JP3415227B2 - Hazardous material removal device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [0001] BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device manufacturing process and the like.
To effectively remove harmful substances contained in gas generated in
The present invention relates to a harm removal device. [0002] 2. Description of the Related Art In recent years, computers and their applications have been developed.
Electronic controls have been developing remarkably,
The direction and scope of the development seems to be infinite.
For this reason, it is mainly used as electronic components used in computers.
Manufacturing technology of semiconductor electronic devices occupying important positions and their production
Production is also growing remarkably rapidly. [0003] As a semiconductor which is a raw material of these semiconductor elements,
For example, germanium (Ge) and silicon (Si) are often used,
Gallium arsenide (GaAs), gallium
Phosphorus (GaP) is also in practical use. [0004] The semiconductor element manufacturing process is performed, for example, by using a semiconductor circle.
A semiconductor pillar forming process for forming pillars, which is sliced and halved
A wafer forming step of forming a conductive wafer;
Masking, thin film formation, doping, etching, etc.
Element formation to form many elements by repeating
Process, the semiconductor wafer on which the elements are formed is divided into individual elements
Cutting process. In such a semiconductor manufacturing process, for example,
For example, very fine particulate dust of about 0.01 to 50 μm
Is known to occur, and also this particulate dust
Is prohibited to emit itself from the viewpoint of pollution prevention
Hazardous substances, or the gases containing them
Harmful substances in the atmosphere were absorbed or sorbed
It is known that Used in the semiconductor manufacturing process,
Is the harmful substance that is generated
System, arsenic system, phosphorus system, boron system, metal hydrogen system, fluorine system, halo
Gen / halides, nitrogen oxides, and others
You. As the harmful silicon-based gas, monosilane
(SiH_Four), Dichlorosilane (SiHCl_Two), Silicon trichloride
(SiHCl_Three), Silicon tetrachloride (SiCl_Four), Silicon tetrafluoride
(SiF_Four), Disilane (Si_TwoH₆), TEOS (Si (OC
_TwoH_Five)_Four) Are typical. As the arsenic-based harmful gas, arsine (AsH)
_Three), Arsenic fluoride (III) (AsF_Three), Arsenic fluoride (V) (As
F_Five), Arsenic (III) chloride (AsCl_Three), Arsenic chloride (V) (As
Cl_Five) Are typical.
Sphine (PH_Three), Phosphorus (III) fluoride (PF_Three), Phosphorus fluoride
(V) (PF_Five), Phosphorus (III) chloride (PCl_Three), Phosphorus chloride (V) (P
Cl_Five), Phosphorus oxychloride (POCl_Three) Are typical. As the boron-based harmful gas, diborane (B_TwoH
₆), Boron trifluoride (BF_Three), Boron trichloride (BCl_Three), Three smells
Boron (BBr)_Three) Are typical, and metal hydrogen-based
As harmful gas, hydrogen selenide (H_TwoSe), monogerma
(GeH_Four), Hydrogen telluride (H_TwoTe), stibine (Sb
H_Three), Tin hydride (SnH_Four) Are typical, and fluorine-based
The harmful gas is methane tetrafluoride (CF_Four), Trifluoride
Tan (CHF_Three), Methane difluoride (CH_TwoF_Two), Hexafluoride
Propane (C_ThreeH_TwoF₆), Propane octafluoride (C_ThreeF₈)Such
Is mentioned as an example. Halogen and halide which are harmful gases
As fluorine (F_Two), Hydrogen fluoride (HF), chlorine (C
l_Two), Hydrogen chloride (HCl), carbon tetrachloride (CCl_Four), Hydrogen bromide
(HBr), nitrogen trifluoride (NF_Three), Sulfur tetrafluoride (S
F_Four), Sulfur hexafluoride (SF₆), Tungsten hexafluoride (V
I) (WF₆), Molybdenum hexafluoride (VI) (MoF₆), Tetrasalt
Germanium (GeCl)_Four), Tin tetrachloride (SnCl_Four), Pentachloride
Antimony (V) (SbCl_Five), Tungsten hexachloride (VI)
(WCl₆), Molybdenum hexachloride (MoCl₆) Are typical
is there. The harmful gas nitrogen oxides include monoacids.
Nitrogen oxide (NO), nitrogen dioxide (NO_Two), Nitrous oxide (N_Two
O), and other harmful gases include sulfide
Hydrogen (H_TwoS), ammonia (NH_Three), Trimethylamine
(CH_Three)_ThreeN can be mentioned as an example. In addition, flammable ethane (C_TwoH
₆), Propane (C_ThreeH₈), Nitrogen (N_Two), Oxygen (O_Two), Al
Gon (Ar), carbon dioxide (CO_Two)
It is known that fine particles are generated by the above method. [0013] Today, the spirit of pollution prevention is being thoroughly enforced.
Exhaust gas containing these harmful components and dust
Release into the atmosphere is not allowed, as shown in FIG.
Exhaust gas is extracted from exhaust gas source 1 by pump 2 and collected.
The dust is removed from the exhaust gas by the device 3 and
Process such as oxidation, reduction, sorption, adsorption, etc.
Process and release it into safe and clean gas.
Is being used. As the above dust collecting device, a cyclone, a screen,
Rubber, venturi rubber, bag filter, electricity
Using a well-known dust collector such as a dust collector, looper, sedimentation chamber
However, the particle size that can collect dust is finer than
Applicant has high dust capacity and small installation area.
Patent application title (Japanese Patent Application No. 5-113927)
It is preferable to use an arrangement. The above harmful substance removing device is shown in FIG.
The harmful substance treatment material 102 is placed in a cylindrical casing 101.
Is used. This casing 10
1 has an inlet 103 at the lower end and an outlet 104 at the upper end.
And the holding frame 105 fixed to the lower part of the inner circumference.
Have. The holding frame 105 is made of a perforated plate.
A support plate 106 is provided.
The material 102 is supported. The harmful substance treating material 102 has a particle size of 5 to 18, for example.
Substrate formed in granular or lump size of about mm
Harmful substance treatment material, and the base material is, for example, active
Made of charcoal, ceramics, synthetic resin, etc.
Materials include platinum catalyst, alkali metal silicate, phosphoric acid
Metal salts are frequently used. [0018] SUMMARY OF THE INVENTION This conventional harmful substance removal
In the device, the exhaust gas containing harmful components is
01 straight from the entrance 103 to the exit 104
Enclosure (range indicated by hatching with fine pitch in FIG. 5) Flow path 1
08 and easy to flow while the flow path formation range is narrow
Harmful substances around the flow path 108
While the processing ability of the processing material 102 is hardly exhibited,
Within a short time, the ability to remove harmful substances will decrease and break through,
There is a disadvantage that the life is shortened. In a conventional harmful substance removing apparatus,
An inlet 103 is provided at the lower end of the casing 101,
A port 104 is provided to allow exhaust gas to flow through the flow path 10 by the action of atmospheric pressure.
8 and the flow in the casing 101 is suppressed.
The exhaust gas is also contacted with the harmful material 102 outside the road 108.
But the pressure of the pump 2 acts on the exhaust gas.
Has little effect on enhancing its effectiveness.
No. Further, in the conventional harmful substance removing apparatus, the harmful substance
Since the support plate 106 for supporting the base material is a perforated plate, it is not opened.
Exhaust gas may flow into the area corresponding to the mouth
There is no contact with granular or massive processing material at the opening.
As a result, the use efficiency of harmful substances is reduced,
To increase the breakthrough time
It is disadvantageous in extending the life. The present invention has been made in view of the above technical problems.
Gas generated in the semiconductor device manufacturing process, etc.
Hazardous substances contained in the casing
To make the most effective contact with the whole material
In addition to increasing the utilization rate of this harmful material,
Substance removal equipment that can realize high processing capacity and long life
The purpose is to provide. [0022] The harmful substance removing apparatus according to the present invention.
In order to achieve the above objectives,
The steps were taken. [0023] [0024] [0025] [0026]That is, the harmful substance removing device of the present inventionAt one end
A cylindrical case having an inlet and an outlet at the other end
Particles or lumps that adsorb or decompose harmful substances
Equipped with a processing material filling sectionHazardous material removal deviceIn, on
In the filling part of the processing material, the upper part, upper and lower middle part or lower part
At least at the top of the part from the inner peripheral surface of the casing
A surrounding baffle projecting into the filling portion of the processing material is arranged,
Support plate for receiving harmful substances at the lower part of the casing
The supporting plate is a perforated plate and the upper surface of the perforated plate.
And the surrounding baffle plate
So that the movement of exhaust gas goes to the inside of the treated material.
Slant from end to tip, and the angle of inclination is 15 to
The angle is 80 degrees. [0027] [0028] Hereinafter, the present invention will be described in more detail in order to clarify the present invention.
explain. The entrance of the hazardous substance removal device of the present invention
It is connected to a harmful substance source that produces exhaust gas containing it. This harmful substance source is a waste gas containing harmful substances.
Is not particularly limited as long as it generates a semiconductor
Used in the semiconductor pillar formation process during the body manufacturing process
Phase growth chamber, plasma vapor phase growth chamber, device formation process
Thin film forming chamber used in the process, doping
Chamber, etching chamber, plasma etching chamber,
Cleaning treatment used during the cleaning process or between each process
A room etc. can be mentioned as a typical example. The entrance of the harmful substance removing device of the present invention is directly
It may be connected to these hazardous material sources,
If dust is generated at the same time, clogging
And dust with harmful substances pass through the harmful substance removal device
To prevent harmful substances from being generated through dust collectors.
It is preferable to connect. The present invention directly concerns this dust collector.
Since it is not a title, its detailed description is omitted.
You. The outlet of the harmful substance removing device of the present invention is directly
It may be in communication with the atmosphere, and another hazardous substance removal device
Alternatively, it may be connected to the atmosphere via a silencer. The casing may have a cylindrical shape.
For example, it may be a polygonal cylinder such as a square, hexagon, octagon, etc.
And may be elliptical cylinder,
Center around the axis in order to progress as evenly as possible
Is preferably formed in a cylindrical shape that is uniform in all directions
And the inlet and outlet are coaxial with the casing.
Preferably. The material of the casing is not particularly limited.
However, airtightness, chemical resistance, acid resistance, alkali resistance, weather resistance
It is preferable to have the property and sufficient mechanical strength.
Corrosion resistant treatment of fiber reinforced synthetic resin, rubber lining etc.
Metals such as iron and steel including stainless steel
Can be. Among these, processing such as cleaning inside and outside
Those that are easy or unnecessary are more preferable.
Stainless steel is frequently used. The above-mentioned harmful substance treating material has been conventionally used.
For example, a treating agent may be applied to a granular or massive substrate.
What is carried is used. The substrate itself absorbs harmful substances.
May not have the ability to attach or sorb
Has the ability to adsorb or sorb harmful substances
It is preferable to use those that have
No. A base material capable of adsorbing or sorbing harmful substances
For example, activated carbon, ceramics, zeolite, aluminum
Mina, acid clay and the like. Further, as a base material, a treatment agent described below is used in a granular form.
A lump formed in a lump may be used. As the treating agent, gold such as aluminum phosphate
Genus phosphate, aluminosilicate, alkali metal silicate,
A platinum catalyst or the like is frequently used. [0040] Other processing agents include the following.
An example can be given. That is, Na_TwoO, K_Two
O, CaO, MgO, CuO, Ag_TwoO, alumina, dioxide
Group I, Group II, Group III of the periodic table such as ruconium or
Group IV oxides or compounds containing these oxides
So, (Mc₁) x (Mc_Two) y (O) z etc. are used
Is done. However, the above Mc₁Is a group I, group II or group III
Element_TwoIs III such as aluminum (Al)
Group, carbon (C), silicon (Si), titanium (Ti), zirconium
Group IV, such as zirconium (Zr), V, such as phosphorus (P) and vanadium (V)
O is oxygen, x, y, and z are each
It is an integer. In the harmful substance removing device of the present invention,
In addition, the upper part or the upper and lower middle
At least the upper part of the casing or lower part inside the casing
Surrounding baffles projecting from the peripheral surface into the processing material filling section
Placed in the lower part of the casing to receive harmful substances
A support plate is provided, the support plate comprising a perforated plate and the perforated plate.
And a pen that projects upward from the upper surface of the board.
The surrounding baffle plate moves the exhaust gas toward the inside of the processing material.
From its base end to its tip, and its inclination
The most significant feature is that the angle is 15 to 80 degrees. That is, this is composed of a surrounding baffle and a case.
A support plate for receiving harmful substances is located in the lower part of the ring.
This support plate is a perforated plate and projects upward from the top
And the synergistic effect of
Therefore, the exhaust gas containing more harmful substances is
Because it can be distributed, the utilization rate of harmful substances
Which can be increased, which results in higher throughput and longer
The service life can be further improved. [0043] [0044] [0045] [0046]By the way, in the harmful substance removing device of the present invention,
TheBecause the inner peripheral surface of the casing is smooth,
Depending on the shape, between harmful substance treatment materials in the filling part of the treatment material
The inner peripheral surface of the casing and the hazardous material treatment
A flow path with low flow resistance is formed between the
The inner peripheral surface of the casing with low dynamic resistance is
Exhaust gas flows in the flow path between the two, which reduces treatment efficiency
And the surrounding area of the processing material
May be easily missed. Then,Hazardous substance removal device of the present inventionSo, on
In the filling part of the processing material, the upper part, upper and lower middle part or lower part
Processed from at least the upper part of the part from the inner peripheral surface of the casing
A peripheral baffle protruding into the filling portion of the material is provided. In this case, the surrounding baffle plate transfers the exhaust gas.
So that the movement goes to the inside of the processing material, From the base end to the tip
It is provided at an angle to the angle of 15 to 80.
Degrees, preferably 30 to 60 degrees
You. Also, there is a support plate for supporting the harmful substance treating material.
With perforated plateFrom being formedCorresponding to the non-opening part
Exhaust gas flows into the part at allButNo, and opening
As a result, the granular or massive processing material directly contacts and blocks
In order to increase the efficiency of using harmful materials,
It is disadvantageous and prolongs breakthrough time and prolongs life
It is disadvantageous in terms of security. Therefore,Hazardous substance removal device of the present inventionAt
Receives harmful substance treatment material in the lower part of the above casing
A support plate is provided for the perforated plate and the support plate.
There is a cage that projects upward from the upper surface of the perforated plate.Because
To. As described above, the filling portion of the processing material is formed from the perforated plate.
Because it is supported in a state of being lifted by the paddle, processing
Most of the flow passages formed in the material filling section are
It is not closed by the opening, it opens between the eyes of the shikoko and gathers
(Flow channel aggregation effect), and the exhaust gas flows into the filling section of the processing material.
In addition, the outflow of exhaust gas from the treatment material
Without stopping, this allows the entire filling area of the treatment material
Exhaust gas can be flowed evenly over the Also, the height of the sashimi is limited by the use of harmful substance treating materials.
In order to support it away from the perforated plate,3 ~ 30mm is preferred
It is more preferable to set the thickness to 5 to 15 mm..
When the height is less than 3mm, make the eyes of the sashimi smaller.
And the flow path resistance may increase.
Not good, on the other hand, when the height of the paddle exceeds 30 mm
Is higher than the limit of the channel aggregation effect
It is not necessary to use
Not good. In addition, the size of the eyes of the pond is
Smaller than particle size, set to 1 to 12 mmPrefer to do
I. [0053] [0054] [0055] [0056] [0057] [0058] [0059] [0060] [0061] [0062] [0063][Action] Hazardous substance removal device of the present invention According to the processing
In the filling part of the material, the upper part, upper and lower middle part or lower part
At least on the inner peripheral surface of the casing
A surrounding baffle that protrudes into the material filling section is
A support plate for receiving harmful substances is provided at the lower part of the housing
The support plate is located between the perforated plate and the upper surface of the perforated plate.
And the surrounding baffle plate is exhausted.
From the base end so that the gas moves toward the inside of the processing material
Incline toward the tip, and the angle of inclination is 15 to 80 degrees
Because of the synergistic effect,
Exhaust gas containing harmful substances is circulated throughout the treatment material filling section
Exhaust gas and harmful material treatment material.
It has the effect of being extremely good and capable of removing harmful substances efficiently.
Because [0064] [0065] [0066] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, harmful substance removal according to one embodiment of the present invention will be described.
The apparatus will be described specifically with reference to the drawings.
It is not limited to this. 1 and 2,
This harmful substance removing device has a harmful substance treatment inside the casing 41.
The casing 41 is filled with a material 42.
It has an inlet 43 at the end and an outlet 44 at the lower end.
The inlet 43 generates exhaust gas containing harmful substances.
Connected to harmful source. This harmful substance source is a waste gas containing harmful substances.
Is not particularly limited as long as it generates a semiconductor
Used in the semiconductor pillar formation process during the body manufacturing process
Phase growth chamber, plasma vapor phase growth chamber, device formation process
Thin film forming chamber used in the process, doping
Chamber, etching chamber, plasma etching chamber,
Cleaning treatment used during the cleaning process or between each process
A room etc. can be mentioned as a typical example. The inlet 43 directly generates these harmful substances.
May be connected to the
When it is produced, clogging with dust and harmful substances adhere
Prevent dust from passing through the hazardous material removal device.
Is preferred. Therefore, the entrance 43 of the harmful substance removing device 4
Is, for example, as shown in FIG.
Connected to the harmful substance generation source 1 via the control unit. The outlet 44 of the harmful substance removing device 4
Can be communicated to the atmosphere through another hazardous substance removal device.
In this embodiment, the single-stage harmful substance removing device 4 is used.
Harmful substance removal effect was obtained.
To the atmosphere. The casing 41 may have a cylindrical shape.
For example, a polygonal cylinder such as a square, hexagon, and octagon, an ellipse
Although a cylindrical shape or the like may be used, here, the harmful substance treating material 42 is used.
To ensure that deterioration proceeds as evenly as possible,
Is formed in a cylindrical shape that is uniform in all directions around
And the outlet 44 is provided coaxially with the casing 41.
You. The material of the casing 41 is not particularly limited.
Airtightness, chemical resistance, acid resistance, alkali resistance,
Those having weather resistance and sufficient mechanical strength are preferable,
For example, fiber-reinforced synthetic resin, rubber lining inside
Metals such as iron and stainless steel including stainless steel
Which can be used. In this embodiment,
Cleaning is easy or unnecessary.
The casing 41 is formed using stainless steel. At the lower part of the inner peripheral surface of the casing 41,
The support frame 45, which also serves as reinforcement for
The peripheral edge of the support plate 46 is supported by the holding frame 45. This support plate 46 is shown in the enlarged sectional view of FIG.
As shown, a perforated plate 47 and a paddle 48 fixed to the upper surface thereof
Consists of The pond 48 has a perforated material 42 for treating harmful substances.
It must be formed so that it can be supported away from the plate 47.
Therefore, the size of the eyes is smaller than the particle size of the harmful material.
Is also small, and in this case, it is particularly set to about 1 to 12 mm.
You. In addition, the paddle 48 may have a lattice shape in a plane.
However, in this embodiment, the configuration is simplified and the cost is reduced.
It is formed in a stripe shape in order to achieve The height of the paddle 48 also depends on the harmful substance treating material 4.
2 must be set so that it can be supported away from the perforated plate 47.
Therefore, it is preferable to set the thickness to about 3 to 30 mm. Paddle
When the height of the 48 is less than 3 mm,
It is necessary to reduce the
On the other hand, when the height of the paddle 48 exceeds 30 mm
Means that the effect of the channel assembly by the paddle 48 has reached its limit and
In addition, the cost of materials for the paddle 48 is high.
This is not preferred. The harmful substance treating material 42 is conventionally used.
Can be used, for example, to process granular or massive substrates
What carried the agent is used. The substrate itself absorbs harmful substances.
May not have the ability to attach or sorb
Has the ability to adsorb or sorb harmful substances
It is preferable to use those that have
No. A base material capable of adsorbing or sorbing harmful substances
For example, activated carbon, ceramics, zeolite, aluminum
Mina, acid clay and the like. Further, as a base material, a treatment agent to be described later is granulated.
A lump formed in a lump may be used. As the treating agent, gold such as aluminum phosphate may be used.
Genus phosphate, alkali metal silicate, aluminosilicate,
A platinum catalyst or the like is frequently used. Further, the other treating agents include the following.
An example can be given. That is, Na_TwoO, K_Two
O, CaO, MgO, CuO, Ag_TwoO, alumina, dioxide
Group I, Group II, Group III of the periodic table such as ruconium or
Group IV oxides or compounds containing these oxides
So, (Mc₁) x (Mc_Two) y (O) z etc. are used
Is done. However, the above Mc₁Is a group I, group II or group III
Element_TwoIs III such as aluminum (Al)
Group, carbon (C), silicon (Si), titanium (Ti), zirconium
Group IV, such as zirconium (Zr), V, such as phosphorus (P) and vanadium (V)
O is oxygen, x, y, and z are each
It is an integer. In this harmful substance removing device 4, the case
And the harmful substance processing material 42 is filled
Between the filler (shown by hatching)
An interval is provided between the inlet 41 and the processing material filling section.
At an appropriate distance from each of these, the entrance baffle
49 is provided, and the filling portion of the processing material is
At least upper part of upper part, upper middle part or lower part
In this embodiment, a casing is provided between the upper portion and the upper and lower intermediate portions.
Peripheral baffles 5 projecting from the inner peripheral surface into the processing material filling portion
0 and 51 are provided. The entrance baffle 49 is
It is necessary to cover the entrance 43 from inside, and
Although it is not necessary to cover the mouth 43 entirely,
In the example, the inlet 43 is formed to have a larger diameter than the
The flow of exhaust gas flowing from the center of the casing 41
From the radial direction. The shape of the entrance baffle 49 is not particularly limited.
Not from the entrance 43 side,
Although it may be formed in a shape or an ellipse, in this embodiment,
A circle concentric with the inlet 43 to distribute the exhaust gas evenly
Is formed. Further, the entrance baffle 49 has, for example, a conical shape.
A three-dimensional board such as a chrysanthemum board may be used, but in this embodiment,
Is formed in a flat plate shape that can simplify the shape and reduce costs
are doing. By the way, it is necessary to provide the entrance baffle 49.
As a result, the exhaust gas flowing from the inlet 43 is separated in the peripheral direction.
But the inner peripheral surface of the casing 41 is smooth.
Formed between the harmful substance processing material in the filling part of the processing material
The inner peripheral surface of the casing 41 and the harmful substance treating material
A flow path with low flow resistance is formed between them, and this flow resistance
Flow path between the inner peripheral surface of the small casing and the hazardous material treatment material
Exhaust gas flows through the furnace, which reduces the processing efficiency.
In particular, the area around the treatment material filling section is easily broken through in a short time.
There is a risk of becoming. Then, the processing material in the casing 41 is
At the top of the filling section, the processing material
A surrounding baffle 50 protruding into the filling portion is provided, and a casing is provided.
The flow of exhaust gas along the inner peripheral surface of 41
I am being guided. In this case, the surrounding baffle 50 is shown in FIG.
As shown, point diagonally downward from the proximal end to the distal end.
So that the exhaust gas moves toward the inside of the treated material.
In particular, in FIG. 1, α is 15 to 80 degrees,
In particular, it is desirable that the angle is in the range of 30 to 60 degrees.
In the example, it is formed at 45 degrees. If α is less than 15 degrees, the effect is poor.
It is meaningless, while exhausting beyond 80 degrees
It is not desirable because it may hinder the distribution of the products. Further, a casing is provided at an intermediate portion of the processing material filling portion.
A peripheral baffle made of reinforcing ribs fixed to the inner peripheral surface of 41
51, and the surrounding baffle plate 51 also has
The same role as the plate 50 is given. In this harmful substance removing apparatus, the inlet 43
The flow of exhaust gas flowing from
It is spread radially in the casing 41. Also, the entrance
Appropriate spacing is provided between the baffle plate 49 and the processing material filling section
Of the exhaust gas flow spread in the radial direction
The part flows into the back side of the entrance baffle 49 and is filled with the processing material.
The exhaust gas flows uniformly over the entire end face of the part. Thus, the entire harmful substance treating material 42 is
Since the exhaust gas can be brought into contact evenly,
In addition to the improved efficiency, partial harmful material treatment 4
2 can be prevented from deteriorating and the breakthrough time can be extended
Therefore, the life can be extended. In addition, at the exit side of the harmful substance treatment material packed layer,
The filling portion of the processing material is separated from the perforated plate 47 by
As it is supported in a floating state, it can be
Most of the flow path formed in the non-opening of the perforated plate 47
Therefore, they are not blocked, and open and gather
Exhaust gas is partially blocked in the treatment material filling section.
Without disturbing the flow throughout the treatment material
It is. Thus, the entire harmful substance treating material 42 is
Because uniform exhaust gas can be contacted,
In addition to the improved efficiency, partial harmful material treatment 4
2 can be prevented from deteriorating and the breakthrough time can be further extended.
As a result, the life can be further extended. And, by the synergistic action of these,
Smaller amount of harmful material 42 is equal to or better than the conventional example
Capacity and the same amount of hazardous material
When used, the breakthrough time is about 50 to 100 times that of the conventional example.
It became longer. In this embodiment, the casing 41
Since the exhaust gas flows from above, the pressure of the exhaust gas
Although there is no danger that the hazardous material will be lifted upward,
The mouth 44 and the inlet 43 are alternated so that
Around the upper and lower middle part
1 and the upper surrounding baffle 50, the harmful material 42
Is prevented from rising, so there is no problem. FIG. 3 shows another embodiment of the harmful substance removing apparatus of the present invention.
An example is shown in this harmful substance removal device.
The removal device has an inlet 43 at one end and another
Instead of having an outlet 44 at one end, an inlet 43 is provided at one end.
And an outlet 44 is provided at one end to fill the processing material.
From the processing gas outlet side 53 to the outlet 4 at one end.
4 is provided with a passage 54 communicating with
In addition to the above effects of the harm removal device,
Size, or mount the above harmful substance removal devices on the installation surface.
The ladder can be installed
It becomes easy. Incidentally, as shown in FIG.
Need not necessarily be provided in the center of the casing 41.
No. That is, even with such a configuration, the liquid flows in from the inlet 43.
The exhaust gas flow hits the entrance baffle 49 and
In the radial direction in the tub 41 and filling of the processing material
Over the entire end face of the filling part of the processing material due to the resistance of the part
As a result, the exhaust gas flows evenly. The apparatus for removing harmful substances according to the present invention is different from the above-mentioned embodiment.
It is not limited, and the above configurations may be combined.
By doing so, it does not deviate from the technical idea of the present invention.
Various modifications are possible, and this harmful substance removing device
Uses two or more, for example, in series
Or, combine them in parallel and in parallel to remove harmful substances.
To ensure more reliable operation and to ensure that the
It may be configured so that it can be used immediately. [0100] 【The invention's effect】In the harmful substance removing device of the present invention,
Having the above configuration, having an inlet at one end and an outlet at the other end
Adsorb or dispose of harmful substances in a cylindrical casing
Hazardous substance with a filling part of granular or massive processing material to be broken
In the removing device, the filling portion of the processing material is provided with an upper portion or
At least in the upper part of the middle part or the lower part
The circumference projecting from the inner peripheral surface of the thing into the filling part of the processing material
A surrounding baffle is located, and harmful substances are
A support plate for receiving the processing material is provided, and the support plate is a perforated plate.
And a pen that projects upward from the upper surface of the perforated plate.
In the surrounding baffle, the movement of exhaust gas is inside the processing material.
From the base end to the tip so that
The angle of inclination is 15 to 80 degrees.
BecauseExhaust gas containing harmful substances flows all over the treatment material
And the surrounding baffle allows exhaust
The movement can be directed towards the inside of the treatment material.
As a result, the contact between the harmful substances and the exhaust gas is extremely effective.
As a result, the utilization rate of harmful substances can be increased.
Therefore, high processing capacity and long life can be realized.
It has an effect. [0101]Also, the harmful substance removing device of the present inventionIn
A support plate that receives harmful substance treatment material is
The perforated plate and the upper surface of this perforated plate
With a pen that projects upwardSince there, Filling of processing materials
Supports the filling part raised from the perforated plate by the pen
IsAndTherefore, the flow path formed in the processing material
Most are not blocked by the non-perforated part of the perforated plate,
It is opened and gathered between the eyes (flow channel assembling effect),
Inflow of treatment material into filling section and exhaust gas from treatment material filling section
Spillage is not partially blocked, and
Exhaust gas can flow evenly over the entire filling section
As a result, not only can the utilization rate of the harmful substance treatment material be increased,
It has the effect of realizing high processing capacity and long life.
You. [0102] [0103]That is, in the harmful substance removing device of the present invention,
The upper part, upper middle part or lower part of the processing material
At least the upper part of the above from the inner peripheral surface of the casing
A surrounding baffle that protrudes into the processing material
A support plate for receiving harmful substances is
The support plate is provided from the perforated plate and the upper surface of the perforated plate.
And a surrounding baffle plate
So that the movement of exhaust gas goes to the inside of the treated material.
Slant from end to tip, and the angle of inclination is 15 to
Because it is configured at 80 degrees, by the synergistic effect,
Exhaust gas containing harmful substances is further distributed throughout the treatment material filling section
The exhaust gas and the harmful substance treatment material.
The contact is extremely good and harmful substances can be removed efficiently.
As a result, the utilization rate of harmful material
It has the effect of realizing long processing life and long life.
You. [0104] [0105]

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a sectional view of a harmful substance removing device according to one embodiment of the present invention. FIG. 2 is an enlarged sectional view of a support plate of the harmful substance removing device according to one embodiment of the present invention. FIG. 3 is a sectional view of a harmful substance removing apparatus according to another embodiment of the present invention. FIG. 4 is a configuration diagram of a harmful substance removal system to which the present invention and a conventional example are applied. FIG. 5 is a sectional view of a conventional example. [Description of Signs] 4 Harmful substance removing device 41 Casing 42 Harmful substance treatment material 43 Inlet 44 Outlet 46 Support plate 47 Perforated plate 48 Pencil 49 Inlet baffle plate 50 Peripheral baffle plate 51 Peripheral baffle plate

Claims (1)

(1) Claims 1. A cylindrical casing having an inlet at one end and an outlet at the other end is provided with a filling section of a granular or lump-shaped treatment material for adsorbing or decomposing harmful substances. Harmful substances
In the removing device, a surrounding baffle plate projecting from the inner peripheral surface of the casing into the filling portion of the processing material is disposed at an upper portion or at least an upper middle portion or a lower portion of the filling portion of the processing material, A support plate for receiving the harmful substance treatment material is disposed at a lower portion of the inside, the support plate has a perforated plate and a pen projecting upward from the upper surface of the perforated plate, and the surrounding baffle plate is The exhaust gas is inclined from the base end to the tip so that the movement of the exhaust gas is directed toward the inside of the treatment material, and the inclination angle is 1
A harmful substance removing device characterized by having a temperature of 5 to 80 degrees.