JPH09203799A - Radiation beam line device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To increase the acceptance of a radiation beam that is to be converted into a parallel beam by causing the radiation beam impinging on a beam line main body to be collected by mirrors so that it is focused. SOLUTION: A first mirror 22 collects a radiation beam (s) impinging on a reflecting surface 21, so that it is focused (y). A second mirror 24 causes the radiation beam (s) impinging on a reflecting surface 23 from the first mirror 22 to be emitted as a parallel beam as seen along the vertical direction. A third mirror 26 is rocked about a rotating shaft 29 extending horizontally in a direction perpendicular to the radiation beam (s) emitted from the second mirror 24, and causes the radiation beam (s) impinging on the reflecting surface from the second mirror 24 to be emitted toward a beryllium window 27 as a parallel beam as seen along the horizontal direction. The beryllium window 27 can rotate about the rotating shaft 29, together with the third mirror 26. Thus the intensity of the radiation beam (s) applied to a subject 13 for exposure can be enhanced.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a radiation beam line device.

[0002]

2. Description of the Related Art In recent years, very large scale integrated circuits (VLSI / Very large scale integrated circui) have been realized by lithography using mercury lamp light or excimer laser light as a light source.
t) is being manufactured, but the VLSI is further miniaturized and ultra-large scale integrated circuit (ULSI / Ultra
Utilization of X-rays included in radiated light as a light source for manufacturing a large scale integrated circuit is under study.

The emitted light is a light (electromagnetic wave) emitted when an electron moving at a speed close to the speed of light is bent in its traveling direction by a magnetic field or an electric field.
It contains electromagnetic waves with wavelengths that span the linear region.

An example of radiation light generation means applied to a lithographic light source will be described below with reference to FIG.

Reference numeral 1 is a linear accelerator, and the linear accelerator 1 is an electron generator 2 for emitting electrons (charged particles) e.
And a straight tubular acceleration duct 3 having one end connected to the electron generator 2, and a high-frequency accelerator 4 for accelerating the electron e by giving a high frequency to the electron e moving inside the acceleration duct 3. doing.

One end of a curved tubular deflection duct 5 is connected to the other end of the acceleration duct 3, and the deflection duct 5 has:
A bending electromagnet 6 is provided to bend the trajectory of the electron e moving inside.

Reference numeral 7 is a synchrotron (electron storage ring), and the synchrotron 7 has an endless duct 8 for forming a circular orbit of the electrons e. Is connected to the other end of the deflection duct 5.

A bending electromagnet 9 for bending the trajectory of the electrons e moving inside the endless duct 8 is provided in the curved portion of the endless duct 8, and the endless duct 8 is provided at a required position of the endless duct 8. A high frequency accelerating device 10 is provided to apply a high frequency to the electrons e moving inside to accelerate the electrons e.

The radiant light beam s emitted by bending the traveling direction of the electrons e moving at a speed close to the speed of light in the curved portion of the endless duct 8 is curved in an endless manner. A synchrotron radiation beam line device is provided for guiding the exposure to the outside of the duct 8 and performing an exposure experiment in ULSI manufacturing by lithography.

This synchrotron radiation beamline device is a beamline main body 11 having a hollow structure, one end of which is connected to a curved portion of a required portion of the endless duct 8, and an experimental device provided at the other end of the beamline main body 11. 12, and an exposure target 13 on which an exposure experiment is to be performed is installed inside the experimental apparatus 12.

The beamline body 11 and the experimental apparatus 1
A beryllium window (not shown in FIG. 5) for maintaining the inside of the beamline main body 11 in a vacuum state is provided between the two.

When the radiation light beam s is emitted by the radiation light generating means shown in FIG. 5, the insides of the acceleration duct 3, the deflection duct 5, the endless duct 8 and the beam line body 11 are decompressed to an ultrahigh vacuum state. Then, the electron e is made to move at a speed close to the speed of light, and then the electron e is emitted from the electron generator 2.

The electrons e emitted from the electron generator 2 are
Accelerated by the high-frequency accelerator 4,
The beam enters the endless duct 8 by bending the orbit.

The electron e incident on the endless duct 8 has its orbit bent at each bending portion by the deflection electromagnet 9 and is accelerated by the high frequency accelerating device 10, whereby the electron e is tangential to the orbit of the electron e. A radiation light beam s is emitted to.

The radiant light beam s emitted at the curved portion of the endless duct 8 at a predetermined position is formed by the beam line body 11.
And enters the experimental apparatus 12.

On the other hand, the exposure object 13 to be subjected to the exposure experiment is a thin plate-shaped section (wafer / Wefer) of a semiconductor having a coating layer (resist / Resist) formed on the surface thereof, and a predetermined radiation beam s. And a light-shielding body (mask / Mask) having a shaped opening and arranged in parallel to the wafer with an interval of about 30 μm.

Therefore, when the synchrotron radiation beam s is incident on the experimental device 12 in a state where the exposure target 13 is installed inside the experimental device 12 so that the mask faces the upstream side in the traveling direction of the radiant light beam s, the exposure is performed. The radiant light beam s transmitted through the opening of the mask of the object 13 exposes the object 13 to be exposed.
The resist formed on the surface of the wafer is removed according to the shape of the holes in the mask.
The synchrotron radiation beam s incident on 2 is divergent light that spreads in the traveling direction with the orbit of the electron e circulating in the endless duct 8 as a light emitting point, so that the synchrotron radiation incident on the experimental apparatus 12 via the beamline main body 11 Beam s as it is exposure target 1
When the light is irradiated to No. 3, a runout error occurs in which the portion where the resist is removed is displaced from the opening of the mask.

In order to prevent this run-out error from occurring in the exposure object 13, the inside of the beamline main body 11 of the synchrotron radiation beamline apparatus is parabola as seen in the vertical direction as shown in FIGS. 3 and 4. A first mirror 15 having a concave reflecting surface 14 curved in a curved shape, and a second mirror 17 having a concave reflecting surface 16 curved in a horizontal direction,
A beryllium window 18 formed in a curved shape when viewed in the vertical direction is arranged.

The first mirror 15 is arranged so that the radiation light beam s obliquely enters the reflecting surface 14 when viewed in the vertical direction and emits the radiation light beam s as parallel light from the reflecting surface 14 when viewed in the vertical direction. , Is arranged inside the beamline body 11.

A pair of slit members 19, 19 is provided between the first mirror 15 and the emission point x of the emitted light beam s.
, The shape of the reflecting surface 14 of the first mirror 15, the direction of the reflecting surface 14 with respect to the emitted light beam s, and the reflecting surface 1 from the light emitting point x.
It is provided according to the distance up to 4.

In the second mirror 17, the radiation light beam s emitted from the first mirror 15 is obliquely incident on the reflection surface 16 when viewed in the horizontal direction, and the radiation light beam s emitted from the reflection surface 16 when viewed in the horizontal direction. It is arranged inside the beamline main body 11 so as to emit s as parallel light.

The second mirror 17 is the first mirror 1.
5 is supported so as to be able to swing about a rotating shaft 20 that is orthogonal to the radiant light beam s emitted as parallel light from the reflecting surface 14 of FIG.

The beryllium window 18 transmits the radiant light beam s emitted as parallel light from the second mirror 17, and when the radiant light beam s passes through the beryllium window 18 when viewed in the vertical direction, the apparent stroke is The radiating light beam s becomes longer as it approaches the left side edge from the right side edge,
It is airtightly attached to the beamline body 11.

In the synchrotron radiation beam line device having the above-described structure, the radiant light beam s incident on the first mirror 15 is a divergent light that spreads in the traveling direction from the light emitting point x, and therefore is reflected by the first mirror 15. When the synchrotron radiation beam s incident on the surface 14 is viewed in the vertical direction, the angle .theta.1 of the left edge of the synchrotron radiation beam s with respect to the center line of the synchrotron radiation beam s
And the angle .theta.2 of the right edge of the emitted light beam s with respect to the center line of the emitted light beam s are equal to each other, and therefore the emitted light beam s is emitted between the emission point x of the emitted light beam s and the first mirror 15. Distance D1 from the center line of the synchrotron radiation beam s to the left edge in the traveling direction on an arbitrary plane orthogonal to the center line of s
And the distance D2 from the center line of the emitted light beam s to the right side edge in the traveling direction becomes equal.

On the other hand, the emitted light beam s is obliquely incident on the reflecting surface 14 of the first mirror 15 when viewed in the vertical direction,
The center line of the radiation beam s emitted from the light emitting point x is the first
The position of the mirror 15 crossing the reflecting surface 14 is apparently close to the left side edge portion in the traveling direction of the emitted light beam s.

Therefore, when viewed in the vertical direction, the first mirror 15
The light beam density (light intensity) of the emitted light beam s emitted as parallel light from the reflecting surface 14 tends to increase as it approaches the left edge portion from the right edge portion in the traveling direction.

The emitted light beam s emitted from the reflecting surface 14 of the first mirror 15 is incident on the reflecting surface 16 of the second mirror 17, and is seen as horizontal light from the second mirror 17 when viewed in the horizontal direction. Is emitted.

Further, the radiation light beam s emitted from the second mirror 17 passes through the beryllium window 18 and is incident on the exposure object 13 installed inside the experimental apparatus 12.

In the beryllium window 18, the apparent stroke of the radiant light beam s as it passes through the beryllium window 18 when viewed in the vertical direction becomes longer as the radiant light beam s approaches the right side edge to the left side edge in the traveling direction. Since the radiation beam s emitted from the second mirror 17 passes through the beryllium window 18, the attenuation rate tends to increase from the right side edge toward the left side edge in the traveling direction. Present.

Therefore, when reflected by the above-mentioned first mirror 15, the radiant light beam s having a higher light density (light intensity) from the right edge toward the left edge in the traveling direction is beryllium. As parallel light whose light beam density is substantially uniform when viewed in the vertical direction by passing through the window 18,
The object 13 to be exposed is irradiated.

On the other hand, when the radiation light beam s emitted as parallel light from the second mirror 17 is viewed in the horizontal direction, the distance between the upper edge portion and the lower edge portion of the radiation light beam s is determined by the first mirror. It is smaller than the distance between the left edge part and the right edge part of the radiation light beam s when the radiation light beam s emitted from 15 is viewed in the vertical direction.

Therefore, the second mirror 17 is periodically oscillated around the rotary shaft 20 to reciprocate the incident position of the emitted light beam s on the exposure object 13 in the vertical direction.
The radiant light beam s is uniformly irradiated over the entire exposed surface of the exposure target 13.

The movement of the incident position of the radiation light beam s with respect to the exposure target 13 causes the radiation light beam s to move.
The uneven exposure of the exposure target 13 due to the non-uniformity of the light density (high intensity) distribution between the upper edge portion and the lower edge portion of is also eliminated.

[0034]

However, in the synchrotron radiation beam line device in which the synchrotron radiation beam s emitted from the light emitting point x is collimated by the first mirror 15 as described above, for example, about 50 mm. Exposure area (exposure target 1
When obtaining the distance between the left side edge and the right side edge of the radiant light beam s with which the radiant light beam s is irradiated on the third radiant surface 3, the acceptance (spread) of the radiant light beam s incident on the reflecting surface 14 of the first mirror 15 is Even if the size of the mirror 15 of No. 1 is increased and the distance between the slit members 19, 19 is increased, 20 mmra
The maximum is about d (spread such that the beam diameter increases by 20 mm when the radiated light beam s travels 1 m), and the energy of the radiated light beam s emitted from the light emitting point x cannot be effectively used.

The present invention has been made in view of the above-mentioned circumstances, and an object thereof is to provide a synchrotron radiation beam line device capable of enlarging the acceptance of the synchrotron radiation beam to be collimated.

[0036]

In order to achieve the above object, in a synchrotron radiation beamline apparatus according to claim 1 of the present invention, a base end portion is connected to a radiant light generating means and a vacuum is provided inside the tip end portion. A beamline body 11 having a beryllium window 27 for holding the first mirror 22, a first mirror 22 having a concave reflecting surface 21 curved when viewed in the vertical direction, and a concave concave surface when viewed in the vertical direction. A second mirror 24 having a reflecting surface 23 and a third mirror 26 having a concave reflecting surface 25 which is curved when viewed in the horizontal direction are provided, and the first mirror 22 is provided inside the beamline body 11. Arranged so that the radiant light beam s incident on the beamline body 11 is condensed by the reflection surface 21 of the first mirror 22 when viewed in the vertical direction, and the second mirror 24 is arranged inside the beamline body 11. First mirror 22 The radiant light beam s emitted from the first mirror 22 is opposed to the first mirror 22 with the focal point y of the radiant light beam s interposed therebetween, and is vertically reflected by the reflecting surface 23 of the second mirror 24. The third mirror 26 is arranged so as to be emitted as parallel light when viewed, and extends horizontally inside the beamline body 11 in a direction orthogonal to the radiation light beam s emitted from the second mirror 24. The radiant light beam s which is oscillated around the rotation axis 29 and is emitted from the second mirror 24 is converted into light or parallel light which is condensed by the reflecting surface 25 of the third mirror 26 when viewed in the horizontal direction. It is arranged so as to be emitted to the beryllium window 27.

Further, in the synchrotron radiation beamline apparatus according to claim 2 of the present invention, in addition to the configuration of the synchrotron radiation beamline apparatus according to claim 1 of the present invention described above, a beryllium window 27 is provided as a third element. The mirror 26 and the mirror 26 are configured so that they can be swung about a rotation shaft 29.

In both the synchrotron radiation beam line device according to the first and second aspects of the present invention, the synchrotron radiation beam incident on the beam line main body 11 is directed to the first mirror 2
By focusing light so that the focal point y is formed by 2
The acceptance of the radiated light beam s received by the mirror 22 is expanded.

In the synchrotron radiation beam line apparatus according to the second aspect of the present invention, the beryllium window 27 is swung together with the third mirror 26, so that the size of the beryllium window 27 is viewed in the horizontal direction. It is reduced to the minimum according to the beam shape of the radiated light beam s, and the pressure resistance of the beryllium window 27 is improved.

[0040]

Embodiments of the present invention will be described below with reference to the drawings.

FIGS. 1 and 2 show an example of an embodiment of a synchrotron radiation beam line device according to the present invention. In the drawings, parts designated by the same reference numerals as those in FIGS. 3 and 4 are the same. It represents.

This synchrotron radiation beam line device comprises a first mirror 22 having a concave reflecting surface 21 which is curved when viewed in the vertical direction, and a concave reflecting surface 23 which is curved parabolic when viewed in the vertical direction. The second mirror 24 having the third mirror 2 and the third mirror 2 having the concave reflecting surface 25 curved when viewed in the horizontal direction
6 and a beryllium window 27 formed in a curved shape when viewed in the vertical direction.

The first mirror 22 allows the radiant light beam s to obliquely enter the reflecting surface 21 when viewed in the vertical direction, and collects and emits the radiant light beam s from the reflecting surface 21 when viewed in the vertical direction. In addition, it is arranged inside the beamline body 11.

A pair of slit members 28, 28 is provided between the first mirror 22 and the emission point x of the emitted light beam s.
, The shape of the reflecting surface 21 of the first mirror 22, the direction of the reflecting surface 21 with respect to the emitted light beam s, the reflecting surface 2 from the light emitting point x.
It is provided according to the distance to 1.

In the second mirror 24, the radiation light beam s emitted from the first mirror 22 is obliquely incident on the reflection surface 23 when viewed in the vertical direction, and the radiation light beam s emitted from the reflection surface 23 when viewed in the vertical direction. The first mirror 22 is sandwiched inside the beamline main body 11 so that s is emitted as parallel light, with the focal point y of the radiation light beam s emitted from the first mirror 22 being sandwiched.
Are located opposite to.

In the third mirror 26, the radiation light beam s emitted from the second mirror 24 is obliquely incident on the reflection surface 25 when viewed in the horizontal direction, and the radiation light beam s emitted from the reflection surface 25 when viewed in the horizontal direction. It is arranged inside the beamline main body 11 so that s is emitted as parallel light.

The third mirror 26 is the second mirror 2
It is supported so as to be able to swing around a rotating shaft 29 that is orthogonal to the radiant light beam s emitted as parallel light from the four reflecting surfaces 23 and extends horizontally.

The third mirror 2 shown in FIGS. 1 and 2 is used.
The reflecting surface 25 of No. 6 is shaped so as to emit the emitted light beam s as parallel light when viewed in the horizontal direction, but the reflecting surface 25 of the third mirror 26 is seen when seen in the horizontal direction. The shape may be such that s is condensed and emitted.

The beryllium window 27 transmits the radiant light beam s emitted as parallel light from the third mirror 26, and when the radiant light beam s passes through the beryllium window 18 in the vertical direction, the apparent stroke is The radiating light beam s becomes longer as it approaches the left side edge from the right side edge,
It is airtightly attached to the beamline body 11.

Further, the beamline main body 11 includes the first mirror 22, the second mirror 24 and the slit members 28, 2.
8 and the upstream hollow body 11a, and the third mirror 26
And a downstream hollow body 11b in which the beryllium window 27 is attached and an upstream hollow body 11a.
1b and a connecting portion hollow body 11c, such as a bellows, which has flexibility and is airtightly connected to the 1b.
It swings around 9.

In the synchrotron radiation beam line device having the above-mentioned configuration, the radiant light beam s emitted from the light emitting point x is
The light enters the reflecting surface 21 of the first mirror 22 and is condensed from the first mirror 22 so as to form a focal point y between the first mirror 22 and the second mirror 24 when viewed in the vertical direction. Is emitted.

The radiation light beam s emitted from the first mirror 22 enters the reflecting surface 23 of the second mirror 24 and is emitted as parallel light from the second mirror 24 when viewed in the vertical direction.

The radiation light beam s emitted from the second mirror 24 enters the reflecting surface 25 of the third mirror 26, and is emitted as parallel light from the third mirror 26 when viewed in the horizontal direction.

Further, the radiant light beam s emitted from the third mirror 26 passes through the beryllium window 27 and is incident on the exposure object 13 installed inside the experimental apparatus 12.

In the beryllium window 27, the apparent travel of the radiant light beam s as it passes through the beryllium window 27 when seen in the vertical direction becomes longer as the radiant light beam s approaches the right side edge to the left side edge in the traveling direction. Since the radiant light beam s is transmitted through the beryllium window 27, the radiated light beam s is applied to the exposure target 13 as parallel light having a substantially uniform light beam density when viewed in the vertical direction. become.

On the other hand, when the radiation light beam s emitted as parallel light from the third mirror 26 is viewed in the horizontal direction, the distance between the upper edge portion and the lower edge portion of the radiation light beam s is determined by the second mirror. It is smaller than the distance between the left edge part and the right edge part of the radiant light beam s when the radiant light beam s emitted from 24 is viewed in the vertical direction.

Therefore, the third mirror 26 is periodically swung about the rotary shaft 29 to reciprocate the incident position of the radiation light beam s on the exposure object 13 in the vertical direction.
The radiant light beam s is uniformly irradiated over the entire exposed surface of the exposure object 13.

The movement of the incident position of the radiation light beam s on the exposure object 13 causes the radiation light beam s to move.
The uneven exposure of the exposure target 13 due to the non-uniformity of the light density (high intensity) distribution between the upper edge portion and the lower edge portion of is also eliminated.

In the synchrotron radiation beam line device shown in FIGS. 1 and 2, the synchrotron radiation beam s emitted from the light emitting point x is first radiated.
The mirror 22 condenses the light so that the focal point y is formed and is incident on the reflecting surface 23 of the second mirror 24, and the emitted light beam s is emitted from the second mirror 24 as parallel light when viewed in the vertical direction. By appropriately increasing the size of the first mirror 22, it is possible to increase the acceptance of the radiation beam s received by the first mirror 22.

That is, since the acceptance of the radiation light beam s incident on the first mirror 22 is expanded, the energy of the radiation light beam s emitted from the light emitting point x can be effectively used, and as a result, It is possible to improve the intensity of the radiated light beam s which is irradiated onto the exposure target 13 through the first mirror 22, the second mirror 24, the third mirror 26, and the like.

Further, in the synchrotron radiation beam line apparatus shown in FIGS. 1 and 2, the beryllium window 27 swings together with the third mirror 26, so that the synchrotron radiation beam s when the size of the beryllium window 27 is viewed in the horizontal direction is shown. The beam size can be reduced to the minimum according to the beam shape, and thus the pressure resistance of the beryllium window 27 can be improved.

The synchrotron radiation beam line device of the present invention is not limited to the above-described embodiments, and it goes without saying that various modifications can be made without departing from the gist of the present invention.

[0063]

As described above, the synchrotron radiation beam line device of the present invention can exhibit various excellent effects as described below.

(1) In both the synchrotron radiation beam line device according to the first and second aspects of the present invention, the radiant light beam incident on the beam line main body 11 is focused by the first mirror 22 on the focal point y. By converging in a linked manner, the acceptance of the radiant light beam s received by the first mirror 22 is increased, so that the energy of the radiant light beam s incident on the beamline main body 11 can be effectively used. As a result, it is possible to improve the intensity of the radiant light beam s that is irradiated onto the exposure target 13 via the first mirror 22, the second mirror 24, the third mirror 26, and the like.

(2) In the synchrotron radiation beam line apparatus according to the second aspect of the present invention, the beryllium window 27 is swung together with the third mirror 26, so the size of the beryllium window 27 is viewed in the horizontal direction. The beryllium window 27 is reduced by reducing it to the minimum according to the beam shape of the synchrotron radiation beam s.
It is possible to improve the pressure resistance of the.

[Brief description of drawings]

FIG. 1 is a conceptual diagram showing an example of an embodiment of a synchrotron radiation beamline device of the present invention as viewed in a vertical direction.

FIG. 2 is a view taken in the direction of arrows II-II in FIG.

FIG. 3 is a conceptual diagram showing an example of a conventional synchrotron radiation beamline device as viewed in a vertical direction.

4 is a view taken in the direction of arrows IV-IV in FIG. 3;

FIG. 5 is a conceptual diagram showing an example of radiation light generation means.

[Explanation of symbols]

 11 Beamline Main Body 21 Reflective Surface 22 First Mirror 23 Reflective Surface 24 Second Mirror 25 Reflective Surface 26 Third Mirror 27 Beryllium Window 29 Rotation Axis s Radiant Beam y Focus

Continuation of the front page (51) Int.Cl. ⁶ Identification code Office reference number FI Technical display location H05H 13/04 H01L 21/30 531S

Claims (2)

[Claims] 1. A beryllium window (2) having a base end portion connected to a radiant light generating means and a front end portion for holding an internal vacuum.
1) having a beamline body (11) on which 7) is mounted and a concave reflecting surface (21) curved when viewed in the vertical direction
Mirror (22), a second mirror (24) having a concave reflecting surface (23) curved when viewed in the vertical direction, and a concave reflecting surface (25) curved when viewed in the horizontal direction. A third mirror (26), wherein the first mirror (22) is inside the beamline body (11) and the synchrotron radiation beam (s) incident on the beamline body (11) is the first mirror ( The second mirror (24) is placed inside the beamline body (11) from the first mirror (22) so that the second mirror (24) is arranged so as to be condensed by the reflecting surface (21) of the second mirror (22). The radiated light beam (s) being focused on the first (y)
Of the emitted light beam (s) emitted from the first mirror (22) facing the second mirror (22) of the second mirror (2).
The second mirror (2) is arranged inside the beamline body (11) so that the third mirror (26) is arranged so as to be emitted as parallel light when viewed in the vertical direction by the reflecting surface (23) of 4).
4) radiation emitted from the second mirror (24) that can be swung about a rotation axis (29) extending horizontally in a direction orthogonal to the radiation beam (s) emitted from the second mirror (24). The beam (s) is arranged so as to be emitted to the beryllium window (27) as light or parallel light that is condensed when viewed in the horizontal direction by the reflecting surface (25) of the third mirror (26). Synchrotron radiation beam line device. 2. The synchrotron radiation beamline device according to claim 1, wherein the beryllium window (27) is configured to be swingable about a rotation axis (29) together with the third mirror (26).