JP3187661B2 - Method of manufacturing structure for reducing charge and structure thereof - Google Patents

Method of manufacturing structure for reducing charge and structure thereof

Info

Publication number
JP3187661B2
JP3187661B2 JP19207994A JP19207994A JP3187661B2 JP 3187661 B2 JP3187661 B2 JP 3187661B2 JP 19207994 A JP19207994 A JP 19207994A JP 19207994 A JP19207994 A JP 19207994A JP 3187661 B2 JP3187661 B2 JP 3187661B2
Authority
JP
Japan
Prior art keywords
electronic component
mounting
electric resistance
porous body
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19207994A
Other languages
Japanese (ja)
Other versions
JPH0835051A (en
Inventor
内村  勝次
森光  英樹
恭治 古川
晴雄 瀬藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sintokogio Ltd
Original Assignee
Sintokogio Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintokogio Ltd filed Critical Sintokogio Ltd
Priority to JP19207994A priority Critical patent/JP3187661B2/en
Publication of JPH0835051A publication Critical patent/JPH0835051A/en
Application granted granted Critical
Publication of JP3187661B2 publication Critical patent/JP3187661B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、液晶ディスプレー、半
導体ウェハ等の電子部品を加工装置の取付け台から剥離
する際の急激な放電の発生を防止するため、前記取り付
け台を被覆するとともに電子部品の取り付け面を構成す
る構造体の製造方法およびその構造体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention covers an electronic component such as a liquid crystal display, a semiconductor wafer, etc., in order to prevent an abrupt discharge from occurring when the electronic component is peeled off from the mount of a processing apparatus. The present invention relates to a method of manufacturing a structure that forms the mounting surface of the above, and the structure.

【0002】[0002]

【従来の技術】例えば、電子部品の一つである液晶ディ
スプレーを製造する場合、液晶を配向させるために、液
晶ディスプレーのガラス基板はラビングされる。このラ
ビングは、ガラス基板を取り付け台上に固定した後、ガ
ラス基板の配向膜上で、クロスを巻きつけたローラーを
転動させて行われる。
2. Description of the Related Art For example, when manufacturing a liquid crystal display which is one of electronic parts, a glass substrate of the liquid crystal display is rubbed to align liquid crystals. This rubbing is performed by fixing a glass substrate on a mounting table and then rolling a roller around which a cloth is wound on the alignment film of the glass substrate.

【0003】[0003]

【発明が解決しようとする課題】ところで、このような
ラビング工程に伴ってガラス基板および取り付け台は帯
電するとともに、ガラス基板と取り付け台とは相互に密
着するため接触帯電する。したがって、ガラス基板を取
り付け台から剥離する時、ガラス基板と取り付け台とに
は電位の大きい剥離帯電が発生するとともに、これらの
間には急激な放電現象が生じる。この急激な放電現象の
結果、その衝撃でガラス基板が破損したり、その電気回
路が破壊されるなどの問題が起きている。このような問
題は、半導体ウェハ等の他の電子部品を加工する場合に
も見られる。本発明は上記の事情に鑑みてなされたもの
で、電子部品を取り付け台から剥離する際の剥離帯電に
よる急激な放電現象の発生を緩和するとともに、電子部
品と取り付け台との間の接触帯電をも緩和することがで
きる構造体の製造方法およびその構造体を提供すること
を目的とする。
By the way, the glass substrate and the mounting table are charged by such a rubbing process, and the glass substrate and the mounting table are contact-charged because they are in close contact with each other. Therefore, when the glass substrate is peeled off from the mounting table, a peeling charge having a large potential is generated between the glass substrate and the mounting table, and a rapid discharge phenomenon occurs between them. As a result of this rapid discharge phenomenon, problems such as breakage of the glass substrate due to the impact and breakage of its electric circuit have occurred. Such a problem is also observed when processing other electronic components such as a semiconductor wafer. The present invention has been made in view of the above circumstances, and alleviates the occurrence of a sudden discharge phenomenon due to peeling charging when an electronic component is peeled off from a mounting table, and reduces contact charging between the electronic component and the mounting table. It is an object of the present invention to provide a method for manufacturing a structure and a structure capable of alleviating the problem.

【0004】[0004]

【課題を解決するための手段】上記の目的を達成するた
めに本発明は、電子部品を加工装置の取付け台から剥離
する際の急激な放電の発生を防止するため、前記取り付
け台を被覆するとともに電子部品の取り付け面を構成す
る構造体の製造方法であって、アルミナ粉末に、導電性
酸化物粉末と金属酸化物粉末とを混合して成る粒径15
0μm以下の粉末を溶射して前記取り付け台の母体の表
面に気孔率1〜20%の多孔質体を形成し、その後、こ
の多孔質体を研削加工して平坦状の前記取り付け面を製
作し、もって、この取り付け面を、表面粗さの最大高さ
10μm以上、表面電気抵抗値106〜1010Ω・cm
にするようにしたことを特徴とする。
SUMMARY OF THE INVENTION In order to achieve the above object, the present invention is to cover an electronic component in order to prevent an abrupt discharge from occurring when the electronic component is peeled off from the mount. And a method of manufacturing a structure constituting a mounting surface of an electronic component, wherein the particle size is obtained by mixing a conductive oxide powder and a metal oxide powder with alumina powder.
A porous body having a porosity of 1 to 20% is formed on the surface of the base of the mounting base by spraying a powder of 0 μm or less, and then the porous body is ground to produce the flat mounting surface. Therefore, this mounting surface should have a maximum surface roughness of 10 μm or more and a surface electric resistance of 10 6 to 10 10 Ω · cm.
It is characterized in that it is made to.

【0005】[0005]

【作用】取付け面の表面電気抵抗値を106〜1010Ω
・cmにすることにより、取り付け台の電子の移動が緩
慢になり、電子部品を加工装置の取付け台から剥離する
際の急激な放電の発生を防止することができる。また、
構造体を多孔質体にすることにより、取り付け台の取付
け面と電子部品との接触面積が小さくなって接触帯電、
剥離帯電の電位を小さくすることができ、しかも、取付
け面は水分を吸着することができるため、取付け面およ
び電子部品の静電気の発生を抑制することができる。
[Function] The surface electric resistance value of the mounting surface is 10 6 to 10 10 Ω.
By setting to cm, the movement of the electrons on the mounting table becomes slow, and it is possible to prevent the occurrence of sudden discharge when the electronic component is peeled off from the mounting table of the processing device. Also,
By making the structure a porous body, the contact area between the mounting surface of the mounting base and the electronic component is reduced, and contact charging,
Since the potential of the peeling charge can be reduced and the mounting surface can adsorb moisture, generation of static electricity on the mounting surface and the electronic component can be suppressed.

【0006】ここで、導電性酸化物としては、ZnO、
SnO2、TiO2等を用いる。また、金属酸化物として
は、Al23、Sb25、Nb25等を用いる。また、
溶射の方法としては、酸素ガス、アセチレンガス等を燃
焼炎にして粉末状の原料を吹き付けるようにしたガス溶
粉法や、アルゴンガス、水素ガス等の不活性ガス中でア
ーク放電させながら粉末状の原料を吹き付けるようにし
たプラズマ溶射法を用いることができる。
Here, as the conductive oxide, ZnO,
SnO 2 , TiO 2 or the like is used. As the metal oxide, Al 2 O 3 , Sb 2 O 5 , Nb 2 O 5 or the like is used. Also,
Examples of the thermal spraying method include a gas melting method in which an oxygen gas, an acetylene gas, or the like is used as a combustion flame to spray a powdery material, or a powder spraying method in which an arc is discharged in an inert gas such as an argon gas or a hydrogen gas. Plasma spraying method in which the raw material is sprayed.

【0007】なお、気孔率は20%以下が好ましく、2
0%を越えると構造体の強度が不足するようになる。ま
た、表面電気抵抗値は106〜1010Ω・cmが好まし
く、106Ω・cm以下では急激な放電が発生する一
方、1010Ω・cm以上では除々に放電させることがで
きなくなる。また、構造体は多孔質のため表面粗さの最
大高さが必然的に10μm以上になる。また、構造体を
単独で製造する場合には上述の溶射による方法ではな
く、慣用手段の焼成による方法により製造するようにし
てもよい。また、焼成物の平坦化のための加工はいわす
る研削加工あるいはブラスト加工により行うようにして
もよい。
The porosity is preferably not more than 20%.
If it exceeds 0%, the strength of the structure becomes insufficient. The surface electric resistance 10 6 ~10 10 Ω · cm is preferred, while the rapid discharge occurs in the following 10 6 Ω · cm, it becomes impossible to discharge gradually in the 10 10 Ω · cm or more. Further, since the structure is porous, the maximum height of the surface roughness is necessarily 10 μm or more. In the case where the structure is manufactured alone, the structure may be manufactured not by the above-described method by thermal spraying but by a method of firing by conventional means. Processing for flattening the fired product may be performed by so-called grinding or blasting.

【0008】[0008]

【実験例】本発明の一実験例について説明すると、アル
ミナと酸化チタンとの混合物を、これらの混合割合を種
々変えて金属板に溶射して各種の試験片を製作し、その
気孔率と表面電気抵抗値を測定した結果を表1に示す。
なお、測定には横河電機株式会社製のディジタル絶縁抵
抗計(2426型)を用いた。
[Experimental Example] An experimental example of the present invention will be described. A mixture of alumina and titanium oxide is sprayed onto a metal plate at various mixing ratios to produce various test pieces. Table 1 shows the measurement results of the electric resistance.
Note that a digital insulation resistance meter (type 2426) manufactured by Yokogawa Electric Corporation was used for the measurement.

【0009】表1Table 1

【0010】この表1からは、酸化チタンが13重量
%、アルミナが87重量%の場合に気孔率が10〜15
%、表面粗さが最大高さ20μm、表面電気抵抗値が1
6〜108となり、本発明の目的に沿うものであること
が判る。
According to Table 1, the porosity is 10 to 15 when the titanium oxide content is 13% by weight and the alumina content is 87% by weight.
%, Maximum surface roughness 20μm, surface electric resistance 1
0 6 to 10 8 , which proves that the object of the present invention is met.

【0011】[0011]

【比較例】サイズ300mm×300mm×0.7mm
の液晶ディスプレー用ガラス基板を、ラビング装置の取
り付け台上に両面テープ(総厚85μm±10μm)を
用いて固定し、かつ前記取り付け台の材質を取り付け台
の母体であるアルミニュウム合金製のものと、アルミニ
ュウム合金製の取り付け台の母体を本発明の構造体で被
覆したものとを用いて、液晶を配向させるためのラビン
グを行い、その後、ガラス基板を取り付け台から剥離し
た時に取り付け台に帯電した静電気の電位を測定した。
その測定し記録した結果を図1に示す。
[Comparative example] Size 300mm x 300mm x 0.7mm
A liquid crystal display glass substrate is fixed on a mounting table of a rubbing device using a double-sided tape (total thickness 85 μm ± 10 μm), and the material of the mounting table is made of an aluminum alloy which is a base of the mounting table; Using a base of an aluminum alloy mounting base coated with the structure of the present invention, rubbing for aligning the liquid crystal is performed, and then the static electricity charged on the mounting base when the glass substrate is peeled off from the mounting base. Was measured.
The measured and recorded results are shown in FIG.

【0012】この場合、ラビング装置としては、新東工
業株式会社製のLABー5型を用いた。このラビング装
置は、直径148mmのロールに厚さ1.85mmのラ
ビングクロス(吉川化工株式会社製)を巻装し、電子部
品を載せる取り付け台を30mm/secの速度で水平
移動できるようにしたものである。また、静電気の電位
の測定器としては、大坪電気株式会社製のTIー300
型を用いた。そして、この測定結果は横河電機株式会社
製のLRー8100型を用いて記録した。なお、室温は
21℃、湿度は65%であった。
In this case, as a rubbing device, a LAB-5 type manufactured by Shinto Kogyo Co., Ltd. was used. This rubbing device is configured such that a rubbing cloth (manufactured by Yoshikawa Kako Co., Ltd.) having a thickness of 1.85 mm is wound on a roll having a diameter of 148 mm, and a mounting table for mounting electronic components can be horizontally moved at a speed of 30 mm / sec. It is. Also, as a measuring device of the potential of static electricity, TI-300 manufactured by Otsubo Electric Co., Ltd.
A mold was used. The measurement results were recorded using LR-8100 model manufactured by Yokogawa Electric Corporation. The room temperature was 21 ° C. and the humidity was 65%.

【0013】図1からは、取り付け台を本発明の構造体
にしたものが、そうでないものと比較して帯電電位が非
常に小さく、約1/4であることが判る。
From FIG. 1, it can be seen that when the mounting base is made of the structure of the present invention, the charging potential is very small, that is, about 4 as compared with the case where the mounting base is not used.

【0014】[0014]

【発明の効果】以上の説明から明らかなように本発明
は、アルミナ粉末に、導電性酸化物粉末と金属酸化物粉
末とを混合して成る粒径150μm以下の粉末を溶射し
て前記取り付け台の母体の表面に気孔率1〜20%の多
孔質体を形成し、その後、この多孔質体を研削加工して
平坦状の前記取り付け面を製作し、もって、この取り付
け面を、表面粗さの最大高さ10μm以上、表面電気抵
抗値106〜1010Ω・cmに構成したから、電子部品
を取り付け台から剥離する際の剥離帯電による急激な放
電を発生を緩和するとともに、電子部品と取り付け台と
の間の接触帯電をも緩和することができるなどの優れた
効果を奏する。
As is clear from the above description, the present invention provides a method of spraying a powder having a particle size of 150 μm or less, which is obtained by mixing a conductive oxide powder and a metal oxide powder, on alumina powder. A porous body having a porosity of 1 to 20% is formed on the surface of the mother body, and then the porous body is ground to produce the flat mounting surface. The maximum height is 10 μm or more and the surface electric resistance value is 10 6 to 10 10 Ω · cm, so that it is possible to alleviate the sudden discharge caused by peeling charging when the electronic component is peeled off from the mounting table, An excellent effect is obtained such that contact electrification with the mounting table can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の構造の取り付け台と、アルミニュウム
合金製の取り付け台とを用いて液晶パネルのガラス基板
のラビングをし、その直後にガラス基板を取り付け台か
ら剥離し、その時に各取り付け台に帯電した静電気の電
位を測定し、記録した結果を示す比較グラフである。
FIG. 1 shows a rubbing of a glass substrate of a liquid crystal panel using a mounting base having a structure of the present invention and a mounting base made of an aluminum alloy, and immediately after that, the glass substrate is peeled off from the mounting base. 4 is a comparison graph showing the results of measuring and recording the potential of static electricity charged on the substrate.

【表1】 [Table 1]

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C23C 4/10 C04B 38/00 H05K 13/02 H01B 5/14 Continuation of the front page (58) Field surveyed (Int. Cl. 7 , DB name) C23C 4/10 C04B 38/00 H05K 13/02 H01B 5/14

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】電子部品を加工装置の取付け台から剥離す
る際の急激な放電の発生を防止するため、前記取り付け
台を被覆するとともに電子部品の取り付け面を構成する
構造体の製造方法であって、アルミナ粉末に、導電性酸
化物粉末と金属酸化物粉末とを混合して成る粒径150
μm以下の粉末を溶射して前記取り付け台の母体の表面
に気孔率1〜20%の多孔質体を形成し、その後、この
多孔質体を研削加工して平坦状の前記取り付け面を製作
し、もって、この取り付け面を、表面粗さの最大高さ1
0μm以上、表面電気抵抗値106〜1010Ω・cmに
するようにしたことを特徴とする帯電緩和用構造体の製
造方法。
1. A method of manufacturing a structure for covering an electronic component and forming a mounting surface of the electronic component in order to prevent a sudden discharge when the electronic component is peeled from the mount of the processing apparatus. And a particle diameter of 150 obtained by mixing a conductive oxide powder and a metal oxide powder with alumina powder.
A porous body having a porosity of 1 to 20% is formed on the surface of the base of the mounting base by spraying a powder having a particle size of μm or less, and then the porous body is ground to produce the flat mounting surface. Therefore, this mounting surface should have a maximum surface roughness of 1
A method for producing a charge-mitigating structure, characterized in that the surface electric resistance is set to 0 μm or more and the surface electric resistance is set to 10 6 to 10 10 Ω · cm.
【請求項2】電子部品を加工装置の取り付け台から剥離
する際の急激な放電の発生を防止するため、前記取り付
け台を被覆するとともに電子部品の取り付け面を構成す
る構造体であって、ZnO、SnO2、TiO2等の導電
性酸化物にAl23、Sb25、Nb25等の金属酸化
物を微量混入したもの10〜20重量%と、残りをアル
ミナ粉末で成る混合物を焼成した後加工し、もって気孔
率1〜20%、表面粗さの最大高さ10μm以上、表面
電気抵抗値106〜1010Ω・cmの多孔質体に構成し
たことを特徴とする帯電緩和用構造体。
2. A structure that covers said mounting base and constitutes a mounting surface of said electronic component, in order to prevent a sudden discharge from occurring when the electronic part is peeled off from the mounting base of the processing apparatus, wherein the ZnO is a structure. , SnO 2 , TiO 2, and other conductive oxides mixed with a small amount of metal oxides, such as Al 2 O 3 , Sb 2 O 5 , Nb 2 O 5, and 10 to 20% by weight, with the remainder being alumina powder The mixture is fired and then processed to form a porous body having a porosity of 1 to 20%, a maximum surface roughness of 10 μm or more, and a surface electric resistance of 10 6 to 10 10 Ω · cm. Structure for charging relaxation.
JP19207994A 1994-07-21 1994-07-21 Method of manufacturing structure for reducing charge and structure thereof Expired - Fee Related JP3187661B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19207994A JP3187661B2 (en) 1994-07-21 1994-07-21 Method of manufacturing structure for reducing charge and structure thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19207994A JP3187661B2 (en) 1994-07-21 1994-07-21 Method of manufacturing structure for reducing charge and structure thereof

Publications (2)

Publication Number Publication Date
JPH0835051A JPH0835051A (en) 1996-02-06
JP3187661B2 true JP3187661B2 (en) 2001-07-11

Family

ID=16285295

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3187661B2 (en)

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US8155091B2 (en) 2003-08-15 2012-04-10 Thomson Licensing Broadcast router with multiple expansion capabilities
US9117261B2 (en) 2004-11-16 2015-08-25 Thomson Licensing Film grain SEI message insertion for bit-accurate simulation in a video system
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Publication number Publication date
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