JP3017979B1 - High frequency cleaning equipment - Google Patents

Abstract

An object of the present invention is to provide a high-frequency cleaning apparatus which can perform both pure water cleaning and chemical cleaning and can quickly switch between the two. SOLUTION: A main body having a tapered nozzle portion having an opening of a cleaning liquid discharge port, pure water supply means for supplying pure water to the main body, and built in the main body, are provided from the supply means into the main body. The apparatus is characterized by comprising a high-frequency applying means for applying high-frequency sound waves to the supplied pure water, and a chemical liquid supplying means for supplying a chemical liquid provided near the discharge port of the nozzle portion.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a liquid crystal glass substrate,
The present invention relates to an apparatus for high-frequency cleaning a substrate to be cleaned such as a semiconductor wafer or a magnetic disk.

[0002]

2. Description of the Related Art Conventionally, liquid crystal glass substrates, semiconductor wafers,
To clean an object to be processed such as a magnetic disk, a plurality of the substrates to be cleaned are vertically arranged in a processing tank, and a cleaning liquid is stored in the processing tank. It has been practiced to vibrate and emit high-frequency sound waves to the cleaning liquid to wash a plurality of substrates to be cleaned in the processing bath at a time.

However, in the above-described method, it is difficult to uniformly clean the entirety of the objects to be processed with an increase in the area of the liquid crystal glass substrate and an increase in the diameter of the semiconductor wafer.

For this reason, a substrate to be cleaned (for example, a semiconductor wafer) is transported in a single-wafer manner, and a rinse shower, a chemical solution scrub, a pure water scrub, a cleaning by a high-frequency cleaning device, a pure water shower, a spinner, etc. Drying and cleaning are performed.

In the meantime, pure water cleaning and chemical liquid cleaning using a high-frequency cleaning device are performed by separate dedicated machines. However, installing a high-frequency cleaning device for the type of cleaning liquid to be used increases the installation space, and has been a major problem in constructing a semiconductor device manufacturing system.

For this reason, as shown in FIG. 4, there has been proposed a high-frequency cleaning apparatus which performs both pure water cleaning and chemical liquid cleaning.

In FIG. 4, a main body 1 has a cylindrical portion 2, a tapered nozzle portion 4 integrally connected to the lower surface of the cylindrical portion 2 and having a discharge port 3 at a lower end, and a vertical partitioning of the cylindrical portion 2. And a vibrating plate 5 to be provided.

The vibrator 6 is arranged on the vibrating plate 5. The high-frequency supply cable 7 is connected to the cylindrical portion 2 of the main body 1.
It is fixed to the upper part by a cable fitting member 8, and its tip (not shown) is connected to the vibrator 6.

The cleaning liquid supply pipe 9 is connected to a lower side wall of the cylindrical portion 2 defined by the diaphragm 5. The other end of the pipe 9 is connected to a pure water supply source 10.
The first solenoid valve 11 is interposed in the cleaning liquid supply pipe 9. A chemical supply pipe 12 is connected to the pipe 9 located between the solenoid valve 11 and the main body 2. The other end of the chemical supply pipe 12 is connected to a chemical storage tank 13 containing a chemical diluted to a desired concentration.
The second solenoid valve 14 and the pump 15 are connected to the chemical supply pipe 1.
2 are interposed sequentially from the connection side of the cleaning liquid supply pipe 9.

The handler 16 is connected to the upper side wall of the cylindrical portion 2 partitioned by the diaphragm 5.

A description will now be given of (1) pure water cleaning and (2) chemical cleaning by the high frequency cleaning apparatus having the structure shown in FIG.

(1) Cleaning with Pure Water After the second solenoid valve 14 is closed and the first solenoid valve 11 is opened, pure water from the pure water supply source 10 is divided by the diaphragm 5 of the main body 1 through the cleaning liquid supply pipe 9. The liquid is supplied into the lower cylindrical portion 2 and the tapered nozzle portion 4. At the same time, when high-frequency power is applied to the vibrator 6 through a high-frequency cable 7 from a high-frequency oscillator (not shown), the vibrator 6 vibrates at a desired frequency, and the vibrating plate 5 to which the vibrator 6 is attached also vibrates. Vibration is applied to the pure water supplied into the cylindrical portion 2 and the inside of the tapered nozzle portion 4. For this reason, pure water riding on high-frequency sound waves is sprayed from the discharge port 3 of the nozzle unit 4 onto the surface of the cleaning object (not shown).

(2) Cleaning of Chemical Solution After closing the first electromagnetic valve 11 and opening the second electromagnetic valve 14, the pump 15 is operated to bake the chemical solution in the storage tank 13 through the chemical solution supply pipe 12 and the cleaning liquid supply pipe 9. The liquid is supplied into the lower cylindrical portion 2 and the tapered nozzle portion 4 defined by the diaphragm 5 of the main body 1. At the same time, when high-frequency power is applied to the vibrator 6 through a high-frequency cable 7 from a high-frequency oscillator (not shown), the vibrator 6 vibrates at a desired frequency, and the vibrating plate 5 to which the vibrator 6 is attached also vibrates. Vibration is applied to the chemical solution supplied into the cylindrical portion 2 and the inside of the tapered nozzle portion 4. For this reason, a chemical solution riding on high-frequency sound waves is ejected from the discharge port 3 of the nozzle unit 4 onto the surface of the cleaning object (not shown).

According to the high-frequency cleaning device having the structure shown in FIG. 4, it is possible to use a single high-frequency cleaning device for both pure water cleaning and chemical cleaning.

However, in the high-frequency cleaning apparatus having the structure shown in FIG. 4, when the cleaning is switched from the chemical cleaning to the pure water cleaning, the connection between the chemical liquid supply pipe 12 and the pure water supply pipe 9 on the main body 1 side and the cleaning of the main body 1 are performed. Since the chemical solution remains in the cylindrical portion 2 and the nozzle portion 4, it is necessary to completely replace the chemical solution remaining in each member with pure water in order to perform pure water cleaning. As a result, a long switching time is required, and it is difficult to perform efficient cleaning.

[0016]

SUMMARY OF THE INVENTION An object of the present invention is to provide a high-frequency cleaning apparatus which can perform both pure water cleaning and chemical cleaning and can quickly switch between the two.

[0017]

According to the present invention, there is provided a high frequency cleaning apparatus comprising: a main body having a tapered nozzle portion having an opening of a cleaning liquid discharge port; pure water supply means for supplying pure water to the main body; A high-frequency applying means for applying high-frequency sound waves to the pure water supplied from the supply means into the main body, and a chemical liquid for supplying a chemical liquid provided in the vicinity of the discharge port of the nozzle portion; Supply means , wherein the chemical liquid supply means supplies the chemical liquid when the supply of the chemical liquid is stopped.
Spillage for suction in the opposite direction
C) It has a prevention mechanism.

[0018]

[0019]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a high frequency cleaning apparatus according to the present invention will be described in detail with reference to FIGS.

FIG. 1 is a partially cutaway front view showing a cylindrical high-frequency cleaning device, and FIG. 2 is a cross-sectional view showing a suck-back valve which is a spill-over prevention mechanism provided in the chemical liquid supply pipe of FIG.

The main body 21 shown in FIG. 1 is integrally connected to a cylindrical portion 22 and a lower surface of the cylindrical portion 22.
And a diaphragm 25 that partitions the cylindrical portion 22 up and down.

The pure water supply pipe 26 is connected to the lower side wall of the cylindrical portion 22 defined by the diaphragm 25. The other end of the pure water supply pipe 26 is connected to a pure water supply source (not shown). The vibrator 27 is disposed on the diaphragm 25. The high-frequency supply cable 28 is provided with a cable fitting member 29 above the cylindrical portion 22 of the main body 21.
And its tip is connected to the vibrator 27.

For example, two chemical supply pipes 30 ₁ and 30 ₂
The supply ports are provided in the vicinity of the discharge port 23 so as to communicate symmetrically with each other at the nozzle portion 24. The solenoid valves 31 ₁ and 31 ₂ are connected to the chemical supply pipes 30 ₁ and 30 3 respectively.
They are respectively interposed in the middle of the 0 _2. Suck back valve 32 is spilled drop prevention mechanism _1, 32 ₂ are respectively provided on the solenoid valves 31 _1, 31 ₂ and the chemical supply pipe 30 _1, 30 ₂ portion located between the nozzle portion 24 . In supplying the chemicals from the _two chemical supply pipes 30 ₁ and 30 ₂ , the same chemical or a different chemical may be supplied.

The suck back valves 32 ₁ and 32 ₂ are:
As shown in FIGS. 2A and 2B, a housing 33 for storing a chemical, an upper portion of the housing 33, and the chemical supply pipe 30 ₁ (3
0 ₂ ), and a branch pipe 34 for communicating with the housing 33.
Diaphragm 35 arranged so as to partition the upper and lower sides
An operating shaft 37 having a locking plate 36 at a lower end, which is hermetically inserted from the lower surface of the housing 33 into the lower surface of the housing 33 and has a leading end connected to the lower surface of the diaphragm 35; A coil spring 38 disposed at a portion of the operation shaft 37 located between the plates 36 to urge the operation shaft 37 downward; and a lower space of the housing 33 partitioned by the diaphragm 35. It has a structure provided with a gas flow pipe 39 connected to the housing 33 so as to communicate with each other. The gas (for example, air) is supplied to the gas flow pipe 39.
Timing to supply and exhaust to the housing 33 via is made in synchronism with the solenoid valve 31 _1, 31 _2. That is, when the solenoid valves 31 ₁ and 31 ₂ are opened, gas (for example, air) is supplied to the housing 33 through the gas flow pipe 39, and when the solenoid valves 31 ₁ and 31 ₂ are closed, the housing 33 is closed.
The gas inside is exhausted through the gas flow pipe 39.

A handler 40 for moving the main body 21 is connected to the upper side wall of the cylindrical portion 22 defined by the diaphragm 25.

A description will be given of (1) pure water cleaning and (2) chemical cleaning with the high-frequency cleaning apparatus having such a configuration.

(1) Pure Water Cleaning A lower cylindrical portion 2 divided by a diaphragm 25 of the main body 21 through a pure water supply pipe 26 and pure water from a pure water supply source (not shown).
2 and into the tapered nozzle portion 24. at the same time,
When high-frequency power is applied to the vibrator 27 through a high-frequency cable 28 from a high-frequency oscillator (not shown), the vibrator 2
7 vibrates at a desired frequency and the vibrating plate 25 to which the vibrator 27 is attached vibrates, so that vibration is applied to the pure water supplied to the inside of the cylindrical portion 22 and the tapered nozzle portion 24. . For this reason, pure water can be jetted from the discharge port 23 of the nozzle portion 24 onto the surface of the object to be cleaned (not shown) on the high-frequency sound wave.

(2) Chemical Cleaning The lower cylindrical part 2 divided by the diaphragm 25 of the main body 21 through a pure water supply pipe 26 and pure water from a pure water supply source (not shown).
2 and the inside of the tapered nozzle portion 24, and open the solenoid valves 31 ₁ and _{3 12} to open the two chemical liquid supply tubes 30 ₁ and 3
0 is supplied from the ₂ for example the same type of liquid medicine to the discharge port 23 near the nozzle portion 24. At this time, the solenoid valve 31 _1, 31 ₂ of the opening operation in synchronization with a gas (e.g., air) is supplied to the housing 33 through the suck back valve 32 _1, 32 ₂ of the gas flow pipe 39. By supplying such air into the housing 33, the diaphragm 35 is bent upward against the downward urging force of the coil spring 38 disposed on the operating shaft 37 as shown in FIG. Is done.

When high-frequency power is applied from a high-frequency oscillator (not shown) to the vibrator 27 through a high-frequency cable 28 after the supply of the pure water and the chemical solution, the vibrator 27 vibrates at a desired frequency, and the vibrator to which the vibrator 27 is attached is mounted. Board 25
Therefore, the pure water supplied into the cylindrical portion 22 and the tapered nozzle portion 24 is also vibrated. For this reason, pure water is jetted onto the object to be cleaned together with the chemical supplied from the chemical liquid supply pipes 30 ₁ and 30 ₂ to the nozzle 24 near the discharge port 23 via the high frequency sound wave from the discharge port 23 of the nozzle 24. it can. In addition, the chemical solution is supplied to the discharge unit 2
3 is supplied to the nozzle portion 24 in the vicinity, that is, the chemical solution is supplied immediately before the injection of the pure water, but since the pure water is injected on the high-frequency sound wave, the chemical solution is uniformly injected into the pure water in this injection process. Can be diluted and mixed. Therefore, the object to be cleaned can be uniformly cleaned by the jet flow of the chemical solution uniformly diluted with pure water.

When switching from chemical cleaning to pure water cleaning, the nozzles 24 near the discharge port 23 are closed by closing the solenoid valves 31 ₁ and 31 ₂ interposed in the chemical supply pipes 30 ₁ and 30 _2.
Stop supplying the chemical solution to the inside. At this time, the solenoid valve 3
The gas in the housing 33 is exhausted through the gas flow pipes 39 of the suck back valves 32 ₁ and 32 ₂ in synchronization with the closing operations of ₁₁ and 31 ₂ . By exhausting the air in the housing 33, the distal end of the operating shaft 37 is caused by a downward urging force of a coil spring 38 disposed on the operating shaft 37 as shown in FIG. The connected diaphragm 35 curves downward, and the volume of the upper space of the housing 33 partitioned by the diaphragm 35 increases. As a result, the through the solenoid valve 31 _1, 31 ₂ from the nozzle portion 24 side the chemical supply pipe 30 _1, 30 ₂ chemical liquid remaining in part the branch pipe 34 as shown in (B) of FIG. 2 casing 33 to flowing within, prevents the chemical is spilling into the nozzle portion 24 from the chemical supply pipe 30 _1, 30 ₂ of the supply port in the pure water cleaning process after stopping supply of the chemical liquid.

In addition, as shown in FIG.
Supply pipe 30₁, 30_TwoA branch pipe 34 is used to remove the chemical solution remaining in the portion.
When flowing into the housing 33 through the
30 ₁, 30_TwoOf the nozzle portion 24 communicating with the supply port of
Since pure water is also sucked in, the nozzle gradually spreads due to the diffusion of chemicals.
Seeps out to the side of the screw 24. However, the capacity of the housing 33,
In other words, by increasing the amount of suck-back,
For a certain period of time, the effect of the diffusion of the drug solution can be avoided.
You.

Therefore, according to the high frequency cleaning apparatus of the present invention, the nozzle portion 24 near the discharge port 23 in the main body 21 is provided.
The inside of the cylindrical portion 22 and the tapered nozzle portion 25 of the main body can be prevented from being contaminated with the chemical solution during the cleaning of the chemical solution by connecting the chemical solution supply pipes 30 ₁ and 30 ₂ to the nozzles. As a result, when switching from chemical solution cleaning to pure water cleaning, a long-time switching operation of replacing all the chemical solution remaining in the cylindrical portion of the main body and the tapered nozzle portion with pure water as in the related art is performed in a short time. The switching operation can be performed.

The suck back valve 32₁, 32_TwoTo
Chemical supply pipe 30₁, 30_TwoMedicine by providing in the part
In the pure water washing process after the supply of the liquid is stopped,
30 ₁, 30_TwoChemical spills into the nozzle part 24 from the supply port of
Cleaning with pure water without chemical solution contamination can be prevented.
Can do it.

Next, another high frequency cleaning apparatus according to the present invention will be described with reference to FIG. In FIG. 3, the same members as those in FIG. 1 described above are denoted by the same reference numerals, and description thereof will be omitted.

In the high frequency cleaning apparatus shown in FIG. 3, for example, two chemical supply pipes 41 ₁ and 41 ₂ are attached along the side surface of the tapered nozzle portion 24 near the discharge port 23 so that the supply ports face downward. Have been.

According to such a configuration, the chemical solution supply pipe 4 extends along the nozzle portion 24 near the discharge port 23 in the main body 21.
By mounting the 1 _1, 41 _2, because the drug solution at the time of chemical cleaning is not flow directly into the cylindrical portion 22 and a tapered nozzle portion 25 of the body 21, it is possible to prevent the inner these members are contaminated with chemical. As a result, when switching from chemical solution cleaning to pure water cleaning, a long-time switching operation of replacing all the chemical solution remaining in the cylindrical portion of the main body and the tapered nozzle portion with pure water as in the related art is performed in a short time. The switching operation can be performed.

Further, suck-back valves 32 ₁ and 32 ₂ are provided at the chemical solution supply pipes 41 ₁ and 41 ₂ , and the chemical solution supply pipes 41 ₁ and 41 ₂ are externally attached to the nozzle section 24. By making the structure not communicated with the inside, the chemical solution supply pipe 4 is connected to the pure water jet flow from the discharge port 23 of the nozzle part 24 in the pure water washing process after the supply of the chemical solution is stopped.
1 _1, 41 for the chemical liquid ₂ of the supply port can be prevented from being mixed, it is possible to perform mixing without pure water cleaning chemicals.

Although two chemical supply pipes are arranged in the above embodiment, one, three, or four chemical supply pipes may be provided in the nozzle portion near the discharge port of the main body.

[0039]

As described above in detail, according to the high frequency cleaning apparatus of the present invention, it is possible to perform both cleaning with pure water and cleaning with a chemical solution, and to quickly switch between them. It has a remarkable effect such as being able to be effectively used for manufacturing a liquid crystal glass substrate or a magnetic disk.

[Brief description of the drawings]

FIG. 1 is a partially cutaway front view showing a high-frequency cleaning device according to an embodiment of the present invention.

FIG. 2 is a sectional view showing a suck-back valve which is a spill-prevention mechanism provided in the chemical liquid supply pipe of FIG. 1;

FIG. 3 is a partially cutaway front view showing a high frequency cleaning device according to another embodiment of the present invention.

FIG. 4 is a schematic view showing a conventional high frequency cleaning device.

[Explanation of symbols]

Reference numeral 21 denotes a main body, 23 denotes a discharge port, 24 denotes a tapered nozzle portion, 26 denotes a pure water supply pipe, 27 denotes a vibrator, 30 ₁ , 30 ₂ , 41 ₁ , 41 ₂ ... a chemical liquid supply pipe, 31 ₁ and 31 ₂ ... Solenoid valves, 32 ₁ , 32 ₂ ... Suck back valves.

────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-8-230622 (JP, A) JP-A-10-125641 (JP, A) JP-A-11-102885 (JP, A) JP-A-2- 257632 (JP, A) JP 6-31879 (JP, U) JP 7-21168 (JP, U) (58) Fields investigated (Int. Cl. ⁷ , DB name) B08B 3/12 B08B 3 / 02

Claims (1)

(57) [Claims] 1. A main body having a tapered nozzle portion having an opening of a cleaning liquid discharge port, pure water supply means for supplying pure water to the main body, and a built-in main body; A high-frequency applying means for applying a high-frequency sound wave to the pure water supplied, and a chemical liquid supply means for supplying a chemical liquid provided in the vicinity of the discharge port of the nozzle portion , wherein the chemical liquid supply means comprises: How to supply chemicals when chemical supply is stopped
Has a spill prevention mechanism for suction in the opposite direction.
A high-frequency cleaning device characterized in that: