JPH10303132A - Built-in coil matching device and plasma cvd device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily assemble and disassemble a plasma CVD device. SOLUTION: A coil-like pipe 22 is incorporated in a metallic cylindrical-body 21 housing a matching device 30, and the matching device 30 is connected to the pipe 22 through a copper plate 25. The pipe 22 is changed to an insulating pipe 23 in a middle and insulated from the cylindrical body 21. The part of a plasma generating chamber 4 which comes into contact with the pipe 22 is insulated with an insulating material 29, such as the plastic, etc. The pipe 22 is fixed to the cylindrical body 21 after the pipe 22 is changed to the insulating pipe 23 for making cooling water flow and coupled with an external cooling pipe 13 with a one-shot coupling 27. A connecting terminal 28 for connecting the matching device 30 to an external high-frequency oscillator 7 with a coaxial cable 8 is also attached to the cylindrical body 21.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a matching device with a built-in coil and a plasma CVD device in a semiconductor manufacturing apparatus.

[0002]

2. Description of the Related Art A conventional plasma CVD apparatus has an aluminum vacuum chamber 2 for accommodating a wafer 1 therein, as shown in FIG. 2, and the vacuum chamber 2 has a lid 3 at an upper part, and the lid 3 is opened and closed. Thus, maintenance in the vacuum chamber 2 can be performed.

[0003] A cylindrical plasma generating chamber 4 is provided on the lid 3 so as to protrude outside. In order to generate the plasma 5 in the plasma generation chamber 4, a metal pipe 6 is wound around the outer circumference of the plasma generation chamber 4 in a coil shape, and high-frequency power is applied to the pipe 6. High frequency power is applied to the pipe 6 from the high frequency oscillator 7 via the matching unit 9. The gas introduced into the plasma generation chamber 4 by this application is turned into a plasma state to form a film on the wafer 1. The matching unit 9 is merely a shield box in which the variable capacitor 26 for impedance matching is simply built.

The above-mentioned coiled pipe 6 is connected to the vacuum chamber 2.
And must be insulated. For this purpose, a pipe 6 is wound around the outer periphery of the non-metallic window 12 fitted in the plasma generation chamber 4. Further, from the pipe 6 to the matching unit 9 must be insulated from the chamber 2. Also, pipe 6
Since there is a danger of heat generation from to the matching unit 9, a coaxial cable cannot be used, and the copper plate 10 is used exclusively. The copper plate 10 is screwed to the pipe 6. The copper plate 10 is usually a sheet metal having a width of about 30 to 40 mm and a thickness of about 1.0 mm. The copper plate 10 is covered with a cover 11 so as to insulate the copper plate 10 and prevent high-frequency waves that are harmful to the human body from leaking outside. The cover 11 is made of aluminum and assembled in a box shape. In assembling, in order to prevent a high frequency from leaking, in order to increase the contact area at the joint, the joint is fixed using more screws than usual.

In order to avoid a rise in temperature due to the application of high frequency power, a cooling pipe 13 is connected to the coiled pipe 6 via a screw joint 14, and cooling water is injected into the coiled pipe 6 from outside. .

[0006]

However, in the above-described conventional plasma CVD apparatus, when the vacuum chamber 2 is maintained, the coil-shaped pipe 6 is connected to the plasma generating chamber 4 of the vacuum chamber 2 in order to open the lid 3. Before removing the cover 11, the cover 11 must be disassembled and removed, and the copper plate 10 and the cooling pipe 1 connected by screws must be removed.
The third threaded joint 14 must be removed. Similarly, at the time of assembling, the cooling pipe 13 and the copper plate 10 must be connected, and the cover 11 must be further assembled. This requires a great deal of labor and time for the operator. In particular, the cover 11
In this case, the joint is fixed using more screws than usual, so that the assembling and disassembling operations are extremely complicated.

SUMMARY OF THE INVENTION An object of the present invention is to provide a matching device with a built-in coil that can be easily attached to and detached from a vacuum chamber, and a plasma CVD device that can be easily assembled and disassembled, while solving the above-mentioned problems of the prior art. It is in.

[0008]

A matching device with a built-in coil according to the present invention comprises a bottomed cylindrical body, a plasma generating coil mounted in a plasma generating chamber of a vacuum chamber, and a coil connected to the coil. And a matching device for impedance matching. The cylindrical body may be a cylinder or a square tube, or may be a box having an open surface. Since the matching device and the coil are integrated by incorporating the coil in the cylindrical body, the matching device with the built-in coil can be easily attached to and detached from the vacuum chamber.

[0009] A matching device with a built-in coil according to the present invention comprises a cylindrical body having a bottom and a coil for plasma generation built in the cylindrical body and mounted on the outer periphery of a plasma generation chamber provided in a vacuum chamber. And a matching device built in the tubular body, connected to the coiled pipe to match the input impedance, and the matching device is supplied with high-frequency power output from a high-frequency oscillator outside the tubular body. It has a connection terminal for connecting a coaxial cable to be transmitted, and a one-touch joint for connecting a cooling pipe outside the cylindrical body to the coil pipe for plasma generation with one touch.

The matching device with built-in coil is mounted on the vacuum chamber so that the built-in coiled pipe is mounted on the outer periphery of the plasma generating chamber. It is only necessary to connect an external cooling pipe to the coiled pipe of the mold matching device with a one-touch type joint, and connect the coaxial cable of the high-frequency oscillator to the connection portion. Conversely, for removal, remove the cooling pipe from the one-touch type joint, remove the coaxial cable of the high-frequency oscillator from the connection part, and then evacuate the coil built-in type matcher so that the built-in coiled pipe can be removed from the plasma generation chamber. Just remove it from the chamber.

Therefore, since the matching device and the coiled pipe can be handled integrally, the matching device and the coiled pipe are formed separately, connected to each other by a copper plate, and further assembled by a cover to cover the copper plate. Plasma C
The assembly and disassembly work of the VD device becomes extremely easy. In addition, since the coil-shaped pipe is built in the tubular body and does not go outside, it is not erroneously deformed, and therefore, generation and state of plasma after attaching and detaching are not changed.

Further, in the plasma CVD apparatus according to the present invention, the coil built-in type matching device according to claim 2 is detachably attached to a vacuum chamber provided with a plasma generating chamber. Since an integrated coil-type matching device incorporating a coiled pipe is provided, the structure of the device can be simplified.

Further, in the plasma CVD apparatus of the present invention, a coaxial cable of a high-frequency oscillator is connected to the matching device of the built-in coil type matching device via a connection terminal, and the coiled pipe of the matching device of the built-in coil type is one-touch. A cooling pipe is connected by a type joint.

[0014]

Embodiments of the present invention will be described with reference to FIG. In FIG. 1 (a), a vacuum chamber 2 made of aluminum for accommodating a wafer 1 has a lid 3 at an upper part,
A cylindrical plasma generation chamber 4 protrudes from the lid 3.
A non-metal window 12 is fitted in the plasma generation chamber 4.

On the upper part of the vacuum chamber 2, a coil-integrated matching device 3 in which a coiled pipe 22 and a matching device 30 are integrated.
1 is attached. The coil-integrated matching device 31 includes an aluminum tubular body 21 having an upper portion closed and an opened lower portion, and is detachably mounted on the lid 3 so that the tubular member 21 covers the plasma generation chamber 4. It is attached. The tubular body 21 has a built-in coil-shaped metal pipe 22 for plasma generation that fits completely around the plasma generation chamber 4 of the lid 3.

The metal pipe 22 is made of an insulating material 2 such as plastic which covers the outer periphery of the plasma generation chamber 4 of the lid 3.
9 so as not to conduct with the vacuum chamber 2. The metal pipe 22 is also made of an aluminum cylindrical body 21.
In order to insulate the pipe, the upstream and downstream sides are converted into an insulating pipe 23 made of Teflon or the like via a joint 24. The insulating pipe 23 further includes a cooling pipe 1 for flowing cooling water from the outside of the tubular body 21 into the coiled pipe 22.
3 is connected to a one-touch joint 27 for one-touch connection. This one-touch type joint 27 is a cylindrical body 2
1 is fixed outside. A coupler joint is preferable as the one-touch joint.

A coaxial cable 8 for transmitting high-frequency power output from the high-frequency oscillator 7 is provided outside the cylindrical body 21.
Are connected to each other.
A generally used BNC terminal is preferable as the connection terminal. A matching device 30 for matching the input impedance of the high-frequency oscillator 7 is connected by a copper plate 25 between the connection terminal 28 and the coiled pipe 22. That is, the connection terminal 28 is connected to the metal pipe 22 on the upstream side with the copper plate 25, and the copper plate 25 and the metal pipe 22 on the downstream side are grounded via the variable capacitors 26, 26, respectively.

As described above, the matching device 31 with a built-in coil according to the present embodiment is an integrated device of the matching device 30 and the coiled pipe 22, and the cylindrical body 21 in which the matching device 30 is housed.
A coil-shaped metal pipe 22 is built in the inside,
The metal pipe 22 is fixed to the tubular body 21 after the conversion of the insulating pipe, is connected to the cooling pipe 13 outside the tubular body 21 by a one-touch type joint 27, and the coaxial cable 8 of the high-frequency oscillator 7 is connected to the connection terminal 28. They are connected. For this reason, as shown in FIG. 1 (b), when mounted in the vacuum chamber 2, the matching device 31 with a built-in coil is placed right above the vacuum chamber 2 and the coiled pipe 22 in the matching device with a built-in coil is connected to the vacuum chamber. After the matching device 31 with a built-in coil is attached so that it fits perfectly around the plasma generation chamber 4 of the lid 3, the one-touch joint 27 is used to connect the insulating pipe 23 fixed to the cylindrical body 21 and the external cooling pipe 13. , And the coaxial cable 8 of the high-frequency oscillator 7 and the copper plate 25 are connected by the connection terminal 28 and finally grounded.

In addition, in the detachment at the time of maintenance, the one-touch type joint 27 is detached to separate the insulating pipe 23 and the cooling pipe 13 of the coil-integrated matching box 31, and the coaxial cable 8 of the high-frequency oscillator 7 is detached from the connection terminal 28. After the grounding is released, it is only necessary to remove the coil-integrated matcher so that the coiled pipe 22 in the coil-integrated matcher can be completely removed from the outer periphery of the plasma generation chamber 4 of the lid 3.

Therefore, in any case, it is only necessary to attach or detach the integrated coil-integrated matcher to or from the vacuum chamber as it is, and to assemble or disassemble the cover using a large number of screws as in the prior art. Alternatively, troublesome work of attaching and detaching a copper plate or a cooling water joint connected by screws is eliminated. In addition, since the coil-shaped pipe 22 for generating plasma is built in the coil-integrated matching device 31, the coil-shaped pipe 22 is not exposed to the outside during maintenance, and is erroneously deformed by applying an external force. For example, the generation of plasma and the state are not changed.

Further, the metal pipe 22 is formed of the insulating pipe 2.
3, since it is insulated from the metal tubular body 21, safety when the matching device 30 and the pipe 22 are integrated can be ensured. Further, since the copper plate 25 connected to the coiled pipe 22 is built in the tubular body 21, the distance between the copper plates 25 can be reduced.

In the above embodiment, the case where the plasma generating chamber is provided at the upper part of the vacuum chamber has been described. However, the present invention is not limited to this, and the plasma generating chamber may be provided at the left, right, or lower part. Also applicable to

[0023]

According to the present invention, the coiled pipes are built in the matching device so that they can be integrally handled, so that the coiled pipes are separately provided and required to be assembled and disassembled. The built-in matching device can be easily attached to and detached from the vacuum chamber, and the assembly and disassembly of the plasma CVD device during maintenance can be performed easily and in a short time.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view showing an embodiment of a plasma CVD apparatus, in which (a) shows a state in which a built-in coil-type matching box is attached to a vacuum chamber, and (b) shows a state in which the built-in coil-type matching box is removed from the vacuum chamber. It shows the state that it was turned on.

FIG. 2 is a schematic sectional view showing a conventional example of a plasma CVD apparatus.

[Explanation of symbols]

 2 Vacuum chamber 3 Lid 7 High frequency oscillator 8 Coaxial cable 13 Cooling pipe 21 Tubular body 22 Coiled pipe 23 Insulated pipe 25 Copper plate 27 One-touch joint 28 Connection terminal 29 Insulating substance 30 Matching device

Claims (4)

[Claims] 1. A built-in coil having a bottomed tubular body and a built-in plasma generating coil mounted in a plasma generating chamber of a vacuum chamber and an impedance matching device connected to the coil. Type matching device. 2. A cylindrical body having a bottom, a coiled pipe for plasma generation built in the cylindrical body and mounted on an outer periphery of a plasma generation chamber provided in a vacuum chamber, and built in the cylindrical body. A matching device connected to the coiled pipe for matching input impedance; and a connection terminal for connecting a coaxial cable transmitting high-frequency power output from a high-frequency oscillator outside the cylindrical body to the matching device. A matching device with a built-in coil, comprising: a one-touch joint for connecting a cooling pipe outside the cylindrical body to the coiled pipe for plasma generation with a single touch. 3. A vacuum chamber provided with a plasma generation chamber,
A plasma CVD apparatus to which the matching device with a built-in coil according to claim 2 is detachably attached. 4. The plasma CVD apparatus according to claim 3, further comprising connecting a coaxial cable of a high-frequency oscillator via a connection terminal to a matching device of said built-in coil type matching device. A plasma CVD device in which a cooling pipe is connected to the pipe by a one-touch type joint.