JP3029075B2 - Method and apparatus for producing resin powder with low residual vinyl monomer content by steam treatment of vinyl chloride resin slurry - Google Patents
Method and apparatus for producing resin powder with low residual vinyl monomer content by steam treatment of vinyl chloride resin slurryInfo
- Publication number
- JP3029075B2 JP3029075B2 JP4280633A JP28063392A JP3029075B2 JP 3029075 B2 JP3029075 B2 JP 3029075B2 JP 4280633 A JP4280633 A JP 4280633A JP 28063392 A JP28063392 A JP 28063392A JP 3029075 B2 JP3029075 B2 JP 3029075B2
- Authority
- JP
- Japan
- Prior art keywords
- slurry
- vinyl monomer
- resin powder
- monomer content
- perforated plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Degasification And Air Bubble Elimination (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は未反応の塩化ビニル
モノマー(以下、「VC」と略称することがある)等の
ビニルモノマー類を残留ビニルモノマーとして含有する
塩化ビニル樹脂(以下、「PVC」と略称することがあ
る)スラリーからVCを除去して残留VC含有量の低い
PVCを製造する方法及びそれに用いる装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vinyl chloride resin (hereinafter "PVC") containing vinyl monomers such as unreacted vinyl chloride monomer (hereinafter sometimes abbreviated as "VC") as residual vinyl monomer. The present invention relates to a method for producing VC having a low residual VC content by removing VC from a slurry, and an apparatus used therefor.
【0002】詳しくは、本発明は未反応のVCを含有す
る被処理PVCスラリーを多孔板製棚段上に形成された
処理通路へ導入し、多孔板の細孔を通じて水蒸気を下方
から被処理PVCスラリー中に噴射すると共に、該スラ
リー液面の上方からも別の水蒸気を液面に対して円錐状
にしかも、場合によっては間欠的に噴射することによっ
て被処理PVCスラリー中の泡発生を抑制(抑泡)しな
がら、抑制され得ずに発生した泡を早期に消滅(消泡)
させて安定した流動状態を保つことからなる残留VC含
有量の低いPVCを製造する方法及びそれに用いられる
装置に関する。More specifically, the present invention introduces a treated PVC slurry containing unreacted VC into a treatment passage formed on a perforated plate shelf, and transmits steam from below through the pores of the perforated plate. while injecting into the slurry, conical with respect to the liquid surface a different water vapor from above the slurry surface
In addition, in some cases while suppressing foam generation of the processed PVC slurry by intermittently injected (foam), eliminating the bubbles generated without could be suppressed early (defoaming)
It is allowed by an apparatus that is used method and its producing stable low PVC residual VC content consisting of keeping the flow state.
【0003】[0003]
【従来の技術】PVC、別名ポリ塩化ビニルは化学的に
も物理的にも優れた特性を備えた樹脂である。その製造
は通常的には、VCを水性媒体中で懸濁重合法、乳化重
合法又は塊状重合法等によって重合させることによって
行なわれている。それらの中でも、懸濁重合法と乳化重
合法とが広く用いられている。両法は何れも、或一定の
重合転化率、一般には80〜95%に達した段階で重合
反応を停止させ、得られた重合体スラリーから水性媒体
を機械的に分離し、熱風乾燥その他の種々の乾燥方法で
水性媒体を除去してポリ塩化ビニル(PVC)粉末を得
る。2. Description of the Related Art PVC, also known as polyvinyl chloride, is a resin having excellent properties both chemically and physically. The production is usually carried out by polymerizing VC in an aqueous medium by a suspension polymerization method, an emulsion polymerization method or a bulk polymerization method. Among them, the suspension polymerization method and the emulsion polymerization method are widely used. In both methods, the polymerization reaction is stopped when a certain polymerization conversion rate, generally 80-95%, is reached, the aqueous medium is mechanically separated from the polymer slurry obtained, and hot air drying or other The aqueous medium is removed by various drying methods to obtain a polyvinyl chloride (PVC) powder.
【0004】上記の各段階で分離された水性媒体中に
も、乾燥器からの排気中にも、乾燥直後のPVC粉末中
にも依然として少量のVCが残留している。しかし、環
境保全の見地からは残留VCの量を可能な限り減少させ
ることが望ましい。[0004] in an aqueous medium which is separated at each stage of the
Also, in the exhaust from the dryer is also still a small amount of VC in PVC powder immediately after drying remaining. However, from the viewpoint of environmental protection, it is desirable to reduce the amount of residual VC as much as possible.
【0005】この未反応モノマーを除去又は回収する段
階においては、溝状に処理通路を区画壁で区分された多
孔板製棚段を装着した処理塔の多孔板製棚段上に被処理
スラリーを導入し、多孔板の細孔を通じて下から水蒸気
を噴射する処理が提案されている(特開昭54−869
3号公報及び特開昭56−22305号公報参照)。こ
の処理においては、PVC粉末又はPVCスラリー中に
含有されるVCを多孔板製棚段の下方から導入される水
蒸気に乗せて蒸発分離する。In the step of removing or recovering the unreacted monomer, the slurry to be treated is placed on a perforated plate shelf of a treatment tower equipped with a perforated plate shelf in which a processing passage is formed in a groove shape and divided by partition walls. Introducing water vapor from below through the pores of a perforated plate has been proposed (Japanese Patent Application Laid-Open No. 54-869).
3 and JP-A-56-22305). In this treatment, VC contained in PVC powder or PVC slurry is vaporized and separated by being put on steam introduced from below a perforated plate tray.
【0006】[0006]
【発明が解決しようとする課題】上記の処理方法におい
ては、多孔板製棚段上の被処理PVCスラリーが下方か
らの水蒸気の導入(噴射)によって泡立ちを生じて上記
の区画壁を溢流する事態、更に流下管へ流れ込む事態及
びVC抜出し管を経由して凝縮器へ侵入する事態等の好
ましくない事態が往々にして生ずる。その結果、処理装
置の出口に流出する製品PVC粒子中にはVCが依然と
して高水準の量で残留する事態を来す。In the above-mentioned treatment method, the PVC slurry to be treated on the perforated plate tray is foamed by the introduction (spray) of water vapor from below and overflows the partition wall. Undesirable situations often occur, such as the situation that flows into the downcomer pipe and the situation that enters the condenser via the VC discharge pipe. As a result, VC is still present in the product PVC particles flowing out of the outlet of the treatment equipment.
Cause a situation in which the remaining in a high-level of the amount to.
【0007】更に、上記の泡立ちによって泡に同伴され
て処理装置(塔)の内壁に付着したPVC粒子が高温の
水蒸気に長時間曝されて劣化し、それが該内壁から剥離
してPVCスラリー中に混入すると異物の原因となる。Further, the PVC particles adhered to the inner wall of the processing apparatus (tower) are deteriorated by being exposed to high-temperature steam for a long time due to the foaming due to the foaming. If mixed with, it may cause foreign matter.
【0008】本発明の目的は上記従来処理において生じ
ていた事態である処理塔(処理装置)内での発泡を抑制
することと共に、抑制され得ずに一旦生じた泡を早期に
消滅させることによって従来法の障害を除去することに
ある。The object along with it suppresses foaming of the above conventional process is a situation that occurs in the treatment tower (processor) of the present invention, by extinguishing once resulting foam without could be suppressed at an early stage The object of the present invention is to eliminate the obstacles of the conventional method.
【0009】[0009]
【課題を解決するための手段】本発明者等は上記障害の
発生原因を次の様に推定した:被処理PVCスラリー
を多孔板製棚段上で水蒸気処理することによって発生す
る泡はPVC粒子内部から脱離したVC及び水蒸気の気
泡であるこの気泡の発生によって、多孔板上の被処理
PVCスラリーの体積が見掛け上は膨張し、その結果と
して溝状の処理通路を区分する区画壁を溢流して流下管
に流れ込む事態が生じ、更に進めばVC抜出し管を経由
して凝縮器へ侵入する。The present inventors have presumed the causes of the above-mentioned obstacles as follows: The bubbles generated by steam-treating the PVC slurry to be treated on a perforated plate tray are PVC particles. the generation of the bubble is a bubble of desorbed VC and water vapor from the interior Accordingly, the volume of the processed PVC slurry on the perforated plate apparent expands, the partition walls partitioning the groove-like processing channel as a result A situation may occur in which the fluid overflows and flows into the downcomer pipe, and if it proceeds further, it enters the condenser via the VC extraction pipe.
【0010】上記の推定に立って検討を進めた結果、本
発明者等は下記の3条件が同時に充足されることを必須
要件とする本発明に到達した。即ち、請求項1に規定さ
れた本発明によれば、上記の課題を解決でき、本発明の
効果を充分に奏することができる: 1)多孔板製棚段の下方から水蒸気を導入して、それに
よってこの棚段上のPVCスラリーを撹拌する; 2)PVCスラリー液面の上方から同液面に対して水蒸
気を円錐状に噴射する; 3)PVCスラリーからの飛散物又は揮発後の凝固物を
温水によって洗浄する。As a result of study based on the above presumption, the present inventors have arrived at the present invention which requires that the following three conditions be simultaneously satisfied. That is, according to the present invention defined in claim 1, the above-mentioned problems can be solved and the effects of the present invention can be sufficiently exhibited: 1) By introducing steam from below the perforated plate shelf, Thereby, the PVC slurry on the tray is stirred; 2) water vapor is conically sprayed from above the liquid level of the PVC slurry to the liquid level; 3) scattered matter from the PVC slurry or coagulated matter after volatilization. Is washed with warm water.
【0011】本発明者等は上記問題の解決に鋭意努力の
結果、下記の本発明を完成した。即ち、本発明は被処理
PVCスラリーを前記の多孔板製棚段を装着した塔型処
理装置で処理するに当たり、多孔板製棚段の下方から細
孔を通じて該スラリー中へ水蒸気を噴射する処理の継続
期間中に亘り、該スラリー液面の上方に別途に設けられ
た水蒸気噴射機構例えば、ノズルから被処理PVCスラ
リー液面に対して水蒸気を噴射することからなる被処理
PVCスラリーを処理して残留ビニルモノマー含有量の
低い樹脂粉体を製造する方法及びそれに用いる装置に関
する。The present inventors have made intensive efforts to solve the above problems, and have completed the present invention described below. That is, in the present invention, when treating the PVC slurry to be treated in the tower-type treatment apparatus equipped with the perforated plate shelves, a process of injecting steam into the slurry through pores from below the perforated plate shelves . Continue
Over during the period, steam injection mechanism provided separately above the slurry surface for example, the residual by processing the processed PVC slurry comprising injecting steam against the treatment PVC slurry liquid surface from the nozzle The present invention relates to a method for producing a resin powder having a low vinyl monomer content and an apparatus used for the method.
【0012】上記の様に被処理PVCスラリー液面の上
方から別途に水蒸気を該液面に対して可能な限り均一に
押圧力を及ぼす様に噴射することによる効果は被処理P
VCスラリー中の泡発生の抑制及び抑制され得ずに発生
した泡を消滅させることにあり、その結果として残留V
C含有量の低いPVCを製造することができる。As described above, the effect of separately jetting steam from above the liquid surface of the treated PVC slurry so as to exert a pressing force as uniformly as possible on the liquid surface is as follows.
Lies in extinguishing the bubbles generated without could be suppressed and the suppression of foam generation in the VC slurry, resulting as a residual V
PVC with a low C content can be produced.
【0013】[0013]
【発明の実施の形態】以下、図面に基づいて本発明を具
体的に説明するが、本発明はこれに限定されるものでは
ない。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings, but the present invention is not limited thereto.
【0014】図1は本発明の方法を実行する為の多孔板
製棚段付き塔型処理装置(図3中で「13」)におい
て、未反応の残留VCを含有する被処理PVCスラリー
を収容して脱VC処理を行なう多孔板製棚段1の模式的
平面図である。この多孔板製棚段1は通常、図2に示さ
れた様に多孔板を処理通路の底板として形成され、多数
の細孔が多孔板製棚段を貫通して設けられている。多孔
板製棚段1の下側から細孔を通じて水蒸気が被処理PV
Cスラリー中に噴射される。FIG. 1 shows a perforated-plate-type tower-type treatment apparatus ("13" in FIG. 3) for carrying out the method of the present invention, in which a PVC slurry to be treated containing unreacted residual VC is stored. It is a schematic plan view of the perforated plate shelf 1 which performs a VC removal process. This perforated plate shelf 1 is usually formed with a perforated plate as a bottom plate of the processing passage as shown in FIG. 2, and a large number of pores are provided through the perforated plate shelf. Water vapor is passed through the pores from the lower side of the perforated plate shelf 1 through the pores.
Injected into C slurry.
【0015】多孔板製棚段1の上表面には区画壁20〜
23が互い違い(千鳥型)に立ち上がっている。区画壁
20〜23の役割は多孔板製棚段1の上に導入された被
処理PVCスラリーの流れを多孔板製棚段1の上に所定
時間滞留させることにある。その結果、細孔を通じて噴
入された水蒸気から供給される熱によって被処理PVC
スラリー中の未反応VC(残留VC)がストリッピング
されると共に被処理PVCスラリーの媒体である水等が
蒸発除去される。The upper surface of the perforated plate shelf 1 has partition walls 20 to
23 are staggered (staggered). The role of the partition walls 20 to 23 is to make the flow of the PVC slurry to be treated introduced onto the perforated plate shelf 1 stay on the perforated plate shelf 1 for a predetermined time. As a result, the PVC to be treated is heated by the heat supplied from the steam injected through the pores.
Unreacted VC (residual VC) in the slurry is stripped, and water or the like, which is the medium of the PVC slurry to be treated, is removed by evaporation.
【0016】図2はこの処理系の状況を更に把握する為
のもので、塔型処理装置の模式的縦断面見取り図であ
る。図2においては多孔板製棚段1の上表面から区画壁
2(20、21、22及び23等の総称)が複数列立ち
上がって、収容された被処理PVCスラリーを区分して
いることが明らかに看取される。図2は多孔板製棚段1
が塔型処理装置の最上段に位置する場合を示している。
多孔板製棚段1が第2段目以下に位置する場合には、左
端区画は多孔板製棚段1の直上に位置する別の多孔板製
棚段(不図示)からの流下管の下端に位置することにな
る。また、噴射ノズル付きの温水噴射リング6は直上の
棚板の下方に設置されていて、所定時間経過毎にその噴
射ノズルから温水を噴射して脱VC塔内の洗浄を行な
う。噴射ノズル付きの温水噴射リング6の詳細な構成及
び変形態様並びに具体的運転条件については後記の別項
に説明されている。FIG. 2 is a schematic longitudinal sectional view of a tower type processing apparatus for further understanding the state of the processing system. In FIG. 2, it is apparent that a plurality of rows of partition walls 2 (collectively 20, 21, 22 and 23, etc.) rise from the upper surface of the perforated plate shelf 1 to partition the contained PVC slurry to be treated. Will be taken care of. FIG. 2 shows a perforated plate shelf 1
Is located at the top of the tower type processing apparatus.
When the perforated plate shelf 1 is located at or below the second stage, the left end section is the lower end of the downflow pipe from another perforated plate shelf (not shown) located immediately above the perforated plate shelf 1 Will be located. Further, a hot water injection ring 6 with an injection nozzle is installed below the shelf plate immediately above, and every time a predetermined time elapses, hot water is injected from the injection nozzle to wash the inside of the VC removal tower. Detailed configuration of hot water injection ring 6 with injection nozzle
For details on the deformation and specific operating conditions, see the separate section below.
Is described in
【0017】図2の多孔板製棚段1の左端区画へ導入さ
れた被処理PVCスラリーが区画壁20に沿って図面の
手前方向へ流れながら水蒸気処理を受け、区画壁20の
末端で胴板3に達し、右の区画壁21で折り返されて奥
方向へ流れながら水蒸気処理を受け、この状況が繰り返
されて区画壁23と塔壁とによって形成された流下管4
に到る。多孔板製棚段1における処理を終えた被処理P
VCスラリーは流下管4を経由して直下の多孔板製棚段
(不図示)へ流れ込み、上述の処理を繰り返して受けな
がら図3の処理装置13の出口11へ到る。The PVC slurry to be treated introduced into the left end section of the perforated plate shelf 1 of FIG. 2 is subjected to steam treatment while flowing along the partition wall 20 in the direction of the drawing, and the body plate is formed at the end of the partition wall 20. 3 reached, subjected to steam treatment while flowing folded in the right partition wall 21 to the back direction, flows down tube this condition is formed by and the partition wall 23 is repeated tower wall 4
To reach. P to be processed after processing in perforated plate shelf 1
The VC slurry flows into a perforated plate shelf (not shown) immediately below via the downflow pipe 4, and reaches the outlet 11 of the processing apparatus 13 in FIG. 3 while repeatedly receiving the above-described processing.
【0018】本発明においては、多孔板製棚段1の上で
被処理PVCスラリーが多孔板製棚段の下方から噴射さ
れる水蒸気によって処理されるだけの従来処理に加え
て、該処理の全期間に亙って、被処理PVCスラリー液
面の上方に別途に設けられた水蒸気噴射ノズル5からも
該スラリー液面に対する水蒸気の噴射を受ける。In the present invention, in addition to the conventional treatment in which the PVC slurry to be treated is only treated on the perforated plate shelf 1 by steam injected from below the perforated plate shelf, the entire process is carried out. Over the period, steam is also jetted onto the slurry surface from the steam jet nozzle 5 separately provided above the surface of the PVC slurry to be treated.
【0019】本発明における上方からの水蒸気の噴射圧
力は水蒸気噴射ノズル5の出口において通常、1kgf
/cm2(abs.)よりも大で13kgf/cm
2 (abs.)以下、好ましくは1.1〜11kgf/
cm2(abs.)に設定する。低過ぎる噴射圧力では
水蒸気の保有エネルギーが不足する結果として、噴射水
蒸気が所期の泡消滅能力を発揮し得なくなる。逆に高過
ぎる噴射圧力では、被処理PVCスラリーの液面を高圧
の水蒸気が叩いてスラリー液面を波立たせる結果とし
て、発泡を誘発する。Injection pressure of water vapor from above in the present invention
The force is usually 1 kgf at the outlet of the steam injection nozzle 5.
/ Cm2(Abs.)13 kgf / cm
2 (Abs.) Or less, Preferably 1.1 to 11 kgf /
cm2(Abs.). If the injection pressure is too low
As a result of the lack of water vapor holding energy,
The steam will not be able to exhibit the expected foam extinction ability.Conversely
With a high injection pressure, the liquid level of the PVC slurry to be treated
As a result of the water vapor hitting the surface of the slurry
Induce foaming.
【0020】水蒸気の噴射量は多孔板製棚段の面積基準
でその1m2当たり50〜400kg/h、好ましくは
80〜250kg/hに選ぶことが適当である。噴射量
が45kg/h/m2以下では、消泡効果不足を来た
し、噴射量405kg/h/m2では、水蒸気の使用量
が必要量を上回る。水蒸気の噴射は通常、連続的に行な
うが、間欠的に行なってもよい。間欠的に行なう場合に
は水蒸気の実噴射量が上記の範囲に属する様に行なうこ
とが適当である。間欠的噴射を周期的に繰り返す方式も
採用に適する場合がある。The amount of steam injected is 50 to 400 kg / h per m 2 , preferably on the basis of the area of the perforated tray.
It is appropriate to select from 80 to 250 kg / h . When the injection amount is 45 kg / h / m 2 or less, the defoaming effect is insufficient, and when the injection amount is 405 kg / h / m 2 , the amount of steam used exceeds the required amount. Injection of steam is usually performed continuously, but may be performed intermittently. When performing intermittently, it is appropriate to perform so that the actual injection amount of water vapor falls in the above range. A method in which intermittent injection is repeated periodically may be suitable for adoption.
【0021】本発明の泡消滅(消泡)又は泡抑制(抑
泡)の為の水蒸気噴射ノズル5の構造は前記多孔板2上
を流れる被処理PVCスラリー液面上の何れの個所へも
均一に噴射水蒸気を配分するものであることが肝要であ
る。この要請は水蒸気噴射ノズル5が多孔板製棚段1の
中心付近上方に設置されている場合には中心から離れる
に従って水蒸気の軌跡も長くなり、その温度(保有熱エ
ネルギー)も低下する事態を可能な限り補償しようとす
ることに端を発する。The structure of the steam injection nozzle 5 for eliminating bubbles (defoaming) or suppressing (suppressing bubbles) according to the present invention is uniform at any point on the surface of the treated PVC slurry flowing on the perforated plate 2. It is important that the injected steam be distributed to the water. This requirement is that when the steam injection nozzle 5 is installed near the center of the perforated plate shelf 1, the locus of the steam becomes longer as the distance from the center increases, and the temperature (holding heat energy) can decrease. It starts with trying to compensate as much as possible.
【0022】水蒸気噴射ノズル5の設置位置は被処理P
VCスラリー液面から通常50〜1000mm上方に選
択することが充分な効果発現の為には好ましい。水蒸気
噴射ノズル5を低過ぎる位置に設置した場合には、被処
理PVCスラリー液面に均一に水蒸気を噴射することに
装置的な困難を生ずる。また、水蒸気噴射ノズル5を高
過ぎる位置に設置した場合には、処理装置13全体の高
さを必要以上に増大させる事態を来す。The installation position of the steam injection nozzle 5 is
It is preferable to select the height of the slurry from 50 to 1000 mm above the surface of the VC slurry in order to obtain a sufficient effect. If the steam jet nozzle 5 is installed at a position that is too low, it is difficult to jet steam uniformly to the surface of the PVC slurry to be treated. If the water vapor injection nozzle 5 is installed at a position that is too high, the height of the entire processing apparatus 13 may be increased more than necessary.
【0023】被処理PVCスラリー液面に対して上方か
ら噴射される水蒸気団が形成する円錐面の頂角(θ)は
通常、60〜150度、好ましくは100〜135度の
範囲において同一多孔板製棚段1上に存在する被処理P
VCスラリー液面の何れの個所にも可能な限り均一に水
蒸気の作用が及ぽされる様に設定することが好ましい。
水蒸気の作用が不均一に及ぼされると、被処理PVCス
ラリー中に局部的な発泡を引き起こして消泡効果を低減
させる結果を招く。The apex angle (θ) of the conical surface formed by the steam group sprayed from above with respect to the surface of the PVC slurry to be treated is usually in the range of 60 to 150 degrees , preferably 100 to 135 degrees. P to be processed existing on the shelf 1
It is preferable to set so that the action of the steam can be applied as uniformly as possible to any part of the liquid surface of the VC slurry.
When the action of the steam is unevenly applied, local foaming is caused in the PVC slurry to be treated, resulting in a reduction in the defoaming effect.
【0024】この要請に応える水蒸気噴射ノズル5の構
造の例として、次の様なものを挙げることができる: ・多孔板製棚段の中心からの距離に比例して噴射ノズル
の孔径を増大させる ・多孔板製棚段の中心からの距離に比例して噴射ノズル
の孔数を増加させる ・広角円錐ノズル(頂角θの大きな円錐ノズル)を使用
する。The following are examples of the structure of the water vapor injection nozzle 5 that meets this demand: The diameter of the injection nozzle is increased in proportion to the distance from the center of the perforated plate shelf.・ Increase the number of holes of the injection nozzle in proportion to the distance from the center of the perforated plate shelf. ・ Use a wide-angle conical nozzle (conical nozzle with a large vertical angle θ) .
【0025】本発明における被処理PVCスラリーを処
理する塔型処理装置の胴板3と区画壁20、区画壁20
と21、区画壁21と22、及び区画壁22と23との
間の各処理通路の底板を構成する多孔板は下記の機能を
備えていることを要する: ・その上に存在する被処理PVCスラリーを細孔を通じ
て流下させず、しかも該細孔の閉塞も実質的に起こさな
いこと、 ・その下方から水蒸気を長期間に亙りしかも何れの場所
においても均一に通過させて上方の被処理PVCスラリ
ー中へ送り込めること。The body plate 3 and the partition walls 20 and 20 of the tower-type processing apparatus for processing the PVC slurry to be processed according to the present invention.
And the perforated plate constituting the bottom plate of each processing passage between the partition walls 21 and 22, and the partition walls 22 and 23 must have the following functions:-The PVC to be processed existing thereon The slurry does not flow down through the pores, and does not substantially block the pores. The PVC slurry to be treated is formed by allowing steam to pass therefrom over a long period of time and uniformly at any place. Be able to send it inside.
【0026】更に、処理通路は図2に示されている様に
流下管4及び図3に示されている被処理PVCスラリー
抜出し管11の様なスラリーの流出路を備えていること
を要する。Further, the processing passage is required to have a slurry outflow path such as the downflow pipe 4 as shown in FIG. 2 and the PVC slurry extraction pipe 11 as shown in FIG.
【0027】上記の機能を発揮する為には、多孔板製棚
段に設けられた各細孔の直径(内径)を通常5mm以
下、好ましくは0.5〜2mm、最も好ましくは0.7
〜1.5mmに設定する。これに加えて各多孔板製棚段
の開口率(=細孔総面積/多孔板面積;別名「開孔
率」)を0.01〜10%、好ましくは0.04〜4
%、最も好ましくは0.2〜2%に選ぶ。In order to exhibit the above function, the diameter (inner diameter) of each pore provided in the perforated plate shelf is usually 5 mm or less, preferably 0.5 to 2 mm, most preferably 0.7 mm.
Set to に 1.5 mm. In addition, the opening ratio of each perforated plate shelf (= total pore area / perforated plate area; aka “opening ratio”) is 0.01 to 10%, preferably 0.04 to 4%.
%, Most preferably 0.2 to 2%.
【0028】開口率が上記下限値を大幅に下回る場合に
は、多孔板製棚段上の被処理PVCスラリー中に存在す
るPVC粒子が十分には攪拌されない状態を生ずる。そ
の原因は多孔板の細孔を通じて下方から被処理PVCス
ラリー中へ噴射される水蒸気の供給するエネルギーが所
期の攪拌に足りないことにある。逆に多孔板の開口率が
上限値を大幅に上回る場合には、多孔板上に存在する被
処理PVCスラリーが細孔から流下する現象(液洩れ)
が生じたり、液漏れに到らずとも余剰の水蒸気を消費す
る結果を来す。When the opening ratio is significantly lower than the above lower limit, a state occurs in which the PVC particles present in the PVC slurry to be treated on the perforated plate tray are not sufficiently stirred. The cause is that the energy supplied by the water vapor injected from below into the PVC slurry to be treated through the pores of the perforated plate is insufficient for the intended stirring. Conversely, when the opening ratio of the perforated plate is significantly higher than the upper limit, the phenomenon that the treated PVC slurry existing on the perforated plate flows down from the pores (liquid leakage).
Or the excess water vapor is consumed even if the liquid does not leak.
【0029】多孔板製棚段1を構成する多孔板の上に被
処理PVCスラリーを処理に必要な時間だけ滞留させる
為には前記処理通路(区画壁20、21、22及び23
等によって区分された通路)を溝型の長い一連の通路に
形成させることが有益である。溝型通路によって形成さ
れる処理通路の流線は図面に例示されている九十九折り
型(羊腸型)、渦巻型、矢車型又は星型(放射状)その
他のものを状況に応じて適宜選択できる。In order to allow the PVC slurry to be treated to stay on the perforated plate constituting the perforated plate shelf 1 for a time required for the treatment, the processing passages (the partition walls 20, 21, 22, and 23) are required.
, Etc.) are formed in a series of long grooves. The streamline of the processing passage formed by the groove-shaped passage is appropriately selected from a ninety-nine-fold type (sheep-intestine type), a spiral type, a wicker type or a star type (radial type) as shown in the drawings, depending on the situation. it can.
【0030】要は下記の状態が実現及び維持されながら
被処理PVCスラリーが押出流を形成する様に処理通路
上を移動すれば本発明の効果発現には十分である。 ・多孔板製棚段上に装入された被処理PVCスラリーが
多孔板製棚段上を激しい泡立ちを伴わず、 ・各PVC粒子が多孔板製棚段上に滞留する時間を均一
にし、 ・液状媒体中にPVC粒子が均一に懸濁されて局部的偏
在を生じない。In short, the processing path is such that the PVC slurry to be processed forms an extrusion flow while the following conditions are realized and maintained.
Moving upwards is sufficient for expressing the effect of the present invention. -The PVC slurry to be treated loaded on the perforated plate shelf is not accompanied by vigorous bubbling on the perforated plate shelf.-The time during which each PVC particle stays on the perforated plate shelf is made uniform; The PVC particles are uniformly suspended in the liquid medium and do not cause local uneven distribution.
【0031】上述の各種区画壁20、21、22及び2
3等で区分された被処理PVCスラリー処理通路を備え
た多孔板製棚段1は本発明の処理装置13(塔型を包
含)の中に1段以上設けられれば、それに対して本発明
の改良機構及び処理方法を適用して本発明の効果を収め
ることができる。The above-mentioned various partition walls 20, 21, 22 and 2
3 or the like, the perforated plate shelf 1 provided with the passage for treating the PVC slurry to be treated is provided in the treatment apparatus 13 of the present invention (including a tower type) in one or more stages. The effects of the present invention can be obtained by applying the improved mechanism and processing method.
【0032】本発明の処理装置が2段以上の多孔板製棚
段(例えば、1及び1a)を備えている場合には、下段
に位置する多孔板製棚段1aに対する直上多孔板製棚段
1の下側に温水噴射リング6を設けて多孔板製棚段1の
下面及びそれに連なる胴板内壁面を温水噴射リング6に
穿設された温水噴射ノズルから噴射される温水で洗浄す
ることを要する。温水噴射リング6は温水パイプをリン
グ状に賦形し、棚板1の下面及び胴板内壁に対して所望
の方向へ温水を噴射する噴射ノズルを適当個数及び適切
箇所に設けたものでよい。温水の噴射方向は個々の温水
噴射ノズルの軸が鉛直方向と交差する角度(γ)が10
〜60度となる様に設定することが好ましい。When the processing apparatus of the present invention is provided with two or more perforated plate shelves (for example, 1 and 1a), the perforated plate shelves directly above the perforated plate shelves 1a located at the lower stage A hot water injection ring 6 is provided below the lower surface 1 and the lower surface of the perforated plate shelf 1 and the inner wall surface of the body plate connected thereto are connected to the hot water injection ring 6.
It is necessary to wash with hot water injected from the hot water injection nozzle provided . The hot water injection ring 6 may be formed by shaping a hot water pipe into a ring shape, and providing an appropriate number of injection nozzles and an appropriate number of injection nozzles for injecting hot water in a desired direction toward the lower surface of the shelf 1 and the inner wall of the body plate. The direction of hot water injection is such that the angle (γ) at which the axis of each hot water injection nozzle intersects the vertical direction is 10 °.
It is preferable to set the angle to about 60 degrees.
【0033】温水噴射リング6の平面形状は通常はギリ
シャ文字のΩ型もしくはΦ型又は渦巻型、星型もしくは
羊腸型(九十九折り)の様なものでも、互に中心を同じ
くする多重リング型でも良い。温水噴射リング6の最大
直径は塔の胴板3の内壁よりも内側に該リング6の外縁
が収まる様に設定すれば済む。しかし、胴板3の内壁に
接近し過ぎれば洗い落とされるPVC粒子等が間隙を閉
塞する恐れを伴う。この様な事態を防ぐ為には胴板3の
内壁から内側へ20mm以上離れる程度に温水噴射リン
グ6の外径を設定すれば十分である。通常用いられる塔
型処理装置の塔内径から見て温水噴射リング6の外径を
通常、150〜2000mmとすることが好ましい。The hot water injection ring 6 may have a planar shape such as the Greek letter Ω type or Φ type, or the spiral type, star type or sheep intestine type (99-fold). It can be a type. The maximum diameter of the hot water injection ring 6 may be set so that the outer edge of the ring 6 is located inside the inner wall of the body plate 3 of the tower. However, if the inner wall of the body plate 3 is too close, there is a risk that the PVC particles and the like that are washed off may block the gap. In order to prevent such a situation, it is sufficient to set the outer diameter of the hot water injection ring 6 so as to be at least 20 mm inward from the inner wall of the body plate 3. It is preferable that the outer diameter of the hot water injection ring 6 is usually 150 to 2,000 mm when viewed from the inner diameter of the tower of a commonly used tower processing apparatus.
【0034】ここで、噴射される温水の温度はPVCス
ラリーの温度±10℃、好ましくは該スラリーの温度±
7℃、更に好ましくはPVCスラリーの温度±5℃であ
ることが好ましい。 Here, the temperature of the hot water to be injected is PVC
Rally temperature ± 10 ° C, preferably the slurry temperature ±
7 ° C, more preferably ± 5 ° C of PVC slurry temperature.
Preferably .
【0035】該温水噴射を90min以下の間隔、好ま
しくは60min以下の間隔で行なうことが残留ビニル
モノマー含有量の低い樹脂粉体を製造する為には好まし
い。また、該温水噴射を1sec以上、好ましくは5s
ec以上行なうことが残留ビニルモノマー含有量の低い
樹脂粉体を製造する為には好ましい。別の観点では、該
温水噴射量は1操作当たり0.1〜50m 3 /h/m 2
とすることが残留ビニルモノマー含有量の低い樹脂粉体
を製造為には好ましい。ここで、1操作当たりとは、個
々の噴射ノズルからの噴射1回当たりという意味であ
る。即ち、噴射リング6には複数個の噴射ノズルが穿設
され得ることから、複数個の温水噴射ノズルを備えた温
水噴射リング6においては、噴射される温水の全量(全
温水噴射量)は噴射ノズル1個当たりの噴射量とその噴
射ノズルの個数との積となる。 The hot water injection is preferably performed at intervals of 90 minutes or less.
Or residual vinyl at intervals of 60 minutes or less
Preferred for producing resin powder with low monomer content
No. Further, the hot water injection is performed for 1 second or more, preferably 5 seconds.
ec or more to reduce residual vinyl monomer content
It is preferable for producing a resin powder. In another aspect, the
The hot water injection amount is 0.1 to 50 m 3 / h / m 2 per operation.
Resin powder with low residual vinyl monomer content
Is preferred for production. Here, per operation means
Meaning one injection from each injection nozzle
You. That is, a plurality of injection nozzles are bored in the injection ring 6.
The temperature with multiple hot water injection nozzles
In the water injection ring 6, the total amount of hot water to be injected (total
(Hot water injection amount) is the injection amount per injection nozzle and its injection
It is the product of the number of injection nozzles.
【0036】温水噴射リング6に設けられる噴射ノズル
の開孔形状は円孔、長円孔、スリット等の適宜のものを
使用目的に応じて選択できる。ここで、円孔又は長円孔
の最大直径は通常1〜8mm、他方、スリットの最大長
も通常1〜8mmに選ぶことが好ましい。The shape of the opening of the injection nozzle provided on the hot water injection ring 6 can be appropriately selected from circular holes, oval holes, slits and the like according to the purpose of use. Here, the maximum diameter of the circular hole or oblong holes are usually 1 to 8 mm, while the maximum length of the slit is preferably also chosen to normal 1 to 8 mm.
【0037】他方、該多孔板製棚段1の上に存在する被
処理PVCスラリー液面に対して上方から前述の水蒸気
噴射機構5を通ずれば均一に水蒸気噴射を行なうことが
できる。勿論、上記の処理通路を備えた多孔板製棚段1
は処理装置内に複数段組み付けた形、即ち1、1a、1
b及び1c等の配置で通常は用いられる。 On the other hand , if the above-mentioned steam jetting mechanism 5 is passed from above to the surface of the PVC slurry to be treated existing on the perforated plate shelf 1, the steam can be jetted uniformly . Of course, the perforated plate shelf 1 having the above-described processing passage
Is a multi-stage assembly in the processing apparatus, that is, 1, 1a, 1
Usually used in arrangements such as b and 1c.
【0038】本発明の処理装置が塔型である場合につい
て説明すれば、塔の内径(内直径:D)にも塔高(H)
にも特別な制限は無い。通常は塔内径(D)300〜3
000mm、好ましくは500〜2000mmに設定す
れば、殆どの使用目的に適合する。また、[塔高(H)
/塔内径(D)]比率はH/D=通常2〜20、好まし
くは5〜15程度に選ぶ。The case where the processing apparatus of the present invention is of the tower type will be described. The inner diameter (inner diameter: D) of the tower is also equal to the tower height (H).
There are no special restrictions. Normally tower inner diameter (D) 300 ~ 3
If it is set to 000 mm, preferably 500 to 2000 mm, it is suitable for most uses. Also, [ Tower height (H)
/ Tower inner diameter (D) ] ratio is selected such that H / D = usually 2 to 20, preferably 5 to 15.
【0039】本発明の被処理PVCスラリーとは、水性
分散媒及びPVC粒子(粉末)の他に、これらから除去
されるべき残留VCモノマーをも含有するものである。
該スラリーには更に、樹脂製造の為の重合の際に重合系
に添加された懸濁剤例えば、ポリビニルアルコール(P
VA)、カルボキシメチルセルロース(CMC)等、緩
衝剤、粒径調整剤、スケール付着抑制剤又は消泡剤等も
含有され得る。The treated PVC slurry of the present invention contains, in addition to the aqueous dispersion medium and the PVC particles (powder), residual VC monomers to be removed therefrom.
The slurry may further contain a suspending agent, such as polyvinyl alcohol (P), added to the polymerization system during polymerization for resin production.
VA), carboxymethylcellulose (CMC), and the like, a buffer, a particle size adjusting agent, a scale adhesion inhibitor, an antifoaming agent, and the like.
【0040】PVCは樹脂を構成する分子鎖の結合単位
であるVCの重合体であって、ポリ塩化ビニルの略称で
あり、別名塩化ビニル樹脂である。VCは塩化ビニル
(モノマー)の略称である。PVC is a polymer of VC, which is a bonding unit of a molecular chain constituting a resin, and is an abbreviation of polyvinyl chloride, which is also called vinyl chloride resin. VC is an abbreviation for vinyl chloride (monomer).
【0041】しかし、本発明における被処理PVCはV
Cの単独重合体に限らず、VCと他のビニルモノマーと
の共重合体、オレフィン系重合体へのVCのグラフト重
合体、これらの2種以上の組成物をも包含する概念であ
る。PVCの典型的例としては、重合体の構成単位とな
ったVC単位を50重量%以上含有する重合体を挙げる
ことができる。However, the PVC to be treated in the present invention is V
The concept is not limited to a homopolymer of C, but includes a copolymer of VC with another vinyl monomer, a graft polymer of VC to an olefin polymer, and a composition of two or more of these. A typical example of PVC is a polymer containing 50% by weight or more of a VC unit as a constituent unit of the polymer.
【0042】ここで「ビニルモノマー」とは次の様な各
種のものをも包含する概念である: ・ビニルアルコールのカルボン酸エステル類例えば、酢
酸ビニル ・ビニルエーテル類例えば、アルキルビニルエーテル ・不飽和カルボン酸のエステル類例えば、アクリレー
ト、メタクリレート ・ハロゲン化ビニリデン類例えば、塩化ビニリデン、弗
化ビニリデン ・不飽和ニトリル類例えば、アクリルニトリル(別名
「アクリロニトリル」) ・オレフィン類例えば、エチレン、プロピレン。Here, the term "vinyl monomer" is a concept including various kinds of: carboxylic acid esters of vinyl alcohol such as vinyl acetate; vinyl ethers such as alkyl vinyl ether; and unsaturated carboxylic acid. Esters such as acrylates and methacrylates; vinylidene halides such as vinylidene chloride and vinylidene fluoride; unsaturated nitriles such as acrylonitrile (also called "acrylonitrile"); olefins such as ethylene and propylene.
【0043】前記の被処理PVCスラリー中に残留する
VCモノマーは如何なる量であろうとも、除去すること
が望まれる。本発明の方法及び処理装置の適用対象であ
る被処理PVCスラリーはPVC粒子に吸収又は吸着さ
れたVCを通常500〜40000ppm含有してい
る。該PVCスラリー中のPVCの濃度(以下、単に
「スラリー濃度」ということがある)は5〜45重量
%、好ましくは10〜40重量%に設定する。この上限
値を大幅に超える場合には被処理PVCスラリーの流動
性悪化を生じ、この下限値を大幅に下回る場合には本発
明の処理装置(塔型)の能力低下を来すばかりで、VC
除去能力には格別の上昇が生じない。It is desirable to remove any amount of VC monomer remaining in the PVC slurry to be treated. The treated PVC slurry to which the method and the treatment apparatus of the present invention are applied usually contains 500 to 40000 ppm of VC absorbed or adsorbed by PVC particles. The concentration of PVC in the PVC slurry (hereinafter sometimes simply referred to as “slurry concentration”) is set to 5 to 45% by weight, preferably 10 to 40% by weight. If the upper limit is significantly exceeded, the fluidity of the PVC slurry to be treated is deteriorated. If the lower limit is significantly decreased, the capacity of the treatment apparatus (tower type) of the present invention is reduced, and the
There is no particular increase in removal capacity.
【0044】被処理PVCスラリーを前記の流出管4を
備えた多孔板製棚段1の上で水蒸気処理する際のスラリ
ー温度の下限は通常60℃、好ましくは70℃、最も好
ましくは80℃に選ぶ。他方、被処理PVCスラリー温
度の上限は通常130℃、好ましくは120℃、最も好
ましくは110℃に選ぶ。When the PVC slurry to be treated is subjected to steam treatment on the perforated plate shelf 1 provided with the outflow pipe 4, the lower limit of the slurry temperature is usually 60 ° C., preferably 70 ° C., and most preferably 80 ° C. Choose. On the other hand, the upper limit of the temperature of the PVC slurry to be treated is usually 130 ° C., preferably 120 ° C., and most preferably 110 ° C.
【0045】処理装置中の圧力は被処理PVCスラリー
温度60〜130℃の場合には約0 .2〜3kgf/cm2(abs)である。被処理PV
Cスラリーの温度を高めるに伴って、該スラリー中のP
VC粒子からVCが水蒸気に同伴して気化し易くなる。
しかし、該温度を高め過ぎると、スラリー中のPVC粒
子の着色又は熱劣化を引き起こす。When the temperature of the PVC slurry to be processed is 60 to 130 ° C., the pressure in the processing apparatus is about 0. 2-3 kgf / cm 2 (abs). PV to be treated
With the increase of the temperature of the C slurry, P in the slurry
VC is easily vaporized from the VC particles accompanying the water vapor.
However, if the temperature is too high, the PVC particles in the slurry will be colored or thermally degraded.
【0046】上記の被処理スラリーの外にも、本発明の
方法及び処理装置を適用し得る対象としては、下記のス
ラリーも包含される: ・重合反応終了後に反応系を常圧まで降圧する途中で系
内スラリーを貯蔵槽へ開放して得られたPVCスラリー ・重合反応を任意の重合率の段階で停止して、系内スラ
リーをその儘貯蔵槽へ開放して得られたPVCスラリ
ー。In addition to the above-mentioned slurry to be processed, the following slurry may be applied to the method and the processing apparatus of the present invention: During the completion of the polymerization reaction, the pressure in the reaction system is reduced to normal pressure. A PVC slurry obtained by releasing the slurry in the system to the storage tank in step 1.-A PVC slurry obtained by stopping the polymerization reaction at a stage of an arbitrary polymerization rate and opening the slurry in the system to the storage tank as it is.
【0047】本発明の被処理PVCスラリーは前述の処
理通路を備えた多孔板製棚段1の上側に装入されるに当
たり、50〜100℃に予熱されていることが望まし
い。この予熱は処理装置から排出される処理済みPVC
スラリーと装入される被処理PVCスラリーとの間の熱
交換によって行なわれことが実際的である。この熱交換
によって、排出PVCスラリーも冷却されて好適な排出
温度60〜120℃への温度低下が達成される。When the PVC slurry to be treated of the present invention is charged above the perforated plate shelf 1 provided with the treatment passages described above, it is desirable that the slurry be preheated to 50 to 100 ° C. This preheating is performed on the treated PVC discharged from the processing equipment.
It is practical to do this by heat exchange between the slurry and the incoming PVC slurry to be treated. This heat exchange also cools the discharged PVC slurry and achieves a temperature reduction to a suitable discharge temperature of 60-120C.
【0048】被処理PVCスラリーの処理装置内におけ
る滞留時間の下限は1min、好ましくは2min、最
も好ましくは3minであり、滞留時間の上限は約60
minである。被処理PVCスラリーの滞留時間を長く
設定するに伴って被処理PVCスラリー中のPVC粒子
から残留VCモノマーを高度に除去できるが、滞留時間
が長過ぎるとPVC粒子の着色(変色)及び熱劣化等を
引き起こす。The lower limit of the residence time of the PVC slurry to be treated in the processing apparatus is 1 min, preferably 2 min, most preferably 3 min, and the upper limit of the residence time is about 60 min.
min. Can be highly remove residual VC monomer from PVC particles to be treated PVC slurry with the setting a longer residence time of the processed PVC slurry residence time
If the length is too long, coloring (discoloration) and thermal deterioration of the PVC particles are caused.
【0049】本発明の処理装置内への被処理PVCスラ
リーの装入量(流量)は各多孔板製棚段を構成する多孔
板面積基準で1m2当たり0.1〜300m3/h、好
ましくは1〜100m3/hに調整する。The amount (flow rate) of the PVC slurry to be treated to be introduced into the treatment apparatus of the present invention is preferably 0.1 to 300 m 3 / h per 1 m 2 based on the area of the perforated plate constituting each perforated plate shelf. Is adjusted to 1 to 100 m 3 / h.
【0050】本発明の処理装置に装着された多孔板製棚
段の下方からの水蒸気導入(噴射)量は被処理PVCス
ラリー1m3当たりで1〜100kg/h、好ましくは
5〜50kg/hである。この水蒸気導入の目的は下記
の諸点にある: ・被処理PVCスラリーを加熱すると共に所定温度に維
持する ・被処理PVCスラリーを充分に攪拌して含有PVC粒
子が沈降することを防ぐ ・被処理PVCスラリー中に残留するVCの気相中への
蒸発・移行を促進する。The amount of steam introduced (sprayed) from below the perforated plate shelf mounted on the treatment apparatus of the present invention is 1 to 100 kg / h, preferably 5 to 50 kg / h per m 3 of the PVC slurry to be treated. is there. The purpose of this steam introduction is to:-heat the PVC slurry to be treated and maintain it at a predetermined temperature;-sufficiently agitate the PVC slurry to be treated to prevent the contained PVC particles from settling out;-PVC to be treated. It promotes evaporation and transfer of VC remaining in the slurry into the gas phase.
【0051】特に、被処理PVCスラリー中のPVC粒
子の沈降を防止することは次の2点において重要であ
る: ・被処理PVCスラリー内に含有される各PVC粒子の
滞留時間を均一化する(滞留時間分布を狭める) ・含有PVC粒子中の残留VC及び液状媒体中の残留V
Cの除去を促進する。In particular, prevention of sedimentation of PVC particles in the PVC slurry to be treated is important in the following two points: uniforming the residence time of each PVC particle contained in the PVC slurry to be treated ( residual V in residual VC and liquid medium residence time distribution narrow the) content in PVC particles
Promotes C removal.
【0052】上記の各目的を達成する為には、多孔板製
棚板の下方からの水蒸気導入量を適切に選ぶことが肝要
である。水蒸気の導入量が少な過ぎれば所期の状態を実
現できない。他方、水蒸気の導入量が多過ぎれば、被処
理PVCスラリーの飛沫発生が激しくなる外にフラッデ
ィングが生ずる場合もある。それにも拘らず、被処理P
VCスラリー中のVCの除去効果が格別に向上する訳で
はない。In order to achieve each of the above objects, it is important to appropriately select the amount of steam introduced from below the perforated shelf. If the amount of introduced steam is too small, the desired state cannot be realized. On the other hand, if the introduced amount of water vapor is too large, flooding may occur in addition to intense splashing of the PVC slurry to be treated. Nevertheless, the processed P
The effect of removing VC in the VC slurry is not particularly improved.
【0053】[0053]
【実施例】以下に、本発明を実施例に基づいて具体的に
説明するが、本発明はこれに制限されるものではない。EXAMPLES Hereinafter, the present invention will be described specifically with reference to examples, but the present invention is not limited to these examples.
【0054】[0054]
【実施例1】図1の形状(多孔板の細孔直径1.3m
m、開口率0.3%)を有し、図3の様に組み立てられ
た多孔板製棚段付き塔型処理装置を用い、被処理PVC
スラリー[PVC(平均重合度=1300);PVC濃
度30重量%、残留VCモノマー濃度30000ppm
(PVC重量基準;以後のVC濃度の単位)]の脱VC
モノマー処理を図3に示された装置及び工程に基づいて
実施した。Example 1 The shape shown in FIG. 1 (pore diameter of the perforated plate: 1.3 m)
m, opening ratio 0.3%), and using a perforated plate-type tower-type processing apparatus assembled as shown in FIG.
Slurry [PVC (average degree of polymerization = 1300); PVC concentration 30% by weight, residual VC monomer concentration 30000 ppm
(PVC weight basis; subsequent units of VC concentration)]
The monomer treatment was performed based on the apparatus and process shown in FIG.
【0055】用いられた塔型処理装置13の多孔板製棚
段1の上側に装入できる被処理PVCスラリー量は1段
当り0.87m3、各多孔板製棚段の間隔1600m
m、直径1500mmの各多孔板製棚段上のPVCスラ
リー液深を約500mmとすると共に、処理通路幅(例
えば区画壁21と22との間隔)を200mmとした。[0055] treated PVC slurry amount that can be charged into the upper side of the porous plate made tray 1 used were tower type processor 13 per stage 0.87 m 3, the interval of the porous plate made trays 1600m
m, PVC slurry on each perforated plate shelf with a diameter of 1500 mm
The Lee solution depth was about 500 mm, and the width of the processing passage (for example, the interval between the partition walls 21 and 22) was 200 mm.
【0056】図3のスラリータンク14から熱交換器1
7に装入されて80℃に予熱された被処理PVCスラリ
ーを図3に示された処理装置13の塔頂室8に流量20
m3/hで装入すると共に、スラリーの上方に位置する
水蒸気噴射ノズル5から被処理PVCスラリーの表面に
向けて水蒸気を頂角θ=約120度の円錐体状に噴射圧
2.5kgf/cm 2 (abs.)及び噴射量96kg
/(h/m 2 )で各段のスラリーにおいて場所的に不均
衡を生じない様に(均一に)噴射した。それと並行し
て、塔底室9に蒸気導入管12から水蒸気(温度110
℃の過熱蒸気)を流量600kg/hで導入した。この
際の被処理PVCスラリーの滞留時間は10minであ
った。From the slurry tank 14 in FIG.
PVC slurry to be treated and preheated to 80 ° C
Into the top chamber 8 of the processing apparatus 13 shown in FIG.
Charged at m 3 / h and located above the slurry
From the steam injection nozzle 5 to the surface of the PVC slurry to be treated
Injects water vapor into a cone with an apex angle of about 120 degrees
2.5 kgf / cm 2 (abs.) And injection amount 96 kg
/ (H / m 2 ), the slurry in each stage is locally uneven
It was sprayed (evenly) so as not to cause a balance . In parallel with it
Then, steam (temperature of 110
℃ superheated steam) was introduced at a flow rate of 600 kg / h. At this time, the residence time of the PVC slurry to be treated was 10 minutes.
【0057】被処理PVCスラリーは図3の処理装置1
3内に装入された後に、多孔板製棚段1上側の処理通路
を順に下段側へ流れながら、多孔板製棚段1の底板に設
けられた細孔を通じて下方から導入される水蒸気で10
0℃に加熱され、多孔板製棚段1の処理通路末端に位置
する流下管4からその下に設けられた多孔板製棚段1a
へ移動してこの処理を繰り返し受け、最終的に処理装置
13の最下段からスラリー出口管11及びスラリーポン
プ19を経由して受入れ槽16へ到る。The PVC slurry to be treated is supplied to the treatment apparatus 1 shown in FIG.
After being loaded into the 3, water vapor while flowing the processing path of the porous plate made of tray 1 on the side in order to lower side, is introduced from below through the pores provided in the bottom plate of the perforated plate made tray 1 At 10
Heated to 0 ° C., the perforated plate shelf 1a provided thereunder from the downflow pipe 4 located at the end of the processing passage of the perforated plate shelf 1
To the receiving tank 16 through the slurry outlet pipe 11 and the slurry pump 19 from the lowermost stage of the processing apparatus 13.
【0058】この過程でPVCスラリーは熱交換器17
によって50℃まで冷却された。この排出PVCスラリ
ー中のVC含有量(濃度)は1ppm以下であった。ま
た、処理装置13の塔頂室8で発生した水とVCとの混
合蒸気は塔頂から出て凝縮器15に進入し、そこで凝縮
した水とVCとは分液によって分離される。In this process, the PVC slurry is transferred to the heat exchanger 17.
To 50 ° C. The VC content (concentration) in the discharged PVC slurry was 1 ppm or less. Further, the mixed vapor of water and VC generated in the tower top chamber 8 of the treatment device 13 exits the tower and enters the condenser 15, where the condensed water and VC are separated by liquid separation.
【0059】上述のPVCスラリー処理の全期間に亙
り、被処理PVCスラリー液面の上方から水蒸気噴射ノ
ズル5を通じて連続的に水蒸気をスラリー液面に対して
圧力2.5kgf/cm2Abs.で噴射してスラリー
液相内の泡発生を抑制すると共に、抑制され得ずに発生
した泡を極力消滅させた。この際の水蒸気噴射量は多孔
板面積基準で1m2当り96kg/hとした。During the entire period of the above-mentioned PVC slurry treatment, steam is continuously supplied from above the surface of the PVC slurry to be processed through the steam injection nozzle 5 to a pressure of 2.5 kgf / cm 2 Abs. In addition to suppressing the generation of bubbles in the slurry liquid phase by spraying, it is generated without being suppressed
Bubbled bubbles were eliminated as much as possible . Steam injection amount at this time was set to 1 m 2 per 96 kg / h with a porous plate of area.
【0060】上述のPVC処理時に、温水噴射リング6
から多孔板製棚段毎に温水を流量0.5m3/h/段、
10分間隔で、5秒間に亙り合計量2m 3 /hで各段内
壁面及び直上多孔板製棚段下面へ噴射して塔内を洗浄し
たところ、製品(PVC粉)中には焼け物(異物;胴板
の内壁面等に付着して長時間加熱された結果、熱劣化し
たPVC粒子等)が認められなかった。その結果を表1
に示す。At the time of the above-mentioned PVC treatment, the hot water injection ring 6
The flow rate of hot water from each perforated plate shelf to 0.5 m 3 / h / stage,
When the tower was washed by spraying at an interval of 10 minutes at a total amount of 2 m 3 / h over 5 seconds onto the inner wall surface of each stage and the lower surface of the perforated plate shelf directly above, the product (PVC powder) contained burnt matter (PVC powder). Foreign matter; as a result of adhering to the inner wall surface of the body plate and heating for a long time, thermally deteriorated PVC particles, etc.) were not observed. Table 1 shows the results.
Shown in
【0061】[0061]
【比較例1】実施例1の処理において前記水蒸気噴射ノ
ズル5からの噴射を停止して、他の条件は実施例1と同
様にして操作を行なった。Comparative Example 1 In the process of Example 1, the injection from the steam injection nozzle 5 was stopped, and the other conditions were the same as in Example 1.
【0062】その結果、被処理PVCスラリーが発泡し
て処理済みPVCスラリー出口11におけるPVCスラ
リー中の残留VC濃度が300ppm(PVC基準)に
達した。また、運転開始30分後にVC凝縮器15にP
VCが堆積して閉塞を生じ、運転不能となった。しか
も、製品(PVC粉)中にPVC100g当たり78個
の焼け物(異物)が発生した。その結果を表1に併せて
示す。As a result, the PVC slurry to be treated foamed and the residual VC concentration in the PVC slurry at the treated PVC slurry outlet 11 reached 300 ppm (based on PVC). Also, 30 minutes after the start of operation, the P
VC was deposited and clogged, and operation became impossible. In addition, 78 burns (foreign matter) were generated in the product (PVC powder) per 100 g of PVC. The results are shown in Table 1.
【0063】[0063]
【比較例2】実施例1の処理において前記温水噴射リン
グ6からの温水噴射を停止して、他の条件は実施例1と
同様にして操作を行なった。Comparative Example 2 In the process of Example 1, the operation of injecting the hot water from the hot water injection ring 6 was stopped, and the other conditions were the same as in Example 1.
【0064】その結果、処理済みPVCスラリー出口1
1におけるPVCスラリー中の残留VC濃度は1ppm
(PVC基準)となったが、製品中(PVC粉)中にP
VC100g当たり122個の焼け物(異物)が発生し
た。結果を表1に併せて示す。As a result, the treated PVC slurry outlet 1
1 the residual VC concentration in the PVC slurry was 1 ppm
(PVC standard), but P in product (PVC powder)
122 burns (foreign matter) were generated per 100 g of VC. The results are shown in Table 1.
【0065】[0065]
【比較例3】 PVCスラリー処理の全期間に亙り被処理
PVCスラリー液面の上方から水蒸気噴射ノズル5の頂
角を45度とした以外には実施例1におけると同一に操
作を行なった。 Comparative Example 3 The same operation as in Example 1 was performed except that the apex angle of the steam injection nozzle 5 was set to 45 degrees from above the surface of the PVC slurry to be treated over the entire period of the PVC slurry treatment.
【0066】その結果、水蒸気噴射ノズルから噴射され
る水蒸気が多孔板製棚段上の中央部に偏って噴射された
結果、水蒸気と接触していないPVCスラリー液面から
泡が発生し、処理済PVCスラリー出口11におけるP
VCスラリー中の残留VC濃度が260ppm(PVC
基準)に達した。しかも、運転開始40min後に15
にPVCが堆積して閉塞を生じた結果、運転不能に到っ
た。それに加えて、製品(PVC粉)中にPVC100
当り67個の焼け物(異物)が発生した。その結果を表
1に併せて示す。As a result, the water vapor injected from the water vapor injection nozzle was jetted to the center of the perforated plate shelf, and as a result, bubbles were generated from the surface of the PVC slurry not in contact with the water vapor, and P at PVC slurry outlet 11
The residual VC concentration in the VC slurry is 260 ppm (PVC
Criteria). In addition, 15 minutes after the start of operation,
As a result of the accumulation of PVC and clogging, operation became impossible. In addition, PVC100 in the product (PVC powder)
67 burns (foreign matter) were generated per shot. The results are shown in Table 1.
【0067】[0067]
【実施例2】 温水噴射リング6から多孔板製棚段毎に温
水を流量0.2m3/h/段、10min間陽で5se
c間に亙り次記の各所へ噴射(全噴射量合計0.8m3
/h)して塔内を洗浄する以外には、実施例1における
と同一に操作を行なった。ここで、塔内の各所とは、各
棚段の内壁面及び直上に位置する多孔板製棚段の下面を
いう。 Example 2 Hot water was supplied from a hot water injection ring 6 to each of the perforated plate shelves at a flow rate of 0.2 m 3 / h / stage for 10 min.
Injection to the following locations over the interval c (total injection amount 0.8 m 3
/ H), and the same operation as in Example 1 was performed, except that the inside of the column was washed. Here, each location in the tower refers to the inner wall surface of each shelf and the lower surface of the perforated plate shelf located immediately above.
【0068】その結果、処理済PVCスラリー出口11
におけるPVCスラリー中の残留VC濃度は1ppm以
下(PVC基準)へ低下したが、製品中(PVC粉)に
PVC100g当たり2個の焼け物(異物)が発生し
た。その結果を表1に併せ示す。As a result, the treated PVC slurry outlet 11
, The residual VC concentration in the PVC slurry at 1 ppm or less (PVC standard) was reduced, but two burns (foreign matter) were generated in the product (PVC powder) per 100 g of PVC. The results are shown in Table 1.
【0069】[0069]
【実施例3】 温水噴射リング6から多孔板製棚段毎に温
水を流量0.05m3/h/段、10min間隔で5s
ec間に亙り次記の各所へ噴射(全噴射量合計0.2m
3/h)して塔内を洗浄する以外には、実施例1におけ
ると同一に操作を行なった。ここで、塔内の各所とは、
各棚段の内壁面及び直上に位置する多孔板製棚段の下面
をいう。 [Embodiment 3] Hot water was supplied from a hot water injection ring 6 to each perforated plate shelf at a flow rate of 0.05 m 3 / h / stage for 5 s at 10 min intervals.
ec to the following places (total injection amount 0.2m
3 / h), and the same operation as in Example 1 was performed, except that the inside of the column was washed. Here, each place in the tower is
It refers to the inner wall surface of each shelf and the lower surface of the perforated plate shelf located immediately above.
【0070】その結果、処理済PVCスラリー出口11
におけるPVCスラリー中の残留VC濃度は1ppm以
下(PVC基準)へ低下したが、製品中(PVC粉)に
PVC100g当たり34個の焼け物(異物)が発生し
た。その結果を表1に併せ示す。As a result, the treated PVC slurry outlet 11
, The concentration of residual VC in the PVC slurry was reduced to 1 ppm or less (PVC standard), but 34 burns (foreign matter) were generated in the product (PVC powder) per 100 g of PVC. The results are shown in Table 1.
【0071】[0071]
【実施例4】 温水噴射リング6から多孔板製棚段毎に温
水を流量1.5m3/h/段、5min間隔で10se
cに亙り次記の各所へ噴射(全噴射量合計6.0m3/
h)して塔内を洗浄する以外には、実施例1におけると
同一に操作を行なった。ここで、塔内の各所とは、各棚
段の内壁面及び直上に位置する多孔板製棚段の下面をい
う。 Embodiment 4 Hot water was supplied from a hot water injection ring 6 to each perforated plate shelf at a flow rate of 1.5 m 3 / h / stage for 10 sec at 5 min intervals.
c to the following locations (total injection amount: 6.0 m 3 /
h) The same operation as in Example 1 was carried out, except that the inside of the column was washed. Here, each location in the tower refers to the inner wall surface of each shelf and the lower surface of the perforated plate shelf located immediately above.
【0072】その結果、処理済PVCスラリー出口11
におけるPVCスラリー中の残留VC濃度は1ppm以
下(PVC基準)へ低下し、製品(PVC粉)中のPV
C100g当たりの焼け物(異物)発生個数は0まで到
達したが、処理済PVCスラリーの濃度が23wt%に
減少した。処理済PVCスラリー濃度の減少に起因して
PVCスラリーの脱水工程における負荷が増大した。そ
の結果を表1に併せ示す。As a result, the treated PVC slurry outlet 11
The concentration of residual VC in the PVC slurry at 1 ppm or less (based on PVC) and the PV in the product (PVC powder)
The number of burns (foreign matter) generated per 100 g of C reached 0, but the concentration of the treated PVC slurry was reduced to 23 wt%. Due to the decrease in the concentration of the treated PVC slurry, the load in the step of dewatering the PVC slurry increased. The results are shown in Table 1.
【0073】[0073]
【実施例5】 PVCスラリー処理の全期間に亙り被処理
PVCスラリー液面の上方から水蒸気噴射ノズル5を通
じて噴射圧力5.0kgf/cm2(Abs.)で連続
的に、しかも均一な面密度になる様に水蒸気を噴射して
スラリー液相内の気泡発生を抑制すると共に、抑制され
得ずに発生した気泡を極力消滅させた。この際には水蒸
気噴射量を多孔板の面積基準(/m2)で153kg/
hに設定した以外には、実施例1におけると同一に操作
を行なった。 Embodiment 5 Throughout the entire period of the PVC slurry treatment, a spray pressure of 5.0 kgf / cm 2 (Abs.) Is applied from above the surface of the treated PVC slurry through the steam spray nozzle 5 to a uniform and uniform surface density. Water vapor was sprayed so as to suppress the generation of bubbles in the slurry liquid phase, and the generated bubbles that could not be suppressed were eliminated as much as possible. At this time, the steam injection amount was 153 kg / on the basis of the area of the perforated plate (/ m 2 ).
The same operation as in Example 1 was performed except that h was set.
【0074】その結果、処理済PVCスラリーの出口1
1におけるPVCスラリー中の残留VC濃度は1ppm
以下(PVC基準)まで低下すると共に、製品(PVC
粉)中にPVC100g当りの焼け物(異物)の発生個
数は0個に抑制された。その結果を表1に併せ示す。As a result, the outlet 1 of the treated PVC slurry
1 the residual VC concentration in the PVC slurry was 1 ppm
Below (PVC standard) and products (PVC standard)
The number of burns (foreign matter) per 100 g of PVC in the powder) was suppressed to zero. The results are shown in Table 1.
【0075】[0075]
【実施例6】 PVCスラリー処理の全期間に亙り被処理
PVCスラリー液面の上方から水蒸気噴射ノズル5を通
じて噴射圧力11.0kgf/cm2(Abs.)で連
続的に、しかも均一な面密度になる様に水蒸気を噴射し
てスラリー液相内の気泡発生を抑制すると共に、抑制さ
れ得ずに発生した気泡を極力消滅させた。この際には水
蒸気噴射量を多孔板の面積基準(/m2)で226kg
/hに設定した以外には、実施例1におけると同一に操
作を行なった。 Embodiment 6 Throughout the entire period of the PVC slurry treatment, a spray pressure of 11.0 kgf / cm 2 (Abs.) Is applied from above the surface of the PVC slurry to be treated through the steam spray nozzle 5 to a uniform surface density. Water vapor was sprayed so as to suppress the generation of bubbles in the slurry liquid phase, and the generated bubbles that could not be suppressed were eliminated as much as possible. In this case, the steam injection amount was 226 kg based on the area of the perforated plate (/ m 2 ).
The same operation as in Example 1 was performed except that / h was set.
【0076】その結果、処理済PVCスラリーの出口1
1におけるPVCスラリー中の残留VC濃度は1ppm
以下(PVC基準)まで低下し、製品(PVC粉)中に
PVC100g当りの焼け物(異物)の発生個数は8個
であった。この際には、水蒸気の噴射圧力を高めに設定
することによって噴射量を増大させたことに起因して、
PVCスラリーの液面が波打ったことに加えて、気泡
(直径100〜150mm程度)が発生した。その結果
を表1に併せ示す。As a result, the outlet 1 of the treated PVC slurry
1 the residual VC concentration in the PVC slurry was 1 ppm
The number of burned substances (foreign matter) per 100 g of PVC in the product (PVC powder) was eight. In this case, because the injection amount was increased by setting the injection pressure of the steam high,
In addition to the rippled surface of the PVC slurry, bubbles (about 100 to 150 mm in diameter) were generated. The results are shown in Table 1.
【0077】[0077]
【発明の効果】本発明の方法及び処理装置を用いれば、
下記の効果を収めることができる。 ・多孔板製棚段上の被処理PVCスラリーが下方からの
水蒸気の噴射によっても泡立ちを殆ど生じない外に、上
記の区画壁を溢流する事態も流下管へ流れ込む事態も実
質的に生じない ・塔頂からVCモノマーが抜出し管を経由して凝縮器へ
侵入する事態等の好ましくない事態が防止される ・処理装置の出口から排出されるPVC粒子中に残留す
るVCモノマー量が所定の水準以下に抑えられる ・被処理PVCスラリーの泡立ちが実質的に抑制される
結果、下記の波及効果も伴う: PVC粒子が泡に同伴される事態が殆ど完全に解消され
る PVC粒子が処理塔の内壁に付着する事態も殆ど生じな
い PVC粒子が水蒸気に長時間曝されて劣化する事態も殆
ど生じない 劣化PVC粒子等の混入による異物の発生は殆ど無い。According to the method and the processing apparatus of the present invention,
The following effects can be obtained. -The PVC slurry to be treated on the perforated plate shelf hardly foams even when water vapor is injected from below, and substantially neither overflows the partition wall nor flows into the downcomer pipe. -Undesirable situations such as a situation where the VC monomer enters the condenser via the extraction pipe from the top of the tower are prevented.-The amount of the VC monomer remaining in the PVC particles discharged from the outlet of the treatment device is at a predetermined level. The foaming of the PVC slurry to be treated is substantially suppressed, and the following ripple effect is also accompanied: The situation where PVC particles are entrained in the foam is almost completely eliminated. Almost no occurrence of adhering to PVC. Very little occurrence of deterioration of PVC particles due to prolonged exposure to water vapor. There is almost no generation of foreign matter due to mixing of degraded PVC particles and the like.
【0078】[0078]
【表1】 [Table 1]
【図1】図1は本発明の方法に使用する処理装置を構成
する多孔板製棚段の平面見取り図である。FIG. 1 is a plan view of a perforated plate shelf constituting a processing apparatus used in the method of the present invention.
【図2】図2は本発明の方法に使用する処理装置を構成
する多孔板製棚段部分の模式的縦断面図である。FIG. 2 is a schematic longitudinal sectional view of a perforated plate shelf portion constituting a processing apparatus used in the method of the present invention.
【図3】図3は本発明の方法の工程と処理装置の構成と
を示す概念的系統図である。FIG. 3 is a conceptual system diagram showing the steps of the method of the present invention and the configuration of a processing apparatus.
1 本発明の処理装置に組込まれた最上段の多孔板製棚
段 2 本発明の処理装置に組込まれた多孔板 3 本発明の塔型処理装置の外郭を形成する胴板 4 本発明の処理装置に組込まれた多孔板製棚段の下流
端からの流下管 5 本発明の処理装置に組込まれた多孔板製棚段の上方
に設けられた水蒸気噴射ノズル 6 本発明の処理装置に組込まれた温水噴射リング 7 本発明の処理装置に組込まれた最上段の多孔板製棚
段への被処理PVCスラリー装入口 8 本発明の処理装置における塔頂室 9 本発明の処理装置における塔底室 10 本発明の処理装置塔頂からの混合蒸気出口 11 本発明の処理装置に組込まれた最下段の多孔板製
棚段からの処理済みPVCスラリー出口 12 本発明の処理装置塔底への水蒸気導入口 13 本発明の処理装置本体 14 本発明の処理装置へ装入される被処理PVCスラ
リーのスラリータンク15 本発明の処理装置塔頂から
出た混合蒸気の凝縮器 16 本発明の処理装置から排出された処理済みPVC
スラリーの受入れ槽 17 本発明の処理装置に設置された熱交換器 18 本発明の処理装置へ被処理PVCスラリーを装入
するスラリーポンプ 19 本発明の処理装置から処理済みPVCスラリーを
排出するスラリーポンプ 20 本発明の処理装置に組込まれた区画壁 21 本発明の処理装置に組込まれた区画壁 22 本発明の処理装置に組込まれた区画壁 23 本発明の処理装置に組込まれた区画壁 1a 本発明の処理装置に組込まれた第2段の多孔板製
棚段 1b 本発明の処理装置に組込まれた第3段の多孔板製
棚段 1c 本発明の処理装置に組込まれた第4段(図3では
最下段)の多孔板製棚段 γ 温水噴射リングの噴射ノズル軸と鉛直方向との交差
角度 θ 水蒸気噴射機構から下方へ噴射される水蒸気の円錐
面における頂角DESCRIPTION OF REFERENCE NUMERALS 1 Uppermost shelf made of perforated plate incorporated in the treatment apparatus of the present invention 2 Perforated plate incorporated in the treatment apparatus of the present invention 3 Body plate forming the outer shell of the tower type treatment apparatus of the present invention 4 Treatment of the present invention Downstream pipe from the downstream end of the perforated plate shelf incorporated in the apparatus 5 Steam injection nozzle provided above the perforated plate shelf incorporated in the processing apparatus of the present invention 6 Built in the processing apparatus of the present invention Hot water injection ring 7 PVC slurry inlet to be processed into the uppermost perforated plate shelf incorporated in the processing apparatus of the present invention 8 Tower chamber in the processing apparatus of the present invention 9 Bottom chamber in the processing apparatus of the present invention 9 10 Mixed steam outlet from the top of the processing apparatus of the present invention 11 Treated PVC slurry outlet from the lowest perforated plate shelf incorporated in the processing apparatus of the present invention 12 Steam introduction to the bottom of the processing apparatus of the present invention Mouth 13 Main body of processing apparatus of the present invention 14 Treated PVC slurry treated PVC discharged from the apparatus of the condenser 16 the invention of mixed vapor exiting from the processor overhead of the slurry tank 15 present invention to be charged into the processing apparatus of the invention
Slurry receiving tank 17 Heat exchanger installed in processing apparatus of the present invention 18 Slurry pump for charging treated PVC slurry to processing apparatus of the present invention 19 Slurry pump for discharging processed PVC slurry from processing apparatus of the present invention Reference Signs 20 partition wall incorporated in the processing apparatus of the present invention 21 partition wall incorporated in the processing apparatus of the present invention 22 partition wall incorporated in the processing apparatus of the present invention 23 partition wall incorporated in the processing apparatus of the present invention 1a Second-stage perforated plate shelf 1b incorporated in the processing apparatus of the present invention 3rd perforated plate shelf 1c incorporated in the processing apparatus of the present invention 4th stage ( Γ the crossing angle between the injection nozzle axis of the hot water injection ring and the vertical direction θ the apex angle of the water vapor injected downward from the steam injection mechanism in the conical surface
───────────────────────────────────────────────────── フロントページの続き (72)発明者 内 田 誠 一 千葉県千葉市美浜区真砂2−23−1− 606 (56)参考文献 特開 昭56−22305(JP,A) 特開 昭54−8693(JP,A) 特開 昭54−131687(JP,A) 特開 昭54−62171(JP,A) 特開 平3−65202(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08F 6/00 - 6/24 C08F 14/06 B01D 19/02 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Seiichi Uchida 2-2-1-606 Masago, Mihama-ku, Chiba City, Chiba Prefecture (56) References JP-A-56-22305 (JP, A) JP-A-54 -8693 (JP, A) JP-A-54-131687 (JP, A) JP-A-54-62171 (JP, A) JP-A-3-65202 (JP, A) (58) Fields investigated (Int. . 7, DB name) C08F 6/00 - 6/24 C08F 14/06 B01D 19/02
Claims (23)
スラリーをその下方から導入される水蒸気で加熱及び攪
拌処理すると共に、該スラリー液面の上方から液面に対
して水蒸気を噴射すること及び該スラリーからの飛散物
又は揮発後の凝固物を温水噴射によって洗浄する操作を
施すことを特徴とする残留ビニルモノマー含有量の低い
樹脂粉体の製造方法。1. A method of heating and stirring a vinyl chloride resin slurry containing a residual vinyl monomer with water vapor introduced from below, and spraying water vapor from above the liquid surface of the slurry onto the liquid surface. Washing the scattered matter or the coagulated matter after volatilization by hot water injection, thereby producing a resin powder having a low residual vinyl monomer content.
リー液面の上方から噴射される水蒸気の圧力をその噴射
開始点において1kgf/cm2(Abs.)よりも大
とする残留ビニルモノマー含有量の低い樹脂粉体製造方
法。2. The method according to claim 1, wherein the pressure of the steam injected from above the slurry liquid level is higher than 1 kgf / cm 2 (Abs.) At the injection start point. A method for producing a low amount of resin powder.
該スラリーの上方から噴射される水蒸気の噴射圧を1.
1〜11kgf/cm2(Λbs.)とする残留ビニル
モノマー含有量の低い樹脂粉体製造方法。3. The method according to claim 1, wherein
The injection pressure of the water vapor injected from above the slurry was set at 1.
A method for producing a resin powder having a low residual vinyl monomer content of 1 to 11 kgf / cm 2 (Λbs.).
いて、該スラリーの上方から噴射される水蒸気を過熱蒸
気とする残留ビニルモノマー含有量の低い樹脂粉体製造
方法。4. The method according to claim 1, wherein water vapor injected from above the slurry is superheated steam, and the residual vinyl monomer content is low.
いて、該スラリーが処理に供されてから終了するまでの
期間内は押出し流れに近い状態で流れることを特徴とす
る残留ビニルモノマー含有量の低い樹脂粉体製造方法。5. The method according to claim 1, wherein the slurry is subjected to a treatment until the slurry is finished.
A method for producing a resin powder having a low residual vinyl monomer content, wherein the resin powder flows in a state similar to an extrusion flow during the period .
いて、該スラリーの温度を70〜150℃に保つ残留ビ
ニルモノマー含有量の低い樹脂粉体製造方法。6. The method according to claim 1, wherein the temperature of the slurry is kept at 70 to 150 ° C. and the resin powder has a low residual vinyl monomer content.
いて、スラリー液面の上方から該液面に対して円錐体状
に噴射される水蒸気の円錐面の頂角θが30〜150度
である残留ビニルモノマー含有量の低い樹脂粉体製造方
法。7. The method according to claim 1, wherein the apex angle θ of the conical surface of the water vapor sprayed in a conical shape from above the liquid surface of the slurry is 30 to 150. Resin powder production method with low residual vinyl monomer content.
いて、該スラリーに下方からも供給される水蒸気の量を
各操作当たり1〜100Kg/h/m2とする残留ビニ
ルモノマー含有量の低い樹脂粉体製造方法。8. The residual vinyl monomer content according to claim 1, wherein the amount of steam supplied also from below to the slurry is from 1 to 100 kg / h / m 2 per operation. Low resin powder production method.
いて、噴射される温水の温度が該スラリーの温度±10
℃である残留ビニルモノマー含有量の低い樹脂粉体の製
造方法。9. The method according to claim 1, wherein the temperature of the hot water to be sprayed is ± 10% of the temperature of the slurry.
A method for producing a resin powder having a low residual vinyl monomer content at ℃.
おいて、該温水噴射を90min以下の間隔で行なう残
留ビニルモノマー含有量の低い樹脂粉体の製造方法。10. The method according to claim 1, wherein the hot water injection is performed at intervals of 90 minutes or less.
において、該温水噴射を60min以下の間隔で行なう
残留ビニルモノマー含有量の低い樹脂粉体製造方法。11. The method according to claim 1, wherein the hot water injection is performed at intervals of 60 minutes or less.
において、該温水噴射を1sec以上行なう残留ビニル
モノマー含有量の低い樹脂粉体製造方法。12. wherein A method according to any one of claims 1 to 11, lower resin powder production method of residual vinyl monomer content to perform hot water injection 1 sec or more.
において、該温水噴射を5sec以上行なう残留ビニル
モノマー含有量の低い樹脂粉体製造方法。13. The method according to claim 1, wherein the hot water injection is carried out for 5 seconds or more.
において、該温水噴射量は1操作当たり0.1〜50m
3/h/m2とする残留ビニルモノマー含有量の低い樹
脂粉体製造方法。14. The method according to claim 1, wherein the injection amount of hot water is 0.1 to 50 m per operation.
A method for producing a resin powder having a low residual vinyl monomer content of 3 / h / m 2 .
脂スラリーから該ビニルモノマーを分離除去する為に、
下記の(a)〜(e)に記載された手段を備えているこ
とを特徴とする残留ビニルモノマー含有量の低い樹脂粉
体の製造装置: (a)該塔内に設けられた1以上の多孔板製棚段、 (b)該多孔板製棚板上に設けられた該スラリーの処理
通路、 (c)該処理通路の下方から水蒸気を導入する手段、 (d)該スラリー液面の上方から液面に対して水蒸気を
噴射する手段 (e)該多孔板製棚段に対して直上の多孔板製棚段の下
方に位置して温水を水平よりも上方へ噴射する温水噴射
リング。15. In order to separate and remove the vinyl monomer from the residual vinyl monomer-containing vinyl chloride resin slurry,
An apparatus for producing a resin powder having a low residual vinyl monomer content, which is provided with the following means (a) to (e): (a) one or more resin powders provided in the column; (B) a passage for processing the slurry provided on the shelf made of perforated plate, (c) means for introducing steam from below the treatment passage, (d) above the surface of the slurry liquid (E) A hot water injection ring which is located below the perforated plate shelf just above the perforated plate shelf and injects hot water upward from the horizontal.
スラリーの処理通路が多孔板製棚段の上で区画壁によっ
て溝状に区分された一連の通路を形成すると共に、該ス
ラリー液面の上方から該液面に対して水蒸気を噴射円錐
面の頂角(θ)が30〜150度の範囲で噴射する機構
を備えていることを特徴とする残留ビニルモノマー含有
量の低い樹脂粉体の製造装置。16. The apparatus according to claim 15, wherein the processing passage for the slurry forms a series of passages which are divided in a groove shape by partition walls on a perforated plate shelf, and the surface of the slurry liquid is formed. A resin powder having a low residual vinyl monomer content, characterized by being provided with a mechanism for injecting water vapor from above into the liquid surface at an apex angle (θ) of an injection cone surface of 30 to 150 degrees. manufacturing device.
いて、多孔板製棚段に設けられた細孔の平均直径が5m
m以下である残留ビニルモノマー含有量の低い樹脂粉体
の製造装置。17. The apparatus according to claim 15, wherein the pores provided on the perforated plate shelf have an average diameter of 5 m.
m, a device for producing a resin powder having a low residual vinyl monomer content of not more than m.
置において、多孔板製棚段の開口率(=細孔面積総和/
多孔板全面積)が0.01〜10%である残留ビニルモ
ノマー含有量の低い樹脂粉体の製造装置。18. The apparatus according to claim 15, wherein the opening ratio of the perforated plate tray (= total pore area / total pore area).
An apparatus for producing a resin powder having a low residual vinyl monomer content having a total area of a perforated plate of 0.01 to 10%.
置において、該水蒸気噴射機構が該スラリー液面の上方
50〜1000mmの高さに位置する残留ビニルモノマ
ー含有量の低い樹脂粉体の製造装置。19. The apparatus according to claim 15, wherein the steam injection mechanism is a resin powder having a low residual vinyl monomer content located at a height of 50 to 1000 mm above the slurry liquid level. manufacturing device.
置において、該温水噴射リングの噴射ノズルが直上多孔
板製棚段の下方50〜500mmに位置する残留ビニル
モノマー含有量の低い樹脂粉体の製造装置。20. The resin powder having a low residual vinyl monomer content according to claim 15, wherein the injection nozzle of the hot water injection ring is located 50 to 500 mm below a perforated plate shelf directly above. Body manufacturing equipment.
置において、該温水噴射リングがパイプからなる最大直
径150〜2000mmのリング状体で、パイプ壁に平
均直径1〜8mmの透孔を複数個有する残留ビニルモノ
マー含有量の低い樹脂粉体の製造装置。21. The apparatus according to claim 15, wherein the hot water injection ring is a ring-shaped body made of a pipe and having a maximum diameter of 150 to 2000 mm, and is flat on a pipe wall.
An apparatus for producing a resin powder having a low residual vinyl monomer content and having a plurality of through holes having an average diameter of 1 to 8 mm.
置において、該温水噴射リングがパイプからなる最大直
径150〜2000mmの平面形状において略リング状
体で、パイプ壁に最大幅1〜8mmのスリットを複数個
有する残留ビニルモノマー含有量の低い樹脂粉体の製造
装置。22. The apparatus according to claim 15, wherein the hot water injection ring is a substantially ring-shaped member having a maximum diameter of 150 to 2000 mm formed of a pipe and a maximum width of 1 to 8 mm in a pipe wall. For producing a resin powder having a low residual vinyl monomer content and having a plurality of slits.
置において、該温水噴射リングの噴射ノズル軸と鉛直方
向との交差角度(γ)が10〜60度である残留ビニル
モノマー含有量の低い樹脂粉体の製造装置。23. The apparatus according to claim 15, wherein the intersection angle (γ) between the injection nozzle axis of the hot water injection ring and the vertical direction is 10 to 60 degrees. Production equipment for low resin powder.
Priority Applications (1)
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JP4280633A JP3029075B2 (en) | 1992-09-25 | 1992-09-25 | Method and apparatus for producing resin powder with low residual vinyl monomer content by steam treatment of vinyl chloride resin slurry |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4280633A JP3029075B2 (en) | 1992-09-25 | 1992-09-25 | Method and apparatus for producing resin powder with low residual vinyl monomer content by steam treatment of vinyl chloride resin slurry |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06107723A JPH06107723A (en) | 1994-04-19 |
JP3029075B2 true JP3029075B2 (en) | 2000-04-04 |
Family
ID=17627777
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4280633A Expired - Fee Related JP3029075B2 (en) | 1992-09-25 | 1992-09-25 | Method and apparatus for producing resin powder with low residual vinyl monomer content by steam treatment of vinyl chloride resin slurry |
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Country | Link |
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JP (1) | JP3029075B2 (en) |
Cited By (1)
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US12129318B2 (en) | 2020-09-25 | 2024-10-29 | Lg Chem, Ltd. | Method for preparing vinyl chloride-based polymer |
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JP3709568B2 (en) | 1994-02-07 | 2005-10-26 | チッソ株式会社 | Residual monomer removal treatment method and residual monomer removal treatment tower used therefor |
JP3724012B2 (en) * | 1995-08-04 | 2005-12-07 | チッソ株式会社 | Residual monomer removal apparatus and residual monomer removal method using the same |
JP3978797B2 (en) | 1996-12-26 | 2007-09-19 | チッソ株式会社 | Residual monomer removal method and apparatus |
CN1137149C (en) * | 1999-04-22 | 2004-02-04 | 智索股份有限公司 | Device and method for removing unreacted monomer from polymer latex |
TW202012461A (en) | 2018-06-07 | 2020-04-01 | 日商捷恩智股份有限公司 | Device for residual-monomer removal |
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Cited By (1)
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US12129318B2 (en) | 2020-09-25 | 2024-10-29 | Lg Chem, Ltd. | Method for preparing vinyl chloride-based polymer |
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