JP3051268U - Conveyor type continuous solder flux cleaning device - Google Patents
Conveyor type continuous solder flux cleaning deviceInfo
- Publication number
- JP3051268U JP3051268U JP1997011821U JP1182197U JP3051268U JP 3051268 U JP3051268 U JP 3051268U JP 1997011821 U JP1997011821 U JP 1997011821U JP 1182197 U JP1182197 U JP 1182197U JP 3051268 U JP3051268 U JP 3051268U
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- Prior art keywords
- cleaning
- cleaned
- liquid
- container
- conveyor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】
【課題】 種類が一個毎に異なる被洗浄物が、同一ライ
ン上に順次投入、排出されながら洗浄、乾燥を自動的に
連続して行う洗浄装置において、洗浄液、乾燥気体の種
類、温度、時間、超音波照射強度、シャワー強度など各
種異なる洗浄最適条件を、個別被洗浄物に合致して供給
できる手段を得る。また、その供給結果をデータとして
記録し管理利用する。
【解決手段】 水平に配置されるコンベア1の入口側か
ら出口側に向かってシャワー部A、超音波洗浄部B、す
すぎ洗浄部C、液切り部D、温風乾燥部Eが隣接して配
設され、被洗浄物の固定された洗浄容器が各部のヘッド
により密閉され、洗浄容器毎に最適制御を行い、シャワ
ー、超音波洗浄、すすぎ、液切り、温風乾燥する。ま
た、数種類の洗浄液とすすぎ液を貯える液リザーブ部F
を備え、個別被洗浄物に合致した液の供給を可能とし、
制御部Gによる自動制御にて個別被洗浄物に合致した洗
浄条件を得る。
(57) [Summary] [PROBLEMS] In a cleaning apparatus that automatically performs cleaning and drying while sequentially introducing and discharging objects to be cleaned that are different in type from one to another on the same line, a cleaning liquid and a dry gas are used. A means for supplying various optimum cleaning conditions such as type, temperature, time, ultrasonic irradiation intensity, shower intensity and the like in accordance with an individual object to be cleaned is obtained. In addition, the supply result is recorded as data and used for management. SOLUTION: A shower part A, an ultrasonic cleaning part B, a rinse cleaning part C, a liquid drain part D, and a hot air drying part E are arranged adjacently from an inlet side to an outlet side of a horizontally arranged conveyor 1. The cleaning container in which the object to be cleaned is fixed is hermetically sealed by the heads of the respective parts, and optimal control is performed for each cleaning container, and showering, ultrasonic cleaning, rinsing, draining, and hot-air drying are performed. In addition, a liquid reservoir F for storing several types of cleaning liquid and rinsing liquid.
To enable the supply of liquids that match the individual items to be cleaned,
Under the automatic control of the control unit G, the cleaning conditions matching the individual objects to be cleaned are obtained.
Description
【0001】[0001]
本考案は、半導体複合素子(モジュール)製造工程で使用される種々のフラッ クスやはんだボールが付着する被洗浄物を、洗浄容器に貼付したバーコード等の 識別子を読取ることによって、データ化されている洗浄方式の中から選択し、条 件に合致した洗浄工程とその制御をコンベア上で行う個別対応可能な基板のはん だフラックス洗浄装置に関するものである。 In the present invention, the object to be cleaned to which various fluxes and solder balls used in the manufacturing process of the semiconductor composite device (module) are attached is converted into data by reading an identifier such as a bar code attached to the cleaning container. It relates to a solder flux cleaning device for substrates, which can be individually selected from among the cleaning methods selected and the cleaning process that meets the conditions and its control are performed on a conveyor.
【0002】[0002]
従来のはんだフラックス洗浄装置は図4に示すように、超音波洗浄槽41とす すぎ洗浄槽42が並設し、被洗浄物はネットコンベア40に投入され、勾配を上 下動しながら一定方向に搬送される全ての被洗浄物に同一の洗浄工程を与えるは んだフラックス洗浄装置である。 As shown in FIG. 4, in the conventional solder flux cleaning apparatus, an ultrasonic cleaning tank 41 and a rinsing cleaning tank 42 are provided side by side, and an object to be cleaned is charged into a net conveyor 40 and moved in a certain direction while moving up and down the gradient. This is a solder flux cleaning device that applies the same cleaning process to all the objects to be cleaned that are transported.
【0003】[0003]
被洗浄物によっては必ずしも洗浄槽による工程が必要とは限らない。その場合 には不必要となる洗浄槽内の洗浄液を抜き洗浄を行っていた。その為、多品種少 量の製造ラインには洗浄液の充填と放出が伴いコスト的また時間的に不向きであ った。本考案については、洗浄液の異なる洗浄工程を要求する被洗浄物でさえ同 時に装置に投入することが可能で、且つ、個別洗浄容器内に洗浄液を投入し工程 終了後抜取るので、大型洗浄槽の必要がなく被洗浄物個別対応可能なコンベア式 連続はんだフラックス洗浄装置である。 Depending on an object to be cleaned, a step using a cleaning tank is not always necessary. In that case, the cleaning liquid in the cleaning tank, which is no longer needed, was removed and cleaning was performed. For this reason, the production line for a large variety of small quantities requires filling and discharging of the cleaning solution, making it unsuitable for cost and time. According to the present invention, even a cleaning object requiring a different cleaning step of the cleaning liquid can be simultaneously introduced into the apparatus, and the cleaning liquid is supplied into the individual cleaning container and withdrawn after the completion of the step. It is a conveyor type continuous solder flux cleaning device that can individually handle the objects to be cleaned without the need for cleaning.
【0004】[0004]
本考案は前記課題を解決するために、被洗浄物が固定される洗浄容器を具備し 、当該容器が水平に配置されるコンベアの入口側から出口側までを移動する間に 被洗浄物の洗浄乾燥を、洗浄容器と密閉した洗浄ヘッドと当該容器の内部で完了 させる連続洗浄装置を構成する。 In order to solve the above problem, the present invention includes a cleaning container to which an object to be cleaned is fixed, and the cleaning of the object to be cleaned while the container moves from an inlet side to an outlet side of a horizontally arranged conveyor. Construct a continuous washing device that completes drying inside the washing container and the washing head that is sealed with the washing container.
【0005】 当該洗浄容器底部には被洗浄物を固定するボス付き台座を設け剥離後のフラッ クスやはんだボールが容器内気流や水流と相互作用する様傾斜を設ける。コンベ アを休止して実行する洗浄乾燥にはシャワー部と超音波洗浄部とすすぎ洗浄部と 液切り部と温風乾燥部があり、シャワー部にはシャワーノズル及び真空吸上ノズ ル、超音波洗浄部には超音波振動子及び噴流ノズル及び真空吸上ノズル及び液位 センサ、すすぎ洗浄部には噴流ノズル及び真空吸上ノズル及び液位センサ、液切 り部には液切りノズル及び真空吸上げノズル、温風乾燥部には温風ノズル、が固 定されている洗浄ヘッドが隣接される。洗浄ヘッドはコンベア動作に連動して回 動動作し高さの異なる洗浄容器を完全に密閉及び開放する特徴を持つ。[0005] At the bottom of the cleaning container, a pedestal with a boss for fixing an object to be cleaned is provided, and an inclined surface is provided so that the peeled flux or solder ball interacts with the air flow or water flow in the container. Washing and drying, which is performed while the conveyor is paused, includes a shower section, an ultrasonic cleaning section, a rinsing section, a liquid drain section, and a hot air drying section, and the shower section has a shower nozzle, a vacuum suction nozzle, and an ultrasonic wave. Ultrasonic vibrator, jet nozzle and vacuum suction nozzle and liquid level sensor in cleaning part, jet nozzle and vacuum suction nozzle and liquid level sensor in rinse part, liquid drain nozzle and vacuum suction part in liquid drain part A cleaning head in which a rising nozzle and a hot air nozzle are fixed to the hot air drying section is adjacent to the cleaning head. The cleaning head rotates in conjunction with the conveyor operation, and has the feature of completely closing and opening cleaning containers of different heights.
【0006】[0006]
被洗浄物は洗浄容器に固定して装置へ投入され、当該容器に貼付された識別子 のデータに基づき、シャワー部では洗浄液の選択と時間と加圧ポンプの圧力、超 音波洗浄部では洗浄液選択と超音波照射時間と加圧ポンプの圧力、すすぎ工程で は洗浄液の水位と時間と加圧ポンプの圧力、温風乾燥時間はブロア温度と時間、 を各工程ヘッド制御装置が制御部から指示され処理することにより、従来装置に は不可能であった個々に付着物の異なる被洗浄物を連続的に投入することが可能 となる。 The object to be cleaned is fixed in a cleaning container and put into the apparatus.Based on the identifier data affixed to the container, selection and time of the cleaning liquid and the pressure of the pressure pump in the shower section, and selection of the cleaning liquid in the ultrasonic cleaning section are performed. The ultrasonic irradiation time and pressure of the pressure pump, the water level and time of the cleaning liquid and the pressure of the pressure pump in the rinsing process, and the hot air drying time are the blower temperature and time, and the process head control unit is instructed by the control unit to process. By doing so, it is possible to continuously feed objects to be cleaned, each of which has a different attachment, which was impossible with the conventional apparatus.
【0007】[0007]
以下、本考案の実施例を図面に基づき説明する。図1は本考案の請求項1に対 応する実施例の全体構成図、図2は本考案で使用する洗浄容器の基本斜視図、図 3はコンベア上で洗浄容器を密閉する洗浄乾燥ヘッドの具体例である。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is an overall configuration diagram of an embodiment according to claim 1 of the present invention, FIG. 2 is a basic perspective view of a cleaning container used in the present invention, and FIG. 3 is a cleaning and drying head for sealing the cleaning container on a conveyor. This is a specific example.
【0008】 図1に示すように、本実施例は水平に配設されるコンベア1とコンベア1上部 に互いに隣接して設置されるシャワー部Aと超音波洗浄部Bとすすぎ洗浄部Cと 液切り部Dと温風乾燥部Eと液リザーブFと制御部Gとから構成される。As shown in FIG. 1, in this embodiment, a conveyor 1 is disposed horizontally, and a shower unit A, an ultrasonic cleaning unit B, a rinsing unit C, and a shower unit A are installed adjacent to each other above the conveyor 1. It comprises a cutting section D, a hot air drying section E, a liquid reserve F, and a control section G.
【0009】 制御部Gは、コンベア1の位置制御とともに、シャワー部Aのバーコードリー ダ等識別子読取センサにより洗浄容器高さと被洗浄物固有のデータを予め入力さ れたデータベースから検索し、各部に配設されている機器を制御する。The control unit G controls the position of the conveyor 1, and also retrieves the height of the washing container and the data unique to the object to be washed from a database input in advance by an identifier reading sensor such as a barcode reader of the shower unit A, and Controls the equipment installed in the
【0010】 コンベア1は、入口側から出口側まで水平に配置され、図略の駆動源等を介し て循環移動可能に配設される。コンベア1は投入された洗浄容器の全ての洗浄工 程開始終了連動で搬送停止を繰り返し、洗浄ヘッド直下に当該容器が搬送される 様位置制御される。なお、工程開始時には、上下動モータ38により洗浄ヘッド 3を下げ洗浄容器を密閉して洗浄あるいは乾燥を開始、終了後には洗浄ヘッド3 を上げ洗浄容器を開放する。The conveyor 1 is disposed horizontally from the entrance side to the exit side, and is disposed so as to be able to circulate via a drive source (not shown) or the like. Conveyor 1 is repeatedly transported and stopped in synchronization with the start and end of all the cleaning steps of the loaded cleaning container, and the position is controlled so that the container is transported immediately below the cleaning head. At the start of the process, the washing head 3 is lowered by the up / down motor 38, and the washing or drying is started by closing the washing container. After the washing, the washing head 3 is raised and the washing container is opened.
【0011】 図2に示すように、洗浄容器2は耐熱、耐圧素材で作られた容器で、内部底面 には空気や液体が容易に通過可能な網状あるいはスリット状の台座を有し、当該 台座35上端部には被洗浄物固定ボス36が固定されている。当該台座35は、 被洗浄物に付着しているフラックスやはんだボール等が剥離した後、当該容器底 部方向へ容易に転落する様傾斜が設けられている。As shown in FIG. 2, the cleaning container 2 is a container made of a heat-resistant and pressure-resistant material, and has a mesh-shaped or slit-shaped pedestal on the inner bottom surface through which air or liquid can easily pass. An object-to-be-cleaned fixing boss 36 is fixed to the upper end portion 35. The pedestal 35 is provided with an inclination so that the flux, solder balls and the like adhering to the object to be cleaned are peeled off and easily fall down toward the container bottom.
【0012】 また、洗浄容器2側面には、バーコード等の識別子37が貼付され、被洗浄物 が固定された洗浄容器2の個々の識別を促す。また、各部には図3に示すような 洗浄容器2を固定密閉する洗浄ヘッド3が配設され、コンベア1の動作に連動し 制御盤43からの指示で上下動モータ38により送りネジ軸39を回転させ、各 工程開始時には洗浄ヘッド3を下げ密閉、各工程終了時には洗浄ヘッド3を上げ 開放する。An identifier 37 such as a bar code is attached to the side surface of the cleaning container 2 to urge individual identification of the cleaning container 2 to which the object to be cleaned is fixed. A cleaning head 3 for fixing and sealing the cleaning container 2 as shown in FIG. 3 is provided in each part, and a feed screw shaft 39 is moved by a vertical motor 38 according to an instruction from a control panel 43 in conjunction with the operation of the conveyor 1. Rotate to lower and seal the cleaning head 3 at the start of each process, and raise and open the cleaning head 3 at the end of each process.
【0013】 液リザーブ部Fは、実施例では3種類の洗浄液リザーブタンク25と1種類の すすぎ液リザーブタンク26を配設し、また、コンベア1上の洗浄容器2ごとに 要求される洗浄液を各々分配回収できる様電磁ポンプを洗浄液の数分配設してい る。また回収側のパイプには真空ポンプ17から送られる洗浄液あるいはすすぎ 液を汚物と分離させるためのフィルタ20を配設している。In the embodiment, the liquid reserve section F is provided with three types of cleaning liquid reserve tanks 25 and one type of rinsing liquid reserve tank 26, and also stores the required cleaning liquid for each cleaning container 2 on the conveyor 1. A number of electromagnetic pumps are provided to distribute and collect the washing liquid. Further, a filter 20 for separating the cleaning liquid or the rinsing liquid sent from the vacuum pump 17 from the dirt is provided in the pipe on the collecting side.
【0014】 シャワー部Aには、投入最初の工程で制御盤に情報提供するCCDカメラ等の 識別子読取センサ9とシャワーノズル11と真空吸上ノズル10が固定されたシ ャワーヘッド3と加圧ポンプ18と真空ポンプ17が配設されている。シャワー 工程は、制御部から指示された時間だけ洗浄液投入し、洗浄液を吸上げる時間は 数十秒間遅延させ終了する。加圧ポンプの圧力を被洗浄物に対応して変化させる ことも可能。In the shower section A, an identifier reading sensor 9 such as a CCD camera for providing information to the control panel in the first step of feeding, a shower head 3 to which a shower nozzle 11 and a vacuum suction nozzle 10 are fixed, and a pressure pump 18 And a vacuum pump 17 are provided. The shower process is performed by injecting the cleaning liquid for a time instructed by the control unit, and the time for sucking the cleaning liquid is delayed for several tens of seconds and is completed. The pressure of the pressure pump can be changed according to the object to be cleaned.
【0015】 超音波洗浄部Bには、超音波振動子12と真空吸上ノズル10と噴流ノズル1 3と液位センサ14が固定された超音波洗浄ヘッド5と加圧ポンプ18と洗浄液 を制御盤43から指示された温度にするヒータ19と真空ポンプ17とフィルタ 20と超音波洗浄循環電磁バルブ33が配設されている。The ultrasonic cleaning section B controls the ultrasonic vibrator 12, the vacuum suction nozzle 10, the jet nozzle 13, the ultrasonic cleaning head 5 to which the liquid level sensor 14 is fixed, the pressure pump 18, and the cleaning liquid. A heater 19, a vacuum pump 17, a filter 20, and an ultrasonic cleaning and circulating electromagnetic valve 33 for setting the temperature to the temperature specified by the panel 43 are provided.
【0016】 超音波洗浄工程は、まずヒータ19を制御盤からの指示による設定温度とし超 音波洗浄給液電磁バルブ29をON、加圧ポンプ18をONして洗浄液を液位セ ンサ14が認識する高さまで投入し、当該給液電磁バルブ29をOFF、当該排 液電磁バルブ30をOFF、当該循環電磁バルブ33をONし、洗浄容器2の中 の洗浄液をフィルター20を通して循環させる。In the ultrasonic cleaning step, first, the heater 19 is set to a set temperature according to an instruction from the control panel, the ultrasonic cleaning liquid supply electromagnetic valve 29 is turned on, and the pressurizing pump 18 is turned on so that the liquid level sensor 14 recognizes the cleaning liquid. Then, the liquid supply electromagnetic valve 29 is turned off, the liquid discharge electromagnetic valve 30 is turned off, the circulation electromagnetic valve 33 is turned on, and the cleaning liquid in the cleaning container 2 is circulated through the filter 20.
【0017】 制御盤から指示された時間だけ超音波振動子12をONし、噴流ノズル13に よる水流を加えた超音波洗浄を行う。時間後は、超音波振動子12をOFF、加 圧ポンプ18をOFF、当該循環電磁バルブ33をOFF、当該排液電磁バルブ 30をONした後、真空ポンプ17をONして洗浄液を回収する。加圧ポンプ1 8の圧力を被洗浄物に対応して変化させることも可能。The ultrasonic vibrator 12 is turned ON for a time instructed by the control panel, and ultrasonic cleaning is performed by adding a water flow by the jet nozzle 13. After a lapse of time, the ultrasonic vibrator 12 is turned off, the pressure pump 18 is turned off, the circulating electromagnetic valve 33 is turned off, the drainage electromagnetic valve 30 is turned on, and then the vacuum pump 17 is turned on to collect the cleaning liquid. It is also possible to change the pressure of the pressure pump 18 according to the object to be cleaned.
【0018】 すすぎ洗浄部Cには、噴流ノズル13と真空吸上ノズル10と液位センサ14 が固定されたすすぎ洗浄ヘッド6と、加圧ポンプ18とヒータ19と真空ポンプ 17とフィルタ20とすすぎ洗浄循環電磁バルブ34が配設されている。In the rinsing section C, a rinsing head 6 to which a jet nozzle 13, a vacuum suction nozzle 10 and a liquid level sensor 14 are fixed, a pressure pump 18, a heater 19, a vacuum pump 17, a filter 20 and a rinse A cleaning circulation electromagnetic valve 34 is provided.
【0019】 すすぎ工程は、まずヒータ19を制御盤43からの指示による設定温度として すすぎ洗浄給液電磁バルブ31をON、加圧ポンプ18をONしてすすぎ液を液 位センサ14が認識する高さまで投入し、当該給液電磁バルブ31をOFF、当 該排液電磁バルブ32をOFF、当該循環電磁バルブ34をONし、洗浄容器2 中のすすぎ液をフィルター20を通して循環させる。In the rinsing process, first, the heater 19 is set to a set temperature in accordance with an instruction from the control panel 43, the rinse cleaning liquid supply electromagnetic valve 31 is turned on, the pressurizing pump 18 is turned on, and the liquid level sensor 14 recognizes the rinsing liquid. Then, the liquid supply electromagnetic valve 31 is turned off, the drainage electromagnetic valve 32 is turned off, the circulation electromagnetic valve 34 is turned on, and the rinsing liquid in the washing container 2 is circulated through the filter 20.
【0020】 制御盤から指示された時間後は、加圧ポンプ18をOFF、当該循環電磁バル ブ34をOFF、当該排液電磁バルブ32をONした後、真空ポンプ17をON してすすぎ液を回収する。加圧ポンプ18の圧力を被洗浄物に対応して変化させ ることも可能。After a time instructed by the control panel, the pressurizing pump 18 is turned off, the circulating electromagnetic valve 34 is turned off, the drainage electromagnetic valve 32 is turned on, and then the vacuum pump 17 is turned on to remove the rinsing liquid. to recover. It is also possible to change the pressure of the pressure pump 18 according to the object to be cleaned.
【0021】 液切り部Dは、液切りノズル15と真空吸上ノズル10が固定された液切りヘ ッド7と、エアーフィルター22とエアコンプレッサ21と真空ポンプ17とフ ィルター20が配設されている。液切り工程は、真空ポンプ17をON、エアー コンプレッサ21をON後、制御盤43からの指示時間後、真空ポンプ17をO FF、エアーコンプレッサ21をOFFする。エアーコンプレッサ21の圧力を 被洗浄物に対応して変化させることも可能。The liquid draining section D is provided with a liquid draining head 7 to which a liquid draining nozzle 15 and a vacuum suction nozzle 10 are fixed, an air filter 22, an air compressor 21, a vacuum pump 17, and a filter 20. ing. In the liquid draining step, after the vacuum pump 17 is turned on and the air compressor 21 is turned on, the vacuum pump 17 is turned off and the air compressor 21 is turned off after an instruction time from the control panel 43. It is also possible to change the pressure of the air compressor 21 according to the object to be cleaned.
【0022】 温風乾燥部Eは、温風ノズル16が固定された温風乾燥ヘッド8とブロア24 とエアーヒータ23とエアフィルタ22が配設されている。制御部で指示された 時間エアーヒータ23とブロア24をONする。The hot air drying section E includes a hot air drying head 8 to which the hot air nozzle 16 is fixed, a blower 24, an air heater 23, and an air filter 22. The air heater 23 and the blower 24 are turned on for the time specified by the control unit.
【0023】 以上の実施例において、洗浄容器として図2の構造のものを採用したが、これ に限定するものではなく、たとえば台座35の傾斜が水平なものでもよい。また 、シャワー部A、超音波洗浄部B、すすぎ洗浄部C、液切り部D、温風乾燥部E はそれぞれ単一の部で構成されているが、同一の部を複数個配設するものでもよ い。In the above embodiment, the cleaning container having the structure shown in FIG. 2 is employed. However, the present invention is not limited to this. For example, the pedestal 35 may have a horizontal inclination. Further, the shower part A, the ultrasonic cleaning part B, the rinsing part C, the liquid drain part D, and the hot air drying part E are each constituted by a single part, but a plurality of identical parts are provided. But you can.
【0024】[0024]
【考案の効果】 本考案によれば、次のような顕著な効果を奏する。(1)被洗浄物毎に洗浄容 器が用意されるので、被洗浄物の形状による制限がなくなり適用範囲が広がる、 また、洗浄内容を任意に選択することができ、被洗浄物の洗浄が効果的に行える 。(2)洗浄は洗浄容器内で行われるので、洗浄槽の必要がなく、所要洗浄液も 少量で済み、常に新鮮な洗浄液による洗浄が行われ、経費の節約がはかれる。各 工程がコンベアに沿って直列に、かつ隣接して配置されるため全体構造が小型に なる。According to the present invention, the following remarkable effects are obtained. (1) Since a washing container is prepared for each object to be cleaned, there is no limitation due to the shape of the object to be cleaned, and the applicable range is widened. It can be done effectively. (2) Since the washing is performed in the washing container, there is no need for a washing tank, and only a small amount of washing liquid is required, and washing is always performed with fresh washing liquid, thereby saving costs. Since each process is arranged in series and adjacently along the conveyor, the overall structure becomes smaller.
【図1】本考案の一実施例の全体構成図FIG. 1 is an overall configuration diagram of an embodiment of the present invention.
【図2】本考案実施例に使用される洗浄容器の斜視図FIG. 2 is a perspective view of a cleaning container used in the embodiment of the present invention.
【図3】本考案実施例に使用される洗浄ヘッドの斜視図FIG. 3 is a perspective view of a cleaning head used in the embodiment of the present invention.
【図4】従来の洗浄装置の概要構造を示す構成図FIG. 4 is a configuration diagram showing a schematic structure of a conventional cleaning device.
1 コンベア 2 洗浄容器 3 洗浄ヘッド 4 シャワーヘッド 5 超音波洗浄ヘッド 6 すすぎ洗浄ヘッド 7 液切りヘッド 8 温風乾燥ヘッド 9 識別子読取センサ 10 真空吸上ノズル 11 シャワーノズル 12 超音波振動子 13 噴流ノズル 14 液位センサ 15 液切りノズル 16 温風ノズル 17 真空ポンプ 18 加圧ポンプ 19 ヒータ 20 フィルタ 21 エアーコンプレッサ 22 エアーフィルタ 23 エァーヒータ 24 ブロア 25 洗浄液リザーブタンク 26 すすぎ液リザーブタンク 27 シャワー給液電磁バルブ 28 シャワー排液電磁バルブ 29 超音波洗浄給液電磁バルブ 30 超音波洗浄排液電磁バルブ 31 すすぎ洗浄給液電磁バルブ 32 すすぎ洗浄排液電磁バルブ 33 超音波洗浄循環電磁バルブ 34 すすぎ洗浄循環電磁バルブ 35 台座 36 固定ボス 37 識別子 38 上下動モータ 39 送りネジ軸 40 ネットコンベア 41 超音波洗浄槽 42 すすぎ洗浄槽 43 制御盤 DESCRIPTION OF SYMBOLS 1 Conveyor 2 Cleaning container 3 Cleaning head 4 Shower head 5 Ultrasonic cleaning head 6 Rinsing cleaning head 7 Draining head 8 Hot air drying head 9 Identifier reading sensor 10 Vacuum suction nozzle 11 Shower nozzle 12 Ultrasonic transducer 13 Jet nozzle 14 Liquid level sensor 15 Liquid drain nozzle 16 Hot air nozzle 17 Vacuum pump 18 Pressurizing pump 19 Heater 20 Filter 21 Air compressor 22 Air filter 23 Air heater 24 Blower 25 Cleaning liquid reserve tank 26 Rinse liquid reserve tank 27 Shower supply electromagnetic valve 28 Shower discharge Liquid electromagnetic valve 29 Ultrasonic cleaning liquid supply electromagnetic valve 30 Ultrasonic cleaning liquid discharge electromagnetic valve 31 Rinse cleaning liquid supply electromagnetic valve 32 Rinsing cleaning liquid discharge electromagnetic valve 33 Ultrasonic cleaning circulation electromagnetic valve 34 Rinse cleaning circulation electromagnetic Valve 35 Pedestal 36 Fixed boss 37 Identifier 38 Vertical motor 39 Feed screw shaft 40 Net conveyor 41 Ultrasonic cleaning tank 42 Rinse cleaning tank 43 Control panel
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 21/304 351 H05K 3/26 A H05K 3/26 G06F 7/00 U ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification symbol FI H01L 21/304 351 H05K 3/26 A H05K 3/26 G06F 7/00 U
Claims (2)
定する洗浄容器と、シャワー部と超音波洗浄部とすすぎ
洗浄部と液切り部と温風乾燥部の各部で洗浄容器を密閉
する洗浄ヘッドと、洗浄容器に貼付された識別子を読取
るセンサと、洗浄ヘッドを支持しコンベア連動で上下動
させる上下動モータと、洗浄ヘッドに固定されるノズル
あるいは超音波振動子あるいは液位センサと、給排液系
のポンプと、洗浄液の給排液を制御する電磁バルブと、
コンベア連動で前記全ての制御を行う制御器とから構成
されるはんだフラックス洗浄装置。1. A cleaning device in which a conveyor, a cleaning container for fixing an object to be cleaned on the conveyor, a shower unit, an ultrasonic cleaning unit, a rinsing cleaning unit, a liquid draining unit, and a hot air drying unit are hermetically sealed. A head, a sensor for reading an identifier affixed to the cleaning container, a vertical motor for supporting the cleaning head and vertically moving in conjunction with a conveyor, a nozzle fixed to the cleaning head, an ultrasonic vibrator or a liquid level sensor, A drainage pump, an electromagnetic valve for controlling the supply and drainage of the cleaning liquid,
A solder flux cleaning device comprising a controller that performs all the above-mentioned controls in conjunction with a conveyor.
工程中に固定した大型の洗浄槽を必要とせず、洗浄容器
に貼付されたバーコード等の識別子を読取り、被洗浄物
個々の洗浄制御情報に基づいた洗浄工程の選択及び制
御、洗浄液の選択及び制御、シャワー温度と時間の選択
及び制御、超音波照射時間の選択及び制御、乾燥温度と
時間の選択及び制御が可能な特徴を持つはんだフラック
ス洗浄装置。2. A cleaning container is provided for each of the objects to be cleaned, and a large cleaning tank fixed during the cleaning process is not required, and an identifier such as a bar code attached to the cleaning container is read, and each of the objects to be cleaned is read. Selection and control of the cleaning process based on the cleaning control information, selection and control of the cleaning solution, selection and control of the shower temperature and time, selection and control of the ultrasonic irradiation time, and selection and control of the drying temperature and time. Solder flux cleaning equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1997011821U JP3051268U (en) | 1997-12-25 | 1997-12-25 | Conveyor type continuous solder flux cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1997011821U JP3051268U (en) | 1997-12-25 | 1997-12-25 | Conveyor type continuous solder flux cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP3051268U true JP3051268U (en) | 1998-08-21 |
Family
ID=43185435
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1997011821U Expired - Lifetime JP3051268U (en) | 1997-12-25 | 1997-12-25 | Conveyor type continuous solder flux cleaning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3051268U (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012204746A (en) * | 2011-03-28 | 2012-10-22 | Dainippon Screen Mfg Co Ltd | Substrate processing device |
JP2018187496A (en) * | 2018-09-06 | 2018-11-29 | 株式会社アイホー | Tableware washing device |
CN114710892A (en) * | 2022-04-12 | 2022-07-05 | 广东骏亚电子科技股份有限公司 | Manufacturing method of high-frequency plate with interlayer accurate alignment |
-
1997
- 1997-12-25 JP JP1997011821U patent/JP3051268U/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012204746A (en) * | 2011-03-28 | 2012-10-22 | Dainippon Screen Mfg Co Ltd | Substrate processing device |
JP2018187496A (en) * | 2018-09-06 | 2018-11-29 | 株式会社アイホー | Tableware washing device |
CN114710892A (en) * | 2022-04-12 | 2022-07-05 | 广东骏亚电子科技股份有限公司 | Manufacturing method of high-frequency plate with interlayer accurate alignment |
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