JP3335264B2 - Cassette holding device, substrate transport device equipped with the same, and automatic substrate processing device - Google Patents

Cassette holding device, substrate transport device equipped with the same, and automatic substrate processing device

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Publication number
JP3335264B2
JP3335264B2 JP10995095A JP10995095A JP3335264B2 JP 3335264 B2 JP3335264 B2 JP 3335264B2 JP 10995095 A JP10995095 A JP 10995095A JP 10995095 A JP10995095 A JP 10995095A JP 3335264 B2 JP3335264 B2 JP 3335264B2
Authority
JP
Japan
Prior art keywords
cassette
holding
holding device
resistance wire
strain gauge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP10995095A
Other languages
Japanese (ja)
Other versions
JPH08264620A (en
Inventor
博明 村尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaijo Corp
Original Assignee
Kaijo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaijo Corp filed Critical Kaijo Corp
Priority to JP10995095A priority Critical patent/JP3335264B2/en
Publication of JPH08264620A publication Critical patent/JPH08264620A/en
Application granted granted Critical
Publication of JP3335264B2 publication Critical patent/JP3335264B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Weting (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Manipulator (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、シリコンウェハーやガ
ラス基板等の基板を複数枚収納し得るカセットを保持す
るカセット保持装置に関する。また、本発明は、該カセ
ット保持装置を具備してこれらの基板を該カセットと共
に所望の経路に沿って自動的に搬送する基板搬送装置に
関すると共に、該基板搬送装置を具備して該基板をカセ
ットごと処理槽内の処理液中に浸漬して洗浄処理等を施
す基板自動処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cassette holding device for holding a cassette capable of storing a plurality of substrates such as silicon wafers and glass substrates. In addition, the present invention relates to a substrate transfer device that includes the cassette holding device and automatically transfers these substrates together with the cassette along a desired path, and also includes the substrate transfer device and transfers the substrates to the cassette. The present invention relates to an automatic substrate processing apparatus for performing a cleaning process or the like by immersing a substrate in a processing solution in a processing tank.

【0002】[0002]

【従来の技術】従来、この種のカセット保持装置及び基
板搬送装置を備える基板自動処理装置として、図4及び
図5に示すものがある。
2. Description of the Related Art Conventionally, as an automatic substrate processing apparatus having such a cassette holding apparatus and a substrate transfer apparatus, there is an apparatus shown in FIGS.

【0003】図4に示すように、この基板自動処理装置
においては、その架台1上に、複数、例えば5つの処理
槽2乃至6が順に配設されている。これら各処理槽内に
は洗浄用液及びエッチング用液等、所要の処理液2a乃
至6aが貯留されている。
As shown in FIG. 4, in this automatic substrate processing apparatus, a plurality of, for example, five processing tanks 2 to 6 are sequentially arranged on a gantry 1. In each of these processing tanks, required processing liquids 2a to 6a such as a cleaning liquid and an etching liquid are stored.

【0004】図5にも示すように、当該基板自動処理装
置においては、処理対象としてのシリコンウェハー若し
くはガラス基板等の基板8は、処理用の専用のカセット
10に多数収納された状態にて取り扱われる。なお、該
カセット10内において、各基板8はその主面同士が平
行となるように、且つ各々が直立した状態で一定間隔で
整列されている。当該基板自動処理装置はこれらの基板
8の洗浄処理を自動的に行うものであり、後述する一連
の工程にて該各基板8の洗浄を完了することができる。
As shown in FIG. 5, in the automatic substrate processing apparatus, a substrate 8 such as a silicon wafer or a glass substrate to be processed is handled while being stored in a large number of cassettes 10 dedicated for processing. It is. In the cassette 10, the substrates 8 are arranged at regular intervals such that their main surfaces are parallel to each other and each is standing upright. The automatic substrate processing apparatus automatically performs the cleaning process on the substrates 8 and can complete the cleaning of each substrate 8 in a series of steps described later.

【0005】上記基板8を収容したカセット10は、図
4及び図5に示すカセット保持装置12によって保持さ
れ、搬送手段14(図4参照)によって該カセット保持
装置12が所定経路に沿って搬送されることによって上
記の各処理槽2乃至6を巡る。該カセット保持装置12
と搬送手段14とを、基板搬送装置と総称する。
The cassette 10 accommodating the substrate 8 is held by a cassette holding device 12 shown in FIGS. 4 and 5, and the cassette holding device 12 is transported along a predetermined path by a transport means 14 (see FIG. 4). By doing so, it goes around each of the processing tanks 2 to 6 described above. The cassette holding device 12
And the transfer means 14 are collectively referred to as a substrate transfer device.

【0006】図4に示すように、上記搬送手段14は、
上述した各処理槽2乃至6が並ぶ方向、すなわち水平方
向(矢印Hにて示す)において移動自在な可動ベース1
6と、該可動ベース16を移動させる駆動手段(図示せ
ず)とを有している。同図に示すように、この可動ベー
ス16には、可動ポール17が上下方向(矢印Vにて示
す)において往復動自在に設けられており、該可動ベー
ス16に内蔵された図示しない駆動手段によって昇降せ
しめられる。
[0006] As shown in FIG.
The movable base 1 which is movable in a direction in which the processing tanks 2 to 6 are arranged, that is, in a horizontal direction (indicated by an arrow H)
6 and a driving means (not shown) for moving the movable base 16. As shown in the figure, a movable pole 17 is provided on the movable base 16 so as to be able to reciprocate in a vertical direction (indicated by an arrow V), and is driven by driving means (not shown) built in the movable base 16. It can be raised and lowered.

【0007】上述した構成の搬送手段14が作動するこ
とによって、上記カセット保持装置12がその保持した
カセット10と共に各処理槽2乃至6内の処理液2a乃
至6aによる浸漬位置を経て該各処理槽外に至る所定経
路(後述)に沿って搬送される。
When the transporting means 14 having the above-described structure is operated, the cassette holding device 12 and the cassette 10 held by the cassette holding device 12 pass through the immersion positions of the processing liquids 2a to 6a in the processing tanks 2 to 6, and the respective processing tanks. It is conveyed along a predetermined route (described later) to the outside.

【0008】次いで、上記カセット保持装置12につい
て詳述する。
Next, the cassette holding device 12 will be described in detail.

【0009】このカセット保持装置12は、上記可動ポ
ール17の上端部に固定された基体部19と、該基体部
19に対して各々一端部にて取り付けられて互いに平行
に水平に伸長する2本の円柱状の長手支持部材21及び
22とを有している。該両長手支持部材21、22は、
基体部19内に設けられた軸受機構(図示せず)によっ
てその軸中心を中心として回転自在に支持されており、
該基体部19に内蔵された駆動手段(図示せず)によっ
て回転駆動される。
The cassette holding device 12 includes a base 19 fixed to the upper end of the movable pole 17 and two bases 19 attached to the base 19 at one end and extending horizontally in parallel with each other. And the column-shaped longitudinal support members 21 and 22. The two longitudinal support members 21 and 22 are
A bearing mechanism (not shown) provided in the base body 19 is rotatably supported about its axis.
It is rotationally driven by driving means (not shown) built in the base portion 19.

【0010】上記両長手支持部材21及び22の各他端
側には、上記カセット10を保持するための保持部材2
4が2本ずつ、取付けブロック25を介して取り付けら
れている。図から明らかなように、これら4本の保持部
材24は長手状に形成され、上記長手支持部材21、2
2に対して、具体的には取付けブロック25に対し、片
持梁状態、この場合、垂下状態にて装着されている。そ
して、図5に示すように、該各保持部材24の下端部は
フック部24aとされ、カセット10に形成された鍔部
10aをこのフック部24aによって支え持つようにな
されている。
A holding member 2 for holding the cassette 10 is attached to the other end of each of the two longitudinal support members 21 and 22.
4 are mounted two by two via mounting blocks 25. As is clear from the figure, these four holding members 24 are formed in a longitudinal shape, and
2, specifically, it is attached to the mounting block 25 in a cantilever state, in this case, a hanging state. As shown in FIG. 5, the lower end of each holding member 24 is formed as a hook portion 24a, and the flange portion 10a formed on the cassette 10 is supported by the hook portion 24a.

【0011】ところで、当該基板自動処理装置において
は、上記カセット10がカセット保持装置12によって
確かに保持されているかどうかを検出するための検出手
段が設けられている。これは、該カセット保持装置12
によって保持されて搬送中のカセット10が何等かの原
因により途中で落下してしまったり、又、チャックミス
で上記各処理槽2乃至6内に取り残されてしまう場合を
想定して設けられるものである。このような不都合な事
態が発生した際、該検出手段よりの検出信号によってこ
れを確認することができ、装置を停止させて復旧作業を
行うなど、迅速に対処し得るものである。
In the automatic substrate processing apparatus, a detecting means for detecting whether the cassette 10 is held by the cassette holding device 12 is provided. This is because the cassette holding device 12
The cassette 10 is provided on the assumption that the cassette 10 being held and being conveyed is dropped on the way due to some cause, or is left in the processing tanks 2 to 6 due to a chuck error. is there. When such an inconvenient situation occurs, it can be confirmed by a detection signal from the detection means, and it is possible to quickly cope with the situation, for example, by stopping the apparatus and performing a recovery operation.

【0012】上記検出手段の一例として、図5に示す構
成のものが採用される。
As an example of the detection means, the one having the configuration shown in FIG. 5 is employed.

【0013】すなわち、夫々発光素子及び受光素子を内
蔵した2つのフォトセンサ31及び32が用いられる。
これら2つのフォトセンサを一組とする光透過型の検出
手段は、例えば、図4に示す各処理槽2乃至6の各々に
ついて、その近傍に個別に設置される。かかる構成の検
出手段によれば、図5に示す如く、上記発光素子から受
光素子に向かって光33が常時照射され、この照射光3
3をカセット10が横切ることによって該受光素子から
の受光出力が得られなくなることを以てカセット10の
存在を検出する。すなわち、カセットの通過にも拘ら
ず、該受光素子に入射する光が遮られることなく続けて
入射していれば、上述の異常事態が発生したものと確認
される。
That is, two photosensors 31 and 32 each containing a light emitting element and a light receiving element are used.
The light-transmitting type detection means including these two photosensors as a set is individually installed in the vicinity of each of the processing tanks 2 to 6 shown in FIG. 4, for example. According to the detecting means having such a configuration, as shown in FIG. 5, light 33 is constantly emitted from the light emitting element toward the light receiving element.
The presence of the cassette 10 is detected based on the fact that the light receiving output from the light receiving element cannot be obtained when the cassette 10 crosses 3. That is, if the light incident on the light receiving element continues uninterrupted despite the passage through the cassette, it is confirmed that the above-described abnormal situation has occurred.

【0014】なお、検出手段の他の例として、図6に示
す光反射型のフォトセンサ35も用いられる。このフォ
トセンサ35は、発光素子及び受光素子の両者を内蔵し
ており、該発光素子からの照射光36がカセット10の
表面にて反射したその反射光37を該受光素子にて受け
るように設置され、検出の原理としては上記した光透過
型のものと同様である。
As another example of the detecting means, a light reflection type photo sensor 35 shown in FIG. 6 is used. The photosensor 35 has a built-in light-emitting element and a light-receiving element, and is installed such that the light 36 emitted from the light-emitting element receives the reflected light 37 reflected on the surface of the cassette 10 by the light-receiving element. The principle of detection is the same as that of the light transmission type described above.

【0015】続いて、上記した構成の基板自動処理装置
の動作について説明する。
Next, the operation of the automatic substrate processing apparatus having the above configuration will be described.

【0016】図4において、まず、前段の工程より、多
数の基板8を配列収容したカセット10が供給され、こ
れをカセット保持装置12が受け入れて保持する。具体
的には、基体部19内に設けられた駆動手段(図示せ
ず)の作動によって2本の長手支持部材21、22が回
転駆動され、これにより、4本の保持部材24が閉方向
に作動してカセット10の鍔部10a(図5参照)を保
持する。
In FIG. 4, first, a cassette 10 in which a large number of substrates 8 are arranged and stored is supplied from a previous step, and the cassette 10 is received and held by a cassette holding device 12. Specifically, the operation of the driving means (not shown) provided in the base portion 19 causes the two longitudinal support members 21 and 22 to be rotationally driven, whereby the four holding members 24 are moved in the closing direction. It operates to hold the flange 10a (see FIG. 5) of the cassette 10.

【0017】このようにカセット保持装置12がカセッ
ト10を保持すると、図示しない各駆動手段が適宜作動
して可動ベース16の水平移動と可動ポール17の昇降
動作とが行われる。これにより、カセット10はこれを
保持したカセット保持装置12と共に、図4に示す経路
1 →H1 →V2 に沿って搬送され、1つ目の処理槽2
内に貯留されている処理液2aに浸漬され、且つ、該処
理槽2内に設けられた受台(図示せず)上に載置され
る。そして、該カセット10を保持している各保持部材
24が開方向に作動させられてカセット10の保持状態
が解除され、処理液2aによる各基板8に対する処理、
例えば前洗浄が施される。
When the cassette holding device 12 holds the cassette 10 in this manner, the respective driving means (not shown) are appropriately operated to perform the horizontal movement of the movable base 16 and the operation of moving the movable pole 17 up and down. As a result, the cassette 10 is transported along with the cassette holding device 12 holding the cassette 10 along the route V 1 → H 1 → V 2 shown in FIG.
It is immersed in the processing liquid 2 a stored therein and is placed on a receiving table (not shown) provided in the processing tank 2. Then, each holding member 24 holding the cassette 10 is operated in the opening direction to release the holding state of the cassette 10, and the processing of each substrate 8 by the processing liquid 2a is performed.
For example, pre-cleaning is performed.

【0018】上記の前洗浄が終了すると、上記各保持部
材24が閉作動させられ、カセット10を保持する。続
いて、上記可動ベース16及び可動ポール17が作動さ
せられて、該カセット10は図4に示す経路V3 →H2
→V4 を辿って搬送され、次の処理槽3内の受台(図示
せず)上に載置される。そして、処理液3aによる基板
8の処理が行われる。
When the pre-cleaning is completed, the holding members 24 are closed to hold the cassette 10. Subsequently, the movable base 16 and the movable pole 17 are operated to move the cassette 10 into the path V 3 → H 2 shown in FIG.
→ V 4 is conveyed by following the, is placed on the cradle of the next treatment tank 3 (not shown). Then, the processing of the substrate 8 with the processing liquid 3a is performed.

【0019】以降、カセット10は、上述と同様にして
図4に示す経路V5 →H3 →V6 、V7 →H4 →V8
9 →H5 →V10を順次辿って搬送され、隣接する他の
処理槽4乃至6内の受台(図示せず)上に載置される。
これにより、各基板8は各処理液4a、5a、及び6a
による処理を受ける。斯くして各基板8の洗浄作業を完
了する。なお、図5に示す両フォトセンサ31、32を
用いてのカセット10の検出は、カセット搬送経路中の
所要位置にて適宜行われる。
Thereafter, the cassettes 10 are moved in the same manner as described above by the paths V 5 → H 3 → V 6 , V 7 → H 4 → V 8 , shown in FIG.
V 9 → H 5 → V 10 are sequentially transported, and are placed on a pedestal (not shown) in other adjacent processing tanks 4 to 6.
As a result, each substrate 8 is treated with each of the processing liquids 4a, 5a, and 6a.
Process. Thus, the cleaning operation of each substrate 8 is completed. The detection of the cassette 10 using the two photosensors 31 and 32 shown in FIG. 5 is appropriately performed at a required position in the cassette transport path.

【0020】続いて、カセット10はカセット保持装置
12上から回収され、各基板8は該カセット10と共に
次工程に向けて搬出される。
Subsequently, the cassette 10 is recovered from the cassette holding device 12, and the substrates 8 are carried out together with the cassette 10 for the next process.

【0021】一方、カセット10が外されたカセット保
持装置12は、上記可動ベース16及び可動ポール17
の作動により、経路V11→H6 →V12に沿って移動させ
られ、再び元の位置に戻される。この後、これまでの一
連の動作が繰り返される。
On the other hand, the cassette holding device 12 from which the cassette 10 has been removed is mounted on the movable base 16 and the movable pole 17.
By the operation, is moved along the path V 11 → H 6 → V 12 , it is returned to the original position. Thereafter, a series of operations up to this point are repeated.

【0022】[0022]

【発明が解決しようとする課題】上述した従来の装置に
おいては、カセット10がカセット保持装置12によっ
て保持されていることの確認を、フォトセンサ31、3
2(若しくはこれに準ずるもの)を用いて行っている。
このようにフォトセンサ等を使用する場合、一般に、そ
のカセット検出を確実ならしめるためには、カセット1
0が該フォトセンサ等による検出位置を通過する際に一
時的に停止させるか、または搬送速度を遅くする必要が
ある。よって、洗浄開始から終了に至るまでの所要時間
がその分長くなり、作業能率の向上を図る上で解決され
るべき問題となっている。
In the above-described conventional apparatus, the photo sensors 31, 3 confirm that the cassette 10 is held by the cassette holding device 12.
2 (or equivalent).
When a photo sensor or the like is used as described above, generally, in order to ensure the detection of the cassette, the cassette 1
It is necessary to stop temporarily when 0 passes through the detection position by the photo sensor or the like, or to reduce the transport speed. Therefore, the time required from the start to the end of the cleaning is lengthened correspondingly, which is a problem to be solved in order to improve the work efficiency.

【0023】また、上記基板8の洗浄に使用される各処
理液2a乃至6aには、水蒸気は勿論のこと、腐食性の
気体を発生するものが含まれていることが多く、特にフ
ォトセンサの場合ではこれら発生気体による曇りや腐食
を防止する目的で煩わしいメンテナンスを必要とすると
いう不都合がある。因に、メンテナンスが及ばずに曇り
及び腐食対策が不充分であると、カセットの検出が不能
になるなど、誤動作を起す懸念がある。
Each of the processing liquids 2a to 6a used for cleaning the substrate 8 often contains not only water vapor but also corrosive gas. In some cases, there is an inconvenience that cumbersome maintenance is required for the purpose of preventing fogging and corrosion due to these generated gases. However, if maintenance is not sufficient and fogging and corrosion measures are inadequate, there is a concern that a malfunction may occur, for example, detection of a cassette becomes impossible.

【0024】更に、カセット10の搬送経路の近傍に上
記のようなフォトセンサ31、32を数多く配置するこ
とは、コストの増大を招来すると共に、装置全体として
の構造を設計する上でその設置スペースを種々勘案しな
ければならず、装置設計の自由度を制限することともな
っている。
Further, arranging a large number of the photosensors 31 and 32 in the vicinity of the transport path of the cassette 10 causes an increase in cost and an installation space for designing the structure of the entire apparatus. Must be taken into account in various ways, which limits the degree of freedom in device design.

【0025】本発明は上記した点に鑑みてなされたもの
であって、その目的とするところは、自体が構成の一部
として含まれるべき基板自動処理装置に関して、その作
業能率の向上、メンテナンス作業の削減、コストの低減
及び設計自由度の増大等の達成に寄与するカセット保持
装置を提供することである。また、本発明は、該カセッ
ト保持装置とこれを所定経路に沿って搬送する搬送手段
とからなる基板搬送装置の提供、更に、上記基板自動処
理装置を提供することを目的とする。
The present invention has been made in view of the above points, and an object of the present invention is to provide an automatic processing apparatus which itself should be included as a part of its structure, to improve the work efficiency and maintain the work. An object of the present invention is to provide a cassette holding device that contributes to the reduction of the cost, the reduction of the cost, and the increase of the degree of freedom in design. It is another object of the present invention to provide a substrate transport device including the cassette holding device and transport means for transporting the cassette holder along a predetermined path, and further to provide the automatic substrate processing device.

【0026】[0026]

【課題を解決するための手段】本発明によるカセット保
持装置は、基体部と、前記基体部に各々一端が回転自在
に取り付けられかつ互いに略平行に伸長して回転駆動さ
れる一対の長手支持部材と、前記長手支持部材の他端側
の各々に装着され、長手状かつ前記長手支持部材に対し
垂下状態で複数枚の基板を収納可能な基板収納カセッ
トを保持するための保持部材を備え、前記保持部材
は、金属製芯部材と、樹脂製表層部材とを有し、前記芯
部材の固定端近傍の歪量が最も大きい部位に抵抗線歪ゲ
ージを設け、前記抵抗線歪みゲージを前記表層部材によ
って被覆してなることを特徴とする。本発明によるカセ
ット保持装置の抵抗線歪みゲージは、該芯部材に接着剤
を用いて固着されることを特徴とする。本発明による基
板搬送装置は、カセット保持装置によって保持された複
数枚の基板を収納可能な基板収納カセットを搬送する搬
送手段を有し、前記カセット保持装置は、前記搬送手段
により搬送される基体部と、前記基体部に各々一端が回
転自在に取り付けられかつ互いに略平行に伸長して回転
駆動される一対の長手支持部材と、前記長手支持部材の
他端側の各々に装着され、長手状かつ前記長手支持部材
に対して垂下状態で基板収納カセットを保持するための
保持部材を備え、前記保持部材は、金属製芯部材と、
樹脂製表層部材とを有し、前記芯部材の固定端近傍の歪
量が最も大きい部位に抵抗線歪ゲージを設け、前記抵抗
線歪みゲージを前記表層部材によって被覆してなること
を特徴とする。本発明による基板自動処理装置のカセッ
ト保持装置によって保持された複数枚の基板を収納可能
な基板収納カセットを所定経路に沿って搬送する搬送手
段を有し、前記カセット内の基板を前記所定経路中で処
理槽内に貯留された処理液により浸漬処理を行う基板自
動処理装置において、前記カセット保持装置は、前記搬
送手段により搬送される基体部と、前記基体部に各々一
端が回転自在に取り付けられかつ互いに略平行に伸長し
て回転駆動される一対の長手支持部材と、前記長手支持
部材の他端側の各々に装着され、長手状かつ前記長手支
持部材に対して垂下状態で基板収納カセットを保持する
ための保持部材を備え、前記保持部材は、金属製芯部
材と、樹脂製表層部材とを有し、前記芯部材の固定端近
傍の歪量が最も大きい部位に抵抗線歪ゲージを設け、前
記抵抗線歪みゲージを前記表層部材によって被覆してな
ることを特徴とする。
According to the present invention, there is provided a cassette holding apparatus comprising: a base; and a pair of longitudinal support members, one end of which is rotatably mounted on the base and which is driven to rotate substantially parallel to each other. And attached to each of the other end sides of the longitudinal support members, and are formed in a longitudinal shape and with respect to the longitudinal support members.
And a holding member for holding the retractable substrate storage cassette a plurality of substrates in a drooping state Te, the holding member includes a metal core member, and a resin surface layer member, the core member A resistance wire strain gauge is provided at a portion near the fixed end where the amount of strain is largest, and the resistance wire strain gauge is covered with the surface member. The resistance wire strain gauge of the cassette holding device according to the present invention is characterized by being fixed to the core member using an adhesive. The substrate transfer device according to the present invention includes a transfer unit that transfers a substrate storage cassette capable of storing a plurality of substrates held by the cassette holding device, and the cassette holding device includes a base unit that is transferred by the transfer unit. When each one end of which is mounted a pair of longitudinal support members which is rotated by rotatably mounted and substantially extend parallel to one another, to each of the other end of the longitudinal support member, elongate and the base portion The longitudinal support member
And a holding member for holding a substrate storage cassette drooping state, the holding member includes a metal core member with respect to,
A resin surface layer member, wherein a resistance wire strain gauge is provided at a position where the amount of strain is greatest near the fixed end of the core member, and the resistance wire strain gauge is covered by the surface layer member. . The present invention has a transporting means for transporting a substrate storage cassette capable of storing a plurality of substrates held by a cassette holding device of the automatic substrate processing apparatus according to the present invention along a predetermined path, and moving the substrate in the cassette in the predetermined path. In the automatic substrate processing apparatus for performing immersion processing by using the processing liquid stored in the processing tank, the cassette holding device has a base unit conveyed by the conveyance unit and one end rotatably attached to the base unit. A pair of longitudinal support members which are extended substantially in parallel with each other and driven to rotate, and mounted on each of the other end sides of the longitudinal support members to form a longitudinal and longitudinal support member.
And a holding member for holding a substrate accommodating cassette in hanging state with respect to support member, the holding member includes a metal core member, and a resin surface layer member, the fixed end near said core member A resistance wire strain gauge is provided at a portion where the amount of strain is largest, and the resistance wire strain gauge is covered with the surface layer member.

【0027】[0027]

【作用】上記構成によれば、上記保持部材がカセットを
保持することによってカセット保持装置の所定部位に生
ずる歪に基づいて、上記抵抗線歪ゲージの抵抗値が変化
する。また、該保持部材がカセットを保持していない状
態であれば、該抵抗値は元の値となる。
According to the above construction, the resistance value of the resistance wire strain gauge changes based on the strain generated in a predetermined portion of the cassette holding device when the holding member holds the cassette. If the holding member does not hold the cassette, the resistance value becomes the original value.

【0028】[0028]

【実施例】次に、本発明の実施例としての基板自動処理
装置について、添付図面を参照しつつ説明する。なお、
本発明に係る基板自動処理装置は、以下に説明する要部
以外は図4乃至図6に示した従来の基板自動処理装置と
同様に構成されている故、基板自動処理装置全体として
の説明は省略して該要部のみの説明に留める。また、以
下の説明において、該従来の基板自動処理装置の構成部
分と同一の構成部分については、同じ参照符号を付して
示している。
Next, an automatic substrate processing apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings. In addition,
The automatic substrate processing apparatus according to the present invention is configured similarly to the conventional automatic substrate processing apparatus shown in FIGS. 4 to 6 except for the main parts described below. The description will be omitted, and only the main part will be described. In the following description, the same components as those of the conventional automatic substrate processing apparatus are denoted by the same reference numerals.

【0029】図1及び図2に示すように、本発明に係る
基板自動処理装置において、カセット保持装置12が具
備する2本の長手支持部材21及び22の自由端側に、
カセット10を保持するための保持部材40が2本ず
つ、取付けブロック25を介して取り付けられている。
これら4本の保持部材40は互いに同形状、同寸法にて
長手状に形成され、上記長手支持部材21、22に対し
て、具体的には取付けブロック25に対し、片持梁状
態、この場合、垂下状態にて装着されている。
As shown in FIGS. 1 and 2, in the automatic substrate processing apparatus according to the present invention, the two longitudinal support members 21 and 22 of the cassette holding device 12
Two holding members 40 for holding the cassette 10 are mounted via the mounting block 25 at a time.
These four holding members 40 are formed in the same shape and the same length in the same shape, and are formed in a longitudinal shape. , Mounted in a hanging state.

【0030】図2及び図3に示すように、上記保持部材
40は、例えばステンレス鋼等の金属からなる芯部材4
0aと、フッ素系等の樹脂を素材として該芯部材40a
上に覆設された表層部材40bとからなる。図2に示す
ように、該表層部材40bは、芯部材40aの下端より
も更に下方に延出する延出部40cを有し、該延出部4
0cの下端部はフック部40dとされ、カセット10に
形成された鍔部10aをこのフック部40dによって支
え持つようになされている。
As shown in FIGS. 2 and 3, the holding member 40 is a core member 4 made of a metal such as stainless steel.
0a and the core member 40a made of a resin such as a fluorine-based resin.
And a surface layer member 40b overlaid thereon. As shown in FIG. 2, the surface member 40b has an extension 40c that extends further below the lower end of the core member 40a.
The lower end of Oc is a hook portion 40d, and the flange portion 10a formed on the cassette 10 is supported by the hook portion 40d.

【0031】図2及び図3に示すように、上記カセット
保持装置12に関し、カセット10を保持する際に歪が
生ずべき所定部位、この場合、1本の保持部材40に、
抵抗線歪ゲージ42が接着剤等を用いて固着されてい
る。但し、図2では、該抵抗線歪ゲージ42を黒点にて
示している。図3に示すように、該抵抗線歪ゲージ42
には結線42aが施され、該結線42aにて図示しない
ブリッジ回路と接続されている。但し、該ブリッジ回路
は図4に示した基板自動処理装置において基本部19内
に設けられ、該結線42aは、可動部であるカセット保
持装置12及び搬送手段14の作動時にその妨げとなら
ないように配線されている。かかる構成によれば、上記
保持部材40がカセット10を保持することによって該
保持部材40に生ずる歪に基づいて、抵抗線歪ゲージ4
2の抵抗値が変化し、また、該保持部材40がカセット
10を保持していない状態であれば、該抵抗値は元の値
となる。これを該ブリッジ回路や図示しないオシログラ
フなどで測定することができる。すなわち、抵抗線歪ゲ
ージ42の抵抗値の変化を以て、カセット保持装置12
によるカセット10の保持及び非保持の状態が確認され
る。
As shown in FIGS. 2 and 3, with respect to the cassette holding device 12, a predetermined portion where distortion is not generated when the cassette 10 is held, in this case, a single holding member 40,
The resistance wire strain gauge 42 is fixed using an adhesive or the like. However, in FIG. 2, the resistance wire strain gauge 42 is indicated by a black dot. As shown in FIG.
Is connected to a bridge circuit (not shown) at the connection 42a. However, the bridge circuit is provided in the basic portion 19 in the automatic substrate processing apparatus shown in FIG. 4, and the connection 42a is provided so as not to hinder the operation of the cassette holding device 12 and the transfer means 14 which are movable parts. Wired. According to such a configuration, the resistance wire strain gauge 4 is used based on the strain generated in the holding member 40 when the holding member 40 holds the cassette 10.
2 changes, and if the holding member 40 does not hold the cassette 10, the resistance value becomes the original value. This can be measured by the bridge circuit or an oscillograph (not shown). That is, the change in the resistance value of the resistance strain gauge 42 causes the cassette holding device 12
, The holding and non-holding states of the cassette 10 are confirmed.

【0032】上記構成によれば、基板自動処理装置(装
置全体は図4参照)において、上記カセット保持装置1
2がカセット10を保持しているかどうかの確認を、カ
セット10の搬送中、停止中及びその搬送速度に拘らず
連続的に且つ確実に行うことができる。よって、従来の
ようにカセット検出のために搬送速度を減じたりする必
要はなく、速やかに搬送することができ、基板自動処理
装置の作業能率が向上する。
According to the above configuration, in the automatic substrate processing apparatus (see FIG. 4 for the entire apparatus), the cassette holding device 1 is used.
Whether the cassette 2 is holding the cassette 10 can be continuously and reliably confirmed regardless of whether the cassette 10 is being conveyed, stopped, or conveyed. Therefore, unlike the conventional case, it is not necessary to reduce the transfer speed for detecting the cassette, the transfer can be performed quickly, and the work efficiency of the automatic substrate processing apparatus is improved.

【0033】[0033]

【0034】本実施例においては、図3から明らかなよ
うに、上記抵抗線歪ゲージ42は保持部材40の芯部材
40aに固着され、かつ、樹脂製の表層部材40bによ
って被覆されている。故に、抵抗線歪ゲージ42は、特
別なコーティング処理を施さずとも腐食性気体等から保
護される。
In this embodiment, as is apparent from FIG. 3, the resistance wire strain gauge 42 is fixed to the core member 40a of the holding member 40 and is covered by a resin surface member 40b. Therefore, the resistance wire strain gauge 42 is protected from corrosive gas and the like without performing a special coating process.

【0035】また、図2及び図3から明らかなように、
上記抵抗線歪ゲージ42は、取付けブロック25に対す
る保持部材40の固定端の近傍に固着されている。すな
わち、片持梁状となされた該保持部材40の全長のう
ち、加わるモーメント、従って歪量が最も大きい部位に
抵抗線歪ゲージ42を配置したものである。この構成に
よれば、抵抗線歪ゲージ42の抵抗値の変化量が大き
く、カセット10の保持、非保持を確実に検出すること
ができる。
As is clear from FIGS. 2 and 3,
The resistance wire strain gauge 42 is fixed near a fixed end of the holding member 40 to the mounting block 25. That is, the resistance wire strain gauge 42 is disposed at a position where the applied moment, and thus the amount of strain, is the largest in the entire length of the holding member 40 formed in a cantilever shape. According to this configuration, the amount of change in the resistance value of the resistance wire strain gauge 42 is large, and the holding and non-holding of the cassette 10 can be reliably detected.

【0036】[0036]

【0037】また、抵抗線歪ゲージは一般に比較的低廉
であるからコストが安く済み、又、極く薄くかつ小さな
ものであるが故に装置全体の構造を設計する際に特にス
ペースを考慮することなく自在に設置可能であり、装置
設計の自由度が増大する。
In addition, the resistance wire strain gauge is generally relatively inexpensive, so that the cost can be reduced. In addition, since the resistance wire strain gauge is extremely thin and small, it is possible to design the structure of the entire device without taking space into account. It can be installed freely, and the degree of freedom in device design increases.

【0038】[0038]

【発明の効果】以上説明したように、本発明によれば、
カセット保持装置が具備する保持部材がカセットを保持
する際に歪が生ずべき該カセット保持装置の所定部位
に、抵抗線歪ゲージが固着されている。そして、該抵抗
線歪ゲージの抵抗値の変化を以てカセットの保持及び非
保持の状態が確認される。かかる構成によれば、基板自
動処理装置においてカセット保持装置がカセットを保持
しているかどうかの確認を、カセットの搬送中、その搬
送速度に拘らず連続的に且つ確実に行うことができる。
よって、従来のようにカセット検出のために搬送速度を
減じたりする必要はなく、速やかに搬送することがで
き、基板自動処理装置の作業能率が向上する。更に、抵
抗線歪ゲージは比較的低廉であるからコストが安く済
み、又、極く薄くかつ小さなものであるが故に装置全体
の構造を設計する際に特にスペースを考慮することなく
自在に設置可能であり、装置設計の自由度が増大する。
加えて、本発明によるカセット保持装置においては、そ
の基体部に対し各々一端部にて回転自在に取り付けられ
且つ互いに略平行に伸長して駆動手段により回転駆動さ
れる長手支持部材を有し、上記保持部材は長手状にして
該長手支持部材の他端側に略片持梁状態にて装着され、
上記抵抗線歪ゲージは該保持部材の固定端近傍に固着さ
れている。すなわち、片持梁状となされた該保持部材の
最も歪量が大きい部位に抵抗線歪ゲージを配置したもの
である。この構成によれば、抵抗線歪ゲージの抵抗値の
変化量が大きく、カセットの保持、非保持を確実に検出
することができる。また、本発明によるカセット保持装
置においては、上記保持部材が、金属製芯部材と、該芯
部材上に覆設された樹脂製表層部材とからなり、上記抵
抗線歪ゲージは該芯部材に固着され、且つ、該表層部材
によって被覆されている。故に、抵抗線歪ゲージは、特
別なコーティング処理を施さずとも腐食性気体等から保
護される。
As described above, according to the present invention,
A resistance wire strain gauge is fixed to a predetermined portion of the cassette holding device where the holding member provided in the cassette holding device should not be distorted when holding the cassette. Then, the state of holding and non-holding of the cassette is confirmed based on the change in the resistance value of the resistance wire strain gauge. According to such a configuration, whether or not the cassette holding device holds the cassette in the automatic substrate processing apparatus can be continuously and reliably performed regardless of the transfer speed during the transfer of the cassette.
Therefore, unlike the conventional case, it is not necessary to reduce the transfer speed for detecting the cassette, the transfer can be performed quickly, and the work efficiency of the automatic substrate processing apparatus is improved. Furthermore, the resistance wire strain gauge is relatively inexpensive, so the cost can be reduced, and because it is extremely thin and small, it can be freely installed without considering the space when designing the structure of the entire device. Therefore, the degree of freedom in device design is increased.
In addition, in the cassette holding device according to the present invention, the cassette holding device has a longitudinal support member rotatably attached at one end to each of the base portions and extending substantially in parallel with each other and driven to rotate by driving means, The holding member is longitudinally attached to the other end side of the longitudinal support member in a substantially cantilever state,
The resistance wire strain gauge is fixed near the fixed end of the holding member. In other words, the resistance wire strain gauge is arranged at a portion of the cantilever-shaped holding member where the amount of strain is largest. According to this configuration, the amount of change in the resistance value of the resistance wire strain gauge is large, and the holding and non-holding of the cassette can be reliably detected. Further, in the cassette holding device according to the present invention, the holding member includes a metal core member and a resin surface member covered on the core member, and the resistance wire strain gauge is fixed to the core member. And is covered by the surface member. Therefore, the resistance wire strain gauge is protected from corrosive gas and the like without performing a special coating process.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は、本発明に係る基板自動処理装置の要部
であるカセット保持装置の斜視図である。
FIG. 1 is a perspective view of a cassette holding device, which is a main part of an automatic substrate processing apparatus according to the present invention.

【図2】図2は、図1に示したカセット保持装置が処理
液中でカセットを保持している状態を示す、一部断面を
含む正面図である。
FIG. 2 is a front view including a partial cross section showing a state where the cassette holding device shown in FIG. 1 holds a cassette in a processing liquid.

【図3】図3は、図1及び図2に示したカセット保持装
置の一部の、一部断面を含む斜視図である。
FIG. 3 is a perspective view including a partial cross section of a part of the cassette holding device shown in FIGS. 1 and 2.

【図4】図4は、従来の基板自動処理装置の斜視図であ
る。
FIG. 4 is a perspective view of a conventional automatic substrate processing apparatus.

【図5】図5は、図4に示した基板自動処理装置が備え
るカセット保持装置がカセットを保持した状態と、該カ
セットの検出をなす光透過型フォトセンサとを示す、一
部断面を含む正面図である。
5 is a partial cross-sectional view showing a state in which a cassette holding device included in the automatic substrate processing apparatus shown in FIG. 4 holds a cassette and a light transmitting photosensor for detecting the cassette; It is a front view.

【図6】図6は、図5に示したカセット保持装置と、光
反射型フォトセンサとを示す、一部断面を含む正面図で
ある。
FIG. 6 is a front view including a partial cross section, showing the cassette holding device shown in FIG. 5 and a light reflection type photosensor.

【符号の説明】[Explanation of symbols]

1 (基板自動処理装置
の)架台 2,3,4,5,6 処理槽 2a,3a,4a,5a,6a 処理液 8 基板 10 カセット 12 カセット保持装置 14 搬送手段 16 可動ベース 17 可動ポール 19 基体部 21,22 長手支持部材 25 取付けブロック 31,32,35 フォトセンサ 40 保持部材 40a 金属製芯部材 40b 樹脂製表層部材 42 抵抗線歪ゲージ
DESCRIPTION OF SYMBOLS 1 Stand (of automatic substrate processing apparatus) 2, 3, 4, 5, 6 Processing tank 2a, 3a, 4a, 5a, 6a Processing liquid 8 Substrate 10 Cassette 12 Cassette holding device 14 Transport means 16 Movable base 17 Movable pole 19 Base Part 21, 22 Longitudinal support member 25 Mounting block 31, 32, 35 Photosensor 40 Holding member 40a Metal core member 40b Resin surface member 42 Resistance wire strain gauge

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/68 B65G 49/07 H01L 21/304 H01L 21/305 B25J 15/08 B25J 19/02 Continuation of the front page (58) Field surveyed (Int. Cl. 7 , DB name) H01L 21/68 B65G 49/07 H01L 21/304 H01L 21/305 B25J 15/08 B25J 19/02

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基体部と、前記基体部に各々一端が回転
自在に取り付けられかつ互いに略平行に伸長して回転駆
動される一対の長手支持部材と、前記長手支持部材の他
端側の各々に装着され、長手状かつ前記長手支持部材に
対して垂下状態で複数枚の基板を収納可能な基板収納カ
セットを保持するための保持部材を備え、前記保持部
材は、金属製芯部材と、樹脂製表層部材とを有し、前記
芯部材の固定端近傍の歪量が最も大きい部位に抵抗線歪
ゲージを設け、前記抵抗線歪みゲージを前記表層部材に
よって被覆してなることを特徴とするカセット保持装
置。
1. A base member, a pair of longitudinal support members each rotatably attached to the base member at one end and extending substantially in parallel with each other and driven to rotate, and each of the other end of the longitudinal support member Attached to the longitudinal and longitudinal support member
And a holding member for holding a plurality of retractable substrate storage cassettes substrates hanging state for, the holding member includes a metal core member, and a resin surface layer member, the core member A resistance wire strain gauge is provided at a portion where the amount of strain is the largest near the fixed end of the cassette holding device, and the resistance wire strain gauge is covered with the surface member.
【請求項2】 前記抵抗線歪みゲージは、該芯部材に接
着剤を用いて固着されることを特徴とする請求項1記載
のカセット保持装置。
2. The cassette holding device according to claim 1, wherein the resistance wire strain gauge is fixed to the core member using an adhesive.
【請求項3】 カセット保持装置によって保持された複
数枚の基板を収納可能な基板収納カセットを搬送する搬
送手段を有し、前記カセット保持装置は、前記搬送手段
により搬送される基体部と、前記基体部に各々一端が回
転自在に取り付けられかつ互いに略平行に伸長して回転
駆動される一対の長手支持部材と、前記長手支持部材の
他端側の各々に装着され、長手状かつ前記長手支持部材
に対して垂下状態で基板収納カセットを保持するための
保持部材を備え、前記保持部材は、金属製芯部材と、
樹脂製表層部材とを有し、前記芯部材の固定端近傍の歪
量が最も大きい部位に抵抗線歪ゲージを設け、前記抵抗
線歪みゲージを前記表層部材によって被覆してなること
を特徴とする基板搬送装置。
3. A transport device for transporting a substrate storage cassette capable of storing a plurality of substrates held by a cassette holding device, wherein the cassette holding device comprises: a base portion transported by the transport device; A pair of longitudinal support members each rotatably attached to the base portion and rotatably driven while extending substantially in parallel with each other; and attached to each of the other end sides of the longitudinal support members to form a longitudinal and longitudinal support. Element
And a holding member for holding a substrate storage cassette drooping state, the holding member includes a metal core member with respect to,
A resin surface layer member, wherein a resistance wire strain gauge is provided at a position where the amount of strain is greatest near the fixed end of the core member, and the resistance wire strain gauge is covered by the surface layer member. Substrate transfer device.
【請求項4】 カセット保持装置によって保持された複
数枚の基板を収納可能な基板収納カセットを所定経路に
沿って搬送する搬送手段を有し、前記カセット内の基板
を前記所定経路中で処理槽内に貯留された処理液により
浸漬処理を行う基板自動処理装置において、前記カセッ
ト保持装置は、前記搬送手段により搬送される基体部
と、前記基体部に各々一端が回転自在に取り付けられか
つ互いに略平行に伸長して回転駆動される一対の長手支
持部材と、前記長手支持部材の他端側の各々に装着さ
れ、長手状かつ前記長手支持部材に対して垂下状態で基
板収納カセットを保持するための保持部材を備え、前
記保持部材は、金属製芯部材と、樹脂製表層部材とを有
し、前記芯部材の固定端近傍の歪量が最も大きい部位に
抵抗線歪ゲージを設け、前記抵抗線歪みゲージを前記表
層部材によって被覆してなることを特徴とする基板自動
処理装置。
4. A transport unit for transporting a substrate storage cassette capable of storing a plurality of substrates held by a cassette holding device along a predetermined path, wherein a substrate in the cassette is processed in the processing path along the predetermined path. In the automatic substrate processing apparatus for performing immersion processing by using the processing liquid stored in the cassette holding device, the cassette holding device has a base portion conveyed by the conveyance means, and one end is rotatably attached to the base portion, and the cassette holding device is substantially mutually separated. A pair of elongate support members which are extended in parallel and driven to rotate, and mounted on each of the other end sides of the elongate support members.
Is, and a holding member for holding a substrate storage cassette drooping state with respect to elongate and the longitudinal support member, the holding member includes a metal core member, and a resin surface layer member, the An automatic substrate processing apparatus, comprising: a resistance wire strain gauge provided in a portion near the fixed end of a core member where the amount of strain is the largest, and the resistance wire strain gauge is covered by the surface layer member.
JP10995095A 1995-03-17 1995-03-17 Cassette holding device, substrate transport device equipped with the same, and automatic substrate processing device Expired - Lifetime JP3335264B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10995095A JP3335264B2 (en) 1995-03-17 1995-03-17 Cassette holding device, substrate transport device equipped with the same, and automatic substrate processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10995095A JP3335264B2 (en) 1995-03-17 1995-03-17 Cassette holding device, substrate transport device equipped with the same, and automatic substrate processing device

Publications (2)

Publication Number Publication Date
JPH08264620A JPH08264620A (en) 1996-10-11
JP3335264B2 true JP3335264B2 (en) 2002-10-15

Family

ID=14523241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10995095A Expired - Lifetime JP3335264B2 (en) 1995-03-17 1995-03-17 Cassette holding device, substrate transport device equipped with the same, and automatic substrate processing device

Country Status (1)

Country Link
JP (1) JP3335264B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100760537B1 (en) * 2001-09-26 2007-09-20 주식회사 케이씨텍 Device for sensing whether a semicondutor wafer cassette is gripped

Also Published As

Publication number Publication date
JPH08264620A (en) 1996-10-11

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