JP3467317B2 - Intaglio for printing - Google Patents

Intaglio for printing

Info

Publication number
JP3467317B2
JP3467317B2 JP14350194A JP14350194A JP3467317B2 JP 3467317 B2 JP3467317 B2 JP 3467317B2 JP 14350194 A JP14350194 A JP 14350194A JP 14350194 A JP14350194 A JP 14350194A JP 3467317 B2 JP3467317 B2 JP 3467317B2
Authority
JP
Japan
Prior art keywords
intaglio
substrate
etching
printing
etching resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP14350194A
Other languages
Japanese (ja)
Other versions
JPH082134A (en
Inventor
淳 越智
康彦 近藤
純 西林
毅 石丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Rubber Industries Ltd
Original Assignee
Sumitomo Rubber Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Rubber Industries Ltd filed Critical Sumitomo Rubber Industries Ltd
Priority to JP14350194A priority Critical patent/JP3467317B2/en
Publication of JPH082134A publication Critical patent/JPH082134A/en
Application granted granted Critical
Publication of JP3467317B2 publication Critical patent/JP3467317B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns

Description

【発明の詳細な説明】 【０００１】 【産業上の利用分野】本発明は、特にグラビアオフセッ
ト印刷による精密印刷に適した印刷用凹版に関するもの
である。 【０００２】 【従来の技術】パーソナルコンピュータ、電子式卓上計
算器、デジタル時計、テレビなどの電子機器に用いられ
る電子回路の回路基板や液晶カラーディスプレイのカラ
ーフィルターは、製造工程が少なく安価である印刷法を
用いて製造することが提案されている。その際、１００
μｍレベルの印刷精度が必要であるため、印刷パターン
の直線性が高くかつ微細な線幅や線間隔を再現すること
のできるグラビアオフセット印刷を使用する製造方法が
検討されている。 【０００３】グラビアオフセット印刷の製版工程は、基
板の表面へのエッチングレジストの形成、エッチングレ
ジスト上への印刷パターンの形成、印刷パターンに対応
した部位のエッチングレジストの除去、エッチングによ
る印刷パターンの凹部の形成、エッチングレジストの除
去からなる。グラビアオフセット印刷は、凹版へのイン
キの充填、凹版からオフセットブランケットへのインキ
の転写、オフセットブランケットから被印刷体へのイン
キの転写の各工程からなる。このうち、インキの充填の
際には、図２に示すように、凹版表面の余分のインキ４
をドクター刃５でＡ方向にかき取りながら、凹部内６に
インキ４を充填する、いわゆるドクタリングがある。 【０００４】 【発明が解決しようとする課題】凹版の基板にソーダラ
イムガラスなどの軟質のガラスを用いた場合は、微細な
印刷パターンでも精度よくエッチングすることができ、
さらに、図３に示すように、凹部の底面７がフラットで
エッジ部が尖った、シャープな形状になる。しかし、基
板１が軟質であるために、ドクタリング時に、図４に示
すように、凹版の上面８に傷９が入ったり、図５に示す
ように、凹部１０のエッジ部に欠け１１が生じたりす
る。 【０００５】そのため、版をエッチングする際のエッチ
ングレジストにクロム膜などの硬質の膜を用い、これを
エッチング後も除去せずに、図６に示すように、保護膜
１２として用いた場合、ドクター刃が直接触れる凹版の
上面１３は傷が生じにくくなるが、かえって凹部のエッ
ジ部１４には欠けが生じやすくなる。一方、グラビアオ
フセット印刷用凹版の基板に軟鋼、銅、黄銅または石英
ガラスや低アルカリガラスなどの硬質ガラスを用いた場
合は、ドクタリング時に前述のような傷やエッジ部の欠
けが生じにくくなるが、微細なパターンを精度よくエッ
チングすることが困難になり、さらに図７に示すよう
に、凹部の断面は底面１５が丸くなって、シャープさに
欠けた形状になり、さらに深さのばらつきも大きくな
る。 【０００６】本発明の目的は、上記の技術的課題を解決
し、微細なパターンを精度よく印刷でき、かつドクタリ
ングによって傷や欠けが生じず、耐久性が向上した印刷
用凹版を提供することである。 【０００７】 【課題を解決するための手段】前記の課題を解決するた
めの本発明の印刷用凹版は、印刷パターンの凹部の内表
面を含む軟質ガラス基板の表面に硬質の保護膜を形成し
たことを特徴とするものである。図１は、本発明の印刷
用凹版の一例を示す断面図であり、基板１の表面には印
刷パターンの凹部２が形成されており、この凹部２の内
表面を含む基板１の表面は硬質の保護膜３で被覆されて
いる。 【０００８】本発明における基板１には、エッジ部がシ
ャープで底面がフラットな凹部を得るために、例えばソ
ーダライムガラスなどの軟質ガラスが用いられる。硬質
の保護膜３としては、例えばクロム、アルミニウム、チ
タン、モリブデン、銅、金などの金属膜、ＴｉＣ、Ｔｉ
Ｎ、Ａｌ２Ｏ３、ＳｉＣ、ＭｏＳｉ、ＳｉＯ２、Ｓｉ３
Ｎ４、ＷＣなどのセラミックス、ダイアモンドなどが用
いられる。この保護膜は、ＣＶＤ（化学蒸着）やＰＶＤ
（物理蒸着）などによって形成することができる。保護
膜は、非常に薄い膜から厚い膜まで任意の厚さで形成で
きるが、ドクタリングに対する耐久性を向上させるうえ
で、５０Ａ以上、好ましくは１００〜１０，０００Ａの
厚みであればよい。 【０００９】本発明の印刷用凹版の製造は、まず、前記
の材料から選ばれる基板１の表面にエッチングレジスト
を形成する。エッチングレジストの材料としては、エッ
チングの腐食液に対して十分な耐性を有することが必要
で、腐食液の種類に応じてクロム、ノボラック系の樹
脂、ワックス（電子部材用）などを基板の表面に、通常
は０．０５〜０．５μｍの厚みで蒸着あるいは塗布され
る。 【００１０】エッチングレジストを形成した後、レーザ
ーの照射やフォトリソグラフィー法などによって印刷パ
ターンに対応した部位のレジストを除去し、基板表面に
印刷パターンを形成する。エッチングに使用する腐食液
は、通常、フッ酸を主成分とし、この他に硝酸、硫酸、
フッ化アンモニウムなどを含んだ混合水溶液などが用い
られる。腐食液の種類、腐食液の濃度、腐食時間、腐食
温度は、基板に形成する凹部の深さに応じて設定され
る。 【００１１】エッチング後、基板からエッチングレジス
トを除去し、凹部２の内表面を含む基板１の表面に前記
の材料から選ばれる硬質の保護膜３を形成する。 【００１２】 【作用】本発明の印刷用凹版は、凹部の内表面を含む基
板の表面に硬質の保護膜が形成されているために、ドク
タリング時に凹版の上面の傷および凹部のエッジ部の欠
けが生じにくくなり、耐久性が向上する。また、基板と
して軟質のガラスを用いることから、精度のよいエッチ
ングや深さのばらつきが小さいエッチングが可能とな
り、断面の形状がシャープな凹版を製造することができ
る。 【００１３】 【実施例】以下に本発明の凹版の実施例を示す。 実施例１ ソーダライムガラス基板の表面全体に厚さ１０００Ａの
クロム膜のエッチングレジストを形成し、このレジスト
上に１００μｍ幅のストライプパターンである印刷パタ
ーンをレーザー光を用いて形成した。次いで、腐食液と
してｐＨを１〜２に調整したフッ酸と硫酸の混合水溶液
を用い、２３℃に保った腐食液に前記の基板を１０分間
浸してエッチングを行い、ストライプパターンの凹部
（幅１２５μｍ、深さ８μｍ）を形成した。さらに、基
板の表面からエッチングレジストを除去し、凹部の内表
面を含む基板の表面全体に厚さ５０Ａのクロム膜を保護
膜として蒸着し、凹版を得た。 実施例２ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングを行い、ついで、基板の表面から
エッチングレジストを除去した。さらに、凹部の内表面
を含む基板の表面全体に厚さ１００Ａのクロム膜を蒸着
し、凹版を得た。 実施例３ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングを行い、ついで、基板の表面から
エッチングレジストを除去した。さらに、凹部の内表面
を含む基板の表面全体に厚さ１０００Ａのクロム膜を蒸
着し、凹版を得た。 実施例４ 実施例１と同様にして、ステンレス基板の表面全体にエ
ッチングレジストを形成し、印刷パターンを形成してか
らエッチングを行い、ついで、基板の表面からエッチン
グレジストを除去した。さらに、凹部の内表面を含む基
板の表面全体に厚さ１０００Ａのクロム膜を蒸着し、凹
版を得た。 実施例５ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングを行い、ついで、基板の表面から
エッチングレジストを除去した。さらに、凹部の内表面
を含む基板の表面全体に厚さ１０００Ａのアルミニウム
膜を蒸着し、凹版を得た。 実施例６ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングを行い、ついで、基板の表面から
エッチングレジストを除去した。さらに、凹部の内表面
を含む基板の表面全体に厚さ１０００Ａのチタン膜を蒸
着し、凹版を得た。 実施例７ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングを行い、ついで、基板の表面から
エッチングレジストを除去した。さらに、凹部の内表面
を含む基板の表面全体に厚さ１０００ＡのＴｉＣ膜を蒸
着し、凹版を得た。 実施例８ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングを行い、ついで、基板の表面から
エッチングレジストを除去した。さらに、凹部の内表面
を含む基板の表面全体に厚さ１０００ＡのＡｌ2 Ｏ3 膜
を蒸着し、凹版を得た。 比較例１ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングした。エッチング後、基板の表面
からエッチングレジストを除去して凹版を得た。 比較例２ 実施例１と同様にして、ソーダライムガラス基板の表面
全体にエッチングレジストを形成し、印刷パターンを形
成してからエッチングした。エッチング後、エッチング
レジストを除去せずに凹版を得た。 比較例３ 実施例１と同様にして、ステンレス基板の表面全体にエ
ッチングレジストを形成し、印刷パターンを形成してか
らエッチングした。エッチング後、基板の表面からエッ
チングレジストを除去して凹版を得た。 比較例４ 実施例１と同様にして、石英ガラス基板の表面全体にエ
ッチングレジストを形成し、印刷パターンを形成してか
らエッチングした。エッチング後、基板の表面からエッ
チングレジストを除去して凹版を得た。 比較例５ 実施例１と同様にして、低アルカリガラス基板の表面全
体にエッチングレジストを形成し、印刷パターンを形成
してからエッチングした。エッチング後、基板の表面か
らエッチングレジストを除去して凹版を得た。 【００１４】本発明の実施例および比較例において、凹
版の耐久性を調べるためにドクタリング試験を行った。
この試験のドクター刃にはスウェーデン鋼を用い、合計
１００００回のドクタリングのうち、１００回毎に凹版
の上面の傷および凹部のエッジ部の欠けを調べた。その
結果を実験条件とともに表１に示す。 【００１５】 【表１】【００１６】 断面の形状：◎；凹部の底面がフラット（図３） 〇；凹部の底面がやや丸い（図７） 凹版の損傷 回数：凹版に損傷が生じた時のドクタリン
グの回数 状況：「傷」とは凹版の上面の傷を意味する。（図４） 「欠け」とは凹部のエッジ部の欠けを意味する。（図
５） 「なし」とは１００００回のドクタリング後も目立った
損傷がないことを意味する。 【００１７】この試験結果より、本発明の凹版の保護膜
の厚みが１００Ａ以上の場合（実施例２〜８）は、凹版
の断面形状が良好で、１００００回のドクタリングを行
なっても凹版の損傷が見られなかった。一方、保護膜の
厚みが５０Ａである場合（実施例１）は、ドクタリング
回数が５００回において、凹版の上面に傷を生じた。し
かし、比較例１〜３の損傷発生回数と比較すると、凹版
の耐久性が大きく向上していることがわかる。 【００１８】 【発明の効果】本発明によれば、凹部の内表面を含む基
板の表面全体に硬質の保護膜を形成したため、ドクタリ
ングによる凹版の上面の傷や凹部のエッジの欠けの発生
を防止することができる。このため、凹版の耐久性が向
上し、微細なパターンの大量印刷に適する。 【００１９】また、基板にソーダライムガラスなどの軟
質ガラス材料を用いたために、精度のよいエッチングや
深さのばらつきの小さいエッチングが可能になり、シャ
ープな断面形状をもった凹版が製造できる。このため、
微細な線幅や線間隔をもつ印刷パターンを精度よくエッ
チングでき、従ってシャープなエッジからのインキ層の
転写がスムーズで、印刷においてパターンを精密に再現
することができる。 【００２０】以上のことから、本発明の印刷用凹版は、
グラビアオフセット印刷法による電子回路やカラーフィ
ルターなどの微細なパターンの印刷に特に好適に使用で
き、その工業的価値は極めて高い。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an intaglio printing plate particularly suitable for precision printing by gravure offset printing. 2. Description of the Related Art Circuit boards for electronic circuits and color filters for liquid crystal color displays used in electronic devices such as personal computers, electronic desk calculators, digital clocks, and televisions have a small number of manufacturing steps and are inexpensive. It has been proposed to manufacture using the method. At that time, 100
Since a printing accuracy on the order of μm is required, a manufacturing method using gravure offset printing that has high linearity of a printing pattern and can reproduce fine line widths and line intervals has been studied. The plate making process of gravure offset printing includes forming an etching resist on the surface of a substrate, forming a printing pattern on the etching resist, removing the etching resist at a portion corresponding to the printing pattern, and etching a concave portion of the printing pattern by etching. Formation and removal of the etching resist. Gravure offset printing includes the steps of filling an intaglio with ink, transferring ink from the intaglio to an offset blanket, and transferring ink from the offset blanket to a printing medium. Of these, when the ink is filled, as shown in FIG.
There is a so-called doctor ring in which the ink 4 is filled in the recess 6 while the doctor blade 5 scrapes in the direction A. [0004] When a soft glass such as soda lime glass is used for an intaglio substrate, even a fine print pattern can be etched accurately.
Further, as shown in FIG. 3, the bottom surface 7 of the concave portion has a flat shape with sharp edges and a sharp shape. However, since the substrate 1 is soft, a scratch 9 is made on the upper surface 8 of the intaglio as shown in FIG. 4 or a chip 11 is formed at the edge of the recess 10 as shown in FIG. Or For this reason, when a hard film such as a chromium film is used as an etching resist for etching a plate and is not removed even after etching, and is used as a protective film 12 as shown in FIG. Although the upper surface 13 of the intaglio that the blade directly touches is less likely to be scratched, the edge 14 of the recess is more likely to be chipped. On the other hand, when a mild glass, copper, brass or a hard glass such as quartz glass or low alkali glass is used for the substrate of the intaglio plate for gravure offset printing, the aforementioned scratches and chipping of the edge portion are less likely to occur during doctoring. In addition, it becomes difficult to accurately etch a fine pattern. Further, as shown in FIG. 7, the cross section of the concave portion has a rounded bottom surface 15, lacks sharpness, and has a large variation in depth. Become. SUMMARY OF THE INVENTION An object of the present invention is to provide an intaglio printing plate which solves the above-mentioned technical problems, can print a fine pattern with high accuracy, does not suffer from scratches or chipping due to doctoring, and has improved durability. It is. According to the present invention, there is provided an intaglio printing plate having a hard protective film formed on a surface of a soft glass substrate including an inner surface of a concave portion of a printing pattern. It is characterized by the following. FIG. 1 is a cross-sectional view showing an example of an intaglio printing plate according to the present invention, in which a concave portion 2 of a printed pattern is formed on the surface of a substrate 1, and the surface of the substrate 1 including the inner surface of the concave portion 2 is hard. Of the protective film 3. The substrate 1 according to the present invention has an edge portion
For the bottom to obtain a flat recess in Sharp, for example, a soft glass such as soda lime glass is used. As the hard protective film 3, for example, a metal film of chromium, aluminum, titanium, molybdenum, copper, gold, or the like, TiC, Ti
N, Al 2 O 3 , SiC, MoSi, SiO 2 , Si 3
Ceramics such as N 4 and WC, diamond and the like are used. This protective film is formed by CVD (chemical vapor deposition) or PVD.
(Physical vapor deposition) or the like. The protective film can be formed in any thickness from a very thin film to a thick film. However, in order to improve the durability against doctoring, the protective film may have a thickness of 50 A or more, preferably 100 to 10,000 A. In manufacturing the intaglio printing for printing of the present invention, first, an etching resist is formed on the surface of the substrate 1 selected from the above materials. The material of the etching resist must have sufficient resistance to the etching etchant, and chromium, novolak-based resin, wax (for electronic components), etc. should be applied to the surface of the substrate according to the type of the etchant. Usually, it is deposited or coated with a thickness of 0.05 to 0.5 μm. After forming the etching resist, the resist corresponding to the print pattern is removed by laser irradiation or photolithography to form a print pattern on the substrate surface. The etchant used for etching is usually composed mainly of hydrofluoric acid, and besides nitric acid, sulfuric acid,
A mixed aqueous solution containing ammonium fluoride or the like is used. The type of the etchant, the concentration of the etchant, the corrosion time, and the corrosion temperature are set according to the depth of the concave portion formed on the substrate. After the etching, the etching resist is removed from the substrate, and a hard protective film 3 selected from the above-mentioned materials is formed on the surface of the substrate 1 including the inner surface of the recess 2. In the intaglio printing for printing of the present invention, since a hard protective film is formed on the surface of the substrate including the inner surface of the indentation, scratches on the upper surface of the intaglio and edge portions of the indentation during doctoring. Chipping is less likely to occur and durability is improved. Further, since the use of glass soft as the substrate, the precision variation of good etching and depth enables small etching of, can the shape of the cross section producing a sharp intaglio. Examples of the intaglio printing of the present invention will be described below. Example 1 A 1000 A-thick chrome film etching resist was formed on the entire surface of a soda-lime glass substrate, and a 100 μm-wide striped printing pattern was formed on the resist using laser light. Then, using a mixed aqueous solution of hydrofluoric acid and sulfuric acid whose pH was adjusted to 1 to 2 as an etchant, the substrate was immersed in an etchant maintained at 23 ° C. for 10 minutes to perform etching. , 8 μm deep). Further, the etching resist was removed from the surface of the substrate, and a chromium film having a thickness of 50 A was deposited as a protective film on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Example 2 In the same manner as in Example 1, an etching resist was formed on the entire surface of a soda lime glass substrate, a printing pattern was formed, etching was performed, and then the etching resist was removed from the surface of the substrate. Further, a chromium film having a thickness of 100 A was deposited on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Example 3 In the same manner as in Example 1, an etching resist was formed on the entire surface of a soda lime glass substrate, a printing pattern was formed, etching was performed, and then the etching resist was removed from the surface of the substrate. Further, a chrome film having a thickness of 1000 A was deposited on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Example 4 In the same manner as in Example 1, an etching resist was formed on the entire surface of a stainless steel substrate, a printing pattern was formed, etching was performed, and then the etching resist was removed from the surface of the substrate. Further, a chrome film having a thickness of 1000 A was deposited on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Example 5 In the same manner as in Example 1, an etching resist was formed on the entire surface of a soda-lime glass substrate, a printing pattern was formed, etching was performed, and then the etching resist was removed from the surface of the substrate. Further, an aluminum film having a thickness of 1000 A was deposited on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Example 6 In the same manner as in Example 1, an etching resist was formed on the entire surface of the soda-lime glass substrate, a printing pattern was formed, etching was performed, and then the etching resist was removed from the surface of the substrate. Further, a titanium film having a thickness of 1000 A was deposited on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Example 7 In the same manner as in Example 1, an etching resist was formed on the entire surface of a soda-lime glass substrate, a printing pattern was formed, etching was performed, and then the etching resist was removed from the surface of the substrate. Further, a TiC film having a thickness of 1000 A was deposited on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Example 8 In the same manner as in Example 1, an etching resist was formed on the entire surface of a soda-lime glass substrate, a printing pattern was formed, etching was performed, and then the etching resist was removed from the surface of the substrate. Further, an Al 2 O 3 film having a thickness of 1000 A was deposited on the entire surface of the substrate including the inner surface of the concave portion to obtain an intaglio plate. Comparative Example 1 In the same manner as in Example 1, an etching resist was formed on the entire surface of the soda-lime glass substrate, and a printed pattern was formed, and then etching was performed. After the etching, the etching resist was removed from the surface of the substrate to obtain an intaglio. Comparative Example 2 In the same manner as in Example 1, an etching resist was formed on the entire surface of the soda-lime glass substrate, and a printed pattern was formed, and then etching was performed. After the etching, an intaglio was obtained without removing the etching resist. Comparative Example 3 In the same manner as in Example 1, an etching resist was formed on the entire surface of the stainless steel substrate, a print pattern was formed, and etching was performed. After the etching, the etching resist was removed from the surface of the substrate to obtain an intaglio. Comparative Example 4 In the same manner as in Example 1, an etching resist was formed on the entire surface of the quartz glass substrate, and after a printing pattern was formed, etching was performed. After the etching, the etching resist was removed from the surface of the substrate to obtain an intaglio. Comparative Example 5 In the same manner as in Example 1, an etching resist was formed on the entire surface of a low-alkali glass substrate, and a printing pattern was formed, and then etching was performed. After the etching, the etching resist was removed from the surface of the substrate to obtain an intaglio. In Examples and Comparative Examples of the present invention, a doctoring test was performed to examine the durability of the intaglio.
Swedish steel was used as the doctor blade in this test, and out of a total of 10,000 doctor rings, scratches on the upper surface of the intaglio and chipping of the edge of the concave portion were examined every 100 times. The results are shown in Table 1 together with the experimental conditions. [Table 1] Cross-sectional shape: ◎; the bottom of the recess is flat (FIG. 3); 〇; the bottom of the recess is slightly round (FIG. 7). Damage to the intaglio: The number of times of doctoring when the intaglio is damaged: “ "Scratch" means a scratch on the upper surface of the intaglio. (FIG. 4) "Chip" means chipping at the edge of the recess. (Fig. 5) "None" means that there is no noticeable damage even after 10,000 times of doctoring. According to the test results, when the thickness of the protective film of the intaglio of the present invention is 100 A or more (Examples 2 to 8), the cross-sectional shape of the intaglio is good, and even if doctoring is performed 10,000 times, No damage was seen. On the other hand, when the thickness of the protective film was 50 A (Example 1), the number of doctoring times was 500, and the upper surface of the intaglio was damaged. However, when compared with the number of times of occurrence of damage in Comparative Examples 1 to 3, it can be seen that the durability of the intaglio is greatly improved. According to the present invention, since a hard protective film is formed on the entire surface of the substrate including the inner surface of the concave portion, scratches on the upper surface of the intaglio plate due to doctor ring and chipping of the edge of the concave portion are prevented. Can be prevented. For this reason, the durability of the intaglio plate is improved, and it is suitable for mass printing of fine patterns. Further, since a soft glass material such as soda lime glass is used for the substrate, accurate etching and etching with a small variation in depth can be performed, and an intaglio having a sharp sectional shape can be manufactured. For this reason,
A print pattern having a fine line width or line interval can be etched with high precision, and therefore, the transfer of the ink layer from a sharp edge can be smoothly performed, and the pattern can be accurately reproduced in printing. From the above, the intaglio printing for printing of the present invention is:
It can be particularly suitably used for printing fine patterns such as electronic circuits and color filters by the gravure offset printing method, and its industrial value is extremely high.

【図面の簡単な説明】 【図１】本発明の印刷用凹版の一例を示す断面図であ
る。 【図２】グラビアオフセット印刷のドクタリング工程の
模式図である。 【図３】通常の軟質ガラス基板を用いた従来の凹版の断
面図である。 【図４】ドクタリング後の凹版の上面の傷を示す破断斜
視図である。 【図５】ドクタリング後の凹部のエッジ部の欠けを示す
破断斜視図である。 【図６】基板の上面にのみ保護膜を有する従来の凹版の
断面図である。 【図７】硬質の基板を用いた従来の凹版の断面図であ
る。 【符号の説明】 １─基板 ２─凹部 ３─保護膜BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing an example of a printing intaglio according to the present invention. FIG. 2 is a schematic view of a doctoring step of gravure offset printing. FIG. 3 is a cross-sectional view of a conventional intaglio using a normal soft glass substrate. FIG. 4 is a cutaway perspective view showing scratches on the upper surface of the intaglio after doctoring. FIG. 5 is a cutaway perspective view showing chipping of an edge portion of a concave portion after doctoring. FIG. 6 is a cross-sectional view of a conventional intaglio having a protective film only on the upper surface of a substrate. FIG. 7 is a cross-sectional view of a conventional intaglio using a hard substrate. [Description of Signs] 1 {substrate 2} recess 3} protective film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 石丸 毅 兵庫県明石市魚住町清水41番地の１ 住 友ゴム魚住寮 (56)参考文献 特開 昭60−101538（ＪＰ，Ａ) 特開 昭56−46753（ＪＰ，Ａ) 特開 平４−201563（ＪＰ，Ａ) 特開 平７−319152（ＪＰ，Ａ) 特開 平７−253660（ＪＰ，Ａ) 特開 平６−305270（ＪＰ，Ａ) 特開 平６−179257（ＪＰ，Ａ) 特開 平５−57867（ＪＰ，Ａ) 特開 平５−139065（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) B41N 1/12 B41C 1/00 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Takeshi Ishimaru 41-1, Shimizu, Uozumi-cho, Akashi-shi, Hyogo Prefecture Sumitomo Rubber Fish House (56) References JP-A-60-101538 (JP, A) JP-A Sho56 JP-A-46753 (JP, A) JP-A-4-201563 (JP, A) JP-A-7-319152 (JP, A) JP-A-7-253660 (JP, A) JP-A-6-305270 (JP, A) JP-A-6-179257 (JP, A) JP-A-5-57867 (JP, A) JP-A-5-139065 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) B41N 1/12 B41C 1/00

Claims (1)

(57)【特許請求の範囲】 【請求項１】印刷パターンの凹部の内表面を含む軟質ガ
ラス基板の表面に硬質の保護膜を形成したことを特徴と
する印刷用凹版。(57) [Claim 1] A soft gas including an inner surface of a concave portion of a print pattern.
Intaglio, characterized in that the protective film is formed of a rigid surface of the glass substrate.
JP14350194A 1994-06-24 1994-06-24 Intaglio for printing Expired - Fee Related JP3467317B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14350194A JP3467317B2 (en) 1994-06-24 1994-06-24 Intaglio for printing

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Application Number Priority Date Filing Date Title
JP14350194A JP3467317B2 (en) 1994-06-24 1994-06-24 Intaglio for printing

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Publication Number Publication Date
JPH082134A JPH082134A (en) 1996-01-09
JP3467317B2 true JP3467317B2 (en) 2003-11-17

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JP (1) JP3467317B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1908599A1 (en) * 2005-07-25 2008-04-09 Think Laboratory Co., Ltd. Gravure platemaking roll and process for producing the same
JPWO2007132734A1 (en) * 2006-05-11 2009-09-24 株式会社シンク・ラボラトリー Gravure plate making roll and method for producing the same
WO2007132755A1 (en) * 2006-05-16 2007-11-22 Think Laboratory Co., Ltd. Gravure roll and process for producing the same
JP2009045817A (en) * 2007-08-20 2009-03-05 Shineisha:Kk Intaglio, and manufacturing method for intaglio

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