JP3402019B2 - Wiper for precision equipment or clean room and method of manufacturing the same - Google Patents

Description

Detailed Description of the Invention

[0001]

The present invention relates, the dust generation was or for very small <br/> a oneirogmus tight equipment relates wiper and a manufacturing method for clean rooms.

[0002]

2. Description of the Related Art With the rapid progress of the electronic information society, not only the conventional glasses and lenses, but also the cleanliness of the screens of electronic devices represented by liquid crystal screens can be achieved not only by the high level of contaminant removal performance but also by the wiping cloth. Do not generate dust, especially dust that causes dielectric breakdown such as hydrophilic substances or conductive substances. In particular, for wiping of products and manufacturing devices in the manufacturing process of liquid crystal materials and semiconductors in a clean room, those having a low dusting property are particularly required. Conventional cotton and paper cannot be used as a wiping cloth in the field where fluff and dust are disliked. In recent years, a knitted fabric using ultrafine fibers has been proposed as a wiping cloth. For example, a wiping cloth characterized by the bulkiness of a cloth made of ultrafine fibers having a denier of 0.9 or less is disclosed in JP-A-61-l.
Japanese Unexamined Patent Publication No. 63-211364 proposes a entangled knitted woven fabric, which is proposed in O3428 and is composed of ultrafine yarn of 0.2 denier or less and fibers of 0.5 to 10 denier. However, these proposed fabrics have not only a hard texture but also a drawback that they are too slippery with respect to a material having glass as a substrate and, conversely, they are not slippery and have poor wiping workability. In addition, the knitted fabric has a drawback in that it is deformed due to the size of elasticity peculiar to the knitted fabric and is deformed after being stretched, which is called laughter. There are also problems such as excessive slippage and insufficient wipeability due to the coarseness of the mesh. Furthermore, it has been difficult to reduce dust generation of the wiping cloth.

[0003]

The object of the present invention is to provide a improved drawbacks as described above, very few of dusting resistance, or for precision instruments that have a high degree of wiping property without fear of breakdown A wiper for a clean room and a method for manufacturing the wiper are provided.

[0004]

The present invention has the following constitution in order to solve the above problems. That is, the precision machine of the present invention
The wiper for container and clean room has a single yarn fineness of 0.
Ultra fine fiber filaments of 1 denier or less and single yarn fineness of 1 de
The knitted and woven fabric is composed of filament yarns of neel or more , and the ultrafine fibers selectively shape the surface of the knitted and woven fabric.
And the hydrophilic substance or conductivity of the knitted fabric
The content of the substance is 0.5% by weight or less, and
Particle size 5 Miku measured by JIS B-9923 (shaking method)
The amount of dust that is more than Ron is 10 pieces / ft ³ · 100 cm ² or less
It is characterized in that the wiper portion is constituted by a wiping cloth . In addition, such a method for producing a wiper is performed by using an ultrafine fiber filament having a single yarn fineness of 0.1 denier or less and a single fiber having a shrinkage ratio of 4 to 8% higher than that of the ultrafine fiber.
Consisting of highly shrinkable filament yarn with a fineness of 1 denier or more
After heat treatment of the knitted fabric, the surface of the knitted fabric is watered.
Upon processing jet punching, knitted fabrics, in systems that do not contain the parent aqueous material or a conductive material, - from fiber production
There line to the finishing, hydrophilicity of the resulting knitted fabric material also
It is characterized in the this <br/> to control the content of the conductive material to 0.5 wt% or less.

[0005]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention is used for manufacturing precision equipment, particularly for manufacturing processes and products of liquid crystal materials and semiconductors.
Suitable materials as Ruwa Ipa, firstly, that there is no dust, was extensive studies by paying attention to can not cause dielectric breakdown, made specific ultrafine fiber filaments,
Moreover the system was thoroughly eliminate a hydrophilic substance and a conductive substance
I tried to manufacture the cloth , and it is extremely reliable.
We have succeeded in providing wipers for precision equipment or clean rooms .

The precision equipment or clean room of the present invention
The material forming the wiper for use is an ultrafine filament made of synthetic fiber such as polyester or polyamide, and such an ultrafine filament can be wiped off if it is contained in at least 30% by weight of the fibers constituting the wiper . We can provide excellent products. Here, the ultrafine fibers are fibers having a single fiber fineness of 0.1 denier or less, preferably 0.08 to 0.01 denier, and more preferably 0.06 to 0.05 denier. When used in combination other fibers other than such microfibers, that you use the high shrinkage filament yarn at least 1 denier is important. Such high shrink filament
The yarn can impart the bulkiness of the knitted fabric . This
Further preferred fineness 2-6 denier der high shrinkage yarn
It As the composite ratio of the ultrafine fibers and the high shrinkage yarn, the ultrafine fibers are preferably at least 30% or more, more preferably 50 to 80% by weight, particularly preferably 60 to 60% by weight of the cloth.
The range of 70% by weight is the bulkiness of the fabric, the texture,
Good in terms of wipeability . The high shrinkage yarn of more than 1 denier this high as long as it has shrink properties, the shrinkage is not intended to be limited to, shrinkage characteristics for heat is larger than importantly ultrafine fibers Is. If the boiling water shrinkage of the ultrafine fibers is 4-8%, the high shrinkage yarn is 1
A material having a shrinkage ratio of about 0 to 25% is preferable. In particular, it is important to use a microfiber having a shrinkage ratio 4 to 8% higher than that of boiling water. That is, greater shrinkage than ultrafine fiber is expressed at high shrinking yarns by heat treatment, Ru fiber bundle inside the knitting is formed. On the other hand, the contraction behavior
Thus, the ultrafine fiber disturbs monofilaments sequence of one, knitted woven
Increases the bulkiness of the object surface.

The form of the cloth is a knitted woven fabric, and either a woven fabric or a knitted fabric can be used, but the dust generation amount of the wiping cloth is smaller in the knitted fabric, and thus is more preferable. Further, the knitted fabric has advantages such as superior bulkiness and wiping workability as compared with the woven fabric.

A wiper for precision equipment, which is an object of the present invention,
The wiping cloth for wiper cleanroom particle size greater than 5 microns of particles, none or 10
Pieces / ft ³ · 100 cm ² or less. Further, in the semiconductor manufacturing process where cleanliness is required, it is necessary to avoid the generation of foreign matter having a particle size of 1 micron or more as much as possible. In particular, even if there is a hydrophilic substance or a conductive substance among such dust generation, it causes a clouding phenomenon or a dielectric breakdown, which is a fatal defect. Therefore, in the present invention, by eliminating such hydrophilic substances and conductive substances as much as possible,
It has significantly improved reliability in cleaning precision equipment and clean rooms.

That is, examples of such hydrophilic substances include polyalkylene glycol compounds used in dyeing and softening, hydrophilic agents such as water-soluble polyesters, antifouling agents such as polyacrylic acid esters, and cationic agents. Examples include antistatic agents such as polymer activators and dispersants such as higher alcohol sulfates and betaine amphoteric activators.
Examples of the conductive substance include conductive metal, conductive metal compound, carbon powder, antistatic fiber, and conductive fiber such as carbon fiber . Scarecrow
That substance is to carefully eliminate from the production of fibers for use in the present invention up to the types of processing textiles, for precision instruments of the present invention
Or a wiping cloth for a clean room wiper is manufactured. In other words, it takes Waipingukuro vinegar,
The content of the hydrophilic substance or the conductive substance is 0 . 5 wt% or less, good Mashiku 0.1 wt% or less, it is important for the reasons described above that more preferably controlled to 0.

Also, for the precision equipment or clean of the present invention
For wiping cloths for room wipers, JI
The wiping cloth used in a clean room where the number of suspended particles of 0.5 μm or more measured according to the “light scattering type particle counter method” of S B-9923 is 100 particles / ft ³ or less is In addition to a small amount of dust generation, it is preferable that the water absorbs dirt quickly and has a high water absorption. The same applies to oil absorption. The water absorption rate is preferably 1 second or less, more preferably instantaneous water absorption, and the water absorption amount is preferably 200% or more, more preferably 300% or more. Moreover, the components extracted by water or oils must be absent or in very small quantities. Such a function is achieved by the packing density of the constituent fibers, and therefore,
The surface of the knitted fabric is water jet punched.
By this water jet punch processing, while suppressing dust contained in the wiping cloth and dust generated during the wiping work to a minimum, the morphology of the knitted fabric is stable,
The fiber-fiber entanglement effect is fully achieved, and dust generation during wiping work is reduced. Further, the water flow also has an effect of removing foreign matters attached to the knitted fabric .

[0011] The following is for precision equipment of the present invention or clean
A typical method of manufacturing a wiping cloth for a room wiper will be described. Notes in the production of such a wiping cloth is a system that does not contain a parent aqueous material or conductive material is to prepared by proceeding to the machining finish from fiber production.

First, the sea component of the fiber obtained by aligning the polyester filament yarn made of the sea-island type composite fiber made of a resin composition containing no hydrophilic substance or conductive substance and the high shrinkage filament yarn is removed to remove the sea component. It is possible to obtain a composite fiber composed of ultrafine fibers of 1 denier or less and highly shrinkable filament yarn. Treatment in the presence of alkali is effective for removing sea components, and sodium hydroxide is usually used. It is also possible to use peelable split fibers. Temporary twisting and the like can be applied when manufacturing the composite fiber.

The precision equipment or clean room of the present invention
Any method may be used as a method for producing a knitted fabric that constitutes a wiping cloth for a wiper, but in the case of a knitted fabric, a circular knitted interlock method is effective in terms of productivity and prevention of fraying during cutting. The obtained knitted woven fabric, that is, the knitted product , is treated in hot water at 100 ° C. or higher after forming ultrafine fibers by desalination. After that , the usual knitted fabric is dyed and finished and set, but in this case also, it is important to process it in a system containing no hydrophilic substance or conductive substance.

The precision equipment or clean room of the present invention
Water jet punching is performed to manufacture the wiping cloth for the wiper . That is, the water purified by filtration is pressure-injected from the small holes onto the surface of the knitted fabric . The water pressure is preferably 30 to 120 kgf / cm ² , and more preferably 50 to 80 kgf / cm ² . When it is less than 30 kgf / cm ^2, the effect of processing does not appear, the shape stability is poor, and the effect of entanglement between fibers is insufficient. If it exceeds 120 kgf / cm ² , the ultrafine fiber single yarn may be partially cut by water pressure, which may cause fuzz, which is not preferable.

The knitted and woven fabric subjected to water jet punching is dried and heated at a temperature of 100 ° C. or higher together with the finishing set to volatilize water and hydrophilic components. Also in this case,
It is important to take care not to leave hydrophilic substances or conductive substances on the knitted fabric . After that, it is cut to the size of the product, and finally pure water (distilled water, ion-exchanged water, etc.)
It is washed, dried in a clean pack and commercialized. Here, a clean pack is a clean room with a space where the number of suspended particles of 0.5 μm or more measured according to the “light scattering type particle counter method” of JlS B-9923 is 100 particles / ft ³ or less. Means packing in a pack.

The precision equipment or clean room of the present invention
The wiping cloth for wipers for use has extremely little dust generation and exhibits excellent effects and performance for precision equipment and clean rooms. Therefore, using such a wiping cloth as it is, or using a wiper whose wiper portion is composed of the cloth, the manufacturing process of liquid crystal materials and semiconductors and their products, as well as electronic information materials, etc. can be performed without dust generation, and It can be cleaned without causing clouding or insulation breakdown, and can be used to accurately wipe off oil films and dirt on pearls, jewelry, furniture and automobile windows.

[0017]

The present invention will be described in detail based on the following examples.

The dusting property was evaluated by JIS B- 9923 (shaking method). The water absorption was measured by JlS L- 1096, and the water absorption was evaluated by immersing the sample in water for 2 minutes, pulling up the sample, and increasing the weight after 1 minute of drip.

The wiping property was evaluated by the following method. Silicone oil SH200 (manufactured by Toray Dow Corning Silicone Co., Ltd.) was dropped onto a glass plate of about 5 mg with an injection needle, and a thickness of about 1 m was applied to one end face of a cylindrical load having a diameter of 45 mm and a weight of 1 kgf.
A sample (wiping cloth) fixed via a fabric corresponding to m is placed on a glass plate and moved at a speed of 1 m / min to wipe off silicone. Next, dry copying machine toner (SF-
76T: manufactured by Sharp Corporation) is sprinkled on a glass plate, and the toner is blown off with compressed air (1 kgf / cm ² ). Adhered to the surface of the glass plate tape (manufactured by Sekisui Chemical Co., Ltd. "Sellotape", registered trademark) stripping the residual toner on the glass plate paste, the degree of toner adhered to the adhesive tape is determined. 5 that the toner does not adhere at all (the glass plate is completely wiped from the silicone)
The grade 1 and the one in which an extremely large amount of toner remained were classified as grade 1 and visually judged in 5 stages.

Example 1 The ultrafine fiber is a sea-island type polyester having 50 denier and 9 filaments (70 islands / filament: manufactured by Toray Industries, Inc.).
A fiber made of an alkali hot water-soluble polyester composed of a polyethylene terephthalate as a high component and a copolymer of terephthalic acid and 5-sodium sulfoisophthalic acid as an acid component of a polyester as a sea component (the ratio of sea islands is 10/9
0) was used. The boiling water shrinkage of this yarn was 5.8%.

As the high shrinkage yarn, a polyester yarn (made by Toray Industries, Inc.) of 30 denier and 12 filaments was used. The shrinkage of this yarn was 13.8%. On the other hand, the ultrafine fibers are aligned with the high shrinkage yarn without de-sealing, and the circular knitting machine (32
G, 36 inches) was knitted in an interlock system to obtain a raw machine. This greige machine was once heat treated at 130 ° C for 20 minutes, and then heated at 80 ° C for 30 minutes, and sodium hydroxide 1% was added.
The sea component was completely removed by treatment with the aqueous solution of (using distilled water). After that, water jet punching was performed using filtered water at a pressure of 80 kgf / cm ² from the surface. After that, heat setting was performed at 130 ° C. Weight is 2
At 10 g / m ² , width: 68%, length: 72 relative to the raw machine
Shrink to%.

The obtained cloth had a supple chamois tone, excellent dimensional stability and good workability as a wiping cloth. When 100 g of this cloth was cut into a sample and a hydrophilic substance was extracted by a Soxhlet method using ethanol, the substance was 0%.

Example 2 A knitted fabric made of the same composite yarn as in Example 1 was produced by the same method, and as in Example 1, care was taken not to mix in hydrophilic substances, conductive substances, etc. after removal, a pressure of 80 kgf / cm ² from the surface, similarly processed Walsh <br/> over coater jet punching as in example 1, 100 kg more from the back
Water jet punching was performed at a pressure of f / cm ² .
After that, heat setting was performed at 160 ° C. Unit weight is 218g /
At m ² , it contracted to a width of 68% and a length of 70% with respect to the raw fabric. The hydrophilic material of this fabric was 0%.

The obtained cloth had a flexible chamois tone, excellent dimensional stability and good workability as a wiping cloth.

The performance required as a wiping cloth in a clean room was evaluated for the cloths of Examples 1 and 2. The results are shown in Table 1.

[0026]

[Table 1]

Since the fabrics of Examples 1 and 2 of the present invention have a remarkably low dusting property and do not contain a hydrophilic substance, they can be cleaned without worrying about dielectric breakdown and have a high water absorption rate. In addition, the water absorption was high and the wiping property was also very excellent.

Comparative Example 1 Using the wiping cloth produced in Example 1, this cloth was treated with a water-soluble polyester hydrophilizing agent (SR-100).
0: manufactured by Takamatsu Yushi Co., Ltd.), dried and heat set. The amount of the hydrophilic agent attached to this cloth was 1.6.
% By weight. Surface quality of the resultant fabric, feeling is almost the same as in Example 1, although the water absorption rate was further improved, in this fabric, was working wiping the glass material of the liquid crystal substrate, a glass surface It was cloudy and was not practical.

Comparative Example 2 In the yarn constitution of Example 1, 1.2% of carbon powder-containing antistatic fiber was added.
The mixture was mixed by weight%, knitted, and then water jet punched in the same manner as in Example 1 and heat set to prepare a wiping cloth. The carbon powder-containing antistatic fiber,
The antistatic component of 65 wt% nylon 6 mixed with 35 wt% carbon powder was used as the core component of 5 wt%, and the polyester (9
5 wt%) as a sheath component and is a 20 denier monofilament.

The antistatic property of this wiping cloth was improved, but when the cloth was wiped off as a semiconductor wiping cloth, traces of carbon powder adhered to the surface of the semiconductor substrate, causing dielectric breakdown. It was impossible to put into practical use.

[0031]

According to the present invention, it is possible to provide a wiping cloth which is free from cutting and fraying, and which produces very little dust, and which includes a hydrophilic substance and a conductive substance as well as the wiping property and the wiping workability. Since it is not reliable, precision equipment and products such as liquid crystal materials and semiconductors
The thing which can be used as a wiper for precision instruments or a clean room can be provided.

Claims (13)

(57) [Claims] 1. A knitted woven fabric comprising ultrafine fiber filaments having a single yarn fineness of 0.1 denier or less and filament yarns having a single yarn fineness of 1 denier or more, and the ultrafine fibers selectively select the surface of the knitted fabric. And the content of the hydrophilic substance or the conductive substance in the knitted fabric is 0.5% by weight or less, and the knitted fabric is measured by JIS B-9923 (shaking method). 10 particles / f with a particle size of 5 microns or more
A wiper for precision equipment or a clean room, characterized in that the wiper part is composed of a wiping cloth of t ³ · 100 cm ² or less. 2. The wiper for precision instruments or clean rooms according to claim 1, wherein the content of the hydrophilic substance or the conductive substance is 0.1% by weight or less. 3. The wiper for precision instruments or clean rooms according to claim 1 or 2, wherein the ultrafine fibers having a single yarn fineness of 0.1 denier or less are contained in an amount of 30% by weight or more. Wherein said monofilament fineness 1 denier or more filaments
The wiper for precision equipment or clean room according to any one of claims 1 to 3, wherein the yarn is a fiber having a higher shrinkage than the ultrafine fiber. 5. The wiper for precision equipment or clean room according to claim 1, wherein the ultrafine fibers are polyester filaments. 6. The wiper for precision equipment or clean room according to claim 1, wherein the water absorption rate of the knitted fabric measured by J1S L-1096 is 1 second or less. 7. The wiper for precision equipment or clean room according to claim 1, wherein the water absorption of the knitted fabric measured by JIS L-1096 is 200% by weight or more. 8. The wiper for precision equipment or clean room according to claim 1, wherein the precision equipment is equipment and products in the manufacturing process of liquid crystal materials and semiconductors. 9. The wiper for precision equipment or clean room according to claim 1, wherein the clean room is a manufacturing room for liquid crystal materials and semiconductors. 10. The clean room wiper is packed in a clean room in which the number of suspended particles having a particle size of 0.5 micron or more is 100 particles / ft ³ or less.
The wiper for precision instruments or the clean room according to any one of to 7 and 9. 11. A knitted fabric comprising an ultrafine fiber filament having a single yarn fineness of 0.1 denier or less, and a highly shrinkable filament yarn having a single yarn fineness of 1 denier or more, which has a shrinkage rate of 4 to 8% higher than that of the ultrafine fiber, After the heat treatment, when the surface of the knitted fabric is subjected to water jet punching, the knitted fabric is processed from fiber production to finish processing in a system containing no hydrophilic substance or conductive substance to obtain the knitted fabric. A method for producing a wiper for a precision instrument or a clean room, which comprises controlling the content of a hydrophilic substance or a conductive substance to 0.5% by weight or less. 12. The method for producing a wiper for a precision instrument or a clean room according to claim 11, wherein the water jet punching is performed using filtered water and at a pressure of 30 to 120 kgf / cm ² . 13. The method for producing a wiper for a precision instrument or a clean room according to claim 11, wherein the heat treatment includes scouring and dyeing.