JP3469662B2 - Liquid crystal display - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to a liquid crystal display device (LC
D: Liquid Crystal Display)
The present invention relates to an active matrix type liquid crystal display device using a thin film field effect transistor (TFT) of polycrystalline silicon (p-Si).

[0002]

2. Description of the Related Art LCDs have advantages such as small size, thin shape and low power consumption, and are being put to practical use in fields such as OA equipment and AV equipment. In particular, an active matrix LCD that uses TFTs as switching elements and can be driven by line-sequential scanning can theoretically perform static driving with a duty ratio of 100% in a multiplexed manner, and has a large screen and high contrast ratio. Used in video displays.

An active matrix LCD is a substrate (TFF) in which TFTs are connected to pixel electrodes arranged in a matrix.
A substrate) and a substrate having a common electrode (counter substrate) are attached to each other with a liquid crystal interposed therebetween, and a voltage is applied to each pixel capacitance forming each display pixel. The TFTs are simultaneously turned on for each scanning line to select the data signal input to the pixel electrode and to hold the voltage applied to the pixel capacitance by the OFF resistance until rewriting in the next field. is doing. The liquid crystal has electro-optical anisotropy and modulates the transmitted light according to the electric field formed by each pixel capacitance to produce a display image.

In recent years, as a TFT, p- has been formed on the channel layer.
There is one that uses Si, and high mobility is achieved,
The miniaturization of the size and the integrated mounting of the drive circuit have been realized. The miniaturization of the TFT leads to the expansion of the display area and a high aperture ratio can be obtained. Therefore, the TFT is particularly used for a light valve of a projector. For the purpose of further increasing the brightness, a light-shielding layer serving as a black matrix (BM) is provided with TF.
There is one that is built in on the array substrate side of T. That is, B
The aperture ratio is improved by regaining the loss of the display area due to the margin in consideration of the positional deviation at the time of bonding when M is formed on the counter substrate side.

With regard to such a structure, in particular, by devising a superimposing portion for scanning lines and signal lines to function as a BM, the BM on the counter substrate side is unnecessary or reduced to improve the aperture ratio. is there. FIG. 7 is a plan view of the conventional structure, and FIG. 8 is a sectional view taken along the line DD of FIG. A p-Si active layer (51) is formed on a substrate (50) made of heat-resistant quartz glass or the like, a non-doped channel layer (51n), and N-type highly doped source and drain regions ( 51s, 51d) are included. In addition, the first auxiliary capacitance electrode (5
1C) is formed integrally with the source region (51s). The entire surface covering these is covered with a gate insulating layer (52) formed by CVD or thermal oxidation, and a gate line (53) made of doped p-Si and a second auxiliary layer are formed on the gate insulating layer (52). An electrode (53C) is formed, and a part of the gate line (53) is formed on the channel layer (51C).
n) and is a gate electrode (53G). The first interlayer insulating layer (5
4) and Al is deposited on the first interlayer insulating layer (54).
Drain line (55) of the drain region (5) is formed through the contact hole (CT3) opened in the gate insulating layer (52) and the first interlayer insulating layer (54).
1d). A second interlayer insulating layer (56) is coated on the drain line (55) by CVD,
A pixel electrode (57) for driving a liquid crystal is formed of ITO on the second interlayer insulating layer (56), and a gate insulating layer (5) is formed.
2), it is connected to the source region (51s) through a contact hole (CT4) formed in the first interlayer insulating layer (54) and the second interlayer insulating layer (56). The pixel electrode (57) is arranged in a region surrounded by the gate line (53) and the drain line (55), has a drain line (55) and an overlapping portion, and also serves as a BM. With this configuration, on the drain line (55) side, the margin of the BM on the opposite substrate side in consideration of the bonding deviation is unnecessary, and the aperture ratio is improved.

FIG. 9 and FIG. 10 are cross-sectional structures of the overlapping portion of the pixel electrode (57) and the drain line (55).
It corresponds to the EE line part. As shown in FIG. 9, a minimum distance (L) is required between adjacent pixel electrodes (57) in order to prevent crosstalk due to a lateral electric field between the source and the source. The liquid crystal orientation is unstable in the peripheral portion due to the disturbance of the electric field, and it is necessary to shield the liquid crystal in this portion as well, and the overlapping portion with the drain line (55) having the width (L1) is required. But,
Such a superposed portion immediately becomes a parasitic capacitance between the source and the drain, which causes distortion of the drain signal and causes crosstalk and a reduction in the contrast ratio.

On the other hand, the structure of FIG. 10 eliminates such a problem, and the light shielding layer (58) is formed over the width (L1) below the peripheral edge of the pixel electrode (57).
As a result, the pixel electrode (57) and the drain line (5
The parasitic capacitance is reduced by reducing the overlapping portion width (L2) of 5).

[0008]

In the conventional structure shown in FIGS. 7, 8 and 9, the drain line (55) is replaced by the edge of the BM, and the sub BM on the opposite substrate side is made smaller, so that Aperture ratio has been realized. Further, as shown in FIG. 10, by additionally disposing a light shielding layer (58) on the periphery of the pixel electrode (57), a structure in which the parasitic capacitance between the source and drain is reduced becomes possible, and the deterioration of display quality is prevented. It is peeling. However, in this structure, the width of the drain line (55) is narrower than in the case of FIG. 9, and the resistance is increased. That is, the design of the drain wiring pattern is performed under the limitation that the line width is set to the minimum separation distance (L) or less, which causes signal delay due to wiring resistance.

The second insulating layer (56) for covering the drain line (55) is a base layer for the pixel electrode (57) and is made of SiNx or SiO2 formed by CVD. Although such a CVD film has good step coverage, the underlying shape appears on the surface as it is. In particular, since the drain line (55) is thickly formed to a film thickness of 5000 to 7,000 Å corresponding to the step of the base, the step is large and the pixel electrode (57) is raised. Further, since the width of the drain line (55) is made small, the film thickness must be further increased in order to suppress an increase in wiring resistance. If there is such a step,
The electric field is disturbed at the peripheral edge of the pixel electrode (57), the alignment of the liquid crystal becomes unstable, and the expansion of the display region is returned, resulting in a decrease in the contrast ratio. In addition, such a step causes a decrease in exposure accuracy during photoetching, and an increase in the parasitic capacitance due to the enlargement of the overlapping portion of the pixel electrode (57) and the drain line (55) or a decrease in the overlapping portion. This led to light leakage due to disappearance, and was a cause of display quality deterioration such as crosstalk and a decrease in contrast ratio.

[0010]

In order to achieve this object, the present invention firstly provides a signal to a liquid crystal driving pixel capacitor formed for each display pixel by sealing liquid crystal between a pair of electrode substrates. In a liquid crystal display device that modulates light by changing the orientation of the liquid crystal by applying a voltage, one of the pair of electrode substrates has a channel layer containing no impurities and both end portions of the channel layer on the substrate. An island-shaped polycrystalline semiconductor layer including a source region and a drain region containing impurities, a first insulating layer formed on the polycrystalline semiconductor layer, and the first insulating layer are formed. A gate line including a gate electrode formed on the substrate and disposed above the channel layer, a second insulating layer formed on the gate line, and the second insulating layer formed on the gate line. Before formed on the substrate A drain line having a connection portion with the drain region, a third insulating layer covering the drain line and having a flat surface, and the source region formed on the third insulating layer. And a pixel electrode forming one of the pixel capacitors.

Secondly, in the first structure, the third insulating layer is composed of an SOG film formed by spin coating and baking of a liquid material, or a multilayer film including the SOG film. Thirdly, in the second configuration, the SOG
The film was formed by performing spin coating and baking of the liquid material a plurality of times.

Fourthly, in the first structure, the third insulating layer is flattened by a CMP method utilizing a combined action of a chemical reaction by a polishing liquid and mechanical friction polishing. . Fifthly, in any one of the first to fourth configurations, the drain line is arranged at a peripheral position of the pixel electrode, and the pixel electrode is partially disposed on the drain line with the third insulating layer interposed therebetween. The drain line is thinned in a portion overlapping with the pixel electrode and overlapping with the pixel electrode.

Sixth, in any one of the first to fifth structures, the gate line is made of a polycrystalline silicon layer containing impurities and is formed so as to intersect the drain line at a peripheral position of the pixel electrode. The light shielding layer is formed in an island shape in the band of the edge line along the gate line of the pixel electrode.

[0014]

In the first structure, the flatness of the pixel electrode is improved by flattening the base layer of the pixel electrode.
As a result, it is possible to prevent the contrast ratio from being lowered due to the disordered alignment of the liquid crystal and to improve the display quality. Further, since the underlying layer is made flat, the alignment accuracy at the time of exposing the pixel electrode pattern is improved, so that the positional relationship between the pixel electrode and the electrode wiring can be finely adjusted, and the peripheral light is shielded, the aperture ratio is improved, and the parasitic capacitance is reduced. Is realized and the display quality is improved.

The SOG formed by the spin coating method as the third insulating layer covering the drain line in the second structure.
By using the film, the steps of the drain line layer and other wiring layers are alleviated or eliminated, and the base layer of the pixel electrode becomes flat. This improves the flatness of the pixel electrode. In the third configuration, the SOG film is formed in a plurality of times, so that the flatness and film quality of the third insulating layer are improved.

In the fourth structure, a polishing liquid and mechanical friction polishing are applied to the third insulating layer covering the drain line, and the surface is formed by the CMP method which eliminates unevenness by the combined action of chemical and mechanical. By planarizing, the steps of the drain line layer and other wiring layers are relaxed or eliminated, and the base layer of the pixel electrode is planarized. This allows
The flatness of the pixel electrode is improved.

In the fifth structure, by bringing the pixel electrode to the region overlapping the drain line, the display region is expanded to the drain line edge, the aperture ratio is improved, and the peripheral edge of the pixel electrode is shielded. As a result, the contrast ratio is improved. Further, by reducing the film thickness of the drain line in the overlapping portion with the pixel electrode, the step with the thick film portion produces the film thickness of the flattened third insulating layer, In addition, the parasitic capacitance between the source and drain is reduced. Further, since the underlying layer of the pixel electrode is flattened and the positional relationship between the pixel electrode and the drain line is controlled with high accuracy, the light shielding effect of the drain electrode on the peripheral edge of the pixel electrode and the overlapping of the drain line and the pixel electrode are achieved. The reduction of the parasitic capacitance in both parts is realized, and the deterioration of the display quality due to either problem can be prevented.

In the sixth structure, the light-shielding layer is formed on the peripheral edge of the pixel electrode on the gate line side, so that light leakage from the peripheral edge of the pixel electrode is blocked and the display quality is improved.

[0019]

EXAMPLES Next, the present invention will be described in detail based on examples. 1 is a plan view of a pixel portion of a liquid crystal display device according to a first embodiment of the present invention, FIG. 2 is a sectional view taken along the line AA of FIG. 1, and FIG. 3 is a sectional view taken along the line BB of FIG. FIG. 4 is a sectional view taken along line C-C in FIG. 1. First, 640 is formed on a transparent substrate (10) such as high heat resistant quartz glass.
SiH4 under high temperature and low pressure conditions of ℃ and 0.3 Torr
Alternatively, the active layer (11) of the TFT and the first auxiliary capacitance electrode (11C) are formed by stacking p-Si having a thickness of about 600Å by the low pressure CVD using Si2H6 as a material gas and patterning this by photoetching. Are formed. The active layer (11) and the first auxiliary capacitance electrode (11
HTO (High Temperture Oxide) on the entire surface that covers C)
That is, a film, that is, a high temperature and low pressure condition of about 880 ° C. and 0.8 Torr, which is formed by low pressure CVD using a mixed gas of SiH 2 Cl 2 and N 2 O as a material gas, is covered with SiO 2 having a thickness of 1000 Å, and a gate insulating layer It is said that. The first auxiliary capacitance electrode (11C) is an active layer (11).
The resist formed so as to cover the region is used as a mask to perform ion implantation of N-type impurities such as phosphorus, thereby doping the N + type and reducing the resistance.

On the gate insulating layer (12), the active layer (1
Similar to 1), p-Si film of about 3000 Å is formed by high temperature low pressure CVD, N + type is doped by low pressure CVD using POCl3 (phosphoryl trichloride) as a diffusion source, and patterned by photoetching. Thus, the gate line (13), the gate electrode (13G) and the second auxiliary capacitance electrode (13C) are formed. The second auxiliary capacitance electrode (13C) is connected between pixels along the direction of the gate line (13), and a common electrode voltage is applied. The second auxiliary capacitance electrode (13C) includes a gate insulating layer (1C) and a first auxiliary capacitance electrode (11C) to which a source voltage is applied.
2) is sandwiched in between and constitutes an auxiliary capacitance for holding charges. Source / drain regions (11s, 11d) are formed in the active layer (11) by ion implantation of N-type impurities such as phosphorus using the gate electrode (13G) as a mask, and a non-doped channel region ( 1
1n) has been formed.

Gate line (13), gate electrode (13
G) and the second auxiliary capacitance electrode (13C) are entirely covered with SiO2 by thermal CVD to form a first interlayer insulating layer (14). After opening a contact hole (CT1) in the gate insulating layer (12) and the first interlayer insulating layer (14) on the drain region (11d), Al is laminated to a thickness of 6000 to 7000Å by sputtering or the like, The main line (15M) of the drain line (15) is formed by etching, and is connected to the drain region (11d) through the contact hole (CT1). Furthermore, by sputtering Mo or Ti
Etc. are laminated in a thickness of about 1500 Å, and the main line (15M) is covered with a pattern larger than the main line (15M) by photoetching, and a sub line (15S) also serving as a BM is formed.

On the substrate (10) on which the drain line (15) is formed, as shown in FIG.
After the two films (1) are laminated to a thickness of about 1000 to 2000Å, SOG (spin-on-glass) solution is spin-coated and fired several times to form a film containing SiO2 as a main component, that is, an SOG film. (2) is formed. The SOG film is formed by spin coating a SOG solution prepared by dissolving a silicon compound RnSi (OH) 4-n and an additive in an organic solvent using a spinner, and performing heat treatment to promote evaporation of the solvent and dehydration / polymerization reaction. Inorganic SiO2 is produced. The SOG film has excellent surface flatness, and also in this embodiment, the drain line (15) is completely covered and the step is eliminated. Particularly, as in the present embodiment, the flatness and the film quality are further improved by performing the spin coating and the baking in a plurality of times. A SiNx film (3) is further formed on the SOG film (2) by CVD, and these SiO2 films are formed.
The film (1), the SOG film (2) and the SiNx film (3) are used as the second interlayer insulating layer (16).

The structure requiring such a high temperature process can be realized only in a liquid crystal display device using a highly heat-resistant quartz glass substrate and p-SiTFT. Also, S
Considering the heat resistance of the drain line (15) already formed of Al when firing the OG, the quality of the SOG film (2) deteriorates if the temperature is not raised. As a result, the SOG film (2) having poor film quality is used only for planarization, and the SiO2 film (1) and Si
Interlayer insulation is formed by the NX film (3), and insulation failure due to defects in the SOG film (2) is prevented.

After forming contact holes (CT2) in the gate insulating layer (12), the first interlayer insulating layer (14) and the second interlayer insulating layer (16) on the source region (11s), ITO sputtering is performed. Then, a pixel electrode (17) is formed by performing photoetching and is also connected to the source region (11s) through the contact hole (CT2). Since the pixel electrode (17) is formed on the flattened second interlayer insulating layer (16), high flatness is obtained. Further, Cr or the like is formed in an island shape in the band covering the edge along the gate line (13) on the pixel electrode (17) to form a light shielding layer (18).

As shown in FIGS. 1 and 3, the pixel electrode (1
7) is superimposed on the sub line (15S),
Close to the main line (15M). That is, the drain line (15) is a thick main line (15).
The main line (15M) has a narrower line width than the conventional one, and the sub line (15S) has a thin film thickness.
Moreover, the pixel electrode (17) is larger than the conventional one, and is expanded to the limit of the minimum separation distance (L) for preventing crosstalk with the adjacent pixel electrode (17), and the display area is located at the edge of the subline (15S). Has been expanded to
The sub-line (15S) has the width (L1) of the peripheral light-shielding region necessary for improving the contrast ratio and the pixel electrode (1
It is superimposed on 7) and functions as a BM. Further, the sub-line (15S) suppresses an increase in resistance due to the reduced line width of the may line (15M), compensates for conductivity, and is formed to have a thin film thickness, so that the sub-line (15S) and A step is obtained, which increases the distance from the pixel electrode (17) on the second interlayer insulating layer (16) which is flattened to cover the drain line (15) and reduces the parasitic capacitance. ing.

The positional relationship between the pixel electrode (17) and the may line (15M) and the sub line (15S) is improved in alignment accuracy by improving the flatness of the second interlayer insulating layer (16). It is improved, and control is possible within the range of alignment deviation of 1 μm or less. Therefore, crosstalk between the source and drain due to the deviation of the separation distance between the pixel electrode (17) and the may line (15M), and peripheral light shielding due to the deviation of the overlapping area of the pixel electrode (17) and the sub line (15S). Problems such as defects and increase in parasitic capacitance can be prevented.

Similarly, as shown in FIG. 4, the position of the light shielding layer (18) is also controlled with high precision even on the side of the gate line (13) side, and the minimum separation distance (L) and the peripheral light shielding width (L1) are obtained.
The pixel area (17) is expanded and the display area is expanded to the edge of the gate line (13). As a result, the sub-BM (not shown) that forms the main edge of the BM around the pixel electrode (17) together with the sub-line (15S) and is formed on the counter substrate side is reduced, and the aperture ratio is improved. . Since the pixel electrode (17) and the gate line (13) are separated with the first insulating layer (14) and the second insulating layer (16) interposed therebetween, the parasitic capacitance in the overlapping portion has no effect. There is no.

As a planarization of the second interlayer insulating layer (16), in addition to the use of the SOG film (2) described above, CMP (chem
ical mechanical polishing) method. That is, on the substrate on which the drain line (15) is formed, E
A SiO2 film is formed by CR-CVD, and mechanical polishing removal using a weak alkaline polishing liquid enhances polishing efficiency due to the combined effect of chemical reaction and mechanical friction, and planarizes. As a result, highly accurate flatness is obtained, and the unevenness of the pixel electrode (17) is eliminated.

In the present invention, the drain line (15)
The structure of is not limited to that described above. As another embodiment, as shown in FIG. 6, a structure in which a large pattern sub-line (25S) is formed in the lower layer and then a small pattern main line (25M) is formed in the upper layer is also possible.

[0030]

As is apparent from the above description, in the present invention, by flattening the underlayer of the pixel electrode, the step of the pixel electrode is eliminated in the structure in which the drain line replaces the black matrix. , The display quality was improved. The aperture ratio was improved by forming a step in the drain line, making the width of the thick portion smaller than the conventional line width, and expanding the pixel electrode in close proximity to this. Further, by overlapping the thin portion as a black matrix on the pixel electrode, the distance between the thinned portion and the pixel electrode on the flattened interlayer insulating layer is increased, and the parasitic capacitance is reduced.

[Brief description of drawings]

FIG. 1 is a plan view of a liquid crystal display device according to an embodiment of the present invention.

FIG. 2 is a sectional view taken along the line AA of FIG.

3 is a cross-sectional view taken along the line BB of FIG.

FIG. 4 is a cross-sectional view taken along the line CC of FIG.

FIG. 5 is a cross-sectional view of a second interlayer insulating layer.

FIG. 6 is a cross-sectional view of a liquid crystal display device according to another embodiment of the present invention.

FIG. 7 is a plan view of a conventional liquid crystal display device.

8 is a cross-sectional view taken along the line DD of FIG.

9 is a cross-sectional view taken along the line EE of FIG.

10 is a cross-sectional view taken along the line EE of FIG.

[Explanation of symbols]

1 SiO2 film 2 SOG film 3 SiNX film 10 Transparent substrate 11 p-Si active layer 12 Gate insulating layer 13,33 gate line 14 First interlayer insulating layer 15,25 drain line 15M, 25M main line 15S, 25S sub line 16 Second interlayer insulating layer 17 pixel electrodes 18 Light-shielding layer CT contact hole L Minimum distance L1 peripheral light-shielding width

─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. ⁷ , DB name) G02F 1/1368 G02F 1/1333 505 G02F 1/1343

Claims (5)

(57) [Claims] 1. A liquid crystal display in which a liquid crystal is sealed between a pair of electrode substrates and a signal voltage is applied to a pixel capacitance for driving a liquid crystal formed for each display pixel to change the orientation of the liquid crystal to modulate light. In the device, one of the pair of electrode substrates is an island-shaped polycrystal that includes a channel layer that does not contain impurities and source and drain regions that contain impurities at both ends of the channel layer. A semiconductor layer; a first insulating layer formed on the polycrystalline semiconductor layer; and a gate electrode formed on the substrate on which the first insulating layer is formed and arranged above the channel layer. A gate line, a second insulating layer formed on the gate line, a drain line formed on the substrate on which the second insulating layer is formed and having a connection portion with the drain region, and the drain line. A third insulating layer entirely formed surface is flattened over the down,
Ri consists pixel electrode constituting one of the pixel capacitor has a connection portion between the source region is formed on the insulating layer of the third,
The drain line is arranged in a peripheral position of the pixel electrode.
And the pixel electrodes are partially sandwiched by the third insulating layer.
The drain line is overlapped with the drain line and
The film thickness of the in is thin in the portion overlapping the pixel electrode.
A liquid crystal display device characterized by being provided . 2. The third insulating layer is an SOG film formed by spin coating and baking a liquid material, or the SOG film.
The liquid crystal display device according to claim 1, wherein the liquid crystal display device comprises a multilayer film including a G film. 3. The liquid crystal display device according to claim 2, wherein the SOG film is formed by performing spin coating and baking of a liquid material a plurality of times. 4. The CMP utilizing the combined action of a chemical reaction by a polishing liquid and mechanical friction polishing for the third insulating layer.
The liquid crystal display device according to claim 1, wherein the liquid crystal display device is flattened by a method. 5. The gate line contains impurities.
It consists of a polycrystalline silicon layer,
The pixel electrode is formed to intersect with the drain line.
The light-shielding layer is an island in the edge band along the gate line of
Claim 1 to claim 2 characterized in that it is formed in a shape
Item 5. The liquid crystal display device according to any one of items 4.