JP3375338B2 - 信号の傾斜決定を用いたエンドポイント検出技術 - Google Patents

信号の傾斜決定を用いたエンドポイント検出技術

Info

Publication number
JP3375338B2
JP3375338B2 JP50149994A JP50149994A JP3375338B2 JP 3375338 B2 JP3375338 B2 JP 3375338B2 JP 50149994 A JP50149994 A JP 50149994A JP 50149994 A JP50149994 A JP 50149994A JP 3375338 B2 JP3375338 B2 JP 3375338B2
Authority
JP
Japan
Prior art keywords
layer
signal
detecting
change
breakthrough
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP50149994A
Other languages
English (en)
Japanese (ja)
Other versions
JPH07507904A (ja
Inventor
ヘルバート イー． リッツバク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Luxtron Corp
Original Assignee
Luxtron Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25405691&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP3375338(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Luxtron Corp filed Critical Luxtron Corp
Publication of JPH07507904A publication Critical patent/JPH07507904A/ja
Application granted granted Critical
Publication of JP3375338B2 publication Critical patent/JP3375338B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Image Processing (AREA)
JP50149994A 1992-06-09 1993-05-24 信号の傾斜決定を用いたエンドポイント検出技術 Expired - Lifetime JP3375338B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US89613792A 1992-06-09 1992-06-09
US896,137 1992-06-09
PCT/US1993/004936 WO1993025893A1 (en) 1992-06-09 1993-05-24 Endpoint detection technique using signal slope determinations

Publications (2)

Publication Number Publication Date
JPH07507904A JPH07507904A (ja) 1995-08-31
JP3375338B2 true JP3375338B2 (ja) 2003-02-10

Family

ID=25405691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50149994A Expired - Lifetime JP3375338B2 (ja) 1992-06-09 1993-05-24 信号の傾斜決定を用いたエンドポイント検出技術

Country Status (5)

Country Link
EP (1) EP0645008A1 (enrdf_load_stackoverflow)
JP (1) JP3375338B2 (enrdf_load_stackoverflow)
KR (1) KR950702029A (enrdf_load_stackoverflow)
TW (1) TW223176B (enrdf_load_stackoverflow)
WO (1) WO1993025893A1 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5738756A (en) * 1995-06-30 1998-04-14 Lam Research Corporation Method and apparatus for detecting optimal endpoints in plasma etch processes
US6010538A (en) * 1996-01-11 2000-01-04 Luxtron Corporation In situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication link
US6028669A (en) * 1997-07-23 2000-02-22 Luxtron Corporation Signal processing for in situ monitoring of the formation or removal of a transparent layer
WO2000071971A1 (en) 1999-05-24 2000-11-30 Luxtron Corporation Optical techniques for measuring layer thicknesses
US6570662B1 (en) 1999-05-24 2003-05-27 Luxtron Corporation Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers
CN114112944A (zh) * 2022-01-25 2022-03-01 武汉精立电子技术有限公司 一种显示面板测量方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5021362A (en) 1989-12-29 1991-06-04 At&T Bell Laboratories Laser link blowing in integrateed circuit fabrication
WO1991018322A1 (en) 1990-05-18 1991-11-28 Xinix, Inc. Method for control of photoresist develop processes

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4679938A (en) * 1985-06-03 1987-07-14 International Business Machines Corporation Defect detection in films on ceramic substrates
US5160576A (en) * 1991-03-05 1992-11-03 Lam Research Corporation Method of end point detection in a plasma etching process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5021362A (en) 1989-12-29 1991-06-04 At&T Bell Laboratories Laser link blowing in integrateed circuit fabrication
WO1991018322A1 (en) 1990-05-18 1991-11-28 Xinix, Inc. Method for control of photoresist develop processes

Also Published As

Publication number Publication date
TW223176B (enrdf_load_stackoverflow) 1994-05-01
KR950702029A (ko) 1995-05-17
EP0645008A1 (en) 1995-03-29
JPH07507904A (ja) 1995-08-31
WO1993025893A1 (en) 1993-12-23

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