JP3085100B2 - Magnetoelectric conversion element - Google Patents

Magnetoelectric conversion element

Info

Publication number
JP3085100B2
JP3085100B2 JP06213756A JP21375694A JP3085100B2 JP 3085100 B2 JP3085100 B2 JP 3085100B2 JP 06213756 A JP06213756 A JP 06213756A JP 21375694 A JP21375694 A JP 21375694A JP 3085100 B2 JP3085100 B2 JP 3085100B2
Authority
JP
Japan
Prior art keywords
layer
conversion element
magnetoelectric conversion
magnetoresistive
short bar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP06213756A
Other languages
Japanese (ja)
Other versions
JPH0878755A (en
Inventor
雅永 西川
友春 佐藤
利昭 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP06213756A priority Critical patent/JP3085100B2/en
Publication of JPH0878755A publication Critical patent/JPH0878755A/en
Application granted granted Critical
Publication of JP3085100B2 publication Critical patent/JP3085100B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】磁性体基板に磁気抵抗効果層が形
成された磁電変換素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoelectric conversion element in which a magnetoresistance effect layer is formed on a magnetic substrate.

【0002】[0002]

【従来の技術】従来から絶縁材料あるいは磁性材料から
なる基板に、磁気抵抗効果を有するInSbなどからな
る磁気抵抗効果層が形成された磁電変換素子が、厚さ、
角度、回転数などを検知するためのセンサ−を構成する
ための素子として広く用いられている。このような磁電
変換素子の構造を図2、4、5を用いて説明する。
2. Description of the Related Art Conventionally, a magnetoelectric conversion element in which a magnetoresistance effect layer made of InSb or the like having a magnetoresistance effect is formed on a substrate made of an insulating material or a magnetic material has a thickness,
It is widely used as an element for constituting a sensor for detecting an angle, a rotation speed, and the like. The structure of such a magneto-electric transducer is described with reference to FIG. 2, 4 and 5.

【0003】図4は従来の磁電変換素子20の断面図
で、磁性体基板1にミアンダライン形状を有するInS
b薄膜からなる磁気抵抗効果層2が、例えばエポキシ樹
脂などの熱硬化性樹脂による接着層3により接着されて
いる。さらに前記ミアンダライン形状を有する磁気抵抗
効果層2には電気伝導性を有するショ−トバ−4...
4が多数個形成されている。図2の部分平面図にショ−
トバ−4....4が形成された磁気抵抗効果層2を示
す。図2に示すように磁気抵抗効果層2の両端には外部
素子と電気的に接続するための接続端子(図示せず)を
接続するための電極5、5が形成されている。
FIG . 4 is a cross-sectional view of a conventional magneto-electric transducer 20 in which a magnetic substrate 1 has a meandering InS
The magnetoresistive layer 2 made of a thin film b is bonded by an adhesive layer 3 made of a thermosetting resin such as an epoxy resin. Further, the magnetoresistive layer 2 having the meander line shape has a short bar having electrical conductivity. . .
4 are formed in large numbers. In the partial plan view of FIG.
Toba-4. . . . 4 shows the magnetoresistive effect layer 2 on which 4 is formed. As shown in FIG. 2, electrodes 5, 5 for connecting connection terminals (not shown) for electrically connecting to an external element are formed at both ends of the magnetoresistive layer 2.

【0004】このような磁電変換素子の製造方法を図5
を用いて説明する。
FIG. 5 shows a method of manufacturing such a magnetoelectric conversion element .
This will be described with reference to FIG.

【0005】まずInSbウェハ−6を準備する。この
InSbウェハ−6の片面を鏡面研磨し、さらに研磨面
に全面エッチングを施す。次に図5(1)に示すように
InSbウェハ−6にAlなどの電極材料を蒸着もしく
はスパッタリングにより成膜し電極材7を形成する。次
図5(2)に示すように電極材7をフォトリソグラフ
ィ−によりショ−トバ−4....4と接続電極5、5
に形成する。次に図5(3)に示すようにInSbウェ
ハ−6をフォトリソグラフィ−によりミアンダライン形
状に成形し、磁気抵抗効果層2を形成する。ここで同時
に個々の磁電変換素子20を分離するための溝
8....8も形成する。次に図5(4)に示すように
InSbウェハ−6の磁気抵抗効果層2の形成面をエポ
キシ樹脂などの熱硬化性樹脂からなる接着層3により磁
性体基板1に接着する。次に図5(5)に示すようにI
nSbウェハ−6を前記溝8....8の底面まで研削
することにより多数個の磁電変換素子20が独立して形
成された磁性体基板1を得る。次にダイシングにより溝
8....8で切断し磁電変換素子20を得る。
First, an InSb wafer 6 is prepared. One surface of the InSb wafer 6 is mirror-polished, and the polished surface is entirely etched. Next, as shown in FIG. 5A , an electrode material 7 is formed by depositing an electrode material such as Al on the InSb wafer 6 by vapor deposition or sputtering. Next, as shown in FIG . . . . 4 and connection electrodes 5, 5
Formed. Next, as shown in FIG. 5C , the InSb wafer 6 is formed into a meander line shape by photolithography to form the magnetoresistive layer 2. 7. Grooves for simultaneously separating individual magneto-electric conversion elements 20 here . . . 8 are also formed. Next, as shown in FIG. 5 (4), the surface of the InSb wafer 6 where the magnetoresistive layer 2 is formed is bonded to the magnetic substrate 1 by an adhesive layer 3 made of a thermosetting resin such as an epoxy resin. Next, as shown in FIG.
The nSb wafer-6 is placed in the groove 8. . . . By grinding to the bottom surface of 8, a magnetic substrate 1 on which a large number of magnetoelectric conversion elements 20 are independently formed is obtained. Next, grooves are formed by dicing. . . . 8 to obtain a magnetoelectric conversion element 20.

【0006】[0006]

【発明が解決しようとする課題】しかしながら従来の磁
電変換素子はショ−トバ−と磁気抵抗効果層が形成され
た面をエポキシ樹脂で磁性体基板に接着するとき、樹脂
の硬化収縮により、磁気抵抗効果層にクラックが入るこ
とがあった。また磁気抵抗効果層が形成された面にエポ
キシ樹脂が十分入り込まないことがありその部分に気泡
が生じるので、磁気抵抗効果層の端が欠けたりショ−ト
バ−が脱落することがあった。
However, in the conventional magnetoelectric transducer, when the surface on which the short bar and the magnetoresistive layer are formed is adhered to the magnetic substrate with an epoxy resin, the magnetoresistive shrinkage of the resin causes the magnetoresistance. Cracks sometimes occurred in the effect layer. Further, the epoxy resin may not sufficiently enter the surface on which the magnetoresistive layer is formed, and air bubbles may be generated in such a portion, so that the edge of the magnetoresistive layer may be chipped or the short bar may fall off.

【0007】本発明は上記問題点を解決するために考案
されたものであり、ショ−トバ−と磁気抵抗効果層を保
護するために、応力緩和効果のある保護層を形成するも
のである。
SUMMARY OF THE INVENTION The present invention has been devised to solve the above problems, and forms a protective layer having a stress relaxing effect to protect a short bar and a magnetoresistive layer.

【0008】[0008]

【課題を解決するための手段】本発明の請求項1にかか
る磁電変換素子は、応力緩和効果のある樹脂による保護
膜を有する磁気抵抗効果層が基板に形成され、さらに、
前記磁気抵抗効果層には電気導電性を有するショートバ
ーが形成されており、前記保護膜を介して磁性体基板に
前記磁気抵抗効果層のショートバーが形成されている面
接着された事を特徴とする。
According to a first aspect of the present invention, there is provided a magnetoelectric conversion element, wherein a magnetoresistance effect layer having a protective film made of a resin having a stress relaxation effect is formed on a substrate .
The magnetoresistive layer has a short bar having electrical conductivity.
Is formed on the magnetic substrate via the protective film.
The surface of the magnetoresistive layer on which the short bar is formed
Is characterized by being adhered.

【0009】[0009]

【作用】請求項1記載の磁電変換素子は、応力緩和効果
のある保護膜を有する磁気抵抗効果層が基板に形成さ
れ、前記保護膜を介して磁性体基板に接着されているの
で、磁気抵抗効果層に樹脂の硬化収縮による応力により
クラックが生じたり、ショ−トバ−が脱落したりするこ
とがなくなる。
According to the magneto-electric conversion element of the present invention, a magneto-resistance effect layer having a protective film having a stress relieving effect is formed on a substrate and adhered to a magnetic substrate via the protective film. Cracks are not generated in the effect layer due to the stress caused by curing shrinkage of the resin, and the short bar is not dropped.

【0010】[0010]

【実施例】(実施例1)以下に本発明の一実施例磁電変
換素子を図1、2、3を用いて説明する。なお従来例と
同一の部分については同一の符号を用いてその説明を省
略する。
(Embodiment 1) A magnetoelectric transducer according to an embodiment of the present invention will be described below with reference to FIGS. Note that the same parts as those in the conventional example are denoted by the same reference numerals, and description thereof will be omitted.

【0011】図1は本実施例の磁電変換素子10の断面
図である。磁電変換素子10はミアンダライン形状を有
するInSb薄膜からなる磁気抵抗効果層2と、前記磁
気抵抗効果層2に形成された電気伝導性を有するショ−
トバ−4....4が応力緩和効果のある例えばポリイ
ミドなどの樹脂による保護層3aにより被覆され、保護
層3aの形成面が例えばエポキシ樹脂などの熱硬化性樹
脂による接着層3により、磁性体基板1に接着された構
造を有している。図2の部分平面図にショ−トバ−
4....4が形成された磁気抵抗効果層2を示す。図
2に示すように磁気抵抗効果層2の両端には外部素子と
電気的に接続するための接続端子(図示せず)を接続す
るための電極5、5が形成されている。
FIG. 1 is a sectional view of a magnetoelectric conversion element 10 according to the present embodiment. The magnetoelectric conversion element 10 includes a magnetoresistive layer 2 made of an InSb thin film having a meandering line shape, and a show having electrical conductivity formed on the magnetoresistive layer 2.
Toba-4. . . . 4 is covered with a protective layer 3a made of a resin such as polyimide having a stress relaxation effect, and the surface on which the protective layer 3a is formed is bonded to the magnetic substrate 1 by an adhesive layer 3 made of a thermosetting resin such as an epoxy resin. It has a structure. Short bar is shown in the partial plan view of FIG.
4. . . . 4 shows the magnetoresistive effect layer 2 on which 4 is formed. As shown in FIG. 2, electrodes 5, 5 for connecting connection terminals (not shown) for electrically connecting to an external element are formed at both ends of the magnetoresistive layer 2.

【0012】このような磁電変換素子の製造方法を図3
を用いて説明する。
FIG. 3 shows a method of manufacturing such a magnetoelectric conversion element.
This will be described with reference to FIG.

【0013】まずInSbウェハ−6を準備する。この
InSbウェハ−6の片面を鏡面研磨し、さらに研磨面
に全面エッチングを施す。次に図3(1)に示すように
InSbウェハ−6にまずAlなどの電極材料を蒸着も
しくはスパッタリングにより成膜し電極材7を形成す
る。次に図3(2)に示すように電極材7をフォトリソ
グラフィ−によりショ−トバ−4....4と接続電極
5、5に形成する。次に図3(3)に示すようにInS
bウェハ−6をフォトリソグラフィ−によりミアンダラ
イン形状に成形し、磁気抵抗効果層2を形成する。ここ
で同時に個々の磁電変換素子20を分離するための溝
8....8も形成する。次に図3(4)に示すように
ポリイミドの有機溶媒溶液をスピンコ−ト法により塗布
し、90℃で30分間乾燥したのち350℃で2時間硬
化し、保護層3aを形成する。次に図3(5)に示すよ
うに保護層3a形成面にエポキシ樹脂などの熱硬化性樹
脂による接着層3を介して、磁性体基板1を接着する。
次に図3(6)に示すようにInSbウェハ−6を前記
溝8....8の底面まで研削することにより個々の磁
電変換素子10が独立して他数個形成された磁性体基板
1を得る。次にダイシングソ−により溝8....8で
切断し磁電変換素子10を得る。
First, an InSb wafer 6 is prepared. One surface of the InSb wafer 6 is mirror-polished, and the polished surface is entirely etched. Next, as shown in FIG. 3A, an electrode material such as Al is first deposited on the InSb wafer 6 by vapor deposition or sputtering to form an electrode material 7. Next, as shown in FIG. . . . 4 and connection electrodes 5 and 5. Next, as shown in FIG.
The wafer b is formed into a meander line shape by photolithography to form the magnetoresistive layer 2. 7. Grooves for simultaneously separating individual magneto-electric conversion elements 20 here . . . 8 are also formed. Next, as shown in FIG. 3D, an organic solvent solution of polyimide is applied by a spin coating method, dried at 90 ° C. for 30 minutes, and then cured at 350 ° C. for 2 hours to form a protective layer 3a. Next, as shown in FIG. 3 (5), the magnetic substrate 1 is bonded to the surface on which the protective layer 3a is formed via an adhesive layer 3 made of a thermosetting resin such as an epoxy resin.
Next, as shown in FIG. . . . By grinding to the bottom surface of 8, a magnetic substrate 1 on which several other magneto-electric conversion elements 10 are independently formed is obtained. Next, grooves 8 are formed with a dicing saw. . . . 8 and the magnetoelectric conversion element 10 is obtained.

【0014】なお本発明は上記各実施例に限定されるも
のではなく、前記電極材はAlの他にCuやAuなど他
の金属材料でも良いし、Ti/AlやTi/Ni/Al
等の二層以上の多層膜構造を用いても良く、またCr・
Cuなどの合金を用いても良い事はいうまでもない。
The present invention is not limited to the above embodiments. The electrode material may be other metal materials such as Cu and Au in addition to Al, or may be Ti / Al or Ti / Ni / Al.
Etc. may be used.
It goes without saying that an alloy such as Cu may be used.

【0015】また保護層を形成する材料として、無機材
料のシリカ(SiO2 )、酸化シリコン(SiO)、
化ケイ素(SiNx )などの材料をスパッタリングや蒸
着により形成しても良い。
As a material for forming the protective layer , an inorganic material
A material such as silica (SiO2), silicon oxide (SiO), or silicon nitride (SiNx) may be formed by sputtering or vapor deposition.

【0016】[0016]

【発明の効果】本発明の磁電変換素子は磁気抵抗効果層
の形成面を、応力緩和効果を有する樹脂による保護層で
被覆することにより、磁性体基板に接着するための熱硬
化性樹脂の硬化収縮の影響を無くすことができた。した
がって磁気抵抗効果層のクラック、欠けおよびショ−ト
バ−の脱落が大幅に削減できた。その結果、良品率を向
上できると共に磁気抵抗効果層の厚みを増やすことがで
きるので、パタ−ン設計の制約が減らせる。
According to the magnetoelectric transducer of the present invention, the surface on which the magnetoresistive layer is formed is covered with a protective layer made of a resin having a stress relaxation effect, whereby the thermosetting resin for bonding to the magnetic substrate is cured. The effect of shrinkage could be eliminated. Therefore, cracks and chips in the magnetoresistive layer and falling off of the short bar were greatly reduced. As a result, the yield rate can be improved, and the thickness of the magnetoresistive layer can be increased, so that restrictions on pattern design can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例磁電変換素子の断面図であ
る。
FIG. 1 is a cross-sectional view of a magnetoelectric conversion element according to an embodiment of the present invention.

【図2】本発明の一実施例磁電変換素子の部分平面図で
ある。
FIG. 2 is a partial plan view of a magnetoelectric conversion element according to an embodiment of the present invention.

【図3】本発明の一実施例磁電変換素子の製造途中を示
す図である。
FIG. 3 is a diagram showing a manufacturing process of the magneto-electric conversion element according to one embodiment of the present invention;

【図4】従来の磁電変換素子の断面図であるFIG. 4 is a sectional view of a conventional magnetoelectric conversion element.

【図5】従来の磁電変換素子の製造途中を示す図であ
る。
FIG. 5 is a view showing a state in the course of manufacturing a conventional magnetoelectric conversion element.

【符号の説明】[Explanation of symbols]

1 磁性体基板 2 磁気抵抗効果層 3 接着層 3a 保護層 4 ショ−トバ− 5 接続電極 6 InSbウェハ− 7 電極材 8 溝 10、20 磁電変換素子 DESCRIPTION OF SYMBOLS 1 Magnetic substrate 2 Magnetoresistive layer 3 Adhesive layer 3a Protective layer 4 Short bar 5 Connection electrode 6 InSb wafer 7 Electrode material 8 Groove 10, 20 Magnetoelectric conversion element

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 43/08 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 43/08

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】応力緩和効果のある樹脂による保護膜を有
する磁気抵抗効果層が基板に形成され、さらに、前記磁
気抵抗効果層には電気導電性を有するショートバーが形
成されており、前記保護膜を介して磁性体基板に前記磁
気抵抗効果層のショートバーが形成されている面が接着
された事を特徴とする磁電変換素子。
1. A magnetoresistive layer having a protective layer of a resin having the stress relaxation effect is formed on the substrate, further, the magnetic
A short bar with electrical conductivity is formed in the air resistance effect layer
It made which are, the magnetic to the magnetic substrate via the protective film
A magnetoelectric conversion element characterized in that the surface of the air resistance effect layer on which the short bar is formed is adhered.
JP06213756A 1994-09-07 1994-09-07 Magnetoelectric conversion element Expired - Lifetime JP3085100B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06213756A JP3085100B2 (en) 1994-09-07 1994-09-07 Magnetoelectric conversion element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06213756A JP3085100B2 (en) 1994-09-07 1994-09-07 Magnetoelectric conversion element

Publications (2)

Publication Number Publication Date
JPH0878755A JPH0878755A (en) 1996-03-22
JP3085100B2 true JP3085100B2 (en) 2000-09-04

Family

ID=16644513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06213756A Expired - Lifetime JP3085100B2 (en) 1994-09-07 1994-09-07 Magnetoelectric conversion element

Country Status (1)

Country Link
JP (1) JP3085100B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6732583B1 (en) * 2000-05-15 2004-05-11 Mitsubishi Denki Kabushiki Kaisha Sensor element and its manufacturing method
WO2015182370A1 (en) * 2014-05-30 2015-12-03 株式会社村田製作所 Method for manufacturing electronic component

Also Published As

Publication number Publication date
JPH0878755A (en) 1996-03-22

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