JP3287871B2 - Printed circuit board manufacturing method - Google Patents

Printed circuit board manufacturing method

Info

Publication number
JP3287871B2
JP3287871B2 JP8007192A JP8007192A JP3287871B2 JP 3287871 B2 JP3287871 B2 JP 3287871B2 JP 8007192 A JP8007192 A JP 8007192A JP 8007192 A JP8007192 A JP 8007192A JP 3287871 B2 JP3287871 B2 JP 3287871B2
Authority
JP
Japan
Prior art keywords
circuit board
printed circuit
path
copper plating
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP8007192A
Other languages
Japanese (ja)
Other versions
JPH05281426A (en
Inventor
一雅 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP8007192A priority Critical patent/JP3287871B2/en
Publication of JPH05281426A publication Critical patent/JPH05281426A/en
Application granted granted Critical
Publication of JP3287871B2 publication Critical patent/JP3287871B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details

Landscapes

  • Optical Integrated Circuits (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

PURPOSE:To constitute the printed circuit board in such a manner that a part of its electric conductor circuit plays the role of a photoconductor path and to minimize the use of photoconductor path elements by forming a part of the electric conductor circuit as a light reflection surface of the photoconductor path. CONSTITUTION:Copper plating layers 3a, 3b constituting the electric conductor circuit and the photoconductor path 4 consisting of the photoconductor path element of a light transmissive member are integrally embedded in a substrate 2 consisting of an epoxy resin, etc. The photoconductor path element constituting the photoconductor path 4 is formed of a transparent resin material or transparent rubber material having good light transmittance. The light reflection surfaces 5a, 5b are formed in the corner parts which are a part of the copper plating layers 3a, 3b in such a manner that a light signal reflects and transmits the inside of such photoconductor path 4. Namely, the light signal entering from the end face of the photoconductor path 4a from the arrow (a) side is reflected perpendicularly an the light reflection surface 5a of the copper plating layer 3a, is introduced horizontally to the photoconductor path 4b, is reflected perpendicularly an the light reflection surface 5b of the copper plating layer 3b, is passed through the photoconductor path 4c and is emitted from the end face like an arrow (b).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、電気導体回路と共に光
導体路を一体化して基板中に埋設したプリント基板及び
その製造方法に関するものである。
BACKGROUND OF THE INVENTION The present invention is a printed circuit board and is embedded in the substrate by integrating the optical conductor with an electrical conductor circuit
The present invention relates to the manufacturing method .

【0002】[0002]

【従来の技術】近年、音響製品や電源等の機器におい
て、電気信号を得るための電気導体回路と、光信号を得
るための光透過性部材からなる光導体路素子とを1枚の
プリント基板に一体化して埋設する技術が増えてきてお
り、この傾向は今後、さらに増大すると考えられる。
2. Description of the Related Art In recent years, in a device such as an acoustic product or a power supply, an electric conductor circuit for obtaining an electric signal and an optical waveguide element formed of a light transmitting member for obtaining an optical signal are formed on a single printed circuit board. The technology of burying and integrating into a building is increasing, and this trend is expected to increase further in the future.

【0003】[0003]

【発明が解決しようとする課題】このように構成してい
る上述したプリント基板は、光導体路素子を用いてプリ
ント基板に光導体路を構成するが、プリント基板へ光導
体路素子を形成する技術は現在のところまだ開発されて
いない。また、光導体路内を通る光信号は直線性を有す
るので、光導体路素子に角度が生じると光信号の通過が
不可能となるので、光導体路素子の形成方法に工夫が必
要となる。しかも、光導体路素子に光反射構造を形成す
ることは、さらに技術的に特殊な工夫が必要となる。
In the above-described printed circuit board configured as described above, an optical path is formed on the printed circuit board by using the optical path element, and the optical path element is formed on the printed circuit board. The technology has not yet been developed. Also, since the optical signal passing through the light guide path has linearity, it is impossible to pass the light signal when the light guide path element has an angle, so that a method of forming the light guide path element needs to be devised. . In addition, forming a light reflecting structure in the optical waveguide device requires a special technical device.

【0004】また、一般に光導体路素子は高価であるた
め、プリント基板の製造コストが高くなるといった問題
があり、従って光導体路の使用は最小限にする必要があ
る。
[0004] Further, since the optical waveguide element is generally expensive, there is a problem that the manufacturing cost of the printed circuit board is high, and therefore, it is necessary to minimize the use of the optical waveguide.

【0005】本発明は、上述したような問題点を解消す
るためになされたもので、電気導体回路と共に光導体路
を一体的に埋設したプリント基板を提供し、しかも光導
体路に光反射構造を有するプリント基板を得ることを目
的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and provides a printed circuit board in which an optical conductor path is integrally buried together with an electric conductor circuit. It is an object to obtain a printed circuit board having:

【0006】[0006]

【課題を解決するための手段】上述した目的を達成する
ため、本発明によるプリント基板の製造方法は、基板に
電気導体回路と、光透過性部材からなる光導体路とが一
体化され上記基板中に埋設されたプリント基板の製造方
法において、基体上にフォトレジスト層を形成し、フォ
トリソグラフィーにより複数の開口を形成する工程と、
開口の間に残されたフォトレジスト層の角部をカットし
傾斜面を形成して開口に導電体層を形成した後、フォト
レジスト層を除去することにより光反射面を有する電気
導体回路を形成する工程と、電気導体回路の間に透明材
料を充填して光導体路を形成する工程と、電気導体回路
と光導体路を含む面に樹脂層を形成して一体固化し基
体を除去する転写工程とからなる。
In order to achieve the above-mentioned object, a method of manufacturing a printed circuit board according to the present invention is characterized in that an electric conductor circuit and a light guide path made of a light transmitting member are integrated with the substrate. In a method of manufacturing a printed circuit board embedded therein, a step of forming a photoresist layer on a substrate and forming a plurality of openings by photolithography,
After cutting the corners of the photoresist layer left between the openings to form an inclined surface and forming a conductor layer in the openings, the photoresist layer is removed to form an electric conductor circuit having a light reflecting surface. removing the step, a step of forming a light guide path is filled with a transparent material between the electric conductor circuit, an integrated solidified substrate to form a resin layer on the entire surface including the electrical conductor circuits and optical interconnects for And a transfer step.

【0007】[0007]

【作用】上述した本発明のプリント基板の製造方法は、
導体路の光反射面を電気導体回路と同時に製作するこ
とができる。
Printed circuit board manufacturing method of the present invention [act was above mentioned, the
The light reflecting surface of the light guide path can be manufactured simultaneously with the electric conductor circuit.

【0008】[0008]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1に、本実施例によるプリント基板の平面図を
示し、図2に図1のA−A線における断面図を示す。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view of a printed circuit board according to the present embodiment, and FIG. 2 is a sectional view taken along line AA of FIG.

【0009】図1及び図2において、全体を符号1で示
したプリント基板は、エポキシ次子等よりなる基板2に
電気導体回路となる銅メッキ層3a,3bと、光透過性
部材の光導体路素子よりなる光導体路4とが同一平面上
で隣接して一体的に埋設され構成されている。
In FIGS. 1 and 2, a printed circuit board generally designated by a reference numeral 1 is composed of a board 2 made of epoxy epoxy or the like, copper plating layers 3a and 3b serving as electric conductor circuits, and an optical conductor of a light transmitting member. Optical waveguide 4 composed of optical path elements is on the same plane
And are buried adjacently and integrally.

【0010】詳しくは、銅メッキ層3a,3bは基板2
に所定の間隔を隔てて蛇行状に埋設されており、これら
両銅メッキ層3a,3bの間に光導体路4が挟まれるよ
うに蛇行状に埋設されている。そして光導体路4を構成
する光導体路素子は、光透過率のよい透明樹脂材や透明
ゴム材からできている。
More specifically, the copper plating layers 3a and 3b are
Are embedded in a meandering manner at predetermined intervals, and are embedded in a meandering manner such that the optical waveguide 4 is sandwiched between the copper plating layers 3a and 3b. The light guide path element constituting the light guide path 4 is made of a transparent resin material or a transparent rubber material having good light transmittance.

【0011】透明樹脂材としては、例えば、アクリル樹
脂、ポリカーボネート樹脂あるいはエポキシ樹脂等の光
学用途材料からなり、また、透明ゴム材としては、光フ
ァイバー等に利用される光学用途の2液硬化タイプのシ
リコンゴムが望ましい。シリコンゴムは、化学的に安定
で耐熱性もあり、特に2液硬化タイプは透明性もよく扱
いも容易である。
The transparent resin material is, for example, an optical material such as an acrylic resin, a polycarbonate resin or an epoxy resin, and the transparent rubber material is a two-component curing type silicon for optical applications used for optical fibers and the like. Rubber is preferred. Silicon rubber is chemically stable and heat-resistant, and a two-component curing type is particularly transparent and easy to handle.

【0012】上述のように蛇行状に埋設された光導体路
4は、この光導体路4中を光信号が反射して透光するよ
うにするために銅メッキ層3a,3bの一部であるコー
ナー部分に光反射面5a,5bが形成されている。すな
わち、矢印a側から光導体路4aの端面から入光した光
信号は、銅メッキ層3aの光反射面5aに直角に反射し
て光導体路4bに水平に導かれ、ここから銅メッキ層3
bの光反射面5bに直角に反射して光導体路4cを通
り、この光導体路4cの端面より光導体路4外へ出光す
る。
As described above, the optical waveguide 4 buried in a meandering shape is a part of the copper plating layers 3a and 3b in order to reflect an optical signal in the optical waveguide 4 and transmit the light. Light reflecting surfaces 5a and 5b are formed at certain corners. That is, an optical signal incident from the end of the light guide path 4a from the arrow a side is reflected at right angles to the light reflecting surface 5a of the copper plating layer 3a and is guided horizontally to the light guide path 4b, from which the copper plating layer 3
b, the light is reflected at right angles to the light reflecting surface 5b, passes through the light guide path 4c, and exits the light guide path 4 from the end face of the light guide path 4c.

【0013】ここで、光反射面5a,5bについて説明
すると、光反射面5a,5bを構成する銅メッキ層3
a,3bは、銅から構成されており、このため光反射面
5a,5bでの光の反射率が不足する場合は、使用する
波長に反射率の高い金属、例えば、スズ、ニッケル、
銀、金あるいはこれらの合金をメッキし、鏡面加工する
ことによって解決できる。また光反射面5a,5bにア
ルミニウム等を蒸着したり、スパッタリングすることで
あってもよく、さらに、金等の展延性のよい金属を圧着
する方法、または、加熱してはんだ等の低融点合金を付
ける等の方法をとってもよい。
Here, the light reflecting surfaces 5a and 5b will be described. The copper plating layer 3 forming the light reflecting surfaces 5a and 5b
Since a and 3b are made of copper, if the light reflectance on the light reflecting surfaces 5a and 5b is insufficient, a metal having a high reflectance at a wavelength to be used, for example, tin, nickel, or the like is used.
The problem can be solved by plating silver, gold or an alloy thereof, and mirror-finish the plating. Alternatively, aluminum or the like may be vapor-deposited or sputtered on the light reflecting surfaces 5a and 5b, and a method of pressing a metal having good spreadability such as gold, or a method of heating and applying a low melting point alloy such as solder For example, a method such as attaching

【0014】図3にプリント基板1の光導体路4への光
信号の入口及び出口の実施例を示す。この場合も図1と
同様に光信号の反射を銅メッキ層の一部を利用して可能
にしている。すなわち、プリント基板1上に実装したフ
ォトダイオード6からプリント基板1面に垂直に投光さ
れた光信号は、プリント基板1中に埋設された銅メッキ
層3cに形成した光反射面5cに直角に反射され光導体
路4に導かれ、そしてこの光信号はプリント基板1中に
埋設された別の銅メッキ層3dの反射面5dを直角に上
方へ反射してプリント基板1上に実装したフォトセンサ
ー7によって検出することができる。勿論、上述した光
反射面5c,5dも光の反射率が不足する場合は、使用
する波長に反射率の高い上述と同様の金属を用いればよ
い。
FIG. 3 shows an embodiment of the entrance and exit of the optical signal to the light guide path 4 of the printed circuit board 1. Also in this case, as in FIG. 1, the reflection of the optical signal is enabled by using a part of the copper plating layer. That is, the optical signal emitted perpendicularly to the surface of the printed circuit board 1 from the photodiode 6 mounted on the printed circuit board 1 is perpendicular to the light reflecting surface 5c formed on the copper plating layer 3c embedded in the printed circuit board 1. The photosensor is mounted on the printed circuit board 1 by being reflected and guided to the light guide path 4 and reflecting the optical signal upward at right angles to the reflecting surface 5d of another copper plating layer 3d embedded in the printed circuit board 1. 7 can be detected. Of course, if the light reflecting surfaces 5c and 5d also have insufficient light reflectance, the same metal having the high reflectance at the wavelength to be used may be used.

【0015】次に、電気導体回路の一部が光導体路の反
射面として利用できるようにしたプリント基板の製造工
程を図3の実施例を例にとって図4及び図5について説
明する。
Next, a manufacturing process of a printed circuit board in which a part of an electric conductor circuit can be used as a reflection surface of a light guide path will be described with reference to FIGS. 4 and 5 by taking the embodiment of FIG. 3 as an example.

【0016】先ず、図4Aに示すように、所定の厚みを
有するステンレス等の導体板8の表面に薄膜銅9を接着
する。
First, as shown in FIG. 4A, a thin-film copper 9 is bonded to the surface of a conductor plate 8 such as stainless steel having a predetermined thickness.

【0017】次に、図4Bに示すように、薄膜銅9上に
厚さ30〜40μm程度のフォトレジスト層10を形成
し、このフォトレジスト層10に対し露光・現像を行っ
てフォトレジスト層10の除去された電気導体回路とな
る銅メッキ層の2つの開口10a,10aを形成する。
Next, as shown in FIG. 4B, a photoresist layer 10 having a thickness of about 30 to 40 μm is formed on the thin-film copper 9, and the photoresist layer 10 is exposed and developed to form a photoresist layer 10. The two openings 10a and 10a of the copper plating layer which becomes the electric conductor circuit from which the above-mentioned is removed are formed.

【0018】次に、図4Cに示すように、開口10a,
10aの間に残されたフォトレジスト層10の角部を例
えば、機械的あるいはレーザによって45°の角度に精
度よくカットし、傾斜面10b,10bを形成する。
Next, as shown in FIG. 4C, the openings 10a,
The corners of the photoresist layer 10 left between 10a are precisely cut at an angle of 45 °, for example, mechanically or by a laser to form inclined surfaces 10b, 10b.

【0019】次に、図4Dに示すように、フォトレジス
ト層10の開口10a,10aを通して露出する薄膜銅
9を電極として銅メッキ処理を施し、フォトレジスト層
10の開口10a,10a内に銅メッキ層3c,3dを
形成する。このとき、フォトレジスト層10の傾斜面1
0b,10bによって銅メッキ層3c,3dに光導体路
の反射面5c,5dが形成される。
Next, as shown in FIG. 4D, copper plating is performed using the thin film copper 9 exposed through the openings 10a, 10a of the photoresist layer 10 as an electrode, and copper plating is performed in the openings 10a, 10a of the photoresist layer 10. The layers 3c and 3d are formed. At this time, the inclined surface 1 of the photoresist layer 10
The reflecting surfaces 5c and 5d of the optical waveguide are formed on the copper plating layers 3c and 3d by the layers 0b and 10b.

【0020】次に、図5Aに示すように、フォトレジス
ト層10を所定の溶液によって除去し、薄膜銅9上に銅
メッキ層3c,3dを残す。
Next, as shown in FIG. 5A, the photoresist layer 10 is removed with a predetermined solution, and the copper plating layers 3c and 3d are left on the thin-film copper 9.

【0021】次に、図5Bに示すように、図5Aで形成
された銅メッキ層5c,5dの間の空間部11内に透明
樹脂または透明ゴムを充填し、この透明樹脂または透明
ゴムを固化することによって光導体路4が形成される。
Next, as shown in FIG. 5B, the space 11 between the copper plating layers 5c and 5d formed in FIG. 5A is filled with a transparent resin or a transparent rubber, and the transparent resin or the transparent rubber is solidified. Thus, the light guide path 4 is formed.

【0022】次に、図5Cに示すように、メッキ転写法
により、プリプレグのエポキシ樹脂とホットプレス(1
80℃、75分)による加熱硬化により、銅メッキ層3
c,3d及び光導体路4を含む全面にプリント基板の素
材となる樹脂層12を形成・被覆し、その後、樹脂層1
2を固化して銅メッキ層3c,3d及び光導体路4と一
体化させる。
Next, as shown in FIG. 5C, the prepreg epoxy resin and hot press (1
(80 ° C., 75 minutes), the copper plating layer 3
A resin layer 12 serving as a material of a printed circuit board is formed and coated on the entire surface including the light guide path 4c, 3d, and the light guide path 4;
2 is solidified and integrated with the copper plating layers 3 c and 3 d and the optical waveguide 4.

【0023】最後に、図5Dに示すように、樹脂層12
から導体板8を剥離したのち、薄膜銅9をエッチング除
去することにより、樹脂層12に銅メッキ層3c,3d
と、光導体路4とが一体的に埋設され、樹脂層12が加
熱処理により固化されるとプリント基板が完成する。そ
の後、プリント基板1上にフォトダイオード6及びフォ
トセンサー7を実装することによって図3に示したプリ
ント基板1が製作できる。
Finally, as shown in FIG. 5D, the resin layer 12
After the conductor plate 8 is peeled off from the resin layer 12, the thin film copper 9 is removed by etching, so that the copper plating layers 3c and 3d
When the resin layer 12 is solidified by a heat treatment, the printed circuit board is completed. Thereafter, by mounting the photodiode 6 and the photosensor 7 on the printed board 1, the printed board 1 shown in FIG. 3 can be manufactured.

【0024】尚、 上述したプリント基板の製造におい
て、プリント基板1の上面から光を直角方向に反射させ
るための反射面5c,5dは、通常のパターンマスクの
露光では作成できないので、この場合はこの反射面部分
のフォトレジスト層を未露光で残し、紫外線レーザー照
射等で角度を付けて部分露光するか、現像後にフォトレ
ジストを機械的に正確にカットまたは研磨して反射面を
作成し、この反射面に銅メッキを行うようにしてもよ
い。または、下地の銅メッキに影響を与えない程度にエ
キシマレーザーを使って化学的に除去してもよい。
In the manufacture of the printed circuit board described above, the reflecting surfaces 5c and 5d for reflecting the light from the upper surface of the printed circuit board 1 in the right angle direction cannot be formed by ordinary pattern mask exposure. Leave the photoresist layer on the reflective surface unexposed and partially expose it at an angle with ultraviolet laser irradiation, etc., or mechanically cut or polish the photoresist after development to create a reflective surface, The surface may be plated with copper. Alternatively, it may be chemically removed using an excimer laser so as not to affect the copper plating of the base.

【0025】また、図1に示したプリント基板1の反射
面5a,5bの場合、プリント基板を上から見た時にフ
ォトレジスト層に角度を構成することは配線設計でCA
D段階で可能である。しかし注意すべきことは、薄膜銅
9上へ形成するフォトレジスト層10を収縮の少ない材
料を選定する必要がある。これはフォトレジスト層10
に適当な角度が構成されていてもフォトレジストの収縮
のために凹凸ができ光の反射が不十分となる。この場合
は、フォトレジストに銅メッキをしてフォトレジストを
除去したのち、この銅表面を部分的に研磨するか、また
は、金等の展延性のよい金属やはんだ等の低融点合金で
修正してもよい。
In the case of the reflection surfaces 5a and 5b of the printed circuit board 1 shown in FIG. 1, forming the angle in the photoresist layer when the printed circuit board is viewed from above is a matter of CA in wiring design.
This is possible at the D stage. However, it should be noted that it is necessary to select a material that causes less shrinkage of the photoresist layer 10 formed on the thin-film copper 9. This is the photoresist layer 10
Even if an appropriate angle is formed, unevenness is generated due to shrinkage of the photoresist, and light reflection becomes insufficient. In this case, after the photoresist is plated with copper to remove the photoresist, the copper surface is partially polished or modified with a spreadable metal such as gold or a low-melting alloy such as solder. You may.

【0026】また、上述したプリント基板の製造におい
て、光導体路4を構成する透明樹脂または透明ゴムと、
基板を構成する樹脂層12とが熱的に接触することをで
きるだけ避けなければならない。例えば、基板材料とし
てテフロン系の材料は影響が少ないが、代表的なエポキ
シ樹脂はアミン成分を架橋剤として含み、透明樹脂また
は透明ゴムを熱時の接触によって白濁させる可能性があ
る。従って、透明樹脂、透明ゴムの表面にバリヤーの働
きをする被膜を形成することが望ましい。被膜材として
は、テフロンやフッ化ビニリデン等のフッ素樹脂の被膜
またはコーティング材、あるいは無機物による保護がよ
い。
In the manufacture of the printed circuit board described above, a transparent resin or a transparent rubber constituting the light guide path 4 is used.
Thermal contact with the resin layer 12 constituting the substrate must be avoided as much as possible. For example, a Teflon-based material has little effect as a substrate material, but a typical epoxy resin contains an amine component as a cross-linking agent, and may cause a transparent resin or a transparent rubber to become clouded by hot contact. Therefore, it is desirable to form a film acting as a barrier on the surface of the transparent resin or the transparent rubber. As the coating material, a coating or coating material of a fluororesin such as Teflon or vinylidene fluoride, or protection with an inorganic substance is preferable.

【0027】上述のように構成した本発明によるプリン
ト基板は、基板中に一体的に埋設した銅メッキ層の一部
が光導体路の光反射面となるようにしたので、銅メッキ
層が光導体路の役割を果たすことができ、これによっ
て、高価な光導体路素子を最小限の使用で可能にするこ
とができ、また、従来から技術的に困難であった光デバ
イスの表面実装及び高密度実装を容易に行うことができ
る。
In the printed circuit board according to the present invention configured as described above, a part of the copper plating layer integrally embedded in the board is made to be the light reflecting surface of the light guide path. It can play the role of a conductor path, which enables expensive light guide elements to be used with a minimum of use, as well as the surface mounting and height of optical devices, which have hitherto been technically difficult. Density mounting can be easily performed.

【0028】また、光導体路の光反射面が銅メッキ層の
一部であるので、難しい光導体路素子の固定に比べて容
易に光導体路を構成し、かつ光反射面の精度もよく接着
による固定も不用である。
Further, since the light reflecting surface of the light guide path is a part of the copper plating layer, the light guide path can be formed more easily and the precision of the light reflecting surface can be improved as compared with the case where the light guide element is difficult to fix. Adhesive fixing is unnecessary.

【0029】さらに、光導体路の光反射面を銅メッキ層
と同時に製作できることで、光導体路素子の固定時に生
じやすい接着性や位置ずれ等の問題を解消することがで
きる。
Further, since the light reflecting surface of the optical waveguide can be manufactured simultaneously with the copper plating layer, problems such as adhesiveness and displacement which are likely to occur when the optical waveguide element is fixed can be solved.

【0030】尚、本発明は、上述しかつ図面に示した実
施例に限定されるものでなく、その要旨を逸脱しない範
囲内で種々の変形実施が可能である。例えば、銅メッキ
層は必ずしも電気回路としての働きを有する必要はな
く、製造工程において銅メッキ層をパターニングする時
に、同時にパターニングすればよい。
The present invention is not limited to the embodiment described above and shown in the drawings, and various modifications can be made without departing from the scope of the invention. For example, the copper plating layer does not necessarily have to function as an electric circuit, and may be patterned at the same time as patterning the copper plating layer in the manufacturing process.

【0031】[0031]

【発明の効果】以上説明したように本発明によるプリン
ト基板の製造方法によれば、高価な光導体路素子の最小
限の使用で光反射構造を有する光導体路を製作すること
ができる。これによって、プリント基板の製造コストの
高騰を解消することができ、また、従来から技術的に困
難であった光デバイスの表面実装及び高密度実装が可能
となる。
According to the printed board manufacturing method of the present invention described above, according to the present invention, it is possible to manufacture a light guide path having a light reflective structure with minimum use of high cost optical conductor element. As a result, it is possible to prevent a rise in the manufacturing cost of the printed circuit board, and it is possible to mount optical devices on the surface and at a high density, which have been technically difficult in the past.

【0032】また、本発明によるプリント基板の製造方
法によれば、光導体路の光反射面が電気導体回路の一部
となるので、難しい光導体路素子の固定に比べて製作が
容易となり、かつ光反射面の精度もよく接着による固定
も不要となると共に、光導体路の光反射面を電気導体回
路と同時に製作できることで、光導体路素子の固定時に
生じやすい接着性や位置ずれ等の問題を解消することが
できる。
Also, a method of manufacturing a printed circuit board according to the present invention
According to the method, the light reflecting surface of the light guide path is part of the electrical conductor circuit.
Therefore, it is easier to manufacture compared to the difficult way of fixing the optical waveguide element, and the precision of the light reflecting surface is good and the fixing by bonding is not necessary, and the light reflecting surface of the optical waveguide is manufactured at the same time as the electric conductor circuit. By doing so, it is possible to solve problems such as adhesiveness and displacement that are likely to occur when the optical waveguide element is fixed.

【0033】また、本発明によるプリント基板の利用分
野としては、例えば、テレビジョン、オーディオ機器、
家庭用電気製品及び電源機器等のフォトカプラや、ある
いは、光コントローラー、光中継機、光コンピュータ及
び光ICカード等の光通信・情報処理分野に広く適用可
能である。
The fields of application of the printed circuit board according to the present invention include, for example, televisions, audio equipment,
The present invention can be widely applied to photocouplers such as household electric appliances and power supply devices, and optical communication and information processing fields such as optical controllers, optical repeaters, optical computers, and optical IC cards.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本実施例におけるプリント基板の平面図であ
る。
FIG. 1 is a plan view of a printed circuit board according to the present embodiment.

【図2】図1のA−A線における断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】本実施例における他の例によるプリント基板の
断面図である。
FIG. 3 is a sectional view of a printed circuit board according to another example of the present embodiment.

【図4】図3の実施例におけるプリント基板の製作工程
図(その1)である。
FIG. 4 is a diagram (part 1) illustrating a process of manufacturing a printed circuit board in the embodiment of FIG. 3;

【図5】図3の実施例におけるプリント基板の製作工程
図(その2)である。
FIG. 5 is a diagram (part 2) illustrating a process of manufacturing the printed circuit board in the embodiment of FIG. 3;

【符号の説明】[Explanation of symbols]

1 プリント基板 2 基板 3a〜3d 銅メッキ層 4,4a〜4c 光導体路 5a〜5d 光反射面 6 フォトダイオード 7 フォトセンサー 8 導体板 9 薄膜銅 10 フォトレジスト層 10a 開口 12 樹脂層 DESCRIPTION OF SYMBOLS 1 Printed board 2 Substrate 3a-3d Copper plating layer 4, 4a-4c Light guide path 5a-5d Light reflection surface 6 Photodiode 7 Photosensor 8 Conductor plate 9 Thin film copper 10 Photoresist layer 10a Opening 12 Resin layer

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基板に電気導体回路と、光透過性部材か
らなる光導体路とが一体化され上記基板中に埋設された
プリント基板の製造方法において、 基体上にフォトレジスト層を形成し、フォトリソグラフ
ィーにより複数の開口を形成する工程と、 上記開口の間に残された上記フォトレジスト層の角部を
カットし傾斜面を形成して、上記開口に導電体層を形成
した後、上記フォトレジスト層を除去することにより光
反射面を有する電気導体回路を形成する工程と、 上記電気導体回路の間に透明材料を充填して光導体路を
形成する工程と、 上記電気導体回路と上記光導体路を含む面に樹脂層を
形成して一体固化し、上記基体を除去する転写工程とか
らなることを特徴とするプリント基板の製造方法。
1. A method of manufacturing a printed circuit board in which an electric conductor circuit and an optical waveguide made of a light-transmitting member are integrated into a substrate and embedded in the substrate, wherein a photoresist layer is formed on the substrate. Forming a plurality of openings by photolithography, cutting the corners of the photoresist layer left between the openings to form an inclined surface, forming a conductive layer in the openings, Forming an electric conductor circuit having a light reflecting surface by removing the resist layer; filling a transparent material between the electric conductor circuits to form an optical conductor path; It solidified integrally forming a resin layer on the whole surface including the conductive path, the method of manufacturing a printed circuit board, characterized by comprising a transfer step of removing the substrate.
JP8007192A 1992-04-01 1992-04-01 Printed circuit board manufacturing method Expired - Fee Related JP3287871B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8007192A JP3287871B2 (en) 1992-04-01 1992-04-01 Printed circuit board manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8007192A JP3287871B2 (en) 1992-04-01 1992-04-01 Printed circuit board manufacturing method

Publications (2)

Publication Number Publication Date
JPH05281426A JPH05281426A (en) 1993-10-29
JP3287871B2 true JP3287871B2 (en) 2002-06-04

Family

ID=13707993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8007192A Expired - Fee Related JP3287871B2 (en) 1992-04-01 1992-04-01 Printed circuit board manufacturing method

Country Status (1)

Country Link
JP (1) JP3287871B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6528145B1 (en) * 2000-06-29 2003-03-04 International Business Machines Corporation Polymer and ceramic composite electronic substrates
JP2005274962A (en) * 2004-03-24 2005-10-06 Fuji Xerox Co Ltd Optical waveguide wiring board, method for manufacturing same, original board for manufacturing same, and photoelectric hybrid substrate
KR100872585B1 (en) * 2007-07-26 2008-12-08 삼성전기주식회사 Optical wave guide, package board having the same and manufacturing method thereof
KR100896522B1 (en) * 2007-09-13 2009-05-08 삼성전기주식회사 Manufacturing method of optical wave guide and package board

Also Published As

Publication number Publication date
JPH05281426A (en) 1993-10-29

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