JP3082211B2 - Vacuum furnace and temperature uniforming method in vacuum furnace - Google Patents

Vacuum furnace and temperature uniforming method in vacuum furnace

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Publication number
JP3082211B2
JP3082211B2 JP02160455A JP16045590A JP3082211B2 JP 3082211 B2 JP3082211 B2 JP 3082211B2 JP 02160455 A JP02160455 A JP 02160455A JP 16045590 A JP16045590 A JP 16045590A JP 3082211 B2 JP3082211 B2 JP 3082211B2
Authority
JP
Japan
Prior art keywords
heaters
space
temperature
vacuum furnace
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP02160455A
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Japanese (ja)
Other versions
JPH0452215A (en
Inventor
雅知 中村
洋一 中西
宏司 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Original Assignee
Daido Steel Co Ltd
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Publication date
Application filed by Daido Steel Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP02160455A priority Critical patent/JP3082211B2/en
Publication of JPH0452215A publication Critical patent/JPH0452215A/en
Application granted granted Critical
Publication of JP3082211B2 publication Critical patent/JP3082211B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Control Of Resistance Heating (AREA)
  • Powder Metallurgy (AREA)
  • Furnace Details (AREA)
  • Control Of Temperature (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は種々の被処理材に焼入や焼戻或いは焼結、
焼成などの熱処理を施す為に用いられる真空炉及びその
真空炉における温度均一化方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to quenching, tempering or sintering of various materials to be treated.
The present invention relates to a vacuum furnace used for performing heat treatment such as firing, and a method for uniforming temperature in the vacuum furnace.

[従来の技術] この種の炉においては、例えば真空容器内において被
処理材の存置空間の上面側と下面側に夫々ヒータが配設
されると共に、被処理材の温度を検出する為の温度検出
器が設けられ、その検出値に基づいて上記ヒータの発熱
量制御が行われる。
2. Description of the Related Art In a furnace of this type, for example, a heater is provided on an upper surface side and a lower surface side of a space in which a material to be processed is placed in a vacuum vessel, and a temperature for detecting the temperature of the material to be processed. A detector is provided, and the heating value of the heater is controlled based on the detected value.

[発明が解決しようとする課題] このような従来の真空炉では被処理材は上面と下面と
から加熱されるのみである為、側面側の加熱が充分でな
く、上面側や下面側との温度差が大きくなる問題点があ
った。そこで上記側面側にもヒータと温度検出器とを設
け、その温度検出器による検出値に基づいて該側面側の
ヒータを制御する技術が案出された。このような技術
は、被処理材の全体の温度の均一化を向上させる上にお
いて好ましい。しかし温度検出器の数が増加すればそれ
の制御網が極めて複雑となってしまう問題点がある。
[Problems to be Solved by the Invention] In such a conventional vacuum furnace, since the material to be processed is only heated from the upper surface and the lower surface, the heating on the side surface is not sufficient, and the heat treatment on the upper surface and the lower surface is difficult. There was a problem that the temperature difference became large. Therefore, a technique has been devised in which a heater and a temperature detector are provided also on the side surface side, and the heater on the side surface side is controlled based on a value detected by the temperature detector. Such a technique is preferable from the viewpoint of improving the uniformity of the entire temperature of the material to be processed. However, there is a problem that the control network for the temperature detector becomes extremely complicated as the number of temperature detectors increases.

本発明は上記従来技術の問題点(技術的課題)を解決
する為になされたもので、一つの温度検出器からの検出
値でもって、複数のヒータの発熱量を相互に偏差を持た
せた状態で制御することにより、簡易な制御網でもって
被処理材の温度分布の均一化を向上させた状態での加熱
を行い得るようにした真空炉及び真空炉における温度均
一化方法を提供することを目的とする。
The present invention has been made in order to solve the above-mentioned problems (technical problems) of the prior art, and has a method in which the heating values of a plurality of heaters are mutually deviated based on a detection value from one temperature detector. To provide a vacuum furnace and a temperature uniforming method in a vacuum furnace capable of performing heating in a state where uniformity of temperature distribution of a material to be processed is improved by a simple control network by controlling in a state. With the goal.

[課題を解決する為の手段] 本願発明の真空炉は、内部に被処理材の存置空間を有
する真空容器内においては、上記存置空間の周囲に夫々
上記存置空間に存置される被処理材を加熱する為の複数
のヒータを備えている真空炉において、上記複数の各ヒ
ータの夫々の給電経路には発熱量調節器を夫々個別に介
設し、それら複数の発熱量調節器と、真空容器内の被処
理材の温度を検出して、上記複数の発熱量調節器を同時
に制御する為に真空容器内に設けられた一つの温度検出
器との間には、上記複数のヒータ相互の発熱量に偏差を
持たせ得るよう上記複数の発熱量調節器の夫々につい
て、個別の偏差設定器を介設したものである。
[Means for Solving the Problems] The vacuum furnace of the present invention is configured such that, in a vacuum vessel having a space in which a material to be treated is placed, a material to be treated that is placed in the space in which the material is placed is located around the space. In a vacuum furnace provided with a plurality of heaters for heating, a heating value controller is individually provided in a power supply path of each of the plurality of heaters, and the plurality of heating value controllers and a vacuum vessel are provided. In order to detect the temperature of the material to be processed in the vacuum chamber and to simultaneously control the plurality of heating value adjusters, the heat generation between the plurality of heaters is performed between the plurality of heaters and one temperature detector provided in the vacuum vessel. Each of the plurality of heating value adjusters is provided with a separate deviation setting device so that the amount can have a deviation.

[作用] 被処理材には上面側、下面側及び側面側の各ヒータか
ら熱が与えられて、その全体の温度分布の均一化が向上
される。その加熱の場合、温度検出器によって被処理材
の温度が検出され、その検出値に基づいて複数のヒータ
の発熱量が制御される。該制御の場合、一つの温度検出
器による検出値に基づき、複数のヒータの発熱量が予め
偏差設定器に設定された偏差を持たせた状態で制御され
る。その結果、被処理材をその全体の温度を均一化した
状態で加熱できる。
[Operation] Heat is applied to the material to be processed from the heaters on the upper surface side, the lower surface side, and the side surface side, and the uniformity of the entire temperature distribution is improved. In the case of the heating, the temperature of the material to be processed is detected by the temperature detector, and the amounts of heat generated by the plurality of heaters are controlled based on the detected value. In the case of this control, the amounts of heat generated by the plurality of heaters are controlled in such a manner that a deviation set in advance by the deviation setting device is provided based on the detection value of one temperature detector. As a result, the material to be processed can be heated in a state where the entire temperature is made uniform.

[実施例] 以下本願の実施例を示す図面について説明する。第
1、2図において、1は真空炉を示す。2は真空容器
で、本体3とその本体3の出入口に設けた扉4とから構
成してある。5は断熱壁で、本体6とその本体6の出入
口に設けた扉7とから構成され、その内側の空間が熱処
理室8となっている。10は熱処理部8内に設けられた載
置台で、その上側の空間が被処理材の存置空間11となっ
ている。12a〜12fは上記存置空間11の周囲に配設された
ヒータで、夫々上記存置空間11の上面側、下面側、及び
左、右、前、後の各側面側に設けられたものを示し(本
明細書中では扉の側を前、その反対側を後と呼び、左右
は扉の側から見ての左右を言う)、各々は断熱壁に取付
けてある。尚上記前面側及び後面側のヒータ12e,12fは
設けられない例もある。13は処理室8内に備えられた温
度検出器で、高温度の検出が可能なものであり、例えば
熱電対が用いられる。次に15は被処理材の周知の冷却機
構を示し、以下これについて説明する。16はクーラ、17
は冷却ファンで、ファンモータ18によって運転されるよ
うになっている。19はモータカバーで、真空保持用のも
のである。20,21は夫々ダクトで、ダクト20はその下面
に、ダクト21は上面に夫々ガスの流通口を有している。
22,23は上下流切替用のダンパーである。このような冷
却機構15にあっては、ダンパー22,23が図示の如き状態
においてクーラ16及びファン17を運転することにより、
冷却用のガスが実線矢印の如き経路で循環し、存置空間
11に置かれた被処理材が冷却される。尚ダンパー22,23
を切り替えることにより、冷却用のガスを存置空間11に
下から上へ向けて流して被処理材の冷却を行うこともで
きる。
[Embodiment] Drawings showing an embodiment of the present application will be described below. 1 and 2, reference numeral 1 denotes a vacuum furnace. Reference numeral 2 denotes a vacuum vessel, which comprises a main body 3 and a door 4 provided at the entrance of the main body 3. Reference numeral 5 denotes a heat insulating wall, which is composed of a main body 6 and a door 7 provided at an entrance of the main body 6, and a space inside the main body 6 is a heat treatment chamber 8. Reference numeral 10 denotes a mounting table provided in the heat treatment section 8, and a space above the mounting table is a space 11 in which the material to be processed is located. Reference numerals 12a to 12f denote heaters disposed around the existing space 11, which are provided on the upper surface side, the lower surface side, and the left, right, front, and rear side surfaces of the existing space 11, respectively ( In the present specification, the side of the door is referred to as front, and the opposite side is referred to as rear, and the left and right refer to the left and right as viewed from the door side), each of which is attached to a heat insulating wall. In some cases, the heaters 12e and 12f on the front and rear sides are not provided. Reference numeral 13 denotes a temperature detector provided in the processing chamber 8, which is capable of detecting a high temperature. For example, a thermocouple is used. Next, reference numeral 15 denotes a well-known cooling mechanism for the material to be processed, which will be described below. 16 is cooler, 17
Is a cooling fan, which is driven by a fan motor 18. 19 is a motor cover for holding a vacuum. The ducts 20 and 21 each have a duct. The duct 20 has a gas flow port on its lower surface, and the duct 21 has a gas flow port on its upper surface.
Reference numerals 22, 23 denote dampers for switching between upstream and downstream. In such a cooling mechanism 15, the dampers 22, 23 operate the cooler 16 and the fan 17 in the state shown in the drawing,
Cooling gas circulates along the path shown by the solid arrow,
The workpiece placed at 11 is cooled. Dampers 22, 23
By switching the cooling gas, the material to be processed can be cooled by flowing the cooling gas from the bottom to the top in the storage space 11.

次に上記ヒータ12a〜12fの制御系統を示す第3図につ
いて説明する。尚第3図において符号数字に付した英小
文字a〜fは、それらを付した符号で示される各部材が
上記各ヒータ12a〜12fに対応する部材であることを示す
ものであり、以下においては必要のある場合を除き英小
文字a〜fを省略した符号で説明を行う。25は電源端子
で、商用電源に接続される。26はヒータへの給電経路に
介設した発熱量調節器で、一例として電流調節器が用い
てある。このような電流調節器としては、例えばサイリ
スタが用いられる。27は変圧器で、電圧を降下させるよ
うにしたものである。上記電流調節器26と変圧器27とは
図示の如き順序に接続することにより、電流調節器26は
小電流容量のもので足りる。28は周知の温度調節計で、
温度検出器13から得られる温度の検出値に基づいて制御
信号を出力するようにしたものである。29は偏差設定器
で、温度調節計28からの制御信号を受け、自体に予め設
定された偏差値をその制御信号に加え、その偏差値の加
えられた信号を上記電流調節器26に与えるようにしてあ
る。
Next, FIG. 3 showing a control system of the heaters 12a to 12f will be described. In FIG. 3, lowercase letters a to f attached to reference numerals indicate that the members indicated by the reference numerals are members corresponding to the heaters 12a to 12f, respectively. Unless necessary, the description will be made with reference numerals in which lowercase letters a to f are omitted. Reference numeral 25 denotes a power supply terminal, which is connected to a commercial power supply. 26 is a calorific value controller interposed in the power supply path to the heater, and a current regulator is used as an example. As such a current regulator, for example, a thyristor is used. 27 is a transformer for reducing the voltage. By connecting the current regulator 26 and the transformer 27 in the order shown in the figure, the current regulator 26 having a small current capacity is sufficient. 28 is a well-known temperature controller,
A control signal is output based on a temperature detection value obtained from the temperature detector 13. Numeral 29 denotes a deviation setting device which receives a control signal from the temperature controller 28, adds a deviation value preset for itself to the control signal, and gives a signal to which the deviation value is added to the current controller 26. It is.

次に上記真空炉を用いた被処理材の熱処理を説明す
る。扉4,7が開けられ、被処理材31が載置台10の上に乗
せられる。載置状態は、大きな被処理材31はそのまま、
小さなものは例えば棚に積んだ状態である。次に扉4,7
が閉じられ、真空容器2内が真空排気され、ヒータ12a
〜12fへの通電によってそれらが発熱され、それらヒー
タ12a〜12fからの主として輻射伝熱によって被処理材31
が加熱される。
Next, the heat treatment of the material to be processed using the vacuum furnace will be described. The doors 4 and 7 are opened, and the workpiece 31 is placed on the mounting table 10. In the mounting state, the large workpiece 31 remains as it is,
Small ones are, for example, stacked on shelves. Then doors 4,7
Is closed, the inside of the vacuum vessel 2 is evacuated, and the heater 12a is closed.
To 12f, they generate heat, and the material to be treated 31 is mainly generated by radiant heat transfer from the heaters 12a to 12f.
Is heated.

上記加熱の場合、被処理材31の温度は温度検出器13に
よって検出され、それからの信号に基づき温度調節計2
8、偏差設定器29を経て電流調節器26が制御され、各ヒ
ータ12a〜12fの出力が制御される。それらヒータ12a〜1
2fの出力の制御は、予め偏差設定器29に設定された偏差
をもった状態で行われる。従って存置空間11に存置され
た被処理材31はその何れの部分も略均一な温度に加熱さ
れる。
In the case of the above-mentioned heating, the temperature of the processing target material 31 is detected by the temperature detector 13, and based on the signal from the temperature detector 13, the temperature controller 2
8. The current adjuster 26 is controlled via the deviation setter 29, and the output of each heater 12a to 12f is controlled. Those heaters 12a-1
Control of the output of 2f is performed in a state having a deviation set in the deviation setting unit 29 in advance. Therefore, the material to be processed 31 placed in the existing space 11 is heated to a substantially uniform temperature in any part thereof.

尚上記各偏差設定器29a〜29fに設定すべき偏差値は、
被処理材31の形態、大きさ、存置空間11での積載状態等
の違いに応じて、夫々存置空間11の各部の被処理材31の
温度を均一にすることのできる種々の値を予め実験的に
求めておき、それらの値のうちから実情に合ったものを
選択して用いるのが良い。
The deviation value to be set in each of the deviation setting units 29a to 29f is
Depending on the shape, size, loading state, etc. of the material 31 to be processed, various values that can make the temperature of the material 31 in each part of the existing space 11 uniform can be previously tested. It is better to select a value suitable for the actual situation from these values and use it.

上記のようにして被処理材31に所定の加熱が施された
ならば、ヒータへの通電が停止され、冷却用のガスが真
空容器2内に導入され、クーラ16やファン17が前述のよ
うに運転されて、被処理材31の冷却が行われる。
When the target material 31 is subjected to the predetermined heating as described above, the power supply to the heater is stopped, the cooling gas is introduced into the vacuum vessel 2, and the cooler 16 and the fan 17 are operated as described above. , The material to be treated 31 is cooled.

そして冷却が終了すると、扉4,7が開かれて熱処理を
終えた被処理材31が取り出される。
Then, when the cooling is completed, the doors 4 and 7 are opened, and the material 31 subjected to the heat treatment is taken out.

次に被処理材の種別、例えば大きさ、形状、材質等が
変更になった場合における熱処理について説明する。一
例として、被処理材が大きなものに変更になった場合に
おける熱処理の場合には、例えばヒータ12bの発熱量が
大きくなるように偏差設定器29bの設定値を変更し、そ
の状態で上記の場合と同様の操作が行われる。その結
果、その変更された被処理材であっても均一な温度分布
の状態で熱処理を行うことができる。
Next, the heat treatment in the case where the type of the material to be processed, for example, the size, shape, material, etc., is changed will be described. As an example, in the case of heat treatment when the material to be processed is changed to a large material, for example, the setting value of the deviation setting unit 29b is changed so that the heat generation amount of the heater 12b is increased, and The same operation as described above is performed. As a result, the heat treatment can be performed in a uniform temperature distribution state even with the changed material to be processed.

次に、第3図の制御系統において、上記の如き偏差設
定器29を用いずに全ヒータの発熱制御を行った場合と、
前記のように偏差設定器29を用いて全ヒータの発熱制御
を行った場合とにおいて夫々炉内の温度分布幅を実測し
たところ、次の第1表の如き改善が見られた。
Next, in the control system of FIG. 3, the case where the heat generation control of all the heaters is performed without using the deviation setter 29 as described above,
When the temperature distribution width in the furnace was actually measured in the case where the heating of all the heaters was controlled using the deviation setting device 29 as described above, improvements as shown in the following Table 1 were found.

次に、上記炉内のヒータ12a〜12fの制御は、第3図に
2点鎖線で示されるように、ヒータ12a〜12fを2組(例
えばヒータ12a〜12cとヒータ12d〜12f)を区分し、各々
の組において夫々一つの温度検出器13′(13″)及び夫
々一つの温度調節計28′(28″)により前記実施例と同
様の制御を行っても良い。また断熱壁5の形状は、第2
図の如き断面が四角な形状以外に、円筒状であっても良
い。
Next, control of the heaters 12a to 12f in the furnace is performed by dividing the heaters 12a to 12f into two sets (for example, heaters 12a to 12c and heaters 12d to 12f) as shown by a two-dot chain line in FIG. In each group, the same control as in the above embodiment may be performed by one temperature detector 13 '(13 ") and one temperature controller 28'(28"). The shape of the heat insulating wall 5 is the second
The cross section may have a cylindrical shape other than a square shape as shown in the drawing.

[発明の効果] 以上のように本発明にあっては、被処理材31を加熱す
る場合、その被処理材31には周囲の複数のヒータから熱
が与えられるから、被処理材31の全体を温度分布の均一
化を向上させた状態で加熱できる効果があるは勿論のこ
と、 上記加熱の場合、温度検出器13によって被処理材31の
温度を検出し、その検出値に基づいて上記複数のヒータ
の発熱量を同時に制御するから、被処理材31の温度状況
に即した加熱ができる効果がある。
[Effects of the Invention] As described above, in the present invention, when the material to be processed 31 is heated, heat is given to the material to be processed 31 from a plurality of surrounding heaters. Of course, in the case of the above-mentioned heating, the temperature of the material 31 to be processed is detected by the temperature detector 13, and the plurality of the plurality of Since the calorific values of the heaters are controlled at the same time, there is an effect that the material to be processed 31 can be heated in accordance with the temperature condition.

しかも上記制御の場合、上記温度検出器13による温度
の検出は一つでもって、複数のヒータを制御するもので
あるから、その制御網は単純化できる効果があり、従っ
て、設備に係わるコストは低減化し、運転に当たっての
メンテナンスは簡易化する有用性がある。また複数のヒ
ータの発熱量は所望通りに相互に偏差を持たせた状態で
同時に制御できる利点があるから、各ヒータ間でのハン
チングもなく、上記被処理材31は、上記複数のヒータを
夫々個別制御した場合よりも全域の温度制御が均一的に
できる特長がある。
In addition, in the case of the above control, since the temperature detection by the temperature detector 13 controls one heater and controls a plurality of heaters, there is an effect that the control network can be simplified, and therefore, the cost related to the equipment is reduced. This has the utility of reducing power consumption and simplifying maintenance during operation. Further, since there is an advantage that the amounts of heat generated by the plurality of heaters can be simultaneously controlled in a state where they have a mutual deviation as desired, there is no hunting between the heaters, and the material to be processed 31 has the plurality of heaters respectively. There is a feature that the temperature control over the entire area can be performed more uniformly than when individual control is performed.

さらに本発明の方法にあっては、被処理材31の種別が
変わった場合においても、その変更に応じて上記偏差の
設定値を変えるから、変更になった被処理材に対しても
上記の如き温度分布の均一化を向上させた状態での加熱
を行い得る効果がある。
Furthermore, in the method of the present invention, even when the type of the workpiece 31 changes, the set value of the deviation is changed according to the change. Thus, there is an effect that heating can be performed in a state where the temperature distribution is made uniform.

【図面の簡単な説明】[Brief description of the drawings]

図面は本願の実施例を示すもので、第1図は真空炉の縦
断面図、第2図はヒータの配置状態を示す為の第1図に
おけるII−II線断面図、第3図はヒータの制御系統を示
す回路図。 2……真空容器、11……存置空間、12a〜12f……ヒー
タ、13……温度検出器、26……発熱量調節器、29……偏
差設定器。
1 is a longitudinal sectional view of a vacuum furnace, FIG. 2 is a sectional view taken along the line II-II in FIG. 1 to show the arrangement of heaters, and FIG. FIG. 2 is a circuit diagram showing a control system of FIG. 2. Vacuum container, 11 Space, 12a to 12f Heater, 13 Temperature detector, 26 Heat generation amount controller, 29 Deviation setter.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭55−17901(JP,A) 特開 平3−110382(JP,A) 特開 昭62−112726(JP,A) 実開 昭61−63700(JP,U) 実公 平1−43836(JP,Y2) (58)調査した分野(Int.Cl.7,DB名) C21D 1/773 B22F 3/10 F27D 11/02 H05B 3/00 350 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-55-17901 (JP, A) JP-A-3-110382 (JP, A) JP-A-62-112726 (JP, A) 63700 (JP, U) Jiko 1-43836 (JP, Y2) (58) Fields investigated (Int. Cl. 7 , DB name) C21D 1/773 B22F 3/10 F27D 11/02 H05B 3/00 350

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】内部に被処理材の存置空間を有する真空容
器内においては、上記存置空間の周囲に夫々上記存置空
間に存置される被処理材を加熱する為の複数のヒータを
備えている真空炉において、上記複数の各ヒータの夫々
の給電経路には発熱量調節器を夫々個別に介設し、それ
ら複数の発熱量調節器と、真空容器内の被処理材の温度
を検出して、上記複数の発熱量調節器を同時に制御する
為に真空容器内に設けられた一つの温度検出器との間に
は、上記複数のヒータ相互の発熱量に偏差を持たせ得る
よう上記複数の発熱量調節器の夫々について、個別の偏
差設定器を介設したことを特徴とする真空炉。
In a vacuum vessel having a space in which a material to be treated is placed, a plurality of heaters are provided around the space to heat the material to be placed in the space. In the vacuum furnace, a heating value controller is individually provided in each of the power supply paths of the plurality of heaters, and the plurality of heating value controllers and the temperature of the material to be processed in the vacuum vessel are detected. In order to simultaneously control the plurality of heating value adjusters, a plurality of the plurality of heaters may be provided with a deviation between the plurality of heaters and a single temperature detector provided in the vacuum vessel. A vacuum furnace, wherein an individual deviation setting device is provided for each of the calorific value controllers.
【請求項2】内部に被処理材の存置空間を有する真空容
器内においては、上記存置空間の周囲に夫々上記存置空
間に存置される被処理材を加熱する為の複数のヒータを
備えている真空炉において、上記複数の各ヒータの夫々
の給電経路には発熱量調節器を夫々個別に介設し、それ
ら複数の発熱量調節器と、真空容器内の被処理材の温度
を検出して、上記複数の発熱量調節器を同時に制御する
為に真空容器内に設けられた一つの温度検出器との間に
は、上記複数のヒータ相互の発熱量に偏差を持たせ得る
よう上記複数の発熱量調節器の夫々について、個別の偏
差設定器を介設して、上記存置空間に被処理材を存置さ
せてそれを加熱するに当たっては、その存置させた被処
理材の種別に応じて上記各偏差設定器の設定値を調節す
ることにより、上記ヒータ相互の発熱量を変えて、上記
存置空間に存置させた被処理材の全体の温度を均一化さ
せることを特徴とする真空炉における温度均一化方法。
2. A vacuum vessel having a space in which a material to be treated is placed inside, and a plurality of heaters for heating the material to be treated placed in the space in which the material is placed are provided around the space. In the vacuum furnace, a heating value controller is individually provided in each of the power supply paths of the plurality of heaters, and the plurality of heating value controllers and the temperature of the material to be processed in the vacuum vessel are detected. In order to simultaneously control the plurality of heating value adjusters, a plurality of the plurality of heaters may be provided with a deviation between the plurality of heaters and a single temperature detector provided in the vacuum vessel. For each of the calorific value controllers, an individual deviation setting device is interposed, and when the material to be treated is kept in the existing space and heated, depending on the type of the material to be kept. By adjusting the setting value of each deviation setting device, By changing the heat value of the heater mutual temperature leveling method in a vacuum furnace, characterized in that to equalize the overall temperature of the processed material which is of stripping above of stripping space.
JP02160455A 1990-06-19 1990-06-19 Vacuum furnace and temperature uniforming method in vacuum furnace Expired - Lifetime JP3082211B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02160455A JP3082211B2 (en) 1990-06-19 1990-06-19 Vacuum furnace and temperature uniforming method in vacuum furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02160455A JP3082211B2 (en) 1990-06-19 1990-06-19 Vacuum furnace and temperature uniforming method in vacuum furnace

Publications (2)

Publication Number Publication Date
JPH0452215A JPH0452215A (en) 1992-02-20
JP3082211B2 true JP3082211B2 (en) 2000-08-28

Family

ID=15715310

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3082211B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112412U (en) * 1990-03-02 1991-11-18

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001092537A (en) * 1999-09-22 2001-04-06 Toyo Seiki Seisakusho:Kk Method for controlling temperature of furnace body or the like and device provided with the furnace body or the like
JP5089248B2 (en) * 2007-05-30 2012-12-05 株式会社九州日昌 Heat treatment equipment
KR101380456B1 (en) 2010-03-25 2014-04-01 신닛테츠스미킨 카부시키카이샤 Heat treatment method for long material, manufacturing method for long material, and heat treatment furnace used in above methods
WO2013080259A1 (en) * 2011-11-30 2013-06-06 Jfe Steel Corporation Method of heating long object in radiant heating furnace as well as radiant heating furnace therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112412U (en) * 1990-03-02 1991-11-18

Also Published As

Publication number Publication date
JPH0452215A (en) 1992-02-20

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