JP3466673B2 - Vacuum furnace with movable heat reflector - Google Patents

Vacuum furnace with movable heat reflector

Info

Publication number
JP3466673B2
JP3466673B2 JP23804493A JP23804493A JP3466673B2 JP 3466673 B2 JP3466673 B2 JP 3466673B2 JP 23804493 A JP23804493 A JP 23804493A JP 23804493 A JP23804493 A JP 23804493A JP 3466673 B2 JP3466673 B2 JP 3466673B2
Authority
JP
Japan
Prior art keywords
heating
temperature
heat
vacuum furnace
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP23804493A
Other languages
Japanese (ja)
Other versions
JPH0791863A (en
Inventor
真 本田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokai Konetsu Kogyo Co Ltd
Original Assignee
Tokai Konetsu Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokai Konetsu Kogyo Co Ltd filed Critical Tokai Konetsu Kogyo Co Ltd
Priority to JP23804493A priority Critical patent/JP3466673B2/en
Publication of JPH0791863A publication Critical patent/JPH0791863A/en
Application granted granted Critical
Publication of JP3466673B2 publication Critical patent/JP3466673B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高温で熱処理する金属
やセラミックス等焼成用の可動熱反射板付真空炉に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum furnace with a movable heat reflection plate for burning metal or ceramics which is heat-treated at high temperature.

【0002】[0002]

【従来技術】従来、図2に示すように金属発熱体1、2
及び断熱材3から構成される真空炉は、対流による炉内
上下方向温度差をほとんど生じない。しかし、真空炉の
場合、炉内の処理品は、主として輻射伝熱によって加熱
されるため主に断熱材の構成によって、炉内の温度差が
決定される。そのため処理品加熱用の炉内の加熱処理部
4の温度差は、金属発熱体であるヒータの配列、即ち加
熱処理部の周方向全体に渡って上下方向に設置するヒー
タ1と、加熱処理部の底面全体に渡って設置するヒータ
2とによって調整している。さらに、配列したヒータ
1、2それぞれの発熱量をそれぞれサイリスタ5、6に
よって電力配分を制御することによって調整している。
この方法では、ヒータの配列や電力の配分を今までの実
績、経験によって決定するため、温度差はその範囲で固
定化してしまい、処理品によって定まる所望の温度差を
得ることは困難である。すなわち、従来の技術では、主
に炉構造により温度差が決定されるため、炉の柔軟性に
欠けるという問題があった。
2. Description of the Related Art Conventionally, as shown in FIG.
The vacuum furnace composed of the heat insulating material 3 and the heat insulating material 3 causes almost no temperature difference in the vertical direction in the furnace due to convection. However, in the case of a vacuum furnace, the processed product in the furnace is heated mainly by radiant heat transfer, so that the temperature difference in the furnace is mainly determined by the structure of the heat insulating material. Therefore, the temperature difference of the heat treatment unit 4 in the furnace for heating the processed product is the arrangement of the heaters that are metal heating elements, that is, the heater 1 installed vertically in the entire circumferential direction of the heat treatment unit and the heat treatment unit. It is adjusted by the heater 2 installed over the entire bottom surface of the. Further, the heat generation amounts of the arranged heaters 1 and 2 are adjusted by controlling the power distribution by the thyristors 5 and 6, respectively.
In this method, since the arrangement of the heaters and the distribution of the electric power are determined based on the past experience and experience, the temperature difference is fixed within that range, and it is difficult to obtain a desired temperature difference determined by the processed product. That is, in the conventional technique, since the temperature difference is mainly determined by the furnace structure, there is a problem that the furnace lacks flexibility.

【0003】[0003]

【発明が解決しようとする課題】一方、処理品に対する
焼成条件、特に温度差条件は、近年厳しくなっており、
炉内の温度差の高精度化が要求されるようになった。さ
らに、処理品の多品種化により、1つの炉で異なる熱処
理をする機会が増えており、1つの炉に所望の温度差が
種々要求されるようになった。本発明の目的は、かかる
課題を解決すべく、処理品を加熱処理するための加熱処
理部に所望の温度差を得ることができる真空炉を提供す
ることにある。
On the other hand, firing conditions for treated products, especially temperature difference conditions, have become severe in recent years.
It has become necessary to improve the accuracy of the temperature difference inside the furnace. Furthermore, due to the increase in the number of products to be processed, the number of opportunities to perform different heat treatments in one furnace has increased, and various desired temperature differences have been required for one furnace. An object of the present invention is to provide a vacuum furnace capable of obtaining a desired temperature difference in a heat treatment section for heat treatment of a treated product in order to solve such a problem.

【0004】[0004]

【課題を解決するための手段】そこで、かかる目的を達
成すべく本発明にあっては、被加熱物を加熱処理するた
めの加熱処理部を有する、断熱材によって包囲された加
熱室と、該加熱室内部の周方向全体に渡って上下方向に
設置された第1加熱体と、該第1加熱体の加熱量を制御
するための第1制御手段とを有する真空炉において、前
記加熱室内に設置された、前記加熱処理部の上部で上下
に移動可能な可動熱反射板と、前記可動熱反射板の上下
移動量を制御するための移動量制御手段とを設けたこと
を特徴とする真空炉を提供する。又、本発明の構成にお
いて、上記真空炉は、上記加熱室の底面に設置された第
2加熱体と、該第2加熱体の加熱量を制御するための第
2制御手段とをさらに有し、上記第1加熱体の加熱量と
上記第2加熱体の加熱量とを別々に制御するものであっ
てもよい。又、本発明の好ましい実施態様によれば、上
記第1制御手段は、上記加熱処理部の上下方向に複数の
温度検出手段を有するものであってもよい。
In order to achieve such an object, the present invention provides a heating chamber surrounded by a heat insulating material, which has a heat treatment section for heat treating an object to be heated; In a vacuum furnace having a first heating body installed in the vertical direction over the entire circumferential direction of the inside of the heating chamber, and a first control means for controlling the heating amount of the first heating body, in a heating chamber A vacuum characterized in that a movable heat reflection plate that is vertically movable above the heat treatment unit and a movement amount control means for controlling the vertical movement amount of the movable heat reflection plate are provided. Provide a furnace. Further, in the configuration of the present invention, the vacuum furnace further includes a second heating body installed on a bottom surface of the heating chamber, and a second control means for controlling a heating amount of the second heating body. The heating amount of the first heating body and the heating amount of the second heating body may be separately controlled. According to a preferred embodiment of the present invention, the first control means may have a plurality of temperature detection means in the vertical direction of the heat treatment section.

【0005】[0005]

【作用】第1制御手段によって第1加熱体の加熱量を制
御して、断熱材によって包囲された加熱室の温度を定常
状態にし、加熱室内に設置された可動熱反射板の上下方
向移動量を移動量制御手段によって加熱処理部の上部で
制御することによって、可動熱反射板による輻射熱を増
減させ、加熱処理部の上下方向に所望の温度差を得るこ
とができる。さらに、加熱室の底面に設置された第2加
熱体と、該第2加熱体の加熱量を制御するための第2制
御手段とをさらに有する真空炉を用いて、前記第1加熱
体の加熱量と上記第2加熱体の加熱量とを別々に制御す
ることによって、加熱処理部の上下方向に所望の温度差
をさらに確実に得ることができる。
The heating amount of the first heating element is controlled by the first control means to bring the temperature of the heating chamber surrounded by the heat insulating material to a steady state, and the amount of vertical movement of the movable heat reflection plate installed in the heating chamber. Is controlled above the heat treatment section by the movement amount control means, the radiant heat from the movable heat reflection plate can be increased or decreased to obtain a desired temperature difference in the vertical direction of the heat treatment section. Furthermore, the heating of the first heating body is performed by using a vacuum furnace further including a second heating body installed on the bottom surface of the heating chamber and a second control means for controlling the heating amount of the second heating body. By separately controlling the amount and the heating amount of the second heating element, a desired temperature difference in the vertical direction of the heat treatment section can be obtained more reliably.

【0006】[0006]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1で、10は真空炉で、真空炉10は、円筒胴
11と上蓋12と下蓋13とを有し、上蓋12と下蓋1
3は、それぞれフランジ部でボルト等の締結手段(図示
せず)によって円筒胴11に締結され、内部の気密性が
確保される。真空炉10の内部には、断熱材14によっ
て取り囲まれた加熱室15を有し、加熱室15の内部に
は、処理品を加熱処理するための加熱処理部16があ
る。加熱室15の内部の周方向全体に渡って、上下方向
に側面加熱ヒータ17が設置されており、この側面加熱
ヒータ17は、側面加熱ヒータサイリスタ18を介して
温調計19に接続されている。加熱室15の底面全体に
は、底面加熱ヒータ20が設置されており、この底面加
熱ヒータ20は、側面加熱ヒータ17と同様に底面加熱
ヒータサイリスタ21を介して温調計19に接続されて
いる。加熱処理部16の上下方向略中央レベルには、制
御用熱電対22が設置されており、加熱処理部16の温
度を検出するようになっている。この制御用熱電対22
は、温調計19に接続され、加熱処理部16が所望の温
度の定常状態に達するように各サイリスタ18、21に
よって側面加熱ヒータ17及び底面加熱ヒータ20の発
熱量を制御するようになっている。
Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, 10 is a vacuum furnace, and the vacuum furnace 10 has a cylindrical body 11, an upper lid 12 and a lower lid 13, and an upper lid 12 and a lower lid 1
Each of the flanges 3 is fastened to the cylindrical body 11 by a fastening means (not shown) such as a bolt at the flange portion, so that the airtightness inside is secured. Inside the vacuum furnace 10, there is a heating chamber 15 surrounded by a heat insulating material 14, and inside the heating chamber 15, there is a heat treatment section 16 for heat-treating a treated product. A side surface heater 17 is installed in the up-down direction over the entire circumferential direction inside the heating chamber 15, and the side surface heater 17 is connected to a temperature controller 19 via a side surface heater thyristor 18. . A bottom surface heater 20 is installed on the entire bottom surface of the heating chamber 15, and this bottom surface heater 20 is connected to a temperature controller 19 via a bottom surface heater thyristor 21 like the side surface heater 17. . A thermocouple 22 for control is installed at a substantially central level in the vertical direction of the heat treatment section 16 so as to detect the temperature of the heat treatment section 16. This control thermocouple 22
Is connected to a temperature controller 19, and the heat generation amounts of the side surface heater 17 and the bottom surface heater 20 are controlled by the thyristors 18 and 21 so that the heat treatment section 16 reaches a steady state of a desired temperature. There is.

【0007】又、加熱処理部16の頂部、底部及び中央
部の3か所には、測温用熱電対(上)23a、測温用熱
電対(中)23b、測温用熱電対(下)23cが設置さ
れており、定常状態に達した加熱処理部16の温度に発
生する上下方向の温度差を検出できるようになってい
る。これらの測温用熱電対はそれぞれ、演算器24に接
続され、測温用熱電対(上)23aと測温用熱電対
(中)23bによる温度差、測温用熱電対(中)23b
と測温用熱電対(下)23cによる温度差を演算するよ
うになっている。演算器24は、温調計19及び以下で
説明する可動熱反射板25の移動量制御器26に接続さ
れており、演算した温度差によって側面加熱ヒータ17
及び底面加熱ヒータ20の発熱量及び可動熱反射板25
の移動量を制御する構成になっている。加熱室15の上
部には、加熱室15の底部に平行な、モリブデン製の可
動熱反射板25が設置されている。可動熱反射板25の
下面、即ち加熱室15の底面に対向した面は、熱を反射
できるような輻射率、好ましくは0.25以下を有する。可
動熱反射板25は、移動量制御器26に連結されてお
り、加熱室15の頂部から加熱処理部16の上部の範囲
内で加熱室15内を上下方向に移動できるようになって
いる。
Further, at three points of the top, bottom and center of the heat treatment section 16, a thermocouple for temperature measurement (upper) 23a, a thermocouple for temperature measurement (middle) 23b, a thermocouple for temperature measurement (lower) ) 23c is installed so that it is possible to detect the temperature difference in the vertical direction that occurs in the temperature of the heat treatment unit 16 that has reached a steady state. These temperature-measuring thermocouples are respectively connected to the calculator 24, and the temperature difference between the temperature-measuring thermocouple (upper) 23a and the temperature-measuring thermocouple (middle) 23b, the temperature-measuring thermocouple (middle) 23b.
And the temperature difference due to the temperature measuring thermocouple (lower) 23c is calculated. The calculator 24 is connected to the temperature controller 19 and a movement amount controller 26 of the movable heat reflection plate 25, which will be described below, and the side surface heater 17 is controlled by the calculated temperature difference.
And heat generation amount of bottom heater 20 and movable heat reflection plate 25
It is configured to control the movement amount of. A movable heat reflection plate 25 made of molybdenum, which is parallel to the bottom of the heating chamber 15, is installed above the heating chamber 15. The lower surface of the movable heat reflection plate 25, that is, the surface facing the bottom surface of the heating chamber 15 has an emissivity capable of reflecting heat, preferably 0.25 or less. The movable heat reflection plate 25 is connected to the movement amount controller 26, and can move in the heating chamber 15 in the vertical direction within the range from the top of the heating chamber 15 to the upper portion of the heat treatment unit 16.

【0008】以上の構成を有する真空炉について、その
使用方法を説明する。先ず、加熱処理部16が設定温度
に達するまで、側面加熱ヒータ17で加熱室15内を加
熱する。このとき、加熱処理部16の温度を制御用熱電
対22で検出し、加熱処理部16の温度が設定温度で定
常状態に達するように、側面加熱ヒータサイリスタ18
で側面加熱ヒータ17の発熱量を制御する。次いで、測
温用熱電対(上)23a、測温用熱電対(中)23b、
測温用熱電対(下)23cによって、定常状態に達した
加熱処理部16の温度をぞれぞれ検出し、演算器24
で、測温用熱電対(上)23aと測温用熱電対(中)2
3bによる第1温度差、測温用熱電対(中)23bと測
温用熱電対(下)23cによる第2温度差を演算する。
このとき、可動熱反射板25は、加熱室15の頂部に設
置されている。次いで、演算した第1及び第2温度差に
基づき、移動量制御器26によって可動熱反射板25を
加熱室15の頂部から下降させる。可動熱反射板25の
下降によって、輻射熱が増加して、加熱処理部16の温
度差が変わる。次いで、可動反射板を下降した状態で、
加熱室15内の温度が定常状態になるまで待機し、その
後同様なサイクルを繰り返し、加熱室15に所望の温度
差が得られるまで、可動熱反射板25を上下方向に移動
させる。
A method of using the vacuum furnace having the above structure will be described. First, the side surface heater 17 heats the inside of the heating chamber 15 until the heat treatment unit 16 reaches the set temperature. At this time, the side surface heater thyristor 18 detects the temperature of the heat treatment unit 16 by the control thermocouple 22 so that the temperature of the heat treatment unit 16 reaches a steady state at the set temperature.
The amount of heat generated by the side surface heater 17 is controlled by. Next, a thermocouple for temperature measurement (upper) 23a, a thermocouple for temperature measurement (middle) 23b,
The temperature measuring thermocouple (lower) 23c detects the temperature of the heat treatment unit 16 that has reached a steady state, and the calculator 24
Then, the thermocouple for temperature measurement (top) 23a and the thermocouple for temperature measurement (middle) 2
The first temperature difference due to 3b and the second temperature difference due to the temperature measuring thermocouple (middle) 23b and the temperature measuring thermocouple (lower) 23c are calculated.
At this time, the movable heat reflection plate 25 is installed at the top of the heating chamber 15. Then, based on the calculated first and second temperature differences, the movement amount controller 26 lowers the movable heat reflection plate 25 from the top of the heating chamber 15. Radiant heat increases due to the lowering of the movable heat reflection plate 25, and the temperature difference of the heat treatment unit 16 changes. Next, with the movable reflector lowered,
The process waits until the temperature in the heating chamber 15 reaches a steady state, and then the same cycle is repeated, and the movable heat reflection plate 25 is moved in the vertical direction until the desired temperature difference is obtained in the heating chamber 15.

【0009】なお、可動熱反射板25の上下方向移動量
の制御だけでは、所望の温度差が得られない場合には、
底面加熱ヒータ20を用いて、サイリスタ18及び21
により側面加熱ヒータ17と底面加熱ヒータ20の電力
配分を調整して、それぞれの発熱量を変更することによ
って所望の温度差を得ることができる。以上の真空炉に
ついて、2種類の設定温度、1000°C 及び1500°C を対
象に、加熱処理部16の上下方向の温度差測定実験を行
った。測定条件を表1に、測定結果を表2及び表3に示
す。
If a desired temperature difference cannot be obtained only by controlling the amount of movement of the movable heat reflection plate 25 in the vertical direction,
Using the bottom heater 20, the thyristors 18 and 21
By adjusting the electric power distribution between the side surface heater 17 and the bottom surface heater 20 and changing the heat generation amount of each, a desired temperature difference can be obtained. With respect to the above vacuum furnace, a temperature difference measurement experiment in the vertical direction of the heat treatment section 16 was conducted for two kinds of set temperatures, 1000 ° C and 1500 ° C. The measurement conditions are shown in Table 1, and the measurement results are shown in Tables 2 and 3.

【0010】[0010]

【表1】 [Table 1]

【0011】[0011]

【表2】 [Table 2]

【0012】[0012]

【表3】 [Table 3]

【0013】表2及び表3からわかるように、側面加熱
ヒータ17による加熱だけで、可動熱反射板25を使用
しない場合には、加熱処理部16の上下方向の温度は、
加熱処理部16の頂部、中央部、底部の順になってお
り、最大温度差は、設定温度1000°C 、1500°C の場合
ともに10°C(中央部の温度を基準) となっている。可動
熱反射板25による効果を表2の中段に示す。中央部の
温度は可動熱反射板なしの場合から殆ど変化せず、頂
部、底部の温度が共に同じ温度まで上昇し、最大温度差
を10°C から3°C まで改善するという結果を得た。次
に、可動反射板及び底面加熱ヒータ20を用いた場合の
結果を表2及び表3の最下段に示す。設定温度1000°C
の場合には、頂部、中央部、底部の温度が等しくなり、
設定温度1500°C の場合にも略一様な温度差を得た。こ
のように、可動熱反射板によれば、加熱処理部の上下方
向について温度差を少なくすることができ、可動熱反射
板とともに底面加熱ヒータを用いて、側面加熱ヒータと
の間に電力配分を行えば、さらにかかる温度差を少なく
することができることを確認した。
As can be seen from Tables 2 and 3, when the movable heat reflection plate 25 is not used but only by the side surface heater 17, the temperature of the heat treatment section 16 in the vertical direction is as follows.
The top, center, and bottom of the heat treatment section 16 are arranged in this order, and the maximum temperature difference is 10 ° C (referenced to the temperature of the center) for both set temperatures of 1000 ° C and 1500 ° C. The effect of the movable heat reflection plate 25 is shown in the middle row of Table 2. The temperature of the central part hardly changed from the case without the movable heat reflection plate, the temperature of the top part and the bottom part both increased to the same temperature, and the maximum temperature difference was improved from 10 ° C to 3 ° C. . Next, the results when the movable reflector and the bottom heater 20 are used are shown in the lowermost row of Tables 2 and 3. Set temperature 1000 ° C
In case of, the temperature at the top, center, and bottom becomes equal,
Even when the set temperature was 1500 ° C, a substantially uniform temperature difference was obtained. As described above, according to the movable heat reflection plate, it is possible to reduce the temperature difference in the vertical direction of the heat treatment unit, and the bottom surface heater is used together with the movable heat reflection plate to distribute the electric power to the side surface heater. It was confirmed that the temperature difference can be further reduced by carrying out.

【0014】[0014]

【効果】本発明によれば、真空炉内の加熱処理部の上下
方向に所望の温度差を得ることができ、それによって処
理品に対する厳しい温度差条件に対処できる。さらに炉
を改造することなく、処理品の多品種化に伴う温度差の
多様化に対処でき、生産効率を向上することができる。
[Effect] According to the present invention, a desired temperature difference can be obtained in the vertical direction of the heat treatment section in the vacuum furnace, and thus a severe temperature difference condition for the processed product can be dealt with. Further, without remodeling the furnace, it is possible to cope with the diversification of the temperature difference due to the diversification of processed products, and to improve the production efficiency.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例に係わる真空炉の概略図であ
る。
FIG. 1 is a schematic view of a vacuum furnace according to an embodiment of the present invention.

【図2】従来の真空炉の概略図である。FIG. 2 is a schematic view of a conventional vacuum furnace.

【符号の説明】[Explanation of symbols]

10 真空炉 14 断熱材 16 加熱処理部 15 加熱室 18 第1制御手段 21 第2制御手段 23 温度検出手段 25 可動熱反射板 26 移動量制御手段 10 vacuum furnace 14 Insulation 16 Heat treatment section 15 heating chamber 18 First control means 21 Second control means 23 Temperature detecting means 25 Movable heat reflector 26 Moving amount control means

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) F27D 11/02 F27B 17/00 F27D 19/00 G05D 23/19 ─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields surveyed (Int.Cl. 7 , DB name) F27D 11/02 F27B 17/00 F27D 19/00 G05D 23/19

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 被加熱物を加熱処理するための加熱処理
部を有する、断熱材によって包囲された加熱室と、 該加熱室内部の周方向全体に渡って上下方向に設置され
た第1加熱体と、 該第1加熱体の加熱量を制御するための第1制御手段と
を有する真空炉において、 前記加熱室内に設置された、前記加熱処理部の上部で上
下に移動可能な可動熱反射板と、 前記可動熱反射板の上下移動量を制御するための移動量
制御手段とを設けたことを特徴とする真空炉。
1. A heating chamber surrounded by a heat insulating material, which has a heat treatment unit for heat-treating an object to be heated, and a first heating unit installed in a vertical direction over the entire circumference of the inside of the heating chamber. In a vacuum furnace having a body and a first control means for controlling a heating amount of the first heating body, a movable heat reflector movable up and down above the heat treatment unit installed in the heating chamber. A vacuum furnace comprising a plate and a movement amount control means for controlling the vertical movement amount of the movable heat reflection plate.
【請求項2】 前記加熱室の底面に設置された第2加熱
体と、該第2加熱体の加熱量を制御するための第2制御
手段とをさらに有し、前記第1加熱体の加熱量と前記第
2加熱体の加熱量とを別々に制御することを特徴とする
請求項1に記載の真空炉。
2. The heating of the first heating body, further comprising a second heating body installed on a bottom surface of the heating chamber, and second control means for controlling a heating amount of the second heating body. The vacuum furnace according to claim 1, wherein the amount and the heating amount of the second heating body are separately controlled.
【請求項3】 前記第1制御手段は、前記加熱処理部の
上下方向に複数の温度検出手段を有することを特徴とす
る請求項1又は請求項2に記載の真空炉。
3. The vacuum furnace according to claim 1, wherein the first control means has a plurality of temperature detection means in the vertical direction of the heat treatment section.
JP23804493A 1993-09-24 1993-09-24 Vacuum furnace with movable heat reflector Expired - Fee Related JP3466673B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23804493A JP3466673B2 (en) 1993-09-24 1993-09-24 Vacuum furnace with movable heat reflector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23804493A JP3466673B2 (en) 1993-09-24 1993-09-24 Vacuum furnace with movable heat reflector

Publications (2)

Publication Number Publication Date
JPH0791863A JPH0791863A (en) 1995-04-07
JP3466673B2 true JP3466673B2 (en) 2003-11-17

Family

ID=17024335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23804493A Expired - Fee Related JP3466673B2 (en) 1993-09-24 1993-09-24 Vacuum furnace with movable heat reflector

Country Status (1)

Country Link
JP (1) JP3466673B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3741283B2 (en) * 2003-03-10 2006-02-01 学校法人関西学院 Heat treatment apparatus and heat treatment method using the same
JP4418879B2 (en) * 2003-03-10 2010-02-24 学校法人関西学院 Heat treatment apparatus and heat treatment method
WO2007023691A1 (en) 2005-08-26 2007-03-01 Matsushita Electric Industrial Co., Ltd. Reflector and device having the reflector
JP5251015B2 (en) * 2007-06-27 2013-07-31 学校法人関西学院 Heat treatment apparatus and heat treatment method
CN103925791B (en) * 2014-04-16 2015-09-02 嵩县开拓者钼业有限公司 A kind of vacuum furnace

Also Published As

Publication number Publication date
JPH0791863A (en) 1995-04-07

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