JP3071115B2 - Manufacturing method of chip-shaped electronic components - Google Patents

Manufacturing method of chip-shaped electronic components

Info

Publication number
JP3071115B2
JP3071115B2 JP6290740A JP29074094A JP3071115B2 JP 3071115 B2 JP3071115 B2 JP 3071115B2 JP 6290740 A JP6290740 A JP 6290740A JP 29074094 A JP29074094 A JP 29074094A JP 3071115 B2 JP3071115 B2 JP 3071115B2
Authority
JP
Japan
Prior art keywords
electronic component
chip
resin
cushioning material
injection molding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6290740A
Other languages
Japanese (ja)
Other versions
JPH08148392A (en
Inventor
秀徳 上川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saga Sanyo Industry Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Saga Sanyo Industry Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saga Sanyo Industry Co Ltd, Sanyo Electric Co Ltd filed Critical Saga Sanyo Industry Co Ltd
Priority to JP6290740A priority Critical patent/JP3071115B2/en
Publication of JPH08148392A publication Critical patent/JPH08148392A/en
Application granted granted Critical
Publication of JP3071115B2 publication Critical patent/JP3071115B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Injection Moulding Of Plastics Or The Like (AREA)
  • Details Of Resistors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、固体電解コンデンサ等
のチップ状電子部品の製法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a chip-type electronic component such as a solid electrolytic capacitor.

【0002】[0002]

【従来技術】固体電解コンデンサ、チップ状抵抗、チッ
プ状コイル等のチップ状電子部品は、図8に示す如く、
電子部品素子(4a)をモールド(100)内に収容し、電子部
品素子(4a)とモールド(100)との間に形成される空間(10
2)内に、該空間に通じるゲート(101)(溶融樹脂の流入
口)から高圧で溶融樹脂を充満させ(以下、射出成形と呼
ぶ)、電子部品素子(4a)を樹脂にて被覆し外殻を形成し
ている。
2. Description of the Related Art Chip-shaped electronic components such as a solid electrolytic capacitor, a chip-shaped resistor, a chip-shaped coil, etc., as shown in FIG.
The electronic component element (4a) is accommodated in the mold (100), and the space (10) formed between the electronic component element (4a) and the mold (100) is formed.
2) Fill the inside with molten resin at a high pressure from a gate (101) (inlet of molten resin) leading to the space (hereinafter referred to as injection molding), cover the electronic component element (4a) with resin, and Forming a shell.

【0003】上記射出成形における溶融樹脂の射出圧は
大で、この時の機械的ショックによって、電子部品の機
能を損うことがある。これを、電子部品が固体電解コン
デンサである場合について説明する。固体電解コンデン
サは、公知の如く、Ta、Al、Nb等の弁作用金属の
表面に誘電体酸化皮膜を形成し、この誘電体酸化皮膜に
導電性高分子等の固体電解質を形成せしめてコンデンサ
素子を形成し、該コンデンサ素子に射出成形よる樹脂被
覆を行なって外殻となしている。
The injection pressure of the molten resin in the above injection molding is large, and the mechanical shock at this time may impair the function of the electronic component. This will be described for the case where the electronic component is a solid electrolytic capacitor. As is well known, a solid electrolytic capacitor is formed by forming a dielectric oxide film on the surface of a valve metal such as Ta, Al, or Nb, and forming a solid electrolyte such as a conductive polymer on the dielectric oxide film. Is formed, and the capacitor element is coated with a resin by injection molding to form an outer shell.

【0004】上記固体電解コンデンサの製造において、
コンデンサ素子に外殻形成用の樹脂を被覆する際の樹脂
の射出圧による機械的ショックにより、弁作用金属表面
の誘電体酸化皮膜が損傷し、これが原因と思われる漏れ
電流の増大が起こる。漏れ電流の増大を抑制するため
に、溶融樹脂の射出圧を小さくし、或いは、外殻形成前
に、コンデンサ素子(4)に部分的に樹脂を塗布して補強
し、又は図6、図7に示す如く、コンデンサ素子(4)の
表面全体に樹脂のコーティング層(8)を形成して、外殻
形成用の溶融樹脂の射出圧による機械的ショックを緩和
している。
In the production of the solid electrolytic capacitor,
When the capacitor element is coated with the resin for forming the outer shell, a mechanical shock due to the injection pressure of the resin damages the dielectric oxide film on the valve metal surface, which causes an increase in leakage current, which is considered to be the cause. In order to suppress an increase in leakage current, the injection pressure of the molten resin is reduced, or a resin is partially applied to the capacitor element (4) before the outer shell is formed to reinforce the resin. As shown in (1), a resin coating layer (8) is formed on the entire surface of the capacitor element (4) to reduce the mechanical shock caused by the injection pressure of the molten resin for forming the outer shell.

【0005】[0005]

【本発明が解決しようとする課題】ところが、溶融樹脂
の射出圧を小さくすれば、モールド内での溶融樹脂の回
り込み不良が生じ、成形不良及び信頼性等に問題が生じ
る。又、樹脂塗布によるコンデンサ素子(4)に対する部
分的な補強や、コンデンサ素子の全面に樹脂コーティン
グ層(8)を形成して機械的ショックを緩和した場合も次
の問題が生じる。コンデンサ素子(4)に対する部分的補
強では、主にゲートに近い面、一般的には陽極リード線
(11)の引出し面(41)に樹脂を塗布するが、この作業はコ
ンデンサ素子(4)が小さいため自動化はできず、熟練者
の手作業によらねばならず、極めて能率が悪い。
However, if the injection pressure of the molten resin is reduced, poor wraparound of the molten resin in the mold occurs, resulting in poor molding and reliability. The following problems also occur when the capacitor element (4) is partially reinforced by applying a resin, or when a resin coating layer (8) is formed on the entire surface of the capacitor element to reduce mechanical shock. For the partial reinforcement of the capacitor element (4), mainly the surface close to the gate, generally the anode lead
Although the resin is applied to the drawing surface (41) of (11), this operation cannot be automated due to the small size of the capacitor element (4) and must be performed manually by a skilled person, which is extremely inefficient.

【0006】更に、図6、図7の如く、エポキシ樹脂
液、シリコン樹脂液等の樹脂液をコンデンサ素子(4)の
表面全体に塗布して固化させ、弾性樹脂のコーティング
層(8)を形成し、コンデンサ素子(4)を機械的ショック
から効果的に保護するには、コーティング層(8)の厚み
は大きくなり、これがコンデンサ素子(4)の全面を被覆
することになるため、外殻(9)の厚さを含むチップ状電
子部品は大きくなり、又、コーティング樹脂が電極に付
着して信頼性が低下する問題があった。更に、樹脂液を
固化させるための時間が必要で、作業性が悪かった。本
発明は、上記問題を解決できるチップ状電子部品の製法
を明らかにするものである。
Further, as shown in FIGS. 6 and 7, a resin liquid such as an epoxy resin liquid or a silicon resin liquid is applied to the entire surface of the capacitor element (4) and solidified to form an elastic resin coating layer (8). However, in order to effectively protect the capacitor element (4) from mechanical shock, the thickness of the coating layer (8) increases, which covers the entire surface of the capacitor element (4). There is a problem that the chip-shaped electronic component including the thickness of 9) becomes large, and the coating resin adheres to the electrodes to lower the reliability. Further, time is required for solidifying the resin liquid, and workability is poor. The present invention clarifies a method of manufacturing a chip-shaped electronic component that can solve the above-described problem.

【0007】[0007]

【課題を解決する手段】本発明は、射出成形によって電
子部品素子を樹脂にて被覆して外殻(9)を形成するチッ
プ状電子部品の製法において、射出成形による外殻(9)
の形成前に、電子部品素子の表面の内、モールドのゲー
トとの対向面のみに合成樹脂、ゴム、紙、布等で形成し
た緩衝材(5)を当てておき、溶融樹脂の射出圧を緩衝材
(5)によって和らげる。
SUMMARY OF THE INVENTION The present invention relates to a method of manufacturing a chip-shaped electronic component in which an electronic component is coated with a resin by injection molding to form an outer shell (9).
Before forming the electronic component element, a buffer material (5) made of synthetic resin, rubber, paper, cloth, or the like is applied only to the surface of the electronic component element facing the mold gate, and the injection pressure of the molten resin is reduced. Cushioning material
Relieve by (5).

【0008】[0008]

【作用及び効果】本発明によれば、射出成形時の流入樹
脂による電子部品素子への機械的ショックを緩衝材(5)
が緩和してダメージを小さくするため、従来の様に溶融
樹脂の射出圧を小さくする必要はない。従って、射出圧
を小さくした時の様な、成形不良の発生は抑えることが
できる。
According to the present invention, the mechanical shock to the electronic component element due to the inflow resin at the time of injection molding is cushioned (5).
Therefore, it is not necessary to reduce the injection pressure of the molten resin as in the related art. Therefore, occurrence of molding defects, such as when the injection pressure is reduced, can be suppressed.

【0009】又、弾性コーティング樹脂層を電子部品素
子の全面に被覆する場合の様に、チップ部品の小型化を
妨げることもない。更に、コーティング樹脂液の固化に
要する時間を考慮する必要もない。更に、コーティング
樹脂液が電極に付着して信頼性を低下させることもな
い。緩衝材(5)を電子部品素子に装着する作業は、緩衝
材(5)に接着剤層を形成しておくことにより、自動化し
易い。上記の点から、高性能、高信頼性のチップ状電子
部品を能率的に製造できる。
Further, unlike the case where the elastic coating resin layer is coated on the entire surface of the electronic component element, the miniaturization of the chip component is not hindered. Further, it is not necessary to consider the time required for solidifying the coating resin liquid. Furthermore, the coating resin liquid does not adhere to the electrodes to reduce the reliability. The work of mounting the cushioning material (5) on the electronic component element can be easily automated by forming an adhesive layer on the cushioning material (5). From the above points, a high-performance and highly reliable chip-shaped electronic component can be efficiently manufactured.

【0010】本発明を、ピロール、アニリン、チオフェ
ン等の導電性高分子を固体電解質とした高性能コンデン
サの製造に実施すると、射出成形時の機械的ショック
を、予めモールドのゲートに対向する素子面に設置した
緩衝材(5)によって緩和でき、これにより、コンデンサ
素子の弁作用金属表面の誘電体酸化皮膜が損傷して漏れ
電流が増大することは抑制できる。
When the present invention is applied to the manufacture of a high performance capacitor using a conductive polymer such as pyrrole, aniline, thiophene or the like as a solid electrolyte, mechanical shock during injection molding is applied in advance to the element surface facing the gate of the mold. Can be mitigated by the cushioning material (5) provided in the capacitor element, thereby suppressing an increase in leakage current due to damage to the dielectric oxide film on the valve metal surface of the capacitor element.

【0011】[0011]

【実施例】以下は、固体電解コンデンサについての説明
であり、固体電解コンデンサは、Ta、Al、Nb等の
弁作用金属の表面に、陽極酸化等の方法により、誘電体
酸化皮膜を生じさせ、該皮膜上にピロール、チォフェ
ン、アニリン等の導電性高分子を電解質として形成せし
めたコンデンサ素子(4)に対して射出成形により、外殻
(9)を形成している。以下の実施例では、弁作用金属と
してTa焼結体素子を採用した。尚、この種樹脂の成形
において熱硬化性樹脂の場合、トランスファー成形が実
施され、熱可塑性樹脂の場合は、インジェクション成形
であり、射出成形は一般的にはインジェククション成形
である。但しトランスファー成形も射出成形の一種と考
えられ、本発明では、そのように理解するものとする。
The following is a description of a solid electrolytic capacitor. In the solid electrolytic capacitor, a dielectric oxide film is formed on the surface of a valve metal such as Ta, Al, Nb, etc. by a method such as anodic oxidation. A capacitor element (4) having a conductive polymer, such as pyrrole, thiophene, or aniline, formed as an electrolyte on the film is subjected to an outer shell by injection molding.
(9) is formed. In the following examples, a Ta sintered body element was adopted as the valve metal. In the molding of this kind of resin, transfer molding is performed in the case of a thermosetting resin, and injection molding is performed in the case of a thermoplastic resin, and injection molding is generally injection molding. However, transfer molding is also considered to be a type of injection molding, and is understood as such in the present invention.

【0012】「実施例1」図1、図2の如く、Ta焼結
体とその内部から引き出されたリード線(11)によって構
成された素子部材(1)の、リード線引出し面(41)にリー
ド線(11)を貫通させてシート状緩衝材(5)を当てる。シ
ート状緩衝材(5)はフッソ樹脂にて形成され、厚み0.
2mmであり、中央部にはリード線(11)挿入用の孔(51)が
開設されている。次に素子部材(1)の化成をH3PO4
溶液中で陽極酸化により行ない、誘電体酸化皮膜を形成
させた。
Example 1 As shown in FIGS. 1 and 2, a lead wire lead-out surface (41) of an element member (1) composed of a Ta sintered body and a lead wire (11) drawn out from the inside thereof. Then, the sheet-like cushioning material (5) is applied by passing the lead wire (11) through. The sheet-like cushioning material (5) is formed of a fluorine resin, and has a thickness of 0.5 mm.
It is 2 mm, and a hole (51) for inserting the lead wire (11) is formed in the center. Next, the element member (1) was formed by anodic oxidation in an aqueous solution of H 3 PO 4 to form a dielectric oxide film.

【0013】上記素子部材(1)を過酸化水素水溶液(1m
ol/l)に10分間、ピロール単量体に30分間さら
し、酸化皮膜上に化学重合ポリピロール膜を形成させ、
その上にピロール単量体(0.1mol/l)とパラトルエン
スルホン酸(0.05mol/l)を含むアセトニトリル溶液
中にて電解重合ポリピロール膜(2)を形成させ、カーボ
ン及び銀ペースト(3)で陰極を引き出し、コンデンサ素
子(4)とした。上記コンデンサ素子(4)のリード線(11)
及びコンデンサ素子(4)の下面に、金属端子板(6)(61)
を溶着或いは接着して接続した。次に、コンデンサ素子
(4)を緩衝材(5)をモールドのゲートに向けてモールド
内にセットし、175℃、射出圧35Kg/cm2の条件
で、エポキシ樹脂を射出成形し、外殻(9)を形成した。
外殻(9)から突出した金属端子板(6)(61)を外殻に沿わ
して屈曲した。次に、125℃で2時間電圧印加し、エ
ージング処理を行ない固体電解コンデンサとした。
[0013] The element member (1) is connected to an aqueous hydrogen peroxide solution (1 m
(l / l) for 10 minutes and the pyrrole monomer for 30 minutes to form a chemically polymerized polypyrrole film on the oxide film,
An electropolymerized polypyrrole film (2) was formed thereon in an acetonitrile solution containing a pyrrole monomer (0.1 mol / l) and paratoluenesulfonic acid (0.05 mol / l), and a carbon and silver paste (3 ) To pull out the cathode to obtain a capacitor element (4). Lead wire (11) for the capacitor element (4)
And metal terminal plates (6) (61) on the lower surface of the capacitor element (4).
Were connected by welding or bonding. Next, the capacitor element
(4) The cushioning material (5) was set in the mold with facing the gate of the mold, and an epoxy resin was injection-molded at 175 ° C. and an injection pressure of 35 kg / cm 2 to form an outer shell (9). .
The metal terminal plates (6) and (61) projecting from the outer shell (9) were bent along the outer shell. Next, a voltage was applied at 125 ° C. for 2 hours to perform an aging process to obtain a solid electrolytic capacitor.

【0014】「実施例2」実施例1とは、シート状緩衝
材(5)を装着する順番が異なる。実施例1同様にして、
Ta焼結体とその内部から引き出されたリード線(11)に
よって構成された素子部材(1)を、H3PO4水溶液中で
陽極酸化し、誘電体酸化皮膜を形成させた。次に、素子
部材(1)を過酸化水素水溶液(1mol/l)に10分間、
ピロール単量体に30分間さらし、酸化皮膜上に化学重
合ポリピロール膜を形成させ、その上にピロール単量体
(0.1mol/l)とパラトルエンスルホン酸(0.05mol
/l)を含むアセトニトリル溶液中にて電解重合ポリピロ
ール膜(2)を形成させ、カーボン及び銀ペースト(3)で
陰極を引き出し、コンデンサ素子(4)とした。上記工程
で、コンデンサ素子(4)を形成してから、緩衝材(5)に
リード線(11)を貫通させて、該緩衝材(5)をリード線引
出し面(41)に当てた。
"Embodiment 2" is different from Embodiment 1 in the order of mounting the sheet-like cushioning material (5). As in Example 1,
The element member (1) constituted by the Ta sintered body and the lead wire (11) drawn out from the inside was anodized in an aqueous solution of H 3 PO 4 to form a dielectric oxide film. Next, the element member (1) was placed in an aqueous solution of hydrogen peroxide (1 mol / l) for 10 minutes.
Exposure to a pyrrole monomer for 30 minutes to form a chemically polymerized polypyrrole film on the oxide film,
(0.1 mol / l) and paratoluenesulfonic acid (0.05 mol / l)
/ L) to form an electrolytically polymerized polypyrrole film (2) in an acetonitrile solution, and the cathode was drawn out with carbon and silver paste (3) to obtain a capacitor element (4). After the capacitor element (4) was formed in the above process, the lead wire (11) was passed through the buffer material (5), and the buffer material (5) was applied to the lead wire lead-out surface (41).

【0015】次に、コンデンサ素子(4)のリード線(11)
及びコンデンサ素子(4)の下面に、金属端子板(6)(61)
を、溶着又は接着にて接続した。以下の工程は、実施例
1と同様にして、コンデンサ素子(4)を緩衝材(5)をモ
ールドのゲートに向けてモールド内にセットし、175
℃、射出圧35Kg/cm2の条件で、エポキシ樹脂を射出
成形し、外殻(9)を形成した。外殻(9)から突出した金
属端子板(6)(61)を外殻に沿わして屈曲した。次に、1
25℃で2時間電圧印加し、エージング処理を行ない固
体電解コンデンサとした。
Next, the lead wire (11) of the capacitor element (4)
And metal terminal plates (6) (61) on the lower surface of the capacitor element (4).
Were connected by welding or bonding. In the following steps, the capacitor element (4) is set in the mold with the cushioning material (5) facing the gate of the mold in the same manner as in Example 1.
An epoxy resin was injection molded at a temperature of 35 ° C. and an injection pressure of 35 kg / cm 2 to form an outer shell (9). The metal terminal plates (6) and (61) projecting from the outer shell (9) were bent along the outer shell. Then, 1
A voltage was applied at 25 ° C. for 2 hours to perform an aging process to obtain a solid electrolytic capacitor.

【0016】「実施例3」上記実施例2のフッソ樹脂製
シート状緩衝材(5)に代えて、同形状のゴム製の緩衝材
(5)用い、実施例2と同様の手順にて実施した。
[Embodiment 3] Instead of the sheet-like cushioning member 5 made of fluororesin of the above-mentioned embodiment 2, a rubber cushioning member of the same shape is used.
(5) Using the same procedure as in Example 2.

【0017】「実施例4」実施例2のフッソ樹脂製シー
ト状緩衝材(5)に代えて、同形状の紙製の緩衝材(5)を
用い、実施例2と同様の手順にて実施した。
"Example 4" A sheet-like cushioning material 5 of the same shape was used in place of the sheet-like cushioning material 5 made of fluororesin of Example 2, and the procedure was the same as in Example 2. did.

【0018】「実施例5」実施例2フッソ樹脂製シート
状緩衝材(5)に代えて、同形状の布製の緩衝材(5)を用
い、実施例2と同様の手順にて実施した。
"Example 5" Example 2 The same procedure as in Example 2 was carried out, except that the cushioning material 5 of the same shape was used instead of the sheet-like cushioning material 5 made of fluororesin.

【0019】「実施例6」実施例2の均一厚みのフッソ
樹脂製シート状緩衝材(5)に代えて、図4、図5に示す
如く、中央部が厚く形成されて、外殻形成用の溶融樹脂
の流入口側の面が錐状に緩やかに傾斜した合成樹脂性の
緩衝材(5)用い、実施例2と同様の手順にて実施した。
この場合、射出成形による外殻(9)を形成時の溶融樹脂
が、緩衝材(5)の斜面に案内されて、樹脂の回りが良く
なる。
Example 6 As shown in FIGS. 4 and 5, instead of the sheet-like cushioning material (5) made of fluoric resin having a uniform thickness in Example 2, a thicker central portion is formed to form an outer shell. The same procedure as in Example 2 was carried out using a synthetic resin buffer material (5) whose surface on the inlet side of the molten resin was gradually inclined in a conical shape.
In this case, the molten resin at the time of forming the outer shell (9) by injection molding is guided by the slope of the cushioning material (5), so that the circumference of the resin is improved.

【0020】『比較例1』上記実施例1において、緩衝
材(5)を省略して、射出成形を175℃、射出圧35Kg
/cm2で行なった(図8)。
[Comparative Example 1] In the above-mentioned Example 1, the buffer material (5) was omitted, and injection molding was performed at 175 ° C and an injection pressure of 35 kg.
/ Cm 2 (FIG. 8).

【0021】『比較例2』実施例1において、緩衝材
(5)を省略して、射出成形を175℃、射出圧15Kg/
cm2で行なった。
"Comparative Example 2"
Omitting (5), the injection molding was performed at 175 ° C and the injection pressure was 15 kg /
Performed in cm 2 .

【0022】『比較例3』実施例1の工程において、緩
衝材(5)を省略してコンデンサ素子(4)を形成し、次に
シリコン樹脂液を素子全体に塗布し、150℃で3時間
固化させ、コンデンサ素子(4)の表面を弾性シリコン樹
脂層(8)にて被覆した。射出成形を175℃、射出圧3
5Kg/cm2で行ない、エージング処理し、コンデンサと
した(図6、図7)。本実施例と比較例による漏れ電流及
び成形不良の検査結果を表1に示す。
[Comparative Example 3] In the process of Example 1, the buffer element (5) was omitted to form a capacitor element (4), and then a silicone resin liquid was applied to the entire element, and the resultant was heated at 150 ° C for 3 hours. After solidification, the surface of the capacitor element (4) was covered with an elastic silicone resin layer (8). Injection molding at 175 ° C, injection pressure 3
This was performed at 5 kg / cm 2 , and subjected to aging treatment to obtain a capacitor (FIGS. 6 and 7). Table 1 shows the inspection results of the leakage current and the molding failure according to the embodiment and the comparative example.

【0023】[0023]

【表1】 [Table 1]

【0024】本発明によると、ピロール、アニリン、チ
オフェン等の導電性高分子を固体電解質とした高性能コ
ンデンサの製造において、射出成形時の機械的ショック
を予めモールドのゲートに対向する素子面に設置した緩
衝材(5)によって緩和でき、これにより、コンデンサ素
子の弁作用金属表面の誘電体酸化皮膜が損傷して漏れ電
流が増大することを抑制できた。又、射出成形の射出圧
の軽減及び樹脂コート等による成形不良もなく、高信頼
性が得られる。
According to the present invention, in the production of a high-performance capacitor using a conductive polymer such as pyrrole, aniline, thiophene or the like as a solid electrolyte, a mechanical shock at the time of injection molding is previously set on the element surface facing the gate of the mold. The buffer material (5) can alleviate the damage, thereby preventing the dielectric oxide film on the valve metal surface of the capacitor element from being damaged and increasing the leakage current. Also, high reliability can be obtained without reduction of injection pressure in injection molding and molding failure due to resin coating or the like.

【0025】更に、コンデンサ素子への緩衝材(5)の装
着は例えば、緩衝材(5)の裏面に接着剤層を形成してお
くことにより、容易に自動化できる。又、従来の様にコ
ンデンサ素子の全面に弾性樹脂のコーティング層(8)を
形成する場合の様に、コーティング樹脂液の固化時間を
考慮する必要はなく、工程の削減ができ、製造能率は向
上する。本実施例の1〜5では、シートの厚さを0.2m
mtとしたが可能な限り厚くする方が効果があるの勿論で
ある。本発明は上記実施例の構成に限定されれることは
なく、特許請求の範囲に記載の範囲で種々の変形が可能
である。
Further, the mounting of the cushioning material (5) to the capacitor element can be easily automated, for example, by forming an adhesive layer on the back surface of the cushioning material (5). Further, unlike the conventional case where the coating layer (8) of the elastic resin is formed on the entire surface of the capacitor element, there is no need to consider the solidification time of the coating resin liquid, so that the number of steps can be reduced and the production efficiency is improved I do. In the first to fifth embodiments, the thickness of the sheet is 0.2 m.
If you have been a m t thicker as possible as a matter of course there is an effect. The present invention is not limited to the configuration of the above embodiment, and various modifications are possible within the scope of the claims.

【図面の簡単な説明】[Brief description of the drawings]

【図1】電子部品素子に緩衝材及び金属端子板を取付け
た状態を示す斜面図である。
FIG. 1 is a perspective view showing a state in which a cushioning material and a metal terminal plate are attached to an electronic component element.

【図2】図1のA−A線に沿う断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】電子部品の断面図である。FIG. 3 is a cross-sectional view of the electronic component.

【図4】他の実施例の緩衝材を使用した場合の斜面図で
ある。
FIG. 4 is a perspective view when a cushioning material of another embodiment is used.

【図5】他の実施例の緩衝材を使用した電子部品の断面
図である。
FIG. 5 is a sectional view of an electronic component using a cushioning material of another embodiment.

【図6】電子部品素子の表面を樹脂コーティングした比
較例の斜面図である。
FIG. 6 is a perspective view of a comparative example in which the surface of an electronic component element is coated with a resin.

【図7】図6の工程を経た電子部品の断面図である。7 is a cross-sectional view of the electronic component after the process of FIG.

【図8】他の比較形の断面図である。FIG. 8 is a sectional view of another comparative type.

【符号の説明】[Explanation of symbols]

(1) 素子部材 (2) ポリピロール膜 (3) カーボン及び銀ペースト層 (4) コンデンサ素子 (5) 緩衝材 (6) 金属端子板 (8) コート樹脂層 (9) 外殻 (1) Element member (2) Polypyrrole film (3) Carbon and silver paste layer (4) Capacitor element (5) Buffer material (6) Metal terminal plate (8) Coated resin layer (9) Outer shell

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H01G 9/08 H01G 1/02 R (58)調査した分野(Int.Cl.7,DB名) H01G 4/00 - 4/40 H01G 13/00 - 13/06 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 identification code FI H01G 9/08 H01G 1/02 R (58) Fields investigated (Int.Cl. 7 , DB name) H01G 4/00-4 / 40 H01G 13/00-13/06

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 電子部品素子に対し、射出成形によって
樹脂製の外殻(9)を形成するチップ状電子部品の製法に
おいて、 合成樹脂又はゴム又は紙又は布からなる所定形状の緩衝
材(5)を予め準備しておき、 射出成形による外殻(9)の形成前に、前記電子部品素子
の表面の内、モールド(100)のゲート(101)との対向面の
みに前記緩衝材(5)を装着し、 射出成形用溶融樹脂の射出圧を、前記緩衝材(5)によっ
て和らげることを特徴とするチップ状電子部品の製法。
1. A method of manufacturing a chip-shaped electronic component in which a resin outer shell (9) is formed on an electronic component element by injection molding, wherein a cushioning material (5) made of a synthetic resin, rubber, paper, or cloth. ) Is prepared in advance, and before the outer shell (9) is formed by injection molding, the cushioning material (5) is provided only on the surface of the electronic component element facing the gate (101) of the mold (100). ), And the injection pressure of the molten resin for injection molding is reduced by the buffer material (5).
【請求項2】 前記電子部品素子は、弁作用金属の表面
に誘電体酸化皮膜を生じさせ、該皮膜上に電解質として
の導電性高分子を形成せしめたコンデンサ素子(4)であ
ることを特徴とする請求項1記載のチップ状電子部品の
製法。
2. The electronic component element is a capacitor element (4) in which a dielectric oxide film is formed on a surface of a valve action metal, and a conductive polymer as an electrolyte is formed on the film. The method for producing a chip-shaped electronic component according to claim 1.
【請求項3】 前記緩衝材(5)は、前記ゲート(101)と
の対向面の中央部に貫通孔が設けられたシート状の形状
を有し、 前記電子部品素子の電極引出し用リード線(11)を、前記
緩衝材(5)の貫通孔に貫通させることを特徴とする請求
項1記載のチップ状電子部品の製法。
3. The cushioning material (5) has a sheet-like shape in which a through hole is provided in a central portion of a surface facing the gate (101), and a lead wire for leading out an electrode of the electronic component element. 2. The method for producing a chip-shaped electronic component according to claim 1, wherein (11) is penetrated through a through hole of said cushioning material (5).
【請求項4】 前記緩衝材(5)は、前記ゲート(101)と
の対向面の中央部に貫通孔が設けられると共に該中央部
が高くなって斜面を形成した形状を有し、 前記電子部品素子の電極引出し用リード線(11)を、前記
緩衝材(5)の貫通孔に貫通させることを特徴とする請求
項1記載のチップ状電子部品の製法。
4. The buffer material (5) has a shape in which a through hole is provided in a central portion of a surface facing the gate (101) and the central portion is raised to form a slope. 2. The method for producing a chip-shaped electronic component according to claim 1, wherein a lead wire (11) for leading out an electrode of the component element is penetrated through a through hole of the buffer material (5).
【請求項5】 前記緩衝材(5)の前記電子部品素子との
対向面に、接着性又は粘着性を有する材料からなる接着
層を形成しておくことを特徴とする請求項1記載のチッ
プ状電子部品の製法。
5. The chip according to claim 1, wherein an adhesive layer made of an adhesive or tacky material is formed on a surface of said cushioning material facing said electronic component element. Of electronic components.
JP6290740A 1994-11-25 1994-11-25 Manufacturing method of chip-shaped electronic components Expired - Fee Related JP3071115B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6290740A JP3071115B2 (en) 1994-11-25 1994-11-25 Manufacturing method of chip-shaped electronic components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6290740A JP3071115B2 (en) 1994-11-25 1994-11-25 Manufacturing method of chip-shaped electronic components

Publications (2)

Publication Number Publication Date
JPH08148392A JPH08148392A (en) 1996-06-07
JP3071115B2 true JP3071115B2 (en) 2000-07-31

Family

ID=17759917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6290740A Expired - Fee Related JP3071115B2 (en) 1994-11-25 1994-11-25 Manufacturing method of chip-shaped electronic components

Country Status (1)

Country Link
JP (1) JP3071115B2 (en)

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JP2001126959A (en) * 1999-10-29 2001-05-11 Matsushita Electric Ind Co Ltd Solid electrolytic capacitor and method for manufacturing the same
JP2002217056A (en) * 2001-01-19 2002-08-02 Shizuki Electric Co Inc Capacitor
US6972943B2 (en) 2002-12-12 2005-12-06 Sanyo Electric Co., Ltd. Electronic component having lead frame
JP2005093463A (en) 2003-09-12 2005-04-07 Sanyo Electric Co Ltd Niobium solid electrolytic capacitor
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JP5114264B2 (en) 2008-03-26 2013-01-09 三洋電機株式会社 Solid electrolytic capacitor and manufacturing method thereof
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Also Published As

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