JP3231295B2 - Metal base circuit board - Google Patents

Metal base circuit board

Info

Publication number
JP3231295B2
JP3231295B2 JP20753699A JP20753699A JP3231295B2 JP 3231295 B2 JP3231295 B2 JP 3231295B2 JP 20753699 A JP20753699 A JP 20753699A JP 20753699 A JP20753699 A JP 20753699A JP 3231295 B2 JP3231295 B2 JP 3231295B2
Authority
JP
Japan
Prior art keywords
insulating layer
foil
circuit board
metal
conductive foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP20753699A
Other languages
Japanese (ja)
Other versions
JP2001036204A (en
Inventor
克憲 八島
裕 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP20753699A priority Critical patent/JP3231295B2/en
Publication of JP2001036204A publication Critical patent/JP2001036204A/en
Application granted granted Critical
Publication of JP3231295B2 publication Critical patent/JP3231295B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、通信機を初めとす
る各種の電気機器、特に自動車や移動通信等の移動機器
に用いられる半導体搭載用の金属ベース回路基板に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal-based circuit board for mounting a semiconductor used in various electric devices such as a communication device, in particular, a mobile device such as an automobile or mobile communication.

【0002】[0002]

【従来の技術】いろいろな電気機器用途で、半導体素子
等の電子部品を搭載した回路基板が用いられており、安
価で熱放散性に優れることから、金属板上に、無機物を
含有した樹脂からなる絶縁層を介して、金属箔から形成
された回路を積層した金属ベース回路基板が用いられて
いる。
2. Description of the Related Art A circuit board on which electronic components such as semiconductor elements are mounted is used in various electric equipment applications, and since it is inexpensive and has excellent heat dissipation properties, a resin containing an inorganic substance is formed on a metal plate. A metal-based circuit board has been used in which circuits formed of metal foil are stacked via an insulating layer.

【0003】金属ベース回路基板は、前記構造を有する
が故に、絶縁層の熱伝導特性、耐電圧特性、更に、金属
板や導電箔との接着性といった多くの特性面で制約を受
けるので、金属ベース回路基板の特性改善に於いては重
要な検討因子となっている。
[0003] Since the metal-based circuit board has the above structure, it is limited in many aspects such as the heat conduction property of the insulating layer, the withstand voltage property, and the adhesiveness to the metal plate or the conductive foil. This is an important factor in improving the characteristics of the base circuit board.

【0004】例えば特開平6−44824号公報には、
高純度ビスフェノールA型エポキシ樹脂を用いることに
より、高熱伝導性、高ガラス転移点、放熱性に優れ、か
つ高温度下での電気的信頼性の高い回路基板用絶縁接着
組成物が開示されている。
For example, Japanese Patent Application Laid-Open No. Hei 6-44824 discloses that
By using a high-purity bisphenol A type epoxy resin, an insulating adhesive composition for a circuit board that has high thermal conductivity, a high glass transition point, excellent heat dissipation, and high electrical reliability under high temperature is disclosed. .

【0005】また、特開平5−29490号公報には、
導電箔として知られているアルミニウム-銅クラット箔
の箔足を規定することにより、高耐電圧および高ピール
強度が得られることが開示されている。
Further, Japanese Patent Application Laid-Open No. 5-29490 discloses that
It is disclosed that by defining a foil foot of an aluminum-copper clat foil known as a conductive foil, a high withstand voltage and a high peel strength can be obtained.

【0006】[0006]

【発明が解決しようとする課題】近年、自動車等に用い
られている半導体搭載用回路基板は、半導体部品や電気
部品、更に回路部分についても高密度化、高実装化の要
求が益々高まっている。そして、これらの回路基板上に
ダイオード、トランジスターおよびICなどの部品を実
装したモジュールでは、前記部品或いは回路自身から発
生した熱を放散するために、より一層放熱特性に優れ
る、高い電気的信頼性を有する回路基板が要請されてい
る。
In recent years, in circuit boards for mounting semiconductors used in automobiles and the like, demands for higher density and higher mounting of semiconductor parts, electric parts, and circuit parts have been increasing. . Modules with components such as diodes, transistors, and ICs mounted on these circuit boards dissipate the heat generated by the components or the circuit itself. There is a demand for a circuit board having the same.

【0007】従来の金属ベース回路基板では、上述のと
おりに導電箔と絶縁層との接着力確保するために導電箔
の絶縁層に接する側の箔足を特定の長さとするが、この
為に、耐絶縁性等の電気特性を確保する必要から、無機
物を含有する樹脂からなる絶縁層は100μmより厚く
形成されている。そして、熱放散性を高めようとして絶
縁層厚さを薄くしようとすると耐電圧等の電気特性が劣
化するという問題がある。つまり、絶縁層が100μm
未満で熱放散性に優れ、しかも従来のものと同等の電気
信頼性を有する金属ベース回路基板を得ることができな
かった。
In a conventional metal-based circuit board, as described above, the foil foot on the side in contact with the insulating layer of the conductive foil has a specific length in order to secure the adhesive strength between the conductive foil and the insulating layer. The insulating layer made of a resin containing an inorganic substance is formed thicker than 100 μm in order to secure electrical characteristics such as insulation resistance. If the thickness of the insulating layer is reduced in order to increase the heat dissipation, there is a problem that the electric characteristics such as the withstand voltage are deteriorated. That is, the insulating layer is 100 μm
It was not possible to obtain a metal-based circuit board which was excellent in heat dissipation and less than the conventional one and had the same electrical reliability as the conventional one.

【0008】本発明らは、上記の事情に鑑みて、いろい
ろ実験的に検討した結果、絶縁層の構造と導電箔の表面
状況とが特定の関係をとるときに、従来の電気特性を有
しつつ、絶縁層厚さを従来より薄くして放熱特性を改善
できるという知見を得て、本発明に至ったものである。
In view of the above circumstances, the present inventors have conducted various experimental studies, and have found that when the structure of the insulating layer and the surface condition of the conductive foil take a specific relationship, they have the conventional electrical characteristics. On the other hand, the present inventors have found that the thickness of the insulating layer can be made thinner than before so as to improve the heat radiation characteristics, and have reached the present invention.

【0009】[0009]

【課題を解決するための手段】本発明は、金属板に無機
物を含有するエポキシ樹脂からなる絶縁層を介して導電
箔を積層し、前記導電箔をエッチングして回路形成して
なる金属ベース回路基板であって、前記無機物が平均粒
子径5〜50μmの粒子60〜80vol%と平均粒子
径0.2〜1.5μmの粒子40〜20vol%からな
り、前記絶縁層は多層構造を有していて全厚みが50〜
90μmであり、しかも前記絶縁層の導電箔に接する側
の表層の厚みが前記導電箔の絶縁層に接する側の箔足の
長さよりも厚く、導電箔の絶縁層に接する側の面の箔足
の長さが0.5〜40μmであることを特徴とする金属
ベース回路基板である。
According to the present invention, there is provided a metal-based circuit comprising a metal plate, a conductive foil laminated on an insulating layer made of an epoxy resin containing an inorganic substance, and a circuit formed by etching the conductive foil. A substrate, wherein the inorganic substance has an average particle size.
60-80 vol% of particles having a diameter of 5-50 μm and average particles
Particles having a diameter of 0.2 to 1.5 μm and 40 to 20 vol%
The insulating layer has a multilayer structure and has a total thickness of 50 to
90 μm, and the thickness of the surface layer of the insulating layer that is in contact with the conductive layer is thicker than the length of the foil layer of the conductive layer that is in contact with the insulating layer; Is a metal base circuit board having a length of 0.5 to 40 μm.

【0010】[0010]

【発明の実施の形態】以下、図面に基づいて、本発明を
詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.

【0011】図1は、本発明の金属ベース回路基板の一
例の断面を示す面である。金属板1上に、多層構造を有
する絶縁層2を介して、回路形成されている導電箔3が
積そうされている。絶縁層2は、金属板1に接する側か
ら第1の絶縁層21、第2の絶縁層22から構成され、
最上層の第2の絶縁層22は導電箔3と接している。そ
して、導電箔3と接する側の表層となる第2の絶縁層2
2の厚さが導電箔3の絶縁層2と接する側の箔足の長さ
よりも厚く構成されている。なお、図1において、絶縁
層2が2層構造の場合を例示しているが、絶縁層2の表
層が前記構成を満足すれば3層以上の多層構造をとって
も良いことは当然である。
FIG. 1 is a sectional view showing an example of a metal-based circuit board according to the present invention. A conductive foil 3 on which a circuit is formed is stacked on a metal plate 1 via an insulating layer 2 having a multilayer structure. The insulating layer 2 is composed of a first insulating layer 21 and a second insulating layer 22 from the side in contact with the metal plate 1,
The uppermost second insulating layer 22 is in contact with the conductive foil 3. Then, the second insulating layer 2 serving as a surface layer on the side in contact with the conductive foil 3
2 is configured to be thicker than the length of the foil foot of the conductive foil 3 on the side in contact with the insulating layer 2. Although FIG. 1 illustrates the case where the insulating layer 2 has a two-layer structure, it is needless to say that the insulating layer 2 may have a multilayer structure of three or more layers if the surface layer satisfies the above configuration.

【0012】上記の構成を採用しているので、絶縁層2
の全体厚みが従来より薄い100μm未満となっても、
耐電圧等の電気特性が低下せず、特に、導電箔3を絶縁
層2に積層する際に、導電箔3の箔足の長さの影響を受
けて発生しやすい空隙の巻き込み等の現象により耐電圧
特性が低下することを防止するものである。
Since the above configuration is adopted, the insulating layer 2
Even if the overall thickness of the is less than 100 μm thinner than before,
The electric characteristics such as the withstand voltage do not decrease. In particular, when the conductive foil 3 is laminated on the insulating layer 2, it is caused by a phenomenon such as entrapment of a void which is likely to be generated under the influence of the length of the foil foot of the conductive foil 3. This is to prevent the withstand voltage characteristics from being lowered.

【0013】また、本発明の金属ベース回路基板におい
て、導電箔3の絶縁層2に接する側の面の箔足の長さが
0.5〜40μmである。前記箔足の長さが0.5μm
未満では、絶縁層と導電箔との接着力、即ちピール強度
が低下し、絶縁層と導電箔とが剥離してしまうことがあ
るし、40μmを超える場合には、箔足の先端部での電
界集中が生じるためか、金属ベース回路基板の実使用条
件下での長期的な電気信頼性に問題を生じることがあ
る。
Further, in the metal base circuit board of the present invention, the length of the foil leg side of the surface contacting the insulating layer 2 of the conductive foil 3 is Ru 0.5~40μm der. The length of the foil foot is 0.5 μm
If less than, the adhesive strength between the insulating layer and the conductive foil, that is, the peel strength is reduced, and the insulating layer and the conductive foil may be peeled off. Due to the electric field concentration, there may be a problem in long-term electrical reliability of the metal-based circuit board under actual use conditions.

【0014】本発明において、多層構造を有する絶縁層
2に関して、個々の絶縁層は同一組成のものであって
も、異なっていても構わない。絶縁層2の組成に関して
は、高熱伝導性を得るために無機物を含有する樹脂が用
いられる。無機物としては、例えば、アルミナ、シリ
カ、窒化硼素、窒化アルミニウム、窒化珪素等があげら
れ、樹脂としては、エポキシ樹脂、イミド樹脂等が挙げ
られる。
In the present invention, with respect to the insulating layer 2 having a multilayer structure, the individual insulating layers may have the same composition or may be different. Regarding the composition of the insulating layer 2, a resin containing an inorganic substance is used to obtain high thermal conductivity. Examples of the inorganic substance include alumina, silica, boron nitride, aluminum nitride, and silicon nitride. Examples of the resin include an epoxy resin and an imide resin.

【0015】絶縁層を構成する好ましい樹脂組成物とし
て、例えば特開平6−44824号公報に開示されてい
る、純度90%以上のビスフェノールA型エポキシ樹脂
10〜40vol%と無機質充填材90〜60vol%
からなり、その硬化体の熱伝導率が2.1〜7.5J/℃
・m・secであり、かつガラス転移温度が164〜240℃
の特徴を有する絶縁材が挙げられる。
As a preferable resin composition for forming the insulating layer, for example, 10 to 40 vol% of a bisphenol A type epoxy resin having a purity of 90% or more and 90 to 60 vol% of an inorganic filler disclosed in JP-A-6-44824.
And the thermal conductivity of the cured product is 2.1 to 7.5 J / ° C.
· M · sec and glass transition temperature of 164 to 240 ° C
An insulating material having the following characteristics:

【0016】また、前記無機物については、平均粒子径
5〜50μmの粒子60〜80vol%と平均粒子径
0.2〜1.5μmの粒子40〜20vol%(合計1
00vol%)からなり、さらには、平均粒径12〜2
0μmの粒子60〜80vol%と平均粒径0.6〜
0.8μmの粒子40〜20vol%からなる無機物が
良好である。
In addition, regarding the inorganic substance, 60 to 80 vol% of particles having an average particle diameter of 5 to 50 μm and 40 to 20 vol% of particles having an average particle diameter of 0.2 to 1.5 μm (total 1%)
00vol%) Tona is, furthermore, an average particle diameter of 12 to 2
0-μm particles 60-80 vol% and average particle diameter 0.6-
Inorganic substances composed of 40 to 20% by volume of 0.8 μm particles are good.

【0017】また、前記絶縁材には、必要に応じてシラ
ン系カップリング剤、チタネート系カップリング剤、安
定剤、硬化促進剤等を用いることができる。
In addition, a silane-based coupling agent, a titanate-based coupling agent, a stabilizer, a curing accelerator, and the like can be used as necessary for the insulating material.

【0018】本発明に用いる金属板1としては、良熱伝
導性を持つアルミニウムおよびアルミニウム合金、銅お
よび銅合金、鉄並びにステンレス等が使用可能であり、
また、金属板1の厚みとしては、特に制限はないが0.
5〜3.0mmが一般に用いられる。
As the metal plate 1 used in the present invention, aluminum and aluminum alloy, copper and copper alloy, iron, stainless steel, etc. having good thermal conductivity can be used.
The thickness of the metal plate 1 is not particularly limited, but is not limited to 0.1.
5-3.0 mm is commonly used.

【0019】本発明の金属ベース回路基板を得る方法に
就いては、金属板上に絶縁層を多数回塗布、乾燥を繰り
返し、銅、アルミニウム或いは銅−アルミニウム複合箔
等の金属箔を接合し、その後前記金属箔をエッチングし
て回路とする方法により、容易に得ることができる。ま
た、金属板に、多数層の絶縁層を接合後、予め回路形成
された金属箔を接着する方法によっても得ることができ
る。これらの方法の内、前者の方法は、多層構造の絶縁
層を工程条件を変更するのみで自由に設計製作できるの
で、多品種生産性に優れ、好ましい。
According to the method for obtaining a metal-based circuit board of the present invention, an insulating layer is repeatedly applied and dried on a metal plate, and a metal foil such as copper, aluminum or a copper-aluminum composite foil is joined. Thereafter, the metal foil can be easily obtained by etching the metal foil into a circuit. Alternatively, it can be obtained by a method in which a large number of insulating layers are joined to a metal plate, and then a metal foil formed in advance with a circuit is bonded. Among these methods, the former method is preferable because it can be freely designed and manufactured by simply changing the process conditions of the insulating layer having a multilayer structure, and therefore, is excellent in multi-product productivity.

【0020】[0020]

【実施例】〔実施例1〜5〕純度90%以上のビスフェ
ノールA型エポキシ樹脂(大日本インキ化学(株)、EP
CLON EXA-850CRP)25vol%にアルミナ(昭和電
工(株)、AS-30-1および住友化学(株)、AKP-1
5)75vol%を混合した絶縁材を準備し、厚み2.0
mmのアルミニウム板上に、前記絶縁材を所望厚さとな
るように塗布し、乾燥してBステージ状態とした後、更
に前記絶縁材を所望厚さとなるように塗布、乾燥してB
ステージ状態とし、その後厚さ85μmの銅と厚さ40
μmのアルミニウムからなる銅−アルミニウム複合箔を
銅が絶縁層に接するように接合し、加圧下で加熱して絶
縁材を硬化させて、金属ベース基板とした。尚、前記複
合箔の銅の箔足の長さは、平均16μmであり、最大値
は27μmであった。
Examples [Examples 1 to 5] Bisphenol A type epoxy resin having a purity of 90% or more (Dainippon Ink Chemical Co., Ltd., EP
CLON EXA-850CRP) 25 vol% alumina (Showa Denko KK, AS-30-1 and Sumitomo Chemical Co., Ltd., AKP-1
5) Prepare an insulating material mixed with 75 vol%, and set the thickness to 2.0.
mm on an aluminum plate, apply the insulating material to a desired thickness, dry it to a B-stage state, apply the insulating material to a desired thickness, and dry
Stage, then 85μm thick copper and 40mm thick
A copper-aluminum composite foil made of μm aluminum was joined so that copper was in contact with the insulating layer, and heated under pressure to cure the insulating material, thereby obtaining a metal base substrate. In addition, the length of the copper foil foot of the composite foil was 16 μm on average, and the maximum value was 27 μm.

【0021】前記のいろいろな金属ベース基板につい
て、所望の位置にエッチングレジストを印刷し、まず水
酸化ナトリウム水溶液をエッチング液として金属箔の所
望部分のアルミニウムをエッチングした後前記エッチン
グレジストを除去し、次に所望の位置をエッチングレジ
ストでマスクして硫酸−過酸化水素混合溶液をエッチン
グ液として銅をエッチングした後エッチングレジストを
除去し洗浄乾燥することで、回路を形成していろいろな
金属ベース回路基板を得た。
An etching resist is printed at a desired position on each of the various metal base substrates. First, aluminum is etched at a desired portion of the metal foil using an aqueous solution of sodium hydroxide as an etching solution, and then the etching resist is removed. Then, the desired position is masked with an etching resist, the copper is etched using a mixed solution of sulfuric acid and hydrogen peroxide as an etching solution, then the etching resist is removed, and the substrate is washed and dried, thereby forming circuits and forming various metal-based circuit boards. Obtained.

【0022】前記操作で得られた金属ベース基板或いは
金属ベース回路基板について、絶縁破壊強度と熱抵抗を
測定した。絶縁破壊強度の測定は、JIS C2110
に基づき、TOS−8700形(菊水電子工業(株)
製)を用いて行った。また、熱抵抗の測定は、前記金属
ベース基板を3.0×4.0cmに切断し、エッチングに
より1.0×1.0mmの銅パターンを形成した。この銅
箔上にTO−220型トランジスターを半田付けし、水
冷した放熱フィン上に放熱グリースを介して固定した。
トランジスターに通電し、発熱させることにより熱抵抗
値を測定した。
With respect to the metal base substrate or the metal base circuit board obtained by the above operation, the dielectric breakdown strength and the thermal resistance were measured. The measurement of dielectric breakdown strength is based on JIS C2110
Based on TOS-8700 (Kikusui Electronics Corporation)
Manufactured by Toshiba Corporation. For the measurement of the thermal resistance, the metal base substrate was cut into 3.0 × 4.0 cm, and a copper pattern of 1.0 × 1.0 mm was formed by etching. A TO-220 type transistor was soldered on the copper foil, and fixed on a water-cooled heat radiation fin via heat radiation grease.
The transistor was energized to generate heat, and the thermal resistance was measured.

【0023】[0023]

【表1】 [Table 1]

【0024】〔比較例〕また、比較の例としては、絶縁
層の導電箔に接する側の表層となる部分の長さを、導電
箔の箔足の長さより薄い20μmとしたこと以外は、実
施例1と同じ操作で得た金属ベース基板と金属ベース回
路基板を用意し、実施例と同じ評価を行った。この結果
を表1に併せて示した。
[Comparative Example] As a comparative example, the operation was carried out except that the length of the surface layer on the side of the insulating layer in contact with the conductive foil was set to 20 μm, which was smaller than the length of the foil foot of the conductive foil. A metal base substrate and a metal base circuit board obtained by the same operation as in Example 1 were prepared, and the same evaluation as in the example was performed. The results are shown in Table 1.

【0025】[0025]

【発明の効果】本発明の金属ベース回路基板は、従来得
られなかった、絶縁層が100μm未満で熱放散性に優
れ、しかも従来のものと同等の電気信頼性を有する金属
ベース回路基板であるので、従来受けていた用途の制限
が解消されるので、産業上極めて重要である。
The metal-based circuit board of the present invention is a metal-based circuit board which has not been obtained conventionally and has excellent heat dissipation with an insulating layer of less than 100 μm and has the same electrical reliability as the conventional one. Therefore, it is extremely important in industry since the limitation of the application which has been conventionally received is eliminated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の金属ベース回路基板の一例を示す断面
図。
FIG. 1 is a sectional view showing an example of a metal-based circuit board according to the present invention.

【符号の説明】[Explanation of symbols]

1 金属板 2 絶縁層 21 第1絶縁層 22 第2絶縁層 3 導電箔 Reference Signs List 1 metal plate 2 insulating layer 21 first insulating layer 22 second insulating layer 3 conductive foil

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】金属板に無機物を含有するエポキシ樹脂か
らなる絶縁層を介して導電箔を積層し、前記導電箔をエ
ッチングして回路形成してなる金属ベース回路基板であ
って、前記無機物が平均粒子径5〜50μmの粒子60
〜80vol%と平均粒子径0.2〜1.5μmの粒子
40〜20vol%からなり、前記絶縁層は多層構造を
有していて全厚みが50〜90μmであり、しかも前記
絶縁層の導電箔に接する側の表層の厚みが前記導電箔の
絶縁層に接する側の箔足の長さよりも厚く、導電箔の絶
縁層に接する側の面の箔足の長さが0.5〜40μmで
あることを特徴とする金属ベース回路基板。
1. A metal base circuit board formed by laminating a conductive foil on a metal plate via an insulating layer made of an epoxy resin containing an inorganic substance and etching the conductive foil to form a circuit, wherein the inorganic substance is Particles 60 having an average particle diameter of 5 to 50 μm
Particles having a mean particle size of 0.2 to 1.5 µm
The insulating layer has a multilayer structure, the total thickness is 50 to 90 μm, and the thickness of the surface layer of the insulating layer on the side in contact with the conductive foil is in contact with the insulating layer of the conductive foil. A metal base circuit board characterized in that it is thicker than the length of the foil foot on the side, and the length of the foil foot on the side in contact with the insulating layer of the conductive foil is 0.5 to 40 μm.
JP20753699A 1999-07-22 1999-07-22 Metal base circuit board Expired - Fee Related JP3231295B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20753699A JP3231295B2 (en) 1999-07-22 1999-07-22 Metal base circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20753699A JP3231295B2 (en) 1999-07-22 1999-07-22 Metal base circuit board

Publications (2)

Publication Number Publication Date
JP2001036204A JP2001036204A (en) 2001-02-09
JP3231295B2 true JP3231295B2 (en) 2001-11-19

Family

ID=16541363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20753699A Expired - Fee Related JP3231295B2 (en) 1999-07-22 1999-07-22 Metal base circuit board

Country Status (1)

Country Link
JP (1) JP3231295B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4631785B2 (en) * 2006-04-06 2011-02-16 パナソニック電工株式会社 Metal base circuit board, manufacturing method thereof, mounted component, and module

Also Published As

Publication number Publication date
JP2001036204A (en) 2001-02-09

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