JP2942431B2 - Liquid crystal display - Google Patents

Liquid crystal display

Info

Publication number
JP2942431B2
JP2942431B2 JP5010802A JP1080293A JP2942431B2 JP 2942431 B2 JP2942431 B2 JP 2942431B2 JP 5010802 A JP5010802 A JP 5010802A JP 1080293 A JP1080293 A JP 1080293A JP 2942431 B2 JP2942431 B2 JP 2942431B2
Authority
JP
Japan
Prior art keywords
liquid crystal
crystal display
display device
resin
siox
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5010802A
Other languages
Japanese (ja)
Other versions
JPH06222348A (en
Inventor
俊生 福地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Consejo Superior de Investigaciones Cientificas CSIC
Original Assignee
Consejo Superior de Investigaciones Cientificas CSIC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consejo Superior de Investigaciones Cientificas CSIC filed Critical Consejo Superior de Investigaciones Cientificas CSIC
Priority to JP5010802A priority Critical patent/JP2942431B2/en
Publication of JPH06222348A publication Critical patent/JPH06222348A/en
Application granted granted Critical
Publication of JP2942431B2 publication Critical patent/JP2942431B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、オフィスオートメーシ
ョン機器等各種電子機器に使用される液晶表示装置、詳
しくは樹脂基板よりなる液晶表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device used for various electronic devices such as office automation devices, and more particularly to a liquid crystal display device made of a resin substrate.

【0002】[0002]

【従来の技術】例えば、近年のオフィスオートメーショ
ン機器においては、ノートサイズ化、パームトップサイ
ズ化等の軽量小型化に対応して液晶表示装置の薄型化及
び軽量化が望まれていた。
2. Description of the Related Art For example, in recent office automation equipment, there has been a demand for a thinner and lighter liquid crystal display device corresponding to a lighter and smaller size such as a notebook size and a palmtop size.

【0003】そして、液晶表示装置の薄型化及び軽量化
を達成するための液晶表示装置の基板として樹脂基板が
用いられていた。
[0003] A resin substrate has been used as a substrate of a liquid crystal display device for achieving a reduction in thickness and weight of the liquid crystal display device.

【0004】[0004]

【発明が解決しようとする課題】基板として樹脂を使用
した場合、液晶表示装置の薄型化及び軽量化を達成する
ことはできるが、樹脂基板の場合にはガス,水等に対す
る遮蔽性が低いという問題があった。
When a resin is used as the substrate, the liquid crystal display can be made thinner and lighter, but the resin substrate has a low shielding property against gas, water and the like. There was a problem.

【0005】そこで、樹脂基板上にポリビニルアルコー
ル(以下PVAと称す)系等の樹脂層を形成し、遮蔽性
の向上を図っていた。
Therefore, a resin layer of polyvinyl alcohol (hereinafter referred to as PVA) or the like is formed on a resin substrate to improve the shielding property.

【0006】しかしながら、例えばポリエーテルスルホ
ンからなる樹脂基板にPVAからなる樹脂膜を形成して
も、40° C、 95%RHの条件でガス(O2 )バリ
ア性は約0.5cc/m2 ・24Hr・Atm、水(H
2O) についての透湿性は数g/m2 ・24Hrである
ため、遮蔽性は良好とはいえず、40°C、95%RH
の条件下では液晶表示装置のセル内に水、O2 等が侵入
し、液晶層に気泡が発生し、表示品位が低下するという
問題があった。
However, even when a resin film made of PVA is formed on a resin substrate made of polyether sulfone, for example, the gas (O 2 ) barrier property is about 0.5 cc / m 2 at 40 ° C. and 95% RH.・ 24Hr ・ Atm, water (H
Since the moisture permeability of 2 O) is several g / m 2 · 24Hr, it cannot be said that the shielding property is good, and the temperature is 40 ° C. and 95% RH.
Under the condition (1), there is a problem that water, O 2, and the like enter the cells of the liquid crystal display device, bubbles are generated in the liquid crystal layer, and the display quality deteriorates.

【0007】また、発明者等は実願平3−70458号
において樹脂基板の表面にSiO2の単層膜を形成する
ことで表示品位を向上させることを提案したが、この場
合透明電極の耐クラック性には言及していなかった。
In addition, the present inventors have proposed in Japanese Utility Model Application No. 3-70458 to improve the display quality by forming a single layer film of SiO 2 on the surface of a resin substrate. No mention was made of cracking.

【0008】[0008]

【課題を解決するための手段】本発明は、上記従来の欠
点を解決するためになされたものであり、樹脂からなる
一対の透明基板の間に液晶層を介在してなる液晶表示装
置において、前記一対の透明基板両表面にSiNX
SiOXの積層膜が形成され、前記SiN X は前記透明基
板界面の密着性を向上させるために前記透明基板と前記
SiO X との間に形成されていることを特徴とするもの
である。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional drawbacks, and has been made in view of the above. A liquid crystal having a liquid crystal layer interposed between a pair of transparent substrates made of resin. In the display device, a laminated film of SiN x and SiO x is formed on both surfaces of the pair of transparent substrates , and the SiN x is a transparent substrate.
In order to improve the adhesion of the plate interface, the transparent substrate and the
It is characterized by being formed between SiO X.

【0009】[0009]

【作用】本発明によれば、SiN X が透明基板とSiO X
との間に形成されていることにより、SiN X をスパッ
タ法によって形成する際に必要となる窒素プラズマは透
明基板表面を損傷することがなく、透明基板界面の密着
性を向上させることができる。したがって、SiO X
に形成される透明電極の耐クラック性を向上させること
ができる。
According to the present invention, SiN x is made of a transparent substrate and SiO x
Is formed between the SiN x
Nitrogen plasma required when forming by the
Clear adhesion at the transparent substrate interface without damaging the substrate surface
Performance can be improved. Therefore, on the SiO X
Can Rukoto improve the crack resistance of a transparent electrode formed.

【0010】[0010]

【実施例】以下、本発明の実施例について図面を参照し
て説明する。図1は、本発明の一実施例を示す液晶表示
装置1の断面図である。ポリエーテルスルホン、エポキ
シ系樹脂、アルキル系樹脂等の樹脂で一対の透明基板
2,3を形成する。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a liquid crystal display device 1 showing one embodiment of the present invention. A pair of transparent substrates 2 and 3 are formed of a resin such as polyether sulfone, epoxy resin, or alkyl resin.

【0011】前記基板2,3のそれぞれの表裏両表面に
SiNxとSiOxの積層膜4a,4bを形成する。
On both front and back surfaces of the substrates 2 and 3, laminated films 4a and 4b of SiNx and SiOx are formed.

【0012】前記SiNxとSiOxの積層膜を形成し
た基板2,3のそれぞれの片面に透明な帯状電極5,6
を形成し、その後配向膜7,8を形成する。
Transparent strip electrodes 5 and 6 are formed on one surface of each of the substrates 2 and 3 on which the laminated film of SiNx and SiOx is formed.
Is formed, and then the alignment films 7 and 8 are formed.

【0013】前記基板2,3を前記透明電極5,6が直
交するように対向して配置し、該基板2,3間にスペー
サ10を介在させてシール材11により両基板を貼り合
わせる。 次に、両基板2,3間の液晶注入空間9に液
晶12を注入して液晶表示セル1aができあがる。でき
あがった液晶表示セル1aの基板2,3の外表面側に偏
光板13,14を配置する。
The substrates 2 and 3 are opposed to each other so that the transparent electrodes 5 and 6 are orthogonal to each other, and the substrates 2 and 3 are bonded to each other by a sealing material 11 with a spacer 10 interposed therebetween. Next, the liquid crystal 12 is injected into the liquid crystal injection space 9 between the two substrates 2 and 3 to complete the liquid crystal display cell 1a. Polarizing plates 13 and 14 are arranged on the outer surfaces of the substrates 2 and 3 of the completed liquid crystal display cell 1a.

【0014】前記SiNxとSiOxの積層膜4a,4
bは、スパッタ法により前記基板2,3の表面に緻密に
形成される。SiNxとSiOxの積層膜4a,4bの
トータル膜厚は100〜1000Å、好ましくは200
〜600Åの膜厚で形成される。尚、SiNxとSiO
xの膜厚比は1対2が好ましい。
The laminated films 4a, 4 of SiNx and SiOx
b is densely formed on the surfaces of the substrates 2 and 3 by a sputtering method. The total film thickness of the stacked films 4a and 4b of SiNx and SiOx is 100 to 1000, preferably 200.
It is formed with a thickness of up to 600 °. Note that SiNx and SiO
The thickness ratio of x is preferably 1: 2.

【0015】膜厚が100Å未満であった場合にはガス
及び水等に対する遮蔽性が低く、逆に1000Åを越え
ればSiNxとSiOxの積層膜4a,4bに亀裂が生
じる。基板上に形成する膜をSiNxとSiOxの積層
膜としたのは、透明電極の耐クラック性向上のためであ
る。
If the film thickness is less than 100 °, the shielding property against gas and water is low, and if it exceeds 1000 °, cracks are generated in the laminated films 4a and 4b of SiNx and SiOx. The film formed on the substrate is a laminated film of SiNx and SiOx in order to improve the crack resistance of the transparent electrode.

【0016】樹脂基板上にガスバリアとしてのSiOx
無機単層膜及び透明電極(ITO)をスパッタ法により
形成する場合に必要となる酸素プラズマは、樹脂基板表
面を損傷する傾向にあるので膜形成後の密着性が悪く、
高温高湿下でクラックが発生する確率が高くなる。
SiOx as a gas barrier on a resin substrate
Oxygen plasma required when forming an inorganic single layer film and a transparent electrode (ITO) by a sputtering method tends to damage the resin substrate surface, so that the adhesion after film formation is poor,
Cracks are more likely to occur under high temperature and high humidity.

【0017】そこで、本発明においては酸素プラズマを
窒素プラズマに変えることで樹脂基板表面を損傷するこ
となくSiNx膜を形成することができ、その膜上にS
iOx、ITO膜と順次積層形成することで、樹脂基板
界面の密着性を向上させることができる。即ち透明電極
の耐クラック性を向上させた液晶表示装置1を提供する
ことが可能となる。
Therefore, in the present invention, the SiNx film can be formed without damaging the surface of the resin substrate by changing the oxygen plasma to the nitrogen plasma.
By sequentially laminating the iOx and the ITO film, the adhesion at the resin substrate interface can be improved. That is, it is possible to provide the liquid crystal display device 1 in which the crack resistance of the transparent electrode is improved.

【0018】SiOX 単層膜と、SiNxとSiOxの
積層膜の場合の高温高湿下でのITO膜の耐クラック性
の比較データを表1に示すが、SiNxとSiOxの積
層膜の方が耐クラック性が大幅に向上していることがわ
かる。
[0018] and SiO X monolayer film, although the comparative data of the crack resistance of the ITO film under high temperature and high humidity in the case of a laminated film of SiNx and SiOx shown in Table 1, the direction of the laminated film of SiNx and SiOx It can be seen that the crack resistance is significantly improved.

【0019】[0019]

【表1】 [Table 1]

【0020】また、膜厚が400Åの緻密なSiNxと
SiOxの積層膜4a,4bをアクリル系樹脂基板2,
3上に形成した場合、40°C、90%RHの条件でガ
ス(O2 )バリア性は0.1CC/m2 ・24Hr・At
m、透湿(H2O)性は0.05g/m2 ・24Hrであ
り、従来のものがガスバリア性が約0.5cc/m2
24Hr・Atm、透湿性が数g/m2 ・24Hrであ
ったのに対して、ガス及び水の遮蔽性が向上しているこ
とがわかる。
A dense SiNx / SiOx laminated film 4a, 4b having a thickness of 400.degree.
3, the gas (O 2 ) barrier property is 0.1 CC / m 2 · 24Hr · At under conditions of 40 ° C. and 90% RH.
m, the moisture permeability (H 2 O) is 0.05 g / m 2 · 24Hr, and the conventional one has a gas barrier property of about 0.5 cc / m 2 ·
24Hr · Atm and moisture permeability of several g / m 2 · 24Hr, it can be seen that gas and water shielding properties are improved.

【0021】したがって、液晶表示セル1a内にガスや
水が侵入することがなく液晶表示装置の表示品位を向上
させることができる。
Therefore, the display quality of the liquid crystal display device can be improved without gas or water entering the liquid crystal display cell 1a.

【0022】図2は、本発明の他の実施例を示す液晶表
示装置21の断面図である。前記第1の実施例と同じ部
材には同一の記号を付す。
FIG. 2 is a sectional view of a liquid crystal display 21 showing another embodiment of the present invention. The same members as those in the first embodiment are denoted by the same symbols.

【0023】前記液晶表示装置21においては、樹脂基
板2,3の両表面だけでなく、端面部にもSiO2 ,S
iNxとSiOxの積層膜、またはポリビニールアルコ
ール等からなる樹脂膜15a,15bが形成されてい
る。こうすることによって、基板2,3の遮蔽性がさら
に向上する。
In the liquid crystal display device 21, not only both surfaces of the resin substrates 2 and 3 but also SiO 2 , S
Resin films 15a and 15b made of a laminated film of iNx and SiOx or polyvinyl alcohol are formed. By doing so, the shielding properties of the substrates 2 and 3 are further improved.

【0024】本実施例においては、単純マトリクス型の
液晶表示装置を例に説明したけれども、これに限定され
るものではなく、他の液晶表示装置例えばアクティブマ
トリクス型液晶表示装置等でも同様の効果を得ることが
できる。
In this embodiment, a simple matrix type liquid crystal display device has been described as an example. However, the present invention is not limited to this, and similar effects can be obtained with other liquid crystal display devices such as an active matrix type liquid crystal display device. Obtainable.

【0025】[0025]

【発明の効果】本発明の液晶表示装置によれば、樹脂性
の基板表面にSiNxとSiOxの積層膜が形成されて
いるため、ガス及び水に対する遮蔽性が向上し、液晶セ
ル内にガスや水が侵入することがなくなり、液晶表示装
置の表示品位が向上する。
According to the liquid crystal display device of the present invention, since a laminated film of SiNx and SiOx is formed on the surface of the resinous substrate, the shielding property against gas and water is improved, and gas and water are contained in the liquid crystal cell. Water does not enter, and the display quality of the liquid crystal display device is improved.

【0026】また、従来のSiO2 単層膜のものに比べ
て耐クラック性を向上させた高信頼性の液晶表示装置を
提供することができる。
Further, it is possible to provide a highly reliable liquid crystal display device having improved crack resistance as compared with a conventional SiO 2 single layer film.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る液晶表示装置の一実施例を示す断
面図である。
FIG. 1 is a sectional view showing one embodiment of a liquid crystal display device according to the present invention.

【図2】本発明に係る液晶表示装置の他の実施例を示す
断面図である。
FIG. 2 is a sectional view showing another embodiment of the liquid crystal display device according to the present invention.

【符号の説明】[Explanation of symbols]

1,21 液晶表示装置 2,3 基板 4a,4b SiNxとSiOxの積層膜 1,21 liquid crystal display device 2,3 substrate 4a, 4b laminated film of SiNx and SiOx

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 樹脂からなる一対の透明基板の間に液晶
層を介在してなる液晶表示装置において、 前記一対の透明基板両表面にSiNXとSiOXの積層
膜が形成され、前記SiN X は前記透明基板界面の密着
性を向上させるために前記透明基板と前記SiO X との
間に形成されていることを特徴とする液晶表示装置。
1. A liquid crystal display device between a pair of transparent substrate made of a resin formed by interposing a liquid crystal layer, a laminated film of SiN X and SiO X is formed on both surfaces of the pair of transparent substrates, the SiN X is the adhesion at the transparent substrate interface
Between the transparent substrate and the SiO X in order to improve the
A liquid crystal display device formed between the liquid crystal display devices.
JP5010802A 1993-01-26 1993-01-26 Liquid crystal display Expired - Fee Related JP2942431B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5010802A JP2942431B2 (en) 1993-01-26 1993-01-26 Liquid crystal display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5010802A JP2942431B2 (en) 1993-01-26 1993-01-26 Liquid crystal display

Publications (2)

Publication Number Publication Date
JPH06222348A JPH06222348A (en) 1994-08-12
JP2942431B2 true JP2942431B2 (en) 1999-08-30

Family

ID=11760474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5010802A Expired - Fee Related JP2942431B2 (en) 1993-01-26 1993-01-26 Liquid crystal display

Country Status (1)

Country Link
JP (1) JP2942431B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07110509B2 (en) * 1992-02-05 1995-11-29 日精樹脂工業株式会社 Clamping device for injection molding machine
JP2003050382A (en) * 2001-05-31 2003-02-21 Sumitomo Bakelite Co Ltd Display panel
JP2019149384A (en) * 2019-05-29 2019-09-05 株式会社半導体エネルギー研究所 Light-emitting device

Also Published As

Publication number Publication date
JPH06222348A (en) 1994-08-12

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