JP3172757B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置

Info

Publication number
JP3172757B2
JP3172757B2 JP12823193A JP12823193A JP3172757B2 JP 3172757 B2 JP3172757 B2 JP 3172757B2 JP 12823193 A JP12823193 A JP 12823193A JP 12823193 A JP12823193 A JP 12823193A JP 3172757 B2 JP3172757 B2 JP 3172757B2
Authority
JP
Japan
Prior art keywords
plasma
magnetic field
antenna
electromagnetic wave
plasma generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP12823193A
Other languages
English (en)
Japanese (ja)
Other versions
JPH06318565A (ja
Inventor
孝之 深沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP12823193A priority Critical patent/JP3172757B2/ja
Priority to TW083103763A priority patent/TW252262B/zh
Priority to KR1019940008916A priority patent/KR100290749B1/ko
Priority to US08/235,641 priority patent/US5537004A/en
Publication of JPH06318565A publication Critical patent/JPH06318565A/ja
Application granted granted Critical
Publication of JP3172757B2 publication Critical patent/JP3172757B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Plasma Technology (AREA)
JP12823193A 1993-03-06 1993-05-01 プラズマ処理装置 Expired - Fee Related JP3172757B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP12823193A JP3172757B2 (ja) 1993-05-01 1993-05-01 プラズマ処理装置
TW083103763A TW252262B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-05-01 1994-04-26
KR1019940008916A KR100290749B1 (ko) 1993-05-01 1994-04-27 플라즈마처리장치
US08/235,641 US5537004A (en) 1993-03-06 1994-04-29 Low frequency electron cyclotron resonance plasma processor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12823193A JP3172757B2 (ja) 1993-05-01 1993-05-01 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPH06318565A JPH06318565A (ja) 1994-11-15
JP3172757B2 true JP3172757B2 (ja) 2001-06-04

Family

ID=14979742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12823193A Expired - Fee Related JP3172757B2 (ja) 1993-03-06 1993-05-01 プラズマ処理装置

Country Status (3)

Country Link
JP (1) JP3172757B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR100290749B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW252262B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000299199A (ja) * 1999-04-13 2000-10-24 Plasma System Corp プラズマ発生装置およびプラズマ処理装置
JP3820188B2 (ja) 2002-06-19 2006-09-13 三菱重工業株式会社 プラズマ処理装置及びプラズマ処理方法
CN111140454B (zh) * 2020-02-13 2021-05-04 哈尔滨工业大学 一种微型电子回旋共振离子推力器点火装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2598336B2 (ja) * 1990-09-21 1997-04-09 株式会社日立製作所 プラズマ処理装置

Also Published As

Publication number Publication date
KR100290749B1 (ko) 2001-10-24
KR940027041A (ko) 1994-12-10
JPH06318565A (ja) 1994-11-15
TW252262B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1995-07-21

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Legal Events

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R250 Receipt of annual fees

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LAPS Cancellation because of no payment of annual fees