JP3423147B2 - Method for manufacturing optical multilayer filter - Google Patents

Method for manufacturing optical multilayer filter

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Publication number
JP3423147B2
JP3423147B2 JP09249496A JP9249496A JP3423147B2 JP 3423147 B2 JP3423147 B2 JP 3423147B2 JP 09249496 A JP09249496 A JP 09249496A JP 9249496 A JP9249496 A JP 9249496A JP 3423147 B2 JP3423147 B2 JP 3423147B2
Authority
JP
Japan
Prior art keywords
substrate
filter
optical
carrier
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP09249496A
Other languages
Japanese (ja)
Other versions
JPH09277396A (en
Inventor
義博 染野
裕美 小原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP09249496A priority Critical patent/JP3423147B2/en
Publication of JPH09277396A publication Critical patent/JPH09277396A/en
Application granted granted Critical
Publication of JP3423147B2 publication Critical patent/JP3423147B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、光通信において特
定の波長の光を合波または分波する光学多層膜フィルタ
の製造方法に関し、特に、多層膜を形成するための基板
が多層膜形成後に除去される、基板レスと称せられる光
学多層膜フィルタの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical multi-layer film filter that multiplexes or demultiplexes light having a specific wavelength in optical communication. The present invention relates to a method for manufacturing an optical multilayer filter called a substrateless that is removed.

【0002】[0002]

【従来の技術】基板レスと称せられる光学多層膜フィル
タの製造方法として、従来より特開平3−274506
号公報に示されたものが知られている。図4は同公報に
記載された光学多層膜フィルタの製造工程を示す説明図
であり、まず、図4(a)に示すように、可溶性基板1
の表面に複数の溝1aを形成する。次いで、図4(b)
に示すように、この基板1上に高屈折率の光学物質と低
屈折率の光学物質を交互に堆積し、基板の表面と各溝1
aの内部に多層膜2を形成する。しかる後、可溶性の基
板1を特定の溶媒に浸漬して溶解すると、図4(c)に
示すように、多層膜2が各溝1aに沿って剥離され、細
分化された複数のフィルタ素子チップ10が得られる。
したがって、フィルタ素子チップ10には基板1が無
く、多層膜2のみにより構成される。
2. Description of the Related Art As a method for manufacturing an optical multi-layer film filter called substrateless, it has hitherto been disclosed in JP-A-3-274506.
The one shown in Japanese Patent Publication is known. FIG. 4 is an explanatory view showing a manufacturing process of the optical multilayer filter described in the publication. First, as shown in FIG.
A plurality of grooves 1a are formed on the surface of the. Then, FIG. 4 (b)
As shown in FIG. 1, an optical material having a high refractive index and an optical material having a low refractive index are alternately deposited on the substrate 1, and the surface of the substrate and each groove 1 are
The multilayer film 2 is formed inside a. After that, when the soluble substrate 1 is immersed in a specific solvent to dissolve it, the multilayer film 2 is peeled off along each groove 1a as shown in FIG. 10 is obtained.
Therefore, the filter element chip 10 does not have the substrate 1, and is composed of only the multilayer film 2.

【0003】[0003]

【発明が解決しようとする課題】ところで、前述した従
来の光学多層膜フィルタの製造方法では、多層膜2の成
膜時に、該多層膜2が基板1の表面のみならず溝1aの
内壁にも形成されるため、多層膜2が各溝1a間で繋が
ってしまい、特に、この現象は多層膜2の緻密性を高め
るために成膜をプラズマ中で行うと顕著になる。その結
果、多層膜2の成膜後に基板1全体が反り、細分化され
たフィルタ素子チップ10のうち、特に基板1の端部に
形成されたフィルタ素子チップ10では、所望の光学特
性を得ることができなくなり、歩留りが悪化するという
問題点があった。
By the way, in the above-mentioned conventional method of manufacturing an optical multilayer filter, the multilayer film 2 is formed not only on the surface of the substrate 1 but also on the inner wall of the groove 1a when the multilayer film 2 is formed. Since the multi-layered film 2 is formed, the multi-layered film 2 is connected between the grooves 1a, and this phenomenon is particularly remarkable when the film formation is performed in plasma in order to increase the denseness of the multi-layered film 2. As a result, after the multilayer film 2 is formed, the entire substrate 1 is warped, and among the filter element chips 10 that are subdivided, particularly the filter element chips 10 formed at the end portions of the substrate 1 can obtain desired optical characteristics. However, there is a problem that the yield is deteriorated.

【0004】また、前述した従来の光学多層膜フィルタ
の製造方法では、図4(c)に示すように、フィルタ素
子チップ10が完成した状態では、多数のフィルタ素子
チップ10がバラバラに分離されて基板1の溶媒に浮い
た状態となるため、フィルタ素子チップ10を回収する
作業者や、フィルタ素子チップ10の単体を合波フィル
タや分波フィルタとして用いるユーザにとって、フィル
タ素子チップ10の取り扱いが非常に面倒であるという
問題点もあった。
Further, in the above-described conventional method for manufacturing an optical multilayer film filter, as shown in FIG. 4C, a large number of filter element chips 10 are separated into pieces when the filter element chips 10 are completed. Since the substrate 1 floats in the solvent, the filter element chip 10 is extremely handled by an operator who collects the filter element chip 10 or a user who uses the filter element chip 10 alone as a multiplexing filter or a demultiplexing filter. There was also the problem that it was troublesome.

【0005】[0005]

【課題を解決するための手段】本発明は、溶解可能な基
板に予め形成した溝内にマスク材料を充填した状態で多
層膜を成膜し、この多層膜をキャリヤに接着した後、基
板を溶解して多層膜のみをキャリヤに担持するようにし
た。このように、多層膜の成膜時に溝内にマスク材料を
充填することにより、多層膜が溝内で繋がることに起因
する基板の反りを防止できると共に、基板が溶解した後
の複数の基板レスの光学多層膜フィルタがチップ毎にキ
ャリヤに担持されるため、光学多層膜フィルタの取り扱
いを便利なものにすることができる。
According to the present invention, a multilayer film is formed with a mask material filled in a groove formed in advance in a dissolvable substrate, the multilayer film is adhered to a carrier, and then the substrate is It was made to melt | dissolve and carry | supported only the multilayer film on the carrier. Thus, by filling the groove with the mask material at the time of forming the multilayer film, it is possible to prevent the warp of the substrate due to the connection of the multilayer film in the groove, and to prevent a plurality of substrates from being melted after the substrate is melted. Since the optical multi-layer film filter of (1) is carried by the carrier for each chip, the handling of the optical multi-layer film filter can be made convenient.

【0006】[0006]

【発明の実施の形態】本発明の光学多層膜フィルタの製
造方法では、溶解可能な基板上に複数の溝を形成する工
程と、前記溝内にマスク材料を充填する工程と、前記基
板上に多層膜を形成する工程と、前記多層膜をキャリヤ
に接着する接着工程と、前記基板のみを溶解する溶解工
程とを有している。
BEST MODE FOR CARRYING OUT THE INVENTION In the method for manufacturing an optical multilayer filter of the present invention, a step of forming a plurality of grooves on a dissolvable substrate, a step of filling a mask material in the grooves, and a step of forming a groove on the substrate. The method includes a step of forming a multilayer film, an adhesion step of bonding the multilayer film to a carrier, and a melting step of melting only the substrate.

【0007】前記キャリヤは前記基板を溶解する溶媒で
は溶解しない材料であれば何でも良いが、特定の溶媒に
よって溶解可能なフィルムが好ましい。
The carrier may be any material that is insoluble in the solvent that dissolves the substrate, but is preferably a film that can be dissolved in a specific solvent.

【0008】また、前記接着工程と溶解工程との間に、
前記多層膜を前記溝に沿って切断する工程を有すると、
所定形状の光学多層膜フィルタをチップ毎にキャリヤに
担持させることができる。
Further, between the adhering step and the melting step,
Having a step of cutting the multilayer film along the groove,
The optical multi-layer film filter having a predetermined shape can be carried on the carrier chip by chip.

【0009】[0009]

【実施例】実施例について図面を参照して説明すると、
図1は本発明の一実施例に係る光学多層膜フィルタの製
造工程を示す説明図、図2は図1の製造工程で用いられ
る溝とマスク材料を示す平面図である。
EXAMPLES Examples will be described with reference to the drawings.
FIG. 1 is an explanatory view showing a manufacturing process of an optical multilayer filter according to an embodiment of the present invention, and FIG. 2 is a plan view showing a groove and a mask material used in the manufacturing process of FIG.

【0010】図1(a)に示す基板1は溶解可能な材
料、例えば、水を溶媒として溶解するNaClやKBr
等が用いられ、図1(b)に示すように、この基板1の
表面には複数の溝1aが形成される。この溝1aは公知
のフォトリソグラフィやダイシングカッタ等により形成
することができ、図2(a)に示すように、本実施例の
場合、溝1aはマトリクス状に形成されている。
The substrate 1 shown in FIG. 1 (a) is a soluble material, for example, NaCl or KBr which is soluble in water as a solvent.
As shown in FIG. 1B, a plurality of grooves 1a are formed on the surface of the substrate 1. The grooves 1a can be formed by known photolithography, dicing cutter, or the like. As shown in FIG. 2A, the grooves 1a are formed in a matrix in this embodiment.

【0011】次いで、図1(c)に示すように、各溝1
a内にマスク材料としてのワイヤ3を嵌め込む。図2
(b)に示すように、このワイヤ3は複数本を重ねたも
のからなり、溝1aの形状に対応してマトリクス状に形
成されている。
Then, as shown in FIG. 1C, each groove 1
A wire 3 as a mask material is fitted in a. Figure 2
As shown in (b), the wire 3 is formed by stacking a plurality of wires, and is formed in a matrix corresponding to the shape of the groove 1a.

【0012】次いで、図1(d)に示すように、基板1
上に高屈折率の光学物質と低屈折率の光学物質を交互に
堆積することにより、多層膜2を形成する。高屈折率の
光学物質としては例えばTiO2、低屈折率の光学物質
としては例えばSiO2が用いられ、これらはスパッタ
リングや蒸着あるいはイオンプレーティング等によって
成膜することができる。この場合、溝1a内にはワイヤ
3が嵌め込まれているので、溝1a内に成膜されない部
分が生じ、多層膜2はワイヤ3によって溝1a毎に分離
される。
Next, as shown in FIG. 1D, the substrate 1
The multilayer film 2 is formed by alternately depositing an optical material having a high refractive index and an optical material having a low refractive index on the top. For example, TiO 2 is used as the high refractive index optical material and SiO 2 is used as the low refractive index optical material, and these can be formed by sputtering, vapor deposition, ion plating, or the like. In this case, since the wire 3 is fitted in the groove 1a, there is a portion where no film is formed in the groove 1a, and the multilayer film 2 is separated by the wire 3 for each groove 1a.

【0013】次いで、図1(e)に示すように、ワイヤ
3を溝1aから除去した後、図1(f)に示すように、
多層膜2の上面をキャリヤ4に接着する。なお、図1
(f)〜(h)は基板1の上下が逆に示されている。こ
のキャリヤ4としては、基板1を溶融する溶媒(例えば
水)では溶融せず、且つ、特定の有機溶媒(例えばアセ
トン)で溶融する材料、例えば、エポキシ系フィルム等
が用いられる。
Next, as shown in FIG. 1 (e), after removing the wire 3 from the groove 1a, as shown in FIG. 1 (f),
The upper surface of the multilayer film 2 is adhered to the carrier 4. Note that FIG.
(F) to (h) are shown with the substrate 1 upside down. As the carrier 4, a material that does not melt in a solvent (eg, water) that melts the substrate 1 but melts in a specific organic solvent (eg, acetone), such as an epoxy film, is used.

【0014】次いで、図1(g)に示すように、カッタ
5により基板1を各溝1aに沿って切断し、溝1aの内
壁にはみ出した多層膜2の部分(バリ)を切断する。そ
の際、キャリヤ4が切断しなければ、カッタ5の先端が
キャリヤ4の内部に多少入り込んでも問題はない。
Next, as shown in FIG. 1 (g), the substrate 1 is cut by the cutter 5 along each groove 1a, and the portion (burr) of the multilayer film 2 protruding to the inner wall of the groove 1a is cut. At this time, as long as the carrier 4 is not cut, there is no problem even if the tip of the cutter 5 slightly goes inside the carrier 4.

【0015】次いで、基板1を溶媒としての水に浸漬し
て溶解すると、図1(h)に示すように、キャリヤ4上
に多数のフィルタチップ10が基板レスの状態で残り、
この状態で製造工程が完了する。したがって、基板1の
溶媒からフィルタチップ10を回収する作業者のみなら
ず、その後にフィルタ素子チップ10の単体を合波フィ
ルタや分波フィルタとして用いるユーザにとっても、複
数のフィルタチップ10がフィルム状のキャリヤ4上に
担持されているため、取り扱い性を向上することができ
る。
Next, when the substrate 1 is immersed in water as a solvent and dissolved, as shown in FIG. 1 (h), a large number of filter chips 10 remain on the carrier 4 in a substrate-less state,
The manufacturing process is completed in this state. Therefore, not only for the operator who collects the filter chip 10 from the solvent of the substrate 1 but also for the user who uses the single filter element chip 10 as a multiplexing filter or a demultiplexing filter thereafter, the plurality of filter chips 10 are in a film shape. Since it is carried on the carrier 4, the handleability can be improved.

【0016】図3はこのようなキャリヤ4付きのフィル
タチップ10を一対の光ファイバ11a,11b間に取
り付ける方法を示している。まず、図3(a)に示すよ
うに、キャリヤ4付きのフィルタチップ10をチップ毎
にキャリヤ4と共に切断する。次いで、図3(b)に示
すように、このフィルタチップ10をキャリヤ4付きで
フェルール12a,12bによりそれぞれ支持された光
ファイバ11a,11bの各コアの端面の間に配置し、
しかる後、図3(c)に示すように、フェルール12
a,12bを対向させて加圧すると共に、キャリヤ4を
有機溶媒13としての例えばアセトン内に浸漬して溶解
させる。すると、図3(d)に示すように、フィルタチ
ップ10のみが光ファイバ11a,11b間に取り付け
られる。ここで、キャリヤ4を溶解させる場合、超音波
等の振動を加えると効果的である。
FIG. 3 shows a method of mounting the filter chip 10 with such a carrier 4 between a pair of optical fibers 11a and 11b. First, as shown in FIG. 3A, the filter chip 10 with the carrier 4 is cut for each chip together with the carrier 4. Next, as shown in FIG. 3B, the filter chip 10 is placed between the end faces of the cores of the optical fibers 11a and 11b supported by the ferrules 12a and 12b with the carrier 4, respectively.
Then, as shown in FIG. 3C, the ferrule 12
While a and 12b are opposed to each other and pressurized, the carrier 4 is immersed and dissolved in, for example, acetone as the organic solvent 13. Then, as shown in FIG. 3D, only the filter chip 10 is attached between the optical fibers 11a and 11b. Here, when the carrier 4 is dissolved, it is effective to apply vibration such as ultrasonic waves.

【0017】なお、上記実施例では、マスク材料として
のワイヤ3を基板1の溝1a内に嵌め込む場合について
説明したが、ワイヤ3以外の他のマスク材料、例えば磁
性粉を溝1a内に充填し、この磁性粉を磁石の吸引力を
利用して溝1a内に固定した状態で多層膜2を成膜して
も良い。
Although the wire 3 as a mask material is fitted into the groove 1a of the substrate 1 in the above embodiment, a mask material other than the wire 3, for example, magnetic powder is filled in the groove 1a. Then, the multilayer film 2 may be formed in a state in which the magnetic powder is fixed in the groove 1a by utilizing the attractive force of the magnet.

【0018】[0018]

【発明の効果】本発明は以上説明したような形態で実施
され、以下に記載されるような効果を奏する。
The present invention is carried out in the form described above, and has the following effects.

【0019】溶解可能な基板上に複数の溝を形成する工
程と、前記溝内にマスク材料を充填する工程と、前記基
板上に多層膜を形成する工程と、前記多層膜をキャリヤ
に接着する接着工程と、前記基板のみを溶解する溶解工
程とを有する光学多層膜フィルタの製造方法によれば、
多層膜が溝内で繋がることに起因する基板の反りを防止
できると共に、基板が溶解した後の複数の基板レスの光
学多層膜フィルタがチップ毎にキャリヤに担持されるた
め、光学多層膜フィルタの取り扱いを便利なものにする
ことができる。
Forming a plurality of grooves on a dissolvable substrate, filling a mask material in the grooves, forming a multilayer film on the substrate, and adhering the multilayer film to a carrier. According to the method for producing an optical multilayer filter having a bonding step and a dissolving step of dissolving only the substrate,
The warp of the substrate due to the connection of the multilayer film in the groove can be prevented, and a plurality of substrate-less optical multilayer filters after the substrates are melted are carried by the carrier for each chip. The handling can be made convenient.

【0020】また、前記キャリヤとして特定の溶媒によ
って溶解可能なフィルムを用い、このフィルムが前記基
板を溶解する溶媒では溶解しないようにすると、光学多
層膜フィルタを光学系に取り付ける際、キャリヤのみを
特定の溶媒によって溶解させることができるため、取り
付け作業の向上を図ることができる。
If a film that can be dissolved in a specific solvent is used as the carrier and the film is not dissolved in a solvent that dissolves the substrate, only the carrier is specified when the optical multilayer filter is attached to the optical system. Since it can be dissolved by the solvent, the mounting work can be improved.

【0021】また、前記接着工程と溶解工程との間に、
前記多層膜を前記溝に沿って切断する工程を付加する
と、所定形状の光学多層膜フィルタをチップ毎にキャリ
ヤに担持させることができる。
Further, between the adhering step and the dissolving step,
By adding a step of cutting the multilayer film along the groove, the optical multilayer film filter having a predetermined shape can be carried by the carrier for each chip.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に係る光学多層膜フィルタの
製造工程を示す説明図である。
FIG. 1 is an explanatory view showing a manufacturing process of an optical multilayer filter according to an embodiment of the present invention.

【図2】図1の製造工程に用いられる溝とマスク材料を
示す平面図である。
FIG. 2 is a plan view showing a groove and a mask material used in the manufacturing process of FIG.

【図3】図1の光学多層膜フィルタを光ファイバ間に取
り付ける方法を示す説明図である。
FIG. 3 is an explanatory diagram showing a method of mounting the optical multilayer filter of FIG. 1 between optical fibers.

【図4】従来の光学多層膜フィルタの製造工程を示す説
明図である。
FIG. 4 is an explanatory view showing a manufacturing process of a conventional optical multilayer filter.

【符号の説明】[Explanation of symbols]

1 基板 1a 溝 2 多層膜 3 ワイヤ(マスク材料) 4 キャリヤ 10 フィルタチップ 11a,11b 光ファイバ 12a,12b フェルール 13 有機溶媒 1 substrate 1a groove 2 Multi-layer film 3 wires (mask material) 4 carriers 10 filter tips 11a, 11b optical fiber 12a, 12b ferrule 13 Organic solvent

フロントページの続き (56)参考文献 特開 平3−274506(JP,A) 特開 平4−7505(JP,A) 特開 昭63−60401(JP,A) 特開 昭60−262102(JP,A) 特開 昭55−115004(JP,A) 実開 昭61−2450(JP,U) (58)調査した分野(Int.Cl.7,DB名) G02B 5/28 G02B 1/11 C23C 14/00 - 14/02 Continuation of the front page (56) Reference JP-A-3-274506 (JP, A) JP-A-4-7505 (JP, A) JP-A-63-60401 (JP, A) JP-A-60-262102 (JP , A) JP-A-55-115004 (JP, A) Actually developed S61-2450 (JP, U) (58) Fields investigated (Int.Cl. 7 , DB name) G02B 5/28 G02B 1/11 C23C 14/00-14/02

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 溶解可能な基板上に複数の溝を形成する
工程と、前記溝内にマスク材料を充填する工程と、前記
基板上に多層膜を形成する工程と、前記多層膜をキャリ
ヤに接着する接着工程と、前記基板のみを溶解する溶解
工程とを有する光学多層膜フィルタの製造方法。
1. A method of forming a plurality of grooves on a dissolvable substrate, a step of filling a mask material in the grooves, a step of forming a multilayer film on the substrate, and a step of forming the multilayer film on a carrier. A method for manufacturing an optical multilayer filter, comprising: an adhering step of adhering and a dissolving step of dissolving only the substrate.
【請求項2】 前記キャリヤは溶解可能なフィルムであ
り、このフィルムは前記基板を溶解する溶媒では溶解し
ない材料であることを特徴とする請求項1記載の光学多
層膜フィルタの製造方法。
2. The method of manufacturing an optical multilayer filter according to claim 1, wherein the carrier is a soluble film, and the film is a material that is insoluble in a solvent that dissolves the substrate.
【請求項3】 前記接着工程と溶解工程との間に、前記
多層膜を前記溝に沿って切断する工程を有することを特
徴とする請求項1または2に記載の光学多層膜フィルタ
の製造方法。
3. The method of manufacturing an optical multilayer filter according to claim 1, further comprising a step of cutting the multilayer film along the groove between the adhering step and the dissolving step. .
JP09249496A 1996-04-15 1996-04-15 Method for manufacturing optical multilayer filter Expired - Fee Related JP3423147B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
JP09249496A JP3423147B2 (en) 1996-04-15 1996-04-15 Method for manufacturing optical multilayer filter

Publications (2)

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JPH09277396A JPH09277396A (en) 1997-10-28
JP3423147B2 true JP3423147B2 (en) 2003-07-07

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Publication number Priority date Publication date Assignee Title
CN100378475C (en) 2003-06-26 2008-04-02 株式会社尼康 Method for producing multilayer optical device
FR2925767B1 (en) * 2007-12-20 2010-05-28 Centre Nat Rech Scient PROCESS FOR MANUFACTURING A THIN FILM SOFCY FUEL CELL SOFC.
JP5634836B2 (en) * 2010-11-22 2014-12-03 浜松ホトニクス株式会社 Spectral sensor manufacturing method
JP5707107B2 (en) 2010-11-22 2015-04-22 浜松ホトニクス株式会社 Spectroscopic sensor

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