JP2987512B2 - CVD equipment - Google Patents

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a CVD apparatus for forming a semiconductor thin film on a substrate by utilizing a thermal decomposition reaction of a raw material gas. Heating coil).

[Conventional technology]

In the CVD apparatus, since the vapor phase growth is performed using a raw material gas such as arsine, phosphine, and trimethylgallium which is toxic to the human body, the CVD apparatus is usually housed in a box 1 shown in FIG. That is, in box 1, CVD
An exhaust pipe 1a for immediately exhausting the harmful raw material gas to the abatement apparatus even when the toxic raw material gas leaks from the apparatus is connected.

The CVD apparatus in the box 1 is composed of a reaction tube 2 for supplying a source gas to a substrate on a susceptor disposed therein, and auxiliary equipment 3 such as a substrate exchange chamber and a vacuum exhaust device. Is provided with an RF coil 4.

The RF coil 4 is formed by spirally winding a conductive tube 4a having a cooling water flow path therein, and both ends of the tube 4a are respectively provided with a power supply unit and a water passage means (not shown). ), And is held on stays 5, 5 suspended from the ceiling of the box 1, and arranged on the outer periphery of the reaction tube 2 at a position corresponding to the susceptor in the reaction tube 2.

To form a thin film on a substrate using the CVD apparatus,
The RF coil 4 is energized to perform high-frequency induction heating of the susceptor on which the substrate is mounted, heat the substrate via the susceptor, and supply the source gas from the source gas supply pipe 6 into the reaction tube 2 to supply the source gas to the reaction tube 2. Thermal decomposition is performed in the vicinity, and a reaction product accompanying the thermal decomposition is deposited on a substrate. Since the RF coil 4 that is energized generates heat and becomes high in temperature, water is passed through the RF coil 4 and cooled during energization.

The reaction product generated by such vapor phase growth adheres not only to the substrate but also to the inner wall of the reaction tube 2 and the like. In this case, the reaction tube 2 itself can be detached by moving the reaction tube 2 horizontally after releasing the connection with the lower device.

[Problems to be solved by the invention]

However, in the conventional CVD apparatus, the RF coil 4 is
Therefore, in order to wash the reaction tube 2, it was necessary to first extract the RF coil 4 in the axial direction of the reaction tube 2.

Therefore, it is necessary to secure a space having an area corresponding to the outer diameter of the RF coil 4 above the reaction tube 2. For example, the source gas supply tube 6 simply removes a connection flange with the reaction tube 2. In addition, the RF coil 4 must be moved so as not to be an obstacle at the time of removal, and the work of removing the reaction tube 2 is troublesome. Further, it is necessary to secure a space corresponding to the height of the RF coil 4 above the reaction tube 2 for extracting the RF coil 4, and there is also a disadvantage that the box 1 becomes large.

Therefore, an object of the present invention is to provide a CVD apparatus which facilitates the work of removing a reaction tube and does not require a space for removing an RF coil in a box.

[Means for solving the problem]

In order to achieve the above object, the CVD apparatus of the present invention comprises a reaction tube for supplying a source gas to a substrate on a susceptor disposed therein, and a conductive tube having a cooling water flow path therein. In a CVD apparatus having an RF coil spirally wound around the outer periphery of a reaction tube, the RF coil is configured as a connected body of a pair of half portions divided in the axial direction of the coil. At a position where the two pipes are substantially divided along the axial direction, the respective pipes are conductively connected by a conductive joint member, and the respective pipes in the axial direction are integrally connected by a holding member. And

(Operation)

According to the above configuration, by separating the joint member, the RF
Since the coil can be divided into a pair of halves and removed, there is no need to move the RF coil in the axial direction, and a space corresponding to the outer diameter of the RF coil and RF
A space corresponding to the height of the coil is not required.

〔Example〕

Hereinafter, the present invention will be described in more detail based on one embodiment shown in FIGS.

The RF coil 11 according to the present embodiment, as shown in FIG.
A conductive tube 12 having a cooling water flow path 12a therein is spirally wound with a slightly larger inner diameter than the outer diameter of the reaction tube 13 to form a spiral wound body. Are vertically divided along the center axis direction, and a pair of detachable half portions 11
a, 11a.

In actual production, a spiral wound body is formed,
Instead of being divided along the central axis, the tubular body 12 formed in a semicircular shape with a curvature slightly larger than the outer diameter of the reaction tube 13 is arranged left and right, and a large number is also arranged in the axial direction,
The respective semicircular pipes 12, 12 in the axial direction are integrally connected by holding members 14 near both ends of the respective pipes 12, 12, and a pair of right and left pipes 12, 12 are electrically conductive joint members. Connect at 15 to form a spiral wound body.

The joint member 15 is detachable, for example, as shown in FIG. 3. The male and female fittings of the two pipes 12 are performed, and the nut member 15a provided on one of the pipes is formed on the outer periphery of the other pipe. By screwing into the threaded portion 15b, the two pipes 12, 12 are liquid-tight,
They are connected so as to be conductive.

The RF coil 11 configured as described above surrounds a predetermined position of the reaction tube 13 with a pair of halves 11a, 11a, and then surrounds the two halves 1a.
1a and 11a are connected by a joint member 15 and both ends of the RF coil 11 are connected to a power supply section, so that the susceptor 16 is subjected to high-frequency induction heating in the same manner as the RF coil of the conventional device, and the substrate is passed through the susceptor 16. P can be heated to a predetermined temperature.

When removing the reaction tube 13 by washing, etc., use the RF coil
Remove the joint members 15 of 11 and divide the RF coil 11 into a pair of halves.
After dividing into 11a and 11a and removing from the reaction tube 13, the reaction tube 13
Disconnect the device below and move it horizontally to remove it. In this case, the split position of the RF coil 11 is set to the front and rear direction of the box door, and the half part on the door side is removed,
The other half part can be held in the stay or the like and can be left in the apparatus.If a power supply unit or a water passage means is connected to the remaining half part, the RF coil 11 and the power supply unit Since the reaction tube 13 can be removed without releasing the connection of the water passage means, the removal operation is greatly reduced. Further, since the tubes 12 are integrally connected to each other by the holding members 14 in the detached half portion, the tubes 12 are not separated and the handling is easy.

Thus, the RF coil 11 of the present embodiment device is
By connecting and separating the RF coil 11, the RF coil 11 can be connected and mounted at that position as a pair of halves 11 a, 11 a, or can be separated and removed. There is no need to move it in the axial direction, so when removing the reaction tube 13, the source gas supply tube can be removed simply by removing the connection flange with the reaction tube, greatly reducing the removal work. Is done.

Further, since the RF coil 11 of the apparatus of the present embodiment does not need to be moved and removed in the axial direction, the box accommodating the CVD apparatus has a space corresponding to the height of the RF coil 11 above the reaction tube 13. There is no need to secure it, and the height of the box can be made lower than before.

The split position of the pair of halves constituting the RF coil 11 may be any position as long as an interval for taking out the reaction tube 13 can be formed, and the half-circular tube 12 constituting the halves is held in the axial direction. The holding member 14 may hold an arbitrary position in the axial direction at at least one position other than holding both ends of the semicircular pipe 12. In addition, the holding member 14 needs to hold each tube 12 in an electrically insulated state, and uses an insulating member such as plastic. However, when the tube 12 is provided with an insulating coating, May be used.

Further, as the conductive joint member 15, various means can be used as long as the corresponding pipe can be connected in a liquid-tight and conductive manner, and for example, generally used for connection of water supply, gas pipes and hoses. By using an automatic joint member (one-touch joint, auto joint) which can be attached and detached by pushing and pulling slide operations as used, the RF coil 11 can be easily divided and connected.

Then, if the half portions 11a, 11a are formed by using the automatic joint members, the holding members 14 at both ends are brought close to each other when the automatic joint members are lightly engaged in advance in connecting the half portions 11a, 11a. By doing so, connection can be performed at once, and the connection operation can be performed more efficiently than in the case of connecting one by one.

In the above embodiment, the description has been given of the case of the CVD apparatus in which the reaction tube is placed vertically. However, the present invention can be similarly applied to the case of a CVD apparatus in which the reaction tube is placed horizontally.

〔The invention's effect〕

As described above, according to the CVD apparatus of the present invention, RF
The coil is configured as a connected body of a pair of detachable halves, and the coupling member is separated so that it can be divided into a pair of halves and removed.
A space corresponding to the outer diameter of the coil and a space corresponding to the height of the RF coil become unnecessary. This facilitates maintenance work for attaching and detaching the reaction tube, and also makes it possible to reduce the size of the box because no space for removing the RF coil is required above the box that houses the CVD apparatus.

[Brief description of the drawings]

1 to 3 show an embodiment of the present invention. FIG. 1 is a cross-sectional view of a main part of a CVD apparatus, FIG. 2 is a perspective view of an RF coil, and FIG. Sectional view of main part, Fig. 4 shows CV
It is a front view which shows the whole structure of D apparatus. 11 ... RF coil, 11a ... Half section, 12 ... Tube, 13 ...
Reaction tube, 14 ... holding member, 15 ... joint member, P ... substrate

Claims (1)

(57) [Claims] 1. A reaction tube for supplying a source gas to a substrate on a susceptor disposed therein, and a conductive tube having a flow path for cooling water inside the reaction tube spirally wound around the reaction tube. Become
In a CVD apparatus provided with an RF coil, a position where the RF coil is substantially divided into two along the axial direction such that the RF coil is configured as a connected body of a pair of half portions divided in the axial direction of the coil. A CVD apparatus, wherein each tube is connected to be conductive by a conductive joint member, and each tube in the axial direction is integrally connected by a holding member.