JP3113517B2 - Substrate processing equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus,
The present invention relates to a substrate processing apparatus that performs a plurality of substrate processing.

[0002]

2. Description of the Related Art For cleaning the surface of a substrate to be processed, for example, a semiconductor substrate or a glass substrate for a liquid crystal display device, an immersion type substrate processing apparatus is used. As this type of substrate processing apparatus, an apparatus for processing a substrate without a carrier is known. The substrate processing apparatus includes a carrier loading / unloading unit, a substrate transfer unit configured to take a substrate in and out of the carrier,
A carrier transfer robot that transfers a carrier between the loading / unloading unit and the substrate transfer unit, a plurality of substrate processing units arranged side by side, and a substrate that transfers the substrate between the substrate transfer unit and the substrate processing unit And a transfer robot. The substrate transfer robot has a holding arm that opens and closes and holds the substrate. In addition, an arm cleaning device that cleans the holding arm of the substrate transfer robot is arranged in the substrate processing unit so that the substrate is not contaminated by holding the substrate by the holding arm that is contaminated with the processing liquid when transferring the substrate. Have been. The arm washing device includes a washing tank, a washing liquid ejection unit that ejects a washing liquid in the washing tank, and a gas ejection unit that ejects a dry gas in the washing tank.

[0003] Such arm cleaning devices are provided by the number of substrate transport robots that transport substrates wet with a processing liquid. For example, when one substrate is transported, one substrate is provided, three substrates are transported, and when two of the substrates are wet, two substrates are provided.

[0004]

In the above-mentioned conventional apparatus,
Since the arm cleaning device is provided beside the substrate processing unit, the installation area of the device is increased. In particular, when the number of the substrate processing units is small, the ratio of the arm cleaning device to the entire device increases, and the efficiency becomes poor. The purpose of the present invention is
An object of the present invention is to provide a substrate processing apparatus capable of preventing contamination by a holding arm with a small installation area.

Another object of the present invention is to provide a substrate processing apparatus capable of reliably preventing contamination by a holding arm.

[0006]

According to a first aspect of the present invention, there is provided a substrate processing apparatus for processing a plurality of substrates,
One or more substrate processing having a processing bath for processing a substrate
Means, and a holding arm for holding the substrate.
Substrate transfer means for transferring to the processing means; and
Drying means for drying the holding arm and substrate processing
Cleaning means provided on the means, for cleaning the holding arm;
The substrate processing means is disposed outside the processing tank.
A drying unit and a washing unit disposed inside the outer tank.
Is placed.

[0007]

[0008] The substrate processing apparatus according to claim 2, claim 1
Wherein the drying means has a dry gas discharge section for discharging a dry gas for discharging the dry gas toward the holding arm, and the cleaning means has a cleaning liquid discharge section for discharging the cleaning liquid toward the holding arm. ing. According to a third aspect of the present invention, there is provided the substrate processing apparatus according to the second aspect , further comprising an elevating drive unit configured to make a cleaning liquid discharge unit of the cleaning unit and a dry gas discharge unit of the drying unit.

According to a fourth aspect of the present invention, there is provided a substrate processing apparatus.
4. In the apparatus according to any one of the above-described items 3 , at least one of the substrate processing units has a rinsing tank for performing a rinsing process, and the drying unit is provided in the substrate processing unit having the rinsing tank. According to a fifth aspect of the present invention, in the apparatus of the fourth aspect , the cleaning unit is provided in the substrate processing unit having a washing tank.

[0010] The substrate processing apparatus according to claim 6 is the first aspect of the present invention.
In the apparatus according to any one of the above items (1) to ( 3 ), the substrate processing means continuously performs the substrate processing with the plurality of processing liquids in the processing tank.

[0011]

In the substrate processing apparatus according to the first aspect, the substrate transfer means transfers the substrate to the substrate processing means by the holding arm. The transported substrate is immersed in a processing bath to be processed. The substrate after the processing is transported while being held by the holding arm.
When the substrate transport means does not transport the substrate ,
The cleaning means arranged inside the arranged outer tub is
After cleaning the arm, dry hands placed inside the outer tank
The step dries the holding arm.

[0012]

In the substrate processing apparatus according to the second aspect, the cleaning liquid discharge section discharges the cleaning liquid toward the holding arm, and thereafter, the dry gas discharge section discharges the drying gas toward the holding arm. In the substrate processing apparatus according to the third aspect , the lifting drive unit raises and lowers the cleaning liquid discharge unit and the dry gas discharge unit. Claim 4
In the substrate processing apparatus according to the above, the drying means is provided in the substrate processing means having the washing tank for performing the washing treatment, and the holding arm can be washed and dried only by dipping the holding arm in the washing tank and then drying.

In the substrate processing apparatus according to the fifth aspect , the holding arm is washed with the washing means on the washing tank, and then the holding arm is dried by the drying means. In the substrate processing apparatus according to claim 6 , in the substrate processing means, the substrate processing is continuously performed with a plurality of processing liquids in one processing tank.

[0015]

1 and 2, an immersion type substrate cleaning apparatus 1 as a substrate processing apparatus according to an embodiment of the present invention includes a loading / unloading section 2 for a carrier C containing a substrate W and a carrier C.
Transfer unit 3 for taking out the substrate W from the substrate or storing the substrate W in the carrier C, the loading / unloading unit 2 and the substrate transfer unit 3
Transfer robot 4 for transferring carrier C between
A immersion-type substrate cleaning section 5 for cleaning a plurality of substrates W at once, a substrate drying section 6 for draining and drying the substrates W, and a plurality of substrates taken out of the carrier C by the substrate transfer section 3. The apparatus is composed of a substrate transfer robot 7 that collectively holds the substrates W and transfers the substrates W to the substrate cleaning unit 5 and the substrate drying unit 6.

The substrate transfer section 3 mounts the carrier C and
It has two tables 8 that rotate by 0 °, and a substrate holder 3a for extracting a substrate W from the carrier C placed on the table 8. The substrate holder 3a can be moved up and down at the center of the table 8. The carrier transfer robot 4 is configured to be able to move up and down, rotate, and move in the arrow A direction. The carrier transfer robot 4 includes the loading / unloading unit 2
The carrier C loaded into the substrate transfer section 3 is transferred onto the table 8 of the substrate transfer section 3, and the carrier C containing the cleaned substrate W is transferred from the table 8 to the transfer section 2.

The substrate transfer robot 7 has a moving part 10 movable in the direction of arrow B, and a holding arm 9 for holding a plurality of substrates W received from the substrate transfer part 3. The robot 7 sequentially transports the plurality of substrates W sandwiched by the holding arms 9 to the substrate cleaning processing unit 5 and the substrate drying unit 6 by the moving unit 10. The substrate cleaning processing unit 5 includes two separate processing units, an overflow type cleaning processing unit 5a and a water cleaning processing unit 5b. Each processing unit 5a, 5b
The cleaning apparatus includes cleaning tanks 12a and 12b and a substrate holder 11 provided in the cleaning tanks 12a and 12b so as to be able to move up and down. Each of the processing units 5a and 5b holds a plurality of substrates W received from the substrate transfer robot 7 by the substrate holder 11 and
a, 12b.

As shown in FIGS. 3 and 4, an outer tank 25 is disposed around the washing tank 12b of the washing section 5b. An arm cleaning and drying device 30 for cleaning and drying the holding arm 9 is provided inside the outer tank 25. The arm washing / drying device 30 includes a guide member 31 vertically arranged on the inner wall of the outer tub 25, a washing / drying machine main body 32 vertically guided by the guide member 31, and an elevating drive for driving the washing / drying machine main body 32 up and down. And a mechanism 33.

As shown in FIG. 5, the guide member 31 is a member having a U-shaped cross section and a vertically long member. The washing / drying machine main body 32 is connected to a slide plate 35 guided by the guide member 31, a resin air cylinder 36 disposed at the upper center of the slide plate 35, and a tip of the air cylinder 36 via a wire 37. Swing frame 38. The wire 37 is wound around a pulley 39.

The oscillating frame 38 includes a gas discharge portion 40 connected to the tip of the wire 37, a cleaning liquid discharge portion 41 disposed in parallel below the gas discharge portion 40, and a gas discharge portion 40.
And an upper link 42 and a lower link 43 connected to both ends of the cleaning liquid discharge section 41, respectively. Upper link 4
The second link 43 and the lower link 43 are arranged in parallel, and the base end is rotatably supported by the slide plate 35. Further, both ends of the gas discharge unit 40 and the cleaning liquid discharge unit 41 are connected by a link 44.
Are connected by The gas discharge unit 40 and the cleaning liquid discharge unit 41 have a structure in which both ends of the pipe are sealed,
It has a gas discharge port 45 and a liquid discharge port 46 for discharging gas and cleaning liquid obliquely downward toward the holding arm 9. A large number of these discharge ports 45 and 46 are arranged in the axial direction. A dry gas and a cleaning liquid from a gas supply source and a cleaning liquid supply source (not shown) can be supplied to one ends of the gas discharge unit 40 and the cleaning liquid discharge unit 41, respectively.

The elevating mechanism 33 includes a driving pulley 47 and a driven pulley 48 that are vertically spaced from each other, and an endless belt 5 that is bridged between the driving pulley 47 and the driven pulley 48.
0 and a two-axis motor 51 for driving the driving pulley. A drive shaft 52 is provided at both ends of the double shaft motor 51.
Are connected to each other, and drive pulleys 47 are provided at both ends of the drive shaft 52.
Has been fixed.

Next, the operation of the above embodiment will be described. When the carrier C containing the substrate W is placed on the loading / unloading section 2, the carrier transfer robot 4 receives it and places it on the substrate transfer section 3. When the carrier C is transferred to the table 8 of the substrate transfer unit 3, the substrate holding unit 3 a takes out the substrate W from the carrier C and transfers it to the substrate transfer robot 7 in the substrate transfer unit 3. The substrate transfer robot 7 to which the substrate W has been transferred transfers the substrate W to the cleaning tank 12a of the cleaning processing unit 5a. When the cleaning process is completed, the substrate W is transferred by the substrate transfer robot 7 to the cleaning tank 12b of the rinsing unit 5b. When the rinsing process is completed, the immersed substrate W is sent to the substrate drying unit 6 by the substrate transfer robot 7.

When the substrate W is sent to the substrate drying section 6, the substrate W is drained and dried. During the draining and drying process, the substrate transfer robot 7 is disposed on the water washing section 5b. When the substrate transfer robot 7 is placed on the washing section 5b,
As shown in FIG. 4, the washing / drying machine main body 32 is
To rise. Subsequently, the swing frame 38 is swung inward by the advance of the air cylinder 36, so that the gas discharge unit 40 and the cleaning liquid discharge unit 41 approach the holding arm 9. Then, toward the holding arm 9, first, the cleaning liquid discharge unit 4
The cleaning liquid is discharged from 1 for a predetermined time. When the discharge of the cleaning liquid is completed, the slide plate 35 is slightly lowered to bring the gas discharge unit 40 close to the holding arm 9, and the dry gas is discharged from the gas discharge unit 40 for a predetermined time. As the drying gas, for example, N ₂ gas is used. When the discharge of the drying gas is completed, the washing / drying machine main body 32 is lowered to the position shown in FIG. Further, the gas discharge unit 40 and the cleaning liquid discharge unit 41 are stored at positions along the slide plate 35 by retreating the air cylinder 36. Thus, the holding arm 9 wet and contaminated by the cleaning liquid is washed and dried.

When the substrate drying process by the substrate drying unit 6 is completed, the substrate W is held by the holding arm 9 that has been washed and dried, and transferred to the substrate transfer unit 3. In the substrate transfer unit 3, the substrate holding unit receives the substrate and stores the substrate W in the carrier C. The carrier C containing the processed substrate W is transferred to the carry-in / carry-out section 2 by the carrier transport robot 4 and waits for carry-out by a carrier carrier (not shown). [Other Embodiments] (a) The swing mechanism of the gas discharge unit 40 and the liquid discharge unit 41 is not necessarily required depending on the positional relationship with the holding arm, and the gas discharge unit 40 and the cleaning liquid discharge unit 41 are mounted on the slide plate 35. It may be fixed directly. (B) When the substrate transfer robot has an elevating mechanism, the holding arm 9 is immersed in the washing tank 12b for washing.
Only the drying process by the gas discharge unit 40 may be performed. (C) Each of the gas discharge unit 40 and the cleaning liquid discharge unit 41 has one discharge port instead of the plurality of discharge units 45 and 46, and scans the discharge ports horizontally in the longitudinal direction of the holding arm by another swing mechanism. You may do it.

[0025]

According to the first aspect of the present invention, since the drying means is provided in the substrate processing means, there is no need to provide a separate drying means, and the installation area can be reduced.
In addition, since drying can be performed after cleaning, contamination by the holding arm can be reliably prevented. Furthermore, drying means and washing means
Since it is not located in the processing tank, drying means and cleaning
The step is less likely to be contaminated by the processing solution, which reduces contamination by the holding arm.
It can be prevented more reliably.

In the substrate processing apparatus according to the second aspect , the holding arm can be efficiently cleaned and dried because the substrate is cleaned with the cleaning liquid and then dried with the dry gas.

In the substrate processing apparatus according to the third aspect , when cleaning the holding arm, the cleaning and drying means can be arranged above the processing tank, so that it is not necessary to raise and lower the holding arm, and the structure of the substrate transfer means is simplified. In the substrate processing apparatus according to the fourth aspect , the holding arm can be washed and dried only by performing drying only after immersing the holding arm in the washing tank.

In the substrate processing apparatus according to the fifth aspect , since the cleaning and drying processing of the holding arm is performed in the washing tank, the processing liquid can be easily discharged. In the substrate processing apparatus according to the sixth aspect , since the number of processing tanks can be reduced, the installation area can be further reduced.

[Brief description of the drawings]

FIG. 1 is a perspective view of a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a longitudinal sectional view thereof.

FIG. 3 is a schematic sectional view of an arm cleaning / drying apparatus.

FIG. 4 is a schematic sectional view of an arm cleaning / drying apparatus.

FIG. 5 is a perspective partial view of an arm cleaning / drying apparatus.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 5 Substrate cleaning processing part 5b Water cleaning processing part 12b Cleaning tank 30 Arm cleaning / drying device 32 Cleaning / drying machine main body 33 Elevating mechanism 40 Gas discharge part 41 Cleaning liquid discharge part

Claims (6)

(57) [Claims] 1. A substrate processing apparatus for processing a plurality of substrates, comprising: one or a plurality of substrate processing means having a processing bath for processing the substrate; and a holding arm for holding the substrate. A substrate transporting unit for transporting the substrate to the substrate processing unit; a drying unit provided in the substrate processing unit for drying the holding arm; and a drying unit provided to the substrate processing unit for cleaning the holding arm.
Cleaning means, wherein the substrate processing means is provided outside the processing tank.
A drying tank and a washing means,
Substrate processing equipment located inside 2. The drying means according to claim 1 , wherein
Dry gas discharge unit that discharges dry gas that discharges dry gas
Wherein the cleaning means is directed toward the holding arm.
2. The substrate processing apparatus according to claim 1 , further comprising a cleaning liquid discharge unit configured to discharge the cleaning liquid . 3. The cleaning liquid discharge section of the cleaning means and the cleaning liquid discharge section.
A lifting drive unit for raising and lowering the drying gas discharge unit of the drying unit
The substrate processing apparatus according to claim 2, further comprising: 4. A method according to claim 1, wherein at least one of said plurality of substrate processing means is provided.
Another one has a washing tank for performing a washing treatment, and the drying means
Is provided in the substrate processing means having a washing tank.
4. The substrate processing apparatus according to claim 1, wherein: 5. A cleaning device according to claim 1 , wherein said cleaning means comprises a substrate having said washing tank.
The substrate processing apparatus according to claim 4 , wherein the substrate processing apparatus is provided in a processing unit. 6. The substrate processing means includes:
4. The method according to claim 1, wherein the substrate processing using the processing liquid is performed continuously.
A substrate processing apparatus according to any one of the above.