JP3330896B2 - Synchrotron radiation light propagation device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a synchrotron radiation (SR) light propagating device, and more particularly to an SR that oscillates a mirror to swing the traveling direction of the SR light up and down and irradiates a certain area with the SR light. The present invention relates to a light propagation device.

[0002]

2. Description of the Related Art The configuration of a conventional X-ray exposure apparatus will be described with reference to FIG. FIG. 1 is also referred to in the description of the embodiment of the present application.

An X-ray exposure apparatus includes an SR light generator 1, an SR light propagator 10, and an X-ray stepper 50.

[0004] The SR light generator 1 includes a vacuum vessel 2 and an electron beam orbit 3 formed therein. SR light is emitted from the electrons circling along the orbit 3. This SR light is extracted outside through a beam outlet 4 provided in the vacuum container 2.

[0005] The SR light propagation unit 10 includes an entrance side vacuum duct 1.
1. Mirror housing 12 and emission side vacuum duct 30 are included. The mirror housing 12 is provided with an entrance hole 13 and an exit hole 14 for SR light. The entrance-side vacuum duct 11 hermetically connects the beam outlet 4 of the SR light generation unit 1 and the entrance hole 13 of the mirror housing 12. In the vacuum duct 11, a vacuum shutoff valve, a shutter (not shown) for shielding emitted light, and the like are arranged. The entrance end of the exit side vacuum duct 30 is airtightly connected to the exit hole 14.

[0006] An X-ray reflection mirror 15 is housed in a mirror housing 12 and is held by a mirror swing mechanism 16. The SR light incident from the entrance hole 13 is
And is incident into the exit-side vacuum duct 30 through the exit hole 14. The mirror 15 has a vertical incident surface including the incident optical axis and the normal to the reflecting surface at the reflection point, and the angle between the incident optical axis and the reflecting surface is about 2 °, that is, the incident angle is about 88 °. Are arranged as follows.

The swing mechanism 16 swings the mirror 15 about a rotation axis passing through the SR light reflection point and perpendicular to the incident surface as a swing center. The swing of the mirror 15 causes the reflected SR light to swing up and down.

A window flange 37 having an emission window formed of a beryllium thin film is hermetically attached to the emission end of the emission side vacuum duct 30. The SR light that has entered the emission-side vacuum duct 30 is emitted outside through an emission window formed in the window flange 37. An X-ray stepper 50 is arranged at a position facing the window flange 37. The X-ray stepper 50 holds the semiconductor substrate 51 at a position where the SR light emitted from the window flange 37 is irradiated. Semiconductor substrate 5
An exposure mask 52 is held in front of 1.

The SR light is emitted in all directions in the horizontal direction, but only spreads about ± 1 mrad in the vertical direction. By oscillating the mirror 15 and swinging the SR light up and down, the S
R light can be emitted.

[0010]

The SR light diverges in the horizontal direction. By converging the SR light in the horizontal direction and changing it into a parallel light beam, the utilization efficiency of the SR light emitted from the light source can be increased. When performing X-ray exposure, the exposure time can be shortened by increasing the light intensity of X-rays.

In order to converge the SR light in the horizontal direction, a cylindrical mirror or a toroidal mirror is used as the mirror 15 in FIG. The substantial focal length of the cylindrical mirror or the toroidal mirror varies depending on the incident angle of the SR light. When the mirror 15 is swung, the incident angle changes, so that the focal length in the horizontal plane also changes according to the change in the incident angle.

When the focal length changes, the energy density of SR light on the surface of the semiconductor substrate 51 changes. Therefore, it becomes difficult to uniformly irradiate the surface of the semiconductor substrate 51 with X-rays.

An object of the present invention is to provide an SR light propagation device capable of improving the exposure performance of an exposure device using SR light.

[0014]

According to one aspect of the present invention, there is provided a housing in which an input hole and an output hole of synchrotron radiation having a horizontally long cross-sectional shape are formed, and the housing is disposed in the housing. A mirror that reflects synchrotron radiation, and a mirror holding mechanism that holds the mirror in the housing and imparts a bending moment to the mirror so as to converge the synchrotron radiation with respect to the plane of incidence. The mirror holding mechanism in which the magnitude of the bending moment changes linearly with respect to the direction of intersection of the reflecting surface of the mirror and the incident surface of the synchrotron radiation light, and passes through the entrance hole into the housing. The incident synchrotron radiation light is reflected by the mirror and holds the mirror so as to change the traveling direction in a vertical plane, and the angle of change in the traveling direction is varied. Synchrotron radiation propagation device having a swinging mechanism for swinging the error is provided.

When the magnitude of the bending moment applied to the mirror is linearly changed, an image obtained by vertically projecting the light reflected by the mirror onto the incident surface of the synchrotron radiation light becomes substantially a parallel light beam. Can be.

According to another aspect of the present invention, there is provided a housing in which an input hole and an output hole of synchrotron radiation having a long cross section in the horizontal direction are formed, and the synchrotron radiation is disposed in the housing. And a holding plate that is in close contact with the back surface of the mirror and curves together with the mirror, the first plate extending in a direction intersecting the reflection surface of the mirror at a different position with respect to the traveling direction of the synchrotron radiation light.
And the holding plate provided with a second arm and the first arm.
And a rod connected to the second arm and applying a force in a direction in which the first and second arms are opened or closed, wherein the arm is connected to a connecting portion between the rod and the first arm. And the synchrotron radiation incident into the housing through the rod and the entrance hole, the lengths of which are different from the length of the arm up to the connecting portion between the rod and the second arm, are reflected by the mirror. There is provided a synchrotron radiation light propagation device having a swing mechanism for holding the mirror so as to change the traveling direction in a vertical plane and swinging the mirror so that the angle of change in the traveling direction varies.

By making the two arms different in length,
A bending moment whose size changes linearly can be applied to the holding plate.

[0018]

FIG. 1 is a block diagram of an embodiment of the present invention.
1 schematically shows an X-ray exposure apparatus incorporating an R light propagation device.
Since the schematic configuration of the X-ray exposure apparatus has already been described, the description is omitted here. The SR light propagation device according to the embodiment has a configuration different from that of the conventional example in the mirror 15, the swing mechanism 16, and the window flange 37. These configurations will be described later in detail. First, the change in the effective focal length when the mirror 15 swings will be considered.

FIG. 2 shows the optical axis of the SR light and the reflection of the mirror 15.
It is a schematic diagram which shows the relationship with a surface. The mirror is in the reference position
The light source P_SSR light radiated from_iBut a mirror
Reflection point P on the reflection surface of_r1Incident on. Reference reflection point P
_r1Reflected light SR reflected by_rIlluminates the exposed surface S of the semiconductor substrate.
Fired. Reflection surface RF when mirror is at reference position ₁
Swing center P on the extension of₀There is.

The distance between the light source P _S and the reference reflection point _{Pr 1 is represented} by L ₁ ,
The distance between the reference reflection point P _r1 and the exposure surface S is L ₂ , the distance between the reference reflection point P _r1 and the swing center P ₀ (the swing radius) is R, the optical axis of the mirror reflection surface and the incident light SR _i . Is an angle θ. The angle θ when the mirror is at the reference position is defined as θ ₀ . Further, it is assumed that the reflection surface of the mirror is a curved surface to be rotated having a rotation center axis in the incident surface.

Consider a case where the mirror swings from the reference position by an angle Δθ. _Assuming that the reflection point at this time is _Pr2 , the distance x between the reference reflection point _Pr1 and the reflection point _Pr2 is:

[0022]

X = R × sin (Δθ) / sin (θ ₀ −Δθ) ≒ R × sin (Δθ) / (sin (θ ₀ ) −sin (Δθ)) (1) The condition for the SR light SR _i emitted from the light source P _S to be reflected by the mirror into a parallel light beam is as follows:

[0023]

F = L ₁ + x (2)

_{Assuming that} the radius of curvature of the reflecting surface at the position of the reflecting point _Pr2 is r, the basic formula of the mirror is:

[0025]

F = r / ( ₂ sin (θ ₂ −Δθ)) (3) From equations (1) to (3), Δθ is eliminated and r
Is expressed as a function of x,

[0026]

R = ((L ₁ + x) / (R + x)) × 2R sin (θ ₀ ) = (1− (1−L ₁ / R) / (1 + x / R)) × 2R sin (θ ₀ ) ( 4) If x / R << 1, Equation (4) is

[0027]

R ≒ (1− (1−L ₁ / R) (1−x / R)) × 2R sin (θ ₀ ) (5) That is, the radius of curvature r can be approximated by a linear function of x. This indicates that the reflection surface of the mirror is a substantially conical surface.

That is, assuming that the reflecting surface of the mirror is a conical surface having a radius of curvature r represented by the equation (5), the vertical projection image of the reflected light on the horizontal plane is always converted into a parallel light beam even when the mirror is swung. Become. Therefore, the energy density of the SR light on the exposure surface can be made constant.

If R = L ₁ in equation (5),

[0030]

R ≒ 2L ₁ sin (θ ₀ ) (6), and the radius of curvature r is constant regardless of x. this is,
This indicates that the reflection surface of the mirror is a cylindrical surface.

That is, the swing radius R is equal to the reflection reference point _Pr1.
From the equal to the distance L ₁ to the light source P _S is the reflecting surface of the mirror by a cylindrical surface having a radius of curvature of the formula (6), a constant energy density of SR light in the exposure plane can do.

Next, with reference to FIG. 3, a description will be given of a simulation result performed to verify the effect when the mirror 15 is a cylindrical mirror.

FIGS. 3A to 3C show the shape of the SR light irradiation area on the exposure surface. The horizontal axis corresponds to the horizontal direction, and the vertical axis corresponds to the direction in which the optical axis of the reflected SR light is swung. In addition, since the shape of the irradiation area is left-right symmetric, only one side is shown. The horizontal divergence angle of the SR light emitted from the light source is ± 10 mrad, the vertical divergence angle is ± 0.5 mrad, and the angle θ ₀ between the incident optical axis and the reflection surface at the reference position of the mirror is 1.8 °. And FIG.
The distance L ₁ in 3m, and the L ₂ and 6 m.

FIG. 3A shows a case where the mirror is swung around a swing radius R of 0, that is, the reference reflection point _Pr1 . Figure a ₁ ~a ₅ shows the shape of the irradiation area of SR light at the time of changing the angle θ of FIG. When figure a ₁ is the angle θ is 1.61 °, figure a ₅ angle θ shows the shape when the 1.94 °. Figures a _{2 to} a ₄ show the case where the angle θ is an intermediate value between these. When the angle θ is reduced, the irradiation area moves upward and the horizontal spread increases. This is because the focal length f shown in Expression (2) becomes longer, and the converging power of the cylindrical mirror weakens.

[0035] FIG. 3 (B), the swing radius R 3m, ie the case of a R = L _1. The figure b ₁ has an angle θ of 1.
When the 67 °, figure b ₅ shows the shape of the irradiation area when the angle θ was set to 1.89 °. Figure b ₂ ~b _4, the angle θ indicates a case in between. FIG. 3 (B) shows the equation (6).
Is satisfied, the reflected SR light becomes a parallel light beam. Therefore, the amount of change in the size of the irradiation area when the angle θ is changed is small.

FIG. 3C shows a case where the swing radius R is 10 m. Figure c _1, when the angle θ was set to 1.72 °, figure c ₅ shows the shape of the irradiation area when the angle θ was set to 1.89 °. Figures c _{2 to} c ₄ show the case where the angle θ is intermediate. In the case of FIG. 3 (C), the width of the irradiation area becomes narrower as the angle θ decreases. this is,
The distance L from the reflection point _Pr 2 to the exposure surface S in FIG. 2 is larger than the increase in the focal length due to the decrease in the angle θ.
_This is because the influence of the decrease of _2- x is greater. The shape of the irradiation area when the swing radius R = L ₁ is not always uniform, because that is not a correction for the light deviates from the optical axis at a basic calculation.

A comparison between FIGS. 3A and 3C shows that changes in the area and shape of the irradiation region are smaller in the case of FIG. 3C. That is, in order to make the energy density on the exposure surface nearly uniform, the swing radius R must be
It is preferably larger than the distance L ₁ between the _S and the reference reflection point P _r1.

Next, an example of the configuration of the swing mechanism 16 shown in FIG. 1 will be described with reference to FIGS.

FIG. 4A shows a first configuration example. The lever 2 is attached to the support shaft 20 whose relative position is fixed to the housing 12.
One end is swingably mounted. The drive point of the drive mechanism 22 attached to the housing 12 is connected near the tip of the lever 21.

The mirror 15 has two links 23A and 2
It is held in the housing 12 by 3B. Some of the links 23A and 23B are led out of the housing 12 and
1 is fixed near the tip. Links 23A and 23
The portion where B penetrates the wall of the housing 12 is kept airtight by a vacuum bellows. The relative position between the mirror 15 and the support shaft 20 is determined so that a straight line that extends the reflection surface of the mirror 15 toward the entrance hole 13 intersects the support shaft 20.

When the drive mechanism 22 moves the drive point up and down, the lever 21 swings about the support shaft 20, and the mirror 15 connected thereto also swings about the support shaft 20 as the swing center.

FIG. 4B shows a second configuration example. FIG.
In the case of (A), the mirror 15 is fixed near the tip of the swinging lever 21. On the other hand, in the case of FIG. 4B, the mirror 15 is connected to the lever 25 via the moving length reducing / enlarging mechanism 26. The lever 25 is swingably attached to a support shaft 27 fixed to the housing, and its tip is driven up and down by a drive mechanism 28.

When the lever 25 swings, the mirror 15 performs the same swinging motion as in FIG. 4A by the action of the moving length reducing / enlarging mechanism 26. As described above, by using the moving length reducing / enlarging mechanism 26, the swinging mechanism can be downsized.

FIG. 4C shows a third configuration example. The mirror 15 is supported by electric drive mechanisms 24A and 24B via links 29A and 29B. Electric drive mechanism 24
A and 24B drive links 29A and 29B up and down, respectively. By adjusting the phases of the vertical movements of the links 29A and 29B to each other and adjusting the amplitude appropriately,
The mirror 15 can be made to perform the same swinging motion as in the case of FIG.

Next, the configuration near the exit end of the vacuum duct 30 shown in FIG. 1 will be described with reference to FIG.

FIG. 5A is a cross-sectional view showing the configuration near the exit end of the vacuum duct 30, and FIG. 5B is a side view as seen from the direction of arrow A in FIG. The vicinity of the distal end of the vacuum duct 30 is fixed to the base 60 by a support post 32.
A flange 33 is formed at the tip of the vacuum duct 30. One flange 35 of the metal welding bellows 34
Is attached to the flange 33. A window flange 37 is attached to the other flange 36. As shown in FIG. 5 (B), an opening is formed in the window flange 37 along a curved line obtained by curving a horizontal virtual straight line so as to protrude upward, and a beryllium thin film having a thickness of about 20 μm is formed in this opening. 31 is welded or brazed. Around the opening,
A protective eave 38 extending outward is attached. The protective eaves 38 prevent the beryllium thin film 31 from being damaged.

A sliding bearing 40 is attached to each of the left and right overhangs of the window flange 37. The slide bearing 40 is fitted on the guide shaft 41 and slides in the guide direction of the guide shaft 41. The guide shaft 41 is fixed to the vacuum duct 30 via bosses 42 and support plates 43 at both ends. The guide direction of the guide shaft 41 is parallel to an intersection line between a plane perpendicular to the center axis of the vacuum duct 30 and a vertical plane including the center axis.

The window flange 37 is connected to a driving rod 45 of a linear driving device 46 via an L-shaped fitting 44 attached to a projecting portion at the lower end thereof. The linear drive 46 is
By driving the motor 47, the drive rod 45 is reciprocated in the guide direction of the guide shaft 41. The window flange 37 also reciprocates in response to the reciprocation of the drive rod 45.

The window flange 37 reciprocates in synchronization with the swing of the optical axis of the reflected SR light traveling in the vacuum duct 30. The SR light is transmitted through the beryllium thin film 31 and is applied to the exposed surface of the semiconductor substrate 51 shown in FIG.

The cross section of the reflected SR light is shown in FIGS.
As shown in (C), it has a shape along an upwardly convex curve. By forming the beryllium thin film 31 in a shape corresponding to the cross-sectional shape of the SR light, the window area can be reduced. For this reason, the film strength can be increased and the beryllium thin film can be prevented from being damaged as compared with the case where the window shape is a simple circular shape or the like.

In FIG. 5B, the case where the window is formed along the upwardly convex curve has been described. However, the case where the reflection surface of the mirror 15 shown in FIG. Has a window shape along a downwardly convex curve.

Up to this point, the description has been given of the uniformization of the energy density by arranging the swing center of the mirror 15 shown in FIG. 1 on the light source side. When the swing center is located on the light source side,
This has the effect of not only making the energy density uniform, but also improving runout. Next, the effect of improving runout will be described.

When exposing a wide area of the exposure surface by swinging the optical axis of the reflected SR light, the SR incident on a certain point in the exposure area is exposed.
Assuming that the optical axis of the light is perpendicular to the exposure surface, the optical axis of the SR light incident on a point shifted from that position is oblique to the exposure surface. Since the exposure mask and the exposure surface are arranged at a fixed interval, if the optical axis is inclined, the mask pattern cannot be accurately transferred to the exposure surface. This phenomenon is called run-out.

In order to reduce the effect of run-out,
It is preferable that the center of swinging the optical axis of the reflected SR light be as far as possible from the exposure surface. When the swing center of the mirror 15 in FIG. 1 is located closer to the light source than the reflection point, the substantial distance between the center of the optical axis of the reflected SR light and the exposure surface is calculated by the approximate calculation as shown in FIG. it can be seen that approximately equal the radius R and the reference reflection point P _r1 to the sum of the distance L ₂ to the exposure surface S. For this reason, the center of the optical axis of the reflected SR light swinging away from the exposure surface, and the influence of the runout can be reduced.

In FIG. 3, the case where the SR light is converged in the horizontal plane has been described. Next, the case of convergence in the vertical plane will be described. By giving the mirror 15 shown in FIG. 1 a curvature centered on an axis perpendicular to the plane of incidence of the SR light, the SR light can be converged in the vertical plane. Such a mirror is obtained by, for example, bending a cylindrical mirror in a plane including its central axis.

The radius of curvature in the incident surface of the mirror 15 is r _t , and the angle θ between the incident optical axis and the reflecting surface is (θ ₀ −Δθ).
Then, the focal length f _{t in the} plane of incidence is

[0057]

[Equation 7] _{f t = (r t / 2} ) is represented as _{sin (θ 0 -Δθ) ... (} 7). Conditions for converting the reflected SR light into a parallel light beam are as follows:

[0058]

F _t = L ₁ + x (8) Equation (1), (7), erases the Δθ and f _t (8), to represent the radius of curvature r _t as a function of x,

[0059]

R _t = (2 / sin (θ ₀ )) (x ² / R + (1 + L ₁ / R) x + L ₁ ) (9) Selecting a radius of curvature r _t to satisfy equation (9), a vertical projected image of the entrance surface of the reflection SR light becomes parallel light fluxes. In FIG. 1, the distance L ₁ is 3 m, the distance L ₂ is 6 m, and the angle θ.
_{When 0} is 1.8 °, the reference position of the mirror 15, that is, x =
The radius of curvature r _{t at} 0 is 191 m.

FIG. 6A shows a case where a toroidal mirror having a radius of curvature r of 188 mm in a plane perpendicular to the plane of incidence and a radius of curvature r _t of 191 m in the plane of incidence is used.
3 shows a shape of an irradiation area on an exposure surface. The horizontal axis corresponds to the horizontal direction, and the vertical axis corresponds to the direction in which the reflected SR light swings. Each of the figures d ₁ , d ₂ and d ₃ has the angle θ shown in FIG.
The shape of the irradiation area at 63 °, 1.8 °, and 1.92 ° is shown. Compared with the shapes shown in FIGS. 3A to 3C, it can be seen that the width in the vertical direction is compressed.

As described above, when the vertical width of the irradiation region is reduced, the vertical width of the beryllium thin film window 31 shown in FIG. 5B can be further reduced. Therefore, the strength of the beryllium thin film can be further increased, and the safety can be improved.

[0062] FIG. 6 (B) shows the shape of the irradiation area in the case where the curvature radius r _t on the incident surface of the toroidal mirror and 127m. Figures e ₁ , e ₂ , and e ₃ have angles θ shown in FIG. 2 of 1.60 °, 1.8 °, and 1.9, respectively.
The shape of the irradiation area at 4 ° is shown. The curvature radius r _t 1
Assuming that the length is 27 m, when the reflected SR light is viewed along a direction perpendicular to the incident surface, it is focused on the exposure surface. It can be seen that the width in the vertical direction is more compressed than the shape shown in FIG.

The radius of curvature r _t is focused on the exposure surface.
Is selected, the area of the beryllium thin film window 31 can be further reduced. However, when the vertical width of the irradiation area is reduced, the energy density increases in inverse proportion thereto. When the energy density is too high, a local temperature rise is caused, and the danger at the time of malfunction also increases. By changing the radius of curvature r _t, it can alter the energy density to obtain a suitable exposure condition.

As described above, the radius of curvature of the reflecting surface within the incident surface is very large. As a method of giving such a deformation to the mirror, there is known a method in which a mirror material is fixed to a mount having a curved surface in a reverse direction, processed, and then released from the mount. In this case, it is necessary to process the mounting base into a curved surface shape. A curved surface can also be created by applying a bending moment to the mirror.

FIG. 7A is a schematic sectional view of a mirror holding mechanism proposed by the present inventor earlier. Mirror holding plate 17
The mirror 15 is held in close contact with one side of the mirror. At both ends of the other surface of the mirror holding plate 17, two arms 18A and 18B protruding in a direction perpendicular to the mirror holding surface are attached. Note that it is not essential that the arms 18A and 18B be perpendicular to the mirror holding surface. Arms 18A and 18
B may extend in a direction intersecting the reflection surface of the mirror 15. Arms 18A and 18B are equal in length.

A rod 19 is connected to each of the arms 18A and 18B. The rod 19 includes a support rod 19A and adjustment screws 19B inserted into each of both ends thereof. By adjusting the length of the rod 19 with the adjusting screw 19B, a bending moment is applied to the mirror holding plate 17 and the mirror 15 is bent.

Consider an xy coordinate system in which the intersection of the reflecting surface of the mirror 15 and the incident surface of the synchrotron radiation is the x-axis, and the normal direction of the reflecting surface is the y-axis. The shape of the holding surface of the mirror holding plate 17 is expressed by a differential equation

[0068]

## EQU10 ## d ² y / dx ² = M / EI _Z (10) Here, M is the bending moment, E is the Young's modulus of the material, and I _Z is the second moment of area.

When equation (9) is approximated by a linear equation,

[0070]

R _t = (2 / sin (θ ₀ )) ((1 + L ₁ / R) × + L ₁ ) (11) here,

[0071]

(2 / sin (θ ₀ )) (1 + L ₁ / R) = a (2 / sin (θ ₀ )) = b (12)

[0072]

R _t = ax + b (13) The shape of the line of intersection between the reflecting surface of the mirror 15 and the incident surface of the synchrotron radiation is represented by a differential equation

[0073]

Equation 14] is given by the solution of ^{d 2 y / dx 2 = 1} / r t = 1 / (ax + b) ... (14). Comparing equations (10) and (14),

[0074]

The following equation is obtained: I _Z = (M / E) (ax + b) (15) Elastic secondary moment I of mirror holding plate 17
_{When Z} satisfies Expression (15) , a desired radius of curvature is obtained.

When the thickness of the mirror holding plate 17 is constant, the elastic second moment I _Z is proportional to the width of the plate. That is, the width of the mirror holding plate 17 is set to ax with respect to the x-axis direction.
By changing the value corresponding to + b, a desired radius of curvature can be obtained. However, in this method, it is necessary to adjust the width of the mirror holding plate 17 in order to finely adjust the shape of the line of intersection between the reflecting surface of the mirror 15 and the incident surface of the synchrotron radiation. For this reason, it is difficult to finely adjust the shape of the reflection surface.

By using the mirror holding mechanism according to the embodiment of the present invention shown in FIG. 7B, it is possible to easily finely adjust the shape of the reflecting surface. In the mirror holding mechanism according to the embodiment, the lengths of the arms 18A and 18B are different. In addition,
The total length of the arms 18A and 18B is made equal, and the rod 1
9 and arm 18A or rod 19 and arm 18B
By changing the coupling position with the arm, the length of the arm may be substantially changed. The width and thickness of the mirror holding plate 17 are substantially uniform.

In an actual device, it can be considered that ax≪b.

[0078]

[Expression 16] d ² y / dx ² ≒ (−a / b ² ) x + (1 / b) (16) That is, the magnitude of the bending moment is x
It changes linearly in the axial direction. By making the lengths of the arms 18A and 18B different, the mirror holding plate 17
Can be given a bending moment that changes linearly in the x-axis direction.

The rod 1 to the arm 18A or 18B
By adjusting the mounting position of 9, the change rate of the bending moment in the x-axis direction can be adjusted.
By measuring the exposure distribution on the surface of the semiconductor substrate 51 shown in FIG. 1 and finely adjusting the shape of the reflecting surface of the mirror 15,
It becomes possible to make the exposure amount distribution closer to a desired distribution.

The present invention has been described in connection with the preferred embodiments.
The present invention is not limited to these. For example, it will be apparent to those skilled in the art that various modifications, improvements, combinations, and the like can be made.

[0081]

As described above, according to the present invention,
When the mirror that reflects the SR light is swung and the optical axis is swung to irradiate a large area in the exposure surface with the SR light, it is possible to suppress variations in energy density depending on positions in the exposure surface. Further, by finely adjusting the shape of the reflecting surface of the mirror, the exposure amount distribution can be finely adjusted.

[Brief description of the drawings]

FIG. 1 is a schematic view of an X-ray exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing a relationship between an optical axis of SR light of the X-ray exposure apparatus shown in FIG. 1 and a reflecting surface of a mirror.

FIG. 3 is a diagram showing a shape of an SR light irradiation area on an exposure surface.

FIG. 4 is a schematic front view showing a configuration example of a swing mechanism of the X-ray exposure apparatus shown in FIG.

5A and 5B are a cross-sectional view and a side view of the vicinity of an SR light emitting end of the X-ray exposure apparatus shown in FIG.

FIG. 6 is a diagram showing a shape of an SR light irradiation area on an exposure surface.

FIG. 7 is a schematic sectional view of a mirror holding mechanism.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 SR light generation part 2 Vacuum container 3 Orbit 4 Orifice 10 SR light propagation part 11 Inlet side vacuum duct 12 Mirror housing 13 Entry hole 14 Emission hole 15 Mirror 16 Swing mechanism 17 Mirror holding plate 18 Arm 19 Adjusting screw 19A Stretch rod 20, 27 Support shaft 21, 25 Lever 22, 28 Drive mechanism 23A, 23B, 29A, 29B Link 24A, 24B Electric drive mechanism 26 Reduction / enlargement mechanism of moving length 30 Emission vacuum duct 31 Beryllium thin film window 33, 35 , 36 flange 34 vacuum bellows 37 window flange 38 protective eaves 40 slide bearing 41 guide shaft 42 boss 43 support plate 44 L-shaped fitting 45 drive rod 46 linear drive 47 motor 50 X-ray stepper 51 semiconductor substrate 52 exposure mask 60 base

Continuation of the front page (58) Field surveyed (Int.Cl. ⁷ , DB name) H05H 13/04 G21K 1/06

Claims (5)

(57) [Claims] 1. A housing in which an entrance hole and an exit hole of synchrotron radiation having a long cross section in a horizontal direction are formed, a mirror disposed in the housing and reflecting the synchrotron radiation, A mirror holding mechanism for holding a mirror in the housing and applying a bending moment to the mirror so as to converge the synchrotron radiation light with respect to the plane of incidence thereof, wherein the magnitude of the bending moment is smaller than that of the mirror. The mirror holding mechanism, which linearly changes with respect to the direction of intersection between the reflecting surface and the incident surface of the synchrotron radiation light, and the synchrotron radiation light incident into the housing through the incident hole is reflected by the mirror. And a swing mechanism for swinging the mirror so as to change the direction of travel in the vertical plane and to change the angle of change in the direction of travel. Synchrotron radiation light propagation device. 2. The mirror holding mechanism is a holding plate that is in close contact with the back surface of the mirror and curves with the mirror, and intersects with a reflection surface of the mirror at a different position with respect to a traveling direction of synchrotron radiation. The holding plate provided with first and second arms extending in the direction, and connected to the first and second arms, and the first and second arms are provided with an opening direction or a closing direction. A rod for applying force, wherein the length of the arm up to a connecting portion between the rod and the first arm and the length of the arm up to a connecting portion between the rod and the second arm are different. The synchrotron radiation light propagation device according to claim 1, comprising: 3. The center of pivoting of the mirror by the pivoting mechanism is located at an intersection of an incident surface of the synchrotron radiation and a tangent plane at a reflection point of the mirror or an extension thereof, and the reflection point Is located on the incident side of synchrotron radiation light, and the swaying mechanism moves the reflection point of the synchrotron radiation light within the reflection surface of the mirror in accordance with the swaying of the mirror, and 3. The synchrotron radiation light propagation device according to claim 1, wherein the mirror is moved so that the incident angle increases as the distance from the light source to the reflection point increases. 4. A housing in which an entrance hole and an exit hole for synchrotron radiation having a long cross section in the horizontal direction are formed, a mirror disposed in the housing and reflecting the synchrotron radiation, A holding plate that is in close contact with the back surface of the mirror and curves with the mirror, provided with first and second arms extending in a direction intersecting the reflection surface of the mirror at different positions with respect to the traveling direction of the synchrotron radiation. A rod connected to the first and second arms, and for applying a force in a direction in which the first and second arms are opened or closed. The rod having a length different from that of the arm up to the connection with the first arm and the length of the arm up to the connection of the rod and the second arm, and having entered the casing through the entrance hole; The synchrotron radiation is Synchrotron radiation propagation device having a swinging mechanism for swinging said mirror to said mirror holding to change the traveling direction in a vertical plane is reflected by the color change angle of the traveling direction is changed. 5. The center of pivoting of the mirror by the pivoting mechanism is located on an intersection of an incident surface of the synchrotron radiation and a tangent plane at a reflection point of the mirror or an extension of the reflection point, and Is located on the incident side of synchrotron radiation light, and the swaying mechanism moves the reflection point of the synchrotron radiation light within the reflection surface of the mirror in accordance with the swaying of the mirror, and 5. The synchrotron radiation light propagation device according to claim 4, wherein the mirror is moved so that the incident angle increases as the distance from the light source to the reflection point increases.