JP3034003B2 - Pseudo-etched decorative film and method of manufacturing the same - Google Patents

Description

The present invention relates to a pseudo-etched decorative film and a method for producing the same.

[Problems to be solved by conventional technology and invention]

2. Description of the Related Art Conventionally, it has been known to form a desired pattern, pattern, or the like on a metal member by an etching method and impart a design thereto, and is applied to articles such as elevator doors, for example. However, while such a design providing means can provide a high-quality and unique design appearance, the etching process is complicated and costly.

Therefore, a pseudo-etching decorative film has been proposed in which a decorative appearance imitating an actual etching pattern is obtained. As shown in FIG. 4, this type of decorative film is subjected to stencil printing by a screen printing method or the like on a base material 10 having a metal layer along a pattern pattern, and the swelled print layer 11 is used as a matte surface. The other portions are configured as a glossy surface, and the surface of the raised printing layer 11 having a matte surface looks like a concave pattern actually etched.

However, the above-mentioned pseudo-etched decorative film has only a visually recognizable etched processing pattern until it gets tired, and the film surface does not have a feeling of unevenness like the actual etched processing pattern. Only a cosmetic appearance far from that was obtained.

The present invention has been made to overcome the above-mentioned drawbacks of the prior art, and provides a pseudo-etching decorative film in which a clear etching pattern with a more realistic appearance appears, and the decorative film is easily manufactured. An object of the present invention is to provide a manufacturing method.

[Means for solving the problem]

That is, the present invention relates to (1) ionizing radiation which is formed on a film substrate by releasing at the same time as curing and shaping at least in the plate recesses of the roll intaglio for bringing the substrate into contact with the substrate. It is made of a curable resin, and while providing an etching process-like uneven pattern layer simulating the uneven surface obtained by etching the surface of the metal member in a pattern, the surface of the film substrate on which the etching process uneven pattern layer is formed or A pseudo-etching decorative film characterized by laminating a metal thin film layer on the non-formation surface side; (2) an etching process pattern imitating an uneven surface obtained by pattern-etching the surface of a metal member Using a roll intaglio having the plate intaglio formed therein, at least the plate intaglio of the roll intaglio is filled with an ionizing radiation-curable resin and the film substrate is brought into contact with the substrate, while the substrate is in contact with the intaglio. After curing the resin interposed between the substrate and the intaglio by irradiating ionizing radiation and bringing the resin and the substrate into close contact with each other, the substrate is released from the intaglio to form a mold in the intaglio. A method for producing a pseudo-etching decorative film, comprising providing an etching-like uneven pattern layer on a substrate, further comprising a step of contacting the film substrate with a roll intaglio before or from the roll intaglio of the film substrate. After the peeling step, a method for producing a pseudo-etching decorative film, which comprises a step of forming a metal thin film layer on the side of the etched surface of the film substrate on which the etching pattern is formed or on the side of the non-formed surface, Things.

〔Example〕

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

The pseudo-etching decorative film 1 of the present invention is basically
As shown in FIG. 1 and FIG. 2, it is composed of a film substrate 2 and an etching-processed uneven pattern layer 3, and further comprises a metal thin film layer 4. The metal thin film layer 4 is provided on the side of the substrate 2 on which the uneven pattern layer 3 is formed as shown in FIG. 1 in a state of following the uneven shape of the pattern layer, or is provided as shown in FIG. As described above, it is provided by being laminated on the non-formation surface side of the uneven pattern layer 3.

The film substrate 2 can be used without any particular limitation as long as it has strength and flexibility that can be processed on a web. In the case of the embodiment as shown in FIG. 2, it is necessary to use the substrate 2 having such transparency that the metallic feeling of the metal layer 3 appears at least on the surface side. Specific examples of the substrate include polyesters such as polyethylene terephthalate, polyamides such as nylon, acrylic resins such as polyvinyl chloride and polymethyl methacrylate, polycarbonate, polystyrene, polyacrylate, fluororesin, polypropylene, cellulose triacetate, cellophane, etc. And these can be used alone or in an appropriate combination to form a laminated composite. The thickness of the substrate 2 is 10 to 150 μ
m.

The etching-like uneven pattern layer 3 is a layer having an uneven shape simulating an uneven pattern formed by actual etching. The concave-convex pattern layer 3 is formed of an ionizing radiation-curable resin that is filled into a roll intaglio having a concave-convex shape to be formed, cured during the filling, and shaped into a shape corresponding to the concave-convex shape of the concave plate. It is a resin layer. The pattern layer 3 may have a pattern form in which only convex pattern constituent parts are separated from each other as shown in the figure, but it is not particularly shown, but a layer form (for example, a base layer (A shape in which a convex portion and a concave portion forming a pattern are formed thereon).

The metal thin film layer 4 is for giving a metallic feeling in the etching pattern. The metal thin film layer 4 may be formed on the surface on which the uneven pattern layer 3 is formed as described above, or may be formed on the opposite surface thereof. However, as shown in FIG. When formed, in particular, the metal member has an appearance shape very similar to that of a metal member subjected to actual etching processing, and furthermore, an etching-like decorative appearance with a realistic feeling appears. Examples of the metal constituting the metal thin film layer include Al, Cu, Ni, Cr, Au, Ag, and Ti. The thickness of the metal thin film layer 4 is about 15 to 80 nm.

 Next, the manufacturing method of the present invention will be described.

The method of the present invention is characterized by the step of forming an etching pattern, and an example of the step is shown in FIG. That is, as shown in the figure, a roll intaglio 6 having a plate concave portion 5 imitating an etching pattern is prepared and installed, for example, as shown in the drawing, and the film substrate 2 is brought into contact with the roll intaglio 6.
And at least the plate recesses 5 of the intaglio 6 are filled with ionizing radiation-curable resin 7 by appropriate means. Then, while the substrate 2 is in contact with the intaglio 6, it is irradiated with ionizing radiation by the ionizing radiation irradiating device 8 to cure the resin interposed between the substrate 2 and the intaglio 6 and simultaneously adhere to the substrate. Then, the base material 2 is peeled off from the intaglio 6. By this peeling, a pseudo-etched film of the present invention in which the etching tone pattern layer 3 is formed on one surface of the substrate 2 is obtained.

In the present invention, since the uneven pattern layer 3 is formed by the above-described method, an extremely clear uneven shape that faithfully reproduces the uneven shape molded into the roll intaglio is obtained. Good shape is obtained.

The plate recesses 5 can be formed by means such as electronic engraving, etching, milling, and electroforming. In particular, in the present invention, it is possible to mold the plate concave portion by giving a shape obtained by inverting the pattern shape or the like formed by the actual etching process as it is, and in this case, a more realistic etching is performed. A work-like cosmetic appearance is obtained.

As the ionizing radiation-curable resin, a known ultraviolet ray or electron beam-curable resin can be used, and if a solvent-free type is used, volume shrinkage due to curing, shape deformation, and problems such as bubble generation do not occur. This eliminates the need for a pre-drying step of the resin, and makes it easier to reliably obtain an uneven shape with better reproducibility. As the ionizing radiation to be applied, ultraviolet rays can be used when the film substrate 2 is transparent, but when the substrate is opaque, it is necessary to use an electron beam. When using an electron beam, the irradiation amount is usually 0.5 to 30 Mra, depending on the thickness, material, etc. of the sheet base material.
d is preferred. When irradiating with ultraviolet rays,
An appropriate amount of a known photosensitizer, photoinitiator or the like is added to the resin.

When the metal thin film layer 4 is provided, in the method of the present invention, the metallic luster layer is formed by the following forming means following the above manufacturing steps. That is, in the case of a metal thin film layer having an embodiment as shown in FIG.
There is no particular limitation as long as the metal layer can be formed in a form following the uneven shape by, for example, a known metal vapor deposition method,
It is formed by an electroless plating method or the like. In the case of the metal thin film layer shown in FIG. 2, it is usually formed by means of laminating a sheet having a metal thin film layer formed by a metal vapor deposition method, a printing method, a coating method or the like. The second
When the metal thin film layer 4 is provided as shown in the figure, the metal thin film layer 4 may be formed in advance on the film base material 2 (in other words, the base material 2 having the metal thin film layer is used).

The decorative film of the present invention may be provided with a top coat layer or the like for surface protection, if necessary, in the mode illustrated in FIG.

The decorative film of the present invention is actually used as follows. First, in the case of the basic film of the present invention having no metal thin film layer, it can be used by being laminated on a metal product. In the case of the film of the present invention provided with a metal deposition layer,
Although it can be used by laminating it on a metal product, it is more effective to use it by laminating it on a non-metallic product such as a plastic product, a glass product and a wood product. Further, a film without a metal thin film layer can be used as a film for shaping an etching pattern. That is, the film of the present invention is used in such a manner that an etching-like uneven pattern is formed on another resin base material, and after the film is peeled off, metal deposition is performed on the formed surface. When the film is used as a shaping film, unlike the above-mentioned other applications, the etching-processed concavo-convex pattern layer in the film needs to be formed in an inverted (shaping) shape in advance. . As described above, according to the decorative film of the present invention, an etching-like pattern appearance can be easily obtained without complicated actual etching processing, and the etching-like pattern appearance can be easily applied to another desired member. Can also be added.

Next, the present invention will be described in more detail with reference to specific examples.

Example 1 A pseudo-etched film was prepared on the basis of the following materials, conditions, etc., using a 25 μm-thick easily-adhesive polyester film (manufactured by Toray Industries, Inc .: S91) as a film substrate and employing the production mode shown in FIG. Was done.

・ Ionizing radiation curable resin: UV curable resin (manufactured by Dainichi Seika Co., Ltd .: P-1702, viscosity: 2000 cps / 25 ° C) ・ Roll intaglio: Plate depth of 50μ by direct etching method
Use a plate made of m concave pattern.

・ Ionizing radiation: Two ozone-containing high-pressure mercury lamps (120 W / cm)
Ultraviolet irradiation was performed at a substrate feeding speed of 20 mm / min using a lamp.

After the substrate was peeled from the intaglio roll, ultraviolet irradiation was performed again from the resin layer surface under the same conditions as above. The resin layer formed on the substrate had a shape that faithfully reproduced the shape of the intaglio plate.

Next, aluminum was deposited on the resin layer surface side of the base material. The resulting film was an excellent one that exhibited a desired etched appearance with a metallic appearance.

〔The invention's effect〕

As described above, since the decorative film of the present invention is formed of an ionizing radiation-curable resin formed by curing and shaping in a roll intaglio as described above, the decorative film of the present invention has an actual etching process. Is a high-quality pseudo-etching decorative film having an uneven pattern shape very similar to the uneven pattern shape obtained by the method described above. In addition, by providing a metal thin film layer together with such a concavo-convex pattern layer, it is possible to obtain a beautiful appearance with a beautiful etching process tone rich in realism, and the surface thereof has a concavo-convex feeling substantially equivalent to the actual etching process pattern. It shows. In particular, when the metal thin film layer is provided on the side of the uneven pattern layer forming surface so as to follow the uneven shape of the pattern layer, it is possible to obtain a design appearance as if a metal member was etched, and it is particularly excellent as a pseudo-etching decorative film. It will be.

Further, according to the method of the present invention, since the above-described forming means is employed for forming the uneven pattern layer having an etching process,
A pseudo-etching decorative film having a pattern shape substantially the same as that of an actual etching process can be easily and efficiently manufactured on the same manufacturing line. In addition, by using a roll intaglio that is obtained by directly shaping the concavo-convex pattern by the actual etching process, it is possible to more faithfully reproduce and form the etching-like concavo-convex pattern layer having the concavo-convex shape very similar to the actual product.

[Brief description of the drawings]

FIG. 1 is a sectional view showing one embodiment of the decorative film of the present invention,
FIG. 2 is a sectional view showing another embodiment of the sheet of the present invention, and FIG.
FIG. 4 is a conceptual explanatory view showing an example of a process for forming an etching pattern layer in the manufacturing method of the present invention, and FIG. 4 is a sectional view showing an example of a conventional product. DESCRIPTION OF SYMBOLS 1 ... Pseudo-etching decorative film 2 ... Film base material 3 ... Etching process uneven pattern layer 4 ... Metal thin film layer 5 ... Roll intaglio 6 ... Plate recess 7 ... Ionizing radiation curable resin

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-1-176477 (JP, A) JP-A-63-106779 (JP, A) JP-A-2-150344 (JP, A) JP-B-63 50066 (JP, B2) (58) Fields investigated (Int. Cl. ⁷ , DB name) B32B 1/00-35/00 B29C 39/10 B05D 5/06

Claims (2)

(57) [Claims] 1. An ionizing radiation-curable resin formed on a film substrate by releasing at the same time as curing and shaping at least in a plate recess of a roll intaglio for bringing the substrate into contact with the substrate. And an etching-like uneven pattern layer imitating an uneven surface obtained by etching the surface of the metal member in a pattern shape is provided, and the surface of the film substrate on which the etching-like uneven pattern layer is formed or a non-formed surface. A pseudo-etching decorative film characterized by laminating a metal thin film layer on a side. 2. A roll intaglio having an etched pattern-like plate recess formed by simulating an uneven surface obtained by etching the surface of a metal member in a pattern, and ionizing radiation is applied to at least the plate recess of the roll intaglio. Filling the curable resin and contacting the film substrate, irradiating ionizing radiation while the substrate is in contact with the intaglio to cure the resin interposed between the substrate and the intaglio, A method for producing a pseudo-etching decorative film, comprising: providing an etching-like uneven pattern layer formed on an intaglio plate by bringing the resin and the substrate into close contact with each other, and then peeling the substrate from the intaglio plate. Further, before the step of contacting the film substrate with the roll intaglio, or after the step of peeling the film substrate from the roll intaglio, on the side of the film substrate on which the etching pattern is formed or on the side on which the pattern is not formed. Method for producing a pseudo-etching decorative film characterized by having a step of forming the metal thin film layer.