JP3013645B2 - Raw material supply device - Google Patents
Raw material supply deviceInfo
- Publication number
- JP3013645B2 JP3013645B2 JP4242793A JP4242793A JP3013645B2 JP 3013645 B2 JP3013645 B2 JP 3013645B2 JP 4242793 A JP4242793 A JP 4242793A JP 4242793 A JP4242793 A JP 4242793A JP 3013645 B2 JP3013645 B2 JP 3013645B2
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- heater
- tank
- heat
- material liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/87—Controlling the temperature
Description
【０００１】[0001]
【産業上の利用分野】本発明は、光ファイバ用母材等を
安定に製造するために用いられるガラスの原料供給装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a raw material supply apparatus for a glass used for stably producing a preform for an optical fiber and the like.
【０００２】[0002]
【従来の技術】光ファイバを製造するにはＶＡＤ法、Ｏ
ＶＤ法あるいは内付け法等によって、多孔質ガラス母材
を形成し、これを脱水・透明化して線引きする方法がと
られている。近年、光ファイバの長尺化あるいは効率的
に製造するための必要性から大量のガラス原料を連続的
に供給する方法が開発された（特開昭５９−９２９３３
号公報）。このような原料供給装置は図２に示すよう
に、供給ラインから送られた原料液は一旦サービスタン
ク５に貯えられる。サービスタンク５には加圧用ライン
からパイプ６ｂを通って加圧ガスが導入され、このガス
圧によって原料液はパイプ６ｃを通って原料タンク１に
圧送される。原料液はヒータ２によって沸点以上に加熱
され、気化された原料ガスはパイプ６ｄ，流量制御装置
４を通って連続的に反応容器へ送られる。2. Description of the Related Art An optical fiber is manufactured by a VAD method or an OAD method.
A method has been adopted in which a porous glass base material is formed by a VD method, an internal mounting method, or the like, which is then dehydrated and made transparent to draw. In recent years, a method for continuously supplying a large amount of glass material has been developed because of the necessity for lengthening or efficiently producing an optical fiber (Japanese Patent Laid-Open No. 59-92933).
No.). In such a raw material supply apparatus, the raw material liquid sent from the supply line is temporarily stored in a service tank 5 as shown in FIG. A pressurized gas is introduced into the service tank 5 from a pressurizing line through a pipe 6b, and the raw material liquid is pressure-fed to the raw material tank 1 through a pipe 6c by this gas pressure. The raw material liquid is heated to the boiling point or higher by the heater 2, and the vaporized raw material gas is continuously sent to the reaction vessel through the pipe 6 d and the flow rate control device 4.
【０００３】[0003]
【発明が解決しようとする課題】このような原料供給装
置を用いてより多くの原料ガスを安定に供給するには、
原料液により多くの熱を与えて気化速度を上げる方法が
とられる。しかし、ヒータの熱量を増大していくと原料
タンクの内壁面から発生する気泡の発生周期が短かくな
り、かつ発生する気泡の径が大きくなり気泡同士の干渉
が生じる。従って、ヒータの熱量を大きくしすぎると内
壁面に気泡膜が形成される。その結果、ヒータから供給
される熱は気泡膜によってさえぎられて原料液へ伝わり
にくくなり、原料ガスの発生量に限界ができるため安定
に供給することができない場合があった。そこで本発明
は、かかる問題点を解決した原料供給装置を提供するこ
とを目的とする。In order to stably supply more source gas using such a source supply device,
A method of increasing the vaporization rate by giving more heat to the raw material liquid is used. However, when the amount of heat of the heater is increased, the generation period of the bubbles generated from the inner wall surface of the raw material tank is shortened, and the diameter of the generated bubbles is increased, causing interference between the bubbles. Therefore, if the amount of heat of the heater is too large, a bubble film is formed on the inner wall surface. As a result, the heat supplied from the heater is interrupted by the bubble film and is difficult to be transmitted to the raw material liquid, and the amount of the raw material gas generated can be limited, so that there is a case where the supply cannot be performed stably. Therefore, an object of the present invention is to provide a raw material supply device that solves such a problem.
【０００４】[0004]
【課題を解決するための手段】本発明は、パイプを通し
て圧送されるガラスの原料液を収容し、該原料液を収容
する底面及び側面を有し、該側面の外周に加熱用ヒータ
が設けられた原料タンクと、該原料タンク内で気化した
原料ガスを反応容器まで導くパイプとを備えた原料供給
装置であって、前記側面は、内壁面の厚さに複数の凹凸
が設けられ、前記側面の外周に設けられたヒータで加熱
され、前記側面のヒータが上下方向に分割して設けら
れ、上側の該ヒータは下側の該ヒータに対し熱量を低く
加熱制御される原料供給装置である。 SUMMARY OF THE INVENTION According to the present invention, there is provided a raw material liquid for glass which is fed through a pipe, a bottom surface and side surfaces for storing the raw material solution, and a heater for heating provided on an outer periphery of the side surface. A raw material tank, and a pipe for guiding a raw material gas vaporized in the raw material tank to a reaction vessel, wherein the side surface is provided with a plurality of irregularities in the thickness of an inner wall surface, Is heated by a heater provided on the outer periphery of the heater.
The upper heater has a lower calorific value than the lower heater.
A heating-controlled raw material supply device.
【０００５】[0005]
【作用】上記の構成によれば、原料タンクはその内壁面
に凹凸が設けられているので、壁面と原料液との接触面
が増大して熱効率が向上する。また、原料タンクの側面
ヒータは上下方向に分割して設けられ、別々の温度を加
えることによって気泡同士の干渉が生じにくくなること
を実験的に確認した。その結果、タンク内壁面と原料液
との間の熱伝達効率が向上し、従来より多くの原料ガス
を安定に反応容器へ供給することができる。According to the above construction, the raw material tank is provided with irregularities on its inner wall surface, so that the contact surface between the wall surface and the raw material liquid is increased, and the thermal efficiency is improved. In addition, it was experimentally confirmed that the side heater of the raw material tank was provided in a vertically divided manner, and that the application of different temperatures made it less likely that the bubbles would interfere with each other. As a result, the heat transfer efficiency between the inner wall surface of the tank and the raw material liquid is improved, and more raw material gas can be supplied to the reaction vessel more stably than before.
【０００６】[0006]
【実施例】以下、添付図面を参照して本発明の実施例を
説明する。図１は光ファイバ用母材を製造する場合のガ
ラス原料供給装置の概略図であり、供給ラインから送ら
れた原料液は一旦サービスタンク５に貯えられる。サー
ビスタンク５には加圧用ラインからパイプ６ｂを通って
Ａｒ，Ｎ2等の不活性ガスが導入され、このガス圧によ
って原料液はパイプ６ｃを通って原料タンク１に圧送さ
れる。原料液は、底面ヒータ２ｃ及び側面ヒータ２ａ，
２ｂによって沸点以上に加熱され、気化された原料ガス
はパイプ６ｄ、流量制御装置４を通ってＳｉＣｌ4ある
いはＧｅＣｌ4等のガラス微粒子を生成する反応容器へ
送られる。Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a schematic view of a glass raw material supply device for producing a preform for an optical fiber. A raw material liquid sent from a supply line is temporarily stored in a service tank 5. Ar is the service tank 5 through the pipe 6b from pressurizing line, an inert gas such as N 2 is introduced, the raw material liquid by the gas pressure is pumped to the feed tank 1 through the pipe 6c. The raw material liquid is supplied to the bottom heater 2c and the side heaters 2a,
The raw material gas heated to a boiling point or higher by 2b and vaporized is sent through a pipe 6d and a flow rate control device 4 to a reaction vessel that generates glass fine particles such as SiCl 4 or GeCl 4 .
【０００７】上記の原料タンク１はその内壁面に凹凸が
設けられ、熱源と原料液の接触面を増大して熱伝達効率
を改善している。また、原料タンク１の外周に設けられ
たヒータは底面ヒータ２ｃ、側面ヒータ２ａ、２ｂが独
立して取付けられ、別々に加熱される。特に上側のヒー
タ２ａを下側のヒータ２ｂに対して熱量を低く加熱制御
することによって気泡同士の干渉が生じにくくなり、熱
伝達効率を向上することができる。ステンレススチール
製の原料タンク１の内壁面にピッチ１２ｍｍ、深さ６ｍ
ｍの凹凸を設けた。外周のヒータは底面ヒータ２ｃ及び
側面ヒータ２ａ，２ｂはそれぞれ６５０ｗとし、分割し
て設けた。この原料タンクの中にＳｉＣｌ4の原料液を
入れ、ヒータによって加熱しながら熱量に対する原料ガ
スの発生量を測定した。測定結果は図３に示すように、
（１）側面ヒータ２ａは他のヒータより低い熱量を加え
た場合及び、（２）全てのヒータに同じ熱量を加えた場
合は、（３）従来の方法（内壁面が平らであり、全ての
ヒータに同じ熱量を加えた場合）に比べて原料ガスの発
生量が増加したことがわかる。[0007] The above-mentioned raw material tank 1 is provided with irregularities on its inner wall surface to increase the contact surface between the heat source and the raw material liquid to improve the heat transfer efficiency. Further, the heaters provided on the outer periphery of the raw material tank 1 are independently provided with a bottom heater 2c and side heaters 2a, 2b, and are separately heated. In particular, by controlling the heating of the upper heater 2a with respect to the lower heater 2b so as to reduce the amount of heat, interference between bubbles is less likely to occur, and the heat transfer efficiency can be improved. Pitch 12 mm, depth 6 m on the inner wall surface of stainless steel material tank 1
m irregularities were provided. The bottom heater 2c and the side heaters 2a and 2b were 650w each on the outer periphery, and were provided separately. A raw material liquid of SiCl 4 was placed in the raw material tank, and the amount of generated raw material gas relative to the amount of heat was measured while heating with a heater. As shown in FIG.
(1) When the side heater 2a applies a lower amount of heat than the other heaters, and (2) When the same amount of heat is applied to all the heaters, (3) the conventional method (the inner wall surface is flat, and It can be seen that the amount of source gas generated increased as compared with the case where the same amount of heat was applied to the heater.
【０００８】[0008]
【発明の効果】以上説明したように発明の原料タンクは
その側面の内壁面の厚さに複数の凹凸が設けられている
ので、壁面と原料液との接触面が増大して熱効率が向上
する。また、原料タンクの側面ヒータは上下方向に分割
して設けられ、上側のヒータを下側のヒータに対し熱量
を低く制御される温度を加えることによって内壁面から
発生する気泡同士の干渉が生じにくくなることを確認し
た。その結果、タンク内壁面と原料液との間の熱伝達効
率が向上し、従来以上に多くの原料ガスを安定に反応容
器へ供給することができる。As described above, the raw material tank of the present invention is provided with a plurality of irregularities in the thickness of the inner wall surface on the side surface, so that the contact surface between the wall surface and the raw material liquid is increased to improve the thermal efficiency. . In addition, the side heater of the raw material tank is provided in a vertically divided manner, and the upper heater is applied to a lower heater at a temperature controlled to lower the amount of heat so that interference between bubbles generated from the inner wall surface hardly occurs. I confirmed that it would be. As a result, the heat transfer efficiency between the tank inner wall surface and the raw material liquid is improved, and more raw material gas can be supplied to the reaction vessel more stably than before.
【図１】本発明に係る実施例の構成を示す概略図であ
る。FIG. 1 is a schematic diagram showing a configuration of an embodiment according to the present invention.
【図２】従来の構成を示す概略図である。FIG. 2 is a schematic diagram showing a conventional configuration.
【図３】ヒータの熱量に対する原料ガスの発生量を示す
図である。FIG. 3 is a diagram showing the amount of source gas generated with respect to the amount of heat of a heater.
１：原料タンク ２，２ａ，２ｂ，２ｃ：ヒータ ３：凹凸 ４：流量制御装置 ５：サービスタンク ６ａ，６ｂ，６ｃ，６ｄ：パイプ ７ａ，７ｂ，７ｃ，７ｄ：開閉弁 1: Raw material tanks 2, 2a, 2b, 2c: heater 3: unevenness 4: flow control device 5: service tank 6a, 6b, 6c, 6d: pipe 7a, 7b, 7c, 7d: open / close valve
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭64−83666（ＪＰ，Ａ) 特開 平１−156741（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) C03B 37/018 C03B 8/04 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-64-83666 (JP, A) JP-A-1-156741 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C03B 37/018 C03B 8/04
Claims (1)
料液を収容し、該原料液を収容する底面及び側面を有
し、該側面の外周に加熱用ヒータが設けられた原料タン
クと、該原料タンク内で気化した原料ガスを反応容器ま
で導くパイプとを備えた原料供給装置であって、前記側
面は、内壁面の厚さに複数の凹凸が設けられ、前記側面
の外周に設けられたヒータで加熱され、前記側面のヒー
タが上下方向に分割して設けられ、上側の該ヒータは下
側の該ヒータに対し熱量を低く加熱制御されることを特
徴とする原料供給装置。A raw material tank containing a raw material liquid for glass fed through a pipe, a bottom surface and a side surface for storing the raw material liquid, and a heating heater provided on an outer periphery of the side surface; A pipe for guiding a source gas vaporized in the reactor to the reaction vessel, wherein the side surface is provided with a plurality of irregularities in the thickness of the inner wall surface, and a heater provided on the outer periphery of the side surface. Heated and heated on the side
The heater is provided vertically divided, and the upper heater is
The amount of heat is controlled to be lower than that of the heater on the side of the raw material supply apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4242793A JP3013645B2 (en) | 1993-03-03 | 1993-03-03 | Raw material supply device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4242793A JP3013645B2 (en) | 1993-03-03 | 1993-03-03 | Raw material supply device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06256036A JPH06256036A (en) | 1994-09-13 |
| JP3013645B2 true JP3013645B2 (en) | 2000-02-28 |
Family
ID=12635769
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4242793A Expired - Fee Related JP3013645B2 (en) | 1993-03-03 | 1993-03-03 | Raw material supply device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3013645B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08326995A (en) * | 1995-03-28 | 1996-12-10 | Nikon Corp | Liquid material feeding system for preventing reverse diffusion |
| JP3826072B2 (en) | 2002-06-03 | 2006-09-27 | アドバンスド エナジー ジャパン株式会社 | Liquid material vaporizer |
| AU2002313486A1 (en) | 2002-06-28 | 2004-01-19 | Pirelli & C. S.P.A. | Method and device for vaporizing a liquid reactant in manufacturing a glass preform |
| JP5602421B2 (en) * | 2009-12-14 | 2014-10-08 | 三菱電機株式会社 | Solder bonding equipment |
| CN102485952B (en) * | 2010-12-06 | 2015-09-23 | 理想能源设备有限公司 | Vapourizing unit and gasification method |
-
1993
- 1993-03-03 JP JP4242793A patent/JP3013645B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06256036A (en) | 1994-09-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |