JP3283145B2 - Reflector umbrella for strobe light using reflector - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflector and, more particularly, to a reflector which can be suitably used for a strobe reflector and an reflector thereof.

[0002]

2. Description of the Related Art Conventionally, as a reflector for a strobe, an aluminum plate having a polished surface formed by sheet metal processing has been used. In recent years, however, a strobe is also used for a simple camera such as a film with a lens. As a result, the weight and size of the electronic flash system have become increasingly important as a whole. However, a capacitor for discharging a xenon lamp used for a strobe occupies a large proportion in a strobe circuit, and reducing the size of the capacitor not only leads to a reduction in the size of the entire strobe system but also a reduction in cost. It is extremely important. One method for reducing the size of this capacitor is to replace the surface-polished aluminum (total reflectance: 88% to 90%) in order to allow the light emitted from the xenon lamp to efficiently reach the subject. Silver having a higher reflectance (total reflectance: 93% or more) is used. The present inventors have proposed a technique relating to a reflector having a higher reflectivity in the visible light region than aluminum and capable of performing sheet metal working or punching like an aluminum plate (Japanese Patent Laid-Open No. 5-162227). . The reflection plate proposed by the present inventors is composed of a transparent polymer film (B), a silver thin film layer (C), an adhesive layer (D), and a plate-like molded body (E).
It does not directly expose the silver thin film surface to the atmosphere, solves the problem of corrosion of the silver thin film surface, etc., and dramatically improves the weather resistance of the silver-based reflector. Was something.

[0003]

Therefore, the above-mentioned reflector using silver is punched out and sheet-metal processed for strobe light.
An unexpected problem was encountered that the surface of the transparent polymer film layer of the reflection plate was blackened when the light was actually emitted 10 to 50 times by using a strobe. In the reflector actually used,
It is desired not to blacken at least 100 times of light emission. Accordingly, the present inventors have conducted intensive studies on a method for solving this problem. As a result, they have found that the blackening of the transparent polymer film layer is suppressed by forming an inorganic thin film layer of 0.5 μm or more on the reflection surface, and reached the present invention. did.

[0004]

That is, the present invention has been made in order to solve the above-mentioned problems, and has an object to solve the above-mentioned problems. An inorganic thin film layer having a thickness of 0.2 μm or more is formed on one surface of a transparent polymer film (B). (A) is formed, a silver thin film (C) having a thickness of 60 nm or more is formed on the back surface thereof, and the surface of the film on which the silver thin film layer is formed and a plate-like molded product (E), for example, an aluminum plate That can be produced by laminating the above via an adhesive layer (D), that is, a reflector using the surface A of the reflector constituted in the order of ABCDE as a reflection surface And a strobe reflector using the above-mentioned reflector.

That is, the present invention provides at least an inorganic thin film layer (A) having a thickness of 0.2 μm to 3.7 μm, a transparent polymer film (B), and a film thickness of 60 nm to 350 n.
m, a silver thin film layer (C), an adhesive layer (D), and a plate-like molded product (E)
Is a reflection plate formed in the order of ABCDE, wherein the surface of A is a reflection surface, the inorganic thin film layer (A) is a reflection plate made of silicon oxide, and the silicon oxide heat-treats the silazane polymer. And the silicon oxide is formed by a plasma CVD method, and the plate-shaped molded article (E)
Is a reflector selected from aluminum, aluminum alloy, stainless steel, copper zinc alloy, and steel, and a strobe reflector formed by forming the reflector.

Hereinafter, the present invention will be described with reference to the accompanying drawings. FIG. 1 is a diagram showing an example of the cross-sectional structure of the reflector of the present invention. In the figure, 01 is an inorganic thin film layer, 02 is a transparent polymer film, 03 is a silver thin film layer, 04 is an adhesive layer, 0
Reference numeral 5 denotes a plate-like molded body. FIG. 2 is a diagram showing a cross section of a strobe structure in which a reflector is brought into contact with a xenon tube, and FIG. 3 is a view seen from the back side of a light emitting surface of the strobe structure in which a reflector is brought into contact with a xenon tube. FIG. 4 is a diagram showing a strobe light emitting circuit. In addition, 10 is a xenon lamp, 20 is a reflector, and 30 is a trigger terminal.

As the material of the transparent polymer film in the present invention, polyethylene terephthalate, polyether sulfone, polyether ether ketone, polyimide, polyethylene, polypropylene, polycarbonate or polystyrene can be used, but it is not necessarily limited to these. It can be used as long as it is transparent and has a somewhat high normal heat resistance temperature. When the xenon lamp emits light, the lamp is heated, and the reflector placed in contact with the lamp is also heated, but at least the transparent polymer film that does not deform or discolor due to the heat is heated. Preferably, it is used. In the present invention, an inorganic thin film layer on one surface of such a transparent polymer film,
On the back surface, a silver thin film layer is formed. Since the transparent polymer film is heated during the formation process, it is desirable to use a transparent polymer film having a normal heat resistance of 80 ° C. or higher, more preferably 100 ° C. or higher. Among them, polyethylene terephthalate has a normal heat resistance temperature of 120 ° C. and is excellent in transparency and processability, so that it can be suitably used as the transparent polymer film of the present invention. Polyethersulfone has a high normal heat resistance temperature of 170 ° C., and is therefore preferably used particularly when heat resistance is required.

The thickness of the transparent polymer film is not limited, but is preferably about 25 μm to 150 μm. The optical properties of the transparent polymer film used are
The light transmittance of light having a wavelength of 550 nm is preferably 80% or more. More preferably, wavelength 500-700n
The light transmittance for the light of m is 80% or more, more preferably 85% or more. If the light transmittance is lower than 80%, the total reflectance of the reflection film does not reach a desired value.

In the present invention, as described above, an inorganic thin film layer is formed on one surface of a transparent polymer film, and a silver thin film layer is formed on the back surface thereof. Etching treatment such as corona treatment, ultraviolet irradiation, electron beam irradiation, and the like, and undercoating treatment may be performed to improve adhesion between the inorganic thin film layer or the silver thin film layer and the transparent polymer film. Further, dustproofing such as detergent cleaning or ultrasonic cleaning may be performed as necessary.

As the material of the inorganic thin film layer, silicon oxide, titanium oxide, zirconia oxide, aluminum oxide, or the like can be used. However, the material is not limited to these, and in short, light having a wavelength of 400 nm to 750 nm can be used. It can be used as long as the light absorptance for the is less than 20%. If the light absorptance in the wavelength range of 400 nm to 750 nm exceeds 20%, the light emitted from the xenon lamp is absorbed when the light is incident on the inorganic thin film layer. The desired value is not reached. Among the above inorganic oxides, silicon oxide is preferably used because a thin film having a light absorption of 20% or less can be easily formed by a method described later.

It will be readily apparent to those skilled in the art that the term "silicon oxide" as used herein is a generic term for oxidized silicon and does not necessarily need to match stoichiometric. That is, more specifically, the atomic ratio of oxygen to silicon is in the range of 1.5 to 2.1. Also,
It goes without saying that even if impurities such as nitrogen and hydrogen are contained, they are included in the range of the silicon oxide mentioned here.

As a method for forming the inorganic thin film layer, a conventionally known thin film forming method such as a physical vapor deposition method such as a vacuum deposition method, a sputtering method, and an ion plating method, and a chemical vapor deposition method such as a plasma CVD method. Available. Also,
When a silicon oxide thin film is formed, a coating method in which a silazane polymer is applied and then heated and dried can also be used.

In the plasma CVD method, for example, when a silicon oxide thin film is formed, 1,1,3,3-tetramethyldisiloxane (liquid at room temperature) is bubbled with an inert gas such as helium gas. A desired silicon oxide thin film can be obtained by vaporizing and introducing the mixture into a vacuum chamber, mixing oxygen gas therein, generating plasma, and depositing silicon oxide. The plasma CVD method is preferably used because a film formation rate is high and a silicon oxide thin film can be formed at a high speed. In the case of forming a silicon oxide, the coating method is to apply a silazane polymer in the
This is a simple process of heating and drying at 50 to 500 ° C. for about 0.5 to 5 hours, and does not require a vacuum device unlike the above-described film forming method, so that a desired silicon oxide thin film can be obtained with a simple device. Therefore, this is also preferably used. As the silazane polymer used in the coating method, for example, polysilazane (manufactured by Tonen Corp.) can be used.

In the sputtering method, a radio frequency (RF) magnetron sputtering method using a desired inorganic oxide as a target and an inert gas such as argon as a sputtering gas is preferably used. An appropriate amount of oxygen gas may be introduced into the sputtering gas to compensate for oxygen vacancies in the formed inorganic oxide. Further, for example, a direct current (DC) using a metal target such as silicon for a silicon oxide thin film and titanium for a titanium oxide thin film, using an inert gas such as argon as a sputtering gas, and oxygen as a reactive gas. A desired inorganic oxide layer can also be obtained by a reactive sputtering method. In the sputtering method, various inorganic thin films can be formed by selecting a desired material for the target, and therefore, this is also preferably used.

The thickness of the inorganic thin film layer is 0.2 μm to 3.7 μm.
m, more preferably 0.3 μm to 3.7 μm, further preferably 0.4 μm to 3.7 μm, further preferably 0.5 μm to 3.5 μm, and still more preferably 0.5 μm.
２．５2.5 μm. If the thickness of the inorganic thin film layer is thinner than this, it does not function as a protective layer for suppressing blackening of the transparent polymer film against strobe light emission. An umbrella is not preferable because the transparent polymer film is blackened by several times of strobe light emission. On the other hand, if the thickness of the inorganic thin film layer is larger than this, the inorganic thin film layer is undesirably cracked when the reflector is processed into a flash reflector. It should be noted that the inorganic thin film layer having the above-mentioned film thickness can provide practically sufficient performance. Therefore, it is not preferable to increase the film-forming time in order to make the film thickness more than this, because it wastes material.

In the present invention, as shown in FIG. 1, a silver thin film layer is formed on a transparent polymer film having such an inorganic thin film layer formed on one surface thereof, opposite to the surface on which the inorganic thin film layer is formed. To form As a method for forming such a silver thin film layer, conventionally known chemical liquid phase growth methods and physical vapor phase growth methods can be used.
The chemical liquid phase growth method is a general term for a so-called plating method, and is a method of depositing silver from a solution to form a film. Specific examples include a silver mirror reaction. On the other hand, the physical vapor deposition method is a general term for a vacuum film forming method, and specific examples thereof include a resistance heating type vacuum deposition method, an electron beam heating type vacuum deposition method, an ion plating method, and an ion beam assist method. There are a vacuum deposition method, a sputtering method and the like. In particular, in the present invention, a vacuum film forming method capable of a roll-to-roll system for continuously forming a film is preferably used.

In the vacuum deposition method, a silver raw material is an electron beam,
Melt by resistance heating, induction heating, etc., raise the vapor pressure,
Preferably, 0.1 mTorr (about 0.1 Pa) or more is introduced to cause high-frequency or direct-current glow discharge.

As the sputtering method, a direct current (DC) magnetron sputtering method, a high frequency (RF) magnetron sputtering method, an ion beam sputtering method, an ECR sputtering method, a conventional RF sputtering method, a conventional DC sputtering method, or the like can be used. In the sputtering method, a silver plate-shaped target may be used as a raw material, and helium, neon, argon, krypton, xenon, or the like may be used as a sputtering gas, but argon is preferably used. The gas purity is preferably 99.0% or more, more preferably 99.5% or more.

The thickness of the silver thin film layer is from 60 nm to 350 nm,
More preferably, it is 70 nm to 300 nm. If it is less than this, the transmitted light is present due to the insufficient silver film thickness, and the reflectance is not sufficient. On the other hand, if the film thickness is larger than this, the reflectance does not further increase, showing a saturation tendency, and the adhesion of the silver layer to the transparent polymer film is undesirably reduced.

For measuring the film thickness, there are a stylus roughness meter, a repetitive reflection interferometer, a microbalance, a quartz oscillator method and the like.
The quartz oscillator method is suitable for obtaining a desired film thickness because the film thickness can be measured during film formation. There is also a method in which film formation conditions are determined in advance, a film is formed on a sample substrate, the relationship between the film formation time and the film thickness is examined, and the film thickness is controlled by the film formation time.

In the silver thin film layer, gold, copper, nickel, iron, cobalt, tungsten, molybdenum, tantalum, chromium, indium, and the like which do not adversely affect the performance are provided.
Metal impurities such as manganese and titanium may be included. Further, after forming the silver layer, a single metal layer or an alloy layer of Inconel, chromium, nickel, titanium, aluminum, molybdenum, tungsten, etc. is further formed thereon to protect the silver layer and improve the slip property of the film. 10 nm to 3
Those skilled in the art will understand that stacking 0 nm is effective.

The adhesive used in the present invention is an adhesive bonded with the aid of heat or a catalyst, and specifically includes a silicone adhesive, a polyester adhesive, an epoxy adhesive, and a cyanoacrylate adhesive. For example, a general adhesive can be used. Silicone-based adhesives and polyester-based adhesives have excellent heat resistance and electrical properties, and thus can be suitably used for a strobe reflector for applying a trigger. Epoxy-based adhesives are excellent in strength and heat resistance, and therefore can also be suitably used. The cyanoacrylate-based adhesive has excellent quickness and strength, and can be used for efficient reflector production. These adhesives are roughly classified into a thermosetting type, a hot-melt type, and a two-component mixing type depending on the bonding method, and a thermosetting type or a hot-melt type which can be continuously produced is preferably used. The thickness of the thermal adhesive
Although not particularly limited, it is usually about 0.5 μm to 50 μm, preferably about 1 μm to 20 μm.

The adhesion between the transparent polymer film and the plate-like molded product is performed by the procedure of coating the silver thin film layer with an adhesive, drying, and laminating the plate-like molded product with a roller. There are many methods for coating the adhesive depending on the type of the base material and the adhesive, but the gravure coater method and the reverse coater method are widely used. In the gravure coater method, coating is performed by rotating a gravure roll partially immersed in an adhesive and bringing a film sent by a backup roll into contact with the gravure roll to which the adhesive is attached. The coating amount can be adjusted by controlling the number of rotations of the roll and the viscosity of the adhesive. The reverse coater method is also a method similar to the gravure roll method, but the amount of the adhesive adhering to the coating roll is adjusted by a metering roll installed in contact with the coating roll. The drying temperature and the laminating temperature of the coated adhesive vary depending on the type of the adhesive, but are around 100 ° C. when the above-mentioned general adhesive is used.

The adhesive strength between the transparent polymer film on which the silver thin film layer is formed and the plate-like molded product by the adhesive is desirably 100 g / cm or more as measured at a 180 degree peel strength. If the adhesion strength is not reached, when a sheet metal is processed as a reflector for a strobe, the transparent polymer film on which the silver thin film layer is formed is peeled off from the plate-like molded body,
Causes deformation.

Aluminum, aluminum alloy, stainless steel, steel zinc alloy, steel and the like are used for the plate-like molded body.
Each of these metals has advantages and can be used as follows. Aluminum is lightweight and excellent in workability, and has high thermal conductivity and can effectively release the heat applied to the atmosphere, so that it can be suitably used as a reflector for a strobe in which a reflector is heated by lamp emission. . Since aluminum alloy is lightweight and has high mechanical strength, it can be suitably used as a reflector for strobe light. Stainless steel has high mechanical strength and excellent corrosion resistance,
It can be suitably used for a strobe reflector. A steel zinc alloy, that is, brass or brass, has a high mechanical strength and is easy to solder, so that it is easy to take a trigger terminal, and this can also be suitably used for a reflector for strobe light. Since steel is inexpensive, it is preferably used when it is necessary to reduce costs.

The reflectivity of the reflector thus manufactured is typically 93% or more with respect to light having a wavelength of 550 nm, and more specifically, 93% in the range of 450 nm to 750 nm.
% Or more. In order to form the strobe reflector by forming the silver reflector, a conventional method of processing an aluminum plate into a strobe reflector can be applied as it is. For example, a reflector is formed by cutting a reflector into a shape obtained by expanding a reflector in a plane, and bending the cut flat plate.
118002). Since such a method is inexpensive to manufacture, it is suitably used for films with lenses.

A typical method for evaluating the structure of the silver reflector according to the present invention will be described below. The thickness of each part of the inorganic thin film layer, the transparent polymer film, the silver thin film layer, the adhesive layer, and the plate-like molded body can be directly measured by observing the cross section with a transmission electron microscope (TEM). Auger electron spectroscopy (AE
According to S), the composition can be measured by analyzing the composition of the layer structure in the depth direction. Material analysis of the transparent polymer film is possible by infrared spectroscopy (IR).
In addition, the material analysis of the adhesive is performed by peeling the silver thin film layer and the plate-like molded body to expose the adhesive, preparing a sample in which the adhesive is dissolved in an appropriate solvent, and taking an infrared spectrum (IR) thereof. Done. Material analysis of the inorganic thin film layer, the silver thin film layer, and the plate-like formed body is performed by X-ray fluorescence spectroscopy (XRF) or Auger electron spectroscopy (AE).
S). Further, an X-ray microanalyzer (EPMA) can perform elemental analysis of a portion finer than X-ray fluorescence spectroscopy.

[0028]

EXAMPLES Examples of the embodiments of the present invention will be described below with reference to examples. In addition, the total light transmittance and the reflectance described in the examples are measured with a spectrophotometer (U-340, manufactured by Hitachi, Ltd.).
0).

Example 1 A 1,1,3,3-tetramethyldisiloxane gas and an oxygen gas were used as raw materials on one surface of a polyethersulfone film (thickness 50 μm, total light transmittance = 87%). After a silicon oxide having a thickness of 0.5 μm is formed by a plasma CVD method, a purity of 9 μm is formed on the back surface of the surface on which the silicon oxide is formed.
Using 9.9% silver as a raw material, electron beam vacuum evaporation
Silver having a thickness of 150 nm was deposited. The thickness of the silver layer was measured with a quartz crystal film thickness monitor to be 150 nm. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. After measuring the total reflectance of the silver reflecting plate with respect to a light having a wavelength of 550 nm, an umbrella for a strobe reflector is formed by sheet metal processing, the xenon lamp and the silicon oxide layer side are brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit is silver. A strobe for photography was formed by connecting to an aluminum plate of a reflection plate.

Example 2 Polyethylene terephthalate film (100 μm thick)
m, total light transmittance = 87%) on one side.
After applying a polysilazane made and drying by heating at 170 ° C. to form a silicon oxide layer having a thickness of 1.0 μm,
On the back surface of the surface on which the silicon oxide was formed, silver having a purity of 99.9% was used as a raw material, and the thickness was 150 nm by electron beam vacuum evaporation.
Of silver was evaporated. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. After measuring the total reflectance of the silver reflecting plate with respect to a light having a wavelength of 550 nm, an umbrella for a strobe reflector is formed by sheet metal processing, the xenon lamp and the silicon oxide layer side are brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit is silver. A strobe for photography was formed by connecting to an aluminum plate of a reflection plate.

Example 3 Polyethylene terephthalate film (100 μm thick)
m, total light transmittance = 87%) on one side.
After applying a polysilazane made and drying by heating at 170 ° C. to form a silicon oxide layer having a thickness of 2.5 μm,
On the back surface of the surface on which the silicon oxide was formed, using a target of silver having a purity of 99.99%, under a gas atmosphere of 2 mTorr of argon gas by a DC magnetron method, a thickness of 150 mm was used.
The silver thin film layer of nm was formed. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. The wavelength of the silver reflector 55
After measuring the total reflectance with respect to a light beam of 0 nm, an umbrella for a strobe reflector was formed by sheet metal processing, and the xenon lamp and the silicon oxide layer were brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit was connected to an aluminum plate of a silver reflector. By connecting, a strobe for photography was formed.

Example 4 Polyethylene terephthalate film (100 μm thick)
m, total light transmittance = 87%) on one side.
Polysilazane made was applied and dried by heating at 170 ° C. to form a silicon oxide layer having a thickness of 3.5 μm.
On the back surface of the surface on which the silicon oxide was formed, using a target of silver having a purity of 99.99%, under a gas atmosphere of 2 mTorr of argon gas by a DC magnetron method, a thickness of 150 mm was used.
The silver thin film layer of nm was formed. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. The wavelength of the silver reflector 55
After measuring the total reflectance with respect to a light beam of 0 nm, an umbrella for a strobe reflector was formed by sheet metal processing, and the xenon lamp and the silicon oxide layer were brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit was connected to an aluminum plate of a silver reflector. By connecting, a strobe for photography was formed.

Example 5 Polysilazane manufactured by Tonen Co., Ltd. was applied to one surface of a polyethylene film (thickness: 100 μm, total light transmittance = 87%), and dried by heating at 170 ° C.
After a silicon oxide layer having a thickness of 0 μm was formed, silver having a thickness of 70 nm was vapor-deposited on the back surface of the surface on which the silicon oxide was formed by using electron beam vacuum vapor deposition using silver having a purity of 99.9% as a raw material.
The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. After measuring the total reflectance of the silver reflecting plate with respect to a light having a wavelength of 550 nm, an umbrella for a strobe reflector is formed by sheet metal processing, the xenon lamp and the silicon oxide layer side are brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit is silver. A strobe for photography was formed by connecting to an aluminum plate of a reflection plate.

Example 6 Polyethylene terephthalate film (100 μm thick)
m, total light transmittance = 87%) on one side.
After applying a polysilazane made and drying by heating at 170 ° C. to form a silicon oxide layer having a thickness of 1.0 μm,
On the back surface of the surface on which the silicon oxide was formed, using a target of silver having a purity of 99.99% and a thickness of 300 mm by a DC magnetron method under an atmosphere of 2 mTorr of argon gas.
The silver thin film layer of nm was formed. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. The wavelength of the silver reflector 55
After measuring the total reflectance with respect to a light beam of 0 nm, an umbrella for a strobe reflector was formed by sheet metal processing, and the xenon lamp and the silicon oxide layer were brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit was connected to an aluminum plate of a silver reflector. By connecting, a strobe for photography was formed.

Comparative Example 1 Polyethylene terephthalate film (100 μm thick)
m, total light transmittance = 87%). Silver having a purity of 99.9% was vapor-deposited by electron beam vacuum vapor deposition on one surface. The thickness of the silver layer was measured with a quartz crystal film thickness monitor to be 150 nm. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. After measuring the total reflectance of the silver reflecting plate with respect to a light having a wavelength of 550 nm, an umbrella for a strobe reflector is formed by sheet metal processing, the xenon lamp and the silicon oxide layer side are brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit is silver. A strobe for photography was formed by connecting to an aluminum plate of a reflection plate.

Comparative Example 2 A 1,1,3,3-tetramethyldisiloxane gas and an oxygen gas were used as raw materials on one surface of a polyethersulfone film (thickness: 50 μm, total light transmittance = 87%). After a silicon oxide having a thickness of 0.3 μm was formed by a plasma CVD method, silver having a purity of 99.9% was deposited on the back surface of the formed surface by an electron beam vacuum deposition method. The thickness of the silver layer was measured with a quartz crystal film thickness monitor to be 150 nm.
The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. After measuring the total reflectance of the silver reflecting plate with respect to a light having a wavelength of 550 nm, an umbrella for a strobe reflector is formed by sheet metal processing, the xenon lamp and the silicon oxide layer side are brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit is silver. A strobe for photography was formed by connecting to an aluminum plate of a reflection plate.

Comparative Example 3 Polyethylene terephthalate film (100 μm thick)
m, total light transmittance = 87%) on one side.
Polysilazane manufactured was applied and dried by heating at 170 ° C. to form a silicon oxide layer having a thickness of 4.0 μm.
On the back surface of the surface on which the silicon oxide was formed, using a target of silver having a purity of 99.99%, under a gas atmosphere of 2 mTorr of argon gas by a DC magnetron method, a thickness of 150 mm was used.
The silver thin film layer of nm was formed. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. The wavelength of the silver reflector 55
After measuring the total reflectance with respect to a light beam of 0 nm, an umbrella for a strobe reflector was formed by sheet metal processing, and the xenon lamp and the silicon oxide layer were brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit was connected to an aluminum plate of a silver reflector. By connecting, a strobe for photography was formed.

Comparative Example 4 Polysilazane manufactured by Tonen Co., Ltd. was applied to one surface of a polyethylene film (thickness: 100 μm, total light transmittance = 87%) and dried by heating at 170 ° C.
After a silicon oxide layer having a thickness of 0 μm was formed, silver having a thickness of 50 nm was vapor-deposited on the back surface of the surface on which the silicon oxide was formed by electron beam vacuum vapor deposition using silver having a purity of 99.9% as a raw material.
The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. After measuring the total reflectance of the silver reflecting plate with respect to a light having a wavelength of 550 nm, an umbrella for a strobe reflector is formed by sheet metal processing, the xenon lamp and the silicon oxide layer side are brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit is silver. A strobe for photography was formed by connecting to an aluminum plate of a reflection plate.

Comparative Example 5 Polyethylene terephthalate film (100 μm thick)
m, total light transmittance = 87%) on one side.
After applying a polysilazane made and drying by heating at 170 ° C. to form a silicon oxide layer having a thickness of 1.0 μm,
On the back surface of the surface on which the silicon oxide was formed, using a target of silver having a purity of 99.99%, under an atmosphere of 2 mTorr of argon gas by a DC magnetron method, a thickness of 400 mm was used.
The silver thin film layer of nm was formed. The silver side of the film and the aluminum plate were bonded with a polyester hot melt adhesive to form a silver reflector. The wavelength of the silver reflector 55
After measuring the total reflectance with respect to a light beam of 0 nm, an umbrella for a strobe reflector was formed by sheet metal processing, and the xenon lamp and the silicon oxide layer were brought into contact and fixed, and the trigger terminal of the strobe light emitting circuit was connected to an aluminum plate of a silver reflector. By connecting, a strobe for photography was formed.

FIGS. 2 and 3 show Examples 1 to 6 and Comparative Example 1.
It is the schematic of the strobe for photography described in-5. Here, FIG. 2 shows a cross section of a strobe structure in which a silver reflector is brought into contact with a xenon tube, and FIG. 3 shows a view seen from the back side of a light emitting surface of the strobe structure in which a silver reflector is brought into contact with a xenon tube. . In the figure, 10 is a xenon lamp, 2
0 is a silver reflection plate, and 30 is a trigger terminal.

FIG. 4 shows a light emitting circuit for emitting light from a strobe. A voltage charged by an electric field capacitor is applied to the xenon lamp 10, and a high voltage and high frequency trigger is applied to the trigger terminal 20 to induce light emission. Here, the voltage applied to the xenon lamp, the voltage applied to the trigger terminal, and the frequency may be set to appropriate values that allow the xenon lamp to emit light.

The strobe for photographing described in Examples 1 to 6 and Comparative Examples 1 to 5 is different from the strobe circuit described in FIG. 4 in that the voltage applied to the xenon lamp is 320 V and the voltage applied to the trigger terminal is peak-to-peak. After setting the peak value at 15 kV and the frequency at 1 MHz, the xenon lamp was repeatedly emitted 100 times at 10-second intervals, and then the state of the silver reflector was observed. Examples 1 to 6 and Comparative Example 1
Table 1 shows the total reflectance of each of the samples No. to No. 5 with respect to light having a wavelength of 550 nm before the light emission test and the state of the reflector after the light emission test.

[0043]

[Table 1] The fact that Examples 1 to 5 of the present invention are excellent as strobe reflectors for photography has a high reflectance and
It is said that there is no abnormality even in the luminescence test of 00 times
It is clear from the above experimental results.

[0044]

According to the present invention, it is possible to provide a silver reflector which can be suitably used for a strobe reflector in which blackening is suitably prevented.

[Brief description of the drawings]

FIG. 1 is a diagram showing a sectional structure of a reflector.

FIG. 2 is a diagram showing a cross section of a strobe structure in which a reflector is brought into contact with a xenon tube.

FIG. 3 is a view seen from the back side of a light emitting surface of a strobe structure in which a reflector is brought into contact with a xenon tube.

FIG. 4 is a diagram showing a strobe light emitting circuit.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 01 Inorganic thin film layer 02 Transparent polymer film 03 Silver thin film layer 04 Adhesive layer 05 Plate-shaped molded object 10 Xenon lamp 20 Reflector 30 Trigger terminal

──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Nobuhiro Fukuda 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Mitsui Toatsu Chemicals Co., Ltd. (56) References JP-A-5-162227 (JP, A) JP-A-1 -168443 (JP, A) JP-A-4-45921 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) B32B 1/00-35/00 G03B 15/05 F21V 1/14 -1/24

Claims (5)

(57) [Claims] 1. A strobe reflector formed by processing a reflector, wherein the reflector has an inorganic thin film layer (A) having a thickness of at least 0.2 μm to 3.7 μm, and a transparent polymer film. (B), a silver thin film layer (C) having a film thickness of 60 nm to 350 nm, an adhesive layer (D), and a plate-like molded body (E) are ABCD
E, wherein the surface side of the inorganic thin film layer (A) is a reflection plate which is a reflection surface, and the reflection surface of the reflection plate is formed so as to be close to a light source for a strobe light. Reflective umbrella for strobe. 2. The strobe reflector according to claim 1, wherein the inorganic thin film layer (A) of the reflector is made of silicon oxide. 3. The strobe light according to claim 2, wherein the silicon oxide used for the inorganic thin film layer (A) of the reflector is a silicon oxide formed by heat-treating a silazane polymer. Reflective umbrella. 4. The flash umbrella according to claim 2, wherein the silicon oxide used for the inorganic thin film layer (A) of the reflector is a silicon oxide formed by a plasma CVD method. . 5. The reflector (E) of the reflection plate is made of a metal material selected from aluminum, aluminum alloy, stainless steel, copper zinc alloy, and steel. 5. The reflector for a strobe light according to any one of items 4.