JP3199208B2 - Organic rust-resistant copper foil and method for producing the same - Google Patents

Organic rust-resistant copper foil and method for producing the same

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Publication number
JP3199208B2
JP3199208B2 JP07631094A JP7631094A JP3199208B2 JP 3199208 B2 JP3199208 B2 JP 3199208B2 JP 07631094 A JP07631094 A JP 07631094A JP 7631094 A JP7631094 A JP 7631094A JP 3199208 B2 JP3199208 B2 JP 3199208B2
Authority
JP
Japan
Prior art keywords
copper foil
organic rust
resistance
triazole
amino
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP07631094A
Other languages
Japanese (ja)
Other versions
JPH07258870A (en
Inventor
裕二 手嶋
宗治 大原
俊子 横田
誠 土橋
進 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Priority to JP07631094A priority Critical patent/JP3199208B2/en
Publication of JPH07258870A publication Critical patent/JPH07258870A/en
Application granted granted Critical
Publication of JP3199208B2 publication Critical patent/JP3199208B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2222/00Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
    • C23C2222/20Use of solutions containing silanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は有機防錆処理銅箔および
その製造方法に関し、詳しくは有機防錆剤として3−ア
ミノ−1,2,4−トリアゾール、シランカップリング
剤、カルボン酸またはその誘導体からなる混合溶液を用
い、銅箔の両面に該混合溶液を塗布後、乾燥することに
よって、耐酸化性、引き剥し強さ、耐塩酸性、耐湿性お
よび半田濡れ性のいずれの特性も高い水準で具備する有
機防錆処理銅箔およびその製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an organic rust-preventive copper foil and a method for producing the same, and more particularly to 3-amino-1,2,4-triazole, silane coupling agent, carboxylic acid or carboxylic acid as an organic rust preventive. By using a mixed solution consisting of a derivative and applying the mixed solution on both sides of the copper foil and then drying, all of the properties of oxidation resistance, peeling strength, hydrochloric acid resistance, moisture resistance and solder wettability are at a high level. And a method for producing the same.

【0002】[0002]

【従来の技術】従来の銅箔に対する表面処理は、基材と
の引き剥し強さの確保および耐熱耐酸化性、回路基板材
料としての要求特性(耐塩酸性、耐湿性、半田濡れ性
等)を満足させるため、亜鉛またはその合金をめっきし
た後、クロメート処理、さらにシランカップリング剤処
理をする等の非常に多数の工程を必要とした。また、そ
の際に使用するめっき浴の管理等が必要となり極めて煩
雑である。一方、銅箔の平滑面ではこれらの処理が強く
かかりすぎた場合には半田濡れ性に問題が生じる等の課
題もある。
2. Description of the Related Art Conventional surface treatment of copper foil is required to ensure peeling strength with a substrate, heat and oxidation resistance, and characteristics required for a circuit board material (hydrochloric acid resistance, moisture resistance, solder wettability, etc.). In order to satisfy these requirements, a very large number of steps such as plating with zinc or an alloy thereof, chromate treatment, and silane coupling agent treatment were required. In addition, management of the plating bath used at that time is required, which is extremely complicated. On the other hand, if these treatments are applied too strongly on the smooth surface of the copper foil, there are also problems such as a problem in solder wettability.

【0003】一方、銅および銅合金への有機防錆処理方
法として、従来よりベンゾトリアゾール(BTA)およ
びその誘導体が公知であり広く用いられている。また、
銅箔に対しての有機防錆剤の利用例としては保管用の一
時防錆処理として上記したBTA処理が用いられてきて
いる。
On the other hand, benzotriazole (BTA) and its derivatives have been known and widely used as an organic rust preventive treatment method for copper and copper alloys. Also,
As an example of the use of an organic rust preventive for copper foil, the above-mentioned BTA treatment has been used as a temporary rust preventive treatment for storage.

【0004】最近は耐熱性のある有機防錆剤としてカル
ボキシベンゾトリアゾール(“「防錆管理」、1993
年11月号、第417頁”)や3−アミノ−1,2,4
−トリアゾールを含む各種BTA誘導体(“「防錆管
理」、1993年11月号、第412頁)が検討されて
いる。
Recently, carboxybenzotriazole (“Rust Prevention Control”, 1993) has been used as an organic rust inhibitor having heat resistance.
November, p. 417 ") and 3-amino-1,2,4
Various BTA derivatives containing triazole (“Rust Control”, November 1993, p. 412) are being studied.

【0005】これらの有機防錆処理は、防錆剤を含有す
る水溶液を銅箔に塗布するという非常に簡便な方法で良
好な防錆効果が得られるため、防錆のための工程が短く
なると共に液管理も容易となり、工程管理上およびコス
ト低減の面からもその実用化が望まれている。
In these organic rust preventive treatments, a good rust preventive effect can be obtained by a very simple method of applying an aqueous solution containing a rust preventive agent to a copper foil, so that the process for rust preventive is shortened. At the same time, liquid management becomes easy, and its practical use is desired from the viewpoint of process management and cost reduction.

【0006】しかしながら、銅箔の主たる用途である回
路基板材料の分野においては、回路基材との接着に加熱
プレスを用いるため、180℃前後での耐熱耐酸化性が
必要とされる。従来のBTAにおいては100℃を超え
ると急激に耐酸化性が低下することが知られている。
[0006] However, in the field of circuit board materials, which is a main use of copper foil, a heat press is used for bonding to a circuit substrate, so that heat resistance and oxidation resistance at about 180 ° C are required. It is known that the oxidation resistance of conventional BTA rapidly decreases when the temperature exceeds 100 ° C.

【0007】また、前述のカルボキシベンゾトリアゾー
ル、3−アミノ−1,2,4−トリアゾール等のBTA
誘導体は200℃前後までの耐熱耐酸化性は向上する
が、これらの化合物で処理した銅箔は回路基材との引き
剥し強さが低下し1.0kg/cm以下となるため、J
IS規格の1.43kg/cmに比較して著しく低く実
用性がない。
Also, BTA such as carboxybenzotriazole and 3-amino-1,2,4-triazole described above.
Derivatives have improved heat and oxidation resistance up to around 200 ° C., but the copper foil treated with these compounds has a lower peel strength with the circuit substrate of 1.0 kg / cm or less.
It is significantly lower than 1.43 kg / cm of the IS standard and is not practical.

【0008】さらに、これらの化合物を単独で処理した
場合は、半田濡れ性は有機物であるためか非常に良好で
あるものの、回路基板材料として要求される耐塩酸性、
耐湿性等の特性の大部分を満足させることはできない。
例えば耐塩酸性(0.8mm幅回路を1:1塩酸溶液中
に30分浸漬後の引き剥し強さの劣化率で評価)は40
%にも達し、上記した通常の処理銅箔の耐塩酸性が10
%以下であるのに比較して著しく大きい。また、耐湿性
(0.8mm幅回路を沸騰純水中に2時間浸漬後の引き
剥し強さの劣化率で評価)も25%となり、通常の処理
銅箔の耐湿性が10%以下であるのに比較して著しく大
きい。
Further, when these compounds are treated alone, the solder wettability is very good, probably because of the organic matter, but the hydrochloric acid resistance required as a material of the circuit board,
Most of the properties such as moisture resistance cannot be satisfied.
For example, the hydrochloric acid resistance (evaluated by the deterioration rate of the peeling strength after immersing a 0.8 mm width circuit in a 1: 1 hydrochloric acid solution for 30 minutes) is 40.
%, And the hydrochloric acid resistance of the ordinary treated copper foil described above is 10%.
%, Which is remarkably large as compared with the value of not more than%. Further, the moisture resistance (evaluated by the deterioration rate of the peeling strength after immersing the 0.8 mm width circuit in boiling pure water for 2 hours) is 25%, and the moisture resistance of the ordinary treated copper foil is 10% or less. Significantly larger than

【0009】[0009]

【発明が解決しようとする課題】本発明は、これら従来
技術の課題を解決し、200℃前後での耐熱耐酸化性を
維持すると共に、回路基板材料として必要な基材との引
き剥し強さを確保し、さらに回路基板材料として要求さ
れる耐塩酸性、耐湿性、半田濡れ性等の特性を満足する
有機防錆処理銅箔およびその簡便かつ安価な製造方法を
提供することを目的とする。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems of the prior art, maintains the heat-resistant oxidation resistance at about 200 ° C., and has a peel strength with a substrate required as a circuit board material. It is an object of the present invention to provide an organic rust-prevention-treated copper foil satisfying characteristics such as hydrochloric acid resistance, moisture resistance, and solder wettability required as a circuit board material, and a simple and inexpensive manufacturing method thereof.

【0010】[0010]

【課題を解決するための手段】本発明の上記目的は、次
に示す銅箔によって達成される。
The above object of the present invention is achieved by the following copper foil.

【0011】すなわち、本発明の有機防錆処理銅箔は、
銅箔の両面に、3−アミノ−1,2,4−トリアゾー
ル、シランカップリング剤カルボン酸またはその誘導体
からなる有機防錆剤が塗布されていることを特徴とす
る。
That is, the organic rust-preventive copper foil of the present invention comprises:
An organic rust inhibitor comprising 3-amino-1,2,4-triazole, a silane coupling agent carboxylic acid or a derivative thereof is coated on both surfaces of the copper foil.

【0012】本発明で用いる有機防錆剤は、3−アミノ
−1,2,4−トリアゾールを主成分とし、これにシラ
ンカップリング剤およびカルボン酸を加えた混合溶液で
ある。3−アミノ−1,2,4−トリアゾールを主成分
とするのは、200℃の雰囲気下で1時間放置しても酸
化しないという特性を利用するためである。3−アミノ
−1,2,4−トリアゾールの濃度は10mmol/L
〜0.5mol/Lが好ましい。濃度が10mmol/
L未満では耐熱耐酸化性が発揮されず、0.5mol/
Lを超えると耐熱耐酸化性はそれ以上向上せず、かつコ
スト高となり経済的に不利である。
The organic rust inhibitor used in the present invention is a mixed solution containing 3-amino-1,2,4-triazole as a main component and a silane coupling agent and a carboxylic acid added thereto. The reason that 3-amino-1,2,4-triazole is used as a main component is to utilize the property that it is not oxidized even when left at 200 ° C. for one hour. The concentration of 3-amino-1,2,4-triazole is 10 mmol / L
-0.5 mol / L is preferable. The concentration is 10 mmol /
If it is less than L, heat resistance and oxidation resistance are not exhibited, and 0.5 mol /
If it exceeds L, the heat and oxidation resistance will not be further improved, and the cost will increase, which is economically disadvantageous.

【0013】シランカップリング剤としてはγ−(メタ
クリロキシプロピル)トリメトキシシラン、β−(3,
4−エポキシシクロヘキシル)エチルトリメトキシシラ
ン、γ−グリシドキシプロピルトリメトキシシラン、N
−β(アミノエチル)γ−アミノプロピルジメトキシシ
ラン、N−β(アミノエチル)γ−アミノプロピルトリ
メトキシシラン、γ−アミノプロピルトリエトキシシラ
ン、N−フェニル−γ−アミノプロピルトリメトキシシ
ラン等が使用可能である。シランカップリング剤の濃度
は1g/L〜10g/Lが好ましい。濃度が1g/L未
満では耐熱性が低下するのみならず、引き剥し強さや回
路基板材料の要求特性も低下し、10g/Lを超えると
回路基板材料の要求特性の低下が見られる。
As silane coupling agents, γ- (methacryloxypropyl) trimethoxysilane, β- (3,
4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, N
-Β (aminoethyl) γ-aminopropyldimethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, etc. are used. It is possible. The concentration of the silane coupling agent is preferably from 1 g / L to 10 g / L. When the concentration is less than 1 g / L, not only the heat resistance is reduced, but also the peeling strength and the required characteristics of the circuit board material are reduced. When the concentration exceeds 10 g / L, the required characteristics of the circuit board material are reduced.

【0014】カルボン酸またはその誘導体としてはジカ
ルボン酸、トリカルボン酸またはこれらの誘導体が使用
できる。ジカルボン酸としてはマレイン酸、フマル酸、
コハク酸、リンゴ酸、酒石酸等が挙げられる。トリカル
ボン酸としてはクエン酸、アコニット酸等が使用でき
る。また、カルボン酸の誘導体としては無水マレイン酸
等の無水物や金属塩アミド、イミド、エステル等が例示
される。カルボン酸の濃度は0.1g/L〜10g/L
が好適である。濃度が0.1g/L未満では耐熱性が低
下するのみならず、引き剥し強さや回路基板材料の要求
特性も低下し、10g/Lを超えると酸としての作用が
強過ぎるため銅箔を溶解してしまうので好ましくない。
As the carboxylic acid or its derivative, dicarboxylic acid, tricarboxylic acid or a derivative thereof can be used. As dicarboxylic acids, maleic acid, fumaric acid,
Succinic acid, malic acid, tartaric acid and the like can be mentioned. As the tricarboxylic acid, citric acid, aconitic acid and the like can be used. Examples of the carboxylic acid derivatives include anhydrides such as maleic anhydride, and metal salt amides, imides, and esters. The concentration of carboxylic acid is 0.1 g / L to 10 g / L
Is preferred. If the concentration is less than 0.1 g / L, not only the heat resistance is reduced, but also the peeling strength and the required characteristics of the circuit board material are reduced. If the concentration is more than 10 g / L, the action as an acid is too strong to dissolve the copper foil. It is not preferable because it will do.

【0015】このような有機防錆剤を銅箔の表面に塗布
することによって本発明の有機防錆処理銅箔が得られ
る。ここにおいて用いられる銅箔は特に限定されず、例
えば電解銅箔でも圧延銅箔でもよい。
By applying such an organic rust preventive to the surface of the copper foil, the organic rust preventive treated copper foil of the present invention can be obtained. The copper foil used here is not particularly limited, and may be, for example, an electrolytic copper foil or a rolled copper foil.

【0016】有機防錆剤の銅箔への塗布手段は、所定濃
度の有機防錆剤水溶液を用い、この水溶液中に銅箔を浸
漬するか、もしくはシャワー(スプレー)またはハケ塗
り等によって上記水溶液を銅箔表面に塗布する。塗布温
度は室温〜60℃が好適である。60℃を超えると機材
としてポリ塩化ビニルが使用できない等の設備上の制約
があり、かつ特性の向上が見られないので好ましくな
い。塗布時間は1秒以上であればよく、60秒以上にし
ても特性の向上は見られない。
As a means for applying the organic rust inhibitor to the copper foil, an aqueous solution of an organic rust inhibitor having a predetermined concentration is used, and the copper foil is immersed in the aqueous solution, or the solution is applied by shower (spray) or brush painting. Is applied to the copper foil surface. The coating temperature is preferably from room temperature to 60 ° C. If the temperature exceeds 60 ° C., it is not preferable because polyvinyl chloride cannot be used as equipment, and there are restrictions on facilities, and no improvement in characteristics is observed. The application time may be 1 second or longer, and even if it is 60 seconds or longer, no improvement in characteristics is observed.

【0017】この有機防錆剤が塗布された銅箔は、水洗
することなくそのまま絞りロールで余剰の水分を除去
し、乾燥する。乾燥条件は100〜250℃の乾燥炉で
3〜15秒といった通常の条件で行なわれる。
The copper foil on which the organic rust inhibitor has been applied is dried without any excess water with a squeezing roll without washing with water. Drying is performed in a drying furnace at 100 to 250 ° C. under ordinary conditions such as 3 to 15 seconds.

【0018】[0018]

【作用】上述したように、3−アミノ−1,2,4−ト
リアゾール単独では回路基材との引き剥し強さが低い上
に回路基板材料としての特性も全く実用に耐えない。他
方、シランカップリング剤は従来より銅箔と基板材料の
引き剥し強さを向上させる効果のあることは知られてい
たが、耐熱耐酸化性は殆ど期待できない。さらに、カル
ボン酸またはその誘導体は単独では有機酸として銅箔を
溶解する作用しか保有していない。
As described above, 3-amino-1,2,4-triazole alone has a low peeling strength from a circuit substrate and has no practical properties at all as a material for a circuit board. On the other hand, it has been known that a silane coupling agent has an effect of improving the peeling strength between a copper foil and a substrate material, but heat resistance and oxidation resistance can hardly be expected. Further, the carboxylic acid or its derivative alone has only an action of dissolving the copper foil as an organic acid.

【0019】また、本発明者らの研究によれば、3−ア
ミノ−1,2,4−トリアゾールとシランカップリング
剤の混合では、耐熱耐酸化性は3−アミノ−1,2,4
−トリアゾール単独に比較してやや低下し、回路基板材
料としての要求特性も全く向上しない。
According to the study of the present inventors, when 3-amino-1,2,4-triazole is mixed with a silane coupling agent, the heat-resistant oxidation resistance is 3-amino-1,2,4.
-Slightly lower than triazole alone, and the required characteristics as a circuit board material are not improved at all.

【0020】同様に3−アミノ−1,2,4−トリアゾ
ールとカルボン酸またはその誘導体の混合では、耐熱耐
酸化性の低下はそれほど生じないが、回路基板材料とし
ての要求特性はすべて向上しない。
Similarly, when 3-amino-1,2,4-triazole is mixed with a carboxylic acid or a derivative thereof, the heat resistance and oxidation resistance do not decrease so much, but all the required characteristics as a circuit board material are not improved.

【0021】これに対し、本発明のように3−アミノ−
1,2,4−トリアゾール、シランカップリング剤、カ
ルボン酸またはその誘導体を同時に混合した場合には、
詳しい機構については未だ不明であるが、初めて耐熱耐
酸化性、基材との引き剥し強さ、回路基板材料としての
要求特性の全てを満足することが可能となる。
On the other hand, as in the present invention, 3-amino-
When 1,2,4-triazole, a silane coupling agent, a carboxylic acid or a derivative thereof are mixed at the same time,
Although the detailed mechanism is still unknown, it is possible for the first time to satisfy all of the heat resistance and oxidation resistance, the peel strength with the substrate, and the characteristics required for the circuit board material.

【0022】この場合には、耐熱耐酸化性は200℃、
1時間の加熱によっても全く酸化変色することなく、回
路基材との引き剥し強度は1.8kg/cmと実用域に
まで達し、耐塩酸性は15%以下にまで改善され、耐湿
性は10%以下まで向上することが確認された。
In this case, the heat and oxidation resistance is 200 ° C.
Even after heating for 1 hour, the film does not undergo any oxidative discoloration, the peel strength with the circuit substrate reaches 1.8 kg / cm, which is a practical range, the hydrochloric acid resistance is improved to 15% or less, and the moisture resistance is 10%. It was confirmed to improve to the following.

【0023】[0023]

【実施例】以下、実施例等に基づき本発明を具体的に説
明する。
EXAMPLES Hereinafter, the present invention will be specifically described based on examples and the like.

【0024】実施例1 厚さ35μmの電解銅箔を、3−アミノ−1,2,4−
トリアゾール0.1mol/L、γ−グリシドキシプロ
ピルトリメトキシシラン5g/L、コハク酸1g/Lを
含有した有機防錆剤水溶液中に室温で15秒間浸漬した
後、ドライヤーを用いて水切り乾燥を行なった。
Example 1 An electrolytic copper foil having a thickness of 35 μm was prepared by using 3-amino-1,2,4-
After immersing in an organic rust inhibitor aqueous solution containing 0.1 mol / L of triazole, 5 g / L of γ-glycidoxypropyltrimethoxysilane, and 1 g / L of succinic acid at room temperature for 15 seconds, draining and drying is performed using a drier. Done.

【0025】この有機防錆処理銅箔をガラス繊維で補強
したエポキシ樹脂板に温度170℃、加圧力20kg/
cm2で1時間保持して圧着し、銅張積層板を形成し
た。
This organic rust-proofed copper foil was reinforced with glass fiber on an epoxy resin plate at a temperature of 170.degree.
The copper-clad laminate was formed by holding at 1 cm 2 for 1 hour and pressing.

【0026】次いで、0.8mm幅の銅箔を残すように
回路形成し、特性評価用サンプルを作成し、各種評価試
験(引き剥し強さ、耐塩酸性、耐湿性、平滑面半田濡れ
性、平滑面耐熱耐酸化性)を実施した。評価結果を表1
に示す。
Next, a circuit was formed so as to leave a copper foil having a width of 0.8 mm, a sample for evaluating characteristics was prepared, and various evaluation tests (peeling strength, hydrochloric acid resistance, moisture resistance, smooth surface solder wettability, Surface heat and oxidation resistance). Table 1 shows the evaluation results.
Shown in

【0027】この評価方法は下記に示す通りである。 引き剥し強さ:JIS C 6481に準拠して行
なった(但し、JISの規定は10mm幅にて測定)。 耐塩酸性:1:1塩酸水溶液中に30分間浸漬して
その後引き剥し強さを測定し、試験前の引き剥し強さか
らの劣化率を算出した。 耐湿性:沸騰蒸留水中にて2時間煮沸した後の引き
剥し強さを測定し、試験前の引き剥し強さからの劣化率
を算出した。 平滑面半田濡れ性:銅張り積層板に(株)タムラ製
作所社製プリフラックスL−35(商品名)を塗布後乾
燥し、260℃の半田融液中に3秒間浸漬して、半田の
付着面積率で評価した。評価基準は下記の通りである。 〇;100% △;≧95% ×;<95% 平滑面耐熱耐酸化性:防錆処理した銅箔を200℃
のオーブンに1時間保持した後の外観の色調変化の度合
いを比較した。評価基準は下記の通りである。 〇;変化なし △;やや変色 ×;赤茶色 ×;
濃紫色
This evaluation method is as described below. Peeling strength: Performed in accordance with JIS C 6481 (however, JIS regulations are measured at a width of 10 mm). Hydrochloric acid resistance: It was immersed in a 1: 1 aqueous hydrochloric acid solution for 30 minutes, and then the peeling strength was measured, and the rate of deterioration from the peeling strength before the test was calculated. Moisture resistance: The peel strength after boiling for 2 hours in boiling distilled water was measured, and the rate of deterioration from the peel strength before the test was calculated. Smooth surface solder wettability: Preflux L-35 (trade name, manufactured by Tamura Corporation) is applied to a copper-clad laminate, dried, dipped in a 260 ° C. solder melt for 3 seconds, and solder is adhered. The evaluation was based on the area ratio. The evaluation criteria are as follows. 〇; 100% △; ≧ 95% ×; <95% Smooth surface heat and oxidation resistance: 200 ° C.
The degree of change in the color tone of the appearance after holding in an oven for 1 hour was compared. The evaluation criteria are as follows. 〇; no change △; slightly discolored ×; reddish brown ×;
Dark purple

【0028】実施例2 厚さ35μmの電解銅箔に、3−アミノ−1,2,4−
トリアゾール0.05mol/L、N−β(アミノエチ
ル)γ−アミノプロピルトリメトキシシラン2g/L、
マレイン酸0.5g/Lを含有した有機防錆剤水溶液を
50℃にて3秒間スプレーした後、150℃の乾燥炉に
6秒間通し乾燥した。以下は、実施例1と同様の工程に
よってに評価を行ない、結果を表1に示す。
Example 2 An electrolytic copper foil having a thickness of 35 μm was coated with 3-amino-1,2,4-
Triazole 0.05 mol / L, N-β (aminoethyl) γ-aminopropyltrimethoxysilane 2 g / L,
After spraying an organic rust inhibitor aqueous solution containing 0.5 g / L of maleic acid at 50 ° C. for 3 seconds, the solution was passed through a drying oven at 150 ° C. for 6 seconds and dried. Hereinafter, evaluation was performed by the same steps as in Example 1, and the results are shown in Table 1.

【0029】実施例3 厚さ35μmの電解銅箔を、3−アミノ−1,2,4−
トリアゾール0.4mol/L、N−フェニル−γ−ア
ミノプロピルトリメトキシシラン2g/L、クエン酸5
g/Lを含有した有機防錆剤水溶液中に室温にて30秒
間浸漬した後、ドライヤーにて乾燥した。以下は、実施
例1と同様の工程によって評価を行ない、結果を表1に
示す。
Example 3 An electrolytic copper foil having a thickness of 35 μm was prepared by using 3-amino-1,2,4-
Triazole 0.4 mol / L, N-phenyl-γ-aminopropyltrimethoxysilane 2 g / L, citric acid 5
After being immersed in an organic rust inhibitor aqueous solution containing g / L for 30 seconds at room temperature, it was dried with a dryer. Hereinafter, evaluation was performed by the same steps as in Example 1, and the results are shown in Table 1.

【0030】比較例1 厚さ35μmの電解銅箔に、3−アミノ−1,2,4−
トリアゾール0.1mol/Lを含有した有機防錆剤水
溶液を50℃にて10秒間スプレーした後、ドライヤー
乾燥した。以下、実施例1と同様の工程によって評価を
行ない、その結果を表1に示す。
Comparative Example 1 A 3-amino-1,2,4-
An organic rust inhibitor aqueous solution containing 0.1 mol / L of triazole was sprayed at 50 ° C. for 10 seconds, and then dried with a dryer. Hereinafter, evaluation was performed by the same steps as in Example 1, and the results are shown in Table 1.

【0031】比較例2 厚さ35μmの電解銅箔を、3−アミノ−1,2,4−
トリアゾール0.1mol/L、γ−グリシドキシプロ
ピルトリメトキシシラン5g/Lを含有したを含有した
有機防錆剤水溶液中に室温で15秒間浸漬した後、ドラ
イヤー乾燥した。以下、実施例1と同様の工程によって
評価を行ない、その結果を表1に示す。
COMPARATIVE EXAMPLE 2 An electrolytic copper foil having a thickness of 35 μm was prepared by using 3-amino-1,2,4-
It was immersed in an organic rust inhibitor solution containing 0.1 mol / L of triazole and 5 g / L of γ-glycidoxypropyltrimethoxysilane at room temperature for 15 seconds, and then dried with a dryer. Hereinafter, evaluation was performed by the same steps as in Example 1, and the results are shown in Table 1.

【0032】比較例3 厚さ35μmの電解銅箔を、3−アミノ−1,2,4−
トリアゾール0.1mol/L、コハク酸1g/Lを含
有した有機防錆剤水溶液中に室温で15秒間浸漬した
後、ドライヤー乾燥した。以下、実施例1と同様の工程
によって評価を行ない、その結果を表1に示す。
Comparative Example 3 An electrolytic copper foil having a thickness of 35 μm was prepared by using 3-amino-1,2,4-
It was immersed in an organic rust inhibitor solution containing 0.1 mol / L of triazole and 1 g / L of succinic acid at room temperature for 15 seconds, and then dried with a dryer. Hereinafter, evaluation was performed by the same steps as in Example 1, and the results are shown in Table 1.

【0033】比較例4 厚さ35μmの電解銅箔を、γ−グリシドキシプロピル
トリメトキシシラン5g/L、コハク酸1g/Lを含有
した有機防錆剤水溶液中に室温で15秒間浸漬した後、
ドライヤー乾燥した。以下、実施例1と同様の工程によ
って評価を行ない、その結果を表1に示す。
Comparative Example 4 An electrolytic copper foil having a thickness of 35 μm was immersed in an aqueous organic rust inhibitor containing 5 g / L of γ-glycidoxypropyltrimethoxysilane and 1 g / L of succinic acid at room temperature for 15 seconds. ,
Dryer was dried. Hereinafter, evaluation was performed by the same steps as in Example 1, and the results are shown in Table 1.

【0034】比較例5 厚さ35μmの電解銅箔に、ベンゾトリアゾール(BT
A)0.1mol/Lを含有した有機防錆剤水溶液を用
いて50℃にて10秒間スプレーした後、ドライヤー乾
燥した。以下、実施例1と同様の工程によって評価を行
ない、その結果を表1に示す。
Comparative Example 5 A benzotriazole (BT) was applied to an electrolytic copper foil having a thickness of 35 μm.
A) Spraying was performed at 50 ° C. for 10 seconds using an aqueous solution of an organic rust inhibitor containing 0.1 mol / L, followed by drying with a dryer. Hereinafter, evaluation was performed by the same steps as in Example 1, and the results are shown in Table 1.

【0035】[0035]

【表1】 [Table 1]

【0036】表1の結果から明らかなように、実施例1
〜3は、比較例1〜5に比較して引き剥し強さ、耐塩酸
性、耐湿性、耐熱耐酸化性のいずれの特性にも優れてい
る。
As is clear from the results in Table 1, Example 1
No. 3 to No. 3 are superior to all of Comparative Examples 1 to 5 in peeling strength, hydrochloric acid resistance, moisture resistance, and heat and oxidation resistance.

【0037】[0037]

【発明の効果】本発明の有機防錆処理銅箔においては、
3−アミノ−1,2,4−トリアゾール、シランカップ
リング剤、カルボン酸またはその誘導体を含有した有機
防錆剤水溶液により銅箔を処理することにより、200
℃における耐熱耐酸化性と回路基材との引き剥し強さお
よび回路基板材料としての要求特性である耐塩酸性、耐
湿性、半田濡れ性の全てを満足することが可能となる。
According to the organic rust-preventive copper foil of the present invention,
By treating the copper foil with an aqueous solution of an organic rust inhibitor containing 3-amino-1,2,4-triazole, a silane coupling agent, a carboxylic acid or a derivative thereof, 200
It is possible to satisfy all of the heat resistance and oxidation resistance at ℃, the peeling strength with the circuit board, and the hydrochloric acid resistance, moisture resistance and solder wettability required for the circuit board material.

【0038】また、本発明の製造方法により工程が短縮
されると共に液管理も容易となるため、工程管理が容易
となり、かつコスト低減が可能となる。
Further, the manufacturing method of the present invention shortens the process and facilitates the liquid management, so that the process control is facilitated and the cost can be reduced.

【0039】このように本発明の有機防錆処理銅箔は従
来の銅箔に比較して安価に製造可能であり、かつ従来の
銅箔とほぼ同等の性能を有していることから、本発明は
現在使用されている銅箔および銅箔の製造方法に好適に
代替し得るものである。
As described above, the organic rust-prevention-treated copper foil of the present invention can be manufactured at lower cost than conventional copper foil, and has almost the same performance as conventional copper foil. The present invention can be suitably substituted for the currently used copper foil and the method for producing the copper foil.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 高橋 進 埼玉県川越市谷中110−8 (56)参考文献 特開 平3−211298(JP,A) 特開 平3−79781(JP,A) 特開 昭58−224178(JP,A) (58)調査した分野(Int.Cl.7,DB名) C23F 11/00 H05K 3/38 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Susumu Takahashi 110-8 Yanaka, Kawagoe-shi, Saitama (56) References JP-A-3-211298 (JP, A) JP-A-3-79781 (JP, A) 58-224178 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C23F 11/00 H05K 3/38

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 銅箔の両面に、3−アミノ−1,2,4
−トリアゾール、シランカップリング剤、カルボン酸ま
たはその誘導体からなる有機防錆剤が塗布されているこ
とを特徴とする有機防錆処理銅箔。
1. A method for producing 3-amino-1,2,4 on both surfaces of a copper foil.
An organic rust-preventive copper foil coated with an organic rust-preventive agent comprising a triazole, a silane coupling agent, a carboxylic acid or a derivative thereof;
【請求項2】 銅箔の両面に、3−アミノ−1,2,4
−トリアゾール、シランカップリング剤、カルボン酸ま
たはその誘導体からなる有機防錆剤水溶液を塗布した
後、乾燥することを特徴とする有機防錆処理銅箔の製造
方法。
2. A copper foil having both surfaces of 3-amino-1,2,4
-A method for producing an organic anti-rust treated copper foil, comprising applying an aqueous solution of an organic anti-rust agent comprising a triazole, a silane coupling agent, a carboxylic acid or a derivative thereof, and then drying.
JP07631094A 1994-03-24 1994-03-24 Organic rust-resistant copper foil and method for producing the same Expired - Lifetime JP3199208B2 (en)

Priority Applications (1)

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Applications Claiming Priority (1)

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