JPH05177859A - Production of thermal head - Google Patents

Production of thermal head

Info

Publication number
JPH05177859A
JPH05177859A JP34694791A JP34694791A JPH05177859A JP H05177859 A JPH05177859 A JP H05177859A JP 34694791 A JP34694791 A JP 34694791A JP 34694791 A JP34694791 A JP 34694791A JP H05177859 A JPH05177859 A JP H05177859A
Authority
JP
Japan
Prior art keywords
insulating substrate
drive circuit
thermal head
circuit elements
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34694791A
Other languages
Japanese (ja)
Inventor
Shinji Hirata
伸二 平田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP34694791A priority Critical patent/JPH05177859A/en
Publication of JPH05177859A publication Critical patent/JPH05177859A/en
Pending legal-status Critical Current

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  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

PURPOSE:To enhance printing quality by preventing the curving of an insulating substrate and eliminating the irregularity in printing density. CONSTITUTION:After drive circuit elements are linearly arranged on an insulating substrate 23, the insulating substrate 23 is curved by predetermined curving quantity in a predetermined direction using a jig 40. Thereafter, a molding resin is applied to the insulating substrate so as to cover the drive circuit elements and, after heating, the jig 40 is detached to cool the resin.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ファクシミリ装置やワ
ードプロセッサなどの印画出力装置として用いられるサ
ーマルヘッドの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a thermal head used as a print output device such as a facsimile machine or a word processor.

【0002】[0002]

【従来の技術】図6は典型的な従来例のサーマルヘッド
1の断面図であり、図7はサーマルヘッド1の斜視図で
ある。サーマルヘッド1はアルミニウムなどから成る放
熱板2上にセラミックから成る絶縁基板3が固定され、
絶縁基板3上にはガラスから成る蓄熱層4が形成され
る。絶縁基板3を全体に被覆して窒化タンタルTa34
などから成る抵抗体層5がスパッタリングなどで形成さ
れ、この上にアルミニウムなどから成る共通電極6およ
び個別電極7および信号ライン8がパターン形成され
る。共通電極6および個別電極7で挟まれる抵抗体層5
の部分が発熱抵抗体9として構成され、図6の紙面垂直
方向に多数構成される。この発熱抵抗体9の配列領域を
含んで窒化ケイ素Si34などから成る保護膜10が形
成される。
2. Description of the Related Art FIG. 6 is a sectional view of a typical conventional thermal head 1, and FIG. 7 is a perspective view of the thermal head 1. In the thermal head 1, an insulating substrate 3 made of ceramic is fixed on a heat dissipation plate 2 made of aluminum or the like,
A heat storage layer 4 made of glass is formed on the insulating substrate 3. The insulating substrate 3 is entirely covered to cover tantalum nitride Ta 3 N 4
A resistor layer 5 made of, for example, is formed by sputtering or the like, and a common electrode 6 made of aluminum or the like, an individual electrode 7, and a signal line 8 are patterned thereon. Resistor layer 5 sandwiched by common electrode 6 and individual electrode 7
6 is formed as the heat generating resistor 9, and a large number are formed in the direction perpendicular to the paper surface of FIG. A protective film 10 made of silicon nitride Si 3 N 4 or the like is formed including the array region of the heating resistors 9.

【0003】前記信号ライン8は放熱板2に絶縁基板3
に隣接して固定される外部配線基板11から供給される
印画データや各種制御信号などを、各発熱抵抗体9を発
熱駆動する駆動回路素子12に入力する。駆動回路素子
12は個別電極7および信号ライン8に亘ってフェイス
ダウンボンディングで接続される。このような駆動回路
素子12は図6の紙面垂直方向に多数配列される。駆動
回路素子12を接続した後、駆動回路素子12の配置領
域の絶縁基板3上に材料としてエポキシ樹脂などから成
る熱硬化形の樹脂層を、絶縁基板3の全面積に対し例と
して20%程度となるように塗布する。この後、絶縁基
板3を120〜150℃の温度で30分〜1時間加熱
し、当該樹脂層を硬化させ、駆動回路素子12の保護膜
13が形成されサーマルヘッド1が構成される。
The signal line 8 includes a heat sink 2 and an insulating substrate 3
The print data and various control signals supplied from the external wiring substrate 11 fixed adjacent to are input to the drive circuit element 12 that drives each heating resistor 9 to generate heat. The drive circuit element 12 is connected by face-down bonding across the individual electrode 7 and the signal line 8. A large number of such drive circuit elements 12 are arranged in the direction perpendicular to the paper surface of FIG. After connecting the drive circuit elements 12, a thermosetting resin layer made of an epoxy resin or the like is used as a material on the insulating substrate 3 in the area where the drive circuit elements 12 are arranged. To be applied. After that, the insulating substrate 3 is heated at a temperature of 120 to 150 ° C. for 30 minutes to 1 hour to cure the resin layer, and the protective film 13 of the drive circuit element 12 is formed to form the thermal head 1.

【0004】[0004]

【発明が解決しようとする課題】このような従来技術に
おいて、エポキシ樹脂の熱膨張率αr=2.2×10-5
-1であり、絶縁基板3の熱膨張率αb=0.7×10
-5-1であることが知られている。前記保護膜13の形
成工程では矩形板状で平坦な絶縁基板3にエポキシ樹脂
などの樹脂層を塗布しこの後、加熱する。この加熱工程
では樹脂層は前記温度範囲で平衡状態として硬化する。
すなわち絶縁基板3は平坦な状態を維持する。この後、
常温に冷却する際に、前記絶縁基板3と保護膜13との
熱膨張率の差に基づいて、保護膜13の収縮量が絶縁基
板3の収縮量よりも大きいことに起因し、絶縁基板3が
駆動回路素子12などが形成されている主面側と反対側
に凸に湾曲する。
In such a conventional technique, the coefficient of thermal expansion of epoxy resin αr = 2.2 × 10 -5
-1 , and the thermal expansion coefficient αb of the insulating substrate 3 = 0.7 × 10
It is known to be -5 ° C -1 . In the step of forming the protective film 13, a resin layer such as epoxy resin is applied to the flat insulating substrate 3 having a rectangular plate shape and then heated. In this heating step, the resin layer is cured in an equilibrium state within the above temperature range.
That is, the insulating substrate 3 maintains a flat state. After this,
Due to the difference in the coefficient of thermal expansion between the insulating substrate 3 and the protective film 13 at the time of cooling to room temperature, the amount of shrinkage of the protective film 13 is larger than the amount of shrinkage of the insulating substrate 3. Is convexly curved to the side opposite to the main surface side on which the drive circuit elements 12 and the like are formed.

【0005】本件発明者は日本工業規格(JIS)A列
4番の記録紙に対応する全長L1(232mm)のサー
マルヘッド1に対して撓みの状態を測定した。測定結果
は図8のラインC1に示される。すなわち絶縁基板3の
長手方向、すなわち主走査方向両端から中央部付近にな
るに従い次第に湾曲量が大きくなっており、最大湾曲量
d1は約1.2mmに達することが確認された。絶縁基
板3がこのような湾曲を生じると、絶縁基板3はその長
手方向に沿って実際の印画動作時に用いられるプラテン
ローラなどへの押圧力が異なることになり、印画濃度に
むらを生じるという課題を有している。
The inventor of the present invention measured the bending state of the thermal head 1 having a total length L1 (232 mm) corresponding to the recording paper of Japanese Industrial Standard (JIS) A4, No. 4. The measurement result is shown by line C1 in FIG. That is, it was confirmed that the bending amount gradually increased in the longitudinal direction of the insulating substrate 3, that is, in the vicinity of the central portion from both ends in the main scanning direction, and the maximum bending amount d1 reached about 1.2 mm. When the insulating substrate 3 has such a curvature, the insulating substrate 3 has a different pressing force on the platen roller or the like used during the actual printing operation along the longitudinal direction thereof, which causes uneven printing density. have.

【0006】本発明の目的は、上述の技術的課題を解消
し、印画濃度における濃度むらを解消して印画品質を向
上することができるサーマルヘッドの製造方法を提供す
ることである。
An object of the present invention is to solve the above technical problems and to provide a method of manufacturing a thermal head capable of eliminating the density unevenness in the print density and improving the print quality.

【0007】[0007]

【課題を解決するための手段】本発明は、絶縁基板の主
面に複数の発熱抵抗体と、該各発熱抵抗体に駆動電力を
供給する複数の駆動回路素子とを各々直線状に配列させ
るとともに前記駆動回路素子を樹脂層で被覆して成るサ
ーマルヘッドの製造方法において、下記(A)〜(C)
工程を含むことを特徴とするサーマルヘッドの製造方法
である。
According to the present invention, a plurality of heating resistors and a plurality of driving circuit elements for supplying driving power to the heating resistors are linearly arranged on a main surface of an insulating substrate. A method for manufacturing a thermal head, which is formed by coating the drive circuit element with a resin layer together with the following (A) to (C):
A method of manufacturing a thermal head, which comprises the steps of:

【0008】(A)絶縁基板を前記駆動回路素子が配列
される主面側が凸となるように湾曲させるとともに該主
面の駆動回路素子の配列領域に熱硬化性樹脂を塗布す
る。
(A) The insulating substrate is curved so that the main surface side on which the drive circuit elements are arranged is convex, and a thermosetting resin is applied to the arrangement area of the drive circuit elements on the main surface.

【0009】(B)絶縁基板を湾曲状態のまま加熱して
熱硬化性樹脂を硬化させる。
(B) The thermosetting resin is cured by heating the insulating substrate in a curved state.

【0010】(C)絶縁基板を冷却する。(C) Cool the insulating substrate.

【0011】[0011]

【作用】本発明に従えば、駆動回路素子が配列された主
面側に凸に絶縁基板を湾曲し、駆動回路素子の形成領域
に熱硬化性樹脂を塗布する。絶縁基板を湾曲状態のまま
加熱して熱硬化性樹脂を硬化させる。この後、絶縁基板
を冷却する。このとき熱硬化性樹脂の硬化時には絶縁基
板は前記のように湾曲した状態であり、この状態のまま
で熱硬化性樹脂は平衡状態で硬化する。この冷却工程で
絶縁基板および熱硬化性樹脂は収縮するが、樹脂の熱膨
張率が絶縁基板より大きい場合、絶縁基板を前記主面と
反対側に凸となる方向に屈曲させる。このとき、絶縁基
板は冷却に先立って予め湾曲されており、冷却による湾
曲と相殺されて絶縁基板がほぼ平坦な状態となる。
According to the present invention, the insulating substrate is curved in a convex shape on the main surface side on which the drive circuit elements are arranged, and the thermosetting resin is applied to the area where the drive circuit elements are formed. The insulating substrate is heated in a curved state to cure the thermosetting resin. Then, the insulating substrate is cooled. At this time, when the thermosetting resin is cured, the insulating substrate is in the curved state as described above, and the thermosetting resin is cured in the equilibrium state in this state. In this cooling step, the insulating substrate and the thermosetting resin shrink, but when the coefficient of thermal expansion of the resin is larger than that of the insulating substrate, the insulating substrate is bent in a direction convex to the side opposite to the main surface. At this time, the insulating substrate is curved in advance prior to cooling, and the bending due to cooling is offset to bring the insulating substrate into a substantially flat state.

【0012】[0012]

【実施例】図1は、本発明の一実施例に従うサーマルヘ
ッド21の断面図であり、図2はサーマルヘッド21の
分解斜視図である。サーマルヘッド21はたとえばアル
ミニウムなどの金属材料から成る放熱板22を備え、こ
の上にたとえばアルミナAl23系セラミックなどから
成る絶縁基板23が接着剤層30で固定される。絶縁基
板23上にはたとえばスクリーン印刷などの厚膜技術に
てケイ酸ガラスを例として層厚80μmに形成して成る
蓄熱層35が形成され、また厚膜共通電極層27が絶縁
基板23の外周に沿って形成される。
1 is a sectional view of a thermal head 21 according to an embodiment of the present invention, and FIG. 2 is an exploded perspective view of the thermal head 21. The thermal head 21 includes a heat dissipation plate 22 made of a metal material such as aluminum, on which an insulating substrate 23 made of alumina Al 2 O 3 based ceramic is fixed by an adhesive layer 30. A heat storage layer 35 is formed on the insulating substrate 23 by a thick film technique such as screen printing to have a layer thickness of 80 μm using silicate glass as an example, and the thick common electrode layer 27 is formed on the outer periphery of the insulating substrate 23. Formed along.

【0013】蓄熱層35上にはたとえば窒化タンタルT
34を数100Åの膜厚に形成して得られる抵抗体層
34、共通電極36、複数の個別電極37および信号ラ
イン29が形成され、直線状に配列される複数の発熱抵
抗体24が構成される。各発熱抵抗体24を被覆し、た
とえば窒化ケイ素Si34などから成り、たとえばスパ
ッタリングなどの薄膜技術により保護膜39が形成され
る。
On the heat storage layer 35, for example, tantalum nitride T
A plurality of heating resistors 24 arranged in a straight line are formed by forming a resistor layer 34, a common electrode 36, a plurality of individual electrodes 37 and a signal line 29, which are obtained by forming a 3 N 4 to a film thickness of several hundred Å. Is configured. Each heating resistor 24 is covered and is made of, for example, silicon nitride Si 3 N 4 or the like, and a protective film 39 is formed by a thin film technique such as sputtering.

【0014】前記アルミニウムなどをパターン形成して
得られる各個別電極37は所定数毎に駆動回路素子25
に接続され、この駆動回路素子25には外部から印画動
作用のデータや各種制御信号が入力される信号ライン2
9が接続される。これらの駆動回路素子25は例として
熱膨張率αr=2.2×10-5-1を有するエポキシ樹
脂などの合成樹脂材料から成る保護膜26で被覆され
る。
Each individual electrode 37 obtained by pattern-forming the aluminum or the like has a predetermined number of drive circuit elements 25.
And a signal line 2 to which data for printing operation and various control signals are externally input to the drive circuit element 25.
9 is connected. These drive circuit elements 25 are covered with a protective film 26 made of a synthetic resin material such as an epoxy resin having a coefficient of thermal expansion αr = 2.2 × 10 -5 ° C -1, for example.

【0015】前記駆動回路素子25は半田バンプを有す
るフリップチップとして構成され、絶縁基板23にフェ
ースダウンボンディング法にて接続される。駆動回路素
子25が接続された複数の信号ライン29には、ガラス
エポキシ樹脂から成る基板上に可撓性配線基板を固定し
て成る外部配線基板28が固定される。前記絶縁基板2
3および外部配線基板28は放熱板22上で接着剤層3
0によって固定される。また外部配線基板28および駆
動回路素子25の形成領域を被覆してカバー31が設け
られる。前記絶縁基板23およびその上に構成された電
極36,37、あるいは駆動回路素子25を含んでヘッ
ド基板33が構成され、このヘッド基板33は前記放熱
板22に固定される。
The drive circuit element 25 is formed as a flip chip having solder bumps, and is connected to the insulating substrate 23 by face down bonding. An external wiring board 28 formed by fixing a flexible wiring board on a board made of glass epoxy resin is fixed to the plurality of signal lines 29 to which the drive circuit elements 25 are connected. The insulating substrate 2
3 and the external wiring board 28 are disposed on the heat dissipation plate 22 with the adhesive layer 3
Fixed by 0. Further, a cover 31 is provided to cover the formation region of the external wiring board 28 and the drive circuit element 25. A head substrate 33 is configured to include the insulating substrate 23 and the electrodes 36 and 37 formed thereon or the drive circuit element 25, and the head substrate 33 is fixed to the heat dissipation plate 22.

【0016】このように構成されたサーマルヘッド21
はプラテンローラ32との間で感熱記録紙38に感熱印
画を行う。
The thermal head 21 thus constructed
Performs thermal printing on the thermal recording paper 38 with the platen roller 32.

【0017】図3は、本発明の一実施例のサーマルヘッ
ド21の製造工程を説明する工程図である。工程a1で
は、絶縁基板23上に蓄熱層35、抵抗体層34、共通
電極36、個別電極37および信号ライン29などの配
線パターンを形成し、発熱抵抗体24の形成領域を含ん
で前記保護膜39を形成する。工程a2では、配線パタ
ーンにおける各個別電極37と信号ライン29とにわた
り駆動回路素子25をボンディングする。
FIG. 3 is a process chart for explaining the manufacturing process of the thermal head 21 according to one embodiment of the present invention. In step a1, wiring patterns such as the heat storage layer 35, the resistor layer 34, the common electrode 36, the individual electrodes 37, and the signal lines 29 are formed on the insulating substrate 23, and the protective film including the formation region of the heating resistor 24 is formed. 39 is formed. In step a2, the drive circuit element 25 is bonded to each individual electrode 37 and the signal line 29 in the wiring pattern.

【0018】工程a3では、絶縁基板23を図4に示す
湾曲用の治具40で湾曲させる。この治具40の湾曲の
状態は図5(1)に示すように、前記絶縁基板23の全
長が例として日本工業規格A列4番の感熱記録紙に対応
する長さL1(232mm)のとき、治具40の図5
(1)に示す長さL2は前記長さL1程度に選ばれる。
治具40は長手方向に沿ってほぼ円弧状に湾曲し、長手
方向中央部付近での湾曲量d2は従来技術の項で説明し
た最大湾曲量d1(1.2mm)程度に選ばれる。しか
もその湾曲の方向が従来技術の項で図8を参照して説明
した絶縁基板と保護膜との熱膨張率の差に基づく絶縁基
板の駆動回路素子が搭載される主面側方向に凸となるよ
うに選ばれる。
In step a3, the insulating substrate 23 is bent by the bending jig 40 shown in FIG. As shown in FIG. 5A, the jig 40 is bent when the length of the insulating substrate 23 is L1 (232 mm) corresponding to the thermal recording paper of Japanese Industrial Standard A No. 4, for example. 5 of the jig 40
The length L2 shown in (1) is selected to be the length L1.
The jig 40 is curved in a substantially arc shape along the longitudinal direction, and the curving amount d2 near the central portion in the longitudinal direction is selected to be about the maximum curving amount d1 (1.2 mm) described in the section of the prior art. Moreover, the direction of the curvature is convex in the main surface side direction on which the drive circuit element of the insulating substrate is mounted, which is based on the difference in the coefficient of thermal expansion between the insulating substrate and the protective film described with reference to FIG. Chosen to be.

【0019】前記治具40の湾曲量d2は上述したよう
に絶縁基板23と保護膜26との熱膨張率αb,αrの
差と、温度の変化幅ΔTと絶縁基板23の全長L1とに
基づいて下式のように規定される。
As described above, the bending amount d2 of the jig 40 is based on the difference between the thermal expansion coefficients αb and αr of the insulating substrate 23 and the protective film 26, the temperature change width ΔT, and the total length L1 of the insulating substrate 23. Is defined as

【0020】[0020]

【数1】d2=(αr−αb)×ΔT×L1 すなわち、本実施例ではサーマルヘッド21を構成する
絶縁基板23と保護膜26との材質が明らかになった時
点で絶縁基板23の前記予め定める湾曲量d2を決定す
ることができる。
## EQU00001 ## d2 = (. Alpha.r-.alpha.b) .times..DELTA.T.times.L1 That is, in the present embodiment, when the materials of the insulating substrate 23 and the protective film 26 that constitute the thermal head 21 are clarified, the insulating substrate 23 is previously prepared. The determined bending amount d2 can be determined.

【0021】すなわちこのような湾曲状態の治具40を
用いて、図4に示されるように絶縁基板23に前記駆動
回路素子25が搭載される主面と反対側から当接させ、
絶縁基板23を治具40と反対側から押圧する。これに
より絶縁基板23は治具40の湾曲に沿った形状とな
る。
That is, using the jig 40 in such a curved state, the insulating substrate 23 is brought into contact with the insulating substrate 23 from the side opposite to the main surface on which the drive circuit element 25 is mounted, as shown in FIG.
The insulating substrate 23 is pressed from the side opposite to the jig 40. As a result, the insulating substrate 23 has a shape that follows the curve of the jig 40.

【0022】すなわち治具40を用いて絶縁基板23を
上述のように湾曲させた状態で、工程a4においてエポ
キシ樹脂あるいはシリコン樹脂などのモールド樹脂を駆
動回路素子25の配置領域にわたって塗布する。工程a
5ではモールド樹脂塗布後の絶縁基板23を、治具40
に装着して湾曲した状態のまま例として120〜150
℃の温度で30分〜1時間焼成し、前記モールド樹脂を
固化させる。工程a6では治具40から絶縁基板23を
取外し常温となるまで冷却する。
That is, while the insulating substrate 23 is curved using the jig 40 as described above, a mold resin such as epoxy resin or silicon resin is applied over the area where the drive circuit elements 25 are arranged in step a4. Process a
In the case of No. 5, the insulating substrate 23 coated with the mold resin is replaced with the jig 40
120 to 150 as an example with the lens attached to
The mold resin is solidified by baking at a temperature of C for 30 minutes to 1 hour. In step a6, the insulating substrate 23 is removed from the jig 40 and cooled to room temperature.

【0023】上述したように絶縁基板23は工程a4に
おいてモールド樹脂と絶縁基板23との熱膨張率αr,
αbとの相違に基づいて想定される湾曲方向への湾曲量
に関し、前記想定される湾曲方向と反対方向へ想定され
る湾曲量と同程度湾曲させている。したがって工程a
5,a6で加熱して固化させた後に冷却する際に、前記
絶縁基板23の熱膨張率αbと保護膜26の熱膨張率α
rとの相違に基づいて絶縁基板23が前記主面と反対側
に湾曲するが、この温度硬化に伴う湾曲は絶縁基板の前
記予め設定された湾曲を相殺することになり、冷却後の
配線基板23はほぼ平坦な状態を実現する。
As described above, in the insulating substrate 23, in the step a4, the thermal expansion coefficient αr of the mold resin and the insulating substrate 23,
Regarding the amount of bending in the bending direction assumed based on the difference from αb, the bending amount is set to the same degree as the amount of bending assumed in the direction opposite to the assumed bending direction. Therefore, step a
5 and a6 are heated and solidified and then cooled, the thermal expansion coefficient αb of the insulating substrate 23 and the thermal expansion coefficient α of the protective film 26.
The insulating substrate 23 bends to the side opposite to the main surface based on the difference from r, but the curvature due to this temperature curing cancels the preset curvature of the insulating substrate, and the wiring board after cooling. 23 realizes a substantially flat state.

【0024】本件発明者は、本件実施例において冷却後
の絶縁基板23の湾曲量を測定した。その結果は図5
(2)のラインC2に示される。すなわち冷却後の絶縁
基板23は、0.1mm程度の湾曲が見られる程度に平
坦化されていることが確認された。
The inventor of the present invention measured the amount of bending of the insulating substrate 23 after cooling in the present example. The result is shown in Figure 5.
It is shown in line C2 of (2). That is, it was confirmed that the insulating substrate 23 after cooling was flattened to the extent that a curvature of about 0.1 mm was observed.

【0025】したがって本実施例ではサーマルヘッド2
1を構成する絶縁基板23を従来技術に比較し、格段に
平坦性を有するようにできる。これにより印画動作を行
うに際して、絶縁基板23がプラテンローラ31に長手
方向に沿って均等な圧接力で当接するようにでき、印画
濃度のむらを解消することができる。
Therefore, in this embodiment, the thermal head 2
It is possible to make the insulating substrate 23 constituting No. 1 have significantly flatness as compared with the conventional technique. Accordingly, when performing the printing operation, the insulating substrate 23 can be brought into contact with the platen roller 31 with a uniform pressure contact force along the longitudinal direction, and uneven printing density can be eliminated.

【0026】[0026]

【発明の効果】以上のように本発明に従えば、駆動回路
素子が配列された主面側に凸に絶縁基板を湾曲し、駆動
回路素子の形成領域に熱硬化性樹脂を塗覆する。絶縁基
板を湾曲状態のまま加熱して熱硬化性樹脂を硬化させ
る。この後絶縁基板を冷却する。このとき熱硬化性樹脂
の硬化時には絶縁基板は前記のように湾曲した状態であ
り、この状態のままで熱硬化性樹脂は平衡状態で硬化す
る。この冷却工程で絶縁基板および熱硬化性樹脂は収縮
するが、樹脂の熱膨張率は大きく、絶縁基板を前記主面
と反対側に凸となる方向に屈曲させる。このとき、絶縁
基板は冷却に先立って予め湾曲されており、冷却による
湾曲と相殺されて絶縁基板がほぼ平坦な状態となる。
As described above, according to the present invention, the insulating substrate is curved so as to be convex on the main surface side on which the drive circuit elements are arranged, and the thermosetting resin is coated on the formation area of the drive circuit elements. The insulating substrate is heated in a curved state to cure the thermosetting resin. After that, the insulating substrate is cooled. At this time, when the thermosetting resin is cured, the insulating substrate is in the curved state as described above, and the thermosetting resin is cured in the equilibrium state in this state. In this cooling step, the insulating substrate and the thermosetting resin shrink, but the coefficient of thermal expansion of the resin is large, and the insulating substrate is bent in a direction convex toward the side opposite to the main surface. At this time, the insulating substrate is curved in advance prior to cooling, and the bending due to cooling is offset to bring the insulating substrate into a substantially flat state.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に従うサーマルヘッド1の断
面図である。
FIG. 1 is a sectional view of a thermal head 1 according to an embodiment of the present invention.

【図2】サーマルヘッド21の分解斜視図である。FIG. 2 is an exploded perspective view of a thermal head 21.

【図3】本発明の一実施例のサーマルヘッド21の製造
工程を示す工程図である。
FIG. 3 is a process drawing showing a manufacturing process of the thermal head 21 according to the embodiment of the present invention.

【図4】治具40の形状を説明する図である。FIG. 4 is a diagram illustrating a shape of a jig 40.

【図5】本実施例の作用を説明する図である。FIG. 5 is a diagram for explaining the operation of the present embodiment.

【図6】従来例のサーマルヘッド1の断面図である。FIG. 6 is a cross-sectional view of a conventional thermal head 1.

【図7】サーマルヘッド1の斜視図である。7 is a perspective view of the thermal head 1. FIG.

【図8】従来例の問題点を説明するグラフである。FIG. 8 is a graph illustrating a problem of the conventional example.

【符号の説明】[Explanation of symbols]

21 サーマルヘッド 23 絶縁基板 25 駆動回路素子 26 保護膜 40 治具 21 Thermal Head 23 Insulating Substrate 25 Drive Circuit Element 26 Protective Film 40 Jig

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板の主面に複数の発熱抵抗体と、
該各発熱抵抗体に駆動電力を供給する複数の駆動回路素
子とを各々直線状に配列させるとともに前記駆動回路素
子を樹脂層で被覆して成るサーマルヘッドの製造方法に
おいて、下記(A)〜(C)工程を含むことを特徴とす
るサーマルヘッドの製造方法。 (A)絶縁基板を前記駆動回路素子が配列される主面側
が凸となるように湾曲させるとともに該主面の駆動回路
素子の配列領域に熱硬化性樹脂を塗布する。 (B)絶縁基板を湾曲状態のまま加熱して熱硬化性樹脂
を硬化させる。 (C)絶縁基板を冷却する。
1. A plurality of heating resistors are provided on a main surface of an insulating substrate,
In a method of manufacturing a thermal head in which a plurality of drive circuit elements for supplying drive power to each of the heating resistors are arranged linearly and the drive circuit elements are covered with a resin layer, the following (A) to ( A method of manufacturing a thermal head, which comprises the step C). (A) The insulating substrate is curved so that the main surface side on which the drive circuit elements are arranged is convex, and a thermosetting resin is applied to the arrangement area of the drive circuit elements on the main surface. (B) The insulating substrate is heated in a curved state to cure the thermosetting resin. (C) Cool the insulating substrate.
JP34694791A 1991-12-27 1991-12-27 Production of thermal head Pending JPH05177859A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34694791A JPH05177859A (en) 1991-12-27 1991-12-27 Production of thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34694791A JPH05177859A (en) 1991-12-27 1991-12-27 Production of thermal head

Publications (1)

Publication Number Publication Date
JPH05177859A true JPH05177859A (en) 1993-07-20

Family

ID=18386898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34694791A Pending JPH05177859A (en) 1991-12-27 1991-12-27 Production of thermal head

Country Status (1)

Country Link
JP (1) JPH05177859A (en)

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