JP3380801B2 - Exhaust gas treatment method and apparatus - Google Patents
Exhaust gas treatment method and apparatusInfo
- Publication number
- JP3380801B2 JP3380801B2 JP2000247689A JP2000247689A JP3380801B2 JP 3380801 B2 JP3380801 B2 JP 3380801B2 JP 2000247689 A JP2000247689 A JP 2000247689A JP 2000247689 A JP2000247689 A JP 2000247689A JP 3380801 B2 JP3380801 B2 JP 3380801B2
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- Prior art keywords
- exhaust gas
- medium
- temperature
- supply
- gas supply
- Prior art date
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- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、排ガス処理方法及
び装置に関し、特に、排ガス中に含まれる被除去成分を
除去する排ガス処理方法及び装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust gas treatment method and apparatus, and more particularly to an exhaust gas treatment method and apparatus for removing components to be removed contained in exhaust gas.
【０００２】[0002]
【従来の技術】排ガス中に含まれる被除去成分を除去す
る従来の排ガス処理装置及び方法としては、例えば、特
開平１１−１０４４５２号公報に記載の乾式排ガス処理
装置と、その装置を用いた方法とが挙げられる。この従
来の装置及び方法は、装置を構成する反応塔内における
吸着材のホットスポットの発生を防止することを企図し
たものであり、上記公報に記載の実施例等から判断すれ
ば、排ガスの温度に基づいて反応塔へ空気を供給するこ
とにより吸着材の冷却を行うものである。また、上記公
報には、反応塔内を窒素で置換する方法も記載されてい
る。2. Description of the Related Art As a conventional exhaust gas treating apparatus and method for removing components to be removed contained in exhaust gas, for example, a dry type exhaust gas treating apparatus described in JP-A No. 11-104452 and a method using the apparatus. And so on. This conventional apparatus and method are intended to prevent the generation of hot spots of the adsorbent in the reaction tower constituting the apparatus, and the temperature of the exhaust gas is judged from the examples described in the above publication. Based on the above, the adsorbent is cooled by supplying air to the reaction tower. Further, the above publication also describes a method of substituting the inside of the reaction column with nitrogen.
【０００３】[0003]
【発明が解決しようとする課題】ところで、このような
排ガス処理装置において吸着材の温度が上昇する要因と
しては、例えば、排ガスに含有されるＳＯ2ガス等の被
吸着成分による吸着熱、酸素（Ｏ2）ガス等の酸化因子
による酸化熱、水蒸気（Ｈ2Ｏ）による水和熱等が考え
られる。そして、これらの熱が反応塔内で局所的に蓄積
され、その部位の吸着材の温度上昇を引き起こし、とき
には、ホットスポットが形成されて吸着材の発火に至
り、更には燃焼によって吸着材がガラス化してしまうお
それがある。The cause of the temperature rise of the adsorbent in such an exhaust gas treating apparatus is, for example, the heat of adsorption by the adsorbed component such as SO 2 gas contained in the exhaust gas, oxygen ( The heat of oxidation due to an oxidizing factor such as O 2 ) gas, the heat of hydration due to water vapor (H 2 O), and the like are considered. Then, these heats are locally accumulated in the reaction tower, causing the temperature of the adsorbent to rise, and sometimes a hot spot is formed to ignite the adsorbent. There is a risk that it will become.
【０００４】このように、ホットスポットは局所的に生
じる傾向にあるので、ホットスポットの熱が排ガスに移
行しても、その熱は排ガス全体で平均化されてしまい、
ホットスポットの発生を予知叉は検知できる程度に排ガ
ス温度が有意に上昇するとは限らない。逆に言えば、排
ガス温度が有意に上昇しなくても、ホットスポットが発
生している可能性が多分にある。本発明者は、このよう
な知見を考慮して上記従来の方法及び装置について検討
したところ、排ガス温度に基づいて吸着材の冷却や窒素
置換を行う手法では、ホットスポットの発生を必ずしも
確実に予知叉は予測できず、その結果、ホットスポット
の発生を十分に防止できないおそれがあることを見出し
た。As described above, since hot spots tend to occur locally, even if the heat of the hot spots is transferred to the exhaust gas, the heat is averaged over the entire exhaust gas,
The exhaust gas temperature does not necessarily rise significantly to the extent that the occurrence of hot spots can be predicted or detected. Conversely, even if the exhaust gas temperature does not rise significantly, there is a high possibility that hot spots have occurred. The present inventor has studied the above-mentioned conventional method and apparatus in consideration of such findings, and in the method of cooling the adsorbent or replacing the nitrogen based on the exhaust gas temperature, the occurrence of hot spots is not always predicted. In other words, it was not possible to predict, and as a result, it was found that the occurrence of hot spots could not be sufficiently prevented.
【０００５】また、通常の排ガス処理装置のなかには、
排ガスの特性を連続的に監視するために、排ガス中の各
種ガス成分、例えば、ＳＯ2、ＮＯｘ、Ｏ2、ＨＣｌ、Ｃ
Ｏ、Ｈ2Ｏ等のガス濃度を測定しているセンサを備える
ものがある。これらのガスのうちＣＯは、吸着材として
活性炭等の炭素を含むものを用いた場合、その燃焼（酸
化）によっても発生するので、このＣＯ濃度の変化に基
づいてホットスポットの発生を感知する方法が提案され
ている（特開平１１−９９４４号公報等参照）。しか
し、局所的なホットスポットが発生しても、通常の排ガ
スに当初から含まれるＣＯ濃度（例えば、排ガスの種類
によって１０〜９０００ｐｐｍ程度含まれることがあ
る）との有意な差異は生じ難い傾向にある。よって、Ｃ
Ｏ濃度等の変動からホットスポットの発生を予知叉は予
測し且つその発生を防止することも極めて困難と想到さ
れる。Further, among ordinary exhaust gas treatment devices,
In order to continuously monitor the characteristics of the exhaust gas, various gas components in the exhaust gas, such as SO 2 , NOx, O 2 , HCl, C
Some include a sensor that measures the gas concentration of O, H 2 O, or the like. Among these gases, CO is also generated by combustion (oxidation) when carbon containing activated carbon or the like is used as an adsorbent. Therefore, a method of detecting the occurrence of hot spots based on the change in CO concentration is used. Has been proposed (see Japanese Patent Laid-Open No. 11-9944, etc.). However, even if a local hot spot occurs, there is a tendency that a significant difference from the CO concentration initially contained in normal exhaust gas (for example, it may be contained at about 10 to 9000 ppm depending on the type of exhaust gas) does not easily occur. is there. Therefore, C
It is considered extremely difficult to predict or predict the occurrence of a hot spot and prevent the occurrence of a hot spot from changes in the O concentration and the like.
【０００６】そこで、本発明はこのような事情に鑑みて
なされたものであり、ホットスポットの発生を確実に予
知叉は予測でき、これにより、ホットスポットの発生を
十分に防止できる排ガス処理方法及び装置を提供するこ
とを目的とする。Therefore, the present invention has been made in view of such circumstances, and it is possible to reliably predict or predict the occurrence of hot spots, and thereby to sufficiently prevent the occurrence of hot spots. The purpose is to provide a device.
【０００７】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明による排ガス処理方法は、排ガス中に含まれ
る被除去成分を除去する方法であって、（１）排ガスに
対する吸着能叉は分解能を有する媒体を、複数の領域に
区画叉は区分された移動層が形成された反応塔に供給す
る媒体供給工程と、（２）排ガスを反応塔に供給し、そ
の排ガスを媒体が存在する移動層の各領域内へ流通させ
る排ガス供給工程と、（３）各領域内で且つ移動層の延
在方向に沿った複数の位置における媒体の温度を測定す
る温度測定工程と、（４）温度測定工程において測定さ
れた温度実測値が所定のしきい値を超えたときに、その
温度実測値が取得された部位が含まれる領域への排ガス
の供給を停止する排ガス供給制御工程とを備えることを
特徴とする。In order to achieve the above object, an exhaust gas treatment method according to the present invention is a method for removing a component to be removed contained in exhaust gas, which is (1) adsorption capacity for exhaust gas or A medium supply step of supplying a medium having a resolution to a reaction tower in which a moving bed partitioned or divided into a plurality of regions is formed, and (2) exhaust gas is supplied to the reaction tower, and the exhaust gas is present in the medium. Exhaust gas supply step of circulating into each area of the moving bed, (3) Temperature measuring step of measuring the temperature of the medium at a plurality of positions in each area and along the extending direction of the moving bed, and (4) Temperature An exhaust gas supply control step of stopping the supply of the exhaust gas to the region including the part where the measured temperature value is acquired when the measured temperature value measured in the measurement step exceeds a predetermined threshold value. Is characterized by.
【０００８】なお、本発明で使用される「媒体」とは、
排ガスに含まれる被除去成分に対して吸着能叉は分解能
を有するものを示し、形態は特に限定されないが、例え
ば粉状叉は粒状を成す複数の固体粒子（具体的には、活
性炭等の炭素質吸着剤（材）粒子、触媒粒子等）を例示
でき、それら固体粒子の集合体叉は凝集体であってもよ
く、また、幾何学的叉は立体的な形状も特に限定され
ず、例えば、球形、円柱形、円筒形、等の形状を有する
ものが挙げられる。The "medium" used in the present invention means
It shows that it has adsorption ability or resolution for the components to be removed contained in the exhaust gas, and the form is not particularly limited, but for example, a plurality of solid particles in the form of powder or granules (specifically, carbon such as activated carbon). Adsorbent (material) particles, catalyst particles, etc.), and may be an aggregate or an aggregate of these solid particles, and the geometric or three-dimensional shape is not particularly limited. , Spheres, cylinders, cylinders, and the like.
【０００９】このように構成された排ガス処理方法にお
いては、複数領域に区画叉は区分された移動層に供給さ
れた媒体と排ガスとの接触により、排ガス中の被除去成
分が媒体に吸着叉は媒体によって分解されて除去され
る。通常、反応塔には、排ガス温度を好適な所定温度に
維持するために空気等の冷却ガスが流通されるが、上述
の如く、例えばＳＯ2ガスといった被除去成分の吸着熱
により移動層内の媒体温度が局所的に上昇するおそれが
ある。In the exhaust gas treatment method thus constructed, the component to be removed from the exhaust gas is adsorbed or adsorbed on the medium by contacting the exhaust gas with the medium supplied to the moving bed divided into a plurality of regions. It is decomposed and removed by the medium. Usually, a cooling gas such as air is circulated in the reaction tower in order to maintain the exhaust gas temperature at a suitable predetermined temperature. However, as described above, the heat of adsorption of the component to be removed such as SO 2 gas causes The medium temperature may rise locally.
【００１０】これに対し、各領域内で移動層の延在方向
に沿った複数の位置（部位）における媒体の温度を測定
し、この温度実測値が所定のしきい値を超えたときに、
温度上昇が生じた部位が含まれる領域への排ガスの供給
を停止することにより、新たな吸着熱等の発生が抑止さ
れる。特に、移動層内を媒体が流下するような流動層式
の排ガス処理を行うときには、媒体の流下方向に沿って
その温度を測定し得るので、媒体の温度履歴を把握でき
る。このように、移動層内の媒体の温度実測値に基づい
て、ホットスポットが生じるおそれがある媒体が存在す
る領域への排ガス供給が制御される。On the other hand, the temperature of the medium is measured at a plurality of positions (portions) along the extending direction of the moving layer in each region, and when the measured temperature value exceeds a predetermined threshold value,
By stopping the supply of the exhaust gas to the region including the portion where the temperature rises, the generation of new heat of adsorption or the like is suppressed. Particularly, when performing a fluidized bed type exhaust gas treatment in which the medium flows down in the moving bed, the temperature can be measured along the flow down direction of the medium, so that the temperature history of the medium can be grasped. In this way, the exhaust gas supply to the region where the medium in which the hot spot may occur exists is controlled based on the measured temperature value of the medium in the moving bed.
【００１１】また、（５）排ガス供給制御工程を実施し
た後に、不活性ガスを反応塔に供給し、その不活性ガス
を上記の温度実測値が取得された部位が含まれる領域内
へ流通させる不活性ガス供給工程を更に備えると好まし
い。こうすれば、媒体が言わば“窒息”状態となり、そ
の領域内の酸素ガス濃度が低減され、媒体の酸化等によ
る更なる発熱が抑制される。特に、媒体として炭素質吸
着剤等の炭素を含むものを用いた場合には、その燃焼を
十分に防止できる。In addition, (5) after carrying out the exhaust gas supply control step, an inert gas is supplied to the reaction tower, and the inert gas is circulated into the region including the portion where the temperature measured value is acquired. It is preferable to further include an inert gas supply step. In this case, the medium is in a so-called “suffocation” state, the oxygen gas concentration in the region is reduced, and further heat generation due to oxidation of the medium is suppressed. In particular, when a medium containing carbon such as a carbonaceous adsorbent is used as the medium, the combustion can be sufficiently prevented.
【００１２】ここで、排ガスの供給を停止し、叉は、更
に窒息操作を行うことにより、その温度が上記のしきい
値以下となったら、その領域への不活性ガスの供給を停
止し、すなわち窒息を止め、その後、その領域への排ガ
スの供給を再開してもよい。こうすることにより、通常
運転への復帰を簡易に且つ連続的に行うことが可能とな
る。[0012] Here, by stopping the supply of the exhaust gas, or by further performing the choking operation, when the temperature becomes equal to or lower than the above threshold value, the supply of the inert gas to the region is stopped, That is, suffocation may be stopped and then the supply of exhaust gas to the area may be restarted. By doing so, it becomes possible to easily and continuously return to the normal operation.
【００１３】また、（６）移動層の各領域内に存在する
媒体をその領域外へ排出する媒体排出工程を備えてお
り、この媒体排出工程が、温度測定工程において測定さ
れた温度実測値が所定のしきい値を超えたときに、その
温度実測値が取得された部位が含まれる領域内に存在す
る媒体のその領域外への排出速度を増大させる排出速度
調節ステップを有すると好ましい。この場合、排ガス供
給制御工程及び不活性ガス供給工程は実施してもしなく
てもいずれでも構わない。Further, (6) there is provided a medium discharging step of discharging the medium existing in each area of the moving layer to the outside of the area, and the medium discharging step is performed by the measured temperature value measured in the temperature measuring step. It is preferable to have a discharging speed adjusting step of increasing the discharging speed of the medium existing in the region including the region where the measured temperature value is acquired, to the outside of the region when the temperature exceeds the predetermined threshold value. In this case, the exhaust gas supply control step and the inert gas supply step may or may not be performed.
【００１４】このようにすれば、温度上昇が顕著となっ
てそのままの状態では急激な発熱が生じるおそれのある
媒体が移動層内の外部へ速やかに排出される。よって、
その媒体が存在していた領域における急加熱や媒体の燃
焼が十分に抑制される。媒体の排出速度を調節する手段
としては、特に限定されないが、例えば移動層下部にロ
ールフィーダー等の切出装置を用いるときには、その回
転速度を調節するといった方法が挙げられる。また、特
に移動層が固定層式の場合には、移動層下部にシャッタ
ー等を設け、これを開放して自重落下により排出しても
よい。また、温度がしきい値を超えた媒体を移動層の外
部へ排出した後、新たな媒体を移動層に供給することに
より、通常の運転を再開できる。By doing so, the medium, which may cause a sudden heat generation when the temperature rise is remarkable and remains as it is, is promptly discharged to the outside of the moving layer. Therefore,
Rapid heating and combustion of the medium in the region where the medium was present are sufficiently suppressed. The means for adjusting the discharge speed of the medium is not particularly limited, but when a cutting device such as a roll feeder is used in the lower part of the moving bed, a method of adjusting the rotation speed thereof can be mentioned. Further, particularly when the moving bed is of a fixed bed type, a shutter or the like may be provided below the moving bed, and the shutter may be opened and discharged by its own weight. Further, after the medium whose temperature exceeds the threshold value is discharged to the outside of the moving bed, a new medium is supplied to the moving bed, whereby normal operation can be resumed.
【００１５】さらに、媒体として炭素質吸着剤を用いる
ときに、所定のしきい値を好ましくは１４５〜１８０
℃、より好ましくは１５０〜１７５℃、特に好ましくは
１６０〜１７０℃の範囲内の温度とすることが望まし
い。Further, when a carbonaceous adsorbent is used as the medium, a predetermined threshold value is preferably 145 to 180.
C., more preferably 150 to 175.degree. C., and particularly preferably 160 to 170.degree. C.
【００１６】ここで、本発明者らは、媒体として粒状活
性炭等の炭素質吸着剤を用いた場合、（ａ）排ガスに含
まれるＳＯ2等の被除去成分の濃度にも依るが、移動層
内の媒体の温度が、数℃〜５℃程度上昇する傾向にある
こと、（ｂ）媒体温度が１５０℃程度であれば、安定な
排ガス処理運転が可能なこと、（ｃ）媒体温度が１８０
℃を超えた場合、窒息させても温度上昇が存続して発火
温度に達することがあること、を更に見出した。したが
って、しきい値を上記の範囲内の温度に設定すれば、安
定な運転を行いつつ、媒体の温度上昇が十分に抑えられ
る。Here, the inventors of the present invention, when using a carbonaceous adsorbent such as granular activated carbon as the medium, depend on the concentration of the component to be removed such as (a) SO 2 contained in the exhaust gas, although it depends on the moving bed. The temperature of the medium inside tends to rise by several degrees Celsius to 5 degrees Celsius, (b) if the medium temperature is about 150 degrees Celsius, stable exhaust gas treatment operation is possible, and (c) medium temperature is 180 degrees.
It was further found that when the temperature exceeds ℃, the temperature rise may continue to reach the ignition temperature even if the substance is suffocated. Therefore, by setting the threshold value to a temperature within the above range, the temperature rise of the medium can be sufficiently suppressed while performing stable operation.
【００１７】また、本発明による排ガス処理装置は、排
ガス中に含まれる被除去成分を除去するものであり、本
発明の排ガス処理方法を有効に実施するためのものであ
って、排ガスが流通し且つ複数の領域に区画叉は区分さ
れた移動層が形成された反応塔と、排ガスに対する吸着
能叉は分解能を有する媒体を反応塔の移動層に供給する
媒体供給部と、排ガスを移動層の各領域内へ独立に供給
する排ガス分配手段を有する排ガス供給部と、各領域内
で且つ移動層の延在方向に沿って配置され、媒体の温度
を測定する複数の温度測定手段と、これらの温度測定手
段と排ガス分配手段とに接続されており、温度測定手段
で得られた媒体の温度実測値に基づいて、排ガス分配手
段から各領域への排ガスの供給とその供給の停止とを切
り替えるように排ガス分配手段を制御するガス供給制御
部とを備えることを特徴とする。Further, the exhaust gas treating apparatus according to the present invention is for removing the components to be removed contained in the exhaust gas, and is for effectively carrying out the exhaust gas treating method of the present invention. And a reaction tower in which a moving bed partitioned or divided into a plurality of regions is formed, a medium supply unit for supplying a medium having an adsorption capacity or resolution for exhaust gas to the moving bed of the reaction tower, and the exhaust gas of the moving bed An exhaust gas supply unit having an exhaust gas distribution unit that independently supplies each region, a plurality of temperature measurement units that are arranged in each region and along the extending direction of the moving bed, and measure the temperature of the medium, and these It is connected to the temperature measuring means and the exhaust gas distribution means, and switches the supply of exhaust gas from the exhaust gas distribution means to each region and the stop of the supply thereof based on the measured temperature value of the medium obtained by the temperature measurement means. Exhausted to Characterized in that it comprises a gas supply controller for controlling the scan distribution means.
【００１８】さらに、不活性ガスを移動層の各領域内へ
独立に供給する不活性ガス分配手段を有する不活性ガス
供給部を更に備えており、ガス供給制御部が、不活性ガ
ス分配手段に接続されており、且つ、温度測定手段で得
られた媒体の温度実測値に基づいて不活性ガス分配手段
から各領域への不活性ガスの供給とその供給の停止とを
切り替えるように不活性ガス分配手段を制御するもので
あると好ましい。Furthermore, an inert gas supply section having an inert gas distribution means for independently supplying an inert gas into each region of the moving bed is further provided, and the gas supply control section serves as the inert gas distribution means. The inert gas is connected so that the supply of the inert gas from the inert gas distribution means to each region and the stop of the supply thereof are switched based on the measured temperature value of the medium obtained by the temperature measurement means. Preferably, it controls the dispensing means.
【００１９】或いは、移動層の下端部に設けられ、移動
層内に存在する媒体を移動層外へ排出する媒体排出手段
と、温度測定手段と媒体排出手段とに接続されており、
温度測定手段で得られた媒体の温度実測値に基づいて、
媒体排出手段からの媒体の排出量が調節されるように媒
体排出手段を制御する媒体排出量制御部とを更に備えて
も好適である。なお、排ガス処理装置がこの媒体排出量
制御部を備える場合には、上記の不活性ガス供給部及び
ガス供給制御部は必ずしも必要ない。Alternatively, it is connected to the medium discharging means provided at the lower end of the moving layer and discharging the medium existing in the moving layer to the outside of the moving layer, the temperature measuring means and the medium discharging means,
Based on the measured temperature value of the medium obtained by the temperature measuring means,
It is also preferable to further include a medium ejection amount control unit that controls the medium ejection unit so that the ejection amount of the medium from the medium ejection unit is adjusted. When the exhaust gas treatment device includes this medium discharge amount control unit, the above-mentioned inert gas supply unit and gas supply control unit are not necessarily required.
【００２０】[0020]
【発明の実施の形態】以下、本発明の実施形態について
詳細に説明する。なお、同一の要素には同一の符号を付
し、重複する説明を省略する。また、上下左右等の位置
関係は、特に断らない限り、図面に示す位置関係に基づ
くものとする。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below. The same elements will be denoted by the same reference symbols, without redundant description. Further, the positional relationship such as up, down, left and right is based on the positional relationship shown in the drawings unless otherwise specified.
【００２１】図１は、本発明による排ガス処理装置の好
適な一実施形態を模式的に示す構成図である。排ガス処
理装置１００は、反応塔１１０と再生塔１２０とを備え
たものであり、これらの間には、コンベア等の移送機１
３１，１３２が設置されている。移送機１３１，１３２
は、各々の一端部がそれぞれ反応塔１１０の下方及び上
方に位置するように、且つ、各々の他端部がそれぞれ再
生塔１２０の上方及び下方に位置するように配置されて
いる。これらの移送機１３１，１３２は、後述する炭素
質吸着剤（材）を反応塔１１０及び再生塔１２０間で循
環移送するためのものである。また、反応塔１１０及び
再生塔１２０は、炭素質吸着剤がその上端部から供給さ
れ、それぞれの内部を流下して下端部から外部へ排出さ
れるようになっている。FIG. 1 is a schematic diagram showing a preferred embodiment of an exhaust gas treating apparatus according to the present invention. The exhaust gas treatment device 100 includes a reaction tower 110 and a regeneration tower 120, and a transfer device 1 such as a conveyor is provided between them.
31, 132 are installed. Transfer machines 131, 132
Are arranged so that one end of each is located below and above the reaction tower 110, and the other end is located above and below the regeneration tower 120, respectively. These transfer devices 131 and 132 are for circulating and transferring a carbonaceous adsorbent (material) described later between the reaction tower 110 and the regeneration tower 120. In addition, the carbonaceous adsorbent is supplied from the upper end portion of the reaction tower 110 and the regeneration tower 120, flows down the inside of each, and is discharged from the lower end portion to the outside.
【００２２】また、反応塔１１０は、その側壁に排ガス
供給部１８及び処理済ガス排出部２０を有している。こ
の排ガス供給部１８には、排ガスＷが導入される。排ガ
スＷは、反応塔１１０の内部を横断するように流通する
間に、炭素質吸着剤による脱硫（ＳＯ2ガス等のＳＯｘ
ガスの吸着）、除塵等が行われ、処理済ガスＷｓとして
処理済ガス排出部２０からスタック（煙突）１４０へ送
られ排気される。なお、排ガスＷと共にアンモニア等の
還元態窒素Ｎを反応塔１１０に供給すると、排ガスＷの
脱硝（ＮＯｘ成分の分解）を行うことも可能である。The reaction tower 110 also has an exhaust gas supply section 18 and a treated gas discharge section 20 on its side wall. Exhaust gas W is introduced into the exhaust gas supply unit 18. The exhaust gas W is desulfurized by a carbonaceous adsorbent (SOx such as SO 2 gas or the like while flowing so as to traverse the inside of the reaction tower 110).
Adsorption of gas), dust removal, etc. are performed, and the processed gas Ws is sent from the processed gas discharge unit 20 to the stack (chimney) 140 and is exhausted. If reduced nitrogen N such as ammonia is supplied to the reaction tower 110 together with the exhaust gas W, it is possible to denitrate the exhaust gas W (decompose NOx components).
【００２３】再生塔１２０内で排ガスＷ中の被除去成分
を吸着した炭素質吸着剤は、移送機１３１により再生塔
１２０へ送出され、再生塔１２０内で加熱によりＳＯ2
成分が脱離される。脱離されて言わば濃縮されたＳＯ2
ガスは、回収部１５０において吸収剤等に回収される。
また、再生塔１２０の下端部と移送機１３２の他端部と
の間には、ふるい分機１６０が設置されている。再生塔
１２０で再生された炭素質吸着剤は、このふるい分機１
６０で粒径による選別が行われ、所定の寸法以上の粒径
を有する炭素質吸着剤が移送機１３２によって反応塔１
１０に返送される。The carbonaceous adsorbent that has adsorbed the components to be removed in the exhaust gas W in the regeneration tower 120 is sent to the regeneration tower 120 by the transfer device 131 and heated in the regeneration tower 120 to emit SO 2.
The components are released. SO 2 concentrated and desorbed
The gas is recovered by the absorbent or the like in the recovery unit 150.
A sieving machine 160 is installed between the lower end of the regeneration tower 120 and the other end of the transfer machine 132. The carbonaceous adsorbent regenerated in the regeneration tower 120 is the sieving machine 1
The particle size is sorted by 60, and the carbonaceous adsorbent having a particle size equal to or larger than a predetermined size is transferred by the transfer device 132 to the reaction tower 1.
Returned to 10.
【００２４】図２は、図１における反応塔１１０を示す
模式断面図（一部省略）である。図示の如く、反応塔１
１０は、排ガス供給部１８と処理済ガス排出部２０との
間に、炭素質吸着剤Ｐｆ（媒体）が流下する複数の流動
層Ｓ１〜Ｓ３（移動層）が形成されたものである。FIG. 2 is a schematic sectional view (partially omitted) showing the reaction tower 110 in FIG. As shown, reaction tower 1
A plurality of fluidized beds S1 to S3 (moving beds) in which the carbonaceous adsorbent Pf (medium) flows down are formed between the exhaust gas supply unit 18 and the treated gas discharge unit 20.
【００２５】排ガス供給部１８内における排ガスＷの流
通方向の最下流には、複数のガス流通孔を有する略板状
の入口側ルーバ２が設置されている。また、処理済ガス
排出部２０内における最上流には、複数のガス流通孔を
有する略板状の出口側ルーバ４が設置されている。さら
に、入口側ルーバ２と出口側ルーバ４との間には、多孔
板６，８が配設されている。このように、流動層Ｓ１〜
Ｓ３は、入口側ルーバ２、多孔板６，８及び出口側ルー
バ４によって、排ガスＷの流通方向に沿って順に画成さ
れている。また、流動層Ｓ２，Ｓ３の内部には、後述す
る各領域内で且つ略鉛直方向すなわち流動層Ｓ２，Ｓ３
の延在方向に沿って複数の温度センサ５２，５３（温度
測定手段）が配設されている。A substantially plate-shaped inlet-side louver 2 having a plurality of gas circulation holes is installed in the exhaust gas supply unit 18 at the most downstream side in the circulation direction of the exhaust gas W. Further, a substantially plate-shaped outlet side louver 4 having a plurality of gas circulation holes is installed at the uppermost stream in the treated gas discharge unit 20. Further, perforated plates 6 and 8 are arranged between the inlet louver 2 and the outlet louver 4. Thus, the fluidized beds S1 to S1
S3 is sequentially defined by the inlet louver 2, the perforated plates 6 and 8 and the outlet louver 4 along the flow direction of the exhaust gas W. In addition, inside the fluidized beds S2 and S3, the fluidized beds S2 and S3 are provided in respective regions described below and in substantially vertical directions.
A plurality of temperature sensors 52, 53 (temperature measuring means) are arranged along the extending direction of the.
【００２６】これらの流動層Ｓ１〜Ｓ３の上方には、開
閉バルブが設置された炭素質吸着剤Ｐｆの供給管を介し
て図示しないホッパが接続されている。このように、炭
素質吸着剤Ｐｆの供給管及びホッパから媒体供給部が構
成されている。また、各流動層Ｓ１〜Ｓ３の下端部は、
それぞれ中空の断面楔状を成す排出部１１〜１３とされ
ており、下方に向かって徐々に狭められたいわゆる「片
絞り」構造が形成されている。これらの排出部１１〜１
３は、内部空間がそれぞれ流動層Ｓ１〜Ｓ３の上部空間
と連通しており、排ガスＷと接触して各流動層Ｓ１〜Ｓ
３を流下してきた炭素質吸着剤Ｐｆが一時的に滞留する
部位となっている。Above these fluidized beds S1 to S3, a hopper (not shown) is connected via a supply pipe for a carbonaceous adsorbent Pf having an opening / closing valve. In this way, the medium supply unit is composed of the carbonaceous adsorbent Pf supply pipe and the hopper. The lower end of each fluidized bed S1 to S3 is
The discharge portions 11 to 13 each have a hollow wedge-shaped cross section, and a so-called “single aperture” structure is formed in which the discharge portions 11 to 13 are gradually narrowed downward. These discharge parts 11 to 1
3, the internal spaces communicate with the upper spaces of the fluidized beds S1 to S3, respectively, and come into contact with the exhaust gas W to form the fluidized beds S1 to S3.
It is a site where the carbonaceous adsorbent Pf that has flowed down 3 is temporarily retained.
【００２７】また、各排出部１１〜１３の下端には、図
示しない駆動部に接続された棒状のロールフィーダー２
１〜２３（媒体排出手段）等の切出装置がそれぞれ回動
自在に設けられている。これらのロールフィーダー２１
〜２３の回転により、排出部１１〜１３に滞留した炭素
質吸着剤Ｐｆが流動層Ｓ１〜Ｓ３の外部へ排出される。
さらに、排出部１１〜１３の周囲を覆うように、炭素質
吸着剤Ｐｆ用の回収ホッパ９が設けられている。この回
収ホッパ９の下端には、開閉バルブを有する炭素質吸着
剤Ｐｆの回収管が接続されている。At the lower end of each of the discharging units 11 to 13, a rod-shaped roll feeder 2 connected to a driving unit (not shown) is provided.
Cutting devices such as 1 to 23 (medium ejecting means) are rotatably provided. These roll feeders 21
Due to the rotation of ˜23, the carbonaceous adsorbent Pf accumulated in the discharge parts 11 to 13 is discharged to the outside of the fluidized beds S1 to S3.
Further, a recovery hopper 9 for the carbonaceous adsorbent Pf is provided so as to cover the periphery of the discharge parts 11 to 13. A recovery pipe for the carbonaceous adsorbent Pf having an opening / closing valve is connected to the lower end of the recovery hopper 9.
【００２８】図３は、図１に示す排ガス処理装置１００
の要部を模式的に示す正面図である。排ガス供給部１８
は、ダンパＤが設けられた排ガス供給配管３１と接続さ
れている。この排ガス供給配管３１には、ダンパＤが設
けられた部位よりも上流側に空気Ｇａが供給される空気
供給配管３２が接続されている。また、排ガス供給部１
８には、窒素ガスＧｎ（不活性ガス）が供給される窒素
ガス供給配管３３が接続されている。また、処理済ガス
排出部２０は、ブロア３６が設けられた排気配管３５を
介してスタック１４０に接続されている。FIG. 3 shows an exhaust gas treating apparatus 100 shown in FIG.
It is a front view which shows the principal part of this typically. Exhaust gas supply unit 18
Is connected to the exhaust gas supply pipe 31 provided with the damper D. An air supply pipe 32 for supplying air Ga is connected to the exhaust gas supply pipe 31 at an upstream side of a portion where the damper D is provided. Also, the exhaust gas supply unit 1
A nitrogen gas supply pipe 33 to which the nitrogen gas Gn (inert gas) is supplied is connected to 8. Further, the treated gas discharge unit 20 is connected to the stack 140 via an exhaust pipe 35 provided with a blower 36.
【００２９】図４は、図１に示す排ガス処理装置１００
の要部の構成を模式的に示す上面図である。流動層Ｓ１
〜Ｓ３は、排ガスＷの流通方向に並設された隔壁１０に
よって複数の領域Ｒａ〜Ｒｆに分画されている。また、
排ガス供給配管３１は、ダンパＤの下流側で複数の分岐
配管３１ａ〜３１ｆに分岐されており、各分岐配管３１
ａ〜３１ｆは、それぞれ領域Ｒａ〜Ｒｆの入口側に接続
されている。これらの分岐配管３１ａ〜３１ｆの各々に
はダンパＤａが設けられており、各ダンパＤａには窒素
ガス供給配管３３が接続されている。なお、図３及び４
において、ダンパＤ，Ｄａ，Ｄｂは、各々に備わる弁を
駆動するための駆動部（図示せず）に接続されている。FIG. 4 is an exhaust gas treating apparatus 100 shown in FIG.
It is a top view which shows the structure of the principal part of this typically. Fluidized bed S1
S3 are divided into a plurality of regions Ra to Rf by the partition walls 10 arranged in parallel in the flow direction of the exhaust gas W. Also,
The exhaust gas supply pipe 31 is branched into a plurality of branch pipes 31 a to 31 f on the downstream side of the damper D, and each branch pipe 31
a to 31f are connected to the entrance sides of the regions Ra to Rf, respectively. A damper Da is provided in each of these branch pipes 31a to 31f, and a nitrogen gas supply pipe 33 is connected to each damper Da. 3 and 4
In, the dampers D, Da, Db are connected to a drive unit (not shown) for driving the valves provided in each.
【００３０】ダンパＤａは、流路の切り替え叉は開度の
調節により、排ガスＷ及び窒素ガスＧｎの挿通及び遮断
を行うものである。このように、ダンパＤａ及び分岐配
管３１ａ〜３１ｆにより排ガス分配手段が構成されてお
り、これら分岐配管３１ａ及びダンパＤａと排ガス供給
配管３１とから排ガス供給部が構成されている。また、
ダンパＤａ及び窒素ガス供給配管３３から不活性ガス分
配手段が構成されており、これらダンパＤａ及び窒素ガ
ス供給配管３３と分岐配管３１ａとから不活性ガス供給
部が構成されている。The damper Da inserts and shuts off the exhaust gas W and the nitrogen gas Gn by switching the flow path or adjusting the opening degree. In this way, the damper Da and the branch pipes 31a to 31f constitute an exhaust gas distribution means, and the branch pipe 31a and the damper Da and the exhaust gas supply pipe 31 constitute an exhaust gas supply unit. Also,
The damper Da and the nitrogen gas supply pipe 33 constitute an inert gas distribution means, and the damper Da and the nitrogen gas supply pipe 33 and the branch pipe 31a constitute an inert gas supply unit.
【００３１】またさらに、排気配管３５は、複数の分岐
配管３５ａ〜３５ｆに分岐されており、各分岐配管３５
ａ〜３５ｆは、それぞれ領域Ｒａ〜Ｒｆの出口側に接続
されている。さらにまた、各分岐配管３５ａ〜３５ｆの
それぞれにはダンパＤｂが設けられている。このような
構成により、排ガス供給部１８に供給された排ガスＷは
分流され、各分岐配管３１ａ〜３１ｆを通して各領域Ｒ
ａ〜Ｒｆへ独立に導入され、流動層Ｓ１〜Ｓ３を横断す
るように流通し、各分岐配管３５ａ〜３５ｆを通して処
理済ガス排出部２０で合流して排気される。Furthermore, the exhaust pipe 35 is branched into a plurality of branch pipes 35a to 35f, and each branch pipe 35
a to 35f are connected to the exit sides of the regions Ra to Rf, respectively. Furthermore, a damper Db is provided in each of the branch pipes 35a to 35f. With such a configuration, the exhaust gas W supplied to the exhaust gas supply unit 18 is diverted and each region R is passed through each branch pipe 31a to 31f.
a) to Rf are independently introduced, flow so as to traverse the fluidized beds S1 to S3, and are joined and exhausted through the treated gas discharge section 20 through the respective branch pipes 35a to 35f.
【００３２】図５は、図１に示す排ガス処理装置１００
の他の要部を模式的に示す構成図である。制御装置７
（ガス供給制御部）は、出力インターフェイス７１，７
３及び入力インターフェイス７２，７４及びそれらに接
続されたＣＰＵ７５を備えたものである。この制御装置
７は、出力インターフェイス７１を介してダンパＤ，Ｄ
ａ…Ｄａ，Ｄｂ…Ｄｂに、入力インターフェイス７２を
介して温度センサ５２…５２，５３…５３に、出力イン
ターフェイス７３を介してロールフィーダー２１〜２３
に、及び、入力インターフェイス７４を介して入力装置
７６に接続されている。なお、制御装置７は媒体排出量
制御部を兼ねるものである。また、便宜上、制御装置７
がダンパＤ，Ｄａ，Ｄｂ及びロールフィーダー２１〜２
３に直接接続しているように図示したが、実質的にはそ
れらの駆動部に電気的に接続されている。FIG. 5 shows an exhaust gas treating apparatus 100 shown in FIG.
It is a block diagram which shows the other principal part typically. Control device 7
The (gas supply control unit) has output interfaces 71, 7
3 and the input interfaces 72 and 74 and the CPU 75 connected to them. This control device 7 is provided with dampers D, D via an output interface 71.
a ... Da, Db ... Db, temperature sensors 52 ... 52, 53 ... 53 via an input interface 72, and roll feeders 21-23 via an output interface 73.
And is connected to the input device 76 via the input interface 74. The control device 7 also serves as a medium ejection amount control unit. Further, for convenience, the control device 7
Are dampers D, Da, Db and roll feeders 21 to 2
Although shown as being directly connected to 3, they are substantially electrically connected to their drive.
【００３３】このように構成された排ガス処理装置１０
０を用いた本発明の排ガス処理方法の一実施形態につい
て以下に説明する。まず、反応塔１１０に炭素質吸着剤
Ｐｆを供給し、流動層Ｓ１〜Ｓ３の各領域Ｒａ〜Ｒｆを
流下させる（図２参照；媒体供給工程）。次に、排ガス
Ｗが流通するようにダンパＤの流路を開放し、排ガス供
給配管３１を通して排ガスＷを排ガス供給部１８へ導入
する（図３参照）。この時、各領域Ｒａ〜Ｒｆに接続さ
れた分岐配管３１ａ〜３１ｆ，３５ａ〜３５ｆの各ダン
パＤａ，Ｄｂを開放する（図４参照）。これにより、分
流された排ガスＷは、炭素質吸着剤Ｐｆの流下方向に略
直交する方向に各領域Ｒａ〜Ｒｆ内を通過し、ＳＯ2ガ
ス等の被除去成分が炭素質吸着剤Ｐｆに吸着される（排
ガス供給工程）。Exhaust gas treatment device 10 having such a configuration
One embodiment of the exhaust gas treatment method of the present invention using 0 will be described below. First, the carbonaceous adsorbent Pf is supplied to the reaction tower 110 to flow down the regions Ra to Rf of the fluidized beds S1 to S3 (see FIG. 2; medium supply step). Next, the flow path of the damper D is opened so that the exhaust gas W flows, and the exhaust gas W is introduced into the exhaust gas supply unit 18 through the exhaust gas supply pipe 31 (see FIG. 3). At this time, the dampers Da and Db of the branch pipes 31a to 31f and 35a to 35f connected to the regions Ra to Rf are opened (see FIG. 4). As a result, the split exhaust gas W passes through the regions Ra to Rf in a direction substantially orthogonal to the downward direction of the carbonaceous adsorbent Pf, and the components to be removed such as SO 2 gas are adsorbed on the carbonaceous adsorbent Pf. (Exhaust gas supply process).
【００３４】ここで、排ガスＷの温度は、その発生源、
ガスの種類等によって適宜設定することが可能である。
具体的には、排ガスＷ中のＳＯ2濃度が１０〜３００
ｐｐｍ、Ｏ2濃度が１４〜１６ｖｏｌ％、Ｈ2Ｏが７〜１
３ｖｏｌ％のときには、排ガスＷ温度を１００〜１４５
℃とし、排ガスＷ中のＳＯ2濃度が１５０〜１０００
ｐｐｍ、Ｏ2濃度が４〜６ｖｏｌ％、Ｈ2Ｏ濃度が７〜１
３％のときには、排ガスＷ温度を１３０〜１５０℃とし
て通常運転を行う方法を例示できる。Here, the temperature of the exhaust gas W depends on its source,
It can be appropriately set depending on the type of gas and the like.
Specifically, the SO 2 concentration in the exhaust gas W is 10 to 300.
ppm, O 2 concentration is 14 to 16 vol%, H 2 O is 7-1.
When it is 3 vol%, the exhaust gas W temperature is 100 to 145
And the SO 2 concentration in the exhaust gas W is 150 to 1000
ppm, O 2 concentration is 4 to 6 vol%, H 2 O concentration is 7-1.
When it is 3%, it is possible to exemplify a method in which the exhaust gas W temperature is set to 130 to 150 ° C. and normal operation is performed.
【００３５】ここで、排ガスＷの特性により、空気供給
配管３２を通して冷却用の空気Ｇａを排ガス供給配管３
１へ供給する。この空気Ｇａは、排ガスＷと合流して流
動層Ｓ１〜Ｓ３の各領域Ｒａ〜Ｒｆを流通し、炭素質吸
着剤Ｐｆの温度が上記の通常運転に適した温度に良好に
維持される。特に、上記例示の排ガスＷに対して、こ
のような空気Ｇａの供給が有効である。換言すれば、ガ
スの成分に応じて空気Ｇａの供給叉は非供給による運転
が可能である。Here, depending on the characteristics of the exhaust gas W, the cooling air Ga is supplied through the air supply pipe 32 to the exhaust gas supply pipe 3
Supply to 1. The air Ga merges with the exhaust gas W and flows through the regions Ra to Rf of the fluidized beds S1 to S3, and the temperature of the carbonaceous adsorbent Pf is favorably maintained at the temperature suitable for the above normal operation. In particular, such supply of the air Ga to the exhaust gas W exemplified above is effective. In other words, it is possible to operate by supplying or not supplying the air Ga depending on the gas component.
【００３６】このように排ガスＷを流通させている状態
で、流動層Ｓ２，Ｓ３を流動する炭素質吸着剤Ｐｆの温
度を複数の温度センサ５２，５３で経時的に測定する
（図２参照；温度測定工程）。上述したように、排ガス
Ｗ中の被除去成分を吸着した炭素質吸着剤Ｐｆは、その
吸着熱等により加熱され、局所的に温度が顕著に上昇す
るおそれがある。そこで、温度センサ５２，５３で測定
された温度実測値に基づいて以下に示す制御運転を実施
する。With the exhaust gas W flowing in this way, the temperature of the carbonaceous adsorbent Pf flowing in the fluidized beds S2, S3 is measured with time by the plurality of temperature sensors 52, 53 (see FIG. 2; Temperature measurement process). As described above, the carbonaceous adsorbent Pf that has adsorbed the component to be removed in the exhaust gas W is heated by the heat of adsorption or the like, and there is a risk that the temperature will rise significantly locally. Therefore, the following control operation is carried out based on the actual temperature measurement values measured by the temperature sensors 52 and 53.
【００３７】温度センサ５２，５３による複数の温度実
測値は、入力インターフェイス７２を通してＣＰＵ７１
に入力される。ＣＰＵ７５には、入力インターフェイス
７４を通して入力装置７６から予め炭素質吸着剤Ｐｆの
許容温度として所定のしきい値を入力し、記憶させてお
く。ＣＰＵ７５では、そのしきい値と各温度実測値とを
比較する。そして、複数の温度実測値のなかで、しきい
値よりも例えば１０℃程度低い温度に達したものが生じ
たら、その温度実測値が取得された領域（ここでは、例
えば領域Ｒｃとする）に接続された分岐配管３１ｃのダ
ンパＤａの開度を絞るための制御信号を、ＣＰＵ７５か
ら出力インターフェイス７１を通してそのダンパＤａへ
出力する。これにより、ダンパＤａを閉じて排ガスＷの
供給を停止し更には後述する窒息操作を行うための準備
（窒息準備）が行われる。A plurality of actual temperature values measured by the temperature sensors 52 and 53 are sent to the CPU 71 through the input interface 72.
Entered in. A predetermined threshold value as an allowable temperature of the carbonaceous adsorbent Pf is input to the CPU 75 in advance from the input device 76 through the input interface 74 and stored therein. The CPU 75 compares the threshold value with each temperature measurement value. Then, if one of the plurality of actually measured values reaches a temperature lower than the threshold value by, for example, about 10 ° C., the temperature actually measured value is acquired in the region (here, for example, the region Rc). A control signal for reducing the opening degree of the damper Da of the connected branch pipe 31c is output from the CPU 75 to the damper Da through the output interface 71. As a result, the damper Da is closed, the supply of the exhaust gas W is stopped, and further preparations for performing a choking operation described later (suffocation preparation) are performed.
【００３８】次いで、温度実測値がしきい値を超えた
ら、ＣＰＵ７５から分岐配管３１ｃ、３５ｃのダンパＤ
ａ，Ｄｂを閉じるための制御信号をそれらのダンパＤ
ａ，Ｄｂへ出力する。これにより、領域Ｒｃへの排ガス
Ｗの供給を停止する。こうして、領域Ｒｃと外気との接
触を遮断する（排ガス供給制御工程）ことにより、新た
な吸着熱等の発生が抑止される。Next, when the measured temperature value exceeds the threshold value, the damper D of the branch pipes 31c and 35c from the CPU 75.
a, Db control signals for closing the damper D
Output to a and Db. As a result, the supply of the exhaust gas W to the region Rc is stopped. In this way, by interrupting the contact between the region Rc and the outside air (exhaust gas supply control step), generation of new heat of adsorption or the like is suppressed.
【００３９】さらに、領域Ｒｃに接続された分岐配管３
１ｃのダンパＤａの流路を切り替えるための制御信号、
及び、排ガス供給制御工程において閉じた分岐配管３５
ｃのダンパＤｂを開くための制御信号を、ＣＰＵ７５か
らそれらのダンパＤａ，Ｄｂへ出力する。これにより、
領域Ｒｃに接続された窒素ガス供給配管３３側にそのダ
ンパＤａを開放し、窒素ガスＧｎを領域Ｒｃ内に流通さ
せ（不活性ガス供給工程）、領域Ｒｃ内に存在する炭素
質吸着剤Ｐｆを“窒息”させる。領域Ｒｃ内を通過した
窒素ガスＧｎは、再開させたダンパＤｂを通して領域Ｒ
ｃ外へ排出される。このような窒素ガスＧｎの供給によ
り、領域Ｒｃ内の酸素ガス濃度が低減され、炭素質吸着
剤Ｐｆの酸化等による発熱が抑制される。よって、炭素
質吸着剤Ｐｆの燃焼を確実に回避できる。Further, the branch pipe 3 connected to the region Rc
A control signal for switching the flow path of the damper Da of 1c,
And branch pipe 35 closed in the exhaust gas supply control process
A control signal for opening the damper Db of c is output from the CPU 75 to the dampers Da and Db. This allows
The damper Da is opened to the side of the nitrogen gas supply pipe 33 connected to the region Rc, the nitrogen gas Gn is circulated in the region Rc (inert gas supply step), and the carbonaceous adsorbent Pf existing in the region Rc is removed. Let's suffocate. The nitrogen gas Gn that has passed through the region Rc passes through the restarted damper Db, and then the region R
c is discharged to the outside. By supplying the nitrogen gas Gn in this way, the oxygen gas concentration in the region Rc is reduced, and heat generation due to oxidation of the carbonaceous adsorbent Pf and the like is suppressed. Therefore, it is possible to reliably avoid the combustion of the carbonaceous adsorbent Pf.
【００４０】ここで、所定のしきい値を、好ましくは１
４５〜１８０℃、より好ましくは１５０〜１７５℃、特
に好ましくは１６０〜１７０℃とすると好適である。こ
のしきい値が１４５℃未満であると、安定な運転状態が
確保されているにも拘わらず、一部の領域への排ガスＷ
の供給停止叉は窒息操作が実施されてしまい、排ガス処
理に支障をきたすおそれがある。これに対し、このしき
い値が１８０℃を超過すると、窒息操作を行っても炭素
質吸着剤Ｐｆの温度が低下しないことがある。こうなる
と、炭素質吸着剤Ｐｆの温度がその着火温度（例えば３
７０〜４００℃）よりも高くなってしまい、ホットスポ
ットが生じて徐々に拡大するおそれがあるので好ましく
ない。Here, the predetermined threshold value is preferably 1
The temperature is preferably 45 to 180 ° C, more preferably 150 to 175 ° C, and particularly preferably 160 to 170 ° C. If this threshold value is less than 145 ° C., the exhaust gas W to a part of the region will be generated although the stable operating state is secured.
The supply of C. or the choking operation may be carried out, which may hinder the exhaust gas treatment. On the other hand, when the threshold value exceeds 180 ° C., the temperature of the carbonaceous adsorbent Pf may not decrease even if the choking operation is performed. In this case, the temperature of the carbonaceous adsorbent Pf changes to its ignition temperature (for example, 3
(70 to 400 ° C.), and hot spots may occur, which may gradually expand, which is not preferable.
【００４１】次いで、排ガスＷの供給停止及び窒息操作
を行うことにより領域Ｒｃ内の炭素質吸着剤Ｐｆの温度
が上記のしきい値以下となったら、制御装置７からの制
御信号によりダンパＤａ，Ｄｂの流路及び開度を初期状
態に戻す。これにより、排ガス処理装置１００を定常的
な運転状態に復帰させる。Next, when the temperature of the carbonaceous adsorbent Pf in the region Rc falls below the threshold value by stopping the supply of the exhaust gas W and performing the choking operation, the damper Da, The flow path and opening of Db are returned to the initial state. As a result, the exhaust gas treatment device 100 is returned to a steady operating state.
【００４２】このように構成された排ガス処理装置１０
０及びそれを用いた排ガス処理方法によれば、各領域Ｒ
ａ〜Ｒｆ内で且つ流動層Ｓ２，Ｓ３の延在方向（つまり
略鉛直方向、叉は、炭素質吸着剤Ｐｆの流下方向）に沿
った複数の位置において炭素質吸着剤Ｐｆの温度を測定
し、それらの温度実測値に基づいて、所定のしきい値を
超えた部位が含まれる領域に対して排ガスの供給停止及
び窒息操作が行われる。よって、排ガスの入口及び出口
温度に基づいて吸着材（媒体）の冷却を行う従来に比し
て、ホットスポットの発生をより確実に予知叉は予測で
きる。その結果、ホットスポットの発生をより確実且つ
十分に防止できる。また、流動層Ｓ２，Ｓ３内における
複数位置で炭素質吸着剤Ｐｆの温度を測定するので、炭
素質吸着剤Ｐｆの局所的な温度上昇部位を確実に把握で
きる。したがって、窒息を行うべき領域を的確に捉える
ことができ、ホットスポットの発生を一層確実に防止で
きる。Exhaust gas treatment device 10 having such a configuration
0 and the exhaust gas treatment method using the same, each region R
The temperature of the carbonaceous adsorbent Pf is measured at a plurality of positions within a to Rf and along the extending direction of the fluidized beds S2, S3 (that is, the substantially vertical direction, or the flow-down direction of the carbonaceous adsorbent Pf). Based on the measured temperature values, the exhaust gas supply is stopped and the suffocation operation is performed on the region including the portion exceeding the predetermined threshold value. Therefore, the occurrence of a hot spot can be predicted more reliably than in the conventional case in which the adsorbent (medium) is cooled based on the inlet and outlet temperatures of the exhaust gas. As a result, the occurrence of hot spots can be prevented more reliably and sufficiently. Moreover, since the temperature of the carbonaceous adsorbent Pf is measured at a plurality of positions in the fluidized beds S2, S3, it is possible to reliably grasp the local temperature rising portion of the carbonaceous adsorbent Pf. Therefore, the area where the suffocation should be performed can be accurately grasped, and the occurrence of the hot spot can be prevented more reliably.
【００４３】また、炭素質吸着剤Ｐｆの流下方向に沿っ
てその温度を測定するので、流動する炭素質吸着剤Ｐｆ
の温度履歴を把握できる。よって、炭素質吸着剤Ｐｆの
温度の上昇傾向を監視することが可能となり、窒息操作
をより的確に且つ適時に実施できる利点がある。Further, since the temperature of the carbonaceous adsorbent Pf is measured along the downward direction, the flowing carbonaceous adsorbent Pf
The temperature history of can be grasped. Therefore, it becomes possible to monitor the rising tendency of the temperature of the carbonaceous adsorbent Pf, and there is an advantage that the choking operation can be performed more accurately and in a timely manner.
【００４４】さらに、排ガスＷの供給停止に引き続い
て、対象の領域（上述の実施形態では領域Ｒｃ）に窒素
ガスＧｎを流通させるので、その領域Ｒｃ内の酸素ガス
濃度が低減され、炭素質吸着剤Ｐｆの酸化による発熱が
抑制される。したがって、炭素質吸着剤Ｐｆの温度上昇
を更に良好に抑制でき、ホットスポットの発生ひいては
炭素質吸着剤Ｐｆの燃焼によるホットスポットの拡大を
更に一層防止できる。Further, after the supply of the exhaust gas W is stopped, the nitrogen gas Gn is circulated in the target region (the region Rc in the above-described embodiment), so that the oxygen gas concentration in the region Rc is reduced, and the carbonaceous adsorption. Heat generation due to the oxidation of the agent Pf is suppressed. Therefore, the temperature rise of the carbonaceous adsorbent Pf can be suppressed more satisfactorily, and the occurrence of hot spots, and thus the expansion of hot spots due to the combustion of the carbonaceous adsorbent Pf, can be prevented even further.
【００４５】またさらに、炭素質吸着剤Ｐｆの温度が適
当な温度範囲に低下した後、ダンパＤａ，Ｄｂを初期状
態に戻すことにより、対象の領域Ｒｃへの排ガスＷの供
給を再開すれば、通常運転への復帰を簡易に且つ連続的
に行うことが可能となる。したがって、排ガス処理装置
１００の運転効率の低下を必要最小限に抑え得る。さら
にまた、所定のしきい値を上述した好適な範囲内の値と
するので、安定な運転を行いつつ、炭素質吸着剤Ｐｆの
温度上昇を一層確実に抑制できる。Furthermore, after the temperature of the carbonaceous adsorbent Pf has fallen to an appropriate temperature range, the dampers Da and Db are returned to the initial state to restart the supply of the exhaust gas W to the target region Rc. It is possible to easily and continuously return to the normal operation. Therefore, it is possible to suppress a decrease in the operating efficiency of the exhaust gas treatment device 100 to a necessary minimum. Furthermore, since the predetermined threshold value is set to a value within the above-mentioned suitable range, it is possible to more reliably suppress the temperature rise of the carbonaceous adsorbent Pf while performing stable operation.
【００４６】次に、排ガス処理装置１００を用いた本発
明による排ガス処理方法の他の実施形態について以下に
説明する。なお、炭素質吸着剤Ｐｆの反応塔１１０への
供給及び排ガスＷの供給による定常運転状態並びに温度
測定工程は、上述した実施形態におけるのと同様である
ので、ここでの説明は省略する。ここで、排ガス処理装
置１００は、先に述べたように、ロールフィーダー２１
〜２３を備えており、流動層Ｓ１〜Ｓ３を流下してきた
炭素質吸着剤Ｐｆが排出部１１〜１３から回収ホッパ９
へ排出される（媒体排出工程）。Next, another embodiment of the exhaust gas treating method of the present invention using the exhaust gas treating apparatus 100 will be described below. The steady operation state and the temperature measurement step by supplying the carbonaceous adsorbent Pf to the reaction tower 110 and supplying the exhaust gas W are the same as those in the above-described embodiment, and therefore the description thereof is omitted here. Here, as described above, the exhaust gas treating apparatus 100 is configured so that the roll feeder 21
23 to 23, and the carbonaceous adsorbent Pf flowing down the fluidized beds S1 to S3 is collected from the discharge parts 11 to 13 by the recovery hopper 9.
Is discharged to the medium (medium discharging step).
【００４７】本実施形態においては、排ガスＷの処理運
転時に温度センサ５２，５３による温度実測値が先述の
しきい値を超えた場合に、その温度実測値が得られた部
位が含まれる領域を有する流動層（ここでは流動層Ｓ２
とする）の下部に設けられたロールフィーダー２２の回
転数を増大させるための制御信号を、ＣＰＵ７５から出
力インターフェイス７３を通してロールフィーダー２２
（の駆動部）へ出力する。これにより、流動層Ｓ２に存
在する炭素質吸着剤Ｐｆの流動層Ｓ２外への排出速度が
増大される（排出速度調整ステップ）。In the present embodiment, when the temperature measured values by the temperature sensors 52 and 53 exceed the above-mentioned threshold value during the processing operation of the exhaust gas W, the region including the part where the temperature measured value is obtained is selected. Having a fluidized bed (here, fluidized bed S2
The control signal for increasing the number of rotations of the roll feeder 22 provided below the roll feeder 22 is transmitted from the CPU 75 through the output interface 73.
(Drive unit of). As a result, the discharge rate of the carbonaceous adsorbent Pf existing in the fluidized bed S2 to the outside of the fluidized bed S2 is increased (exhaust rate adjusting step).
【００４８】その結果、温度上昇の兆候が認められた炭
素質吸着剤Ｐｆがより速やかに回収ホッパ９内へ排出さ
れ、排ガスＷとの接触が直ちに遮断される。したがっ
て、炭素質吸着剤Ｐｆのホットスポットの発生を十分に
防止できる。このとき、回収ホッパ９内へ空気等の冷却
用ガス、不活性ガス等を供給すると、回収ホッパ９内で
の炭素質吸着剤Ｐｆの温度上昇を抑制する効果が高めら
れるので好ましい。また、排出速度調整ステップを実施
する際には、前述の排ガス供給制御工程及び不活性ガス
供給工程を必ずしも実施する必要はないが、炭素質吸着
剤Ｐｆの温度をより速やかに低下させる観点からは、こ
れらの排出速度調整ステップ、排ガス供給制御工程及び
不活性ガス供給工程を併せて実施した方が有効である。As a result, the carbonaceous adsorbent Pf in which the sign of the temperature rise is recognized is discharged into the recovery hopper 9 more quickly, and the contact with the exhaust gas W is immediately cut off. Therefore, it is possible to sufficiently prevent the occurrence of hot spots in the carbonaceous adsorbent Pf. At this time, it is preferable to supply a cooling gas such as air or an inert gas into the recovery hopper 9 because the effect of suppressing the temperature rise of the carbonaceous adsorbent Pf in the recovery hopper 9 can be enhanced. Further, when performing the discharge rate adjusting step, the exhaust gas supply control step and the inert gas supply step described above do not necessarily have to be performed, but from the viewpoint of decreasing the temperature of the carbonaceous adsorbent Pf more quickly. It is more effective to carry out these discharge rate adjusting step, exhaust gas supply control step and inert gas supply step together.
【００４９】なお、上述した排ガス処理装置及び方法の
各実施形態においては、窒息操作を行う際にダンパＤの
開度を調節して排ガスＷの排ガス供給部１８への供給量
を低減してもよく、或いはダンパＤを閉じて領域Ｒａ〜
Ｒｆの全てに対して排ガスＷの供給を停止しても構わな
い。また、ダンパＤ，Ｄａ，Ｄｂの設置箇所及び員数は
図示に限定されるものではない。これに関する他の例を
図６に示す。In each of the above embodiments of the exhaust gas treating apparatus and method, even when the choking operation is performed, the opening amount of the damper D is adjusted to reduce the supply amount of the exhaust gas W to the exhaust gas supply unit 18. Well, or with the damper D closed, the region Ra-
The supply of the exhaust gas W to all Rf may be stopped. Further, the installation locations and the numbers of the dampers D, Da, Db are not limited to those shown in the drawings. Another example of this is shown in FIG.
【００５０】図６は、本発明による排ガス処理装置に係
る他の実施形態の要部の構成を模式的に示す上面図であ
る。図６においては、排ガス供給配管３１が二系統設け
られており、領域Ｒａ〜Ｒｃ及び領域Ｒｄ〜Ｒｆにそれ
ぞれ接続された分岐配管がダンパＤｃで隔離されるよう
になっている。また、排気配管３５も同様に、領域Ｒａ
〜Ｒｃ及び領域Ｒｄ〜Ｒｆにそれぞれ接続された分岐配
管がダンパＤｄによって隔離されるように構成されてい
る。なお、各ダンパＤａ，Ｄｂに対し、図４に示すのと
同等な窒素ガス供給配管３３を接続してもよい。FIG. 6 is a top view schematically showing the structure of the main part of another embodiment of the exhaust gas treating apparatus according to the present invention. In FIG. 6, two exhaust gas supply pipes 31 are provided, and the branch pipes respectively connected to the regions Ra to Rc and the regions Rd to Rf are isolated by the damper Dc. Similarly, the exhaust pipe 35 also has a region Ra.
To Rc and the regions Rd to Rf are respectively connected to each other by the damper Dd. A nitrogen gas supply pipe 33 equivalent to that shown in FIG. 4 may be connected to each of the dampers Da and Db.
【００５１】また、流動層Ｓ１〜Ｓ３及び領域Ｒａ〜Ｒ
ｆの区画数（区分数）は図示に限定されるものではな
い。流動層は一層叉は二層でもよく、或いは四層以上で
もよく、領域は複数であればよい。さらに、ダンパＤ，
Ｄａ，Ｄｂ，Ｄｃ，Ｄｄの代りに一般に使用される切替
弁等を用いてよく、叉は、例えば排ガス供給配管３１、
空気供給配管３２、及び、窒素ガス供給配管３３にそれ
ぞれ開閉弁を設置した構成としてもよい。またさらに、
入力装置７６としては、例えば、キーボード、磁気情報
を読み取るデータリーダー、或いは、磁気、光又は光磁
気情報を保持かつ出力し得るディスク等から成るものを
例示できる。The fluidized beds S1 to S3 and the regions Ra to R are also provided.
The number of sections of f (the number of sections) is not limited to that shown in the figure. The fluidized bed may be one layer or two layers, or four or more layers, and the region may be plural. In addition, damper D,
A commonly used switching valve or the like may be used instead of Da, Db, Dc, Dd, or, for example, the exhaust gas supply pipe 31,
An opening / closing valve may be installed in each of the air supply pipe 32 and the nitrogen gas supply pipe 33. Furthermore,
Examples of the input device 76 include a keyboard, a data reader for reading magnetic information, and a disk capable of holding and outputting magnetic, optical or magneto-optical information.
【００５２】また、制御装置７によってダンパＤ，Ｄ
ａ，Ｄｂの開閉叉は切り替え操作を全自動で行わずに、
温度センサ５２，５３による温度実測値が所定のしきい
値よりも例えば２０℃程度低い温度に達した場合に、そ
の領域の表示及び／叉は警報を発報し、その表示及び警
報に基づいて、手動でダンパＤ，Ｄａ，Ｄｂの開閉叉は
切り替え操作を実施しても構わない。この場合、制御装
置７に接続された表示装置及び／叉は警報装置が必要で
ある。さらに、反応塔１１０は、流動層式ではなく固定
層式でも構わない。この場合、流動層の下部にシャッタ
ー等の可動部材を設け、これを開放して自重落下により
炭素質吸着剤Ｐｆを外部へ排出してもよい。またさら
に、流動層Ｓ１に温度センサを設けてもよい。加えて、
窒息準備を行わずに、温度センサ５２，５３による温度
実測値が所定のしきい値を超えたら、ダンパＤを窒素ガ
スＧｎに切り替えて直ちに排ガスの供給停止及び窒息操
作を実施してもよい。Further, the control device 7 controls the dampers D, D.
Without opening or closing a or Db or switching operation fully automatically,
When the measured temperature value by the temperature sensors 52, 53 reaches a temperature lower than a predetermined threshold value by, for example, about 20 ° C., a display and / or an alarm for the area is issued and based on the display and the alarm. The opening / closing or switching operation of the dampers D, Da, Db may be manually performed. In this case, a display device and / or an alarm device connected to the control device 7 is required. Furthermore, the reaction tower 110 may be a fixed bed type instead of a fluidized bed type. In this case, a movable member such as a shutter may be provided below the fluidized bed, and the movable member may be opened to discharge the carbonaceous adsorbent Pf by its own weight drop. Furthermore, a temperature sensor may be provided in the fluidized bed S1. in addition,
If the temperature measurement value by the temperature sensors 52 and 53 exceeds a predetermined threshold value without preparing for suffocation, the damper D may be switched to the nitrogen gas Gn to immediately stop the supply of the exhaust gas and perform the suffocation operation.
【００５３】[0053]
【発明の効果】以上説明したように、本発明の排ガス処
理方法及び装置によれば、媒体の複数部位における温度
実測値に基づいて、移動層内における媒体の局所的な温
度上昇を把握できるので、ホットスポットの発生を確実
に予知叉は予測でき、これにより、ホットスポットの発
生を十分に防止できる。As described above, according to the exhaust gas treatment method and apparatus of the present invention, it is possible to grasp the local temperature rise of the medium in the moving bed based on the measured temperature values at a plurality of portions of the medium. Therefore, the occurrence of hot spots can be predicted or predicted with certainty, and thus the occurrence of hot spots can be sufficiently prevented.
【図１】本発明による排ガス処理装置の好適な一実施形
態を模式的に示す構成図である。FIG. 1 is a configuration diagram schematically showing a preferred embodiment of an exhaust gas treatment apparatus according to the present invention.
【図２】図１における反応塔を示す模式断面図（一部省
略）である。FIG. 2 is a schematic cross-sectional view (partially omitted) showing the reaction tower in FIG.
【図３】図１に示す排ガス処理装置の要部を模式的に示
す正面図である。FIG. 3 is a front view schematically showing a main part of the exhaust gas treating apparatus shown in FIG.
【図４】図１に示す排ガス処理装置の要部の構成を模式
的に示す上面図である。FIG. 4 is a top view schematically showing a configuration of a main part of the exhaust gas treating apparatus shown in FIG.
【図５】図１に示す排ガス処理装置の他の要部を模式的
に示す構成図である。5 is a configuration diagram schematically showing another main part of the exhaust gas treating apparatus shown in FIG.
【図６】本発明による排ガス処理装置に係る他の実施形
態の要部の構成を模式的に示す上面図である。FIG. 6 is a top view schematically showing a configuration of a main part of another embodiment of an exhaust gas treating apparatus according to the present invention.
７…制御装置（ガス供給制御部，媒体排出量制御部）、
１８…排ガス供給部、２０…処理済ガス排出部、２１，
２２，２３…ロールフィーダー（媒体排出手段）、３１
…排ガス供給配管、３１ａ〜３１ｆ…分岐配管、３３…
窒素ガス供給配管、５２，５３…温度センサ（温度測定
手段）、１００…排ガス処理装置、１１０…反応塔、Ｄ
ａ…ダンパ（排ガス分配手段，不活性ガス分配手段）、
Ｇｎ…窒素ガス（不活性ガス）、Ｐｆ…炭素質吸着剤
（媒体）、Ｒａ〜Ｒｆ…領域、Ｓ１，Ｓ２，Ｓ３…流動
層（移動層）、Ｗ…排ガス。7 ... Control device (gas supply control unit, medium discharge amount control unit),
18 ... Exhaust gas supply section, 20 ... Treated gas discharge section 21,
22, 23 ... Roll feeder (medium ejecting means), 31
... Exhaust gas supply piping, 31a to 31f ... Branch piping, 33 ...
Nitrogen gas supply pipes, 52, 53 ... Temperature sensor (temperature measuring means), 100 ... Exhaust gas treatment device, 110 ... Reaction tower, D
a: damper (exhaust gas distribution means, inert gas distribution means),
Gn ... Nitrogen gas (inert gas), Pf ... Carbonaceous adsorbent (medium), Ra-Rf ... Area, S1, S2, S3 ... Fluidized bed (moving bed), W ... Exhaust gas.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) B01D 53/02 - 53/12 B01D 53/34 - 53/96 B01J 8/00 - 8/46 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) B01D 53/02-53/12 B01D 53/34-53/96 B01J 8/00-8/46
Claims (7)
る排ガス処理方法であって、 前記排ガスに対する吸着能叉は分解能を有する媒体を、
複数の領域に区画叉は区分された移動層が形成された反
応塔に供給する媒体供給工程と、 前記排ガスを前記反応塔に供給し、該排ガスを前記媒体
が存在する前記移動層の前記各領域内へ流通させる排ガ
ス供給工程と、 前記各領域内で且つ前記移動層の延在方向に沿った複数
の位置における前記媒体の温度を測定する温度測定工程
と、 前記温度測定工程において測定された温度実測値が所定
のしきい値を超えたときに、該温度実測値が取得された
部位が含まれる前記領域への前記排ガスの供給を停止す
る排ガス供給制御工程と、を備えることを特徴とする排
ガス処理方法。1. A method for treating exhaust gas, which comprises removing components to be removed contained in the exhaust gas, wherein a medium having adsorption ability or resolution for the exhaust gas is used.
A medium supply step of supplying to a reaction tower in which a moving bed partitioned or divided into a plurality of regions is formed; and the exhaust gas is supplied to the reaction tower, and the exhaust gas is supplied to each of the moving beds in which the medium exists. Exhaust gas supply step of flowing into the area, a temperature measuring step of measuring the temperature of the medium at a plurality of positions in the area and along the extending direction of the moving layer, and measured in the temperature measuring step An exhaust gas supply control step of stopping the supply of the exhaust gas to the region including the part where the actual temperature value is acquired when the actual temperature value exceeds a predetermined threshold value, Exhaust gas treatment method.
に、不活性ガスを前記反応塔に供給し、該不活性ガスを
前記温度実測値が取得された部位が含まれる前記領域内
へ流通させる不活性ガス供給工程を更に備える、ことを
特徴とする請求項１記載の排ガス処理方法。2. After performing the exhaust gas supply control step, an inert gas is supplied to the reaction tower, and the inert gas is circulated into the region including the portion where the measured temperature value is acquired. The exhaust gas treatment method according to claim 1, further comprising an active gas supply step.
記媒体を該領域外へ排出する媒体排出工程を備えてお
り、 前記媒体排出工程は、前記温度測定工程において測定さ
れた温度実測値が所定のしきい値を超えたときに、該温
度実測値が取得された部位が含まれる前記領域内に存在
する前記媒体の該領域外への排出速度を増大させる排出
速度調節ステップを有する、ことを特徴とする請求項１
叉は２に記載の排ガス処理方法。3. A medium discharging step of discharging the medium existing in each area of the moving layer to the outside of the area, wherein the medium discharging step includes a measured temperature value measured in the temperature measuring step. Has a discharge speed adjusting step of increasing the discharge speed of the medium existing in the region including the region where the measured temperature value is acquired, to the outside of the region when exceeds a predetermined threshold value, Claim 1 characterized by the above.
Or the exhaust gas treatment method described in 2.
きに、前記所定のしきい値を１４５〜１８０℃の範囲内
の温度とする、ことを特徴とする請求項１〜３のいずれ
か一項に記載の排ガス処理方法。4. The method according to claim 1, wherein when the carbonaceous adsorbent is used as the medium, the predetermined threshold value is set to a temperature within a range of 145 to 180 ° C. The exhaust gas treatment method according to item.
る排ガス処理装置であって、 前記排ガスが流通し且つ複数の領域に区画叉は区分され
た移動層が形成された反応塔と、 前記排ガスに対する吸着能叉は分解能を有する媒体を前
記反応塔の前記移動層に供給する媒体供給部と、 前記排ガスを前記移動層の前記各領域内へ独立に供給す
る排ガス分配手段を有する排ガス供給部と、 前記各領域内で且つ前記移動層の延在方向に沿って配置
され、前記媒体の温度を測定する複数の温度測定手段
と、 前記温度測定手段と前記排ガス分配手段とに接続されて
おり、該温度測定手段で得られた前記媒体の温度実測値
に基づいて、前記排ガス分配手段から前記各領域への前
記排ガスの供給と該供給の停止とを切り替えるように該
排ガス分配手段を制御するガス供給制御部と、を備える
ことを特徴とする排ガス処理装置。5. An exhaust gas treating apparatus for removing a component to be removed contained in exhaust gas, wherein the exhaust gas is circulated, and a reaction tower in which a moving layer divided into a plurality of regions is formed, Exhaust gas supply unit having a medium supply unit for supplying a medium having an adsorption capacity or resolution for exhaust gas to the moving bed of the reaction tower, and an exhaust gas distribution unit for independently supplying the exhaust gas into each region of the moving bed. A plurality of temperature measuring means arranged in each of the regions and along the extending direction of the moving layer to measure the temperature of the medium, and connected to the temperature measuring means and the exhaust gas distributing means. Controlling the exhaust gas distribution means so as to switch the supply of the exhaust gas from the exhaust gas distribution means to each of the regions and the stop of the supply based on the measured temperature value of the medium obtained by the temperature measurement means. Exhaust gas treatment apparatus, comprising a gas supply control unit.
へ独立に供給する不活性ガス分配手段を有する不活性ガ
ス供給部を更に備えており、 前記ガス供給制御部は、前記不活性ガス分配手段に接続
されており、前記温度測定手段で得られた前記媒体の温
度実測値に基づいて、該不活性ガス分配手段から前記各
領域への前記不活性ガスの供給と該供給の停止とを切り
替えるように該不活性ガス分配手段を制御するものであ
る、ことを特徴とする請求項５記載の排ガス処理装置。6. The apparatus further comprises an inert gas supply unit having an inert gas distribution means for independently supplying an inert gas into each of the regions of the moving layer, wherein the gas supply control unit includes the inert gas supply unit. It is connected to the gas distribution means, and supplies the inert gas from the inert gas distribution means to the respective regions and stops the supply based on the measured temperature value of the medium obtained by the temperature measurement means. The exhaust gas treatment apparatus according to claim 5, wherein the inert gas distribution means is controlled so as to switch between and.
層内に存在する前記媒体を該移動層外へ排出する媒体排
出手段と、 前記温度測定手段と前記媒体排出手段とに接続されてお
り、該温度測定手段で得られた前記媒体の温度実測値に
基づいて、該媒体排出手段からの前記媒体の排出量が調
節されるように該媒体排出手段を制御する媒体排出量制
御部と、を更に備える請求項５叉は６に記載の排ガス処
理装置。7. A medium discharging means provided at a lower end portion of the moving layer for discharging the medium existing in the moving layer to the outside of the moving layer, and connected to the temperature measuring means and the medium discharging means. A medium discharge amount control unit for controlling the medium discharge unit so that the discharge amount of the medium from the medium discharge unit is adjusted based on the measured temperature value of the medium obtained by the temperature measurement unit. The exhaust gas treatment device according to claim 5 or 6, further comprising:
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|---|---|---|---|
| JP2000247689A JP3380801B2 (en) | 2000-08-17 | 2000-08-17 | Exhaust gas treatment method and apparatus |
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