JP3184550B2 - Vapor phase growth method and apparatus - Google Patents

Vapor phase growth method and apparatus

Info

Publication number
JP3184550B2
JP3184550B2 JP09221091A JP9221091A JP3184550B2 JP 3184550 B2 JP3184550 B2 JP 3184550B2 JP 09221091 A JP09221091 A JP 09221091A JP 9221091 A JP9221091 A JP 9221091A JP 3184550 B2 JP3184550 B2 JP 3184550B2
Authority
JP
Japan
Prior art keywords
gas
vapor phase
phase growth
raw material
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP09221091A
Other languages
Japanese (ja)
Other versions
JPH0750260A (en
Inventor
裕輔 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP09221091A priority Critical patent/JP3184550B2/en
Publication of JPH0750260A publication Critical patent/JPH0750260A/en
Application granted granted Critical
Publication of JP3184550B2 publication Critical patent/JP3184550B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[発明の目的][Object of the Invention]

【0002】[0002]

【産業上の利用分野】本発明は、半導体等の製造に用い
られる気相成長装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor phase growth apparatus used for manufacturing semiconductors and the like.

【0003】[0003]

【従来の技術】図9は、従来の気相成長装置の一例を示
す概略図である。この図に示すように、反応炉100内
の下部には基板101を載置した基板ホルダー102
と、基板ホルダー102を回転させるための回転軸10
3と、加熱用のヒータ104が配設され、上部には反応
炉100内に原料ガスやキャリアガスを供給するガス供
給管105と、ガスの流れを整える複数の孔106aを
形成した円盤状の整流板106が配設されている。ま
た、反応炉100の下部には、回転軸103を回転駆動
するモータ107と、反応炉100内の未反応ガス等を
排気する排気制御装置108が接続されている。ガス供
給管105は、整流板106のほぼ中央部の上方に位置
するようにして配設されている。
2. Description of the Related Art FIG. 9 is a schematic view showing an example of a conventional vapor phase growth apparatus. As shown in this figure, a substrate holder 102 on which a substrate 101 is
And a rotating shaft 10 for rotating the substrate holder 102.
3, a heater 104 for heating, a gas supply pipe 105 for supplying a raw material gas and a carrier gas into the reaction furnace 100, and a disc-like shape having a plurality of holes 106a for regulating the gas flow. A current plate 106 is provided. In addition, a motor 107 that rotates the rotating shaft 103 and an exhaust control device 108 that exhausts unreacted gas and the like in the reactor 100 are connected to a lower portion of the reactor 100. The gas supply pipe 105 is provided so as to be located substantially above the center of the current plate 106.

【0004】従来の気相成長装置は上記のように構成さ
れており、基板101をヒータ104の加熱によって所
定温度に上昇させると共に、モータ107の回転駆動に
よって所定の回転数で回転させ、ガス供給管105から
導入した原料ガスやキャリアガスを、整流板106の孔
106aを通して基板101上に供給して薄膜を気相成
長させる。
The conventional vapor phase growth apparatus is constructed as described above. The substrate 101 is heated to a predetermined temperature by heating the heater 104, and is rotated at a predetermined rotation speed by the rotation of a motor 107 to supply gas. The raw material gas and the carrier gas introduced from the pipe 105 are supplied onto the substrate 101 through the holes 106a of the current plate 106 to vapor-grow a thin film.

【0005】[0005]

【発明が解決しようとする課題】ところで、上記したよ
うな整流板106の中央部上方から原料ガスを基板10
1上に供給する従来の気相成長装置では、ガス供給管1
05の下方に位置する整流板106の中央部近傍の孔1
06aからは流速の速いガスが流れ、周面側の孔106
aからは流速の遅いガスが流れる。
By the way, the raw material gas is supplied from above the central portion of the current plate 106 to the substrate 10 as described above.
In the conventional vapor phase growth apparatus which supplies the gas on the gas supply pipe 1,
05 near the center of the current plate 106 located below
06a, a gas with a high flow velocity flows, and a hole 106
A gas with a low flow velocity flows from a.

【0006】このため、図10に示すように基板101
上に気相成長する薄膜の膜厚は、基板101の中心側の
方が外周側より厚くなり、均一な膜厚の薄膜を得ること
が困難であった。
For this reason, as shown in FIG.
The thickness of the thin film to be vapor-phase grown thereon is thicker at the center of the substrate 101 than at the outer periphery, and it has been difficult to obtain a thin film having a uniform thickness.

【0007】本発明は上記した課題を解決する目的でな
され、均一な膜厚の薄膜を気相成長させることができる
気相成長装置を提供しようとするものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a vapor-phase growth apparatus capable of vapor-phase growing a thin film having a uniform thickness.

【0008】[発明の構成][Structure of the Invention]

【0009】[0009]

【課題を解決するための手段】前記した課題を解決する
ために本発明は、反応炉内に原料ガスを供給し前記反応
炉内に配置した基板上に薄膜を気相成長させる気相成長
装置において、前記基板と対向して複数の孔を有する整
流板を配設すると共に、前記整流板のガス流れ方向上流
側に原料ガスもしくは原料ガスとキャリアガスとを導入
する複数のガス導入管を配設したことを特徴としてい
る。
SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides a vapor-phase growth apparatus for supplying a raw material gas into a reactor and vapor-growing a thin film on a substrate disposed in the reactor. A rectifying plate having a plurality of holes opposed to the substrate, and a plurality of gas introduction pipes for introducing a raw material gas or a raw material gas and a carrier gas are disposed upstream of the rectifying plate in the gas flow direction. It is characterized by having been established.

【0010】[0010]

【作用】本発明によれば、ガス導入管によって反応炉内
に導入される原料ガスもしくは原料ガスとキャリアガス
は複数のガス導入管により供給されることにより、整流
板上でのガスの運動量や圧力分布が均一化されることに
より、整流板に形成した孔を通して均一な流速で基板上
に供給される。
According to the present invention, the raw material gas or the raw material gas and the carrier gas introduced into the reaction furnace by the gas introduction pipe are supplied by a plurality of gas introduction pipes, so that the momentum of the gas on the current plate is reduced. By making the pressure distribution uniform, it is supplied onto the substrate at a uniform flow rate through the holes formed in the current plate.

【0011】[0011]

【実施例】以下、本発明を図示の一実施例に基づいて詳
細に説明する。図1は、本実施例に係る気相成長装置を
示す概略断面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on one embodiment shown in the drawings. FIG. 1 is a schematic sectional view showing a vapor phase growth apparatus according to the present embodiment.

【0012】この図に示すように、反応炉1内の上部に
は複数の孔2aが形成されている円盤状の整流板2(図
2参照)と、2つのガス導入管3,4が配設されてお
り、反応炉1内の下部には基板5を載置した基板ホルダ
6と、基板ホルダ6を回転自在に支持する回転軸7と、
基板5と基板ホルダ6を加熱するヒータ8が配設されて
いる。また、反応炉1の下部には、回転軸7を回転駆動
するモータ9と、反応炉1内の未反応ガス等を排気する
排気制御装置10が接続されている。
As shown in FIG. 1, a disk-shaped straightening plate 2 (see FIG. 2) having a plurality of holes 2a formed therein and two gas introduction pipes 3 and 4 are arranged in an upper portion of the reactor 1. A substrate holder 6 on which a substrate 5 is placed, a rotating shaft 7 for rotatably supporting the substrate holder 6,
A heater 8 for heating the substrate 5 and the substrate holder 6 is provided. Further, a motor 9 for rotating and driving the rotating shaft 7 and an exhaust control device 10 for exhausting unreacted gas and the like in the reactor 1 are connected to a lower portion of the reactor 1.

【0013】整流板2は、石英やステンレス等で形成さ
れており、反応炉1内の内周面に沿って形成した支持台
11上に外周面が密接するようにして載置されている。
The current plate 2 is made of quartz, stainless steel, or the like, and is placed on a support base 11 formed along the inner peripheral surface of the reaction furnace 1 so that the outer peripheral surface thereof is in close contact.

【0014】ガス導入部3,4は、反応炉1内の上部と
整流板2との間に形成される空間に整流板2の上面2b
と略平行に対向して配設され、反応炉1内に供給される
ガス(原料ガス、キャリアガス)が整流板2上で旋回流
が形成されるように、先端のガス吹出し口3a,4aは
反応炉1の内周面方向に沿って形成されている(図3参
照)。また、ガス導入管3,4の外部には、原料ガス
(例えばSiH2 Cl2)、キャリアガス(例えば
2 )をそれぞれ反応炉1内に供給するためのガス供給
制御装置(図示省略)が接続されている。
The gas inlets 3 and 4 are provided on the upper surface 2 b of the current plate 2 in a space formed between the upper portion of the reactor 1 and the current plate 2.
The gas outlets 3a, 4a at the tips are arranged so that the gas (raw material gas, carrier gas) supplied into the reaction furnace 1 forms a swirling flow on the flow straightening plate 2. Are formed along the inner peripheral surface direction of the reaction furnace 1 (see FIG. 3). A gas supply control device (not shown) for supplying a source gas (eg, SiH 2 Cl 2 ) and a carrier gas (eg, H 2 ) to the inside of the reaction furnace 1 is provided outside the gas introduction pipes 3 and 4. It is connected.

【0015】本実施例に係る気相成長装置は上記によう
に構成されており、排気制御装置10で反応炉1内を排
気して反応炉内圧力を調整し、ヒータ8の加熱によって
基板5を所定温度(例えば1100℃程度)に上昇させ
ると共に、モータ9で回転軸7を回転駆動して基板ホル
ダ6(基板5)を所定の回転数で回転させ、ガス供給制
御装置(図示省略)により原料ガス、キャリアガスをガ
ス導入管3,4から反応炉1内に供給する。ガス導入管
3,4のガス吹出し口3a,4aから反応炉1の内周面
方向に沿って供給されるガス(原料ガス、キャリアガ
ス)は、整流板2上で整流板2の上面2bに対してほぼ
平行な旋回流(図では右回転の旋回流)を形成すること
によって、ガスの混合状態が良くなり、且つガスの運動
量や圧力分布が均一化される。
The vapor phase growth apparatus according to this embodiment is configured as described above. The exhaust control unit 10 evacuates the reactor 1 to adjust the pressure in the reactor, and the substrate 8 is heated by the heater 8. Is raised to a predetermined temperature (for example, about 1100 ° C.), and the rotation shaft 7 is rotationally driven by the motor 9 to rotate the substrate holder 6 (substrate 5) at a predetermined number of rotations. A raw material gas and a carrier gas are supplied into the reaction furnace 1 from the gas introduction pipes 3 and 4. Gases (raw material gas, carrier gas) supplied along the inner peripheral surface direction of the reaction furnace 1 from the gas outlets 3a, 4a of the gas introduction pipes 3, 4 are supplied to the upper surface 2b of the rectifier plate 2 on the rectifier plate 2. By forming a swirling flow that is substantially parallel to the rotating flow (a swirling flow rotating clockwise in the figure), the mixing state of the gas is improved, and the momentum and pressure distribution of the gas are made uniform.

【0016】そして、整流板2上で旋回流が形成されて
いるガス(原料ガス、キャリアガス)は、整流板2の孔
2aを通して均一な流速で基板5上に供給されることに
よって、基板5上に半導体薄膜が均一な膜厚で気相成長
する(図4参照)。
The gas (raw material gas, carrier gas) in which the swirling flow is formed on the current plate 2 is supplied onto the substrate 5 at a uniform flow rate through the holes 2a of the current plate 2 so that the substrate 5 A semiconductor thin film is vapor-grown thereon with a uniform thickness (see FIG. 4).

【0017】この時、基板5上に気相成長する半導体薄
膜の膜厚は、図5に示すように、整流板2の開口比(整
流板2の上面2b部分の面積に対するすべての孔2aの
占める割合)が0.2程度以下(下限値は0.01程
度)の場合に基板5上に気相成長される半導体薄膜の膜
厚の均一性が良好になることが実験によって分ったの
で、本実施例では例えば整流板2の開口比を0.1に設
定し、また、整流板2の厚さを例えば3mmに形成した。
At this time, as shown in FIG. 5, the thickness of the semiconductor thin film grown in vapor phase on the substrate 5 is determined by the opening ratio of the rectifying plate 2 (the area of all the holes 2a with respect to the area of the upper surface 2b of the rectifying plate 2). Experiments have shown that when the ratio is less than about 0.2 (the lower limit is about 0.01), the uniformity of the thickness of the semiconductor thin film grown on the substrate 5 is improved. In this embodiment, for example, the opening ratio of the current plate 2 is set to 0.1, and the thickness of the current plate 2 is formed, for example, 3 mm.

【0018】また、反応炉1内の整流板2の上流側に形
成される空間の体積をV、ガス導入管3,4から反応炉
1内に供給されるガス(原料ガス、キャリアガス)のガ
ス供給量をFとした場合、反応炉1内の上部と整流板2
の間でのガスの切換え時間τ(秒)との間に下記に示し
た (1)式のような関係がある。
The volume of a space formed on the upstream side of the current plate 2 in the reaction furnace 1 is V, and the volume of a gas (raw material gas, carrier gas) supplied into the reaction furnace 1 from the gas introduction pipes 3, 4. When the gas supply amount is F, the upper part in the reactor 1 and the current plate 2
And the gas switching time τ (sec) has the relationship shown in the following equation (1).

【0019】[0019]

【外1】 [Outside 1]

【0020】そして、上記したガスの切換え時間が1秒
程度以下であれば薄膜成長開始時や薄膜成長終了時、ヘ
テロ界面を形成するような薄膜成長時に整流板2の孔2
aを通して基板5に供給されるガスの均一性がよくなる
ことが発明者の実験によって分かったので、上記した
(1)式の関係よりV/Fが1(秒)程度以下になるよう
に、反応炉1内の上部と整流板2との間に形成される空
間の体積Vを設定すると共に、ガス導入管3,4から供
給されるガスの供給量Fをガス供給制御装置(図示省
略)によって制御する。
If the gas switching time is about 1 second or less, the hole 2 of the rectifying plate 2 is formed at the start of the thin film growth, at the end of the thin film growth, or at the time of the thin film growth to form a hetero interface.
Since it has been found by the experiment of the inventor that the uniformity of the gas supplied to the substrate 5 through a is improved,
According to the relationship of equation (1), the volume V of the space formed between the upper part in the reactor 1 and the rectifying plate 2 is set so that V / F is about 1 (second) or less, and gas is introduced. The supply amount F of the gas supplied from the pipes 3 and 4 is controlled by a gas supply control device (not shown).

【0021】また、基板5上に気相成長する半導体薄膜
の膜厚の均一性は、図6に示すように、整流板2から基
板5までのガス流路の広がりまたは狭まり角度θ(図7
に示した例はガス流路が広がっている場合)が約15°
以上になると悪くなることが実験によって分ったので、
ガス流路の広がりまたは狭まり角度θを15°程度以内
にする。図1に示した本実施例では、ガス流路の広がり
または狭まり角度θはほぼ0である。
Further, as shown in FIG. 6, the uniformity of the film thickness of the semiconductor thin film grown in vapor phase on the substrate 5 depends on the angle θ (see FIG.
Is about 15 ° when the gas flow path is wide.
Experiments have shown that it becomes worse when the above is reached.
The angle θ of expansion or narrowing of the gas flow path is set within about 15 °. In the present embodiment shown in FIG. 1, the angle θ at which the gas flow path expands or narrows is substantially zero.

【0022】尚、上記した実施例では、ガス(原料ガ
ス、キャリアガス)を導入する導入管は2つであったが
3つ以上用いてもよい。また、整流板は1つであった
が、複数枚重ねて用いてもよい。
In the above-described embodiment, the number of introduction pipes for introducing gases (raw material gas, carrier gas) is two, but three or more introduction pipes may be used. In addition, although one rectifying plate is used, a plurality of rectifying plates may be used.

【0023】図8は、本発明の他の実施例に係る気相成
長装置の整流板を示す斜視図である。この図に示すよう
に、この整流板20は、複数の孔21aが形成されてい
る円盤状の平板部21の周面に中空状の枠部22を一体
的に形成した構成であり、枠部22の内周面には複数の
孔22aが形成されている。また、枠部22内には、2
つのガス導入管3,4が対向して配設され、枠部22内
に供給されるガス(原料ガス、キャリアガス)が旋回流
を形成するように、先端のガス吹出し口3a,4aが枠
部22内の円周方向に沿って形成されている。他の構成
は上記した実施例と同様である。
FIG. 8 is a perspective view showing a current plate of a vapor phase growth apparatus according to another embodiment of the present invention. As shown in this figure, the current plate 20 has a configuration in which a hollow frame portion 22 is integrally formed on a peripheral surface of a disk-shaped flat plate portion 21 in which a plurality of holes 21a are formed. A plurality of holes 22 a are formed in the inner peripheral surface of the nozzle 22. In the frame portion 22, 2
The two gas introduction pipes 3 and 4 are arranged to face each other, and the gas outlets 3a and 4a at the tips are framed so that the gas (raw material gas, carrier gas) supplied into the frame portion 22 forms a swirling flow. It is formed along the circumferential direction in the part 22. Other configurations are the same as those of the above-described embodiment.

【0024】このように、本実施例においても、反応炉
1内にガス導入管3,4を介して供給されるガス(原料
ガス、キャリアガス)は、まず整流板20の枠部22内
で旋回流(図では右回転の旋回流)を形成してガスの混
合状態を良くしてから孔22aを通して平板部21上に
導入され、平板部21の孔21aを通して均一な流速で
基板5上に供給されることによって、基板5上に半導体
薄膜が均一な膜厚で気相成長する。
As described above, also in the present embodiment, the gas (raw material gas, carrier gas) supplied into the reaction furnace 1 through the gas introduction pipes 3 and 4 first flows into the frame portion 22 of the rectifying plate 20. A swirling flow (clockwise swirling flow in the figure) is formed to improve the mixing state of the gas, and then the gas is introduced onto the flat plate portion 21 through the hole 22a, and is uniformly flown onto the substrate 5 through the hole 21a of the flat plate portion 21. By being supplied, the semiconductor thin film grows on the substrate 5 in a vapor phase with a uniform thickness.

【0025】また、本実施例では、整流板20上流側の
外周部より、ほぼ均一なガス供給が行われるため、整流
板20上流側でのガス切換時のガス切換状態が良く、か
つ孔22aより供給されるガス流速を低減できるため、
ガス供給の再現性が良い。
In this embodiment, since the gas is supplied substantially uniformly from the outer peripheral portion on the upstream side of the current plate 20, the gas switching state at the time of gas switching on the upstream side of the current plate 20 is good, and the holes 22a Since the flow rate of the supplied gas can be reduced,
Good reproducibility of gas supply.

【0026】なお、整流板としては、周知の多孔質体
(多孔質金属や燃結多孔体)や微細な粒体(ガラス玉の
ようなもの)を充填して充填層を持たせたもの等を用い
ることができる。さらに開口比が0.2よりも大きな整
流板を複数重ねて実質的に開口比を0.2以下程度にし
て利用することもできる。
The current plate may be a well-known porous material (porous metal or fired porous material) or a fine particle (such as a glass ball) filled with a filling layer. Can be used. Further, a plurality of rectifying plates having an aperture ratio larger than 0.2 can be stacked and used with the aperture ratio substantially set to about 0.2 or less.

【0027】[0027]

【発明の効果】以上、実施例に基づいて具体的に説明し
たように本発明によれば、整流板上に原料ガスもしくは
原料ガスとキャリアガスを複数のガス導入口より導入す
ることにより、ガスの運動量や圧力分布が均一化され
る。従って、基板上には整流板に形成した孔を通して均
質なガスが均一な流速で供給されることによって均一な
膜厚の薄膜を気相成長させることができる。また、ガス
の切換時のガス切換状態も良く、かつガス供給の再現性
も良い。
According to the present invention, as described above in detail with reference to the embodiments, by introducing a raw material gas or a raw material gas and a carrier gas from a plurality of gas inlets onto a current plate, Momentum and pressure distribution are made uniform. Therefore, a thin film having a uniform film thickness can be grown on the substrate by supplying a uniform gas at a uniform flow rate through the holes formed in the current plate. Further, the gas switching state at the time of gas switching is good, and the reproducibility of gas supply is also good.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例に係る気相成長装置を示す概
略図である。
FIG. 1 is a schematic diagram showing a vapor phase growth apparatus according to one embodiment of the present invention.

【図2】本発明の一実施例に係る気相成長装置の整流板
を示す斜視図である。
FIG. 2 is a perspective view showing a rectifying plate of the vapor phase growth apparatus according to one embodiment of the present invention.

【図3】本発明の一実施例に係る気相成長装置の上部を
示す断面図である。
FIG. 3 is a cross-sectional view showing an upper part of the vapor phase growth apparatus according to one embodiment of the present invention.

【図4】本発明の一実施例に係る気相成長装置による気
相成長時の基板面内膜厚分布を示した図である。
FIG. 4 is a diagram showing a film thickness distribution in a substrate surface during vapor phase growth by a vapor phase growth apparatus according to one embodiment of the present invention.

【図5】整流板の開口比と基板面内膜厚均一性の関係を
示した図である。
FIG. 5 is a diagram showing a relationship between an aperture ratio of a current plate and uniformity of film thickness in a substrate surface.

【図6】ガス流路角度と基板面内膜厚均一性の関係を示
した図である。
FIG. 6 is a diagram showing a relationship between a gas flow path angle and film thickness uniformity in a substrate surface.

【図7】ガス流路が広がっている気相成長装置を示す概
略図である。
FIG. 7 is a schematic diagram showing a vapor phase growth apparatus in which a gas flow path is widened.

【図8】本発明の他の実施例に係る気相成長装置の整流
板を示す斜視図である。
FIG. 8 is a perspective view showing a current plate of a vapor phase growth apparatus according to another embodiment of the present invention.

【図9】従来の気相成長装置の一例を示す概略図であ
る。
FIG. 9 is a schematic view showing an example of a conventional vapor phase growth apparatus.

【図10】従来の気相成長装置による気相成長時の基板
面内膜厚分布を示した図である。
FIG. 10 is a diagram showing a film thickness distribution in a substrate surface during vapor phase growth by a conventional vapor phase growth apparatus.

【符号の説明】 1 反応炉 2,20 整流板 2a,21a 孔 3,4 ガス導入管 5 基板 6 基板ホルダ 7 回転軸 8 ヒータ 9 モータ 10 排気制御装置[Description of Signs] 1 Reactor 2, 20 Rectifier plate 2a, 21a Hole 3, 4 Gas introduction tube 5 Substrate 6 Substrate holder 7 Rotary shaft 8 Heater 9 Motor 10 Exhaust control device

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/205 H01L 21/285 H01L 21/31 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 21/205 H01L 21/285 H01L 21/31

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 反応炉内に原料ガスを供給し、前記反応
炉内に配置した基板上に薄膜を気相成長させる気相成長
装置において、 前記基板と対向して配設された、複数の孔を有する整流
板と、 前記整流板のガス流れ方向上流側に原料ガス若しくは原
料ガスとキャリアガスとを導入する、ガス導入管とを備
え、 前記整流板の開口比は0.2以下であり、 前記反応炉内の前記整流板の上流側に形成される空間の
体積Vと、前記ガス導入管から当該空間に供給される前
記原料ガス若しくは原料ガスとキャリアガスのガス供給
量Fとの比V/Fは1秒以下であることを特徴とする気
相成長装置。
1. A vapor phase growth apparatus for supplying a source gas into a reaction furnace and vapor-growing a thin film on a substrate disposed in the reaction furnace, comprising: A flow straightening plate having holes, and a gas introduction pipe for introducing a raw material gas or a raw material gas and a carrier gas upstream of the flow straightening plate in the gas flow direction, wherein an opening ratio of the flow straightening plate is 0.2 or less. The ratio of the volume V of the space formed on the upstream side of the current plate in the reaction furnace to the gas supply amount F of the raw material gas or the raw material gas and the carrier gas supplied from the gas introduction pipe to the space. V / F is 1 second or less.
【請求項2】 前記整流板は、 複数の孔が形成された円盤状の平板部と、 前記平板部のガス流れ方向上流側に設けられ複数の孔が
形成された板とを備え、前記ガス導入管は前記板のガス
流れ方向上流側に配設されていることを特徴とする請求
項1に記載の気相成長装置。
2. The gas flow control device according to claim 1, wherein the current plate includes a disc-shaped flat plate portion having a plurality of holes formed therein, and a plate provided on the upstream side of the flat plate portion in a gas flow direction and having a plurality of holes formed therein. The vapor phase growth apparatus according to claim 1, wherein the introduction pipe is provided on the upstream side of the plate in the gas flow direction.
【請求項3】 前記整流板は、 複数の孔が形成された円盤状の平板部と、 前記平板部の周囲に一体的に形成された枠部とを備え、
当該枠部の内周面には複数の孔が形成されていることを
特徴とする請求項1に記載の気相成長装置。
3. The rectifying plate includes: a disk-shaped flat plate portion having a plurality of holes formed therein; and a frame portion integrally formed around the flat plate portion.
The vapor phase growth apparatus according to claim 1, wherein a plurality of holes are formed in an inner peripheral surface of the frame portion.
【請求項4】 前記枠部は中空状であり、当該枠部内に
前記ガス導入管が配設されていることを特徴とする請求
項3に記載の気相成長装置。
4. The vapor phase growth apparatus according to claim 3, wherein the frame portion is hollow, and the gas introduction pipe is provided in the frame portion.
【請求項5】 前記ガス導入管は、前記整流板のガス流
れ方向上流側に前記原料ガス若しくは原料ガスとキャリ
アガスとの旋回流を形成するように配設されていること
を特徴とする請求項1乃至4のいずれかに記載の気相成
長装置。
5. The gas introduction pipe is arranged upstream of the current plate in the gas flow direction so as to form a swirling flow of the raw material gas or the raw material gas and the carrier gas. Item 5. The vapor phase growth apparatus according to any one of Items 1 to 4.
【請求項6】 前記ガス導入管は複数設けられているこ
とを特徴とする請求項1乃至5のいずれかに記載の気相
成長装置。
6. The vapor phase growth apparatus according to claim 1, wherein a plurality of said gas introduction pipes are provided.
JP09221091A 1991-04-23 1991-04-23 Vapor phase growth method and apparatus Expired - Lifetime JP3184550B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09221091A JP3184550B2 (en) 1991-04-23 1991-04-23 Vapor phase growth method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09221091A JP3184550B2 (en) 1991-04-23 1991-04-23 Vapor phase growth method and apparatus

Publications (2)

Publication Number Publication Date
JPH0750260A JPH0750260A (en) 1995-02-21
JP3184550B2 true JP3184550B2 (en) 2001-07-09

Family

ID=14048084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09221091A Expired - Lifetime JP3184550B2 (en) 1991-04-23 1991-04-23 Vapor phase growth method and apparatus

Country Status (1)

Country Link
JP (1) JP3184550B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0854210B1 (en) * 1996-12-19 2002-03-27 Toshiba Ceramics Co., Ltd. Vapor deposition apparatus for forming thin film
JPH10177961A (en) * 1996-12-19 1998-06-30 Toshiba Ceramics Co Ltd Vapor growth device and method

Also Published As

Publication number Publication date
JPH0750260A (en) 1995-02-21

Similar Documents

Publication Publication Date Title
US5556275A (en) Heat treatment apparatus
JP2000331939A (en) Film-forming device
JP3758579B2 (en) Heat treatment apparatus and heat treatment method
JP3184550B2 (en) Vapor phase growth method and apparatus
JP4936621B2 (en) Process chamber of film forming apparatus, film forming apparatus and film forming method
JPS63150912A (en) Formation of thin film and apparatus therefor
JP2783041B2 (en) Vapor phase silicon epitaxial growth equipment
JP3113478B2 (en) Semiconductor manufacturing equipment
JPS59112614A (en) Vapor growth apparatus
JP3534866B2 (en) Vapor phase growth method
JPH01256118A (en) Vapor phase reaction equipment
EP0330708B1 (en) Apparatus for forming thin films
JP3115058B2 (en) Vapor phase growth method, vapor phase growth apparatus, and fine particle generation apparatus
JPS6252200A (en) Device for gaseous-phase epitaxial growth
JPS61289624A (en) Vapor-phase growth device
JPH0590167A (en) Vapor growth method
JP2775837B2 (en) Chemical vapor deposition equipment
JPS61251125A (en) Heating process device
JPH02212393A (en) Vapor growth method and its device
JPH11102903A (en) Method and equipment for thin film forming and method for manufacturing semiconductor device
JPH01119014A (en) Barrel type vapor growth device
JPH02244712A (en) Plasma device
JPS61112315A (en) Vapor growth equipment
JPH07193009A (en) Vapor growth device and vapor growth method using vapor growth device
JPS58145117A (en) Manufacturing apparatus of semiconductor

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080427

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090427

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100427

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100427

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110427

Year of fee payment: 10

EXPY Cancellation because of completion of term