JP3018034B2 - Ultraviolet sterilization and purification method and device - Google Patents
Ultraviolet sterilization and purification method and deviceInfo
- Publication number
- JP3018034B2 JP3018034B2 JP10147805A JP14780598A JP3018034B2 JP 3018034 B2 JP3018034 B2 JP 3018034B2 JP 10147805 A JP10147805 A JP 10147805A JP 14780598 A JP14780598 A JP 14780598A JP 3018034 B2 JP3018034 B2 JP 3018034B2
- Authority
- JP
- Japan
- Prior art keywords
- treated
- base material
- water
- ultraviolet
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000001954 sterilising effect Effects 0.000 title claims description 35
- 238000000034 method Methods 0.000 title claims description 10
- 238000004659 sterilization and disinfection Methods 0.000 title description 28
- 238000000746 purification Methods 0.000 title description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 64
- 239000000463 material Substances 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 21
- 239000000919 ceramic Substances 0.000 claims description 19
- 239000003054 catalyst Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 14
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 13
- 239000004917 carbon fiber Substances 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 239000002131 composite material Substances 0.000 claims description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910021536 Zeolite Inorganic materials 0.000 claims description 6
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000010457 zeolite Substances 0.000 claims description 6
- 229910052586 apatite Inorganic materials 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 5
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 claims description 5
- 238000001179 sorption measurement Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 229910001220 stainless steel Inorganic materials 0.000 description 9
- 239000010935 stainless steel Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 239000004744 fabric Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 241000894006 Bacteria Species 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 210000004907 gland Anatomy 0.000 description 3
- 239000004745 nonwoven fabric Substances 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 235000003276 Apios tuberosa Nutrition 0.000 description 2
- 235000010777 Arachis hypogaea Nutrition 0.000 description 2
- 235000010744 Arachis villosulicarpa Nutrition 0.000 description 2
- 241000589248 Legionella Species 0.000 description 2
- 244000133018 Panax trifolius Species 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 230000001580 bacterial effect Effects 0.000 description 2
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 2
- 229910052588 hydroxylapatite Inorganic materials 0.000 description 2
- XYJRXVWERLGGKC-UHFFFAOYSA-D pentacalcium;hydroxide;triphosphate Chemical compound [OH-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XYJRXVWERLGGKC-UHFFFAOYSA-D 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Landscapes
- Physical Water Treatments (AREA)
- Water Treatment By Sorption (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Catalysts (AREA)
- Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
Description
【０００１】[0001]
【産業上の利用分野】この発明は、例えば浴槽水、プー
ル水等の用廃水或は室内空気等の完全殺菌浄化を目的と
した紫外線浄化方法とその装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for purifying ultraviolet light for completely sterilizing and purifying waste water such as bathtub water and pool water or indoor air.
【０００２】[0002]
【従来の技術】プール水等の殺菌には従来塩素等薬品処
理が行われてきたが、薬品による殺菌処理は人体への影
響から手控えられる傾向にある。2. Description of the Related Art For the sterilization of pool water and the like, chemical treatment such as chlorine has conventionally been performed, but sterilization treatment with a chemical tends to be withheld due to its effect on the human body.
【０００３】これに対して、紫外線を利用した被処理水
の殺菌は、薬品殺菌法と異なり、人体への影響が殆どな
く効果的に殺菌処理ができる等の特性があり、需要は増
大されつつある。[0003] On the other hand, sterilization of water to be treated using ultraviolet rays is different from the chemical sterilization method in that it has characteristics such that it can be effectively sterilized with little effect on the human body. is there.
【０００４】この紫外線を利用した殺菌法として最も効
率が良いとされるのは、外周を保護管で被覆した紫外線
ランプ両端を開放した処理タンク内に挿入するととも
に、処理タンクの両端に被処理水の給水管乃至排水管に
接続するようにした紫外線殺菌装置を使用して、被処理
水を紫外線ランプの周囲を通過させる間に殺菌を行う方
法である。The most effective sterilization method using ultraviolet light is that the ultraviolet light lamp whose outer periphery is covered with a protective tube is inserted into a treatment tank having both ends opened, and the water to be treated is placed at both ends of the treatment tank. This method uses an ultraviolet sterilizer connected to a water supply pipe or a drain pipe to sterilize the water to be treated while passing around the ultraviolet lamp.
【０００５】しかし、この紫外線殺菌装置により殺菌さ
れるのは細菌、ビールス、カビ類等に限られており、し
かもこれらの微生物についても被処理水中に含有される
無機物、砂塵等に隠れて紫外線の照射を免れるなどアク
シデントが発生するため、完全な殺菌処理は困難であ
る。[0005] However, sterilization by this ultraviolet sterilizer is limited to bacteria, viruses, molds, and the like, and these microorganisms are also hidden by inorganic substances, dust and the like contained in the water to be treated, and the ultraviolet rays are sterilized. Complete sterilization is difficult because of accidents such as escape from irradiation.
【０００６】また、この紫外線殺菌装置では被処理水中
に含まれる有機物を分解することは不可能であり、した
がって被処理水中のBOD,CODの処理或は透明度の改善等
については効果がなく、このためその用途が限定されて
いる。Further, this ultraviolet sterilizer cannot decompose organic substances contained in the water to be treated, and therefore has no effect on the treatment of BOD and COD in the water to be treated or the improvement of the transparency. Therefore, its use is limited.
【０００７】一方、樹脂、金属、不織布等の基材表面
に、TiO2,CdS,CdSe,WO3,Fe2O3,SrTiO3,KNb3等の光半導
体触媒或はこれに銀等の金属を組み合わせた電気化学セ
ルを形成したものと、アバタイト、ゼオライト、活性炭
等の吸着機能を有するセラミックとからなる複合セラミ
ックを溶射してなる殺菌シートが開示されているが（特
許第2585946号）、本願発明者は先にこのシートに200~350m
mの波長領域の紫外線を照射させることによる被処理液
体或は気体の殺菌浄化法を提案した（特願平9−251447
号）。On the other hand, a photo-semiconductor catalyst such as TiO 2 , CdS, CdSe, WO 3 , Fe 2 O 3 , SrTiO 3 , KNb 3 or a metal such as silver A disinfection sheet formed by spraying a composite ceramic comprising an electrochemical cell formed by combining the above and a ceramic having an adsorption function such as abatite, zeolite and activated carbon is disclosed (Japanese Patent No. 2585946). The inventor first put 200-350m on this sheet
A method of sterilizing and purifying a liquid or gas to be treated by irradiating ultraviolet rays in a wavelength region of m is proposed (Japanese Patent Application No. 9-251447).
issue).
【０００８】[0008]
【発明が解決しようとする課題】このシートの基材とし
ては金属、ステンレス等の金属製薄板、薄網板或はテフ
ロン樹脂、フッ素樹脂等の樹脂製薄板、薄網板、或は高
分子材料のクロス生地、不織布等が使用されてきた。The base material of the sheet is a thin metal plate such as metal, stainless steel, etc., a thin mesh plate or a thin resin plate such as Teflon resin or fluororesin, a thin mesh plate, or a polymer material. Cloth fabric, non-woven fabric and the like have been used.
【０００９】しかし、金属、ステンレス等の金属製薄
板、薄網板或はテフロン樹脂、フッ素樹脂等の樹脂製薄
板、薄網板を基材として使用した場合には、光半導体触
媒を含む複合セラミックスを溶射しても、その表面に吸
着し難く、また吸着されても長時間使用するうちに剥離
してしまうという欠点がある。However, when a thin metal plate such as metal or stainless steel, a thin mesh plate or a thin resin plate such as Teflon resin or fluororesin, or a thin mesh plate is used as a base material, a composite ceramic containing an optical semiconductor catalyst is used. Has the disadvantage that it is difficult to be adsorbed on its surface even when sprayed, and that even if it is adsorbed, it will be peeled off after long use.
【００１０】また、高分子材料のクロス生地、不織布等
を基材として使用した場合は、シートに紫外線を照射し
て被処理液体乃至気体を殺菌浄化処理する際に、紫外線
の照射が長時間に及ぶと基材自体がボロボロに破損され
てしまうという難点がある。[0010] When a cloth cloth or nonwoven fabric of a polymer material is used as a base material, the irradiation of the sheet with ultraviolet rays for sterilization and purification of the liquid or gas to be treated requires a long time. If it extends, there is a problem that the base material itself is damaged.
【００１１】これに対して、本願発明者はシートに使用
する基材について鋭意研究した結果、ニッケル、チタン
等の金属メッキを施した炭素繊維からなる基材が光半導
体触媒を含む複合セラミックスに対する吸着能に優れ、
しかも紫外線照射に対する耐久性のあることを見出し
た。On the other hand, the inventor of the present application has conducted intensive studies on the base material used for the sheet. As a result, the base material made of carbon fiber plated with metal such as nickel or titanium is adsorbed on the composite ceramics containing the photosemiconductor catalyst. Excellent ability,
In addition, they have found that they have durability against ultraviolet irradiation.
【００１２】この発明は、上記知見に基づいて完成した
ものであり、具体的には金属メッキを施した炭素繊維か
らなる基材に、光半導体触媒とアパタイト、ゼオライ
ト、活性炭等の吸着能を有するセラミックスとからなる
複合セラミックス粉体を溶射した後、該基材に200〜350
mmの波長領域の紫外線を照射させると共に、被処理液体
或は気体を上記基材に接触させるようにした紫外線殺菌
浄化方法を提案するものである。The present invention has been completed on the basis of the above findings, and specifically has a capability of adsorbing a photo-semiconductor catalyst and apatite, zeolite, activated carbon, and the like to a metal-plated carbon fiber base material. After spraying a composite ceramic powder consisting of ceramics, 200-350
Another object of the present invention is to provide a method of sterilizing and purifying ultraviolet light, which irradiates ultraviolet rays in a wavelength region of mm and brings a liquid or gas to be treated into contact with the base material.
【００１３】[0013]
【００１４】[0014]
【００１５】なお、 金属メッキを施した炭素繊維から
なる基材としては、例えばピッチ系炭素繊維にニッケ
ル、チタンメッキを施し、熱処理したものを使用する。 As the base material made of carbon fibers plated with metal, for example, pitch-based carbon fibers plated with nickel or titanium and heat-treated are used.
【００１６】金属メッキを施した炭素繊維からなる基材
に、光半導体触媒と吸着機能を有するセラミックスとか
らなる複合セラミックス粉体を溶射する。A composite ceramic powder comprising an optical semiconductor catalyst and a ceramic having an adsorbing function is sprayed on a base material made of carbon fiber plated with metal.
【００１７】光半導体触媒としては、TiO2,CdS,CdSe,WO
3,Fe2O3,SrTiO3,KnbO3等を挙げることができる。 TiO 2 , CdS, CdSe, WO
3 , Fe 2 O 3 , SrTiO 3 , KnbO 3 and the like.
【００１８】また、吸着機能を有するセラミックスとし
ては、ハイドロキシアパタイト等のアパタイト、ゼオラ
イト、活性炭等を挙げることができる。Examples of the ceramic having an adsorption function include apatite such as hydroxyapatite, zeolite, and activated carbon.
【００１９】このようにして光半導体触媒を含む複合セ
ラミックスを溶射した基材には200〜350mmの波長領域の
紫外線を照射させながら、プール、浴槽水等の用廃水或
は室内空気等の被処理液体或は気体を接触させて被処理
液体或は気体の殺菌浄化を行なう。The base material sprayed with the composite ceramics containing the photo-semiconductor catalyst is irradiated with ultraviolet rays having a wavelength range of 200 to 350 mm, and treated with waste water such as pools and bath water or indoor air. The liquid or gas to be treated is sterilized and purified by contacting the liquid or gas.
【００２０】この場合、この発明においてニッケル、チ
タン等の金属メッキを施した炭素繊維からなる基材を使
用するため、光半導体触媒を含む複合セラミックスの吸
着能が優れ、したがって被処理液体乃至気体の殺菌浄化
処理中に基材の表面より光半導体触媒が剥離することが
ない。In this case, since a substrate made of carbon fiber plated with metal such as nickel or titanium is used in the present invention, the ability to adsorb composite ceramics containing an photosemiconductor catalyst is excellent, so that the liquid or gas to be treated can be removed. The photo-semiconductor catalyst does not peel off from the surface of the substrate during the sterilization and purification treatment.
【００２１】また、ニッケル、チタン等の金属メッキを
施した炭素繊維を基材とするため、殺菌浄化処理中に長
時間紫外線に晒されても、基材の破損がないのである。Further, since the base material is a carbon fiber plated with a metal such as nickel or titanium, the base material is not damaged even when exposed to ultraviolet rays for a long time during the sterilization and purification treatment.
【００２２】また、この発明ではその表面に光半導体触
媒とアパタイト、ゼオライト、活性炭等の吸着能を有す
るセラミックスとからなる複合セラミックス粉体を溶射
してなる金属メッキを施した炭素繊維基材で構成される
空間に紫外線ランプを配置し、被処理液体乃至気体を上
記空間に送入し、基材表面の光半導体触媒に接触させな
がら、紫外線を照射して被処理液体乃至気体を殺菌浄化
する紫外線殺菌浄化装置を提案する。Further, the present invention comprises a carbon fiber substrate metal-plated on its surface by spraying a composite ceramic powder comprising a photo-semiconductor catalyst and a ceramic having an adsorbing ability such as apatite, zeolite, activated carbon and the like. An ultraviolet lamp is disposed in the space to be processed, and the liquid or gas to be treated is sent into the space, and the ultraviolet light is irradiated with ultraviolet light while being in contact with the photo-semiconductor catalyst on the surface of the substrate to sterilize and purify the liquid or gas to be treated. A sterilization and purification device is proposed.
【００２３】ここで、紫外線ランプの配置される空間は
平板状に加工された基材を組み合わせて形成してもよい
が、この場合は空間内に紫外線の照射されない角部がで
きる。Here, the space in which the ultraviolet lamps are arranged may be formed by combining base materials processed into a flat plate. In this case, corners which are not irradiated with ultraviolet light are formed in the space.
【００２４】これ対して、基材を円筒状に加工して形成
した空間内に紫外線ランプを配置すれば、空間内に紫外
線が万遍なく照射される。On the other hand, if an ultraviolet lamp is disposed in a space formed by processing a base material into a cylindrical shape, ultraviolet light is uniformly irradiated into the space.
【００２５】また、基材表面に山型の折り込み部を連設
すれば、基材の表面積が大きくなり、光半導体触媒と被
処理液体乃至被処理気体の接触を十分に行なうことがで
きる。Further, if a mountain-shaped folded portion is continuously provided on the surface of the base material, the surface area of the base material is increased, and the photo-semiconductor catalyst can be sufficiently contacted with the liquid to be processed or the gas to be processed.
【００２６】更に、空間を構成する基材に1又は2以上の
通水孔乃至通気孔を設け、被処理液体乃至被処理をこれ
らの孔を通して空間内に送入して紫外線による殺菌処理
を行なうようにしてもよい。Further, one or two or more water holes or air holes are provided in the base material constituting the space, and the liquid to be treated or the object to be treated is fed into the space through these holes to perform sterilization treatment by ultraviolet rays. You may do so.
【００２７】この場合、紫外線ランプが配置される基材
の反対側には攪拌装置を配置すれば、攪拌装置により被
処理液体乃至被処理気体を上記孔に通して強制的に紫外
線ランプの配置された空間内に送入することができる。In this case, if a stirrer is disposed on the opposite side of the substrate on which the ultraviolet lamp is disposed, the liquid to be processed or the gas to be processed is forcibly passed through the hole by the stirrer, and the ultraviolet lamp is forcibly disposed. Can be sent into the space.
【００２８】また、大量の液体乃至気体を処理するに
は、被処理液体乃至気体の流れ方向に沿って上記空間を
2以上列設してもよい。Further, in order to treat a large amount of liquid or gas, the above space must be formed along the flow direction of the liquid or gas to be treated.
Two or more rows may be provided.
【００２９】この場合、隣接する他の紫外線ランプと攪
拌装置の間には邪魔板を設ければ、攪拌装置に妨害され
ることなく、他の紫外線ランプによる殺菌処理を行なう
ことができる。In this case, if a baffle plate is provided between the adjacent ultraviolet lamp and the stirring device, the sterilization process using the other ultraviolet lamp can be performed without being obstructed by the stirring device.
【００３０】[0030]
【実施例】実施例 １ 以下、この発明を図示の実施例に基づいて詳細に説明す
ると、１は石英管ジャケットに内蔵された紫外線ラン
プ、２はステンレスパイプである。Embodiment 1 Hereinafter, the present invention will be described in detail with reference to the illustrated embodiment. 1 is an ultraviolet lamp incorporated in a quartz tube jacket, and 2 is a stainless steel pipe.
【００３１】３は、ニッケルメッキを施した炭素繊維に
TiO2とハイドロキシアパタイトとの複合セラミックス粉
体を溶射した基材で、この実施例では基材３が円筒状に
加工し、この円筒状基材３をステンレスパイプ２の内壁
に沿って挿入する。3 is for a carbon fiber plated with nickel.
In this embodiment, the base material 3 is formed into a cylindrical shape by spraying a composite ceramic powder of TiO 2 and hydroxyapatite, and the cylindrical base material 3 is inserted along the inner wall of the stainless steel pipe 2.
【００３２】４は給水口5を有する下部グランドナッ
ト、6は排水口7を有する上部グランドナットで、ステン
レスパイプ2をインナーパイプ8で下部グランドナット4
と上部グランドナット6間にステンレスパイプ2をインナ
ーパイプ8で下部グランドナット4と上部グランドナット
6間に水密に挟着させると共に、円筒状基材3内の空間は
に紫外線ランプ1を挿着する。Reference numeral 4 denotes a lower ground nut having a water supply port 5; 6 denotes an upper ground nut having a drain port 7;
And stainless steel pipe 2 between inner gland 6 and lower gland nut 4 with upper gland nut
At the same time, the ultraviolet lamp 1 is inserted into the space inside the cylindrical base material 3 while being watertightly sandwiched between them.
【００３３】以上の構成において、被処理水を給水口5
より送入し、ステンレスパイプ2内を通過させて排水口7
より排水し、その間に紫外線ランプ1より紫外線を照射
して被処理水の殺菌浄化を行なう。In the above configuration, the water to be treated is supplied to the water inlet 5
Through the stainless steel pipe 2 and drain 7
Water is further discharged, and during that time, ultraviolet light is irradiated from the ultraviolet lamp 1 to sterilize and purify the water to be treated.
【００３４】実施例 ２、３ 図2（実施例2）、図3（実施例3）は実施例1に対して円
筒状基材3を内側に山型の折り込み部3a，…を形成して
円筒状基材3の内面積を更に増大させるようにした例を
示すものである。Embodiments 2 and 3 FIGS. 2 (Embodiment 2) and FIG. 3 (Embodiment 3) are similar to those of Embodiment 1 except that the cylindrical base material 3 is formed inside with mountain-shaped folds 3a. 5 shows an example in which the inner area of the cylindrical substrate 3 is further increased.
【００３５】下記表1は、円筒状基材３をステンレスパ
イプ１内に挿入せずに、紫外線ランプ1のみを照射した
場合を比較例として、この比較例と実施例1及び実施例
２について、水道水中にレジオネラ菌を添加したものを
被処理水として被処理水中のレジオネラ菌に対する殺菌
効果を下記の方法で菌数測定を行なった結果を示すもの
である。Table 1 below shows a comparative example in which only the ultraviolet lamp 1 was irradiated without inserting the cylindrical base material 3 into the stainless steel pipe 1. The results obtained by measuring the bactericidal effect on Legionella bacteria in the treated water by the following method using tap water to which Legionella bacteria were added as treated water.
【００３６】試験方法 浴槽中の須藤水に、水道水に、供試菌株の培養液を１０
５CFU/mlになるように添加し、菌液添加後、水中の菌液
濃度を一定にする目的で実施例１，２及び比較例の紫外
線ランプ1を点灯しない状態でポンプを使用して被処理
水を10分間ステンレスパイプ2内を通過させた。Test Method A culture solution of the test strain was added to Sudo water in a bathtub and tap water for 10 minutes.
5 CFU / ml, and after the addition of the bacterial solution, the UV lamp 1 of each of Examples 1, 2 and Comparative Example was used with the pump turned off in order to keep the bacterial solution concentration constant in water. The treated water was passed through the stainless steel pipe 2 for 10 minutes.
【００３７】そして被処理水を無菌的に採取し、菌数測
定を行なった(0時間サンプル)。次に紫外線ランプ1を点
灯した状態にし、この時点から1時間後、2時間後、3時
間後、4時間後、5時間後と経時的に浴槽水を採取して菌
数測定を行なった。Then, the water to be treated was aseptically collected and the number of bacteria was measured (0 hour sample). Next, the ultraviolet lamp 1 was turned on, and after 1 hour, 2 hours, 3 hours, 4 hours, and 5 hours from this point, the bath water was collected over time and the number of bacteria was measured.
【００３８】[0038]
【表1】 【table 1】
【００３９】これによれば、比較例では一般細菌の殺菌
については多少の効果が見られたが、実施例１では完全
な殺菌効果が認められ、更に実施例2では殺菌効果、酸
化力を更に増大させることができた。According to this, the comparative example showed some effect on sterilization of general bacteria, but the complete sterilization effect was recognized in Example 1, and the sterilization effect and oxidizing power were further improved in Example 2. Could be increased.
【００４０】なお、この実施例では高分子材料のクロス
生地或は不織布等の基材では、紫外線に長時間晒される
と、使用に耐えないほど破損されるが、この実施例で基
材として使用するニッケルメッキを施した炭素繊維マッ
トにおいては紫外線に長時間晒されても、破損されるこ
とがなく、したがって殺菌浄化処理を継続して行なうこ
とができた。In this embodiment, a substrate such as a cloth cloth or a non-woven fabric made of a polymer material is damaged so as to be unusable when exposed to ultraviolet rays for a long time. The nickel-plated carbon fiber mat was not damaged even when exposed to ultraviolet light for a long time, and thus the sterilization and purification treatment could be continued.
【００４１】なお、容積が大きな処理水槽の内壁に沿っ
て円筒状基材を設け、その中央に紫外線ランプを配置し
た場合には紫外線が円筒状基材表面に到達する距離が遠
く、十分な殺菌効果を望めないが、このような場合には
紫外線ランプの周囲に、その壁面に通水孔乃至通気孔を
設けた円筒状基材を1又は2以上配置することにより殺菌
効果を挙げることができる。When a cylindrical substrate is provided along the inner wall of a treatment water tank having a large volume, and an ultraviolet lamp is disposed in the center of the cylindrical substrate, ultraviolet rays reach the surface of the cylindrical substrate at a long distance, and sufficient sterilization is performed. Although no effect can be expected, in such a case, a bactericidal effect can be obtained by arranging one or two or more cylindrical substrates provided with water holes or vent holes on the wall thereof around the ultraviolet lamp. .
【００４２】図4は、その実施例を示すものであり、処
理水槽９の中央に設けられた石英管ジャケットに内蔵さ
れた紫外線ランプ１の周囲にはその壁面に複数の通水孔
10が設けられた円筒状基材３が配置され、更に水槽9中
には攪拌機11が設けられている。FIG. 4 shows an embodiment of the present invention, in which a plurality of water holes are formed on the wall of an ultraviolet lamp 1 built in a quartz tube jacket provided at the center of a treatment water tank 9.
A cylindrical substrate 3 provided with 10 is disposed, and a stirrer 11 is further provided in the water tank 9.
【００４３】この実施例では紫外線ランプ1から紫外線
が円筒状基材3の表面に照射されると同時に、攪拌機11
により被処理水が通水孔10を通過する間に被処理水の殺
菌浄化が行われるのである。In this embodiment, ultraviolet rays are radiated from the ultraviolet lamp 1 to the surface of the cylindrical substrate 3 and, at the same time, the agitator 11
Thus, the sterilization and purification of the water to be treated is performed while the water to be treated passes through the water passage hole 10.
【００４４】また、以上の実施例では、基材を円筒状に
加工した円筒状基材３を使用する例に就いて述べたが、
基材は円筒状に限らず、各種形状に加工して使用するこ
とができ、基材を角柱パイプ或はU字状溝等に挿入する
場合には、その形状に合わせて加工してもよく、また処
理水槽によっては平板状に加工して平板状基材３を使用
したほうが都合のよい場合が有る。Further, in the above embodiment, an example in which the cylindrical substrate 3 obtained by processing the substrate into a cylindrical shape is used has been described.
The base material is not limited to a cylindrical shape, and can be used after being processed into various shapes.When the base material is inserted into a prismatic pipe or a U-shaped groove, the base material may be processed according to the shape. Depending on the treatment water tank, it may be more convenient to use a flat base material 3 after processing it into a flat shape.
【００４５】図５は、この例を示すものであり、被処理
水の入水口12と出水口13を有する処理水槽９内は被処理
水の流れ方向に対して所定間隔を置いて平板状基材３を
設け、これにより被処理水の流れ方向に沿って所定間隔
で紫外線ランプ１の配置される空間14ａ,14ｂ,…を形成
すると共に、空間14ａ,14ｂ,…の間には邪魔板15を介し
て攪拌機11を設ける。FIG. 5 shows this example. The inside of a treated water tank 9 having an inlet port 12 and an outlet port 13 for the water to be treated is provided with a flat base plate at a predetermined interval in the flow direction of the water to be treated. The members 3 are provided to form spaces 14a, 14b,... In which the ultraviolet lamps 1 are arranged at predetermined intervals along the flow direction of the water to be treated, and between the spaces 14a, 14b,. The stirrer 11 is provided through the.
【００４６】なお、平板状基材３の壁面には図6に示す
ように、矩形状、円形状、三角状等の通水孔10が設けら
れている。As shown in FIG. 6, a water hole 10 having a rectangular, circular, triangular shape or the like is provided on the wall surface of the flat base material 3.
【００４７】以上の構成において、入水口11より処理水
槽９内に送り込まれる被処理水は通水孔10を通って空間
14ａに送り込まれ、ここで基板３の表面に溶射された光
半導体触媒と接触しながら紫外線の照射を受けることに
より、殺菌浄化が行われる。In the above configuration, the water to be treated, which is fed into the treated water tank 9 from the water inlet 11, passes through the water passage hole 10 to form a space.
It is sent to 14a, where it is irradiated with ultraviolet rays while being in contact with the photo-semiconductor catalyst sprayed on the surface of the substrate 3, whereby sterilization and purification are performed.
【００４８】空間14ａを出た被処理水は攪拌機11により
強制的に次段の空間14ｂに送り込まれ、基板３の表面に
溶射された光半導体触媒と接触しながら紫外線の照射を
受けることにより、前記同様な殺菌浄化が行われる。The water to be treated that has exited the space 14a is forcibly sent into the next space 14b by the stirrer 11, and is irradiated with ultraviolet light while being in contact with the photo-semiconductor catalyst sprayed on the surface of the substrate 3, The same sterilization and purification as described above is performed.
【００４９】このようにして紫外線ランプ１の配置され
た空間14ａ,14ｂ,…で殺菌浄化が行われて被処理水は出
水口13より排出されるが、この実施例では前段の空間14
ａ,14ｂ,…と攪拌機11の間に邪魔板15が設けられている
ため、攪拌機11により前段の空間14ａ,14ｂ, …での被
処理水の殺菌浄化作業が妨害されることはない。In this manner, the sterilization and purification are performed in the spaces 14a, 14b,... In which the ultraviolet lamps 1 are arranged, and the water to be treated is discharged from the water outlet 13. In this embodiment, the space 14 in the former stage is used.
Since the baffle plate 15 is provided between the stirrer 11 and the a, b,..., the sterilizing and purifying operation of the water to be treated in the preceding spaces 14a, 14b,.
【００５０】なお、この実施例では所定間隔を置いて紫
外線ランプ1の配置された空間14ａ,14ｂ, …を配列し、
その間に攪拌機11を設けた例を述べたが、紫外線ランプ
1の配置された空間14ａ,14ｂ, …を隣接して設けてもよ
く、この場合攪拌機11は紫外線ランプ１の間に邪魔板15
を介して空間14ａ,14ｂ,… 内に設けられる。In this embodiment, the spaces 14a, 14b,... In which the ultraviolet lamps 1 are arranged are arranged at predetermined intervals.
The example in which the stirrer 11 is provided during this time has been described.
May be provided adjacent to each other, and in this case, the stirrer 11 is provided between the ultraviolet lamp 1 and the baffle plate 15.
Are provided in the spaces 14a, 14b,.
【００５１】また、この実施例では被処理水の流れ方向
に沿って紫外線ランプ1を配置した空間14ａ,14ｂ, …を
列設した例について述べたが、このような空間14ａ,14
ｂ，…を被処理水の流れ方向に沿って複数列設けてもよ
い。In this embodiment, an example is described in which the spaces 14a, 14b,... In which the ultraviolet lamps 1 are arranged are arranged along the flow direction of the water to be treated.
may be provided in a plurality of rows along the flow direction of the water to be treated.
【００５２】図7は、この実施例を示すものであり、処
理水槽９内には図8に示すように通水孔を有する縦方向
と横方向に組み合わせて処理水槽9内に挿入して処理水
槽9内に被処理水の流れ方向に沿って列設された空間14
ａ,14ｂ, …を複数列形成すると共に、各空間14ａ,14
ｂ, …にはその間に邪魔板15を設けて紫外線ランプ1と
攪拌機11を配置する。FIG. 7 shows this embodiment. As shown in FIG. 8, the treatment water tank 9 is inserted into the treatment water tank 9 in a combination of a vertical direction and a horizontal direction with water passage holes. Spaces 14 arranged in the water tank 9 along the flow direction of the water to be treated
a, 14b,... are formed in a plurality of rows, and each space 14a, 14b
In b,..., a baffle plate 15 is provided therebetween and the ultraviolet lamp 1 and the stirrer 11 are arranged.
【００５３】以上の構成において、入水口12より処理水
槽9内に送り込まれた被処理水は各列の空間14ａ,14ｂ,
…を通過して前記同様な紫外線による殺菌浄化が行われ
るが、その一部は縦方向に配列された平板状基板3に設
けられた通水孔を通して隣り合う列の空間14ａ,14ｂ,
…に流れ込み、ここでも殺菌浄化が行われるため、大量
の被処理水の殺菌浄化を行なうことができる。In the above configuration, the water to be treated sent into the treated water tank 9 from the water inlet 12 is filled with the spaces 14a, 14b,
, And sterilization and purification by the same ultraviolet rays as described above is performed, and a part of the sterilization and purification is performed through the water holes provided in the plate-shaped substrates 3 arranged in the vertical direction, and the spaces 14a, 14b,
, And sterilization and purification are performed here, so that a large amount of water to be treated can be sterilized and purified.
【００５４】以上要するに、この発明によれば金属メッ
キを施した炭素繊維に光半導体触媒を含む複合セラミッ
クスを溶射してなる基材を使用するため、基材を使用す
るため、基材が破損されることなく、紫外線による長時
間の殺菌浄化処理が可能となる。In short, according to the present invention, since a base material obtained by spraying a composite ceramic containing an optical semiconductor catalyst on carbon fibers plated with metal is used, the base material is used. For a long time, it is possible to perform a long-time sterilization and purification treatment using ultraviolet rays.
【００５５】また、この発明では 被処理水乃至被処理
気体の殺菌浄化以外に、これらに含まれるダイオキシン
等の有機物の分解処理にも効果がある。The present invention is effective not only for sterilizing and purifying water to be treated or gas to be treated, but also for decomposing organic substances such as dioxin contained therein.
【図1】 この発明の一実施例を示す分解斜視図FIG. 1 is an exploded perspective view showing one embodiment of the present invention.
【図2】 この発明の他の実施例を示す斜視図FIG. 2 is a perspective view showing another embodiment of the present invention.
【図3】 この発明の更に他の実施例を示す斜視図FIG. 3 is a perspective view showing still another embodiment of the present invention.
【図4】 この発明の更に他の実施例を示す側面図FIG. 4 is a side view showing still another embodiment of the present invention.
【図5】 同上の実施例における要部の斜視図FIG. 5 is a perspective view of a main part in the embodiment.
【図6】 この発明の更に他の実施例を示す側面図FIG. 6 is a side view showing still another embodiment of the present invention.
【図7】 同上の実施例における要部の斜視図FIG. 7 is a perspective view of a main part in the embodiment.
【図8】 この発明の更に他の実施例を示す斜視図FIG. 8 is a perspective view showing still another embodiment of the present invention.
【図9】 同上の実施例における要部の斜視図FIG. 9 is a perspective view of a main part in the above embodiment.
１は石英管ジャケットに内蔵された紫外線ランプ ２はステンレスパイプ ３は基材 3a，…は山型の折り込み部 ４は下部グランドナット ５は給水口 ６は上部グランドナット ７は排水口 8はインナーパイプ ９は処理水槽 10は通水孔 11は攪拌機 12は被処理水の入水口 13は被処理水の出水口 14ａ,14ｂ,…は紫外線ランプが配置される空間 15は邪魔板 1 is an ultraviolet lamp incorporated in a quartz tube jacket 2 is a stainless steel pipe 3 is a base material 3a,... 9 is a treated water tank 10 is a water supply hole 11 is a stirrer 12 is a treated water inlet 13 is a treated water outlet 14a, 14b,...
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ Ｃ０２Ｆ 1/28 Ｃ０２Ｆ 1/28 Ｆ 1/72 １０１ 1/72 １０１ (58)調査した分野(Int.Cl.7，ＤＢ名) C02F 1/32 C02F 1/72 A61L 9/00 B01J 35/02 B01D 53/36 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 identification symbol FI C02F 1/28 C02F 1/28 F 1/72 101 1/72 101 (58) Investigated field (Int.Cl. 7 , DB name) ) C02F 1/32 C02F 1/72 A61L 9/00 B01J 35/02 B01D 53/36
Claims (6)
した炭素繊維からなる基材に、光半導体触媒とアパタイ
ト、ゼオライト、活性炭等の吸着機能を有するセラミッ
クスとからなる複合セラミックス粉体を溶射した後、該
基材に200〜350mmの波長領域の紫外線を照射させると共
に、被処理液体或は気体を上記基材に接触させるように
したことを特徴とする紫外線殺菌浄化方法。1. Heat treatment by plating with nickel and titanium
After spraying a composite ceramic powder composed of an optical semiconductor catalyst and a ceramic having an adsorbing function such as apatite, zeolite, and activated carbon on a substrate made of carbon fiber , the substrate is exposed to ultraviolet rays in a wavelength region of 200 to 350 mm. A method for sterilizing and purifying ultraviolet light, comprising irradiating and subjecting a liquid or gas to be treated to the base material.
ゼオライト、活性炭等の吸着性能を有するセラミックス
とからなる複合セラミックス粉体を溶射してなるニッケ
ル、チタンメッキを施して熱処理した炭素繊維からなる
基材で構成される空間に紫外線ランプを配置し、被処理
液体乃至気体を上記空間に送入し、基材表面の光半導体
触媒に接触させながら、紫外線を照射して被処理液体乃
至気体を殺菌浄化することを特徴とする紫外線殺菌浄化
装置。2. An optical semiconductor catalyst and apatite on its surface.
Nickel sprayed on composite ceramic powder consisting of ceramics with adsorption performance such as zeolite and activated carbon
Made of carbon fiber heat treated with titanium plating
An ultraviolet lamp is arranged in a space constituted by the base material , and the liquid or gas to be treated is fed into the space, and the liquid or gas to be treated is irradiated with ultraviolet rays while being in contact with the photosemiconductor catalyst on the surface of the base material. An ultraviolet sterilizing and purifying device characterized by sterilizing and purifying.
空間に紫外線ランプを配置した請求項2記載の装置。3. The apparatus according to claim 2, wherein an ultraviolet lamp is arranged in a space formed by the cylindrical base or the flat base.
求項2又は３に記載の装置。4. A contractor in which mountain-shaped folds are continuously provided on the surface of a base material.
An apparatus according to claim 2 or 3 .
けた請求項2乃至４のいずれかに記載の装置。5. The apparatus according to any one of claims 2 to 4 provided with one or more water passage holes to vent the substrate.
外線ランプを配置した1又は2以上の空間を列設した請求
項2乃至５のいずれかに記載の装置。6. claims one or more spaces arranged an ultraviolet lamp in the flow direction of the liquid to be treated through gas was arrayed
Item 6. The apparatus according to any one of Items 2 to 5 .
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|---|---|---|---|
| JP10147805A JP3018034B2 (en) | 1998-05-28 | 1998-05-28 | Ultraviolet sterilization and purification method and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10147805A JP3018034B2 (en) | 1998-05-28 | 1998-05-28 | Ultraviolet sterilization and purification method and device |
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| JPH11333451A JPH11333451A (en) | 1999-12-07 |
| JP3018034B2 true JP3018034B2 (en) | 2000-03-13 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001292902A (en) * | 2000-04-14 | 2001-10-23 | Takuro Ishibashi | Water purifying vacuum bottle using titanium dioxide photocatalyst |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3389187B2 (en) * | 1998-12-31 | 2003-03-24 | エルジー電子株式会社 | Film type photocatalyst |
| JP2002085534A (en) * | 2000-09-18 | 2002-03-26 | Anzai Kantetsu:Kk | Deodorizing and cleaning element and deodorizing and cleaning unit using the same as well as deodorizing and cleaning system using the same |
| KR20010082470A (en) * | 2001-07-24 | 2001-08-30 | 권일우 | Water treatment equipment uslng photochemical reator |
| KR20010082473A (en) * | 2001-07-25 | 2001-08-30 | 황재용 | Photochemical oxidation disinfector |
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| KR100491764B1 (en) * | 2002-04-11 | 2005-05-27 | (주)신광종합기술단 | water-purification equipment using photo-catalyst for installing at inside of water tank |
| KR100671311B1 (en) | 2004-02-03 | 2007-01-19 | 심종섭 | Photocatalyst Sterilizer |
| JP5390630B2 (en) * | 2009-10-20 | 2014-01-15 | 株式会社フジコー | Filter and air purifier |
| DE102011050758A1 (en) * | 2011-05-31 | 2012-12-06 | Fritz Nauer Ag | Optofluidics reactor |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06102192B2 (en) * | 1990-10-03 | 1994-12-14 | 光二 山形 | Photochemical wastewater treatment method |
| JP2585946B2 (en) * | 1993-03-02 | 1997-02-26 | 株式会社信州セラミックス | Sterilization adsorption function body using optical semiconductor |
| JP3312954B2 (en) * | 1993-03-31 | 2002-08-12 | 鈴木総業株式会社 | Water purification treatment equipment |
| JP3215318B2 (en) * | 1995-02-15 | 2001-10-02 | 武田薬品工業株式会社 | Deodorant fiber and method for producing the same |
| JPH08266902A (en) * | 1995-03-29 | 1996-10-15 | Mitsubishi Paper Mills Ltd | Environment purifying material using photocatalyst and its composition |
| JPH0947598A (en) * | 1995-05-31 | 1997-02-18 | Sharp Corp | Washing machine |
| JPH09122640A (en) * | 1995-10-27 | 1997-05-13 | Sumitomo Heavy Ind Ltd | Waste water treatment method |
| JP3283749B2 (en) * | 1996-02-20 | 2002-05-20 | シャープ株式会社 | Refrigerator ice making equipment |
-
1998
- 1998-05-28 JP JP10147805A patent/JP3018034B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001292902A (en) * | 2000-04-14 | 2001-10-23 | Takuro Ishibashi | Water purifying vacuum bottle using titanium dioxide photocatalyst |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11333451A (en) | 1999-12-07 |
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