JP3410227B2 - Thermal head and manufacturing method thereof - Google Patents

Thermal head and manufacturing method thereof

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Publication number
JP3410227B2
JP3410227B2 JP21198794A JP21198794A JP3410227B2 JP 3410227 B2 JP3410227 B2 JP 3410227B2 JP 21198794 A JP21198794 A JP 21198794A JP 21198794 A JP21198794 A JP 21198794A JP 3410227 B2 JP3410227 B2 JP 3410227B2
Authority
JP
Japan
Prior art keywords
heat storage
thermal head
storage layer
solution
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP21198794A
Other languages
Japanese (ja)
Other versions
JPH0852892A (en
Inventor
いづみ 野村
和夫 戸澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
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Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP21198794A priority Critical patent/JP3410227B2/en
Publication of JPH0852892A publication Critical patent/JPH0852892A/en
Application granted granted Critical
Publication of JP3410227B2 publication Critical patent/JP3410227B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、感熱記録あるいは熱転
写記録に使用するサーマルヘッドとその製造方法に係
り、特に蓄熱層の構造とその形成方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thermal head used for heat-sensitive recording or thermal transfer recording and a manufacturing method thereof, and more particularly to a structure of a heat storage layer and a forming method thereof.

【0002】[0002]

【従来の技術および発明が解決しようとする課題】従来
のサーマルヘッドは、一般に、図5(A)に示すよう
に、アルミナ等の絶縁性材料あるいは金属板に絶縁被覆
を施してなる基板1の表面にガラスでなる蓄熱層2を形
成し、その上に発熱抵抗体層3を形成し、その上に駆動
回路に接続される多数本のリード電極4aとコモン電極
4bを形成してその間に発熱部5を構成し、これらを耐
熱性、耐摩耗性の保護膜6で覆ってなる。
2. Description of the Related Art In the conventional thermal head, generally, as shown in FIG. 5A, an insulating material such as alumina or a substrate 1 formed by applying an insulating coating to a metal plate is used. A heat storage layer 2 made of glass is formed on the surface, a heating resistor layer 3 is formed thereon, and a large number of lead electrodes 4a and common electrodes 4b connected to a driving circuit are formed thereon, and heat is generated between them. The part 5 is formed, and these are covered with a heat-resistant and wear-resistant protective film 6.

【0003】上述のように、従来は蓄熱層2としてガラ
スを用いられて来たが、このガラスは熱伝導率が0.7
W/m・K程度であり、印字効率を上げる(すなわち発
熱部5における消費電力を低減する)には熱伝導率の低
いものを用いる必要があるため、低消費電力化を意図し
て、ポリイミド樹脂のように、熱伝導率の低い(一般の
ポリイミド樹脂は0.15W/m・K程度の熱伝導率を
有する)耐熱性樹脂を蓄熱層2に用い、この蓄熱層2を
20μm程度の厚みに形成している。
As described above, glass has been conventionally used as the heat storage layer 2, but this glass has a thermal conductivity of 0.7.
It is about W / m · K, and it is necessary to use a material having a low thermal conductivity in order to increase the printing efficiency (that is, reduce the power consumption in the heat generating part 5), and therefore polyimide with the intention of reducing the power consumption. Like the resin, a heat-resistant resin having a low thermal conductivity (general polyimide resin has a thermal conductivity of about 0.15 W / m · K) is used for the heat storage layer 2, and the heat storage layer 2 has a thickness of about 20 μm. Is formed.

【0004】しかし図5(A)に示した平面構造のもの
においては、感熱紙や転写フィルム等との接触圧力が低
いため、たとえ上述のような熱伝導率の低いポリイミド
樹脂を蓄熱層2として用いても、それほど印字効率を上
げることができなかった。また、一般的な低熱伝導率の
ポリイミド樹脂を用いた場合、蓄熱層2を20μm以上
に形成すると、蓄熱効果が過大となり、「尾引き」や
「にじみ」等印字品質の劣化を来すという問題点もあっ
た。また、印字媒体(紙)を曲げて印字する必要があっ
た。
However, in the case of the planar structure shown in FIG. 5 (A), since the contact pressure with the thermal paper or the transfer film is low, the polyimide resin having a low thermal conductivity as described above is used as the heat storage layer 2. Even when used, the printing efficiency could not be improved so much. Further, when a general polyimide resin having a low thermal conductivity is used, if the heat storage layer 2 is formed to have a thickness of 20 μm or more, the heat storage effect becomes excessive, resulting in deterioration of print quality such as “tailing” or “bleeding”. There were also points. Further, it is necessary to bend the print medium (paper) for printing.

【0005】一方、特開昭63−64767号公報ある
いは特開平1−93375号公報に記載のように、蓄熱
層としてポリイミド樹脂を断面形状がR状をなすように
形成したものがある。このような樹脂は、一般に、溶媒
中にポリイミド樹脂またはその前躯体を溶かした溶液
(以下、ポリイミド樹脂の溶液と称する)を基板上に塗
布し、加熱して溶媒を蒸発させ、反応硬化させることに
より形成する。
On the other hand, as described in JP-A-63-64767 or JP-A-1-93375, there is a heat storage layer in which a polyimide resin is formed to have an R-shaped cross section. Such a resin is generally prepared by coating a solution of a polyimide resin or its precursor in a solvent (hereinafter referred to as a solution of a polyimide resin) on a substrate, heating it to evaporate the solvent, and curing the reaction. Formed by.

【0006】しかしながら、ポリイミド樹脂の溶液を基
板に塗布する場合、基板上に整然と一定の幅で断面形状
がR状になるように塗布することは困難であり、蓄熱機
能にばらつきを生じるおそれがあるという問題点があっ
た。
However, when the solution of the polyimide resin is applied to the substrate, it is difficult to apply it on the substrate in an orderly and constant width so that the cross-sectional shape is R-shaped, and the heat storage function may vary. There was a problem.

【0007】本出願人は、このような問題点を解決する
手段として、図5(B)に示すように、基板1に線状に
凸部1aを形成し、該凸部1a上に流動状態のポリイミ
ド樹脂の溶液を表面張力を利用して塗布し、加熱して反
応させることにより、断面形状がR状をなす蓄熱層2を
形成したものを開発し、特願平5−52867号として
提案した。
As a means for solving such a problem, the applicant of the present invention forms a linear convex portion 1a on a substrate 1 as shown in FIG. 5 (B), and a fluid state on the convex portion 1a. The polyimide resin solution described above was applied using surface tension, heated and reacted to develop a heat storage layer 2 having an R-shaped cross section, and proposed as Japanese Patent Application No. 5-52867. did.

【0008】このように、線状に形成した凸部1aに流
動性を有するポリイミド樹脂の溶液を塗布すれば、溶液
の表面張力により、塗布幅が凸部1aの幅によって規制
され、正確な蓄熱層の幅設定が可能となり、蓄熱層2の
断面の両端付近は表面張力により丸みを持つが、中央部
は溶媒の蒸発とともに平らになり、台形に近いR状の断
面形状を持つ蓄熱層2が形成され、発熱体部は、従来の
部分グレーズの蓄熱層2を持つサーマルヘッドよりも曲
率半径が大きいため、印字時のプラテンの接触圧力の点
から、印字効率向上の面で改善の余地があった。
As described above, when the fluid of the polyimide resin having fluidity is applied to the linearly formed convex portion 1a, the coating width is regulated by the width of the convex portion 1a due to the surface tension of the solution, and the accurate heat storage is achieved. The width of the layer can be set, and both ends of the cross section of the heat storage layer 2 are rounded due to surface tension, but the center part becomes flat with the evaporation of the solvent, and the heat storage layer 2 having an R-shaped cross section close to a trapezoid is formed. Since the formed heating element has a larger radius of curvature than the thermal head having the conventional partial glaze heat storage layer 2, there is room for improvement in terms of printing efficiency in terms of the contact pressure of the platen during printing. It was

【0009】本発明は、上記の問題点に鑑み、蓄熱層と
してポリイミド樹脂を用いたサーマルヘッドにおいて、
蓄熱層を一定の幅で整然と形成でき、かつ断面形状をよ
り真円に近い円弧状に形成したサーマルヘッドとその製
造方法を提供することを目的とする。
In view of the above problems, the present invention provides a thermal head using a polyimide resin as a heat storage layer,
An object of the present invention is to provide a thermal head in which a heat storage layer can be regularly formed with a constant width and whose cross-sectional shape is formed into an arc shape that is closer to a perfect circle, and a manufacturing method thereof.

【0010】[0010]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、基板上に蓄熱層を介して発熱部を形成し
たサーマルヘッドにおいて、前記基板に形成した凸部上
に、ポリイミド樹脂からなりかつ断面形状が真円度公差
10μm以下の円弧状をなす蓄熱層を、前記樹脂を溶媒
中に溶かした溶液の複数回の塗布加熱により積層して形
成したことを特徴とする。
In order to achieve the above object, the present invention provides a thermal head in which a heat generating portion is formed on a substrate through a heat storage layer, and a polyimide resin is formed on the convex portion formed on the substrate. And a circular heat storage layer having a circular cross-sectional shape with a circularity tolerance of 10 μm or less is formed by laminating a solution obtained by dissolving the resin in a solvent a plurality of times.

【0011】また、本発明によるサーマルヘッドの製造
方法は、基板上に蓄熱層を介して発熱部を形成されるサ
ーマルヘッドを製造する方法において、基板に形成され
た凸部上に、第1塗布層としてのポリイミド樹脂を溶媒
中に溶かした溶液を塗布し、該溶液の塗布後に、反応硬
化温度以下であり、かつ一部再溶解可能な温度において
塗布後の該溶液を加熱して乾燥し、該乾燥した層上に第
2塗布層として同じ材質のポリイミド樹脂を溶媒中に溶
かした溶液を塗布し、前記同様に反応硬化温度以下で加
熱して乾燥し、その後、反応硬化温度以上で加熱するこ
とにより、断面形状が真円度公差10μm以下の円弧状
をなすように蓄熱層を形成することを特徴とする。
The method of manufacturing a thermal head according to the present invention is the method of manufacturing a thermal head in which a heat generating portion is formed on a substrate via a heat storage layer, and the first coating is applied on the convex portion formed on the substrate. A solution obtained by dissolving a polyimide resin as a layer in a solvent is applied, and after the application of the solution, the reaction solution is heated at a temperature not higher than the reaction curing temperature, and the solution after application is heated and dried at a temperature at which it can be partially redissolved. A solution prepared by dissolving a polyimide resin of the same material in a solvent as the second coating layer is applied onto the dried layer, heated and dried at a reaction curing temperature or lower as described above, and then heated at a reaction curing temperature or higher. Thus, the heat storage layer is formed so that the cross-sectional shape is an arc shape having a circularity tolerance of 10 μm or less.

【0012】[0012]

【作用】本発明はポリイミド樹脂でなる蓄熱層を該樹脂
の溶液の複数回の塗布により形成したものであり、形成
面を凸部の上面としたことにより、蓄熱層の断面形状が
真円度公差10μm以下の円弧状に容易に形成される。
According to the present invention, a heat storage layer made of a polyimide resin is formed by applying a solution of the resin a plurality of times. The formation surface is the upper surface of the convex portion, so that the cross-sectional shape of the heat storage layer is round. It is easily formed in an arc shape with a tolerance of 10 μm or less.

【0013】また、本発明の方法において、基板凸部の
上面にポリイミド樹脂の溶液を塗布することにより、該
溶液は表面張力によって凸部上面に留まり、塗布幅が基
板凸部の幅内に整然と収まる。また、この塗布後の溶液
を反応硬化温度以下でかつ一部再溶解可能な温度で加熱
して乾燥し、第1塗布層を形成した上に、第2塗布層と
なるポリイミド樹脂の溶液を前の層からはみ出さない様
に塗布すると、第2塗布層は該溶液の表面張力によって
前の層の上面に留まる。この時、下地の塗布層は一部再
溶解するので、塗布された該溶液すなわち第2塗布層が
塗布前の溶液より高濃度となり、これを反応硬化温度以
下でかつ一部再溶解可能な温度で加熱乾燥すると、蓄熱
層中央部が円弧状に盛り上がった形状が形成できる。
Further, in the method of the present invention, by coating a solution of a polyimide resin on the upper surface of the convex portion of the substrate, the solution remains on the upper surface of the convex portion due to surface tension, and the coating width is regularly arranged within the width of the convex portion of the substrate. Fits. In addition, the solution after coating is heated at a temperature not higher than the reaction curing temperature and at a temperature at which it can be partially redissolved to dry it, to form a first coating layer, and then a solution of a polyimide resin to be a second coating layer is formed in advance. The second coating layer remains on the upper surface of the previous layer due to the surface tension of the solution when it is coated so as not to overflow the layer. At this time, since the underlying coating layer is partially redissolved, the applied solution, that is, the second coating layer, has a higher concentration than the solution before coating, and this is at a temperature below the reaction curing temperature and at which partial dissolution is possible. By heating and drying with, a shape in which the central portion of the heat storage layer rises in an arc shape can be formed.

【0014】このように、第1塗布層が凸部の頂部に形
成され、その上に第2塗布層が形成されるので、蓄熱層
を1層形成する場合に比較し、第2塗布層の溶液を塗布
した後、第2塗布層の濃度が高くなり、第2塗布層の塗
布後のR状が保ちやすくなり、蓄熱層の断面形状がより
丸く形成されやすくなる。
As described above, the first coating layer is formed on the top of the convex portion and the second coating layer is formed thereon, so that the second coating layer is formed as compared with the case where one heat storage layer is formed. After the application of the solution, the concentration of the second coating layer becomes high, the R-shape after the coating of the second coating layer is easily maintained, and the heat storage layer is more likely to be formed into a round cross-sectional shape.

【0015】[0015]

【実施例】図1(A)は本発明によるサーマルヘッドの
一実施例を示す断面図、図1(B)はその拡大図、図1
(C)はその蓄熱層の断面形状を示す構成図である。図
1において、1aはアルミナ等のセラミックでなる基板
1に切削加工や一体成形等によって形成された凸部であ
り、発熱体列形成方向すなわち紙面に垂直方向に長く形
成されるものであり、実施例においてはその高さh1を
500μm、凸部1aの頂部の幅W1を1.0mmとし
た。該凸部1aの両側は、膜形成を考慮して、垂直面で
はなく、傾斜面1bとして形成される。すなわち、凸部
1aは断面形状が台形をなすように形成される。2aは
本発明により該凸部1a上に設けられたポリイミド樹脂
で形成された第1塗布層、2bは該第1塗布層上に同じ
材質の樹脂により断面形状がR状をなすように形成され
た第2塗布層である。第1塗布層2a、第2塗布層2b
は加熱し反応硬化した後は一体化した蓄熱層となり、そ
れらの境界部もなくなる。
1A is a sectional view showing an embodiment of a thermal head according to the present invention, and FIG. 1B is an enlarged view thereof.
(C) is a block diagram showing the cross-sectional shape of the heat storage layer. In FIG. 1, reference numeral 1a denotes a convex portion formed by cutting or integral molding on a substrate 1 made of ceramic such as alumina, which is formed to be long in the heating element row forming direction, that is, the direction perpendicular to the paper surface. In the example, the height h1 is 500 μm, and the width W1 of the top of the protrusion 1a is 1.0 mm. Both sides of the convex portion 1a are formed as inclined surfaces 1b instead of vertical surfaces in consideration of film formation. That is, the convex portion 1a is formed to have a trapezoidal cross section. Reference numeral 2a denotes a first coating layer formed of a polyimide resin provided on the convex portion 1a according to the present invention, and 2b is formed on the first coating layer by a resin of the same material so that its cross-sectional shape is R-shaped. It is the second coating layer. First coating layer 2a, second coating layer 2b
After heating and reaction hardening, they become an integrated heat storage layer, and their boundaries disappear.

【0016】具体的には、ポリイミド樹脂を、溶媒とし
てのN−メチル−ピロリドン中に30wt%程度溶解さ
せて粘度が10000cps程度の溶液とし、これを凸
部1a上にディスペンサを用いて塗布した。このよう
に、凸部1a上にポリイミド樹脂の溶液を塗布した際、
凸部1aの上面と両側傾斜面1bとのなす角度α(図1
(B)参照)が180度を超えることにより、表面張力
によって傾斜面1bを流下せず、角部で留まり、上面の
両側で丸みを持ち、両側の角部の間に位置する凸部の頂
部が平らになる断面形状を持つ膜厚35μmの第1塗布
層2aが形成された。このようにポリイミド樹脂の溶液
を塗布したものについて、60℃で30分加熱すること
により、溶媒を除いて乾燥させた。図2(A)は、この
ようにして形成された第1塗布層の断面膜厚分布を表面
粗さ計で測定したものであり、縦軸を横軸の約10倍強
に拡大して示すグラフである。この実測値の曲線を、そ
の内接円aと外接円bからなる2つの同心円で囲んだ場
合の同心円の半径の差を求めた。ただし、小さい方の内
接円aは、塗布層の両端の点を通る円とした。この2つ
の同心円の半径の差を求めると、4.504−4.49
1=13(μm)となり、真円度公差は13μmであっ
た。
Specifically, a polyimide resin was dissolved in N-methyl-pyrrolidone as a solvent at a concentration of about 30 wt% to form a solution having a viscosity of about 10,000 cps, which was applied onto the convex portion 1a using a dispenser. In this way, when the solution of the polyimide resin is applied on the convex portion 1a,
An angle α formed by the upper surface of the convex portion 1a and the inclined surfaces 1b on both sides (see FIG.
(See (B)) exceeds 180 degrees, it does not flow down the inclined surface 1b due to surface tension, stays at the corners, has roundness on both sides of the upper surface, and the top of the convex portion located between the corners on both sides. A first coating layer 2a having a film thickness of 35 μm and having a flattened sectional shape was formed. The thus coated solution of the polyimide resin was heated at 60 ° C. for 30 minutes to remove the solvent and dried. FIG. 2 (A) shows the cross-sectional film thickness distribution of the first coating layer thus formed, measured with a surface roughness meter, and the vertical axis is shown to be about 10 times larger than the horizontal axis. It is a graph. The difference in radius between the concentric circles when the curve of the measured values was surrounded by two concentric circles consisting of the inscribed circle a and the circumscribed circle b was determined. However, the smaller inscribed circle a was a circle passing through the points at both ends of the coating layer. The difference between the radii of these two concentric circles is 4.504-4.49.
1 = 13 (μm), and the roundness tolerance was 13 μm.

【0017】次に第2塗布層2bを形成するための前記
第1塗布層2a形成用と同じ材質のポリイミド樹脂の溶
液を、前記のように乾燥させた第1塗布層2a上に前記
と同様の方法で塗布し、60℃で30分加熱し乾燥させ
た。この時、図1(C)に示すように、第1塗布層2a
の上面が凸部1aの頂部より狭幅(W1>W2)に形成
され、その上に第2塗布層2bが形成されるので、蓄熱
層を1層形成する場合に比較し、断面形状をR状に形成
しやすくなる。また、第1塗布層2aは、第2塗布層2
bを塗布した後に一部再溶解することにより、第2塗布
層2bが高濃度で高粘度になり、第2塗布層2bの塗布
後の形、すなわち中央部が円弧状に盛り上がった形状に
保持される。これを60℃で30分加熱し、その後、2
00℃で40分加熱し、さらに400℃で60分の加熱
を行って反応硬化させ、これにより、第1、第2塗布層
2a、2bが一体化された蓄熱層2を形成した。
Next, a solution of a polyimide resin of the same material as that for forming the first coating layer 2a for forming the second coating layer 2b is formed on the first coating layer 2a dried as described above in the same manner as described above. It was applied by the method described above, and heated at 60 ° C. for 30 minutes to be dried. At this time, as shown in FIG. 1C, the first coating layer 2a
Is formed to have a narrower width (W1> W2) than the top of the convex portion 1a, and the second coating layer 2b is formed thereon, so that the cross-sectional shape is R as compared with the case where one heat storage layer is formed. Easier to form. Further, the first coating layer 2a is the second coating layer 2
By partially re-dissolving after applying b, the second coating layer 2b has a high concentration and high viscosity, and the second coating layer 2b has a shape after coating, that is, a shape in which the central portion is raised in an arc shape. To be done. This is heated at 60 ° C for 30 minutes and then 2
It was heated at 00 ° C. for 40 minutes and further heated at 400 ° C. for 60 minutes to be cured by reaction, thereby forming the heat storage layer 2 in which the first and second coating layers 2a and 2b were integrated.

【0018】図2(B)は、このようにして形成された
第1、第2塗布層でなる蓄熱層2の断面膜厚分布を表面
粗さ計で測定したものであり、縦軸を横軸の約10倍強
に拡大して示すグラフであり、最大膜厚h2は70μm
となった。この実測値の曲線を、その内接円cと外接円
dの2つの同心円で囲んだ場合の同心円の半径の差を求
めた。ただし、小さい方の円cは、塗布層の両端の点を
通る円とした。この2つの同心円の半径の差を求める
と、1.777−1.771=6(μm)となり、真円
度公差は6μmであった。なお、ポリイミド樹脂として
は、−Si−O−による架橋によって熱伝導率を従来の
ものより高く、0.4W/m・K程度にしたものを用い
た。
FIG. 2B shows the cross-sectional thickness distribution of the heat storage layer 2 formed of the first and second coating layers thus formed, measured with a surface roughness meter, and the vertical axis represents the horizontal axis. It is a graph enlarged to approximately 10 times the axis, and the maximum film thickness h2 is 70 μm.
Became. The difference in radius of the concentric circles when the curve of the measured values was surrounded by two concentric circles of the inscribed circle c and the circumscribed circle d was determined. However, the smaller circle c was a circle passing through the points at both ends of the coating layer. The difference between the radii of the two concentric circles was 1.777-1.771 = 6 (μm), and the roundness tolerance was 6 μm. The polyimide resin used had a thermal conductivity of about 0.4 W / m · K, which was higher than that of the conventional one, by crosslinking with —Si—O—.

【0019】その後、発熱抵抗体層3、電極層4a、4
bを蒸着(スパッタリング、CVD法等であってもよ
い)によって積層し、フォトリソグラフィにより、発熱
抵抗体層3およびリード電極4a、コモン電極4bを形
成し、その上に保護層6を形成し、リード電極4a、コ
モン電極4bの外部回路との接続部を露出させた。
After that, the heating resistor layer 3, the electrode layers 4a, 4
b is laminated by vapor deposition (may be sputtering, CVD method or the like), and the heating resistor layer 3, the lead electrode 4a, and the common electrode 4b are formed by photolithography, and the protective layer 6 is formed thereon. The connecting portions of the lead electrode 4a and the common electrode 4b with the external circuit were exposed.

【0020】なお、発熱体駆動用IC(図示せず)は基
板1あるいは該基板1と別の基板に搭載してそのICと
リード電極4aの露出部とをワイヤボンディング等によ
り接続し、その他必要な部品を実装してサーマルヘッド
を作製した。
A heating element driving IC (not shown) is mounted on the substrate 1 or a substrate different from the substrate 1 and the IC and the exposed portion of the lead electrode 4a are connected by wire bonding or the like. A thermal head was manufactured by mounting various components.

【0021】図3(A)は発熱体の平面形状を、縦横の
寸法が350μm×167μmとなるように形成したと
きの電力と光学濃度との関係を、蓄熱層2としてポリイ
ミド樹脂を使用した図5(A)に図示の従来品と本発明
品とについて比較して示すもので、本発明による場合、
従来例と同じ濃度を出すのに電力を従来品の約52%に
低下させることができた。また、先に出願した特願平5
−52867号において示した構造の凸部を同じ幅に形
成し、1層塗りにより蓄熱層を形成した場合に比較し、
電力を約85%に低下させることができた。
FIG. 3A shows the relationship between the electric power and the optical density when the planar shape of the heating element is formed so that the vertical and horizontal dimensions are 350 μm × 167 μm, and a polyimide resin is used as the heat storage layer 2. FIG. 5 (A) shows a comparison between the conventional product and the product of the present invention shown in FIG.
The electric power could be reduced to about 52% of that of the conventional product in order to obtain the same concentration as that of the conventional example. In addition, Japanese Patent Application No. 5 filed earlier
Compared to the case where the convex portion of the structure shown in -52867 is formed in the same width and the heat storage layer is formed by one-layer coating,
The power could be reduced to about 85%.

【0022】また、図3(B)は赤外線放射温度計によ
る発熱部駆動時の温度測定の結果を、ガラスを蓄熱層と
して使用した場合と本発明品とについて比較して示す図
であり、温度の降下は蓄熱層としてのガラスを用いた場
合と同等で、「尾引き」や「にじみ」等の画質劣化は見
られなかった。
Further, FIG. 3 (B) is a diagram showing the results of temperature measurement by the infrared radiation thermometer when driving the heat generating part, comparing the case where glass is used as the heat storage layer and the product of the present invention. Was the same as when glass was used as the heat storage layer, and no image deterioration such as "tailing" or "bleeding" was observed.

【0023】本発明において、図1(A)に示す第1塗
布層2aの底部の幅W1は、0.8mm〜4mmに設定
することが好ましい。この幅Wが0.8mm未満になる
と、R形状に第2塗布層2bの断面形状を形成できず、
また4mmを超えると、第2塗布層2bの上面が平坦化
する傾向が生じ、所望の形状が得られない。真円度公差
は10μm以下であれば、必要なプラテンの接触圧力が
得られる。また、これらの蓄熱層2の熱伝導率は、印字
効率を上げ、しかも過度の蓄熱がなされないように、材
質の選定によって0.2W/m・K〜0.6W/m・K
とすることが好ましく、また、最大膜厚h2は適正な蓄
熱効果を得る上で20μm〜120μmとすることが好
ましい。
In the present invention, the width W1 of the bottom of the first coating layer 2a shown in FIG. 1A is preferably set to 0.8 mm to 4 mm. If the width W is less than 0.8 mm, the cross-sectional shape of the second coating layer 2b cannot be formed in the R shape,
If it exceeds 4 mm, the upper surface of the second coating layer 2b tends to be flattened, and a desired shape cannot be obtained. If the roundness tolerance is 10 μm or less, the required contact pressure of the platen can be obtained. Further, the thermal conductivity of these heat storage layers 2 is 0.2 W / m · K to 0.6 W / m · K depending on the material selection so as to increase printing efficiency and prevent excessive heat storage.
The maximum film thickness h2 is preferably 20 μm to 120 μm in order to obtain an appropriate heat storage effect.

【0024】上記実施例においては、2回の塗布により
蓄熱層2を形成したが、3回以上の塗布により蓄熱層2
を形成することも可能である。
In the above embodiment, the heat storage layer 2 was formed by applying twice, but the heat storage layer 2 was formed by applying three times or more.
Can also be formed.

【0025】図4(A)、(B)の例は、端面型のサー
マルヘッドに本発明を適用した例であり、図4(A)の
例は、前記同様に加工あるいは膜形成によって凸部1a
を形成し、その上に蓄熱層2を形成した例であり、図4
(B)は基板1の端面の角部を凸部として利用すること
により、樹脂の回り込みを防止して蓄熱層2を形成した
例である。
The examples shown in FIGS. 4A and 4B are examples in which the present invention is applied to an end face type thermal head, and the example shown in FIG. 1a
4 is an example in which the heat storage layer 2 is formed on the
(B) is an example in which the heat storage layer 2 is formed by using the corners of the end face of the substrate 1 as protrusions to prevent resin from wrapping around.

【0026】[0026]

【発明の効果】請求項1によれば、同じ材質のポリイミ
ド樹脂でなる複数層の塗布層を樹脂の溶液の塗布加熱に
より積層して形成することにより、蓄熱層を1層形成し
た場合よりも、蓄熱層ないしサーマルヘッドのプラテン
との接触面をよりプラテン側に突出させたR面に形成す
ることが可能となり、プラテンとの接触圧が増大し、さ
らに印字効率を向上させることが可能となり、かつ印字
媒体を曲げずに使用可能なサーマルヘッドを容易に実現
できる。また、蓄熱層は、凸部により幅および高さが一
様に揃えられるため、発熱体列方向について、蓄熱機能
を一定に揃えることができる。また、蓄熱層を1層で形
成する場合に比較し、断面を円弧状に形成する蓄熱層の
幅、高さの設計の自由度が大となる。
According to the first aspect of the present invention, a plurality of coating layers made of the same polyimide resin are laminated by applying and heating a resin solution, so that a single heat storage layer is formed. The contact surface of the heat storage layer or the platen of the thermal head with the platen can be formed on the R surface protruding further to the platen side, the contact pressure with the platen is increased, and the printing efficiency can be further improved. Moreover, it is possible to easily realize a thermal head that can be used without bending the print medium. Moreover, since the width and height of the heat storage layer are made uniform by the convex portions, the heat storage function can be made uniform in the direction of the heating element array. In addition, the degree of freedom in designing the width and height of the heat storage layer having a circular cross section is greater than that in the case where the heat storage layer is formed as a single layer.

【0027】請求項2、3によれば、好適な蓄熱効果が
得られる蓄熱層が形成できる。
According to the second and third aspects, it is possible to form a heat storage layer that can obtain a preferable heat storage effect.

【0028】請求項4によれば、熱伝導率を好適な値に
設定したことにより、好適な蓄熱効果が得られる蓄熱層
が形成できる。
According to the fourth aspect, by setting the thermal conductivity to a suitable value, it is possible to form a heat storage layer that can obtain a suitable heat storage effect.

【0029】請求項5によれば、前記サーマルヘッドを
製造するに当たり、基板に形成された凸部上に、再溶解
可能な温度で加熱乾燥してポリイミド樹脂の第1塗布層
を形成し、該第1塗布層上に第2塗布層としてポリイミ
ド樹脂の溶液を塗布するため、第2塗布層がその塗布後
に樹脂濃度が大きくなり、加熱乾燥した後も第2塗布層
の塗布後の形状を保ち易くなり、真円度公差10μm以
下の円弧状の断面を持つポリイミド樹脂からなる蓄熱層
の形成がより容易に行える。
According to a fifth aspect of the present invention, in manufacturing the thermal head, the first coating layer of the polyimide resin is formed on the convex portion formed on the substrate by heating and drying at a temperature at which it can be redissolved. Since the polyimide resin solution is applied as the second coating layer on the first coating layer, the resin concentration of the second coating layer increases after the coating, and the shape of the second coating layer after coating is maintained even after being dried by heating. This facilitates formation of a heat storage layer made of a polyimide resin having an arc-shaped cross section with a circularity tolerance of 10 μm or less.

【図面の簡単な説明】[Brief description of drawings]

【図1】(A)は本発明によるサ−マルヘッドの一実施
例を示す断面図、(B)はその部分拡大図、(C)はそ
の蓄熱層の断面形状を示す構成図である。
FIG. 1A is a sectional view showing an embodiment of a thermal head according to the present invention, FIG. 1B is a partially enlarged view thereof, and FIG. 1C is a configuration diagram showing a sectional shape of a heat storage layer thereof.

【図2】(A)は本発明の一実施例における第1塗布層
の加熱乾燥後の断面膜厚分布図、(B)は第2塗布層を
形成し、加熱乾燥、反応硬化後の断面膜厚分布図であ
る。
FIG. 2A is a cross-sectional film thickness distribution diagram of the first coating layer after heating and drying in one embodiment of the present invention, and FIG. 2B is a cross-sectional view after forming the second coating layer, heating and drying, and reacting and curing. It is a surface film thickness distribution chart.

【図3】(A)は本発明品と従来品の電力と印字濃度と
の関係を対比して示す図、(B)は、本発明品と従来品
の発熱体の駆動時の温度変化を対比して示す図である。
FIG. 3A is a diagram showing the relationship between the electric power and the print density of the product of the present invention and the conventional product in comparison, and FIG. 3B is the temperature change during driving of the heating element of the product of the present invention. It is a figure shown in contrast.

【図4】(A)、(B)は端面型のサ−マルヘッドにつ
いて本発明を適用した他の実施例を示す断面図である。
4A and 4B are cross-sectional views showing another embodiment to which the present invention is applied to an end face type thermal head.

【図5】(A)は従来のサーマルヘッドの一例を示す断
面図、(B)は本出願人が前に出願したサーマルヘッド
の一例を示す断面図である。
5A is a sectional view showing an example of a conventional thermal head, and FIG. 5B is a sectional view showing an example of a thermal head previously filed by the present applicant.

【符号の説明】[Explanation of symbols]

1:基板、1a:凸部、1b:傾斜面、2:蓄熱層、2
a:第1塗布層、2b:第2塗布層、3:抵抗体層、4
a:リード電極、4b:コモン電極、5:発熱部、6:
保護層
1: substrate, 1a: convex portion, 1b: inclined surface, 2: heat storage layer, 2
a: first coating layer, 2b: second coating layer, 3: resistor layer, 4
a: lead electrode, 4b: common electrode, 5: heat generating part, 6:
Protective layer

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平6−320771(JP,A) 特開 昭59−146870(JP,A) 特開 平4−288244(JP,A) 特開 昭58−59865(JP,A) 特開 平6−115130(JP,A) (58)調査した分野(Int.Cl.7,DB名) B41J 2/335 ─────────────────────────────────────────────────── --- Continuation of the front page (56) Reference JP-A-6-320771 (JP, A) JP-A-59-146870 (JP, A) JP-A-4-288244 (JP, A) JP-A-58- 59865 (JP, A) JP-A-6-115130 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) B41J 2/335

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基板上に蓄熱層を介して発熱部を形成した
サーマルヘッドにおいて、前記基板に形成した凸部上
に、ポリイミド樹脂からなりかつ断面形状が真円度公差
10μm以下の円弧状をなす蓄熱層を、前記樹脂を溶媒
中に溶かした溶液の複数回の塗布加熱により積層して形
成したことを特徴とするサーマルヘッド。
1. A thermal head having a heat generating portion formed on a substrate via a heat storage layer, wherein an arc shape made of a polyimide resin and having a circularity tolerance of 10 μm or less is formed on a convex portion formed on the substrate. A thermal head comprising a heat storage layer formed by laminating a solution obtained by dissolving the resin in a solvent a plurality of times by heating.
【請求項2】請求項1において、前記凸部の頂部の幅が
0.8mm〜4.0mmであることを特徴とするサーマ
ルヘッド。
2. The thermal head according to claim 1, wherein the width of the top of the convex portion is 0.8 mm to 4.0 mm.
【請求項3】請求項1または2において、前記樹脂の中
央部の最も厚い部分の膜厚が20μm〜120μmであ
ることを特徴とするサーマルヘッド。
3. The thermal head according to claim 1, wherein the thickness of the thickest part of the central portion of the resin is 20 μm to 120 μm.
【請求項4】請求項1から3までのいずれかにおいて、
前記樹脂の熱伝導率が0.2〜0.6W/m・Kである
ことを特徴とするサーマルヘッド。
4. The method according to any one of claims 1 to 3,
A thermal head, wherein the resin has a thermal conductivity of 0.2 to 0.6 W / m · K.
【請求項5】基板上に蓄熱層を介して発熱部を形成され
るサーマルヘッドを製造する方法において、基板に形成
された凸部上に、第1塗布層としてのポリイミド樹脂を
溶媒中に溶かした溶液を塗布し、該溶液の塗布後に、反
応硬化温度以下であり、かつ一部再溶解可能な温度にお
いて塗布後の該溶液を加熱して乾燥し、該乾燥した層上
に第2塗布層として同じ材質のポリイミド樹脂を溶媒中
に溶かした溶液を塗布し、前記同様に反応硬化温度以下
で加熱して乾燥し、その後、反応硬化温度以上で加熱す
ることにより、断面形状が真円度公差10μm以下の円
弧状をなすように蓄熱層を形成することを特徴とするサ
ーマルヘッドの製造方法。
5. A method of manufacturing a thermal head in which a heat generating portion is formed on a substrate via a heat storage layer, wherein a polyimide resin as a first coating layer is dissolved in a solvent on the convex portion formed on the substrate. The applied solution, and after the application of the solution, the solution after application is heated and dried at a temperature not higher than the reaction curing temperature and at which the solution can be partially redissolved, and a second coating layer is formed on the dried layer. As a solution of a polyimide resin of the same material dissolved in a solvent as above, and dried by heating below the reaction curing temperature in the same manner as above, and then heating above the reaction curing temperature, the cross-sectional shape roundness tolerance A method of manufacturing a thermal head, characterized in that the heat storage layer is formed so as to form an arc shape of 10 μm or less.
JP21198794A 1994-08-12 1994-08-12 Thermal head and manufacturing method thereof Expired - Fee Related JP3410227B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21198794A JP3410227B2 (en) 1994-08-12 1994-08-12 Thermal head and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21198794A JP3410227B2 (en) 1994-08-12 1994-08-12 Thermal head and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH0852892A JPH0852892A (en) 1996-02-27
JP3410227B2 true JP3410227B2 (en) 2003-05-26

Family

ID=16615020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21198794A Expired - Fee Related JP3410227B2 (en) 1994-08-12 1994-08-12 Thermal head and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP3410227B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008218347A (en) * 2007-03-07 2008-09-18 Gs Yuasa Corporation:Kk Battery
JP5622492B2 (en) * 2010-09-03 2014-11-12 ローム株式会社 Thermal head and method for manufacturing thermal head
JP7297564B2 (en) * 2019-07-03 2023-06-26 ローム株式会社 Thermal print head and manufacturing method thereof
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Also Published As

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