JP3259646B2 - Continuous siliconizing equipment for steel strip - Google Patents
Continuous siliconizing equipment for steel stripInfo
- Publication number
- JP3259646B2 JP3259646B2 JP32075796A JP32075796A JP3259646B2 JP 3259646 B2 JP3259646 B2 JP 3259646B2 JP 32075796 A JP32075796 A JP 32075796A JP 32075796 A JP32075796 A JP 32075796A JP 3259646 B2 JP3259646 B2 JP 3259646B2
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- sio
- refractory material
- siliconizing
- steel strip
- furnace
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Description
【０００１】[0001]
【発明が属する技術分野】本発明は鋼帯の連続浸珪処理
設備に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a facility for continuous siliconizing of steel strip.
【０００２】高珪素鋼帯を工業的に製造する方法とし
て、特開昭６２−２２７０７８号等に示されるような気
体浸珪法による製造方法が知られている。この製造方法
は、Ｓｉ含有量が比較的低い鋼帯を加熱して塩化珪素ガ
スを含む無酸化性ガス雰囲気中で浸珪処理することによ
りＳｉを浸透させ、次いでＳｉを板厚方向に拡散させる
拡散熱処理を施し、冷却後コイル状に巻き取る一連のプ
ロセスを連続ライン化し、高珪素鋼帯を効率よく製造す
ることができる。[0002] As a method for industrially producing a high silicon steel strip, there is known a production method based on a gas siliconizing method as disclosed in JP-A-62-227078. In this manufacturing method, a steel strip having a relatively low Si content is heated and subjected to a siliconizing treatment in a non-oxidizing gas atmosphere containing a silicon chloride gas to penetrate Si and then diffuse Si in the thickness direction. A series of processes for performing a diffusion heat treatment and coiling after cooling is formed into a continuous line, so that a high silicon steel strip can be efficiently produced.
【０００３】上記のような浸珪処理が行われる連続処理
設備の浸珪処理炉は炉内温度が１２００℃以上となり、
また無酸化性ガス雰囲気中に含まれるＳｉＣｌ4等の塩
化珪素ガス（以下、ＳｉＣｌ4を例に説明する）は腐食
性の強いガスであるため、高温の炉内で活性となったＳ
ｉＣｌ4が炉内耐火材と反応し、耐火材を劣化させる。
特に、ＳｉＣｌ4はアルミナやムライト、ジルコニア等
の酸化物系のセラミック材料と反応を起こし、この反応
によってシリカが生成され、耐火材は次第に脆化してい
く。[0003] In the siliconizing furnace of the continuous processing equipment in which the above-described siliconizing treatment is performed, the temperature in the furnace becomes 1200 ° C or more,
Since silicon chloride gas such as SiCl 4 (hereinafter, SiCl 4 will be described as an example) contained in the non-oxidizing gas atmosphere is a highly corrosive gas, it is activated in a high-temperature furnace.
iCl 4 reacts with the refractory material in the furnace and degrades the refractory material.
In particular, SiCl 4 reacts with an oxide-based ceramic material such as alumina, mullite, and zirconia, and silica is generated by this reaction, and the refractory material gradually becomes brittle.
【０００４】表１は様々なセラミック材料とＳｉＣｌ4
との反応形態と反応のギブスの標準自由エネルギーの変
化を示したものである。一般に、ギブスの標準自由エネ
ルギー変化が負になる場合は反応が進行して劣化が進む
ことを示しており、表１によれば酸化物系では唯一Ｓｉ
Ｏ2が、また他のセラミック材料ではＳｉ3Ｎ4とカーボ
ンが、それぞれＳｉＣｌ4とは反応しないことが判る。Table 1 shows various ceramic materials and SiCl 4.
FIG. 3 shows the reaction mode of the reaction and the change in the Gibbs standard free energy of the reaction. In general, when the standard free energy change of Gibbs becomes negative, it indicates that the reaction proceeds and the deterioration proceeds.
It can be seen that O 2 does not react with SiCl 4, and other ceramic materials do not react with Si 3 N 4 and carbon.
【表１】 このような材料特性に着目して、特開平８−１６９７５
０号ではＳｉＯ2やＳｉ3Ｎ4を主体とする浸珪処理炉用
の耐火材が提案されている。[Table 1] Paying attention to such material properties, Japanese Patent Application Laid-Open No. 8-169975
No. 0 proposes a refractory material for a siliconizing furnace which is mainly composed of SiO 2 or Si 3 N 4 .
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、従来の
ＳｉＯ2を主体とする耐火材は熱膨張率が大きいため、
炉内の構造材料として使用した場合に、昇温や降温時の
熱膨張、収縮により亀裂や割れが生じやすいという欠点
がある。また、溶融シリカは変態温度が１１００℃前後
であり、炉内温度である１２００℃以上では変態が生じ
て熱膨張率が急激に変化するため耐火材にクラックや割
れが発生してしまい、使用に耐え得ない。However, conventional refractory materials mainly composed of SiO 2 have a large coefficient of thermal expansion.
When used as a structural material in a furnace, there is a disadvantage that cracks and cracks are likely to occur due to thermal expansion and contraction when the temperature rises and falls. In addition, the fused silica has a transformation temperature of about 1100 ° C., and at a furnace temperature of 1200 ° C. or more, the transformation occurs and the coefficient of thermal expansion changes rapidly, so that cracks and cracks occur in the refractory material. I can't stand it.
【０００６】また、Ｓｉ3Ｎ4を主体とする耐火材はＳｉ
Ｃｌ4との反応は生じないが、材料が非常に高価である
とともに、大型の成型材ができないため炉内の構造材料
とすること自体が難しい。また、カーボンを主体とする
耐火材は酸化によって容易に劣化するため、これも実用
化は難しい。したがって本発明の目的は、気体浸珪法に
よる鋼帯の連続浸珪処理設備において、安価で且つ高温
の塩化珪素ガスに対する耐久性に優れた炉内耐火材を備
えた設備を提供することにある。A refractory material mainly composed of Si 3 N 4 is made of Si
Although it does not react with Cl 4 , it is difficult to use as a structural material in the furnace itself because the material is very expensive and a large molding material cannot be formed. Further, the refractory material mainly composed of carbon is easily deteriorated by oxidation, so that it is difficult to put it to practical use. Accordingly, it is an object of the present invention to provide an equipment which is equipped with a refractory material in a furnace which is inexpensive and has excellent durability against high-temperature silicon chloride gas in a continuous siliconizing treatment equipment for a steel strip by a gas siliconizing method. .
【０００７】[0007]
【課題を解決するための手段】このような課題を解決す
るため、本発明の設備は以下のような構成を有する。 (1) 鋼帯を気体浸珪法により連続的に浸珪処理する連続
浸珪処理設備において、浸珪処理炉内の耐火材として、
ＳｉＯ2およびＡｌ2Ｏ3の１種または２種を合計で８０
ｗｔ％以上含むセラミック材料を１３００℃以上の温度
で焼成して得られた耐火材を用いることを特徴とする鋼
帯の連続浸珪処理設備。 (2) 上記(1)の設備において、耐火材がＳｉＯ2とＡｌ2
Ｏ3とを含み、ＳｉＯ2とＡｌ2Ｏ3の合計量に対するＳｉ
Ｏ2の含有率が２５〜８０ｗｔ％であることを特徴とす
る鋼帯の連続浸珪処理設備。 (3) 上記(1)または(2)の設備において、耐火材が、表面
にＳｉＯ2系またはＳｉＯ2−Ａｌ2Ｏ3系の材料をコーテ
ィングするか若しくは含浸させた耐火材であることを特
徴とする鋼帯の連続浸珪処理設備。In order to solve such problems, the equipment of the present invention has the following configuration. (1) In a continuous siliconizing equipment that continuously siliconizes steel strip by gas siliconizing, as a refractory material in the siliconizing furnace,
One or two of SiO 2 and Al 2 O 3 are used for a total of 80
A continuous siliconizing treatment facility for a steel strip, characterized by using a refractory material obtained by firing a ceramic material containing not less than wt% at a temperature of 1300 ° C. or more. (2) In the equipment of the above (1), the refractory material is SiO 2 and Al 2
O 3 and Si 2 based on the total amount of SiO 2 and Al 2 O 3
A continuous silicification treatment facility for steel strip, wherein the content of O 2 is 25 to 80 wt%. (3) The equipment according to the above (1) or (2), wherein the refractory material is a refractory material whose surface is coated or impregnated with a SiO 2 -based or SiO 2 -Al 2 O 3 -based material. Continuous stripping equipment for steel strip.
【０００８】[0008]
【発明の実施の形態】以下、本発明の詳細と限定理由を
説明する。先に述べたように酸化物系の材料はそのほと
んどがＳｉＣｌ4と反応し、これらを浸珪処理炉の耐火
材として用いた場合、ＳｉＣｌ4との反応によって時間
の経過とともに劣化していく。また、先に述べたように
酸化物系では唯一ＳｉＣｌ4と反応しないＳｉＯ2を主体
とした従来の耐火材は、熱膨張や収縮により亀裂や割れ
を生じ易いという問題があった。BEST MODE FOR CARRYING OUT THE INVENTION The details of the present invention and the reasons for limitation will be described below. As described above, most of oxide-based materials react with SiCl 4, and when these are used as refractory materials in a siliconizing furnace, they deteriorate with time due to the reaction with SiCl 4 . Further, as described above, the conventional refractory material mainly composed of SiO 2 which does not react with SiCl 4 only in an oxide system has a problem that cracks and cracks are easily generated due to thermal expansion and contraction.
【０００９】これに対して、本発明者らは耐火材料とし
ては最も安価な酸化物系の材料を用いることを前提に、
酸化物系の材料を緻密化することによってガスとの接触
面積を減らし、反応が生じたとしても劣化速度を極力小
さくできるような耐火材を得ることを試みた。その結
果、耐熱性があるＳｉＯ2またはＡｌ2Ｏ3若しくはそれ
らの混合物からなるセラミック材を用い、これを従来の
耐火材の焼成温度よりも高温で焼成することにより耐火
材の緻密性を効果的に高められること、そして、このよ
うに高温焼成により緻密化した特定の酸化物系の耐火材
が高温のＳｉＣｌ4に対して高度の耐久性を示すことを
見い出した。On the other hand, the present inventors presuppose that the cheapest oxide-based material is used as the refractory material,
An attempt was made to obtain a refractory material capable of reducing the contact area with a gas by densifying an oxide-based material and reducing the deterioration rate as much as possible even if a reaction occurs. As a result, a ceramic material made of heat-resistant SiO 2 or Al 2 O 3 or a mixture thereof is used, and is fired at a temperature higher than the firing temperature of the conventional fire-resistant material, thereby effectively improving the denseness of the fire-resistant material. It has been found that the specific oxide-based refractory material densified by high-temperature sintering exhibits high durability to high-temperature SiCl 4 .
【００１０】このように特定の酸化物系の材料を高温で
焼成した耐火材が高温のＳｉＣｌ4に対して優れた耐久
性を示すのは、高温焼成によって材料の焼結性が高めら
れ、材料中の空孔が埋められることで緻密化が達成され
るためであり、このような材料の緻密化によってＳｉＣ
ｌ4ガスとの接触面積が減り、劣化速度が低下するもの
である。本発明者らは、このような材料の緻密化に必要
な焼成温度を求めるために、焼成温度を変えてＳｉＯ2
−Ａｌ2Ｏ3系（ＳｉＯ2：５３ｗｔ％、Ａｌ2Ｏ3：４３
ｗｔ％）の耐火材（サイズ：５０ｍｍ×５０ｍｍ×３０
ｍｍ）を製作し、これらを１２００℃の炉内で１０ｖｏ
ｌ％のＳｉＣｌ4を含むＮ2ガス雰囲気に１ヶ月間曝すこ
とにより、その重量減少量と表面観察から劣化速度を評
価した。図１は、その結果に基づき耐火材の焼成温度と
重量減少量との関係を示したもので、耐火材の劣化速度
は耐火材の焼成温度が１３００℃以上となると急激に低
下し、焼成温度が１５００℃ではほとんど反応が進行し
ないことが判る。The reason that the refractory material obtained by firing a specific oxide-based material at a high temperature exhibits excellent durability against high-temperature SiCl 4 is that the sinterability of the material is enhanced by the high-temperature firing, This is because densification is achieved by filling the pores therein.
It reduces the contact area between l 4 gas, in which the degradation rate is lowered. The present inventors have found that in order to determine the sintering temperature necessary for densification of such materials, SiO 2 by changing the firing temperature
-Al 2 O 3 system (SiO 2 : 53 wt%, Al 2 O 3 : 43
wt%) refractory material (size: 50 mm x 50 mm x 30)
mm), and these are placed in a furnace at 1200 ° C. for 10 vol.
By exposing to a N 2 gas atmosphere containing 1% SiCl 4 for one month, the deterioration rate was evaluated from the weight loss and surface observation. FIG. 1 shows the relationship between the firing temperature of the refractory material and the amount of weight reduction based on the results. The deterioration rate of the refractory material rapidly decreases when the firing temperature of the refractory material exceeds 1300 ° C. It can be seen that the reaction hardly progressed at 1500 ° C.
【００１１】また、図２は上記成分のセラミック材料を
１２５０℃と１５００℃でそれぞれ焼成して得られた耐
火材の上記試験後の表面写真である。この写真から判る
ように、高温（１５００℃）で焼成した耐火材はほとん
ど劣化していないのに対し、低温（１２５０℃）で焼成
した耐火材は表面が脆化していることが判る。また、図
１および図２に示されるような結果は、ＳｉＯ2系の耐
火材やＡｌ2Ｏ3系の耐火材についても同様に得られた。
このため本発明の連続浸珪処理設備では、浸珪処理炉内
の耐火材として、ＳｉＯ2およびＡｌ2Ｏ3の１種または
２種を主体としたセラミック材料を１３００℃以上、好
ましくは１５００℃以上の温度で焼成して得られた耐火
材を用いる。FIG. 2 is a photograph of the surface of the refractory material obtained by firing the ceramic material of the above components at 1250 ° C. and 1500 ° C., respectively, after the above test. As can be seen from this photograph, the refractory material fired at a high temperature (1500 ° C.) hardly deteriorates, whereas the refractory material fired at a low temperature (1250 ° C.) has a brittle surface. The results shown in FIGS. 1 and 2 were similarly obtained with respect to the SiO 2 -based refractory material and the Al 2 O 3 -based refractory material.
For this reason, in the continuous siliconizing treatment equipment of the present invention, as a refractory material in the siliconizing treatment furnace, a ceramic material mainly composed of one or two of SiO 2 and Al 2 O 3 is used at 1300 ° C. or more, preferably 1500 ° C. The refractory material obtained by firing at the above temperature is used.
【００１２】この耐火材はＳｉＯ2およびＡｌ2Ｏ3の１
種または２種を主体とするものであり、これらの酸化物
を合計で８０ｗｔ％以上、好ましくは９０ｗｔ％以上含
有している必要がある。ＳｉＯ2とＡｌ2Ｏ3の合計含有
量が８０ｗｔ％未満では、ＳｉＯ2、Ａｌ2Ｏ3以外の残
部成分の劣化が進み、最終的に耐火材全体が脆化してし
まう。また、耐火材はＳｉＯ2とＡｌ2Ｏ3の両方を含
み、ＳｉＯ2とＡｌ2Ｏ3の合計量に対するＳｉＯ2の含有
率が２５〜８０ｗｔ％に調整されたものが最も好まし
く、このような耐火材はＳｉＣｌ4との反応性が小さく
且つ亀裂も生じにくいため、最も優れた耐久性を示す。This refractory material is one of SiO 2 and Al 2 O 3 .
It is mainly composed of one or two kinds, and it is necessary to contain these oxides in total of 80% by weight or more, preferably 90% by weight or more. If the total content of SiO 2 and Al 2 O 3 is less than 80% by weight, the remaining components other than SiO 2 and Al 2 O 3 will deteriorate, and eventually the entire refractory material will be embrittled. Further, the refractory material includes both SiO 2 and Al 2 O 3, and most preferably one content of SiO 2 is adjusted to 25～80Wt% to the total amount of SiO 2 and Al 2 O 3, like this The refractory material has the highest durability because it has low reactivity with SiCl 4 and hardly causes cracks.
【００１３】図３は、ＳｉＯ2とＡｌ2Ｏ3の配合比率が
異なる耐火材（いずれも１５００℃焼成材）の耐久試験
の結果を示している。この試験では、耐火材中のＳｉＯ
2＋Ａｌ2Ｏ3の含有量を９６ｗｔ％で一定とし、ＳｉＯ2
とＡｌ2Ｏ3の合計量に対するＳｉＯ2の含有率を種々変
えた耐火材（１００ｍｍ×１００ｍｍ×２５ｍｍ）を用
い、これら耐火材を浸珪処理炉（炉内温度１２００℃、
炉内雰囲気：２０ｖｏｌ％ＳｉＣｌ4−Ｎ2ガス雰囲気）
内で１年間使用した後の質量減少率と耐火材表面での亀
裂の発生を調べた。図３によれば、ＳｉＯ2とＡｌ2Ｏ3
の合計量に対するＳｉＯ2の含有率が８０ｗｔ％を超え
ると耐火材の熱膨張率が大きくなるため、昇温や降温時
の熱膨張、収縮により亀裂が入りやすくなる。一方、Ｓ
ｉＯ2とＡｌ2Ｏ3の合計量に対するＳｉＯ2の含有率が２
５ｗｔ％未満となると、ＳｉＣｌ4との反応性が小さい
ＳｉＯ2による耐火材の耐久性が十分に得られなくな
り、ＳｉＣｌ4との反応による耐火材の劣化速度が進ん
でしまう。FIG. 3 shows the results of a durability test of refractory materials having different mixing ratios of SiO 2 and Al 2 O 3 (all fired at 1500 ° C.). In this test, the SiO in refractory material was
The content of the 2 + Al 2 O 3 was fixed at 96 wt%, SiO 2
And a refractory material (100 mm × 100 mm × 25 mm) in which the content of SiO 2 with respect to the total amount of Al 2 O 3 was varied, and these refractory materials were subjected to a siliconizing furnace (inner temperature of 1200 ° C.,
Furnace atmosphere: 20vol% SiCl 4 -N 2 gas atmosphere)
After one year of use, the mass loss rate and the occurrence of cracks on the surface of the refractory material were examined. According to FIG. 3, SiO 2 and Al 2 O 3
When the content of SiO 2 with respect to the total amount exceeds 80 wt%, the thermal expansion coefficient of the refractory material becomes large, so that cracks are easily formed due to thermal expansion and contraction at the time of temperature rise and temperature decrease. On the other hand, S
The content ratio of SiO 2 to the total amount of iO 2 and Al 2 O 3 is 2
If the content is less than 5 wt%, the durability of the refractory material due to SiO 2 having low reactivity with SiCl 4 will not be sufficiently obtained, and the degradation rate of the refractory material due to the reaction with SiCl 4 will increase.
【００１４】また、本発明では上記のような耐火材の表
面に、ＳｉＣｌ4と反応しないＳｉＯ2系またはＳｉＯ2
−Ａｌ2Ｏ3系の材料をコーティングするか若しくは含浸
させることができ、これにより耐火材のＳｉＣｌ4に対
する耐久性をさらに高めることができる。ここで、表面
にＳｉＯ2またはＳｉＯ2＋Ａｌ2Ｏ3をコーティングした
耐火材は、焼成前の耐火材の表面に、例えばＳｉＯ2粉
末またはＳｉＯ2粉末とＡｌ2Ｏ3粉末を混合したものを
水または有機溶剤（アルコール等）に溶かしたコーティ
ング剤を塗布した後、１３００℃以上の温度で焼き固め
ることにより、また、表面にＳｉＯ2またはＳｉＯ2＋Ａ
ｌ2Ｏ3を含浸処理を施した耐火材は、焼成前の耐火材の
表面に、例えばＳｉＯ2粉末またはＳｉＯ2粉末とＡｌ2
Ｏ3粉末を混合したものを溶剤に溶かした含浸液を滲み
込ませた後、１３００℃以上の温度で焼き固めることに
より、それぞれ製造することができる。また、場合によ
っては、耐火材を１３００℃以上で焼成した後、上記コ
ーティングまたは含浸処理を行い、しかる後、これらコ
ーティング剤または含浸剤を焼き固める熱処理を行って
もよい。In the present invention, the surface of the refractory material as described above is coated on a surface of a SiO 2 or SiO 2 which does not react with SiCl 4.
-Al 2 O 3 based material can be either coated or impregnated with a, thereby further enhancing the durability against SiCl 4 of refractory material. Here, the refractory material whose surface is coated with SiO 2 or SiO 2 + Al 2 O 3 is obtained by adding, for example, SiO 2 powder or a mixture of SiO 2 powder and Al 2 O 3 powder to the surface of the refractory material before firing. Alternatively, a coating agent dissolved in an organic solvent (alcohol or the like) is applied and then baked at a temperature of 1300 ° C. or more, and the surface is made of SiO 2 or SiO 2 + A.
The refractory material impregnated with l 2 O 3 is coated on the surface of the refractory material before firing, for example, with SiO 2 powder or SiO 2 powder and Al 2 O 3.
Each of them can be manufactured by infiltrating an impregnating solution in which a mixture of O 3 powder is dissolved in a solvent, and then baking at a temperature of 1300 ° C. or more. Further, in some cases, after the refractory material is fired at 1300 ° C. or higher, the above-mentioned coating or impregnating treatment may be performed, and thereafter, a heat treatment for baking and solidifying these coating agents or impregnating agents may be performed.
【００１５】このようなＳｉＯ2またはＳｉＯ2＋Ａｌ2
Ｏ3のコーティング若しくは含浸処理を施した耐火材の
耐久性を確認するため、ＳｉＯ2−Ａｌ2Ｏ3系（Ｓｉ
Ｏ2：４４ｗｔ％，Ａｌ2Ｏ3：５２ｗｔ％）の耐火材料
に、上記した方法でＳｉＯ2とＳｉＯ2＋Ａｌ2Ｏ3のコー
ティングをそれぞれ施した後、１５００℃で焼成して得
られた耐火材と、同じくＳｉＯ2の含浸処理を施した
後、１５００℃で焼成して得られた耐火材をそれぞれ製
作し（耐火材のサイズ：１００ｍｍ×１００ｍｍ×２５
ｍｍ）、図１と同様の試験を実施して質量減少量から劣
化速度を評価した。また、比較のため上記コーティング
や含浸処理を施さない耐火材（１５００℃焼成材）につ
いても同様の試験を行った。その結果を図４に示す。図
４によればＳｉＯ2またはＳｉＯ2＋Ａｌ2Ｏ3のコーティ
ングや含浸処理を施した耐火材は、これらの処理を施さ
ない耐火材（未処理品）に較べて劣化速度がより低減化
されていることが判る。Such SiO 2 or SiO 2 + Al 2
To confirm the durability of the coating or impregnation alms refractory material O 3, SiO 2 -Al 2 O 3 system (Si
O 2 : 44 wt% and Al 2 O 3 : 52 wt%) are coated with SiO 2 and SiO 2 + Al 2 O 3 by the above-described method, and then fired at 1500 ° C. Material and similarly impregnated with SiO 2 and fired at 1500 ° C. to produce refractory materials (size of refractory material: 100 mm × 100 mm × 25).
mm) and the same test as in FIG. 1 was performed to evaluate the rate of deterioration from the amount of mass loss. For comparison, a similar test was performed on a refractory material (1500 ° C. fired material) not subjected to the above-mentioned coating or impregnation treatment. FIG. 4 shows the results. According to FIG. 4 SiO 2 or SiO 2 + Al 2 O 3 coating or impregnation alms refractory material, is further reduced deterioration rate compared with the refractory material not subjected to these processes (untreated) It turns out that there is.
【００１６】[0016]
【実施例】図５に示す連続浸珪処理ラインの浸珪処理炉
において、炉内の側壁をＳｉＯ2：５３％、Ａｌ2Ｏ3：
４３％の組成のキャスタブルの表面にＳｉＯ2を含浸さ
せて１５００℃で焼き固めた本発明の耐火材で構成し、
実操業を行って１年経過後及び２年経過後における耐火
材の劣化状況を調査した。この劣化状況の調査は、質量
減少率を測定することにより行った。図６はその結果を
示したものであり、いずれの耐火材も２年の操業を経た
後でも劣化はほとんど進行しておらず、また、表面を観
察した結果でも脆化はほとんど生じていなかった。EXAMPLE In the siliconizing furnace of the continuous siliconizing line shown in FIG. 5, the side wall in the furnace was made of SiO 2 : 53%, Al 2 O 3 :
A castable having a composition of 43% is impregnated with SiO 2 on the surface and is made of the refractory material of the present invention baked at 1500 ° C.,
The state of deterioration of the refractory material after one year and two years after the actual operation was examined. Investigation of this deterioration state was performed by measuring the mass reduction rate. FIG. 6 shows the results. In any of the refractory materials, deterioration has hardly progressed even after two years of operation, and even when the surface was observed, little embrittlement occurred. .
【００１７】[0017]
【発明の効果】以上述べた本発明の連続浸珪処理設備に
よれば、浸珪処理炉が安価で且つ高温の塩化珪素ガスに
対して高度の耐久性を備えた炉内耐火材を備えているた
め、設備の劣化等を生じることなく長期間安定した操業
が可能であるとともに、設備コストも低減させることが
できる。According to the continuous siliconizing treatment equipment of the present invention described above, the siliconizing treatment furnace is provided with a refractory material in the furnace which is inexpensive and has high durability against high-temperature silicon chloride gas. Therefore, stable operation can be performed for a long time without deterioration of the equipment, and equipment cost can be reduced.
【図１】ＳｉＯ2−Ａｌ2Ｏ3系耐火材の焼成温度と浸珪
処理炉の炉材として使用した場合の質量減少量との関係
を示すグラフFIG. 1 is a graph showing the relationship between the firing temperature of a SiO 2 —Al 2 O 3 refractory material and the amount of mass loss when used as a furnace material for a siliconizing furnace.
【図２】１２５０℃と１５００℃でそれぞれ焼成したＳ
ｉＯ2−Ａｌ2Ｏ3系耐火材について、浸珪処理炉内で使
用した後の表面性状を示す写真FIG. 2 S fired at 1250 ° C. and 1500 ° C., respectively.
Photograph showing surface properties of iO 2 -Al 2 O 3 refractory material after use in a siliconizing furnace
【図３】ＳｉＯ2とＡｌ2Ｏ3の合計量に対するＳｉＯ2含
有率が異なる耐火材を浸珪処理炉の炉材とした場合にお
いて、ＳｉＯ2含有率と耐火材の質量減少率および亀裂
発生個数との関係を示すグラフFIG. 3 shows a case where refractory materials having different SiO 2 contents with respect to the total amount of SiO 2 and Al 2 O 3 are used as a furnace material of a siliconizing furnace, a SiO 2 content ratio, a mass reduction rate of the refractory materials, and crack generation. Graph showing the relationship with the number
【図４】表面にＳｉＯ2またはＳｉＯ2＋Ａｌ2Ｏ3をコー
ティング若しくは含浸させたＳｉＯ2−Ａｌ2Ｏ3系耐火
材とこのような処理を施さない耐火材について、浸珪処
理炉に適用した際の質量減少量を示すグラフFIG. 4 shows a SiO 2 -Al 2 O 3 refractory material whose surface is coated or impregnated with SiO 2 or SiO 2 + Al 2 O 3 , and a refractory material not subjected to such treatment, which were applied to a siliconizing furnace. Graph showing the amount of mass loss at the time of
【図５】実施例で用いた連続浸珪処理設備を模式的に示
す説明図FIG. 5 is an explanatory view schematically showing a continuous siliconizing treatment facility used in the examples.
【図６】実施例の耐火材を浸珪処理炉で用いた際の質量
減少率を経時的に示すグラフFIG. 6 is a graph showing the time-dependent mass reduction rate when the refractory material of the example is used in a siliconizing furnace.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 笠井 勝司 東京都千代田区丸の内一丁目１番２号 日本鋼管株式会社内 (56)参考文献 特開 平８−169750（ＪＰ，Ａ) 特開 昭63−147859（ＪＰ，Ａ) 特開 昭63−151664（ＪＰ，Ａ) 特開 昭62−227078（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) C23C 10/08 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Katsuji Kasai 1-2-1 Marunouchi, Chiyoda-ku, Tokyo Nippon Kokan Co., Ltd. (56) References JP-A-8-169750 (JP, A) JP-A-63 -1447859 (JP, A) JP-A-63-151664 (JP, A) JP-A-62-227078 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C23C 10/08
Claims (3)
理する連続浸珪処理設備において、浸珪処理炉内の耐火
材として、ＳｉＯ2およびＡｌ2Ｏ3の１種または２種を
合計で８０ｗｔ％以上含むセラミック材料を１３００℃
以上の温度で焼成して得られた耐火材を用いることを特
徴とする鋼帯の連続浸珪処理設備。In a continuous siliconizing treatment facility for continuously siliconizing a steel strip by a gas siliconizing method, one or two types of SiO 2 and Al 2 O 3 are used as refractory materials in a siliconizing furnace. 1300 ° C ceramic material containing 80% by weight or more in total
A facility for continuous siliconizing of steel strip, characterized by using a refractory material obtained by firing at the above temperature.
ＳｉＯ2とＡｌ2Ｏ3の合計量に対するＳｉＯ2の含有率が
２５〜８０ｗｔ％であることを特徴とする請求項１に記
載の鋼帯の連続浸珪処理設備。2. The refractory material includes SiO 2 and Al 2 O 3 ,
2. The continuous stripping equipment for steel strip according to claim 1, wherein the content of SiO 2 with respect to the total amount of SiO 2 and Al 2 O 3 is 25 to 80 wt%. 3.
Ｏ2−Ａｌ2Ｏ3系の材料をコーティングするか若しくは
含浸させた耐火材であることを特徴とする請求項１また
は２に記載の鋼帯の連続浸珪処理設備。3. The refractory material is made of SiO 2 or Si on the surface.
O 2 -Al 2 steel strip continuous siliconizing treatment facility according to claim 1 or 2, characterized in that the O 3 based material is one or refractory material impregnated coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32075796A JP3259646B2 (en) | 1996-11-15 | 1996-11-15 | Continuous siliconizing equipment for steel strip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32075796A JP3259646B2 (en) | 1996-11-15 | 1996-11-15 | Continuous siliconizing equipment for steel strip |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10147856A JPH10147856A (en) | 1998-06-02 |
| JP3259646B2 true JP3259646B2 (en) | 2002-02-25 |
Family
ID=18124934
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32075796A Expired - Fee Related JP3259646B2 (en) | 1996-11-15 | 1996-11-15 | Continuous siliconizing equipment for steel strip |
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| KR101190826B1 (en) | 2010-01-06 | 2012-10-12 | 한국전력공사 | The method for producing high silicon steels with a clean surface |
| WO2011052858A1 (en) * | 2009-10-30 | 2011-05-05 | 한국전력공사 | High-silicon steel sheet production method and high-silicon steel sheet produced using the same |
| JP5994754B2 (en) * | 2013-08-23 | 2016-09-21 | Ｊｆｅスチール株式会社 | Silica treatment equipment |
| JP6747520B2 (en) | 2017-09-12 | 2020-08-26 | Ｊｆｅスチール株式会社 | Refractories for furnaces using silicon chloride gas |
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1996
- 1996-11-15 JP JP32075796A patent/JP3259646B2/en not_active Expired - Fee Related
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|---|---|
| JPH10147856A (en) | 1998-06-02 |
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