JP2502852B2 - Intaglio and its manufacturing method - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an intaglio printing plate capable of forming a fine pattern such as a color filter or a transparent electrode of a liquid crystal display by an intaglio printing method and a method for producing the same.

[0002]

2. Description of the Related Art In recent years, in the field of electronics such as color filters for liquid crystals, a printing method which is inferior to photolithography in pattern accuracy but can form a large area pattern at a low cost has been attracting attention.

Printing methods include intaglio printing (commonly called gravure), lithographic printing (commonly called offset printing), letterpress printing (commonly called letterpress) and stencil printing (commonly called screen).
One is the mainstream. The present invention relates to an intaglio printing plate capable of thick film printing and fine pattern printing, and a method for manufacturing the same.

Generally, in intaglio printing, a chrome-plated metal cylinder plate (plate cylinder) is used, printing ink is supplied onto the cylinder plate, the ink on the plate surface is scraped off by a doctor blade, and finally, There is used a method of printing by directly transferring the ink of the concave portions to the printing medium, or a method of using a flat intaglio plate as a printing plate and performing offset printing on the printing medium via a blanket. A method of using a plane intaglio plate as a plate and printing on a printing medium via a blanket is also used. A method of using a plane intaglio plate as a plate and printing on a printing medium via a blanket is also used. For example, there is Mikiya Shimada and others PCM 90-24 of the Institute of Electronics, Information and Communication Engineers.

[0005]

However, in a printing method such as lithographic printing or intaglio printing, the equipment is simple and the number of steps is small, and a large area pattern can be easily formed. On the other hand, the intaglio was produced by wet etching. It was difficult to manufacture an intaglio plate having a narrow opening and a deep groove. Further, in wet etching, the bottom of the recess becomes shallower as it approaches the end of the recess, and the ink filled in the shallow part of the recess is less likely to be transferred, resulting in uneven transfer. Had a problem that it was difficult.

SUMMARY OF THE INVENTION In view of the above problems, it is an object of the present invention to provide an intaglio plate for performing intaglio printing of a fine line width pattern of 25 μm or less or a pattern having a space of 25 μm or less, and a manufacturing method thereof.

[0007]

In order to achieve this object, the present invention provides Si such as quartz glass or borosilicate glass.
An intaglio plate in which a recess is formed by reactive ion etching (hereinafter abbreviated as RIE) in glass having an O ₂ composition of 80 wt% or more is used. RIE discharges and excites a reactive gas, the generated active species chemically reacts with the constituent atoms of the substrate / thin film to be vaporized, and the generated ions are accelerated in the cathode fall region to generate the substrate / substrate. By striking atoms by colliding with the thin film, the substrate and thin film can be etched with high precision. For example, precision machinery vol. 5
1, No. 7, p26, 1985.

[0008]

By forming the recesses by RIE in the glass having the composition of SiO ₂ of 80 wt% or more, it is possible to manufacture an intaglio plate having sharp recesses with sharp edges and narrow openings. Glass having a composition of SiO ₂ of 80 wt% or more has a high etching rate by RIE, and an intaglio plate having sharp edges can be easily manufactured.

Further, when the edge of the concave portion is sharp, when the ink is transferred from the intaglio plate to the transfer target or the blanket, the plate portion of the edge portion of the ink pattern is smoothly separated, and the pattern accuracy is improved. It enables printing of fine patterns.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of an intaglio according to an embodiment of the present invention. Further, FIG. 2 is a sectional view of a concave portion of an intaglio plate manufactured by conventional wet etching.

(First Embodiment) A first embodiment of the present invention will be described below. Al having a thickness of 0.5 μm is vapor-deposited on quartz glass, and a photoresist (AZ4620A manufactured by Hoechst Japan) is applied on the Al. Next, exposure is performed using a photomask. After developing the photoresist with a developing solution, Al is etched to form a pattern. On the quartz glass on which the photoresist and Al pattern are formed,
RIE using CF ₄ gas with a line width of 20 μm and a depth of 1
A 0 μm linear recess was formed. Next, intaglio offset printing was carried out using the intaglio plate of this example to obtain 20 μm.
It was possible to print an m-line width line with an accuracy within ± 1.5 μm.

As the RIE mask, Al and a photoresist are laminated and used, but the material used for the mask may be any as long as it has a selective ratio with respect to the glass to be etched, such as Cr, Al ₂ O ₃ and WSi. Etc. may be used as a mask. Further, in order to form a recess having a depth of 10 μm or more, when the RIE is performed using the above-described laminated Al and photoresist mask, the photoresist is RI.
RIE when Al is exposed on the surface after being removed by E
Then, the photoresist is coated again on the exposed Al surface, the photoresist is exposed from the quartz glass side using Al on the quartz glass as a photomask, the photoresist is developed with a developing solution, and then RIE is performed again. . By repeating this photoresist formation and RIE, 10 μm
It is also possible to form a recess having the above depth. Also, RI
In addition to CF ₄ , the gas used for E is CHF ₃ gas or CHF ₃ gas.
Such as O ₂ and a mixed gas of He may be used.

(Second Embodiment) A second embodiment of the present invention will be described below. A resist was formed on quartz glass by the same method as in Example 1, and RIE was performed to obtain a pitch of 360 μm and a pitch of 340 μm.
A concave portion having a line width stripe pattern was formed with a depth of 10 μm. Next, when intaglio offset printing was performed using the intaglio plate of this example, it was possible to print a line with a line width of 340 μm with a space of 20 μm between the lines and with an accuracy within ± 1.5 μm.

(Comparative Example) (Table 1) shows S of various glass materials.
The relative values of the composition of iO ₂ and the etching rate when RIE is performed are shown. Soda lime glass having a SiO ₂ composition of less than 80 wt% or low alkali glass had a low etching rate and was not suitable as a material for producing an intaglio plate.

[0015]

[Table 1]

[0016]

As described above, the present invention provides an intaglio plate having a recess with a sharp edge, a narrow opening, and a deep groove by forming a recess by RIE on glass having a composition of SiO ₂ of 80 wt% or more. Can be made. When the edge of the concave portion is sharp, when the ink is transferred from the intaglio plate to the transfer target or the blanket, the edge portion of the ink pattern is smoothly separated from the plate, and the pattern accuracy is improved. As a result, fine line width patterns of 25 μm or less and 25
A pattern having a space of μm or less can be printed.

[Brief description of drawings]

FIG. 1 is a sectional view of a concave portion of an intaglio plate according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view of a recess of an intaglio prepared by conventional wet etching.

[Explanation of symbols]

 1 intaglio 2 recess

Claims (2)

(57) [Claims] 1. An intaglio odor used for intaglio offset printing.
Then, for the glass whose SiO ₂ composition is 80 wt% or more ,
An intaglio plate having a recess formed by reactive ion etching . 2. An intaglio odor used for intaglio offset printing.
Glass with a SiO ₂ composition of 80 wt% or more,
The process of forming recesses by reactive ion etching
A method of manufacturing an intaglio, comprising :