JP3525282B2 - Chlorella culture method and apparatus - Google Patents
Chlorella culture method and apparatusInfo
- Publication number
- JP3525282B2 JP3525282B2 JP17326297A JP17326297A JP3525282B2 JP 3525282 B2 JP3525282 B2 JP 3525282B2 JP 17326297 A JP17326297 A JP 17326297A JP 17326297 A JP17326297 A JP 17326297A JP 3525282 B2 JP3525282 B2 JP 3525282B2
- Authority
- JP
- Japan
- Prior art keywords
- chlorella
- sunlight
- medium
- intensity
- culture
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
- C12M41/00—Means for regulation, monitoring, measurement or control, e.g. flow regulation
- C12M41/06—Means for regulation, monitoring, measurement or control, e.g. flow regulation of illumination
-
- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
- C12M21/00—Bioreactors or fermenters specially adapted for specific uses
- C12M21/02—Photobioreactors
-
- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
- C12M41/00—Means for regulation, monitoring, measurement or control, e.g. flow regulation
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- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Zoology (AREA)
- Organic Chemistry (AREA)
- Bioinformatics & Cheminformatics (AREA)
- Biotechnology (AREA)
- Genetics & Genomics (AREA)
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- General Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Sustainable Development (AREA)
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- Analytical Chemistry (AREA)
- Molecular Biology (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Micro-Organisms Or Cultivation Processes Thereof (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、クロレラに光合成
を起こさせる日光の照射下において(すなわち、自然開
放培養 -Natural open culture- において)、クロレラ
培養液に対し供給する液状培地の一定時間当たりの供給
量を適切に制御しつつ効率良くクロレラの培養を行うク
ロレラ培養方法及び装置に関する。TECHNICAL FIELD The present invention relates to a liquid medium to be supplied to a chlorella culture solution for a certain period of time under irradiation of sunlight that causes chlorella to undergo photosynthesis (that is, in a natural open culture). TECHNICAL FIELD The present invention relates to a chlorella culture method and device for efficiently culturing chlorella while appropriately controlling the supply amount.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】従来、
クロレラに光合成を起こさせる日光の照射下においてク
ロレラの培養を行う場合、培養のための培地を基礎培地
(Basal medium)と補給培地(Feedingmedium)に別
け、初日は一定量の基礎培地だけで培養し、翌日クロレ
ラが成長して藻体濃度が増加し始めた後、液状の補給培
地を昼間だけ(夜は停止)徐々に一定流量で与えて培養
するという方法、或いはこれに類する方法が行われてき
た。2. Description of the Related Art Conventionally, the problems to be solved by the invention
When culturing chlorella under the irradiation of sunlight that causes chlorella to undergo photosynthesis, separate the culture medium into a basal medium (Basal medium) and a supplemental medium (Feeding medium), and cultivate only a certain amount of basal medium on the first day. , The following day, after chlorella has grown and the concentration of algal cells has started to increase, a liquid supplement medium is gradually fed at a constant flow rate during the day (stop at night), or a method similar to this has been performed. It was
【0003】しかしながら、このような従来の培養方法
では、培地が不足する場合は十分な速度で成長させるこ
とができず、培地が過剰になると、供給した培地が無駄
になったり、過剰の培地により、pH等を始めとする培
養液の性質がクロレラ培養に不適切なものとなることが
時折起こり、何れにせよ十分に効率良く培養を行うこと
はできなかった。However, in such a conventional culture method, when the medium is insufficient, it cannot be grown at a sufficient rate, and when the medium becomes excessive, the supplied medium becomes useless or due to the excessive medium. Occasionally, the properties of the culture solution, such as pH, became unsuitable for chlorella culture, and in any case, it was not possible to perform the culture sufficiently efficiently.
【0004】本発明は、従来技術に存した上記のような
問題点に鑑み行われたものであって、その目的とすると
ころは、クロレラが培養液から養分を吸収しつつ光合成
を行って成長する速度と、一定時間当たりの培地供給量
とがよく対応することにより、培地が不足してクロレラ
の成長が遅れることや、逆に培地が過剰に供給されて供
給した培地が無駄になることが少なく、クロレラの培養
を効率良く行うことができると共に、過剰の培地供給に
より、pH等を始めとする培養液の性質が、クロレラ培
養に不適切なものとなることが防がれるクロレラ培養方
法及びクロレラ培養装置を提供することにある。The present invention has been made in view of the above-mentioned problems existing in the prior art, and its object is to grow by performing photosynthesis while chlorella absorbs nutrients from a culture solution. The amount of medium supplied per unit of time and the amount of medium supplied per unit time correspond well, which may delay the growth of chlorella due to lack of medium or, conversely, cause excessive supply of medium and waste medium supplied. With a small amount, it is possible to efficiently cultivate chlorella, and by supplying an excessive medium, the properties of the culture solution such as pH are prevented from becoming inappropriate for chlorella culture, and a chlorella culture method and It is to provide a chlorella culture device.
【0005】[0005]
【課題を解決するための手段】上記目的を達成する本発
明のクロレラ培養方法は、対象クロレラに光合成を起こ
させる日光の照射下において、対象クロレラの培養液に
対し液状の培地を供給しつつクロレラの培養を行う方法
であって、日光の強度を検知し、検知した日光の強度が
所定範囲内である場合に、日光の強度の増減に応じ一定
時間当たりの培地供給量を増減させ、検知した日光の強
度が前記所定範囲より小さい場合は実質上培地を供給せ
ず、検知した日光の強度が前記所定範囲より大きい場合
は、一定時間当たりの培地供給量を実質上一定とし、前
記所定範囲が、対象クロレラの光合成に関する光補償点
付近と光飽和点付近の間の範囲であることを特徴とす
る。 The method for culturing chlorella of the present invention which achieves the above-mentioned object is to provide chlorella while supplying a liquid medium to a culture solution of chlorella under irradiation of sunlight for causing photosynthesis in the chlorella. In the method of culturing, the intensity of sunlight is detected, and when the detected intensity of sunlight is within a predetermined range, it is detected by increasing or decreasing the medium supply amount per constant time according to the increase or decrease in the intensity of sunlight. When the intensity of sunlight is smaller than the predetermined range, the medium is not substantially supplied, and when the intensity of detected sunlight is larger than the predetermined range, the medium supply amount per constant time is substantially constant, and the predetermined range is , Compensation point for photosynthesis of target chlorella
Characterized by a range between the vicinity and near the optical saturation point
It
【0006】本発明において培養の対象とするクロレラ
は、クロレラ・ピレノイドサ種及びその他のクロレラで
あって、特に限定されない。Chlorella to be cultivated in the present invention is Chlorella pyrenoidosa species and other chlorella, and is not particularly limited.
【0007】クロレラの培養液は、通常の場合水を主成
分とする。液状の培地は、通常の場合、クロレラの生育
に必要な成分を含有する水溶液である。The chlorella culture medium usually contains water as a main component. The liquid medium is usually an aqueous solution containing components necessary for the growth of Chlorella.
【0008】培地の供給は、連続的であってもよく、例
えば間欠的であってもよい。供給する培地は、通常の場
合、一定組成であるが、一定時間当たりの培地供給量を
増減させる場合、特定の1種又は2種以上の成分の供給
量のみを増減させることもできる。[0008] The supply of the medium may be continuous, for example, intermittent. The medium to be supplied usually has a constant composition, but when the medium supply amount per constant time is increased or decreased, it is also possible to increase or decrease only the supply amount of one or two or more specific components.
【0009】対象クロレラに光合成を起こさせる日光の
強度の検知は、種々の光センサ等の検知手段を適宜利用
して行うことができる。The detection of the intensity of sunlight that causes photosynthesis in the target chlorella can be carried out by appropriately using detection means such as various optical sensors.
【0010】対象クロレラに光合成を起こさせる日光の
照射下においてクロレラの培養を行うにあたり、日光の
強度が、対象クロレラの光合成に関する光補償点付近と
光飽和点付近の間、すなわち所定範囲内である場合に、
日光の強度の増減に応じ一定時間当たりの培地供給量を
増減させ、前記日光の強度が前記所定範囲より小さい場
合は実質上培地を供給せず、前記日光の強度が前記所定
範囲より大きい場合は、一定時間当たりの培地供給量を
実質上一定とする。When culturing chlorella under irradiation of sunlight that causes photosynthesis in the target chlorella, the intensity of the sunlight is close to the light compensation point for photosynthesis of the target chlorella.
In the vicinity of the light saturation point , that is, within the predetermined range,
When the medium supply amount per constant time is increased or decreased according to the increase or decrease of the intensity of sunlight, the medium is not substantially supplied when the intensity of the sunlight is smaller than the predetermined range, and when the intensity of the sunlight is larger than the predetermined range. , The medium supply amount per constant time is made substantially constant.
【0011】従って、光合成速度が0若しくは見掛け上
0であるか又はそれに近い程度に日光が弱いか又は暗黒
である場合は、実質上培地は供給されない。日光の強度
が光飽和点に近いか又はそれ以上である場合は、一定時
間当たりの培地の供給量が実質上一定となる。日光の強
度が両者の間である場合は、日光の強度の増減に応じ一
定時間当たりの培地供給量が増減する。そのため、一定
時間当たりの培地供給量(供給しない場合を含む)と、
対象クロレラが培地の養分を吸収する速度(吸収しない
場合を含む)が良く対応する。Therefore, when the photosynthetic rate is 0 or apparently 0, or the degree of daylight is low or dark, the medium is not substantially supplied. When the intensity of sunlight is close to or higher than the light saturation point, the medium supply amount per constant time is substantially constant. When the intensity of sunlight is between the two, the medium supply amount per fixed time increases or decreases according to the increase or decrease in the intensity of sunlight. Therefore, the medium supply amount per unit time (including the case of not supplying),
The rate at which the target Chlorella absorbs the nutrients in the medium (including the case where it does not absorb) corresponds well.
【0012】上記クロレラ培養方法の実施には、液状の
培地を供給するための培地供給手段と、対象クロレラに
光合成を起こさせる日光の強度を検知するための検知手
段と、その検知手段により検知された日光の強度に基づ
き、その日光の強度が所定範囲内である場合に、日光の
強度の増減に応じ一定時間当たりの培地供給量を増減さ
せ、前記日光の強度が前記所定範囲より小さい場合は実
質上培地を供給せず、前記日光の強度が前記所定範囲よ
り大きい場合は、一定時間当たりの培地供給量を実質上
一定とする培地供給量制御手段とを備え、前記所定範囲
が、対象クロレラの光合成に関する光補償点付近と光飽
和点付近の間の範囲であることを特徴とするクロレラ培
養装置を用いることができる。 In carrying out the above-mentioned chlorella culture method, a medium supply means for supplying a liquid medium, a detection means for detecting the intensity of sunlight causing photosynthesis in the target chlorella, and the detection means. Based on the intensity of the sunlight, when the intensity of the sunlight is within a predetermined range, the amount of medium supplied per constant time is increased or decreased according to the increase or decrease of the intensity of the sunlight, and when the intensity of the sunlight is smaller than the predetermined range, When the intensity of the sunlight is larger than the predetermined range without supplying the medium substantially, the medium supply amount control means for making the medium supply amount per constant time substantially constant, and the predetermined range
However, there is light saturation near the light compensation point for photosynthesis of the target chlorella
In the range of between around sum point Ru can be used chlorella culture apparatus according to claim.
【0013】培地供給手段は、例えば、培地供給用の高
架タンクと、その高架タンクから培養プール等の培養器
へ培地を供給する供給管によって構成することができ
る。The medium supply means can be composed of, for example, an elevated tank for supplying the medium and a supply pipe for supplying the medium from the elevated tank to a culture vessel such as a culture pool.
【0014】検知手段としては、種々の光センサ等を適
宜利用することができる。Various optical sensors or the like can be appropriately used as the detecting means.
【0015】培地供給量制御手段は、例えば、日光の強
度を検知する光センサの出力電圧信号を入力して所要増
幅率での増幅等の必要な処理を行う電圧信号処理装置
と、供給管に設けられ、前記電圧信号処理装置からの入
力電圧信号に応じて開度が増減することにより供給管内
を流れる培地の流量を増減させる比例制御弁によって構
成することができる。この場合の電圧信号処理装置は、
例えば、入力電圧と上記所定範囲の下限に対応する一定
値とを比較してその一定値より低い場合は0を出力し、
一定値より高い場合はその一定値を差し引いた電圧を所
要増幅率で増幅し、そのようにして増幅された電圧と、
上記所定範囲の上限に対応する一定電圧のうち小さい方
を出力する回路を備えたものとすることにより、入力電
圧が上記所定範囲の下限に対応する一定値以下の場合出
力電圧が0となり、上記所定範囲の上限に対応する一定
値以上の場合、その一定値を増幅した出力より大きな電
圧を出力しないものとすることができる。このような処
理回路に代えてコンピュータ或いはマイクロコンピュー
タを利用して同様の処理を行わせることも勿論可能であ
る。そして、比例制御弁を、例えば、電圧信号処理装置
からの入力電圧が0の場合、開度が0であり、入力電圧
が正の値であれば、それに比例した開度となるように設
定することによって、日光の強度が所定範囲内である場
合に、日光の強度の増減に応じ一定時間当たりの培地供
給量を増減させ、前記日光の強度が前記所定範囲より小
さい場合は実質上培地を供給せず、前記日光の強度が前
記所定範囲より大きい場合は、一定時間当たりの培地供
給量が実質上一定となるように制御することができる。
なお、培地の供給は、連続的であってもよく、例えば間
欠的であってもよい。The medium supply amount control means includes, for example, a voltage signal processing device for inputting an output voltage signal of an optical sensor for detecting the intensity of sunlight and performing necessary processing such as amplification at a required amplification factor, and a supply pipe. A proportional control valve that is provided and that increases / decreases the flow rate of the medium flowing in the supply pipe by increasing / decreasing the opening degree according to an input voltage signal from the voltage signal processing device can be configured. The voltage signal processing device in this case is
For example, the input voltage is compared with a constant value corresponding to the lower limit of the above-mentioned predetermined range, and when the voltage is lower than the constant value, 0 is output,
If it is higher than a certain value, the voltage obtained by subtracting the certain value is amplified with the required amplification factor, and the voltage thus amplified,
By providing a circuit that outputs the smaller one of the constant voltages corresponding to the upper limit of the predetermined range, the output voltage becomes 0 when the input voltage is equal to or lower than the constant value corresponding to the lower limit of the predetermined range, and When the value is equal to or more than a certain value corresponding to the upper limit of the certain range, a voltage larger than the output obtained by amplifying the certain value may not be output. It is of course possible to use a computer or a microcomputer instead of such a processing circuit to perform the same processing. Then, for example, when the input voltage from the voltage signal processing device is 0, the proportional control valve is set to have an opening of 0, and when the input voltage is a positive value, the proportional control valve is set to have an opening proportional to that. Thereby, when the intensity of sunlight is within a predetermined range, the medium supply amount per constant time is increased or decreased according to the increase or decrease of the intensity of sunlight, and when the intensity of the sunlight is smaller than the predetermined range, the medium is substantially supplied. If the intensity of the sunlight is higher than the predetermined range, the medium supply amount per constant time can be controlled to be substantially constant.
The medium may be supplied continuously or intermittently, for example.
【0016】この装置によれば、光合成速度が0若しく
は見掛け上0であるか又はそれに近い程度に日光が弱い
か又は暗黒である場合は、実質上培地は供給されない。
日光の強度が光飽和点に近いか又はそれ以上である場合
は、一定時間当たりの培地の供給量が実質上一定とな
る。日光の強度が両者の間である場合は、日光の強度の
増減に応じ一定時間当たりの培地供給量が増減する。そ
のため、一定時間当たりの培地供給量(供給しない場合
を含む)と、対象クロレラが培地の養分を吸収する速度
(吸収しない場合を含む)がよく対応する。According to this apparatus, when the photosynthetic rate is 0 or apparently 0, or the degree of daylight is weak or dark, the medium is not substantially supplied.
When the intensity of sunlight is close to or higher than the light saturation point, the medium supply amount per constant time is substantially constant. When the intensity of sunlight is between the two, the medium supply amount per fixed time increases or decreases according to the increase or decrease in the intensity of sunlight. Therefore, the medium supply amount per unit time (including the case where it is not supplied) and the speed at which the target chlorella absorbs the nutrients of the medium (including the case where it does not absorb) correspond well.
【0017】なお、このクロレラ培養装置は、対象クロ
レラの培養液を収容して対象クロレラを培養するための
培養器を備え、上記培地供給手段は、前記培養器内に培
地を供給するものとすることができる(請求項4)。The chlorella culture device is provided with an incubator for accommodating the culture solution of the target chlorella and culturing the target chlorella, and the medium supply means supplies the medium into the incubator. It is possible (Claim 4).
【0018】培養器は、例えば、屋外の日光の照射量が
できるだけ多い場所に培養プールとして設けることがで
きる。The incubator can be provided, for example, as a culture pool in a place where the amount of sunlight irradiation is as large as possible.
【0019】クロレラの光合成に関する光補償点及び光
飽和点は、例えば、光補償点が2klux(キロルク
ス)で光飽和点が10kluxであるが、それぞれ培養
液の温度等の条件によりある程度変動する。本発明のク
ロレラ培養方法及びクロレラ培養装置においては、上記
所定範囲の上限および/または下限を、培養液の温度変
化による対象クロレラの光合成に関する光補償点および
/または光飽和点の変動に応じて上下させるものとする
ことができる。 The light compensation point and the light saturation point relating to the photosynthesis of chlorella are, for example, a light compensation point of 2 klux and a light saturation point of 10 klux, which vary to some extent depending on the conditions such as the temperature of the culture solution . In the chlorella culturing method and the chlorella culturing device of the present invention, the upper limit and / or the lower limit of the above-mentioned predetermined range are set to a light compensation point and / or a light saturation point related to photosynthesis of the target chlorella due to temperature change of the culture solution. Ru can be assumed to be vertically according to the variation.
【0020】上記所定範囲の上限および/または下限
を、培養液の温度変化による対象クロレラの光合成に関
する光補償点および/または光飽和点の変動に応じて上
下させるのは、例えば、コンピュータ或いはマイクロコ
ンピュータの記憶装置に、培養液の温度に応じた光補償
点および/または光飽和点を予め記憶させておき、培養
液の温度を検知する温度センサの出力を必要に応じA−
D変換した温度信号に対応する光補償点および/または
光飽和点を記憶装置から読み出して前記所定範囲の上限
および/または下限を変化さことにより実現することが
できる。培地供給量制御手段として、光センサの出力電
圧信号を入力して処理を行う上記のような電圧信号処理
装置を用いるには、コンピュータ或いはマイクロコンピ
ュータを利用したものが適する。For example, a computer or a microcomputer can raise or lower the upper limit and / or the lower limit of the above-mentioned predetermined range according to the fluctuation of the light compensation point and / or the light saturation point related to the photosynthesis of the target chlorella due to the temperature change of the culture solution. The optical compensation point and / or the optical saturation point corresponding to the temperature of the culture solution are stored in advance in the storage device, and the output of the temperature sensor for detecting the temperature of the culture solution is stored in A-
This can be realized by reading the optical compensation point and / or the optical saturation point corresponding to the D-converted temperature signal from the storage device and changing the upper limit and / or the lower limit of the predetermined range. A computer or a microcomputer is suitable for using the voltage signal processing device as described above that receives the output voltage signal of the optical sensor and performs processing as the medium supply amount control means.
【0021】この場合、一定時間当たりの培地供給量
(供給しない場合を含む)と、対象クロレラが培地の養
分を吸収する速度(吸収しない場合を含む)の対応がよ
り的確になる。In this case, the correspondence between the medium supply amount per unit time (including the case where it is not supplied) and the rate at which the target chlorella absorbs the nutrients of the medium (including the case where it is not absorbed) becomes more accurate.
【0022】[0022]
【0023】[0023]
【0024】[0024]
【発明の実施の形態】本発明の実施の形態を、図面を参
照しつつ説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described with reference to the drawings.
【0025】図1は、本発明の実施の形態の一例として
のクロレラ培養装置の概略図である。FIG. 1 is a schematic diagram of a chlorella culture device as an example of an embodiment of the present invention.
【0026】このクロレラ培養装置は、主として、培地
調合タンク10と、培地供給用の高架タンク12と、培
地調合タンク10から高架タンク12へ液体の培地を給
送するための給送管14と、その給送管14を通じて培
地を揚送するためのポンプ16と、その高架タンク12
から1又は2以上の培養プール18(培養器)へ培地を
供給する主供給管20及び分岐供給管22と、自記日照
計24と、日照度変換自動比例制御器26と、主供給管
20に設けられた主開閉弁28、主流量計30及び比例
制御弁32と、各分岐供給管22に設けられた分岐開閉
弁34及び分岐流量計36と、日光の照射強度ができる
だけ強く照射量ができるだけ多い場所に設けられた1又
は2以上の培養プール18からなる。This chlorella culture device mainly comprises a medium preparation tank 10, an elevated tank 12 for supplying the medium, a feed pipe 14 for feeding the liquid medium from the medium preparation tank 10 to the elevated tank 12, A pump 16 for pumping the medium through the feed pipe 14 and the elevated tank 12
From the main supply pipe 20 and the branch supply pipe 22 for supplying the culture medium to one or more culture pools 18 (incubator), the self-recording sunshine meter 24, the illuminance conversion automatic proportional controller 26, and the main supply pipe 20. The main opening / closing valve 28, the main flow meter 30 and the proportional control valve 32 provided, the branch opening / closing valve 34 and the branch flow meter 36 provided in each branch supply pipe 22, and the irradiation intensity of sunlight as strong as possible and the irradiation amount as much as possible. It consists of one or more culture pools 18 provided in many places.
【0027】培地調合タンク10は、培地を調合するた
めの原料を収容し、それを攪拌装置により攪拌して培地
を調合するものである。培地調合タンク10において調
合された培地は、適宜の時期にポンプ16によって高架
タンク12に給送される。The culture medium preparation tank 10 stores the raw materials for preparing the culture medium, and agitates the raw material to prepare the culture medium. The culture medium prepared in the culture medium preparation tank 10 is fed to the elevated tank 12 by the pump 16 at an appropriate time.
【0028】高架タンク12内に貯留された培地は、高
架タンク12から、主供給管20を経、主供給管20か
ら分岐して各培養プール18に達する分岐供給管22を
通じて流下することにより、クロレラ及びその培養液を
収容した各培養プール18へ供給される。これらの高架
タンク12並びに主供給管20及び分岐供給管22が、
培地供給手段を構成する。The culture medium stored in the elevated tank 12 flows down from the elevated tank 12 through the main supply pipe 20 and the branch supply pipe 22 that branches from the main supply pipe 20 and reaches each culture pool 18. It is supplied to each culture pool 18 containing chlorella and its culture solution. These elevated tank 12, main supply pipe 20 and branch supply pipe 22
It constitutes a medium supply means.
【0029】自記日照計24は、培養プール18付近に
おける日光の強度を検知する光電板等の光センサ(検知
手段)を備え、日光の強度に応じた電圧信号を出力す
る。日照度変換自動比例制御器26は、自記日照計24
からの出力信号を入力して必要な増幅等の処理を行い、
比例制御弁32に対し出力して比例制御弁32の開度を
制御する。これらの日照度変換自動比例制御器26及び
比例制御弁32が、培地供給量制御手段を構成する。通
常の組成のクロレラを培養する場合、日照度変換自動比
例制御器26による処理は、自記日照計24から入力す
る電圧信号が、培養するクロレラの光合成に関する光補
償点付近(例えば2klu x)の光強度に対応する電圧
未満の場合は0Vを出力し、光補償点付近と光飽和点付
近(例えば10klu x)との間の光強度に対応する電
圧の範囲の場合は、入力電圧から光補償点付近の光強度
に対応する電圧を差し引いた値を所定増幅率で増幅した
電圧を出力し、光飽和点付近を超える光強度に対応する
電圧の場合、光飽和点付近の光強度に対応する電圧から
光補償点付近の光強度に対応する電圧を差し引いた値を
前記所定増幅率で増幅した値、すなわち一定電圧を出力
するよう設定する。光補償点付近の光強度に対応する電
圧、及び光飽和点付近の光強度に対応する電圧の設定
は、培養液の温度等の条件変化が予測される場合に、そ
の条件変化に応じて光補償点と光飽和点が変化しても実
際の光補償点及び光飽和点の電圧になるべく近くなるよ
うにすることが望ましい。The self-recording sunshine meter 24 is equipped with an optical sensor (detection means) such as a photoelectric plate for detecting the intensity of sunlight in the vicinity of the culture pool 18, and outputs a voltage signal according to the intensity of sunlight. Sunlight conversion automatic proportional controller 26, self-recording sunshine meter 24
Input the output signal from and perform necessary processing such as amplification,
Output to the proportional control valve 32 to control the opening of the proportional control valve 32. The daylight conversion automatic proportional controller 26 and the proportional control valve 32 constitute a medium supply amount control means. In the case of culturing chlorella having a normal composition, the process by the illuminance conversion automatic proportional controller 26 is performed such that the voltage signal input from the self-recording sunshine meter 24 is the light near the light compensation point (for example, 2 klu x) related to photosynthesis of the chlorella to be cultured. When the voltage is less than the voltage corresponding to the intensity, 0 V is output, and in the case of the voltage range corresponding to the light intensity between the vicinity of the light compensation point and the vicinity of the light saturation point (for example, 10 klux), the light compensation point is changed from the input voltage. The voltage obtained by subtracting the voltage corresponding to the light intensity in the vicinity is amplified by the specified amplification factor, and in the case of the voltage corresponding to the light intensity exceeding the light saturation point, the voltage corresponding to the light intensity near the light saturation point. The value obtained by subtracting the voltage corresponding to the light intensity in the vicinity of the light compensation point is amplified by the predetermined amplification factor, that is, a constant voltage is output. When the voltage corresponding to the light intensity near the light compensation point and the voltage corresponding to the light intensity near the light saturation point are set according to the change in conditions such as temperature of the culture solution, Even if the compensation point and the optical saturation point change, it is desirable to make the voltages at the actual optical compensation point and the optical saturation point as close as possible.
【0030】比例制御弁32は、日照度変換自動比例制
御器26の出力電圧を入力し、その入力電圧に比例して
弁の開度を調節する。The proportional control valve 32 inputs the output voltage of the day-illuminance conversion automatic proportional controller 26 and adjusts the opening of the valve in proportion to the input voltage.
【0031】日光の強度が光補償点付近未満の場合、す
なわち光合成速度が0若しくは見掛け上0であるか又は
それに近い程度に照射光が弱いか又は暗黒である場合
は、日照度変換自動比例制御器26からの出力電圧は0
Vであるから、比例制御弁32は閉じた状態となる。従
って、培地は分岐供給管22へ流れず各培養プール18
へは供給されない。When the intensity of sunlight is less than near the light compensation point, that is, when the photosynthetic rate is 0 or apparently 0, or the irradiation light is weak to such an extent that it is dark or dark, the daylight illuminance conversion automatic proportional control is performed. Output voltage from the device 26 is 0
Since it is V, the proportional control valve 32 is in a closed state. Therefore, the medium does not flow to the branch supply pipe 22 and each culture pool 18
Is not supplied to.
【0032】日光の強度が光補償点付近と光飽和点付近
との間である場合、比例制御弁32の開度は日照度変換
自動比例制御器26からの出力電圧の増減、すなわち日
光の強度の増減に応じて増減する。従って、培地が分岐
供給管22を経て各培養プール18へは供給される流量
も、日光の強度の増減に応じて増減する。比例制御弁3
2の開度は、各培養プール18へ供給される培地の流量
が日光の強度に応じて適切な量となるように制御され
る。When the intensity of sunlight is between the light compensation point and the light saturation point, the opening of the proportional control valve 32 increases or decreases the output voltage from the day-light illuminance conversion automatic proportional controller 26, that is, the intensity of sunlight. Increase or decrease according to the increase or decrease of. Therefore, the flow rate of the medium supplied to each culture pool 18 via the branch supply pipe 22 also increases / decreases according to the increase / decrease in the intensity of sunlight. Proportional control valve 3
The opening degree of 2 is controlled so that the flow rate of the medium supplied to each culture pool 18 becomes an appropriate amount according to the intensity of sunlight.
【0033】日光の強度が光飽和点付近に達すると、比
例制御弁32の開度は最大となり、光飽和点付近を超え
た場合、日光の強度が増しても比例制御弁32はそのま
まの開度を保つ。従って、培地が分岐供給管22を経て
各培養プール18へ供給される流量も、日光の強度の増
減によらず一定値を保つ。When the intensity of sunlight reaches near the light saturation point, the opening degree of the proportional control valve 32 becomes maximum. When the intensity of sunlight exceeds the light saturation point, the proportional control valve 32 remains open even if the intensity of sunlight increases. Keep a degree. Therefore, the flow rate of the medium supplied to each culture pool 18 through the branch supply pipe 22 also maintains a constant value regardless of the increase or decrease in the intensity of sunlight.
【0034】このように、日光の強度の増減に応じ培地
供給流量が増減するので、一定時間当たりの培地供給量
と、対象クロレラが培地の養分を吸収しつつ光合成を行
って成長する速度が、日光のように日の出から日没に至
るまでの太陽の高さの変化や雲量の変化により強度が時
々刻々と変化する場合でも自動的によく対応する。As described above, since the medium supply flow rate increases and decreases according to the increase and decrease of the intensity of sunlight, the medium supply amount per constant time and the growth rate of the target chlorella by performing photosynthesis while absorbing nutrients of the medium are: Even when the intensity changes from moment to moment due to changes in the height of the sun or changes in the amount of cloud, such as sunlight, it automatically responds well.
【0035】[0035]
【実施例】同一地点における直径40m(表面積125
6平方メートル)の培養プール2基を用いて、一基につ
いては上述の従来の方法で、他の一基については本発明
の方法で、同一組成の基礎培地と同一組成の供給培地
(炭素源としての酢酸を主成分とする液体培地)によ
り、培養液深30cmで7日間の培養を行った。[Example] Diameter 40 m (surface area 125
2 culture pools (6 square meters), one with the conventional method described above and the other with the method according to the invention, with a basal medium of the same composition and a feed medium of the same composition (as carbon source). The liquid medium containing acetic acid as a main component) was cultured for 7 days at a culture medium depth of 30 cm.
【0036】その結果は次の通りである。
(1) 従来の方法で培養した培養プール
使用した60kg(クロレラ乾燥粉末の重量)の種を差
し引いて、273kg(クロレラ乾燥粉末の重量)のク
ロレラを得た。すなわち、光合成産量は、約31g/平
方メートル/日であった。The results are as follows. (1) 60 kg (weight of chlorella dry powder) seeds used in the culture pool cultured by the conventional method were subtracted to obtain 273 kg (weight of chlorella dry powder) of chlorella. That is, the photosynthetic output was about 31 g / square meter / day.
【0037】使用した酢酸(氷酢酸)の全量は、95
5.5リットルであった。すなわち、約3.5リットル
/クロレラ乾燥粉末1kgであった。
(2) 本発明の方法で培養した培養プール
使用した60kg(クロレラ乾燥粉末の重量)の種を差
し引いて、360kg(クロレラ乾燥粉末の重量)のク
ロレラを得た。すなわち、光合成産量は、約41g/平
方メートル/日であった。The total amount of acetic acid (glacial acetic acid) used was 95.
It was 5.5 liters. That is, it was about 3.5 liters / kg of chlorella dry powder. (2) The seed of 60 kg (weight of chlorella dry powder) used in the culture pool cultured by the method of the present invention was subtracted to obtain 360 kg (weight of dry powder of chlorella) of chlorella. That is, the photosynthetic output was about 41 g / square meter / day.
【0038】使用した酢酸(氷酢酸)の全量は、100
8リットルであった。すなわち、約2.8リットル/ク
ロレラ乾燥粉末1kgであった。The total amount of acetic acid (glacial acetic acid) used was 100.
It was 8 liters. That is, it was about 2.8 liter / kg of chlorella dry powder.
【0039】このように、本発明の方法で培養すると、
従来の培養方法に比し、クロレラ乾燥粉末の産量は7日
間で約32%増加し、1kgのクロレラ乾燥粉末を生産
するのに使用される氷酢酸は約25%節約された。Thus, culturing by the method of the present invention,
Compared to the conventional culture method, the production of chlorella dry powder increased by about 32% in 7 days, and the glacial acetic acid used to produce 1 kg of chlorella dry powder was saved by about 25%.
【0040】[0040]
【発明の効果】本発明のクロレラ培養方法によれば、一
定時間当たりの培地供給量(供給しない場合を含む)
と、対象クロレラが培地の養分を吸収しつつ光合成を行
って成長する速度(吸収しない場合を含む)が、日光の
ように日の出から日没に至るまでの太陽の高さの変化や
雲量の変化により照射光の強度が時々刻々と変化する場
合でもよく対応するので、培地が不足してクロレラの成
長が遅れることや、逆に培地が過剰に供給されて供給し
た培地が無駄になることが少なく、クロレラの培養を効
率良く行うことができる。また、過剰の培地供給によ
り、pH等を始めとする培養液の性質が、クロレラ培養
に不適切なものとなることが防がれる。EFFECTS OF THE INVENTION According to the chlorella culture method of the present invention, the amount of medium supplied per unit time (including the case where it is not supplied)
And the rate at which the target chlorella grows through photosynthesis while absorbing nutrients in the medium (including the case where it does not absorb), the change in the height of the sun and the change in cloud cover from sunrise to sunset like sunlight Because it responds well even when the intensity of irradiation light changes from moment to moment, the growth of chlorella is delayed due to lack of medium, and conversely, excess medium is supplied and the supplied medium is not wasted. , It is possible to efficiently culture Chlorella. Further, it is possible to prevent the properties of the culture solution such as pH from becoming unsuitable for the chlorella culture by supplying the excess medium.
【0041】請求項2のクロレラ培養方法によれば、一
定時間当たりの培地供給量(供給しない場合を含む)
と、対象クロレラが培地の養分を吸収しつつ光合成を行
って成長する速度(吸収しない場合を含む)が、日光の
ように日の出から日没に至るまでの太陽の高さの変化や
雲量の変化により照射光の強度が時々刻々と変化する場
合でもより的確に対応するので、培地が不足してクロレ
ラの成長が遅れることや、逆に培地が過剰に供給されて
供給した培地が無駄になることがより少なくなり、クロ
レラの培養を一層効率良く行うことができる。また、過
剰の培地供給により、pH等を始めとする培養液の性質
が、クロレラ培養に不適切なものとなることがよりよく
防がれる。According to the chlorella culture method of claim 2, the medium supply amount per fixed time (including the case where the medium is not supplied)
And the rate at which the target chlorella grows through photosynthesis while absorbing nutrients in the medium (including the case where it does not absorb), the change in the height of the sun and the change in cloud cover from sunrise to sunset like sunlight Since it responds more accurately even when the intensity of the irradiating light changes momentarily, the growth of chlorella is delayed due to lack of medium, or conversely, excess medium is supplied and the supplied medium is wasted. And the chlorella can be cultured more efficiently. Further, by supplying an excessive amount of medium, it is better prevented that the properties of the culture solution such as pH are unsuitable for chlorella culture.
【0042】本発明のクロレラ培養装置によれば、一定
時間当たりの培地供給量(供給しない場合を含む)と、
対象クロレラが培地の養分を吸収しつつ光合成を行って
成長する速度(吸収しない場合を含む)が、日光のよう
に日の出から日没に至るまでの太陽の高さの変化や雲量
の変化により照射光の強度が時々刻々と変化する場合で
も自動的によく対応するので、培地が不足してクロレラ
の成長が遅れることや、逆に培地が過剰に供給されて供
給した培地が無駄になることが少なく、クロレラの培養
を自動的に効率良く行うことができる。また、過剰の培
地供給により、pH等を始めとする培養液の性質が、ク
ロレラ培養に不適切なものとなることが自動的に防がれ
る。According to the chlorella culture apparatus of the present invention, the medium supply amount per unit time (including the case where the medium is not supplied),
Irradiation occurs when the target chlorella absorbs nutrients in the medium and grows by photosynthesis (including the case where it does not absorb) due to changes in the height of the sun from sunrise to sunset and changes in cloud cover. Even if the intensity of light changes momentarily, it automatically responds well, so the growth of chlorella is delayed due to lack of medium, or conversely, excess medium is supplied and the supplied medium is wasted. The amount of chlorella can be automatically and efficiently cultivated. Further, by supplying the excess medium, it is automatically prevented that the properties of the culture solution such as pH become unsuitable for chlorella culture.
【図1】クロレラ培養装置の概略図である。FIG. 1 is a schematic view of a chlorella culture device.
10 培地調合タンク 12 高架タンク 14 給送管 16 ポンプ 18 培養プール 20 主供給管 22 分岐供給管 24 自記日照計 26 日照度変換自動比例制御器 28 主開閉弁 30 主流量計 32 比例制御弁 34 分岐開閉弁 36 分岐流量計 10 Medium preparation tank 12 elevated tank 14 Feeding pipe 16 pumps 18 culture pool 20 Main supply pipe 22 Branch supply pipe 24 Self-recording sunshine meter 26th Illuminance conversion automatic proportional controller 28 Main on-off valve 30 Main flow meter 32 proportional control valve 34 Branch opening / closing valve 36-branch flow meter
フロントページの続き (56)参考文献 特開 平4−299975(JP,A) 特開 平8−322553(JP,A) 特開 平7−184631(JP,A) 特開 平5−284959(JP,A) (58)調査した分野(Int.Cl.7,DB名) C12N 1/00 - 7/08 C12M 1/00 - 3/10 JSTPlus(JOIS) BIOSIS/WPI(DIALOG) PebMedContinuation of the front page (56) Reference JP-A-4-299975 (JP, A) JP-A-8-322553 (JP, A) JP-A-7-184631 (JP, A) JP-A-5-284959 (JP , A) (58) Fields investigated (Int.Cl. 7 , DB name) C12N 1/00-7/08 C12M 1/00-3/10 JSTPlus (JOIS) BIOSIS / WPI (DIALOG) PebMed
Claims (6)
照射下において、対象クロレラの培養液に対し液状の培
地を供給しつつクロレラの培養を行う方法であって、 日光の強度を検知し、 検知した日光の強度が所定範囲内である場合に、日光の
強度の増減に応じ一定時間当たりの培地供給量を増減さ
せ、 検知した日光の強度が前記所定範囲より小さい場合は実
質上培地を供給せず、 検知した日光の強度が前記所定範囲より大きい場合は、
一定時間当たりの培地供給量を実質上一定とし、 前記所定範囲が、対象クロレラの光合成に関する光補償
点付近と光飽和点付近の間の範囲であることを特徴とす
るクロレラ培養方法。1. A method of culturing chlorella while supplying a liquid medium to a culture solution of the target chlorella under irradiation of sunlight that causes photosynthesis of the target chlorella, which comprises detecting and detecting the intensity of sunlight. When the intensity of the sunlight is within the specified range, the medium supply amount per fixed time is increased / decreased according to the increase / decrease of the intensity of the sunlight, and when the detected intensity of the sunlight is smaller than the specified range, the medium is substantially supplied. If the intensity of the detected sunlight is higher than the above specified range,
The medium supply amount per constant time is substantially constant, and the predetermined range is the light compensation for the photosynthesis of the target chlorella.
A method for culturing chlorella, characterized in that the range is between the vicinity of the point and the vicinity of the light saturation point .
関する光補償点と光飽和点の間の範囲である請求項1記
載のクロレラ培養方法。2. The chlorella culture method according to claim 1, wherein the predetermined range is a range between a light compensation point and a light saturation point regarding photosynthesis of the target chlorella.
を、対象クロレラの光合成に関する光補償点および/ま
たは光飽和点の培養液の温度変化による変動に応じて上
下させるものである請求項1又は2記載のクロレラ培養
方法。3. The method according to claim 1, wherein the lower limit and / or the upper limit of the above-mentioned predetermined range is raised or lowered according to the variation of the photocompensation point and / or the light saturation point of the photosynthesis of the target chlorella due to the temperature change of the culture solution. 2. The chlorella culture method described in 2.
と、 対象クロレラに光合成を起こさせる日光の強度を検知す
るための検知手段と、 その検知手段により検知された日光の強度に基づき、そ
の日光の強度が所定範囲内である場合に、日光の強度の
増減に応じ一定時間当たりの培地供給量を増減させ、前
記日光の強度が前記所定範囲より小さい場合は実質上培
地を供給せず、前記日光の強度が前記所定範囲より大き
い場合は、一定時間当たりの培地供給量を実質上一定と
する培地供給量制御手段とを備え、 前記所定範囲が、対象クロレラの光合成に関する光補償
点付近と光飽和点付近の間の範囲であることを特徴とす
るクロレラ培養装置。4. A medium supply means for supplying a liquid medium, a detection means for detecting the intensity of sunlight that causes photosynthesis in the target chlorella, and based on the intensity of sunlight detected by the detection means, When the intensity of the sunlight is within the predetermined range, the medium supply amount per constant time is increased or decreased according to the increase or decrease of the intensity of the sunlight, and when the intensity of the sunlight is smaller than the predetermined range, the medium is not substantially supplied. When the intensity of the sunlight is larger than the predetermined range, the medium supply amount control means for making the medium supply amount per constant time substantially constant is provided, and the predetermined range is light compensation for photosynthesis of the target chlorella.
A chlorella culture device characterized in that it is a range between the vicinity of the point and the vicinity of the light saturation point .
関する光補償点と光飽和点の間の範囲である請求項4記
載のクロレラ培養装置。5. The chlorella culture device according to claim 4, wherein the predetermined range is a range between a light compensation point and a light saturation point regarding photosynthesis of the target chlorella.
レラを培養するための培養器を備え、上記培地供給手段
は、前記培養器内に培地を供給するものである請求項4
又は5記載のクロレラ培養装置。6. An incubator for accommodating a culture solution of a target chlorella and culturing the target chlorella, wherein the medium supply means supplies a medium into the incubator.
Or the chlorella culture device according to 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17326297A JP3525282B2 (en) | 1997-06-12 | 1997-06-12 | Chlorella culture method and apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17326297A JP3525282B2 (en) | 1997-06-12 | 1997-06-12 | Chlorella culture method and apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH119265A JPH119265A (en) | 1999-01-19 |
JP3525282B2 true JP3525282B2 (en) | 2004-05-10 |
Family
ID=15957196
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17326297A Expired - Fee Related JP3525282B2 (en) | 1997-06-12 | 1997-06-12 | Chlorella culture method and apparatus |
Country Status (1)
Country | Link |
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JP (1) | JP3525282B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4730000B2 (en) | 2005-07-01 | 2011-07-20 | 株式会社ニコン | incubator |
JP5764918B2 (en) * | 2010-12-03 | 2015-08-19 | 株式会社Ihi | Luminescent illuminator, culture apparatus and method |
-
1997
- 1997-06-12 JP JP17326297A patent/JP3525282B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH119265A (en) | 1999-01-19 |
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