JP3496376B2 - Method and apparatus for cleaning electronic material surface after cutting - Google Patents

Method and apparatus for cleaning electronic material surface after cutting

Info

Publication number
JP3496376B2
JP3496376B2 JP31872495A JP31872495A JP3496376B2 JP 3496376 B2 JP3496376 B2 JP 3496376B2 JP 31872495 A JP31872495 A JP 31872495A JP 31872495 A JP31872495 A JP 31872495A JP 3496376 B2 JP3496376 B2 JP 3496376B2
Authority
JP
Japan
Prior art keywords
cleaning
water
tank
solvent
electronic material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP31872495A
Other languages
Japanese (ja)
Other versions
JPH09155308A (en
Inventor
隆幸 西浦
俊之 森本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
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Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP31872495A priority Critical patent/JP3496376B2/en
Publication of JPH09155308A publication Critical patent/JPH09155308A/en
Application granted granted Critical
Publication of JP3496376B2 publication Critical patent/JP3496376B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、水晶、フェライ
ト、ガラス、半導体結晶等電子材料の切断後の洗浄方法
及びその装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning method and an apparatus therefor after cutting electronic materials such as quartz, ferrite, glass and semiconductor crystals.

【0002】[0002]

【従来の技術】これら電子材料の切断には、内周刃スラ
イサー、ワイヤーソー、ブレードソーが主に使用され
る。これらの加工機で切断を行うときは、例えば財団法
人機械振興協会技術研究所 昭和60年発行の加工技術
データファイル9巻のP.5に示すように、まず材料に
固定ベースを接着する。この接着には主にエポキシ系接
着剤が用いられる。こののち切断を行う。この切断のあ
と、材料から固定ベースであるエポキシ系接着剤を剥
し、切断時に材料表面および側面に付着した切削液およ
び設備可動部に給脂したグリス等の汚れを洗浄した後、
次に電子材料の電子部品への組み立て、取り付け等の工
程に送られる。
2. Description of the Related Art An inner peripheral blade slicer, a wire saw and a blade saw are mainly used for cutting these electronic materials. When cutting with these processing machines, for example, P. of 9 volumes of processing technology data files issued by the Institute for Machinery Promotion, Technical Research Institute, 1985. First, the fixed base is adhered to the material as shown in FIG. An epoxy adhesive is mainly used for this adhesion. After this, cutting is performed. After this cutting, peel off the epoxy adhesive that is the fixed base from the material, and after cleaning the cutting fluid adhering to the surface and side surfaces of the material at the time of cutting and the grease such as grease greased to the moving parts of the equipment,
Next, the electronic materials are sent to a process such as assembling and attaching to electronic parts.

【0003】この固定ベースの剥し、および洗浄方法と
しては、従来は、(A)通常の脱脂洗浄を行った後酢酸
での煮沸で接着剤を剥離する、あるいは(B)塩化メチ
レン、トリクロルエチレン等の塩素系溶剤で洗浄を行う
ことで、エポキシ接着剤の膨潤剥離と脱脂洗浄を同時に
行う方法が取られてきた。また、(A)の脱脂洗浄に
は、例えば近代編集社が平成7年発行の雑誌「洗浄設
計」のP.42に示す様な炭化水素系溶剤による洗浄、
もしくは同平成3年発行のP.17に示すような水溶性
溶剤を水にうすめて洗浄する水系洗浄が用いられてき
た。
Conventionally, as a method for peeling and cleaning the fixed base, (A) ordinary degreasing cleaning is performed and then the adhesive is peeled off by boiling with acetic acid, or (B) methylene chloride, trichloroethylene, etc. A method of simultaneously performing swelling and peeling of the epoxy adhesive and degreasing cleaning by cleaning with the chlorine-based solvent has been used. In addition, for the degreasing cleaning of (A), for example, P.I. Cleaning with a hydrocarbon solvent as shown in 42,
Or P. issued in 1991. A water-based cleaning method in which a water-soluble solvent as shown in 17 is diluted with water for cleaning has been used.

【0004】[0004]

【発明が解決しようとする課題】上記(A)の場合は、
脱脂、乾燥、洗浄及び酢酸煮沸して水洗、乾燥と多くの
煩雑な工程を通す必要がある。酢酸という有機酸を使用
するため、作業環境の整備、排水および排気の処理に費
用がかかるといった問題がある。
In the case of the above (A),
It is necessary to pass through many complicated steps such as degreasing, drying, washing and boiling with acetic acid, washing with water and drying. Since an organic acid called acetic acid is used, there is a problem that maintenance of the working environment and treatment of wastewater and exhaust are expensive.

【0005】上記(B)の場合は、脱脂洗浄とエポキシ
系接着剤の剥離という2つの工程を同時に行うことはで
きるが塩素系有機溶剤という人体に有害な薬品を使用す
るため、作業環境の整備等に費用がかかる他に、排気等
からの拡散により環境汚染を引き起こす可能性がある。
特にトリクロルエチレンはすでに地下水汚染等の環境汚
染を引き起こしつつあり、将来的には使用が困難になり
つつある。
In the case of the above (B), the two steps of degreasing and cleaning and peeling of the epoxy adhesive can be carried out at the same time, but a chlorine-based organic solvent, which is harmful to the human body, is used. In addition to being expensive, there is a possibility of causing environmental pollution due to diffusion from exhaust gas.
In particular, trichlorethylene is already causing environmental pollution such as groundwater pollution, and its use is becoming difficult in the future.

【0006】[0006]

【課題を解決するための手段】そこで以上の課題を解決
するために、最初にナフテン系あるいはアルキルベンゼ
ン系の各炭化水素系溶剤で脱脂洗浄を行い、次いでNM
P(N−メチルピロリドン)あるいは乳酸エチルのよう
な水溶性の洗浄剤で洗浄し、温風乾燥もしくは真空乾燥
で乾燥させる。
[Means for Solving the Problems] In order to solve the above problems, degreasing and cleaning are first carried out with naphthene-based or alkylbenzene-based hydrocarbon solvents, and then NM.
It is washed with a water-soluble detergent such as P (N-methylpyrrolidone) or ethyl lactate, and dried by warm air drying or vacuum drying.

【0007】[0007]

【発明の実施の態様】ナフテン系およびアルキルベンゼ
ン系等の炭化水素系溶剤は、切削油あるいはグリス等の
炭化水素系の油脂の溶解能力が極めて高いことがわかっ
た。なお、炭化水素系として芳香族系はグリスが溶けに
くい、又脂肪族系のものは引火点の関係で危険であるの
で、前記ナフテン系あるいはアルキルベンゼン系とし
た。それゆえ、切断後の材料に付着している切削油およ
びグリス等の油脂類はこれにより除去できる。これは表
1のように今回実験により確かめられた。なお表1の中
の油脂溶解時間は、液温50℃にてガラス板に付着した
油脂を溶解するに要した時間である。
BEST MODE FOR CARRYING OUT THE INVENTION It has been found that hydrocarbon solvents such as naphthene-based and alkylbenzene-based solvents have an extremely high ability to dissolve hydrocarbon oils and fats such as cutting oil and grease. As the hydrocarbon type, the aromatic type is less likely to dissolve the grease, and the aliphatic type is dangerous because of the flash point. Therefore, the naphthene type or the alkylbenzene type is used. Therefore, the cutting oil and grease such as grease attached to the material after cutting can be removed by this. This was confirmed by the experiment this time as shown in Table 1. The oil and fat dissolution time in Table 1 is the time required to dissolve the oil and fat adhering to the glass plate at a liquid temperature of 50 ° C.

【0008】[0008]

【表1】 [Table 1]

【0009】次いでNMPあるいは乳酸エチル等の水溶
性溶剤で洗浄することでエポキシ接着剤が膨潤し固定ベ
ースが剥がれる。表1中のエポキシ剥離時間は液温80
℃にて半導体結晶とカーボンが接着していたものを剥離
させるのに要する時間である。水溶性溶剤は表1に示す
ように油脂の除去能力は炭化水素系の溶剤に比べ劣る
が、樹脂の溶解・膨潤効果は非常に優れており、今回実
験によりエポキシ系接着剤の剥離能力についてもトリク
ロルエチレンに近い能力を持っていることが判った。ま
た、これら溶剤は表2に示すように人体に対し安全であ
る。なお、表2中のLD50は被験動物(本表ではラッ
ト又はマウス)の50%が死亡する薬品投与量のことで
ある。又、最後に乾燥を行うことで水溶性溶剤を蒸発さ
せる。
Then, by washing with a water-soluble solvent such as NMP or ethyl lactate, the epoxy adhesive swells and the fixed base is peeled off. Epoxy peeling time in Table 1 is liquid temperature 80
This is the time required for peeling off what was adhered between the semiconductor crystal and carbon at ° C. As shown in Table 1, the water-soluble solvent is inferior in oil / fat removal ability to the hydrocarbon type solvent, but the resin dissolving / swelling effect is very excellent. It was found to have a capacity close to that of trichlorethylene. Further, these solvents are safe for human body as shown in Table 2. The LD50 in Table 2 is the dose of a drug that kills 50% of test animals (rats or mice in this table). In addition, the water-soluble solvent is evaporated by finally drying.

【0010】表3に示すように炭化水素系溶剤は原油か
ら製造されるため安価ではあるが、その製法上、沸点が
接近しており、かつ分子量の異なる数種類の誘導体が生
成される。通常は精製時、沸点範囲を広く取って蒸留し
なければ精製効率が悪くなり、コストアップにもなる。
逆に云えば沸点の同じ炭化水素系溶剤のみを取り出すこ
とは大変な手間及び技術的困難がある。このため、どう
しても沸点の高い成分が混ざりこれが乾燥性を悪くす
る。また、これを改善しようとして沸点範囲を狭める
と、製品になる部分の収量が落ちかつ製品にできない部
分が増えコストアップを招く、また、沸点を低く取ると
引火点が低くなるので危険性が増す。
As shown in Table 3, hydrocarbon solvents are inexpensive because they are produced from crude oil, but due to the production method, several kinds of derivatives having different boiling points and different molecular weights are produced. Usually, during purification, unless the boiling point range is wide and distillation is carried out, the purification efficiency is deteriorated and the cost is increased.
Conversely speaking, it is very troublesome and technically difficult to extract only the hydrocarbon solvent having the same boiling point. Therefore, the components having a high boiling point are inevitably mixed with each other, which deteriorates the drying property. Also, if the boiling point range is narrowed in an attempt to improve this, the yield of the part that becomes the product will decrease and the part that cannot be made into the product will increase the cost, and if the boiling point is taken low, the flash point will decrease and the risk increases. .

【0011】乾燥性を高めようとすると、沸点が低下し
て引火点が低くなることにより、コストアップの他に引
火の危険性も大となる。以上述べた如く、安価であって
切削油あるいはグリス等の炭化水素系の油脂の溶解能力
の極めて高いナフテン系およびアルキルベンゼン系の炭
化水素系溶剤を水溶性溶剤と組み合わせている。両者の
長所を結びつけたのが本発明であって、前者の乾燥後の
悪さは、水溶性溶剤にて補っており、しかも両者は分離
する性能があることにより、両者の純度も保たれること
になる。
When the drying property is increased, the boiling point is lowered and the flash point is lowered, so that not only the cost is increased but also the risk of ignition is increased. As described above, a naphthene-based or alkylbenzene-based hydrocarbon solvent, which is inexpensive and has a very high ability to dissolve a hydrocarbon oil such as cutting oil or grease, is combined with a water-soluble solvent. It is the present invention that combines the advantages of both, and the former poorness after drying is compensated by a water-soluble solvent, and since both have the ability to separate, the purity of both can be maintained. become.

【0012】[0012]

【表2】 [Table 2]

【0013】[0013]

【表3】 [Table 3]

【0014】すなわち、NMPおよび乳酸エチル等の化
成品はそもそもコストは高いものの単一成分であるので
沸点範囲が狭く、乾燥性は良い。極性の小さい炭化水素
系溶剤と極性の大きいNMP、乳酸エチル等の水溶性溶
剤は混合しても混ざらず比重差で分離し、NMP、乳酸
エチルは下に沈む。このため、炭化水素系溶剤の残分
(持ち込み)は、NMP、乳酸エチルと比重差で分離で
き、もとの槽に戻せるため炭化水素系の溶剤の損失が少
なくでき、かつNMP、乳酸エチル側の液管理も簡単に
なる。更に、水溶性であることにより水での消火が可能
なため余分な消火設備が不要となる。この水溶性溶剤と
しては他に乳酸メチル、乳酸ブチル、1.3−ジメチル
−2−イミダゾリジノン、乳酸があり同様の作用を認め
た。なお、乳酸は有機酸ではあるが害が少なく、刺激臭
もなく有用である。
That is, although chemical products such as NMP and ethyl lactate are expensive in the first place, they are single components and therefore have a narrow boiling point range and good dryability. A hydrocarbon solvent having a small polarity and a water-soluble solvent having a large polarity, such as NMP and ethyl lactate, do not mix even if they are mixed, and are separated by a difference in specific gravity, and NMP and ethyl lactate sink below. Therefore, the residual hydrocarbon solvent (carry-in) can be separated from NMP and ethyl lactate by the difference in specific gravity, and can be returned to the original tank to reduce the loss of hydrocarbon solvent, and the NMP and ethyl lactate side Liquid management is also simplified. Furthermore, since it is water-soluble, it can be extinguished with water, so that no extra fire extinguishing equipment is required. Other examples of the water-soluble solvent include methyl lactate, butyl lactate, 1.3-dimethyl-2-imidazolidinone, and lactic acid, and similar effects were observed. Although lactic acid is an organic acid, it has little harm and is useful without irritating odor.

【0015】[0015]

【実施例】【Example】

(実施例1) 図1は、多槽式洗浄装置の例を示す。例
えば、ステンレス製の籠等の移し替え用容器21に入れ
られた水晶、フェライト、ガラス、半導体等電子材料の
切断後の材料(以下被洗浄物22と云う。)は第1槽1
のナフテン系溶剤で脱脂され、前記移し替え容器21に
入れたまま第2槽2に移されNMPにてエポキシ接着剤
が膨潤剥離される。そのとき被洗浄物22に付着して持
ちきたされたナフテン系溶剤が分離され、NMP上に浮
上してくる。この様にナフテン系溶剤が除去された被洗
浄物は、第3槽3のNMPでひき続きエポキシ接着剤が
膨潤剥離された後、第4槽4で温風乾燥される。温風は
ブロア8からの風が温風ヒーター7によって加熱され供
給される。
(Example 1) FIG. 1 shows an example of a multi-tank cleaning apparatus. For example, after cutting electronic materials such as crystal, ferrite, glass, and semiconductor (hereinafter referred to as an object to be cleaned 22) placed in a transfer container 21 such as a stainless steel basket, the first tank 1 is used.
Degreased with the naphthene-based solvent, transferred to the second tank 2 with the transfer container 21 kept therein, and the epoxy adhesive is swollen and peeled off by NMP. At that time, the naphthene-based solvent that has adhered to the object to be cleaned 22 and is brought is separated and floats on the NMP. The object to be cleaned from which the naphthene-based solvent has been removed in this way is subsequently dried by warm air in the fourth tank 4 after the epoxy adhesive has been swollen and peeled off by the NMP in the third tank 3. The warm air is supplied from the blower 8 after being heated by the warm air heater 7.

【0016】第2槽2に持ち込まれたナフテン系溶剤
は、油水分離器5で分離され再度第1槽1に戻される。
油水分離器5で分離されたNMPは、減圧蒸留装置6で
蒸留された後、第3槽3に戻される。
The naphthenic solvent brought into the second tank 2 is separated by the oil / water separator 5 and returned to the first tank 1 again.
The NMP separated by the oil-water separator 5 is distilled in the vacuum distillation device 6 and then returned to the third tank 3.

【0017】(実施例2) 図2は、単槽式洗浄装置の
例を示す。まず被洗浄物22は洗浄槽9に入れられる。
洗浄槽の蓋10が締められ、窒素供給バルブ12と排気
バルブ13のバルブが開かれ、洗浄槽9の雰囲気のN2
にての置換が開始される。その後、バルブ11が開か
れ、アルキルベンゼンタンク18からアルキルベンゼン
系の溶剤が洗浄槽9内に注入される。被洗浄物22は、
まずアルキルベンゼン系溶剤で、切削油、グリス等の油
脂が除去される。その後排液バルブ14が開かれると同
時に排気バルブ13が閉じられて、入っていた液が排液
される。
(Embodiment 2) FIG. 2 shows an example of a single tank type cleaning apparatus. First, the object to be cleaned 22 is put in the cleaning tank 9.
The lid 10 of the cleaning tank is closed, the valves of the nitrogen supply valve 12 and the exhaust valve 13 are opened, and the atmosphere of the cleaning tank 9 is filled with N 2 gas.
The replacement at is started. After that, the valve 11 is opened, and the alkylbenzene-based solvent is injected into the cleaning tank 9 from the alkylbenzene tank 18. The object to be cleaned 22 is
First, an oil and fat such as cutting oil and grease is removed with an alkylbenzene solvent. After that, the drain valve 14 is opened and the exhaust valve 13 is closed at the same time, so that the contained liquid is drained.

【0018】さらに、NMP供給バルブ15が開かれN
MPタンク20からNMPが洗浄槽9内に注入されて、
被洗浄物22と洗浄槽9を洗う。これらの液は、先ほど
のアルキルベンゼン系溶剤の液と共に油水分離装置5に
出て、そこでアルキルベンゼン系溶剤とNMPとが分離
される。その後、排液バルブ14が閉じられかつ排気バ
ルブ13が開かれ槽内にNMPが満たされる。そこで、
被洗浄物22のエポキシ接着剤が剥離される。その後再
度排気バルブ13が閉じられ排液バルブ14が開かれN
MPが排液される。
Further, the NMP supply valve 15 is opened to N
NMP is injected into the cleaning tank 9 from the MP tank 20,
The object to be cleaned 22 and the cleaning tank 9 are washed. These liquids flow out to the oil / water separation device 5 together with the liquid of the alkylbenzene-based solvent, and the alkylbenzene-based solvent and NMP are separated there. After that, the drain valve 14 is closed and the exhaust valve 13 is opened to fill the tank with NMP. Therefore,
The epoxy adhesive of the cleaning target 22 is peeled off. Then the exhaust valve 13 is closed again and the drain valve 14 is opened N
The MP is drained.

【0019】排液が終了後、再び排液バルブ14と排気
バルブ13が閉じられ真空用バルブ16が開かれると同
時に真空ポンプ17が作動し、槽内を真空にすることで
NMPの蒸発を促進し、乾燥が加速される。最後に真空
用バルブ16が閉じられ、真空ポンプ10が停止され、
窒素供給バルブ12が開かれ真空状態が破壊されて、洗
浄槽の蓋10が開かれて、洗浄が終了する。排液のアル
キルベンゼン系溶剤は油水分離装置5で分離されたもの
を再利用され、又NMPは油水分離装置5で分離された
後、蒸留装置19で蒸留される。
After the drainage is completed, the drainage valve 14 and the exhaust valve 13 are closed again and the vacuum valve 16 is opened, and at the same time, the vacuum pump 17 is operated to evacuate the inside of the tank to accelerate the evaporation of NMP. And the drying is accelerated. Finally, the vacuum valve 16 is closed, the vacuum pump 10 is stopped,
The nitrogen supply valve 12 is opened, the vacuum state is broken, the lid 10 of the cleaning tank is opened, and the cleaning is completed. The alkylbenzene-based solvent in the effluent is reused after being separated by the oil / water separator 5, and NMP is separated by the oil / water separator 5 and then distilled by the distillation apparatus 19.

【0020】[0020]

【発明の効果】 環境に有害な塩素系溶剤の使用をせずに脱脂、樹脂剥
離及び乾燥を効率良く行うことが可能になった。すなわ
ち、有害な塩素系溶剤を使用しないことにより環境への
悪影響が少なくなり、又塩素系溶剤蒸気の吸入による人
体の健康への害も少なくなった。溶剤のみで終了する
ため、すすぎ水が全く発生せずこれによる水質汚濁ある
いは水質汚濁防止のための水処理装置への多大な投資が
不要である。常に清浄な水溶性溶剤を供給出来る。水
溶性溶剤は蒸発熱も少なく、リンス(水洗)工程を必要
としない為、乾燥シミの発生が少ない。単一成分の溶
剤でかつ溶剤同士が混じり合わないため溶剤の再生が容
易でこれにより溶剤コスト削減と産業廃棄物削減が図れ
る。
EFFECTS OF THE INVENTION It has become possible to efficiently perform degreasing, resin peeling and drying without using a chlorine-based solvent which is harmful to the environment. That is, by not using a harmful chlorine-based solvent, the adverse effect on the environment was reduced, and the inhalation of chlorine-based solvent vapor also reduced the damage to human health. Since only the solvent is used, rinsing water is not generated at all, so that water pollution due to the rinsing water is not required, and a large investment in a water treatment device for preventing water pollution is unnecessary. Can always supply a clean water-soluble solvent. Since the water-soluble solvent also has a small amount of heat of evaporation and does not require a rinsing (water washing) step, it causes less dry spots. Since the solvent is a single component and the solvents do not mix with each other, it is easy to regenerate the solvent, which can reduce the solvent cost and industrial waste.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の多槽式洗浄装置図。FIG. 1 is a diagram of a multi-tank cleaning apparatus of the present invention.

【図2】本発明の単槽式洗浄装置図。FIG. 2 is a diagram of a single-tank cleaning apparatus of the present invention.

【符号の説明】[Explanation of symbols]

1:第1槽ナフテン系洗浄 2:第2槽NMP 3:第3槽NMP 4:温風乾燥槽 5:油水分離装置 6:NMP蒸留装置 7:温風ヒーター 8:ブロア 9:洗浄槽 10:洗浄槽蓋 11:アルキルベンゼン供給バルブ 12:窒素供給バルブ 13:排気バルブ 14:排水バルブ 15:NMP供給バルブ 16:真空用バルブ 17:真空ポンプ 18:アルキルベンゼンタンク 19:蒸留装置 20:NMPタンク 21:移し替え用容器 22:被洗浄物 1: First tank naphthenic cleaning 2: Second tank NMP 3: Third tank NMP 4: Warm air drying tank 5: Oil-water separator 6: NMP distillation device 7: Hot air heater 8: Blower 9: Cleaning tank 10: Cleaning tank lid 11: Alkylbenzene supply valve 12: Nitrogen supply valve 13: Exhaust valve 14: Drain valve 15: NMP supply valve 16: Vacuum valve 17: Vacuum pump 18: Alkylbenzene tank 19: Distillation device 20: NMP tank 21: Container for transfer 22: Object to be cleaned

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI C23G 5/04 C23G 5/04 (58)調査した分野(Int.Cl.7,DB名) B08B 3/08 C11D 7/24 C11D 7/26 C11D 7/50 C23G 5/036 C23G 5/04 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 identification code FI C23G 5/04 C23G 5/04 (58) Fields investigated (Int.Cl. 7 , DB name) B08B 3/08 C11D 7/24 C11D 7/26 C11D 7/50 C23G 5/036 C23G 5/04

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 エポキシ系接着剤でベースに固定された
電子材料を切断した後に洗浄を行う場合に、ナフテン系
又はアルキルベンゼン系の炭化水素系溶剤で脱脂洗浄を
行った後、N−メチルピロリドン又は乳酸エチル等の水
溶性溶剤でエポキシ系接着剤の剥離を行うことを特徴と
する切断後の電子材料表面の洗浄方法。
1. When the electronic material fixed to the base with an epoxy adhesive is cut and then washed, after degreasing and washing with a naphthene-based or alkylbenzene-based hydrocarbon solvent, N-methylpyrrolidone or A method for cleaning the surface of an electronic material after cutting, which comprises removing an epoxy adhesive with a water-soluble solvent such as ethyl lactate.
【請求項2】 請求項1に記載の切断後の電子材料表面
の洗浄方法を実施するに際して、順次洗浄するための炭
化水素系溶剤の槽と水溶性溶剤の槽、洗浄後の電子材料
表面の前記水溶性溶剤を乾燥するための乾燥槽及び前記
水溶性溶剤に混入した前記炭化水素系溶剤を回収循環す
るための比重分離装置を備えたことを特徴とする切断後
の電子材料表面の洗浄装置。
2. When carrying out the method of cleaning a surface of an electronic material after cutting according to claim 1, a tank of a hydrocarbon solvent and a tank of a water-soluble solvent for cleaning successively, and a surface of the electronic material surface after cleaning. An apparatus for cleaning the surface of an electronic material after cutting, comprising a drying tank for drying the water-soluble solvent and a specific gravity separator for collecting and circulating the hydrocarbon solvent mixed in the water-soluble solvent .
【請求項3】 請求項1に記載の切断後の電子材料表面
の洗浄方法を実施するに際して、単槽で炭化水素系溶剤
と水溶性溶剤とを順次供給し洗浄し、更に洗浄後の電子
材料表面の前記水溶性溶剤を乾燥することを特徴とする
切断後の電子材料表面の洗浄装置。
3. The method for cleaning the surface of an electronic material after cutting according to claim 1, wherein a hydrocarbon solvent and a water-soluble solvent are sequentially supplied in a single tank for cleaning, and the electronic material after cleaning is further cleaned. An apparatus for cleaning an electronic material surface after cutting, characterized in that the water-soluble solvent on the surface is dried.
JP31872495A 1995-12-07 1995-12-07 Method and apparatus for cleaning electronic material surface after cutting Expired - Fee Related JP3496376B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31872495A JP3496376B2 (en) 1995-12-07 1995-12-07 Method and apparatus for cleaning electronic material surface after cutting

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31872495A JP3496376B2 (en) 1995-12-07 1995-12-07 Method and apparatus for cleaning electronic material surface after cutting

Publications (2)

Publication Number Publication Date
JPH09155308A JPH09155308A (en) 1997-06-17
JP3496376B2 true JP3496376B2 (en) 2004-02-09

Family

ID=18102255

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31872495A Expired - Fee Related JP3496376B2 (en) 1995-12-07 1995-12-07 Method and apparatus for cleaning electronic material surface after cutting

Country Status (1)

Country Link
JP (1) JP3496376B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105593971B (en) * 2013-09-25 2018-10-02 芝浦机械电子株式会社 The removing method of substrate board treatment, the stripping means of adhesive substrates and bonding agent
JP6124482B1 (en) * 2016-03-09 2017-05-10 ジャパン・フィールド株式会社 Method and apparatus for cleaning object to be cleaned
CN113182258B (en) * 2021-04-29 2022-12-02 中国电子科技集团公司第九研究所 Ferrite spherical harmonic oscillator cleaning method

Also Published As

Publication number Publication date
JPH09155308A (en) 1997-06-17

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