JP3473917B2 - Silica glass having rough surface and method for producing the same - Google Patents
Silica glass having rough surface and method for producing the sameInfo
- Publication number
- JP3473917B2 JP3473917B2 JP25963694A JP25963694A JP3473917B2 JP 3473917 B2 JP3473917 B2 JP 3473917B2 JP 25963694 A JP25963694 A JP 25963694A JP 25963694 A JP25963694 A JP 25963694A JP 3473917 B2 JP3473917 B2 JP 3473917B2
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- max
- surface roughness
- hydrofluoric acid
- acid solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Description
【０００１】本発明は、粗い表面を有するシリカガラス
およびその製造方法、特にマイクロクラックがなく表面
の粗いシリカガラスおよびその製造方法に関するThe present invention relates to silica glass having a rough surface and a method for producing the same, and more particularly to silica glass having no microcracks and a rough surface and a method for producing the same.
【０００２】従来、シリカガラスは、高純度で耐熱性に
優れ、かつ加工し易いところから、半導体工業用の、例
えば電気炉、炉芯管、ボート等の材料として使用されて
きた。ところが、前記シリカガラスで作成された電気炉
は、シリカガラスが透明性に優れているでところから電
気炉内の熱エネルギーが外部に漏れ熱効率が低下すると
いう欠点を有していた。また、シリカガラスの表面が平
滑であるところから該シリカガラスで作成したシリコン
ウエ−ハ熱処理用の炉芯管やボートは、リコンウエ−ハ
の多結晶珪素膜や酸化膜等の膜付け中に付着した膜が容
易に剥離せず、その熱膨張率が原因となって、高温処理
中にヒビ割れを起すという欠点があった。Conventionally, silica glass has been used as a material for the semiconductor industry, for example, for electric furnaces, furnace core tubes, boats, etc. because it has high purity, excellent heat resistance, and is easy to process. However, the electric furnace made of the silica glass has a drawback that the thermal energy in the electric furnace leaks to the outside and the thermal efficiency is lowered because the silica glass has excellent transparency. Further, since the surface of the silica glass is smooth, the furnace core tube or boat for heat treatment of the silicon wafer made of the silica glass is attached during the deposition of the polycrystalline silicon film or the oxide film of the recon wafer. The resulting film does not peel off easily, and its coefficient of thermal expansion causes cracks during high-temperature processing.
【０００３】上記欠点を解決するためサンドブラスト処
理法等で処理し表面が粗いシリカガラスが使用されるよ
うになったが、従来のサンドブラスト処理法で処理され
たシリカガラスは凹凸の下にマイクロクラックが発生
し、機械的強度が低下し、治具の寿命を短いものにした
り、あるいはマイクロクラック内に不純物が浸入しシリ
カガラスを失透させる等の欠点があった。さらに、従来
のサンドブラスト処理品ではフッ酸溶液で洗浄すると、
洗浄回数が多くなるにしたがって表面の凹凸が大きくな
り、表面の凹凸がパーテクルの発生原因となり、シリコ
ンウェーハの歩留を低下させるという欠点があった。In order to solve the above-mentioned drawbacks, silica glass having a rough surface which has been treated by a sandblasting method or the like has come to be used. However, silica glass treated by the conventional sandblasting method has microcracks under unevenness. However, there are drawbacks such as the occurrence of such impurities, the decrease in mechanical strength, the shortening of the life of the jig, and the intrusion of impurities into the microcracks to devitrify the silica glass. Furthermore, if the conventional sandblasted product is washed with a hydrofluoric acid solution,
As the number of times of cleaning increases, the surface irregularities become large, and the surface irregularities cause the generation of particles, which has a drawback that the yield of silicon wafers is reduced.
【０００４】[0004]
【発明が解決しようとする課題】こうした現状に鑑み、
本発明等は鋭意研究を重ねた結果、シリカガラス表面に
特定の粒度の硬質粉状物を吹き付けて特定の粗さにし、
次いでフッ酸溶液で処理することでマイクロクラックが
なく、表面粗さが安定したシリカガラスが得られること
を見出し本発明を完成させたものである。すなわち、In view of the current situation,
The present invention, as a result of repeated intensive research, sprayed a hard powder of a specific particle size on the silica glass surface to a specific roughness,
Then, the present invention was completed by finding that silica glass having a stable surface roughness can be obtained by treating with a hydrofluoric acid solution. That is,
【０００５】本発明は、上記マイクロクラックがなく、
表面粗さが安定したシリカガラスを提供することを目的
とする。The present invention does not have the above microcracks,
The object is to provide a silica glass having a stable surface roughness.
【０００６】本発明は、シリコンウエ−ハの膜付け処理
で付着した膜による、治具のヒビ割れが生じないシリカ
ガラスを提供することを目的とする。An object of the present invention is to provide a silica glass in which a jig is not cracked due to a film attached in a film forming process of a silicon wafer.
【０００７】本発明は、赤外線の散乱反射効果に優れた
シリカガラスを提供することを目的とする。An object of the present invention is to provide a silica glass which has an excellent effect of scattering and reflecting infrared rays.
【０００８】本発明は、上記シリカガラスの製造方法を
提供することを目的とする。An object of the present invention is to provide a method for producing the above silica glass.
【０００９】[0009]
【課題を解決するための手段】上記目的を達成する本発
明は、マイクロクラックがなく表面粗さＲmaxが２０〜
１００μｍの粗い表面を有するシリカガラスおよびその
製造方法に係る。According to the present invention, which achieves the above object, there is no microcrack and a surface roughness R max of 20 to 20 is obtained.
The present invention relates to silica glass having a rough surface of 100 μm and a method for manufacturing the same.
【００１０】本発明のシリカガラスは、表面粗さＲmax
が２０〜１００μｍの粗い表面を有し、マイクロクラッ
クがないシリカガラスである。前記シリカガラスのうち
表面粗さＲmaxが２０μｍ以上、５０μｍ未満のシリカ
ガラスは、従来のサンドブラスト処理法でも製造でき
る。しかしながら、本発明のシリカガラスはマイクロク
ラックがなく強度が優れている上に、フッ酸エッチング
処理を繰り返しても表面粗さが変化することがなく安定
したシリカガラスである。かかるシリカガラスは、熱線
の反射散乱が良好であり、かつ表面に凹凸があるので炉
芯管の端部、保温筒等に形成すれば熱線の外部漏れを良
好に防止し熱エネルギーの有効利用が図れるばかりでな
く、シリコンウエ−ハ熱処理用のボートや炉芯管に付着
した多結晶珪素膜や酸化膜等を容易に剥離でき、該治具
の高温処理中でのヒビ割れの発生を防ぎ、寿命を長く保
つことができる。The silica glass of the present invention has a surface roughness R max.
Is a silica glass having a rough surface of 20 to 100 μm and no microcracks. Among the silica glasses, silica glass having a surface roughness R max of 20 μm or more and less than 50 μm can also be produced by a conventional sandblasting method. However, the silica glass of the present invention is stable and has no microcracks and excellent strength, and the surface roughness does not change even when the hydrofluoric acid etching treatment is repeated. Such silica glass has good reflection and scattering of heat rays, and since the surface has irregularities, it is possible to effectively prevent external leakage of heat rays and effectively utilize heat energy if formed on the end of the furnace core tube, a heat insulating tube, or the like. Not only can it be achieved, but the polycrystalline silicon film or oxide film attached to the boat or furnace core tube for silicon wafer heat treatment can be easily peeled off, and the occurrence of cracks during high-temperature treatment of the jig can be prevented, The life can be kept long.
【００１１】一方、表面粗さＲmaxが５０μｍ以上、１
００μｍ以下のシリカガラスは、従来のサンドブラスト
法では得られない表面粗さのシリカガラスである。前記
シリカガラスはマイクロクラックがなく、しかも再度の
フッ酸溶液処理に対しても表面粗さが変化することがな
いところから、遮熱材として優れている。このシリカガ
ラスは、表面粗さが粗過ぎパーテクルを発生し易い上に
強度的にも低いところがあるので、シリコンウェーハに
影響を与える箇所の部材としては必ずしも適するとはい
えない。On the other hand, the surface roughness R max is 50 μm or more, 1
Silica glass having a diameter of 00 μm or less is a silica glass having a surface roughness that cannot be obtained by a conventional sandblast method. The silica glass is excellent as a heat shield material because it has no microcracks and its surface roughness does not change even when it is treated with a hydrofluoric acid solution again. Since this silica glass has a surface roughness that is too rough and particles are likely to be generated and the strength is low, it cannot be said that the silica glass is necessarily suitable as a member that affects the silicon wafer.
【００１２】上記表面粗さを有するシリカガラスの製造
方法は、一般的にシリカガラスの表面に硬質粉状物を吹
き付けて表面粗さＲmaxを５〜５０μｍとしたのち、フ
ッ酸溶液で処理することにより製造される。特に表面粗
さＲmaxが２０μｍ以上、５０μｍ未満のシリカガラス
の製造には、粒径１５０μｍ以下の硬質粉状物をシリカ
ガラス表面に吹き付け、表面粗さＲmax５〜２５μｍと
しのち、フッ酸溶液処理する製造方法が採用される。ま
た、表面粗さＲmaxが５０μｍ〜１００μｍのシリカガ
ラスの製造には、粒径１５０〜５００μｍの硬質粉状物
をシリカガラス表面に吹き付け、表面粗さＲmaxを２０
〜５０μｍとしたのち、フッ酸溶液で処理する方法が採
られる。吹き付ける硬質粉状物の粉体の粒度が５００μ
ｍを超えるとシリカガラスに大きな凹凸が形成され、フ
ッ酸溶液処理で表面粗さＲmaxが１００を超える粗さと
なりシリカガラスの強度が極端に低くなる。前記吹き付
ける硬質粉状物としては、結晶質二酸化珪素粉、非晶質
二酸化珪素粉または結晶質炭化珪素粉、あるいは前記粉
体と液体との混合スラリーが好適である。特に結晶質炭
化珪素粉またはそのスラリーは前記範囲の粒度の粉体が
容易に調達できるところから好ましい。In the method for producing silica glass having the above-mentioned surface roughness, generally, a hard powder material is sprayed on the surface of the silica glass so that the surface roughness R max is 5 to 50 μm, and then the silica glass is treated with a hydrofluoric acid solution. It is manufactured by In particular, in the production of silica glass having a surface roughness R max of 20 μm or more and less than 50 μm, a hard powder having a particle diameter of 150 μm or less is sprayed on the silica glass surface to obtain a surface roughness R max of 5 to 25 μm, and then a hydrofluoric acid solution. A manufacturing method of processing is adopted. Further, in order to produce silica glass having a surface roughness R max of 50 μm to 100 μm, a hard powder having a particle diameter of 150 to 500 μm is sprayed on the surface of the silica glass to give a surface roughness R max of 20.
After setting the thickness to ˜50 μm, a method of treating with a hydrofluoric acid solution is adopted. The particle size of the sprayed hard powder is 500μ
When it exceeds m, large irregularities are formed on the silica glass, and the surface roughness R max becomes 100 or more by the hydrofluoric acid solution treatment, resulting in extremely low strength of the silica glass. As the hard powder to be sprayed, crystalline silicon dioxide powder, amorphous silicon dioxide powder or crystalline silicon carbide powder, or a mixed slurry of the powder and liquid is suitable. Particularly, crystalline silicon carbide powder or a slurry thereof is preferable because powder having a particle size within the above range can be easily procured.
【００１３】吹き付けられた硬質粉状物はシリカガラス
表面に衝突し、そのエネルギーでシリカガラス表面を剥
離し凹凸を形成するが、硬質粉状物の粉体の粒度が小さ
い程表面粗さが小さくできるが、マイクロクラックの発
生は避けることができない。マイクロクラックは最大深
さ約３０μｍにまで達することがある。かかるマイクロ
クラックを有するシリカガラスをフッ酸溶液で処理する
とマイクロクラックにフッ酸溶液が浸透し、マイクロク
ラックを開口しシリカガラス表面の凹凸を増加する。凹
凸が一定の数に達するとそれ以後はフッ酸溶処理を行っ
ても増加することがなく安定化する。The sprayed hard powdery substance collides with the surface of the silica glass, and the energy of the hardened powdery substance peels off the silica glass surface to form irregularities. The smaller the particle size of the hard powdery substance, the smaller the surface roughness. It is possible, but the occurrence of microcracks is unavoidable. Microcracks can reach a maximum depth of about 30 μm. When silica glass having such microcracks is treated with a hydrofluoric acid solution, the hydrofluoric acid solution penetrates into the microcracks to open the microcracks and increase the unevenness of the silica glass surface. When the number of irregularities reaches a certain number, it does not increase even after the hydrofluoric acid solution treatment and stabilizes.
【００１４】上記マイクロクラックを開口するフッ酸溶
液処理は、１０重量％のフッ酸溶液では１５時間、５０
重量％のフッ酸溶液では約１時間の処理時間で行われ
る。前記フッ酸溶液処理によりシリカガラスの凹凸は、
先端が丸い形状となり、フッ酸溶液処理しないシリカガ
ラスに比較して機械強度は高くなる。The hydrofluoric acid solution treatment for opening the above-mentioned microcracks is performed for 15 hours with a 10 wt% hydrofluoric acid solution for 50 hours.
A treatment time of about 1 hour is carried out with a solution of hydrofluoric acid of wt%. The unevenness of the silica glass by the hydrofluoric acid solution treatment,
The tip has a rounded shape, and the mechanical strength is higher than that of silica glass not treated with a hydrofluoric acid solution.
【００１５】[0015]
【実施例】次に本発明を実施例で具体的に説明するが、
本発明はこれに限定されるものではない。EXAMPLES Next, the present invention will be specifically described with reference to Examples.
The present invention is not limited to this.
【００１６】以下の実施例で示す表面粗さＲmaxはＳｕ
ｒｆ−Ｃｏｍ３００Ｂ（東京精機製）を用いて測定した
粗さの最大値を表わし、またマイクロクラックの存在
は、顕微鏡で測定した値である。The surface roughness R max shown in the following examples is Su.
It represents the maximum value of roughness measured using rf-Com300B (manufactured by Tokyo Seiki), and the presence of microcracks is a value measured by a microscope.
【００１７】実施例１
粒度１５０μｍ以下の結晶質二酸化珪素粉をシリカガラ
ス表面に吹き付け表面粗さＲmax２０μｍのシリカガラ
スを得た。次いで前記シリカガラスを１０重量％のフッ
酸溶液に１５時間浸漬したところ、その表面粗さＲmax
は４５μｍとなった。このシリカガラスをさらにフッ酸
溶液処理したが表面粗さＲmaxに大きな変化がなかっ
た。また、このシリカガラスについてマイクロクラック
の有無を顕微鏡で観察したが、その存在が確認できなか
った。Example 1 Crystalline silicon dioxide powder having a particle size of 150 μm or less was sprayed on the surface of silica glass to obtain silica glass having a surface roughness R max of 20 μm. Next, when the silica glass was immersed in a 10 wt% hydrofluoric acid solution for 15 hours, its surface roughness R max was increased.
Was 45 μm. When this silica glass was further treated with a hydrofluoric acid solution, the surface roughness R max did not change significantly. Further, the presence or absence of microcracks in this silica glass was observed with a microscope, but the presence thereof could not be confirmed.
【００１８】上記シリカガラスを炉芯管の端部に用いた
ところ、電気炉内のエネルギーロスは少なく熱効率が良
かった。When the above silica glass was used at the end of the furnace core tube, energy loss in the electric furnace was small and thermal efficiency was good.
【００１９】実施例２
♯４００の炭化珪素をシリカガラス表面に吹き付け、表
面粗さＲmax５μｍのシリカガラスを製造したのち、実
施例１と同様にフッ酸溶液処理を行った。得られたシリ
カガラス表面には表面粗さＲmax２５μｍの凹凸が形成
されていた。このシリカガラスについてマイクロクラッ
クの有無を観察したが確認できなかった。このシリカガ
ラスを用いて炉芯管を作成しシリコンウエーハの酸化膜
処理を行ったところヒビ割れがなく炉芯管の寿命は長い
ものであった。Example 2 Silicon carbide # 400 was sprayed on the surface of silica glass to produce silica glass having a surface roughness R max of 5 μm, and then hydrofluoric acid solution treatment was carried out in the same manner as in Example 1. The resulting silica glass surface had irregularities with a surface roughness R max of 25 μm. The presence or absence of microcracks in this silica glass was observed, but could not be confirmed. When a furnace core tube was prepared using this silica glass and the silicon wafer was subjected to an oxide film treatment, there was no cracking and the life of the furnace core tube was long.
【００２０】比較例１
粒度２５０〜５００μｍの結晶質二酸化珪素粉をシリカ
ガラス表面に吹き付けて、表面粗さＲmax４０μｍのシ
リカガラスを製造した。このシリカガラスには多数のマ
イクロクラックが存在していた。このシリカガラスを用
いて炉芯管を作成しシリコンウエーハの酸化膜処理を行
ったところ割れ易く炉芯管の寿命は短いものであった。
また、前記シリカガラスから作成した炉芯管にパチンコ
玉を落下させたところ、ほぼ同じ粗さを有する実施例１
の炉芯管に比べて割れが速く、強度的に低いものであっ
た。Comparative Example 1 A silica glass having a surface roughness R max of 40 μm was produced by spraying crystalline silicon dioxide powder having a particle size of 250 to 500 μm onto the surface of the silica glass. The silica glass had many microcracks. When a furnace core tube was prepared using this silica glass and a silicon wafer was subjected to an oxide film treatment, it was easily cracked and the life of the furnace core tube was short.
Further, when a pachinko ball was dropped into the furnace core tube made of the silica glass, Example 1 having substantially the same roughness was obtained.
The crack was faster and the strength was lower than that of the furnace core tube.
【００２１】実施例３
直径１００ｍｍ×厚さ５ｍｍのシリカガラス２枚を用意
し、これに比較例１と同様に粒径２５０〜５００μｍの
結晶質石英粉を吹き付け、サンドブラスト加工を行っ
た。得られたシリカガラスの１枚を１０重量％のフッ酸
溶液に１５時間浸漬したところ、その表面粗さＲmaxは
７０μｍとなった。Example 3 Two pieces of silica glass having a diameter of 100 mm and a thickness of 5 mm were prepared, and in the same manner as in Comparative Example 1, crystalline quartz powder having a particle size of 250 to 500 μm was sprayed and sandblasting was performed. When one piece of the obtained silica glass was immersed in a 10 wt% hydrofluoric acid solution for 15 hours, the surface roughness R max became 70 μm.
【００２２】上記２枚のシリカガラスで遮熱板を作成
し、１０００℃に加熱した炉の端部に使用したところ、
フッ酸溶液処理したシリカガラスで作成した遮熱板を用
いた炉芯管の端部の温度は、前記フッ酸溶液処理しない
遮熱坂を用いた炉芯管の端部の温度より５０℃低くなっ
ていた。When a heat shield plate was made of the above two silica glasses and used at the end of the furnace heated to 1000 ° C.,
The temperature of the end of the furnace core tube using the heat shield plate made of silica glass treated with hydrofluoric acid solution is 50 ° C lower than the temperature of the end of the furnace core tube using the heat shield slope not treated with hydrofluoric acid solution. Was becoming.
【００２３】[0023]
【発明の効果】本発明のシリカガラスはマイクロクラッ
クの発生がなく、良好な粗い表面を有しており赤外線の
散乱反射がよく、かつ表面が安定している。そのため本
発明のシリカガラスで作成した電気炉は熱効率が良く、
またシリコンウエーハ熱処理用の炉芯管やボートはそれ
に付着した酸化膜等による治具のヒビ割れが起こらず半
導体工業用治具材料として好適なものである。EFFECTS OF THE INVENTION The silica glass of the present invention does not generate microcracks, has a good rough surface, has good infrared scattering and reflection, and has a stable surface. Therefore, the electric furnace made of silica glass of the present invention has good thermal efficiency,
Furnace core tubes and boats for heat treatment of silicon wafers are suitable as a jig material for the semiconductor industry because the jigs are not cracked by the oxide film or the like attached to the furnace core tubes or boats.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭54−69120（ＪＰ，Ａ) 特開 平６−247743（ＪＰ，Ａ) 特開 平１−219043（ＪＰ，Ａ) 特開 昭57−144666（ＪＰ，Ａ) 実開 平１−162233（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) C03C 15/00 - 23/00 ─────────────────────────────────────────────────── ─── Continuation of front page (56) Reference JP-A-54-69120 (JP, A) JP-A-6-247743 (JP, A) JP-A 1-219043 (JP, A) JP-A-57- 144666 (JP, A) Actual Kaihei 1-162233 (JP, U) (58) Fields investigated (Int.Cl. 7 , DB name) C03C 15/00-23/00
Claims (5)
表面粗さＲmaxを５〜５０μｍとしたのち、フッ酸溶液
で処理しマイクロクラックがなく、かつ表面粗さＲmax
が２０〜１００μｍとすることを特徴とする粗い表面を
有するシリカガラスの製造方法。1. A silica glass surface is sprayed with a hard powder material to have a surface roughness R max of 5 to 50 μm, and then treated with a hydrofluoric acid solution to prevent microcracks and has a surface roughness R max.
Is 20 to 100 μm, and a method for producing silica glass having a rough surface.
硬質粉状物を吹き付け表面粗さＲmaxを５〜２５μｍと
したのち、フッ酸溶液で処理し表面粗さＲmaxを２０〜
５０μｍとすることを特徴とする請求項１記載の粗い表
面を有するシリカガラスの製造方法。2. A silica glass surface is sprayed with a hard powder having a particle size of less than 150 μm to have a surface roughness R max of 5 to 25 μm, and then treated with a hydrofluoric acid solution to give a surface roughness R max of 20 to.
The method for producing silica glass having a rough surface according to claim 1, wherein the silica glass has a thickness of 50 μm.
ｍの硬質粉状物を吹き付け表面粗さＲmaxを２０〜５０
μｍとしたのち、フッ酸溶液で処理し表面粗さＲmaxを
５０〜１００μｍとすることを特徴とする請求項１記載
の粗い表面を有するシリカガラスの製造方法。3. A silica glass surface having a particle size of 150 to 500 .mu.m.
Spraying a hard powdery substance of m to obtain a surface roughness R max of 20 to 50
2. The surface roughness R max is set to 50 to 100 μm by treating with a hydrofluoric acid solution after setting the thickness to μm.
For producing silica glass having a rough surface.
とを特徴とする請求項１ないし３のいずれか１記載の粗
い表面を有するシリカガラスの製造方法。4. A method for producing a silica glass having a claims 1 to any one rough surface, wherein the 3, characterized in that the powder of the hard powder-like material is silicon carbide powder.
カガラスの製造方法で製造され、マイクロクラックがな
く、かつ表面粗さＲmaxが２０〜１００μｍであること
を特徴とする粗い表面を有するシリカガラス。5. A series according to any one of claims 1 to 4.
A silica glass having a rough surface characterized by having no microcracks and having a surface roughness R max of 20 to 100 μm, which is produced by a method for producing glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25963694A JP3473917B2 (en) | 1994-09-30 | 1994-09-30 | Silica glass having rough surface and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25963694A JP3473917B2 (en) | 1994-09-30 | 1994-09-30 | Silica glass having rough surface and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08104541A JPH08104541A (en) | 1996-04-23 |
| JP3473917B2 true JP3473917B2 (en) | 2003-12-08 |
Family
ID=17336819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25963694A Expired - Fee Related JP3473917B2 (en) | 1994-09-30 | 1994-09-30 | Silica glass having rough surface and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3473917B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3985243B2 (en) * | 1998-12-01 | 2007-10-03 | 信越石英株式会社 | Quartz glass jig having large irregularities on the surface and manufacturing method thereof |
| JP5058242B2 (en) * | 2000-03-21 | 2012-10-24 | シャープ株式会社 | Surface treatment method |
| JP2002047034A (en) * | 2000-07-31 | 2002-02-12 | Shinetsu Quartz Prod Co Ltd | Quarts glass jig for process device utilizing plasma |
| EP1310466A3 (en) | 2001-11-13 | 2003-10-22 | Tosoh Corporation | Quartz glass parts, ceramic parts and process of producing those |
| EP1352986B8 (en) * | 2002-04-04 | 2009-03-04 | Tosoh Corporation | Quartz glass thermal sprayed parts and method for producing the same |
| CN112939463B (en) * | 2021-04-07 | 2022-06-14 | 亚细亚建筑材料股份有限公司 | Anti-slip antifouling glaze |
-
1994
- 1994-09-30 JP JP25963694A patent/JP3473917B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08104541A (en) | 1996-04-23 |
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