JP3374777B2 - 2-metal TAB, double-sided CSP, BGA tape, and manufacturing method thereof - Google Patents
2-metal TAB, double-sided CSP, BGA tape, and manufacturing method thereofInfo
- Publication number
- JP3374777B2 JP3374777B2 JP04386899A JP4386899A JP3374777B2 JP 3374777 B2 JP3374777 B2 JP 3374777B2 JP 04386899 A JP04386899 A JP 04386899A JP 4386899 A JP4386899 A JP 4386899A JP 3374777 B2 JP3374777 B2 JP 3374777B2
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- metal
- metal tab
- double
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【0001】[0001]
【発明の属する技術分野】本発明は、2メタルTAB及
び両面CSP、BGAテープ、並びにその製造方法に関
するものである。TECHNICAL FIELD The present invention relates to a two-metal TAB, a double-sided CSP, a BGA tape, and a method for manufacturing the same.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】表裏面
に導体層を有する配線基板として種々のものが使用され
ている。具体的には、基板にフレキシブルなポリイミド
等を用いたTAB(Tape Automated B
onding)テープ、CSP(Chip Size
Package)、BGA(Ball Grid Ar
ray)、FPC(Flexible Printed
Circuit)、また、ガラスエポキシ等のリジッ
ドな基板を用いた所謂多層基板等がある。2. Description of the Related Art Various wiring boards have been used as wiring boards having conductor layers on the front and back surfaces. Specifically, a TAB (Tape Automated B) using a flexible polyimide or the like as a substrate.
onding) tape, CSP (Chip Size)
Package), BGA (Ball Grid Ar)
ray), FPC (Flexible Printed)
(Circuit), and a so-called multilayer substrate using a rigid substrate such as glass epoxy.
【0003】このような表裏面に導体層を有する基板の
製造方法として、基板の所望の個所に予めパンチングプ
レスやドリル又はレーザー光等でスルーホール又はブラ
インドビアホール等の孔を開けておく。レーザー光を用
いた場合は、レーザー光の熱により発生した所謂スミア
の除去(デスミア)を行う必要がある。As a method for manufacturing such a substrate having conductor layers on the front and back surfaces, holes such as through holes or blind via holes are previously formed in desired portions of the substrate with a punching press, a drill, laser light or the like. When laser light is used, it is necessary to remove so-called smear (desmear) generated by the heat of the laser light.
【0004】その後、スクリーン印刷機を用い導電性ペ
ースト等でこの孔を充填し表裏面の導体層を電気的に接
続する方法(以下、導電性ペースト印刷法という)で
は、スルーホール(貫通孔)の場合は裏回りを避けるた
め、孔開け工程後裏貼りシート等を貼付し、その後導電
性ペーストを印刷、硬化、裏貼りシートの剥離と長い工
程を経る必要がある。また、ブラインドビアホールにお
いては、孔への充填をつつが無く行うためマスクの開口
径の設定をシビアに行う必要から、印刷機には画像認識
装置等の正確な位置精度が要求され、勢い印刷機の仕様
が高価となり、ひいては製品コストの上昇に繋がってし
まう。After that, in the method of filling the holes with a conductive paste or the like using a screen printing machine and electrically connecting the conductor layers on the front and back surfaces (hereinafter referred to as the conductive paste printing method), through holes (through holes) are used. In this case, in order to avoid the backing, it is necessary to attach a backing sheet or the like after the perforating step, and then print and cure the conductive paste and peel the backing sheet, and then go through a long process. Also, in blind via holes, since the opening diameter of the mask must be set severely in order to fill the holes without interruption, the printing machine is required to have accurate position accuracy such as an image recognition device, and the momentum printing machine. Specifications become expensive, which in turn leads to higher product costs.
【0005】メッキを用いる場合には、孔に無電解銅メ
ッキやカーボン等を付着させて、その後電解銅メッキを
行う方法(以下、メッキ法という)であり、湿式法であ
るので、廃液の処理が問題がある。When plating is used, electroless copper plating, carbon or the like is attached to the holes, and then electrolytic copper plating is performed (hereinafter referred to as plating method). Since it is a wet method, the waste liquid is treated. There is a problem.
【0006】これらの方法は、電気的接続の信頼性はと
もかく、コスト的に更に改良された新たな方法の開発が
当業界の間では待ち望まれている。例えば、特開昭59
−61992号公報や特開昭62−81789号公報に
は、この問題点を解決する提案がなされている。In these methods, there is a long-awaited need in the art for the development of new methods that are further improved in cost, regardless of the reliability of electrical connection. For example, JP-A-59
There are proposals for solving this problem in Japanese Patent Laid-Open No. 61992 and Japanese Patent Laid-Open No. 62-81789.
【0007】特開昭59−61992号公報には、絶縁
基板の両面に、貫通孔(スルーホール)を覆う導電部を
有する配線パターンを形成し、さらに該導電部中央に貫
通孔の直径より小径の孔を打ち抜き、両面の導電部同士
を接触させ、次いで導電部同士を導電部材で固定して、
両面の銅箔を導通させるスルーホールプリント配線板の
製造方法が開示されている。In Japanese Patent Laid-Open No. 59-61992, a wiring pattern having a conductive portion covering a through hole (through hole) is formed on both surfaces of an insulating substrate, and a diameter smaller than the diameter of the through hole is formed in the center of the conductive portion. Punch out the holes of, contact the conductive parts on both sides, then fix the conductive parts with a conductive member,
A method of manufacturing a through-hole printed wiring board in which copper foils on both sides are electrically connected is disclosed.
【0008】しかし、この方法においては、スルーホー
ルの形成、小孔の打ち抜き、導電部材による固定と工程
が煩雑になるという問題がある。また、導電部のダレに
よって他側の導電部と接触させるために、表面の平滑性
に劣り、電気的接続の信頼性にも欠ける。However, this method has a problem that the steps of forming a through hole, punching out a small hole and fixing with a conductive member are complicated. Further, since the conductive portion comes into contact with the conductive portion on the other side due to sagging, the surface is inferior in smoothness and the electrical connection is also unreliable.
【0009】また、特開昭62−81789号公報に
は、未焼成セラミック(グリーンシート)にパンチでス
ルーホール(導通孔)を形成し、この後導通孔に導通ピ
ンを挿入し、その後、スクリーン印刷法によって基板の
表面に導体層を印刷し、さらにグリーンシートを焼成す
ることによって、配線基板を製造するものである。Further, in Japanese Patent Laid-Open No. 62-81789, a through hole (conduction hole) is formed by punching in an unfired ceramic (green sheet), and then a conduction pin is inserted into the conduction hole, and then a screen is formed. The wiring board is manufactured by printing a conductor layer on the surface of the board by a printing method and then firing the green sheet.
【0010】この方法は、上記のように基板としてグリ
ーンシートを用いるものであって、ポリイミド等の絶縁
性基板を用いるものではない。This method uses a green sheet as a substrate as described above, and does not use an insulating substrate such as polyimide.
【0011】従って、本発明の目的は、表裏面導体層の
電気的接続の信頼性があり、かつ、その製造コストが低
減できる2メタルTAB及び両面CSP、BGAテー
プ、並びにその製造方法を提供することにある。Therefore, an object of the present invention is to provide a two-metal TAB, a double-sided CSP, a BGA tape, and a method for manufacturing the same, which have reliable electrical connection between the front and back surface conductor layers and can reduce the manufacturing cost. Especially.
【0012】[0012]
【課題を解決するための手段】本発明者らは、検討の結
果、スルーホールをパンチングプレスで形成した後、形
成されたスルーホールに同様にパンチングプレスによっ
て導体を充填することによって、上記目的が達成し得る
ことを知見した。DISCLOSURE OF THE INVENTION As a result of investigations, the inventors of the present invention have achieved the above object by forming through holes by a punching press and then filling the formed through holes with a conductor by the punching press in the same manner. We have found that it can be achieved.
【0013】本発明は、上記知見に基づきなされたもの
で、絶縁性基板とその少なくとも両面に配線層とを有
し、該基板はパンチングプレスで形成されたスルーホー
ルを有し、該スルーホールにはパンチングプレスにより
導体が充填されており、該導体と該配線層とが電気的に
接続がなされていることを特徴とする2メタルTAB及
び両面CSP、BGAテープを提供するものである。The present invention has been made based on the above findings, and has an insulating substrate and a wiring layer on at least both surfaces thereof, and the substrate has through holes formed by a punching press, and the through holes are formed in the through holes. Provides a two-metal TAB, a double-sided CSP, and a BGA tape in which a conductor is filled by a punching press and the conductor and the wiring layer are electrically connected.
【0014】また、本発明は、絶縁性基板の少なくとも
両面に配線層又は金属箔を設けた後、パンチングプレス
によりスルーホールを形成し、次いで該スルーホールに
パンチングプレスによって導体を充填し、該導体と該配
線層又は金属箔を電気的に接続させることを特徴とする
2メタルTAB及び両面CSP、BGAテープの製造方
法を提供するものである。Further, according to the present invention, after providing a wiring layer or a metal foil on at least both surfaces of an insulating substrate, a through hole is formed by a punching press, and then the through hole is filled with a conductor by the punching press. The present invention provides a method for manufacturing a two-metal TAB, a double-sided CSP, and a BGA tape, which is characterized by electrically connecting the wiring layer or the metal foil.
【0015】[0015]
【発明の実施の形態】以下、本発明の実施の形態を説明
する。本発明の2メタルTAB及び両面CSP、BGA
テープは、絶縁性基板とその少なくとも両面に配線層と
を有する。絶縁性基板としてはポリイミドフイルムが一
般に用いられ、配線層は銅箔等をエッチング等すること
により形成される。また、スルーホールに充填される導
体は、鉛、錫、銅、又はこれらを主成分とする合金の
箔、シートが適している。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below. 2-metal TAB and double-sided CSP, BGA of the present invention
The tape has an insulating substrate and a wiring layer on at least both surfaces thereof. A polyimide film is generally used as the insulating substrate, and the wiring layer is formed by etching a copper foil or the like. Further, as the conductor to be filled in the through hole, a foil or sheet of lead, tin, copper, or an alloy containing these as main components is suitable.
【0016】次に、本発明の2メタルTAB及び両面C
SP、BGAテープの製造方法について説明する。本発
明は、上述のように、フレキシブルなポリイミド等を用
いたTABテープ、CSP、BGA、FPC、また、ガ
ラスエポキシ等のリジッドな基板を用いた所謂多層基板
等に広範囲に亘って応用可能であるが、ここでは、TA
Bテープへの応用、特に両面に配線層を有する所謂2メ
タルTABテープの製造方法について説明する。Next, the 2-metal TAB and the double-sided C according to the present invention.
A method of manufacturing SP and BGA tapes will be described. INDUSTRIAL APPLICABILITY As described above, the present invention can be widely applied to a TAB tape using flexible polyimide or the like, CSP, BGA, FPC, or a so-called multilayer substrate using a rigid substrate such as glass epoxy. But here, TA
The application to B tape, especially the method for producing a so-called 2-metal TAB tape having wiring layers on both sides will be described.
【0017】図1は、2メタルTABテープの一般的な
製造方法を示す工程図である。図1に示されるように、
両面銅積層ポリイミドテープに、プレスによって、スプ
ロケットホール、時にはスルーホール等を形成する。FIG. 1 is a process chart showing a general method for manufacturing a two-metal TAB tape. As shown in FIG.
Sprocket holes, sometimes through holes, etc. are formed by pressing on a double-sided copper laminated polyimide tape.
【0018】その後、表面を製面、フォトレジスト塗布
を行い、露光、現像、エッチングによって表面に配線層
を形成する。次に、同様に裏面を製面、フォトレジスト
塗布を行い、露光、現像、エッチングによって裏面に配
線層を形成する。After that, the surface is formed and a photoresist is applied, and a wiring layer is formed on the surface by exposure, development and etching. Next, the back surface is formed in the same manner, a photoresist is applied, and a wiring layer is formed on the back surface by exposure, development and etching.
【0019】最後に、スクリーン印刷によってハンダレ
ジストを塗布した後、導通信頼性を向上させるために金
メッキ等の仕上げメッキを行い、製品とする。Finally, a solder resist is applied by screen printing, and then finish plating such as gold plating is performed to improve conduction reliability to obtain a product.
【0020】本発明では、この工程において、パンチン
グプレスによりスルーホールを形成し、次いでスルーホ
ールに同様にパンチングプレスによって導体を充填し、
該導体と該配線層又は金属箔を電気的に接続させる。According to the present invention, in this step, a through hole is formed by a punching press, and then the through hole is similarly filled with a conductor by a punching press.
The conductor is electrically connected to the wiring layer or the metal foil.
【0021】上記工程において、パンチングプレスによ
るスルーホールの形成、導体の充填時期は任意である。
例えば表裏両面に配線層を形成した後、スルーホールを
形成し、次いでこのスルーホールに導体を充填すればよ
い。また、両面銅貼りテープに先ずスルーホールを形成
し、スプロケットホール形成と同時にスルーホールに導
体を充填してもよい。In the above steps, the formation of through holes by punching press and the filling time of the conductors are arbitrary.
For example, after forming wiring layers on both front and back surfaces, a through hole may be formed, and then the through hole may be filled with a conductor. Alternatively, a through hole may be first formed in the double-sided copper-clad tape, and the through hole may be filled with a conductor at the same time when the sprocket hole is formed.
【0022】本発明において、スルーホールの形成は、
デスミアが不要なパンチングによるものであり、かつ電
気的な接続を取る方法もパンチング同様、ごく普通のパ
ンチングプレス機を用いる。すなわち、パンチングによ
り孔を開けた基板の上にハンダ板や銅箔等の導体を重
ね、再度パンチングし、孔に導体を埋め込む極めて簡略
化された製造工程であり、コスト低減に繋がる。In the present invention, the through hole is formed
Desmearing is unnecessary punching, and the method of electrical connection is the same as punching, using an ordinary punching press. That is, this is a very simplified manufacturing process in which a conductor such as a solder plate or a copper foil is superposed on a substrate having holes punched by punching, and the conductor is embedded in the holes again, resulting in cost reduction.
【0023】しかし、工程は簡単ではあるが、基板厚
みと埋め込む(充填する)導体(板)の厚み、導体
(板)の材質(硬度)、パンチングストローク、か
しめ等の後処理等の選択や設定が極めて重要である。However, although the process is simple, selection and setting of the substrate thickness and the thickness of the conductor (plate) to be embedded (filled), the material (hardness) of the conductor (plate), the punching stroke, the post-treatment such as caulking, etc. Is extremely important.
【0024】導体の厚み(t1)と基板の厚み(t2)
には最適域が存在する。好ましくは1.4×t2≦t1
≦0.7×t2、より好ましくは1.3×t2≦t1≦
0.8×t2、更に好ましくは1.2×t2≦t1≦
0.9×t2である。下記に述べるかしめの条件にもよ
るが、余りに厚いと基板表面に凹凸が生じ、寸法精度等
に問題が起こり、余りに薄いと配線層との電気的な接続
が不充分になるからである。Conductor thickness (t1) and substrate thickness (t2)
There is an optimum range for. Preferably 1.4 × t2 ≦ t1
≦ 0.7 × t2, more preferably 1.3 × t2 ≦ t1 ≦
0.8 × t2, more preferably 1.2 × t2 ≦ t1 ≦
It is 0.9 × t2. Although it depends on the crimping conditions described below, if it is too thick, irregularities occur on the substrate surface, causing problems in dimensional accuracy and the like, and if it is too thin, electrical connection with the wiring layer becomes insufficient.
【0025】導体の材質については上述した通り、ハン
ダや銅箔が適しているが、硬度が高すぎると基板自体に
凹凸が生じ好ましくない。ハンダは柔らかくそのままで
も使用可能であるが、銅箔の場合は、アニール等により
柔らかくする工夫が必要である。なお、コスト的にはリ
サイクルが容易なハンダのほうが有利である。As described above, as the material of the conductor, solder or copper foil is suitable, but if the hardness is too high, the substrate itself becomes uneven, which is not preferable. The solder is soft and can be used as it is, but in the case of copper foil, it is necessary to devise softening by annealing or the like. In terms of cost, solder that is easy to recycle is more advantageous.
【0026】パンチングのストロークは、上記導体の厚
みのように数式で記載することには困難が伴うが、実際
にパンチングし、結果的に導体が基板に対し、所謂串刺
しのような状態になり、その後実施するかしめに好都合
なようにストロークを定める必要がある。Although it is difficult to describe the punching stroke by a mathematical expression like the thickness of the conductor, the punching stroke is actually punched, and as a result, the conductor becomes a so-called skewered state on the substrate, It is necessary to determine the stroke so as to be convenient for the subsequent crimping.
【0027】また、導体を充填した(埋め込んだ)後の
かしめは、導通の信頼性を左右する重要な工程である。
これは、導体を埋め込んだ後、その後の工程における搬
送や作業を円滑に行うためや、また、例えばテープ状の
基板に関しては、その後の工程においてリール等に巻き
取られることが多いが、そのような曲げに対する耐久性
も要求されるからである。Further, the caulking after filling (embedding) the conductor is an important step which influences the reliability of conduction.
This is because, after embedding the conductor, it is possible to smoothly carry or work in the subsequent steps, and, for example, in the case of a tape-shaped substrate, it is often wound up on a reel or the like in the subsequent steps. This is because it is also required to have durability against bending.
【0028】このようにして得られた本発明に係る2メ
タルTABのスルーホール部分の概略断面図を図2に示
す。同図において、1は絶縁性基板、2は配線層、3は
導体をそれぞれ示す。図2に示されるように、表裏両面
の配線層2と導体が良好な電気的な接続を示している。FIG. 2 shows a schematic sectional view of the through hole portion of the two-metal TAB according to the present invention thus obtained. In the figure, 1 is an insulating substrate, 2 is a wiring layer, and 3 is a conductor. As shown in FIG. 2, the wiring layers 2 on both front and back surfaces and the conductors show good electrical connection.
【0029】なお、もし、スルーホールの形成とスルー
ホールへの導体の埋め込みが同時に実施できるならば、
より工程が簡略化されコストダウンに繋がるであろう
が、図3に示すように、導体3下端が丸くなる傾向があ
り、その後かしめたとしても、導通信頼性に劣る。If formation of a through hole and embedding of a conductor in the through hole can be performed at the same time,
Although the process may be simplified and the cost may be reduced, as shown in FIG. 3, the lower end of the conductor 3 tends to be rounded, and even if the caulking is performed thereafter, the conduction reliability is poor.
【0030】ハンダ等の低融点の金属を用いる場合に
は、工程は増えるが、リフロー等により、充填金属を再
溶融することにより、接触を確実にすることができる。When a low melting point metal such as solder is used, the number of steps is increased, but the contact can be ensured by remelting the filling metal by reflowing or the like.
【0031】本発明は、上述したように、フレキシブル
なポリイミド等を用いたTABテープ、CSP、BG
A、FPC、また、ガラスエポキシ等のリジッドな基板
を用いた所謂多層基板等に広範囲に亘って応用可能であ
る。The present invention, as described above, uses TAB tape, CSP, BG made of flexible polyimide or the like.
It can be widely applied to A, FPC, so-called multi-layer substrate using a rigid substrate such as glass epoxy.
【0032】[0032]
【実施例】以下、実施例等に基づき本発明を具体的に説
明する。EXAMPLES The present invention will be specifically described below based on Examples and the like.
【0033】〔実施例1〕
(2メタルTABテープの製造例)36mm幅の両面銅
貼りポリイミドフィルム(ポリイミド層の厚み50μ
m、銅箔厚み表裏各18μm;商品名エスパネックス、
新日本化学社製)を用い、図1に示される2メタルTA
Bテープの製造工程に従い、図4及び図6に示すような
表裏面に配線層を有した所謂2メタルTABテープを製
造した。但し、表裏面の電気的接続は取れていない。Example 1 (Production Example of 2-Metal TAB Tape) 36 mm wide double-sided copper-bonded polyimide film (polyimide layer thickness 50 μm)
m, copper foil thickness 18 μm on each side; trade name Espanex,
2-metal TA shown in FIG. 1 using Shin Nippon Chemical Co., Ltd.)
According to the manufacturing process of the B tape, a so-called 2-metal TAB tape having wiring layers on the front and back surfaces as shown in FIGS. 4 and 6 was manufactured. However, the electrical connection on the front and back is not made.
【0034】図4は、2メタルTABテープの表面図で
あり、図5は、そのランド近傍拡大図である。図6は2
メタルTABテープの裏面からの透視図であり、図7は
そのランド近傍拡大図である。図4〜7において、4は
2メタルTABテープ、5はスプロケットホール、6は
ランドをそれぞれ示す。但し、図6は透視図なので裏面
の配線層は記載していない。なお、ここでいうランドと
はスルーホールを形成し、導体を充填する箇所をいう。FIG. 4 is a front view of the 2-metal TAB tape, and FIG. 5 is an enlarged view of the land and its vicinity. 2 in FIG.
FIG. 7 is a perspective view from the back surface of the metal TAB tape, and FIG. 7 is an enlarged view of the vicinity of the land. 4 to 7, 4 is a 2-metal TAB tape, 5 is a sprocket hole, and 6 is a land. However, since FIG. 6 is a perspective view, the wiring layer on the back surface is not shown. In addition, the land here means a portion where a through hole is formed and a conductor is filled.
【0035】エッチング等により、表裏面に配線層が形
成されたこのテープをパンチングプレス機を用いて図4
及び図6に示す位置にスルーホールを形成した。引き続
き厚み95ミクロンのハンダプレートをテープに重ね、
再度パンチングプレスすることにより、ハンダを埋め込
み(充填し)、その後同じくプレス機によりかしめるこ
とにより表裏面配線層の電気的な接続を取った。例えば
200μmφ孔の概略断面図である図2に示されるよう
に、配線層と導体の理想的な接触が観察され、いずれの
スルーホールにおいても、2メタルTABとして充分な
導通(<10mΩ/孔)が得られた。This tape having a wiring layer formed on the front and back surfaces by etching or the like is formed by using a punching press machine as shown in FIG.
A through hole was formed at the position shown in FIG. Next, overlay the solder plate with a thickness of 95 microns on the tape,
By punching and pressing again, the solder was embedded (filled), and then caulking was also performed by the pressing machine to electrically connect the front and back wiring layers. For example, as shown in FIG. 2, which is a schematic cross-sectional view of a 200 μmφ hole, ideal contact between the wiring layer and the conductor is observed, and sufficient conduction (<10 mΩ / hole) as a 2-metal TAB is observed in any of the through holes. was gotten.
【0036】〔実施例2〕
(2メタルTABテープの製造例)導体のスルーホール
への埋め込み(充填)をエッチング等による配線を形成
した後ではなく、予めスルーホールを形成した後、スプ
ロケットホールを形成すると同時に導体に埋め込む以外
は、実施例1と同様の工程により2メタルTABテープ
を得た。実施例1と同様に、いずれの孔においても、2
メタルTABとして充分な導通(<10mΩ/孔)が得
られた。Example 2 (Manufacturing Example of 2-Metal TAB Tape) Embedding (filling) of a conductor in a through hole is not performed after forming a wiring by etching or the like, but after forming a through hole in advance, a sprocket hole is formed. A two-metal TAB tape was obtained by the same steps as in Example 1 except that the two-metal TAB tape was formed and simultaneously embedded in the conductor. As in Example 1, in any of the holes, 2
Sufficient conduction (<10 mΩ / hole) was obtained as a metal TAB.
【0037】〔比較例1〕
(2メタルTABテープの製造例)予めスルーホールを
形成せず、パンチングプレスによるスルーホールの形成
とハンダの埋め込み(充填)を同時に実施し、その後か
しめた以外は、実施例1と全く同様の工程に従い2メタ
ルTABテープを作成した。すなわち、パンチングプレ
スによりスルーホールを形成すると共に、併せてハンダ
の埋め込みを行った。その結果、例えば200μmφ孔
の概略断面図である図3に示されるように、配線層と導
体との断線が観察されることが多く、2メタルTABと
して充分な導通が得られなかった。Comparative Example 1 (Example of Manufacturing Two-Metal TAB Tape) Except that through holes were not formed in advance, through holes were formed by punching press and solder was filled (filled) at the same time, and then caulking was performed. A two-metal TAB tape was prepared according to the same steps as in Example 1. That is, a through hole was formed by punching press and at the same time, solder was embedded. As a result, for example, as shown in FIG. 3, which is a schematic cross-sectional view of the 200 μmφ hole, disconnection between the wiring layer and the conductor was often observed, and sufficient conduction was not obtained as a two-metal TAB.
【0038】〔比較例2〕
(2メタルTABテープの製造例)予めスルーホールを
形成せず、パンチングプレスによるスルーホールの形成
とハンダの埋め込み(充填)を同時に実施し、その後か
しめた以外は、実施例2と全く同様の工程に従い2メタ
ルTABテープを作成した。すなわち、パンチングプレ
スによりスルーホール及びスプロケットホールを形成す
ると共に、併せてハンダの埋め込みを行った。比較例1
と同様、配線層と導体との断線が観察されることが多
く、2メタルTABとして充分な導通が得られなかっ
た。Comparative Example 2 (Production Example of 2-Metal TAB Tape) Without forming through holes in advance, formation of through holes by punching press and embedding (filling) of solder were carried out at the same time, and then caulking was performed. A two-metal TAB tape was prepared according to the same steps as in Example 2. That is, through holes and sprocket holes were formed by a punching press, and solder was also embedded. Comparative Example 1
Similarly to the above, disconnection between the wiring layer and the conductor was often observed, and sufficient conduction was not obtained as a 2-metal TAB.
【0039】[0039]
【発明の効果】以上説明したように、本発明の2メタル
TAB及び両面CSP、BGAテープは、表裏面導体層
の電気的接続の高い信頼性を有する。また、本発明の製
造方法によって、従来法であるメッキ法や導電性ペース
ト印刷法に比較して、工程が極めて簡単であり、コスト
低減が可能となる。また、乾式で製造できることから、
廃液がでないことや使用材料のリサイクルが可能とな
り、環境保全の観点からも優れた工法といえる。As described above, the two-metal TAB, double-sided CSP, and BGA tape of the present invention have high reliability of electrical connection between the front and back surface conductor layers. In addition, the manufacturing method of the present invention enables extremely simple steps and cost reduction as compared with the conventional plating method and conductive paste printing method. Also, since it can be manufactured in a dry process,
It can be said that it is an excellent construction method from the viewpoint of environmental protection, since there is no waste liquid and the used materials can be recycled.
【図1】図1は、図1は、2メタルTABテープの一般
的な製造方法を示す工程図である。FIG. 1 is a process drawing showing a general manufacturing method of a 2-metal TAB tape.
【図2】図2は、実施例1に係る2メタルTABのスル
ーホール部分の概略断面図である。FIG. 2 is a schematic cross-sectional view of a through hole portion of a 2-metal TAB according to the first embodiment.
【図3】図3は、比較例1に係る2メタルTABのスル
ーホール部分の概略断面図である。FIG. 3 is a schematic cross-sectional view of a through-hole portion of a 2-metal TAB according to Comparative Example 1.
【図4】図4は、実施例1に係る2メタルTABテープ
の表面図である。FIG. 4 is a surface view of a 2-metal TAB tape according to Example 1.
【図5】図5は、図4のランド近傍拡大図FIG. 5 is an enlarged view of the vicinity of the land of FIG.
【図6】図6は、実施例1に係る2メタルTABテープ
の裏面からの透視図である。FIG. 6 is a perspective view from the back surface of the two-metal TAB tape according to the first embodiment.
【図7】図7は、図6のランド近傍拡大図である。FIG. 7 is an enlarged view of the vicinity of the land of FIG.
1:絶縁性基板(ポリイミド)、2:配線層、3:導
体、4:2メタルTABテープ、5:スプロケットホー
ル、6:ランド。1: Insulating substrate (polyimide), 2: Wiring layer, 3: Conductor, 4: 2 metal TAB tape, 5: Sprocket hole, 6: Land.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平5−226423(JP,A) 特開 平9−232381(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 21/60 H01L 23/12 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-5-226423 (JP, A) JP-A-9-232381 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) H01L 21/60 H01L 23/12
Claims (8)
層とを有し、該基板はパンチングプレスで形成されたス
ルーホールを有し、該スルーホールにはパンチングプレ
スにより導体が充填されており、該導体と該配線層とが
電気的に接続がなされていることを特徴とする2メタル
TAB及び両面CSP、BGAテープ。1. An insulating substrate and a wiring layer on at least both sides thereof, the substrate having a through hole formed by a punching press, and the through hole is filled with a conductor by the punching press, A two-metal TAB, a double-sided CSP, and a BGA tape, wherein the conductor and the wiring layer are electrically connected.
請求項1記載の2メタルTAB及び両面CSP、BGA
テープ。2. The two-metal TAB and the double-sided CSP and BGA according to claim 1, which are composed of three or more layers including a metal layer.
tape.
載の2メタルTAB及び両面CSP、BGAテープ。3. The two-metal TAB, the double-sided CSP, and the BGA tape according to claim 1, wherein the conductor is a metal.
成分とする合金である請求項3記載の2メタルTAB及
び両面CSP、BGAテープ。4. The two-metal TAB, double-sided CSP, and BGA tape according to claim 3, wherein the metal is lead, tin, copper, or an alloy containing these as the main components.
は金属箔を設けた後、パンチングプレスによりスルーホ
ールを形成し、次いで該スルーホールにパンチングプレ
スによって導体を充填し、該導体と該配線層又は金属箔
を電気的に接続させることを特徴とする2メタルTAB
及び両面CSP、BGAテープの製造方法。5. A wiring layer or a metal foil is provided on at least both surfaces of an insulating substrate, a through hole is formed by punching press, and then the conductor is filled in the through hole by punching press to form the conductor and the wiring layer. Alternatively, a two-metal TAB characterized by electrically connecting a metal foil
And a method for manufacturing double-sided CSP and BGA tape.
請求項5記載の2メタルTAB及び両面CSP、BGA
テープの製造方法。6. The two-metal TAB and the double-sided CSP and BGA according to claim 5, which are composed of three or more layers including a metal layer.
Tape manufacturing method.
載の2メタルTAB及び両面CSP、BGAテープの製
造方法。7. The method for manufacturing a two-metal TAB, a double-sided CSP, and a BGA tape according to claim 5, wherein the conductor is a metal.
成分とする合金である請求項7記載の2メタルTAB及
び両面CSP、BGAテープの製造方法。8. The method for producing a two-metal TAB, a double-sided CSP, and a BGA tape according to claim 7, wherein the metal is lead, tin, copper, or an alloy containing these as main components.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04386899A JP3374777B2 (en) | 1999-02-22 | 1999-02-22 | 2-metal TAB, double-sided CSP, BGA tape, and manufacturing method thereof |
KR1020000008499A KR100549026B1 (en) | 1999-02-22 | 2000-02-22 | Substrate having a wiring layer and method of manufacturing the same |
TW089103054A TW459316B (en) | 1999-02-22 | 2000-02-22 | Substrate with wiring layers and method thereof |
KR1020050087348A KR100619512B1 (en) | 1999-02-22 | 2005-09-20 | Substrate having a wiring layer and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04386899A JP3374777B2 (en) | 1999-02-22 | 1999-02-22 | 2-metal TAB, double-sided CSP, BGA tape, and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000243791A JP2000243791A (en) | 2000-09-08 |
JP3374777B2 true JP3374777B2 (en) | 2003-02-10 |
Family
ID=12675688
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP04386899A Expired - Fee Related JP3374777B2 (en) | 1999-02-22 | 1999-02-22 | 2-metal TAB, double-sided CSP, BGA tape, and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3374777B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002093861A (en) * | 2000-09-12 | 2002-03-29 | Mitsui Mining & Smelting Co Ltd | Bimetal tab and double-coated csp, bga tape, and method for manufacturing them |
US20040026122A1 (en) * | 2001-04-06 | 2004-02-12 | Katsuhiko Hayashi | Printed circuit board and production method therefor, and laminated printed circuit board |
-
1999
- 1999-02-22 JP JP04386899A patent/JP3374777B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2000243791A (en) | 2000-09-08 |
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