JP2998226B2 - Thick film circuit drawing equipment - Google Patents

Thick film circuit drawing equipment

Info

Publication number
JP2998226B2
JP2998226B2 JP2443791A JP2443791A JP2998226B2 JP 2998226 B2 JP2998226 B2 JP 2998226B2 JP 2443791 A JP2443791 A JP 2443791A JP 2443791 A JP2443791 A JP 2443791A JP 2998226 B2 JP2998226 B2 JP 2998226B2
Authority
JP
Japan
Prior art keywords
substrate
thick film
film circuit
unit
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2443791A
Other languages
Japanese (ja)
Other versions
JPH04263489A (en
Inventor
誠 今西
朗 壁下
健男 安藤
智 仕田
宏章 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP2443791A priority Critical patent/JP2998226B2/en
Publication of JPH04263489A publication Critical patent/JPH04263489A/en
Application granted granted Critical
Publication of JP2998226B2 publication Critical patent/JP2998226B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は電子回路等を構成させる
基板に厚膜回路を形成する厚膜回路描画装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thick film circuit drawing apparatus for forming a thick film circuit on a substrate constituting an electronic circuit or the like.

【0002】[0002]

【従来の技術】以下に従来の厚膜回路描画装置について
説明する。
2. Description of the Related Art A conventional thick film circuit drawing apparatus will be described below.

【0003】図5に示すように、基板規正部5aは基板
6aを保持し、基板高さの計測部2により、基板6aの
高さを測定する。基板規正部5bも同様に基板6bを保
持し、描画ノズル4により基板6b上に厚膜回路を形成
する。計測部2と描画ノズル4はブラケット3により固
定されていて計測部2と描画ノズル4は基板規正部5a
及び5bに対して、それぞれ相対的に同じ動きとなり、
基板6b上の厚膜回路の塗布と、基板6a上の基板高さ
の測定を同時に行なう。ブラケット3は、モータ7によ
り矢印aで示す方向に、またロボット1により矢印X及
びYで示す方向に移動できる。
[0005] As shown in FIG. 5, a substrate setting unit 5 a holds a substrate 6 a, and measures the height of the substrate 6 a by a substrate height measuring unit 2. The substrate setting part 5b also holds the substrate 6b in the same manner, and forms a thick film circuit on the substrate 6b by the drawing nozzle 4. The measuring unit 2 and the drawing nozzle 4 are fixed by the bracket 3, and the measuring unit 2 and the drawing nozzle 4 are fixed to the substrate setting unit 5a.
And 5b are relatively the same respectively.
The application of the thick film circuit on the substrate 6b and the measurement of the substrate height on the substrate 6a are performed simultaneously. The bracket 3 can be moved by a motor 7 in a direction indicated by an arrow a and by the robot 1 in a direction indicated by arrows X and Y.

【0004】[0004]

【発明が解決しようとする課題】しかしながら上記の従
来の高さを測定する基板規正部上の基板が描画する基板
規正部に移載される際、移載による基板の傾きが生じる
ので描画する基板規正部上での基板の高さは計測部で測
定した基板の高さの値とは異なるという問題点を有して
いた。
However, when the above-mentioned substrate on the conventional substrate measuring portion for measuring height is transferred to the substrate defining portion for drawing, the substrate is tilted due to the transfer. There was a problem that the height of the substrate on the setting part was different from the value of the height of the substrate measured by the measuring part.

【0005】本発明は上記従来の問題点を解決するもの
で、基板を移載する際に生ずる基板高さの変化を補正し
て、描画ノズルと基板との間隔を一定値に保持し安定し
た描画ができる厚膜回路描画装置を提供することを第1
の目的とする。
The present invention solves the above-mentioned conventional problems, and corrects a change in substrate height that occurs when a substrate is transferred, thereby maintaining a constant distance between the drawing nozzle and the substrate and stabilizing the distance. The first is to provide a thick film circuit drawing apparatus capable of drawing.
The purpose of.

【0006】また基板が正しく規正されているか否か及
び基板自体の破損やわん曲等の有無を検査することので
きる厚膜回路描画装置を提供することを第2の目的とす
る。
It is a second object of the present invention to provide a thick film circuit drawing apparatus capable of inspecting whether or not a substrate is correctly regulated and whether or not the substrate itself is damaged or bent.

【0007】[0007]

【課題を解決するための手段】第1の目的を達成するた
めに本発明の厚膜回路描画装置は、実装基板を保持する
2個以上の基板規正部と、実装基板に厚膜回路を描画す
る描画ノズルと別の実装基板に基板までの距離を測定す
る計測部を配設し、両者をブラケットに固定し相対的に
同体移動させる装置と、各基板の高さを計測する測長セ
ンサの計測結果を補正演算し、描画ノズルのヘッド部に
フィードバックする基板傾き補正演算部を備えた構成を
有している。
In order to achieve the first object, a thick film circuit drawing apparatus according to the present invention draws a thick film circuit on two or more substrate standardizing portions for holding a mounting substrate. A measuring unit that measures the distance to the board on the drawing nozzle to be mounted and another mounting board, and fixes both to the bracket and moves them relative to each other, and a length measurement sensor that measures the height of each board It has a configuration including a substrate tilt correction calculation unit that corrects the measurement result and feeds it back to the head unit of the drawing nozzle.

【0008】第2の目的を達成するために本発明の厚膜
回路描画装置は、第1の目的を達成するための構成に加
えて基板状態検査部を基板傾き補正演算部に付加した構
成を有している。
In order to achieve the second object, the thick film circuit drawing apparatus of the present invention has a structure in which a substrate state inspection unit is added to a substrate inclination correction operation unit in addition to the structure for achieving the first object. Have.

【0009】[0009]

【作用】この構成によって、基板を移載する際に生じた
基板高さの変動が補正されることとなる。また基板の規
正状態や基板自体の状態が検査されることとなる。
According to this configuration, the fluctuation of the substrate height caused when the substrate is transferred is corrected. In addition, the normal state of the substrate and the state of the substrate itself are inspected.

【0010】[0010]

【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。
An embodiment of the present invention will be described below with reference to the drawings.

【0011】本発明の一実施例を示す図1及び図3で
は、従来例と同一部品に同一番号を付して説明は省略す
る。
In FIGS. 1 and 3 showing one embodiment of the present invention, the same parts as those of the conventional example are denoted by the same reference numerals and the description thereof will be omitted.

【0012】(実施例1)基板高さの計測部2と描画ノ
ズル4はブラケット10を介して固定されていて、計測
部2と描画ノズル4は基板規正部5a及び5bに対して
それぞれ相対的に同じ動きとなり、基板6b上の厚膜回
路の塗布と、基板6a上の基板高さの測定を同時に行な
うことは従来例と同様であるが、描画ノズル4に関して
は、ヘッド部11を介して高さ方向に補正可能とした構
成である。図示は省略したが、ブラケット10をモータ
とロボットにより移動させる構成は従来例と同様であ
る。
(Embodiment 1) The measuring unit 2 for drawing the substrate height and the drawing nozzle 4 are fixed via a bracket 10, and the measuring unit 2 and the drawing nozzle 4 are relatively positioned with respect to the substrate setting units 5a and 5b, respectively. The application of the thick film circuit on the substrate 6b and the measurement of the substrate height on the substrate 6a are performed at the same time as in the conventional example, except that the drawing nozzle 4 is This configuration allows correction in the height direction. Although not shown, the configuration in which the bracket 10 is moved by a motor and a robot is the same as that of the conventional example.

【0013】基板規正部5a及び5bの基板6a及び6
bの各四隅の基板高さをレーザ光により測定できるよう
に配設した4個の測長センサ(例えばアンリツ製光マイ
クロ)8から送られてくる測定データにより、ヘッド部
11の高さを調節する基板傾き補正演算部9を備えてい
る。
The substrates 6a and 6 of the substrate setting portions 5a and 5b
The height of the head unit 11 is adjusted by measurement data sent from four length measuring sensors (for example, optical micros manufactured by Anritsu) 8 arranged so that the substrate height at each of the four corners b can be measured by laser light. And a substrate inclination correction calculation unit 9 for performing the correction.

【0014】12は基板規正部5a及び5bの搬送部で
ある。図2に示すように、基板傾き補正演算部9は、基
板6a及び基板6bの2つの平面の方程式の差を算出
し、描画時に、描画ヘッドが描画する各点の測長値に加
減させる。
Reference numeral 12 denotes a transport unit for the substrate setting units 5a and 5b. As shown in FIG. 2, the substrate inclination correction calculation unit 9 calculates the difference between the equations of the two planes of the substrate 6a and the substrate 6b, and adds or subtracts the length measurement value of each point drawn by the drawing head at the time of drawing.

【0015】なお本実施例では測長センサ8を基板上の
四隅としたが、測長点を増やすことにより、基板の傾斜
状態をより正確に測定することができる。さらに基板規
正部5a,5bも各1か所に限定する必要はない。また
基板規正部5a,5b上の被測長物も基板6a,6bに
限るものでなく、基板規正部5bにおいては、描画以外
の操作を適用することも可能である。
In this embodiment, the length measuring sensors 8 are provided at the four corners on the substrate. However, by increasing the length measuring points, the tilt state of the substrate can be measured more accurately. Further, it is not necessary to limit the board setting portions 5a and 5b to each one. In addition, the object to be measured on the substrate setting units 5a and 5b is not limited to the substrates 6a and 6b, and operations other than drawing can be applied to the substrate setting unit 5b.

【0016】以上のように本実施例によれば、ノズルと
基板との間隔を一定値に保持する手段を設けることによ
り、基板を移載する際に生ずる基板高さの変動を補正し
て描画状態が安定し、線幅や膜厚のばらつきが小さく、
精度の良い細かい回路パターンを形成することができ、
電子回路の品質を大幅に向上させることができる。
As described above, according to this embodiment, by providing the means for maintaining the distance between the nozzle and the substrate at a constant value, the fluctuation of the substrate height which occurs when the substrate is transferred is corrected and drawn. The condition is stable, the variation in line width and film thickness is small,
A precise and fine circuit pattern can be formed,
The quality of the electronic circuit can be greatly improved.

【0017】(実施例2)以下本発明の第2の実施例に
ついて、図面を参照しながら説明する。
(Embodiment 2) Hereinafter, a second embodiment of the present invention will be described with reference to the drawings.

【0018】図3に示すように、実施例1の図1の構成
と異なるのは、基板傾き補正演算部9による補正演算を
する前に、基板状態の検査機能を果す基板状態検査部1
3を付加した点である。基板状態検査部13についての
具体的な計算・検査のアルゴリズムの一例を図4に示
す。なお本実施例では基板規正部5における例を示した
が、他の規正部やステージ等にも適用することができ
る。さらに測定点A,B,C,D以外に測定点を増やせ
ば、平面の方程式が増え、より正確な検査が可能とな
る。また図4中の判定基準の5(μm)や3(回目)な
どの数値は使用目的に応じて自由に設定できる。
As shown in FIG. 3, the configuration of the first embodiment differs from that of FIG. 1 in that the board state inspection section 1 which performs the board state inspection function before performing the correction operation by the board inclination correction operation section 9.
3 is added. FIG. 4 shows an example of a specific calculation / inspection algorithm for the board state inspection unit 13. In the present embodiment, the example in the board setting unit 5 is shown, but the present invention can be applied to other setting units and stages. Further, if the number of measurement points other than the measurement points A, B, C, and D is increased, the number of plane equations increases, and more accurate inspection can be performed. In addition, numerical values such as 5 (μm) and 3 (the third time) of the criterion in FIG. 4 can be freely set according to the purpose of use.

【0019】本実施例によれば、基板の高さを補正する
前に基板が正しく規正されているか否か、及び基板自体
の破損やわん曲等の有無を検査できるので、描画操作時
の補正不能となる不良数を減少させることができる。
According to this embodiment, before correcting the height of the substrate, it can be inspected whether the substrate is correctly set and whether the substrate itself is damaged or bent, and so on. It is possible to reduce the number of failures that cannot be performed.

【0020】[0020]

【発明の効果】以上のように本発明は、実装基板を保持
する2個以上の基板規正部と、実装基板に厚膜回路を描
画する描画ノズルと別の実装基板にその実装基板までの
距離を測定する計測部を配設し、両者をブラケットに固
定し相対的に同体移動させる装置と、各基板の高さを計
測する測長センサの計測結果を補正演算し描画ノズルの
ヘッド部にフィードバックする基板傾き補正演算部を備
えた構成、または、基板状態検査部を基板補正演算部に
付加した構成により、基板を移載する際に生ずる基板高
さの変動を補正して描画ノズルと実装基板との間隔を一
定値に保持し安定した描画ができ、また、基板が正しく
規正されているか否か、及び基板自体の破損やわん曲等
の有無を検査できる優れた厚膜回路描画装置を実現でき
るものである。
As described above, according to the present invention, there are provided two or more board defining portions for holding a mounting board, a drawing nozzle for drawing a thick film circuit on the mounting board, and a distance between the mounting board and another mounting board. A measurement unit that measures the height of the substrate is fixed, and both are fixed to the bracket and moved relative to each other.The measurement result of the length measurement sensor that measures the height of each substrate is corrected and fed back to the head of the drawing nozzle. With the configuration provided with a board tilt correction calculation unit, or the configuration in which a board state inspection unit is added to the board correction calculation unit, the fluctuation of the board height that occurs when the board is transferred is corrected to draw the drawing nozzle and the mounting board. Realizes an excellent thick film circuit drawing device that can maintain stable spacing by keeping the distance between the substrate and the substrate constant, and can check whether the substrate is correctly regulated and whether the substrate itself is damaged or bent. You can do it.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施例の厚膜回路描画装置の構
成の概念を示す概略斜視図
FIG. 1 is a schematic perspective view showing the concept of the configuration of a thick film circuit drawing apparatus according to a first embodiment of the present invention.

【図2】第1の実施例の計算アルゴリズムFIG. 2 is a calculation algorithm according to the first embodiment;

【図3】本発明の第2の実施例の厚膜回路描画装置の構
成の概念を示す概略斜視図
FIG. 3 is a schematic perspective view showing the concept of the configuration of a thick film circuit drawing apparatus according to a second embodiment of the present invention.

【図4】第2の実施例の計算及び検査のアルゴリズムFIG. 4 is a calculation and inspection algorithm according to a second embodiment;

【図5】従来の厚膜回路描画装置の構成の概念を示す概
略斜視図
FIG. 5 is a schematic perspective view showing the concept of the configuration of a conventional thick film circuit drawing apparatus.

【符号の説明】[Explanation of symbols]

2 計測部 4 描画ノズル 5a,5b 基板規正部 6a,6b 実装基板 8 測長センサ 9 基板傾き補正演算部 10 ブラケット 11 ヘッド部 13 基板状態検査部 2 Measuring unit 4 Drawing nozzle 5a, 5b Board setting unit 6a, 6b Mounting board 8 Length measuring sensor 9 Board tilt correction calculation unit 10 Bracket 11 Head unit 13 Board state inspection unit

───────────────────────────────────────────────────── フロントページの続き (72)発明者 仕田 智 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (72)発明者 藤原 宏章 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 昭64−2391(JP,A) 特開 平1−308093(JP,A) 実開 昭63−87867(JP,U) (58)調査した分野(Int.Cl.7,DB名) H05K 3/10 B41F 17/36 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor Satoshi Shida 1006 Kazuma Kadoma, Kadoma City, Osaka Prefecture Inside Matsushita Electric Industrial Co., Ltd. In-company (56) References JP-A 64-2391 (JP, A) JP-A-1-308093 (JP, A) JP-A 63-87867 (JP, U) (58) Fields investigated (Int. . 7, DB name) H05K 3/10 B41F 17/36

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】実装基板を保持する2個以上の基板規正部
と、前記実装基板に厚膜回路を描画する描画ノズルと別
の前記実装基板にその実装基板までの距離を測定する計
測部を配設し、前記描画ノズルと前記計測部をブラケッ
トに固定し相対的に同体移動させる装置と、各実装基板
の高さを計測する測長センサの計測結果を補正演算し、
前記描画ノズルのヘッド部にフィードバックする基板傾
き補正演算部を備えた厚膜回路描画装置。
1. A method according to claim 1, further comprising: two or more board setting sections for holding the mounting board; a drawing nozzle for drawing a thick film circuit on the mounting board; and a measuring section for measuring a distance to the mounting board on another mounting board. Arranged, a device that fixes the drawing nozzle and the measurement unit to the bracket and relatively moves together, and corrects and calculates the measurement result of the length measurement sensor that measures the height of each mounting board,
A thick film circuit drawing apparatus comprising a substrate tilt correction operation unit that feeds back to a head unit of the drawing nozzle.
【請求項2】基板傾き補正演算部に基板状態検査部を付
加した請求項1記載の厚膜回路描画装置。
2. The thick film circuit drawing apparatus according to claim 1, wherein a substrate state inspection unit is added to the substrate inclination correction operation unit.
JP2443791A 1991-02-19 1991-02-19 Thick film circuit drawing equipment Expired - Fee Related JP2998226B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2443791A JP2998226B2 (en) 1991-02-19 1991-02-19 Thick film circuit drawing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2443791A JP2998226B2 (en) 1991-02-19 1991-02-19 Thick film circuit drawing equipment

Publications (2)

Publication Number Publication Date
JPH04263489A JPH04263489A (en) 1992-09-18
JP2998226B2 true JP2998226B2 (en) 2000-01-11

Family

ID=12138127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2443791A Expired - Fee Related JP2998226B2 (en) 1991-02-19 1991-02-19 Thick film circuit drawing equipment

Country Status (1)

Country Link
JP (1) JP2998226B2 (en)

Also Published As

Publication number Publication date
JPH04263489A (en) 1992-09-18

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