WO2012077675A1

WO2012077675A1 - Polarizing plate, method for producing same, liquid crystal panel provided with polarizing plate, and liquid crystal display device and electronic instrument comprising same

Info

Publication number: WO2012077675A1
Application number: PCT/JP2011/078173
Authority: WO
Inventors: 彰規伊藤; 柴田　諭
Original assignee: シャープ株式会社
Priority date: 2010-12-10
Filing date: 2011-12-06
Publication date: 2012-06-14

Abstract

A polarizing plate comprises a substrate transparent to incident light, and a one-dimensional lattice-shaped metal layer formed on the substrate, wherein the pitch of the one-dimensional lattice-shaped metal layer is less than the wavelength of the incident light.

Description

Polarizing plate and manufacturing method thereof, liquid crystal panel including polarizing plate, liquid crystal display device including the same, and electronic device

The present invention relates to a polarizing plate and a manufacturing method thereof, a liquid crystal panel including the polarizing plate, a liquid crystal display device including the same, and an electronic apparatus.
This application claims priority based on Japanese Patent Application No. 2010-276237 filed in Japan on Dec. 10, 2010 and Japanese Patent Application No. 2010-276238 filed on Dec. 10, 2010 in Japan. And the contents thereof are incorporated herein.

A liquid crystal cell incorporated in a liquid crystal display device is roughly composed of a liquid crystal layer and two polarizing plates arranged so as to sandwich the liquid crystal layer.
As a polarizing plate, for example, an absorption anisotropy obtained by adsorbing iodine (I) compound molecules on a polymer sheet and then stretching the polymer sheet to orient the iodine (I) compound molecules is obtained. The one used is used.
The polarizing plate has a polarization characteristic that absorbs light of a component parallel to the absorption axis (stretching direction) of incident light and transmits light of a component orthogonal to the absorption axis. In principle, such an absorption-type polarizing plate has a transmittance that does not exceed 50% when non-polarized light such as natural light is incident.
Therefore, in order to improve the luminance of the liquid crystal display device without increasing the power consumption amount while reducing the power consumption of the liquid crystal display device, it is necessary to use the polarization component absorbed by the polarizing plate. It is considered effective.

On the other hand, a liquid crystal display device is known in which an absorption type polarizing plate is provided with a reflection type polarizing plate that reflects the absorbed polarized component at a position closer to the light source than the liquid crystal cell. As the reflective polarizing plate, for example, a wire grid type polarizing plate having a structure in which a large number of thin metal lines are provided in parallel is known.
As a wire grid type polarizing plate, for example, a fine structure forming a lattice groove pattern is formed on a glass substrate, and the fine structure is made of aluminum oxide (for example, patents). Reference 1).

Japanese Patent Application Laid-Open No. 2004-4621

Since the outermost surface of the polarizing plate of Patent Document 1 is made of aluminum oxide, optical properties such as transmittance and contrast are low, and sufficient performance cannot be obtained to improve the luminance of the liquid crystal display device.
Moreover, in the conventional polarizing plate, in order to form a linear groove pattern, a pressing member made of a hard material such as silicon carbide (SiC) is pressed on the surface of the metal layer, and the surface has a regular arrangement. A nanoimprint method for forming a recess and a pattern formation method using a positive photosensitive resist have been used. However, these groove pattern forming methods have a problem that the number of processes is increased when a polarizing plate having a large area is produced.

The present invention has been made to solve the above-described problems, and a polarizing plate excellent in optical characteristics such as transmittance and contrast, a manufacturing method thereof, a liquid crystal panel including the polarizing plate, and a liquid crystal including the same It is an object to provide a display device and an electronic device.

(1) The manufacturing method of the polarizing plate by the 1st aspect of this invention uses the process which forms a metal layer on a board | substrate, the process which forms an insulating layer on the said metal layer, and the said insulating layer using nervaf A step of forming a one-dimensional lattice-like insulating layer on the metal layer by buffing, and using the substrate on which the metal layer and the one-dimensional lattice-like insulating layer are formed as an anode, The surface of the metal layer is anodized in a state where the surface on which the metal layer and the one-dimensional lattice-like insulating layer are formed and the cathode face each other, thereby the one-dimensional lattice-like shape in the metal layer. A step of forming a porous metal oxide layer in a portion facing the gap of the insulating layer and in the vicinity thereof, and a step of removing the insulating layer by etching.

(2) In the method of manufacturing a polarizing plate according to the first aspect, the metal layer is formed into a one-dimensional lattice by removing the metal oxide layer by etching using the one-dimensional lattice-shaped insulating layer as a mask. You may make it comprise the process processed into.

(3) Moreover, the manufacturing method of the polarizing plate according to the first aspect may include a step of forming a conductive layer on the substrate before the step of forming the metal layer on the substrate. good.

(4) Moreover, in the manufacturing method of the polarizing plate by a 1st aspect, you may make it use the said electroconductive layer as an anode in the process of forming the said metal oxide layer.

(5) Moreover, in the manufacturing method of the polarizing plate according to the first aspect, in the step of processing the metal layer into a one-dimensional lattice, the metal oxide layer and the metal oxide layer in the conductive layer are formed. You may make it remove the part which opposes.

(6) The polarizing plate according to the second aspect of the present invention includes a substrate transparent to incident light, and a one-dimensional lattice-shaped metal layer formed on the substrate, and the one-dimensional lattice-shaped substrate. The pitch of the metal layer is smaller than the wavelength of incident light.

(7) In the polarizing plate according to the second aspect, the one-dimensional lattice-shaped metal layer is obtained by buffing an insulating layer formed on the metal layer formed on the substrate using nervuff. By forming a one-dimensional lattice-like insulating layer on the metal layer, and using the metal layer and the substrate on which the one-dimensional lattice-like insulating layer is formed as an anode, the metal layer and the one-dimensional in the substrate By anodizing the surface layer of the metal layer in a state where the surface on which the lattice-like insulating layer is formed and the cathode face each other, the surface of the metal layer faces the gap between the one-dimensional lattice-like insulating layers. It may be formed by forming a porous metal oxide layer in a portion and the vicinity thereof, removing the metal oxide layer by etching using the one-dimensional lattice-like insulating layer as a mask.

(8) In the polarizing plate according to the second aspect, a conductive layer may be formed between the substrate and the metal layer.

(9) The polarizing plate according to the second aspect may further include a metal oxide layer interposed between the metal layers.

(10) Further, in the polarizing plate according to the second aspect, the one-dimensional lattice-shaped metal layer is obtained by buffing an insulating layer formed on the metal layer formed on the substrate using nervuff. By forming a one-dimensional lattice-like insulating layer on the metal layer, the metal layer and the substrate on which the one-dimensional lattice-like insulating layer is formed as an anode, and the metal layer and the primary in the substrate By anodizing the surface layer of the metal layer in a state where the surface on which the original lattice-like insulating layer is formed and the cathode face each other, the metal layer faces the gap between the one-dimensional lattice-like insulating layers. It may be formed by forming a porous metal oxide layer in the vicinity and in the vicinity thereof.

(11) In the polarizing plate according to the second aspect, a conductive layer may be interposed between the substrate, the metal layer, and the metal oxide layer.

(12) A liquid crystal panel according to a third aspect of the present invention includes a substrate transparent to incident light, and a one-dimensional lattice-shaped metal layer formed on the substrate, the one-dimensional lattice-shaped The pitch of the metal layer includes a polarizing plate smaller than the wavelength of incident light.

(13) A liquid crystal panel according to a fourth aspect of the present invention includes a substrate transparent to incident light, and a one-dimensional lattice-shaped metal layer formed on the substrate, the one-dimensional lattice-shaped The pitch of the metal layer includes a liquid crystal panel having a polarizing plate smaller than the wavelength of incident light.

(14) A liquid crystal panel according to a fifth aspect of the present invention includes a substrate transparent to incident light, and a one-dimensional lattice-shaped metal layer formed on the substrate, the one-dimensional lattice-shaped The pitch of the metal layer includes a liquid crystal display device having a liquid crystal panel having a polarizing plate smaller than the wavelength of incident light.

According to the present invention, a polarizing plate with high brightness can be obtained as compared with a conventional absorption type polarizing plate. Therefore, it is possible to increase the brightness of the liquid crystal display device, and it is possible to display a clear black with high contrast.

It is a top view which shows schematic structure of the polarizing plate of 1st Embodiment. FIG. 2 is a diagram illustrating a schematic configuration of a polarizing plate according to the first embodiment, and is a cross-sectional view taken along line AA of FIG. 1A. It is a schematic perspective view which shows the effect | action of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 1st Embodiment. It is a schematic perspective view which shows anodization in the manufacturing method of the polarizing plate of 1st Embodiment. It is a top view which shows schematic structure of the polarizing plate of 2nd Embodiment. It is a figure which shows schematic structure of the polarizing plate of 2nd Embodiment, Comprising: It is sectional drawing which follows the BB line of FIG. 12A. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 2nd Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 2nd Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 2nd Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 2nd Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 2nd Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 2nd Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 2nd Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 1st Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 2nd Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 3rd Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 4th Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 5th Embodiment. It is a schematic perspective view which shows an example of the electronic device provided with the liquid crystal display device. It is a schematic perspective view which shows another example of the electronic device provided with the liquid crystal display device. It is a schematic perspective view which shows another example of the electronic device provided with the liquid crystal display device. It is a schematic perspective view which shows another example of the electronic device provided with the liquid crystal display device. It is a top view which shows schematic structure of the polarizing plate of 6th Embodiment. FIG. 26 is a diagram illustrating a schematic configuration of a polarizing plate according to a sixth embodiment, and is a cross-sectional view taken along line A1-A1 of FIG. 26A. It is a schematic perspective view which shows the effect | action of the polarizing plate of 6th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 6th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 6th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 6th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 6th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 6th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 6th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 6th Embodiment. It is a schematic perspective view which shows anodization in the manufacturing method of the polarizing plate of 6th Embodiment. It is a top view which shows schematic structure of the polarizing plate of 7th Embodiment. FIG. 36 is a diagram illustrating a schematic configuration of a polarizing plate according to a seventh embodiment, and is a cross-sectional view taken along line B1-B1 of FIG. 36A. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 7th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 7th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 7th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 7th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 7th Embodiment. It is a schematic sectional drawing which shows the manufacturing method of the polarizing plate of 7th Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 6th Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 7th Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 8th Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 9th Embodiment. It is a schematic sectional drawing which shows the liquid crystal display device of 10th Embodiment. It is a schematic perspective view which shows an example of the electronic device provided with the liquid crystal display device. It is a schematic perspective view which shows another example of the electronic device provided with the liquid crystal display device. It is a schematic perspective view which shows another example of the electronic device provided with the liquid crystal display device. It is a schematic perspective view which shows another example of the electronic device provided with the liquid crystal display device.

"Polarizer"
(1) 1st Embodiment FIG. 1: A and FIG. 1B are figures which show schematic structure of the polarizing plate of 1st Embodiment. 1A is a plan view, and FIG. 1B is a cross-sectional view taken along line AA in FIG. 1A.
The polarizing plate 10 according to the first embodiment is roughly composed of a substrate 11, a one-dimensional lattice-shaped metal layer 12 formed on the substrate 11, and a conductive layer 13 formed between the substrate 11 and the metal layer 12. It is configured.
That is, in the polarizing plate 10, the conductive layer 13 and the metal layer 12 are sequentially formed on one surface 11 a of the substrate 11, and the laminate 14 including the conductive layer 13 and the metal layer 12 forms a one-dimensional lattice. Yes.
Note that the stacked body 14 having a one-dimensional lattice shape means that a large number of linear stacked bodies 14 are formed at regular intervals and in parallel, that is, periodically.

That is, when the polarizing plate 10 is viewed from the one surface 11 a side of the substrate 11, the metal layer 12 and the conductive layer 13 are completely overlapped, and the conductive layer 13 does not protrude from the metal layer 12.
Thereby, the adjacent laminated bodies 14 are formed in a state of being separated from each other, and a linear groove (gap) 14 a is formed between the laminated bodies 14.
Further, the extending direction of the one-dimensional lattice-shaped laminate 14 is the absorption axis direction of the polarizing plate 10, and the direction perpendicular to the extending direction of the laminate 14 is the transmission axis direction of the polarizing plate 10.

Moreover, the laminated body 14 and the groove | channel 14a between them are formed with the manufacturing method of the polarizing plate mentioned later.

The pitch P ₁ of the laminate 14 is not particularly limited as long as it is smaller than the wavelength of incident light with respect to the polarizing plate 10. For example, when the polarizing plate 10 is used as a polarizing plate for general visible light (light having a wavelength of about 380 nm to 780 nm), the pitch P ₁ is preferably 100 nm to 150 nm.
Further, the width W ₁ of the laminate 14 is preferably about 1/10 of the wavelength of the incident light with respect to the polarizing plate 10, and is preferably 40 nm to 80 nm.

The thickness of the stacked body 14 is determined by the thicknesses of the metal layer 12 and the conductive layer 13 constituting the stacked body 14, but is preferably 1000 nm to 3500 nm.
The thickness of the metal layer 12 is not particularly limited, but is preferably 1 μm to 3 μm.
The thickness of the conductive layer 13 is not particularly limited, but is preferably 50 nm to 200 nm.

The substrate 11 is not particularly limited as long as it is a transparent substrate, but a substrate having high visible light transmittance and excellent heat resistance and impact resistance is preferable. Examples of such substrate 11 include substrates made of inorganic materials such as glass and quartz, polycarbonate, polyethylene terephthalate, polyethylene naphthalate, polyarylate, polyether ketone, polyether sulfone, polyketone, polyimide, triacetyl cellulose, and polyvinyl. Films made of thermoplastic resins such as alcohol, bulky cyclic olefin resin, polyester, polysulfone, polymethyl methacrylate, polystyrene, diethylene glycol biscarbonate, styrene / acrylonitrile copolymer, polyvinyl chloride, polysulfone, cellulose diacetate, cellulose triacetate Plastics with low photoelastic coefficient known by trademarks such as Arton, Zeonex, etc. Film-like substrate made of a resin, such as a substrate of a polymer resin substrate becomes film-like, such as styrene / methacrylic acid copolymer.

Among these substrates, when the polarizing plate 10 is applied to a liquid crystal display device, one having a small thermal expansion coefficient is preferable in order to prevent the liquid crystal display device from warping. In addition, from the above-mentioned resin from the point that it has a small mass, excellent impact resistance and flexibility, and can protect the laminate 14 which is weak against external force and can easily collapse or peel off. A film-like substrate is preferable.

As the material of the metal layer 12, aluminum (Al), which is a material that has high reflectivity in visible light (light with a wavelength of about 380 nm to 780 nm) and can be anodized, is used.

Examples of the material of the conductive layer 13 include titanium (Ti), tin-doped indium oxide (Indium Tin Oxide: ITO), indium-zinc composite oxide (Indium-Zinc composite Oxide: IZO), and the like.

Next, the operation of the polarizing plate 10 will be described.
As illustrated in FIG. 2, the polarizing plate 10 includes a refractive index n ₁ of the one-dimensional lattice-shaped stacked body 14 and a refractive index of the linear groove 14 a between the stacked bodies 14 (that is, the refractive index of the substrate 11). n ₂ is different. Therefore, polarization selection is performed according to the polarization direction of the light incident on the polarizing plate 10. The light polarization direction is the direction of light electrolysis direction E. Specifically, as illustrated in FIG. 2, the polarizing plate 10 transmits linearly polarized light X having a polarization axis in a direction perpendicular to the extending direction of the one-dimensional lattice-shaped stacked body 14. On the other hand, linearly polarized light having a polarization axis in a direction parallel to the extending direction of the one-dimensional lattice-like laminate 14 is reflected. Therefore, the polarizing plate 10 exhibits the same action as the light reflection polarizing element, that is, the action of transmitting polarized light parallel to the optical axis (transmission axis) and reflecting polarized light perpendicular to the optical axis.
In FIG. 2, symbol L1 indicates incident light, symbol L2 indicates transmitted light, symbol L3 indicates reflected light, symbol L4 indicates polarization X, and symbol L5 indicates polarization Y.

According to the polarizing plate 10 of the first embodiment, since the metal layer 12 made of aluminum is present on the outermost surface, the luminance is 1.2 to 1.3 times that of a conventional absorption polarizing plate. . Therefore, in the liquid crystal display device to which the polarizing plate 10 is applied, the light reflected by the metal layer 12 made of aluminum of the polarizing plate 10 can be reflected by the reflecting plate of the backlight and reused, so that high brightness can be achieved. Become.
Further, the polarizing plate 10, the pitch _{P 1} of the laminate 14 and 100 nm ~ 150 nm. Thereby, in the conventional absorption-type polarizing plate, blue on the short wavelength side is easily transmitted, whereas in the polarizing plate 10, transmission of blue can be suppressed. Therefore, a clear black display is possible with high contrast.
Furthermore, since the polarizing plate 10 can use not only a glass substrate but also a substrate made of a resin film as the substrate 11, it is not only lightweight and difficult to break, but also can be easily processed into a liquid crystal panel.

Next, the manufacturing method of the polarizing plate 10 is demonstrated.
First, as shown in FIG. 3, the entire surface of one surface 11a of the substrate 11 is made of titanium (Ti), tin-doped indium oxide (ITO), indium oxide-zinc oxide (IZO), or the like by sputtering or vapor deposition. The conductive layer 13 is formed uniformly.
The thickness of the conductive layer 13 is preferably 50 nm to 200 nm.

Next, as shown in FIG. 4, a metal layer 12 made of aluminum (Al) is uniformly applied to the entire surface 13a of the conductive layer 13 opposite to the surface in contact with the substrate 11 by sputtering or vapor deposition. To form.
The thickness of the metal layer 12 is preferably 1 μm to 3 μm.

Next, as shown in FIG. 5, the thickness of the metal layer 12 is uniform over the entire surface of the surface 12a opposite to the surface in contact with the conductive layer 13 (hereinafter referred to as "one surface"). Apply a negative resist so that Thereafter, the negative resist is exposed to form an insulating layer 15 having a uniform thickness.
The thickness of the insulating layer 15 is not particularly limited, but is preferably 300 nm to 1000 nm.

Next, as shown in FIG. 6, the insulating layer 15 is buffed with nerbuff to form a one-dimensional lattice-like insulating layer 15 A on the metal layer 12.
That is, the insulating layer 15 is buffed using nerbuff to partially remove the insulating layer 15 and form the adjacent insulating layers 15A on the metal layer 12 in a state of being separated from each other. At the same time, a linear groove (gap) 15a is formed between the insulating layers 15A.
The formation of the insulating layer 15A in a one-dimensional lattice means that a large number of linear insulating layers 15A are formed at regular intervals in parallel, that is, periodically.

A method of forming the one-dimensional lattice-like insulating layer 15A by buffing using nerbuff will be described.
Buffing is a processing method for polishing (shaving) a workpiece by attaching a buff to a machine that rotates at a high speed called a buff race. The buff used depends on the material and shape of the work piece or the target surface roughness. In addition, the buff is obtained by stacking several sheets of cotton cloth, sisal line, lasha cloth, felt, etc., and sewing them on a disk or fixing them with an adhesive.
In the first embodiment, the interval between the target primary lattice-like insulating layers 15A is as small as 40 nm to 80 nm. Therefore, the insulating layer 15A is formed in a state of being separated from each other by buffing using a flannel having a fine pitch on the surface, and a linear groove (gap) 15a is formed between the insulating layers 15A.
The buffing conditions are as follows. As the buff, a circular flannel having a diameter of 10 to 12 inches is used. The buff rotation speed is set to 2000 to 2800 rpm without using an abrasive.

Interval of a one-dimensional lattice-like insulating layer 15A, i.e., the width of the groove 15a is adjusted according to the width _{W 1} of the laminated body 14 of interest is preferably 40 nm ~ 80 nm.

Next, as shown in FIG. 11, the substrate 11 on which the metal layer 12 and the one-dimensional lattice-like insulating layer 15 A are formed is used as the anode 21. Then, one surface 11a of the substrate 11, that is, the surface of the substrate 11 on which the metal layer 12 and the one-dimensional lattice-like insulating layer 15A are formed is made to face the cathode 22 made of stainless steel, platinum (Pt), or the like. In this state, the surface layer of the metal layer 12 made of aluminum (Al) is anodized in the sulfuric acid solution 23. As a result, as shown in FIG. 7, a porous metal oxide layer 16 is formed in a portion of the metal layer 12 facing the gap 15a of the one-dimensional lattice-like insulating layer 15A and in the vicinity thereof.
In other words, by this anodic oxidation, a metal oxide made of aluminum oxide having a large number of fine holes 16a in the thickness direction at and near the portion of the metal layer 12 facing the gap 15a of the one-dimensional lattice-like insulating layer 15A. The material layer 16 is formed in a self-organizing manner. Further, by performing the anodic oxidation of the metal layer 12, the metal oxide layer 16 is also formed on a part of the metal layer 12 covered with the insulating layer 15A.

In addition, in many micro holes 16a formed by this anodic oxidation, when the maximum distance between adjacent micro holes 16a is U and the voltage applied between both electrodes is Va, U = 0.0025Va (μm) It is known that the following relational expression holds. This relational expression is, for example, H.264. Masuda et al. “Jpn. J. Appl. Phys.”, Vol. 37, 1998, p. L1340-p. L1342 and the like.
Thus, in anodic oxidation, the maximum distance between adjacent fine holes 16a increases in proportion to the magnitude of the voltage applied to both electrodes, and the pitch (laminated body) of the finally obtained linear metal layer 12 increases. 14 pitch P ₁ ) increases. Therefore, the voltage applied to both electrodes is appropriately adjusted according to the target pitch of the metal layer 12. In 1st Embodiment, it is preferable that the voltage applied to both electrodes is 2V, for example.

In the first embodiment, the sulfuric acid concentration of the sulfuric acid solution 23 (FIG. 11) is appropriately adjusted according to the thickness of the metal layer 12 to be oxidized, but is preferably 5% by mass, for example.
In the first embodiment, the time for applying a voltage to both electrodes is not limited. Until the metal oxide layer 16 made of aluminum oxide reaches the conductive layer 13, that is, until no current flows between the two electrodes. To do.

Further, in the anodic oxidation, it is preferable to use the conductive layer 13 as an anode. Since the conductive layer 13 is provided so as to be in contact with the metal layer 12, it is possible to always apply a voltage to the metal layer 12 during the oxidation treatment. Therefore, even when the one surface 11a of the substrate 11 is uneven, it is possible to prevent problems such as the remaining non-oxidized metal layer 12 remaining. As a result, the anodic oxidation of the metal layer 12 can be performed efficiently.

Next, as shown in FIG. 8, when the metal oxide layer 16 reaches the conductive layer 13, the anodic oxidation reaction does not proceed, so the anodic oxidation reaction is terminated at that point.

Next, as shown in FIG. 9, by using the linear insulating layer 15A as a mask, the metal oxide layer 16 and the portion of the conductive layer 13 facing the metal oxide layer 16 are removed by etching. The metal layer 12 is processed into a one-dimensional lattice shape.
In the process of processing the metal layer 12 into a one-dimensional lattice shape, for example, a 1 mol / L phosphoric acid solution is used as an etching solution, and the substrate 11 on which the metal oxide layer 16 is formed is immersed in the etching solution. Etching is performed at about 30 ° C. until the conductive layer 13 and the metal oxide layer 16 disappear.

Next, as shown in FIG. 10, the insulating layer 15 A remaining on the one surface 12 a of the metal layer 12 is removed by etching, and the substrate 11, the metal layer 12 and the conductive layer 13 formed in this order on the substrate 11. The polarizing plate 10 roughly constituted by the one-dimensional lattice-like laminate 14 made of is obtained.
In the step of removing the insulating layer 15A, as the etchant, for example, an organic solvent or an alkali solution used for removing a general negative resist is used.

According to the method for manufacturing a polarizing plate of the first embodiment, the surface layer of the metal layer 12 is anodized after the one-dimensional lattice-like insulating layer 15A is formed by buffing using nerbuff. This eliminates the need for a nanoimprint method or a pattern forming method using a positive photosensitive resist, unlike the conventional polarizing plate manufacturing method. Therefore, the manufacturing process can be simplified as compared with the conventional case, and a large-area polarizing plate can be easily manufactured at low cost. Moreover, the manufacturing method of the polarizing plate of 1st Embodiment is applicable not only to a glass substrate but to a resin substrate.

(2) Second Embodiment FIGS. 12A and 12B are diagrams illustrating a schematic configuration of a polarizing plate according to a second embodiment. 12A is a plan view, and FIG. 12B is a cross-sectional view taken along line BB in FIG. 12A.
The polarizing plate 30 of the second embodiment is generally configured from a substrate 31 and a metal layer 32. The metal layer 32 is a one-dimensional lattice-shaped metal layer formed on the substrate 31.
That is, in the polarizing plate 30, the metal layer 32 is formed on one surface 31a of the substrate 31, and the metal layer 32 forms a one-dimensional lattice shape.
The metal layer 32 having a one-dimensional lattice shape means that a large number of linear metal layers 32 are formed at regular intervals and in parallel, that is, periodically.
That is, when the polarizing plate 30 is viewed from the one surface 31 a side of the substrate 31, the adjacent metal layers 32 are formed in a state of being separated from each other, and a linear groove (gap) 32 a is formed between the metal layers 32. Has been.
The extending direction of the one-dimensional lattice-shaped metal layer 32 is the absorption axis direction of the polarizing plate 30, and the direction perpendicular to the extending direction of the metal layer 32 is the transmission axis direction of the polarizing plate 30.

Further, the metal layer 32 and the groove 32a therebetween are formed by a polarizing plate manufacturing method described later.

The pitch P ₂ of the metal layer 32 is not particularly limited as long as it is smaller than the wavelength of incident light with respect to the polarizing plate 30. For example, when the polarizing plate 30 is used as a general polarizing plate for visible light (light having a wavelength of about 380 nm to 780 nm), the pitch P ₂ is preferably 100 nm to 150 nm.
Further, the width W ₂ of the metal layer 32 is preferably about 1/10 of the wavelength of the incident light with respect to the polarizing plate 30, and is preferably 40 nm to 80 nm.
The thickness of the metal layer 32 is not particularly limited, but is preferably 1 μm to 3 μm.

As the substrate 31, the same one as in the first embodiment described above is used.
As the material of the metal layer 32, the same material as in the first embodiment described above is used.

Next, the operation of the polarizing plate 30 will be described.
Polarizer 30, a refractive index _{n 11} of the one-dimensional grid-like metal layer 32, the refractive index of the linear groove 32a between the metal layer 32 (i.e., the refractive index of the substrate ₃₁₎ since the _{n 12} are different, Polarization selection is performed according to the polarization direction of the light incident on the polarizing plate 30. Specifically, the polarizing plate 30 transmits linearly polarized light X having a polarization axis in a direction perpendicular to the extending direction of the one-dimensional lattice-like metal layer 32. On the other hand, the polarizing plate 30 reflects linearly polarized light having a polarization axis in a direction parallel to the extending direction of the one-dimensional lattice-like metal layer 32. Accordingly, the polarizing plate 30 exhibits the same action as the light reflection polarizing element, that is, the action of transmitting polarized light parallel to the optical axis (transmission axis) and reflecting polarized light perpendicular to the optical axis.

According to the polarizing plate 30 of the second embodiment, since the metal layer 32 made of aluminum is present on the outermost surface, the luminance is 1.2 to 1.3 times that of a conventional absorption-type polarizing plate. . Therefore, in the liquid crystal display device to which the polarizing plate 30 is applied, the light reflected by the aluminum metal layer 32 of the polarizing plate 30 can be reflected by the reflecting plate of the backlight and reused. Become.
Further, the polarizing plate 30, the pitch _{P 2} of the

metal layer

32 and 100 nm ~ 150 nm. In contrast to the conventional absorption type polarizing plate, the blue light on the short wavelength side is easily transmitted, whereas the polarizing plate 30 can suppress the transmission of the blue color, so that the contrast is high and a clear black display is possible. .
Furthermore, since the polarizing plate 30 can use not only a glass substrate but also a substrate made of a resin film as the substrate 31, it is not only lightweight and difficult to break, but also can be easily processed into a liquid crystal panel.

Next, the manufacturing method of the polarizing plate 30 is demonstrated.
First, as shown in FIG. 13, a metal layer 32 made of aluminum (Al) is uniformly formed on the entire surface of one surface 31a of the substrate 31 by sputtering or vapor deposition.
The thickness of the metal layer 32 is preferably 1 μm to 3 μm.

Next, as shown in FIG. 14, the thickness of the metal layer 32 is uniform over the entire surface of the surface 32a opposite to the surface in contact with the substrate 31 (hereinafter referred to as "one surface"). Apply a negative resist. Thereafter, the negative resist is exposed to form an insulating layer 33 having a uniform thickness.
The thickness of the insulating layer 33 is not particularly limited, but is preferably 300 nm to 1000 nm.

Next, as shown in FIG. 15, the insulating layer 33 is buffed with nerbuff to form a one-dimensional lattice-like insulating layer 33 A on the metal layer 32.
In other words, the insulating layer 33 is buffed using nelbuff to partially remove the insulating layer 33 and form the adjacent insulating layers 33A on the metal layer 32 in a state of being separated from each other. At the same time, a linear groove (gap) 33a is formed between the insulating layers 33A.
The formation of the insulating layer 33A in a one-dimensional lattice means that a large number of linear insulating layers 33A are formed at regular intervals in parallel, that is, periodically.

In this step, the one-dimensional lattice-like insulating layer 33A is formed by buffing using nerbuff in the same manner as in the first embodiment.

The interval between the one-dimensional lattice-like insulating layers 33A, that is, the width of the grooves 33a is adjusted according to the pitch P ₂ and the width W ₂ of the target one-dimensional lattice-like metal layer 32. Preferably there is.

Next, the substrate 31 on which the metal layer 32 and the one-dimensional lattice-like insulating layer 33A are formed is used as an anode. Then, one surface 31a of the substrate 31, that is, the surface of the substrate 31 on which the metal layer 32 and the one-dimensional lattice-like insulating layer 33A are formed is made to face a cathode made of stainless steel, platinum (Pt), or the like. In this state, the surface layer of the metal layer 32 made of aluminum (Al) is anodized in a sulfuric acid solution. As a result, as shown in FIG. 16, a porous metal oxide layer 34 is formed in a portion of the metal layer 32 facing the gap 33a of the one-dimensional lattice-like insulating layer 33A and in the vicinity thereof.
In other words, by this anodic oxidation, a metal oxide made of aluminum oxide having a number of fine holes 34a in the thickness direction at and near the portion of the metal layer 32 facing the gap 33a of the one-dimensional lattice-like insulating layer 33A. The material layer 34 is formed in a self-organizing manner. Further, by performing the anodic oxidation of the metal layer 32, the metal oxide layer 34 is also formed on a part of the metal layer 32 covered with the insulating layer 33A.

In 2nd Embodiment, it is preferable that the voltage applied to both electrodes is 2V, for example.
In the second embodiment, the sulfuric acid concentration of the sulfuric acid solution is appropriately adjusted according to the thickness of the metal layer 32 to be oxidized, but is preferably 5% by mass, for example.
In the second embodiment, the time for applying a voltage to both electrodes is not limited, and is until the metal oxide layer 34 made of aluminum oxide reaches the substrate 31, that is, until no current flows between the two electrodes.

Next, as shown in FIG. 17, when the metal oxide layer 34 reaches the substrate 31, the anodic oxidation reaction does not proceed, so the anodic oxidation reaction is terminated at that point.

Next, as shown in FIG. 18, the metal layer 32 is processed into a one-dimensional lattice pattern by removing the metal oxide layer 34 by etching using the linear insulating layer 33A as a mask.
In the step of processing the metal layer 32 into a one-dimensional lattice, for example, a 1 mol / L phosphoric acid solution is used as an etchant, and the substrate 31 on which the metal oxide layer 34 is formed is immersed in the etchant. Etching is performed at about 30 ° C. until the metal oxide layer 34 disappears.

Next, as shown in FIG. 19, the insulating layer 33A remaining on one surface 32a of the metal layer 32 is removed by etching, and the substrate 31 and the one-dimensional lattice-like metal layer 32 formed thereon are formed. Is obtained.
In the step of removing the insulating layer 33A, as the etching solution, for example, an organic solvent or an alkaline solution used for removing a general negative resist is used.

According to the method for manufacturing a polarizing plate of the second embodiment, the surface layer of the metal layer 32 is anodized after the one-dimensional lattice-like insulating layer 33A is formed by buffing using nerbuff. This eliminates the need for a nanoimprint method or a pattern forming method using a positive photosensitive resist, unlike the conventional polarizing plate manufacturing method. Therefore, the manufacturing process can be simplified as compared with the conventional case, and a large-area polarizing plate can be easily manufactured at low cost. Moreover, the manufacturing method of the polarizing plate of 2nd Embodiment can be applied not only to a glass substrate but to a resin substrate.

"Liquid Crystal Display"
(1) 1st Embodiment FIG. 20: is a schematic sectional drawing which shows the liquid crystal display device 40 of 1st Embodiment.
In 1st Embodiment, the liquid crystal display device 40 which comprises the liquid crystal panel provided with the polarizing plate 10 of the above-mentioned 1st Embodiment is illustrated.
The liquid crystal display device 40 of the first embodiment is schematically configured from a liquid crystal panel 50 and a backlight 60. The backlight 60 is disposed on the surface 50b side opposite to the display screen 50a.

The liquid crystal panel 50 includes a first polarizing plate 51, a first substrate 52, a first transparent electrode 53, a liquid crystal layer 54, a second transparent electrode 55, a second polarizing plate 56, a color filter 57, 2 substrate 58 and the 3rd polarizing plate 59 are comprised, and these have been laminated | stacked in order.
The color filter 57 includes a red color filter 57R, a green color filter 57G, and a blue color filter 57B.

As the 2nd polarizing plate 56, the thing similar to the polarizing plate 10 which concerns on the above-mentioned 1st Embodiment, or the polarizing plate 30 which concerns on 2nd Embodiment is used.
Further, the absorption axis of the second polarizing plate 56 faces the axial direction indicated by reference numeral 56a in FIG.
The absorption axis of the first polarizing plate 51 faces the axial direction indicated by reference numeral 51a in FIG. 20, and the absorption axis of the third polarizing plate 59 faces the axial direction indicated by reference numeral 59a in FIG.

Further, a linear film called a louver arranged in a blind shape may be arranged between the liquid crystal panel 50 and the backlight 60. The light emitted from the backlight 60 is collimated by the linear film, and the liquid crystal panel 50 is irradiated with the collimated light (parallel light). Alternatively, the light emitted from the backlight 60 is substantially collimated by the linear film, and the liquid crystal panel 50 is irradiated with the substantially collimated light (substantially parallel light).

According to the liquid crystal display device 40, the second polarizing plate 56 of the liquid crystal panel 50 is the same as the polarizing plate 10 or the polarizing plate 30. Therefore, the light reflected by the second polarizing plate 56 can be reused by being reflected by the reflecting plate 61 of the backlight 60, so that high luminance can be achieved and high contrast and clear black display are possible. become.
Further, when the light emitted from the backlight 60 passes through the color filter 57, depolarization occurs and the contrast is lowered. In order to suppress this, a second polarizing plate 56 is provided under the color filter 57. When the polarization degree of the second polarizing plate 56 is lower than the polarization degree of the iodine polarizing plate, the contrast can be increased by providing the third polarizing plate 59 in the first embodiment.

(2) Second Embodiment FIG. 21 is a schematic cross-sectional view showing a liquid crystal display device 70 of a second embodiment.
In FIG. 21, the same components as those in the first embodiment shown in FIG.

The liquid crystal display device 70 of the second embodiment is generally configured by a liquid crystal panel 80 and a backlight 60. The backlight 60 is disposed on the surface 80b side opposite to the display screen 80a.

The liquid crystal panel 80 includes a first polarizing plate 81, a first substrate 82, a first transparent electrode 83, a liquid crystal layer 84, a second transparent electrode 85, a second polarizing plate 86, a color filter 87, And two substrates 88, which are stacked in order.
The color filter 87 includes a red color filter 87R, a green color filter 87G, and a blue color filter 87B.

As the 2nd polarizing plate 86, the thing similar to the polarizing plate 10 which concerns on the above-mentioned 1st Embodiment, or the polarizing plate 30 which concerns on 2nd Embodiment is used.
Further, the absorption axis of the second polarizing plate 86 faces the axial direction indicated by reference numeral 86a in FIG.
The absorption axis of the first polarizing plate 81 faces the axial direction indicated by reference numeral 81a in FIG.

According to the liquid crystal display device 70, the second polarizing plate 86 of the liquid crystal panel 80 is the same as the polarizing plate 10 or the polarizing plate 30. Therefore, the light reflected by the second polarizing plate 86 can be reused by being reflected by the reflecting plate 61 of the backlight 60. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 60 passes through the color filter 87, depolarization occurs and the contrast is lowered. In order to suppress this, a second polarizing plate 86 is provided under the color filter 87.

(3) Third Embodiment FIG. 22 is a schematic cross-sectional view showing a liquid crystal display device 90 of a third embodiment.
22, the same code | symbol is attached | subjected to the same component as 1st Embodiment shown in FIG. 20, and description is abbreviate | omitted.

The liquid crystal display device 90 of the third embodiment is roughly configured by a liquid crystal panel 100 and a backlight 60. The backlight 60 is disposed on the surface 100b side opposite to the display screen 100a.

The liquid crystal panel 100 includes a first polarizing plate 101, a first substrate 102, a first transparent electrode 103, a liquid crystal layer 104, a second transparent electrode 105, a second polarizing plate 106, a color filter 107, 2 substrates 108, and these are laminated in order.
The color filter 107 includes a red color filter 107R, a green color filter 107G, and a blue color filter 107B.

As the 1st polarizing plate 101 and the 2nd polarizing plate 106, the thing similar to the polarizing plate 10 which concerns on the above-mentioned 1st Embodiment or the polarizing plate 30 which concerns on 2nd Embodiment is used.
The absorption axis of the first polarizing plate 101 is in the axial direction indicated by reference numeral 101a in FIG. Further, the absorption axis of the second polarizing plate 106 is oriented in the axial direction indicated by reference numeral 106a in FIG.

According to the liquid crystal display device 90, the same as the polarizing plate 10 or the polarizing plate 30 is used as the first polarizing plate 101 and the second polarizing plate 106 of the liquid crystal panel 100. Therefore, the light reflected by the first polarizing plate 101 and the second polarizing plate 106 is reflected by the reflecting plate 61 of the backlight 60 and can be reused. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 60 passes through the color filter 107, depolarization occurs and the contrast is lowered. In order to suppress this, the second polarizing plate 106 is provided under the color filter 107.

(4) Fourth Embodiment FIG. 23 is a schematic cross-sectional view showing a liquid crystal display device 110 of a fourth embodiment.
In FIG. 23, the same components as those in the first embodiment shown in FIG.

The liquid crystal display device 110 according to the fourth embodiment is roughly composed of a liquid crystal panel 120 and a backlight 60. The backlight 60 is disposed on the surface 120b side opposite to the display screen 120a.

The liquid crystal panel 120 includes a first polarizing plate 121, a first substrate 122, a first transparent electrode 123, a liquid crystal layer 124, a second transparent electrode 125, a color filter 126, a second substrate 127, and a second polarization. The board 128 is provided, and these are laminated in order.
The color filter 126 includes a red color filter 126R, a green color filter 126G, and a blue color filter 126B.

As the 1st polarizing plate 121 and the 2nd polarizing plate 128, the thing similar to the polarizing plate 10 which concerns on the above-mentioned 1st Embodiment, or the polarizing plate 30 which concerns on 2nd Embodiment is used.
The absorption axis of the first polarizing plate 121 faces the axial direction indicated by reference numeral 121a in FIG. Further, the absorption axis of the second polarizing plate 128 faces the axial direction indicated by reference numeral 128a in FIG.

According to the liquid crystal display device 110, the first polarizing plate 121 and the second polarizing plate 128 of the liquid crystal panel 120 are the same as the polarizing plate 10 or the polarizing plate 30. Therefore, the light reflected by the first polarizing plate 121 and the second polarizing plate 128 can be reflected by the reflecting plate 61 of the backlight 60 and reused. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 60 passes through the color filter 87, depolarization occurs and the contrast is lowered. In order to suppress this, in the fourth embodiment, the contrast can be increased by providing the second polarizing plate 128 on the outermost surface.

(5) Fifth Embodiment FIG. 24 is a schematic cross-sectional view showing a liquid crystal display device of a fifth embodiment.
In FIG. 24, the same code | symbol is attached | subjected to the same component as 1st Embodiment shown in FIG. 20, and description is abbreviate | omitted.

The liquid crystal display device 130 of the fifth embodiment is roughly configured by a liquid crystal panel 140 and a backlight 60. The backlight 60 is disposed on the surface 140b side opposite to the display screen 140a.

The liquid crystal panel 140 includes a first substrate 141, a first transparent electrode 142, a first polarizing plate 143, a liquid crystal layer 144, a second transparent electrode 145, a second polarizing plate 146, a color filter 147, 2 substrates 148, and these are laminated in order.
The color filter 147 includes a red color filter 147R, a green color filter 147G, and a blue color filter 147B.

As the 1st polarizing plate 143 and the 2nd polarizing plate 146, the thing similar to the polarizing plate 10 which concerns on the above-mentioned 1st Embodiment, or the polarizing plate 30 which concerns on 2nd Embodiment is used.
The absorption axis of the first polarizing plate 143 faces the axial direction indicated by reference numeral 143a in FIG. Further, the absorption axis of the second polarizing plate 146 faces the axial direction indicated by reference numeral 146a in FIG.

According to the liquid crystal display device 130, the same as the polarizing plate 10 or the polarizing plate 30 is used as the first polarizing plate 143 and the second polarizing plate 146 of the liquid crystal panel 140. Therefore, the light reflected by the first polarizing plate 143 and the second polarizing plate 146 can be reused by being reflected by the reflecting plate 61 of the backlight 60. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 60 passes through the color filter 147, depolarization occurs and the contrast is lowered. In order to suppress this, a second polarizing plate 146 is provided under the color filter 147.

"Electronics"
FIG. 25A to FIG. 25D are diagrams showing an example of an electronic device provided with any one of the above-described liquid

crystal display devices

40, 70, 90, 110, and 130 in a display unit.

FIG. 25A is a schematic perspective view showing a thin display device 200 as an example of an electronic apparatus.
The thin display device (electronic device) 200 is schematically configured by a housing 201, a support base 202, a display unit 203, a speaker unit 204, and a video input terminal 205.
As the display unit 203, one having the same configuration as that of any of the liquid

crystal display devices

40, 70, 90, 110, and 130 according to the first to fifth embodiments of the present invention described above is used.

FIG. 25B is a schematic perspective view showing a notebook personal computer 300 as an example of an electronic apparatus.
A notebook personal computer (electronic device) 300 according to this embodiment is schematically configured by a main body 301, a housing 302, a display unit 303, a keyboard 304, an external connection port 305, and a pointing pad 306.
As the display unit 303, a display unit having the same configuration as any of the liquid

crystal display devices

FIG. 25C is a schematic perspective view showing a mobile phone 400 as an example of the electronic apparatus.
The cellular phone (electronic device) 400 includes a main body 401, a housing 402, a display unit 403, a voice input unit 404, a voice output unit 405, operation keys 406, an external connection port 407, an antenna 408, and the like. It is roughly composed.
As the display unit 403, a display unit having the same configuration as that of any of the liquid

crystal display devices

FIG. 25D is a schematic perspective view showing a video camera 500 as an example of an electronic apparatus.
This video camera (electronic device) 500 includes a main body 501, a display unit 502, a housing 503, an external connection port 504, a remote control receiving unit 505, an image receiving unit 506, a battery 507, and an audio input unit 508. The operation key 509 and the eyepiece unit 510 are roughly configured.
As the display unit 502, a display unit having the same configuration as that of any of the liquid

crystal display devices

The

electronic devices

200, 300, 400, and 500 shown in FIGS. 25A to 25D display any one of the liquid

crystal display devices

40, 70, 90, 110, and 130 according to the first to fifth embodiments of the present invention described above. In the department. Therefore, the electronic apparatus includes a display unit that can display an image with high brightness and high contrast.

"Polarizer"
(6) Sixth Embodiment FIGS. 26A and 26B are diagrams illustrating a schematic configuration of a polarizing plate according to a sixth embodiment. 26A is a plan view, and FIG. 26B is a cross-sectional view taken along line A1-A1 of FIG. 26A.
A polarizing plate 1010 according to the sixth embodiment is generally configured by a substrate 1011, a metal layer 1012, a metal oxide layer 1013, and a conductive layer 1014. The metal layer 1012 is a one-dimensional lattice-shaped metal layer formed on the substrate 1011. The metal oxide layer 1013 is a porous metal oxide layer formed between the one-dimensional lattice-like metal layers 1012 on the substrate 1011. The conductive layer 1014 is formed so as to be interposed between the substrate 1011, the metal layer 1012, and the metal oxide layer 1013.

That is, in the polarizing plate 1010, a metal layer 1012 is formed on one surface 1011a of the substrate 1011, and the metal layer 1012 has a one-dimensional lattice shape.
Note that the metal layer 1012 has a one-dimensional lattice shape means that a large number of linear metal layers 1012 are formed at regular intervals in parallel, that is, periodically.
In the polarizing plate 1010, a porous metal oxide layer 1013 is formed between the one-dimensional lattice-like metal layers 1012 on one surface 1011 a of the substrate 1011.

That is, when the polarizing plate 1010 is viewed from the one surface 1011 a side of the substrate 1011, adjacent metal layers 1012 are formed in a state of being separated from each other with the metal oxide layer 1013 interposed therebetween.
The extending direction of the one-dimensional lattice-shaped metal layer 1012 is the absorption axis direction of the polarizing plate 1010, and the direction perpendicular to the extending direction of the metal layer 1012 is the transmission axis direction of the polarizing plate 1010.

The one-dimensional lattice-like metal layer 1012 is formed by a polarizing plate manufacturing method described later.

The pitch P ₁₀ of the metal layer 1012 is not particularly limited as long as it is smaller than the wavelength of incident light with respect to the polarizing plate 1010. For example, when the polarizing plate 1010 is used as a general polarizing plate for visible light (light having a wavelength of about 380 nm to 780 nm), the pitch P ₁₀ is preferably 100 nm to 150 nm.
Further, the width W ₁₀ of the metal layer 1012 is preferably about 1/10 of the wavelength of incident light with respect to the polarizing plate 1010, and is preferably 40 nm to 80 nm.

The thickness of the metal layer 1012 is not particularly limited, but is preferably 1 μm to 3 μm.
The thickness of the metal oxide layer 1013 is not particularly limited, but here is equal to the thickness of the metal layer 1012.
The thickness of the conductive layer 1014 is not particularly limited, but is preferably 50 nm to 200 nm.

The substrate 1011 is not particularly limited as long as it is a transparent substrate, but a substrate having high visible light transmittance and excellent heat resistance and impact resistance is preferable. Examples of such substrate 1011 include substrates made of inorganic materials such as glass and quartz, polycarbonate, polyethylene terephthalate, polyethylene naphthalate, polyarylate, polyether ketone, polyether sulfone, polyketone, polyimide, triacetyl cellulose, and polyvinyl. Films made of thermoplastic resins such as alcohol, bulky cyclic olefin resin, polyester, polysulfone, polymethyl methacrylate, polystyrene, diethylene glycol biscarbonate, styrene / acrylonitrile copolymer, polyvinyl chloride, polysulfone, cellulose diacetate, cellulose triacetate Heat of low photoelastic coefficient known by trademarks such as Arton, ZEONEX, etc. Film-like substrate made of plastic resin, such as a substrate of a polymer resin substrate becomes film-like, such as styrene / methacrylic acid copolymer.

Among these substrates, when the polarizing plate 1010 is applied to a liquid crystal display device, one having a small thermal expansion coefficient is preferable in order to prevent the liquid crystal display device from warping. In addition, from the above-mentioned resin from the point that the mass is small and excellent in impact resistance and flexibility, and the metal layer 1012 that is weak against external force and can be easily collapsed and peeled off can be protected. A film-like substrate is preferable.

As the material of the metal layer 1012, aluminum (Al), which is a material that has high reflectivity in visible light (light with a wavelength of about 380 nm to 780 nm) and can be anodized, is used.

Examples of the material of the conductive layer 1014 include titanium (Ti), tin-doped indium oxide (Indium Tin Oxide: ITO), indium-zinc composite oxide (Indium-Zinc composite Oxide: IZO), and the like.

Next, the operation of the polarizing plate 1010 will be described.
Polarizer 1010, as shown in FIG. 27, the refractive index _{n 10} of the one-dimensional grid-like metallic layer 1012, and the refractive index _{n 20} of the metal oxide layer 1013 between the metal layer 1012 is different. Therefore, polarization selection is performed according to the polarization direction of the light incident on the polarizing plate 1010. The light polarization direction is the direction of light electrolysis direction E. Specifically, as illustrated in FIG. 27, the polarizing plate 1010 transmits linearly polarized light X1 having a polarization axis in a direction perpendicular to the extending direction of the one-dimensional lattice-like metal layer 1012. On the other hand, the polarizing plate 1010 reflects linearly polarized light having a polarization axis in a direction parallel to the extending direction of the one-dimensional lattice-like metal layer 1012. Therefore, the polarizing plate 1010 exhibits the same action as the light reflection polarizing element, that is, the action of transmitting polarized light parallel to the optical axis (transmission axis) and reflecting polarized light perpendicular to the optical axis.
In FIG. 27, symbol L6 indicates incident light, symbol L7 indicates transmitted light, symbol L8 indicates reflected light, symbol L9 indicates polarization X, and symbol L10 indicates polarization Y.

According to the polarizing plate 1010 of the sixth embodiment, since the metal layer 1012 made of aluminum is present on the outermost surface, the luminance is 1.2 to 1.3 times that of a conventional absorption polarizing plate. . Therefore, in the liquid crystal display device to which the polarizing plate 1010 is applied, the light reflected by the metal layer 12 made of aluminum of the polarizing plate 1010 can be reflected by the reflector of the backlight and reused. Become.
Further, the polarizing plate 1010, a pitch _{P 10} of the

metal layer

1012 and 100 nm ~ 150 nm. Accordingly, the blue light on the short wavelength side is easily transmitted through the conventional absorption polarizing plate, whereas the polarizing plate 1010 can suppress the blue transmission. Therefore, a clear black display with high contrast becomes possible.
In the polarizing plate 1010, a porous metal oxide layer 1013 is formed between one-dimensional lattice-like metal layers 1012. Therefore, durability such as bending resistance is excellent, and the aspect ratio of the metal layer 1012 (ratio of the width and thickness of the metal layer 1012) can be increased.
Furthermore, since the polarizing plate 1010 can use not only a glass substrate but also a resin film substrate as the substrate 1011, it is not only light and difficult to break, but also can be easily processed into a liquid crystal panel.

Next, a method for manufacturing the polarizing plate 1010 will be described.
First, as shown in FIG. 28, the entire surface of one surface 1011a of the substrate 1011 is made of titanium (Ti), tin-doped indium oxide (ITO), indium oxide-zinc oxide (IZO), or the like by sputtering or vapor deposition. The conductive layer 1014 is formed uniformly.
The thickness of the conductive layer 1014 is preferably 50 nm to 200 nm.

Next, as shown in FIG. 29, a metal layer 1012 made of aluminum (Al) is uniformly formed on the entire surface 1014a of the conductive layer 1014 opposite to the surface in contact with the substrate 1011 by a sputtering method or an evaporation method. To form.
The thickness of the metal layer 1012 is preferably 1 μm to 3 μm.

Next, as shown in FIG. 30, the thickness of the metal layer 1012 is uniform over the entire surface of the surface 1012a opposite to the surface in contact with the conductive layer 1014 (hereinafter referred to as “one surface”). Apply a negative resist so that Thereafter, the negative resist is exposed to form an insulating layer 1015 having a uniform thickness.
The thickness of the insulating layer 1015 is not particularly limited, but is preferably 300 nm to 1000 nm.

Next, as illustrated in FIG. 31, the insulating layer 1015 is buffed with nerbuff to form a one-dimensional lattice-shaped insulating layer 1015 A on the metal layer 1012.
In other words, the insulating layer 1015 is buffed using nelbuff to partially remove the insulating layer 1015 and form the adjacent insulating layers 1015A on the metal layer 1012 in a state of being separated from each other. In addition, a linear groove (gap) 1015a is formed between the insulating layers 1015A.
Note that forming the insulating layers 1015A in a one-dimensional lattice means that a large number of linear insulating layers 1015A are formed at regular intervals in parallel, that is, periodically.

A method for forming the one-dimensional lattice-like insulating layer 1015A by buffing using nerbuff will be described.
Buffing is a processing method for polishing (shaving) a workpiece by attaching a buff to a machine that rotates at a high speed called a buff race. The buff used depends on the material and shape of the work piece or the target surface roughness. In addition, the buff is obtained by stacking several sheets of cotton cloth, sisal line, lasha cloth, felt, etc., and sewing them on a disk or fixing them with an adhesive.
In the sixth embodiment, the interval between the target primary lattice-shaped insulating layers 1015A is as small as 40 nm to 80 nm. Therefore, the insulating layer 1015A is formed in a state of being separated from each other by buffing using a flannel having a fine pitch on the surface, and a linear groove (gap) 1015a is formed between the insulating layers 1015A.
The buffing conditions are as follows. As the buff, a circular flannel having a diameter of 10 to 12 inches is used. The buff rotation speed is set to 2000 to 2800 rpm without using an abrasive.

A one-dimensional lattice spacing of the insulating layer 1015A, i.e., the width of the groove 1015a is adjusted according to the width _{W 10} of the one-dimensional grid-like metallic layer 1012 of interest is preferably 40 nm ~ 80 nm .

Next, as illustrated in FIG. 35, a substrate 1011 on which a metal layer 1012 and a one-dimensional lattice-like insulating layer 1015A are formed is used as an anode 1021. Then, one surface 1011a of the substrate 1011, that is, the surface of the substrate 1011 on which the metal layer 1012 and the one-dimensional lattice-like insulating layer 1015A are formed, and the cathode 1022 made of stainless steel, platinum (Pt), or the like are opposed to each other. In this state, the surface layer of the metal layer 1012 made of aluminum (Al) is anodized in the sulfuric acid solution 1023. Thus, as shown in FIG. 32, a porous metal oxide layer 1013 is formed in a portion of the metal layer 1012 facing the gap 1015a of the insulating layer 1015A having a one-dimensional lattice shape and in the vicinity thereof.
In other words, by this anodic oxidation, a metal oxide made of aluminum oxide having a large number of fine holes 1013a in the thickness direction at and near the portion of the metal layer 1012 facing the gap 1015a of the one-dimensional lattice-like insulating layer 1015A. A physical layer 1013 is formed in a self-organizing manner. In addition, by performing anodic oxidation of the metal layer 1012, the metal oxide layer 1013 is also formed on part of the metal layer 1012 covered with the insulating layer 1015A.

In addition, in a large number of fine holes 1013a formed by this anodic oxidation, when U is the maximum distance between adjacent fine holes 1013a and Va is the voltage applied between the two electrodes, U = 0.0025Va (μm) It is known that the following relational expression holds. This relational expression is, for example, H.264. Masuda et al. “Jpn. J. Appl. Phys.”, Vol. 37, 1998, p. L1340-p. L1342 and the like.
Thus, in the anodic oxidation, the maximum distance between the two electrodes voltage applied to the magnitude proportional to neighboring micropores 1013a is increased, the pitch P ₁₀ of the final linear metal layer 1012 to be obtained growing. Therefore, the voltage applied to the electrodes is appropriately adjusted according to the pitch P ₁₀ of the metal layer 1012 of interest. In 6th Embodiment, it is preferable that the voltage applied to both electrodes is 2V, for example.

In the sixth embodiment, the sulfuric acid concentration of the sulfuric acid solution 1023 is appropriately adjusted according to the thickness of the metal layer 1012 to be oxidized, but is preferably 5% by mass, for example.
In the sixth embodiment, the time for applying a voltage to both electrodes is not limited. Until the metal oxide layer 1013 made of aluminum oxide reaches the conductive layer 1014, that is, until no current flows between the two electrodes. To do.

In addition, in the anodic oxidation, it is preferable to use the conductive layer 1014 as an anode. Since the conductive layer 1014 is provided in contact with the metal layer 1012, a voltage can be applied to the metal layer 1012 at all times during the oxidation treatment. Therefore, even when the one surface 1011a of the substrate 1011 is uneven, it is possible to prevent problems such as the remaining non-oxidized metal layer 1012 remaining. As a result, the anodic oxidation of the metal layer 1012 can be performed efficiently.

Next, as shown in FIG. 33, when the metal oxide layer 1013 reaches the conductive layer 1014, the anodic oxidation reaction does not proceed, so the anodic oxidation reaction is terminated at that point.

Next, as shown in FIG. 34, the insulating layer 1015A remaining on one surface 1012a of the metal layer 1012 is removed by etching, and the substrate 1011, the metal layer 1012, the metal oxide layer 1013, and the conductive layer are removed. 1014 is obtained. The metal layer 1012 is a one-dimensional lattice-shaped metal layer formed on the substrate 1011. The metal oxide layer 1013 is a porous metal oxide layer formed between the one-dimensional lattice-like metal layers 1012 on the substrate 1011. The conductive layer 1014 is formed so as to be interposed between the substrate 1011 and the metal layer 1012 and the metal oxide layer 1013.
In the step of removing the insulating layer 1015A, as the etchant, for example, an organic solvent or an alkali solution used for removing a general negative resist is used.

According to the method for manufacturing a polarizing plate of the sixth embodiment, the surface layer of the metal layer 1012 is anodized after the one-dimensional lattice-like insulating layer 1015A is formed by buffing using nerbuff. This eliminates the need for a nanoimprint method or a pattern forming method using a positive photosensitive resist, unlike the conventional polarizing plate manufacturing method. Therefore, the manufacturing process can be simplified as compared with the conventional case, and a large-area polarizing plate can be easily manufactured at low cost. Moreover, the manufacturing method of the polarizing plate of 6th Embodiment can be applied not only to a glass substrate but to a resin substrate.

(7) 7th Embodiment FIG. 36: A and FIG. 36B are figures which show schematic structure of the polarizing plate of 7th Embodiment. 36A is a plan view, and FIG. 36B is a cross-sectional view taken along line B1-B1 of FIG. 36A.
The polarizing plate 1030 according to the seventh embodiment is generally configured by a substrate 1031, a metal layer 1032, and a metal oxide layer 1033. The metal layer 1032 is a one-dimensional lattice-shaped metal layer formed on the substrate 1031. The metal oxide layer 1033 is a porous metal oxide layer formed between the metal layers 1032 having a one-dimensional lattice shape on the substrate 1031.

That is, in the polarizing plate 1030, the metal layer 1032 is formed on one surface 1031a of the substrate 1031 and the metal layer 1032 has a one-dimensional lattice shape.
Note that the metal layer 1032 has a one-dimensional lattice shape means that a large number of linear metal layers 1032 are formed at regular intervals and in parallel, that is, periodically.
In the polarizing plate 1030, a porous metal oxide layer 1033 is formed between the one-dimensional lattice-like metal layers 1032 on one surface 1031 a of the substrate 1031.
That is, when the polarizing plate 1030 is viewed from the one surface 1031 a side of the substrate 1031, adjacent metal layers 1032 are formed in a state of being separated from each other with the metal oxide layer 1033 interposed therebetween.
The extending direction of the one-dimensional lattice-shaped metal layer 1032 is the absorption axis direction of the polarizing plate 1030, and the direction perpendicular to the extending direction of the metal layer 1032 is the transmission axis direction of the polarizing plate 1030.

The one-dimensional lattice-like metal layer 1032 is formed by a polarizing plate manufacturing method described later.

The pitch P ₂₀ of the metal layer 1032 is not particularly limited as long as it is smaller than the wavelength of incident light with respect to the polarizing plate 1030. For example, when the polarizing plate 1030 is used as a polarizing plate for general visible light (light having a wavelength of about 380 nm to 780 nm), the pitch P ₂₀ is preferably 100 nm to 150 nm.
The width W ₂₀ of the metal layer 1032 is preferably about 1/10 of the wavelength of incident light with respect to the polarizing plate 1030, and is preferably 40 nm to 80 nm.
The thickness of the metal layer 1032 is not particularly limited, but is preferably 1 μm to 3 μm.
The thickness of the metal oxide layer 1033 is not particularly limited, but here is equal to the thickness of the metal layer 1032.

As the substrate 1031, the same substrate as that in the sixth embodiment is used.
As the material of the metal layer 1032, the same material as that of the above-described sixth embodiment is used.

Next, the operation of the polarizing plate 1030 will be described.
In the polarizing plate 1030, the refractive index n ₁₁ of the one-dimensional lattice-like metal layer 1032 and the refractive index n ₁₂ of the metal oxide layer 1033 between the metal layers 1032 are different. Therefore, polarization selection is performed according to the polarization direction of the light incident on the polarizing plate 1030. Specifically, the polarizing plate 1030 transmits linearly polarized light X having a polarization axis in a direction perpendicular to the extending direction of the one-dimensional lattice-shaped metal layer 1032, while the extension of the one-dimensional lattice-shaped metal layer 1032 is performed. Reflects linearly polarized light having a polarization axis in a direction parallel to the current direction. Therefore, the polarizing plate 1030 exhibits the same action as the light reflection polarizing element, that is, the action of transmitting polarized light parallel to the optical axis (transmission axis) and reflecting polarized light perpendicular to the optical axis.

According to the polarizing plate 1030 of the seventh embodiment, since the metal layer 1032 made of aluminum is present on the outermost surface, the luminance is 1.2 to 1.3 times that of the conventional absorption polarizing plate. . Therefore, in the liquid crystal display device to which the polarizing plate 1030 is applied, the light reflected by the aluminum metal layer 1032 of the polarizing plate 1030 can be reflected by the reflector of the backlight and reused. Become.
Further, the polarizing plate 1030, a pitch _{P 20} of the

metal layer

1032 and 100 nm ~ 150 nm. Accordingly, the blue light on the short wavelength side is easily transmitted in the conventional absorption-type polarizing plate, but the blue light transmission can be suppressed in the polarizing plate 1030. Therefore, a clear black display with high contrast becomes possible.
In the polarizing plate 1030, a porous metal oxide layer 1033 is formed between one-dimensional lattice-like metal layers 1032. Therefore, durability such as bending resistance is excellent, and the aspect ratio of the metal layer 1032 (ratio of the width and thickness of the metal layer 1032) can be increased.
Furthermore, since the polarizing plate 1030 can use not only a glass substrate but also a resin film substrate as the substrate 1031, it is not only lightweight and difficult to break, but also can be easily processed into a liquid crystal panel.

Next, a method for manufacturing the polarizing plate 1030 will be described.
First, as shown in FIG. 37, a metal layer 1032 made of aluminum (Al) is uniformly formed on the entire surface of one surface 1031a of the substrate 1031 by sputtering or vapor deposition.
The thickness of the metal layer 1032 is preferably 1 μm to 3 μm.

Next, as shown in FIG. 38, the thickness of the metal layer 1032 is uniform over the entire surface of the surface 1032a opposite to the surface in contact with the substrate 1031 (hereinafter referred to as “one surface”). Apply a negative resist. Thereafter, the negative resist is exposed to form an insulating layer 1034 having a uniform thickness.
The thickness of the insulating layer 1034 is not particularly limited, but is preferably 300 nm to 1000 nm.

Next, as illustrated in FIG. 39, the insulating layer 1034 is buffed with nerbuff to form a one-dimensional lattice-shaped insulating layer 1034 A on the metal layer 1032.
In other words, the insulating layer 1034 is buffed using nelbuff to partially remove the insulating layer 1034 and form the adjacent insulating layers 1034A on the metal layer 1032 in a state of being separated from each other. At the same time, a linear groove (gap) 1034a is formed between the insulating layers 1034A.
Note that the formation of the insulating layers 1034A in a one-dimensional lattice means that a large number of linear insulating layers 1034A are formed at regular intervals in parallel, that is, periodically.

In this step, the one-dimensional lattice-like insulating layer 1034A is formed by buffing using nerbuff in the same manner as in the sixth embodiment.

The interval between the one-dimensional lattice-like insulating layers 1034A, that is, the width of the groove 1034a is adjusted according to the pitch P ₂₀ and the width W ₂₀ of the target one-dimensional lattice-like metal layer 1032; Preferably there is.

Next, the substrate 1031 over which the metal layer 1032 and the one-dimensional lattice-like insulating layer 1034A are formed is used as an anode. Then, one surface 1031a of the substrate 1031, that is, the surface of the substrate 1031 on which the metal layer 1032 and the one-dimensional lattice-like insulating layer 1034A are formed is made to face a cathode made of stainless steel, platinum (Pt), or the like. In this state, the surface layer of the metal layer 1032 made of aluminum (Al) is anodized in a sulfuric acid solution. Thus, as shown in FIG. 40, a porous metal oxide layer 1033 is formed in a portion of the metal layer 1032 facing the gap 1034a of the one-dimensional lattice-like insulating layer 1034A and in the vicinity thereof.
In other words, by this anodic oxidation, a metal oxide made of aluminum oxide having a number of micropores 1033a in the thickness direction in a portion facing and adjacent to the gap 1034a of the one-dimensional lattice-like insulating layer 1034A in the metal layer 1032. The physical layer 1033 is formed in a self-organizing manner. Further, by performing anodization of the metal layer 1032, the metal oxide layer 1033 is also formed on part of the portion of the metal layer 1032 that is covered with the insulating layer 1034 A.

In the seventh embodiment, the voltage applied to both electrodes is preferably 2 V, for example.
In the seventh embodiment, in the anodic oxidation, the sulfuric acid concentration of the sulfuric acid solution is appropriately adjusted according to the thickness of the metal layer 1032 to be oxidized, but is preferably 5% by mass, for example.
In the seventh embodiment, the time for applying a voltage to both electrodes is not limited, and is until the metal oxide layer 1033 made of aluminum oxide reaches the substrate 1031, that is, until no current flows between both electrodes.

Next, as shown in FIG. 41, when the metal oxide layer 1033 reaches the substrate 1031, the anodizing reaction does not proceed, and the anodizing reaction is terminated at that point.

Next, as shown in FIG. 42, the insulating layer 1034A remaining on one surface 1032a of the metal layer 1032 is removed by etching, and the substrate 1031, the metal layer 1032, and the metal oxide layer 1033 are roughly configured. A polarizing plate 1030 is obtained. The metal layer 1032 is a one-dimensional lattice-shaped metal layer formed on the substrate 1031. The metal oxide layer 1033 is a porous metal oxide layer formed between the metal layers 1032 having a one-dimensional lattice shape on the substrate 1031.
In the step of removing the insulating layer 1034A, as the etchant, for example, an organic solvent or an alkaline solution used for removing a general negative resist is used.

According to the polarizing plate manufacturing method of the seventh embodiment, the surface layer of the metal layer 1032 is anodized after the one-dimensional lattice-like insulating layer 1034A is formed by buffing using nerbuff. This eliminates the need for a nanoimprint method or a pattern forming method using a positive photosensitive resist, unlike the conventional polarizing plate manufacturing method. Therefore, the manufacturing process can be simplified as compared with the conventional case, and a large-area polarizing plate can be easily manufactured at low cost. Moreover, the manufacturing method of the polarizing plate of 7th Embodiment can be applied not only to a glass substrate but to a resin substrate.

"Liquid Crystal Display"
(6) Sixth Embodiment FIG. 43 is a schematic cross-sectional view showing a liquid crystal display device 1040 of a sixth embodiment.
In 6th Embodiment, the liquid crystal display device 1040 which comprises the liquid crystal panel provided with the polarizing plate 1010 of the above-mentioned embodiment is illustrated.
A liquid crystal display device 1040 according to the sixth embodiment is schematically configured by a liquid crystal panel 1050 and a backlight 1060. The backlight 1060 is disposed on the surface 1050b opposite to the display screen 1050a.

The liquid crystal panel 1050 includes a first polarizing plate 1051, a first substrate 1052, a first transparent electrode 1053, a liquid crystal layer 1054, a second transparent electrode 1055, a second polarizing plate 1056, a color filter 1057, It has a structure in which two substrates 1058 and a third polarizing plate 1059 are provided and these are laminated in order.
The color filter 1057 includes a red color filter 1057R, a green color filter 1057G, and a blue color filter 1057B.

As the 2nd polarizing plate 1056, the thing similar to the polarizing plate 1010 which concerns on the above-mentioned 6th Embodiment of this invention or the polarizing plate 1030 which concerns on 7th Embodiment is used.
Further, the absorption axis of the second polarizing plate 1056 faces the axial direction indicated by reference numeral 1056a in FIG.
Note that the absorption axis of the first polarizing plate 1051 is oriented in the axial direction indicated by reference numeral 1051a in FIG. 43, and the absorption axis of the third polarizing plate 1059 is oriented in the axial direction indicated by reference numeral 1059a in FIG.

Further, a linear film arranged in a blind shape called a louver may be disposed between the liquid crystal panel 1050 and the backlight 1060. The linear film collimates the light emitted from the backlight 1060 and irradiates the liquid crystal panel 1050 with the collimated light (parallel light). Alternatively, the light emitted from the backlight 1060 is substantially collimated by the linear film, and the liquid crystal panel 1050 is irradiated with the substantially collimated light (substantially parallel light).

According to the liquid crystal display device 1040, the second polarizing plate 1056 of the liquid crystal panel 1050 is the same as the polarizing plate 1010 or the polarizing plate 1030. Therefore, the light reflected by the second polarizing plate 1056 is reflected by the reflecting plate 1061 of the backlight 1060 and can be reused. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 1060 passes through the color filter 1057, depolarization occurs and the contrast is lowered. In order to suppress this, a second polarizing plate 1056 is provided under the color filter 1057. When the polarization degree of the second polarizing plate 1056 is lower than the polarization degree of the iodine polarizing plate, the contrast can be increased by providing the third polarizing plate 1059 in the sixth embodiment.

(7) Seventh Embodiment FIG. 44 is a schematic cross-sectional view showing a liquid crystal display device 1070 of a seventh embodiment.
44, the same code | symbol is attached | subjected to the same component as 6th Embodiment shown in FIG. 43, and description is abbreviate | omitted.

The liquid crystal display device 1070 according to the seventh embodiment is generally configured by a liquid crystal panel 1080 and a backlight 1060. The backlight 1060 is disposed on the surface 1080b side opposite to the display screen 1080a.

The liquid crystal panel 1080 includes a first polarizing plate 1081, a first substrate 1082, a first transparent electrode 1083, a liquid crystal layer 1084, a second transparent electrode 1085, a second polarizing plate 1086, a color filter 1087, And two substrates 1088, which are sequentially stacked.
The color filter 1087 includes a red color filter 1087R, a green color filter 1087G, and a blue color filter 1087B.

As the 2nd polarizing plate 1086, the thing similar to the polarizing plate 1010 which concerns on the above-mentioned 6th Embodiment of this invention or the polarizing plate 1030 which concerns on 7th Embodiment is used.
Further, the absorption axis of the second polarizing plate 1086 faces the axial direction indicated by reference numeral 1086a in FIG.
Note that the absorption axis of the first polarizing plate 1081 is oriented in the axial direction indicated by reference numeral 1081a in FIG.

According to the liquid crystal display device 1070, the second polarizing plate 1086 of the liquid crystal panel 1080 is the same as the polarizing plate 1010 or the polarizing plate 1030. Therefore, the light reflected by the second polarizing plate 1086 is reflected by the reflecting plate 1061 of the backlight 1060 and can be reused. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 1060 passes through the color filter 1087, depolarization occurs and the contrast is lowered. In order to suppress this, a second polarizing plate 1086 is provided under the color filter 1087.

(8) Eighth Embodiment FIG. 45 is a schematic cross-sectional view showing a liquid crystal display device 1090 of an eighth embodiment.
45, the same code | symbol is attached | subjected to the same component as 6th Embodiment shown in FIG. 43, and description is abbreviate | omitted.

The liquid crystal display device 1090 according to the eighth embodiment is generally configured by a liquid crystal panel 1100 and a backlight 1060. The backlight 1060 is disposed on the surface 1100b side opposite to the display screen 1100a.

The liquid crystal panel 1100 includes a first polarizing plate 1101, a first substrate 1102, a first transparent electrode 1103, a liquid crystal layer 1104, a second transparent electrode 1105, a second polarizing plate 1106, a color filter 1107, And two substrates 1108, which are stacked in order.
The color filter 1107 includes a red color filter 1107R, a green color filter 1107G, and a blue color filter 1107B.

As the 1st polarizing plate 1101 and the 2nd polarizing plate 1106, the thing similar to the polarizing plate 1010 which concerns on the above-mentioned 6th Embodiment of this invention or the polarizing plate 1030 which concerns on 7th Embodiment is used.
The absorption axis of the first polarizing plate 1101 faces the axial direction indicated by reference numeral 1101a in FIG. Further, the absorption axis of the second polarizing plate 1106 faces the axial direction indicated by reference numeral 1106a in FIG.

According to the liquid crystal display device 1090, the first polarizing plate 1101 and the second polarizing plate 1106 of the liquid crystal panel 1100 are the same as the polarizing plate 1010 or the polarizing plate 1030. Therefore, the light reflected by the first polarizing plate 1101 and the second polarizing plate 1106 can be reflected by the reflecting plate 1061 of the backlight 1060 and reused. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 1060 passes through the color filter 1107, depolarization occurs and the contrast is lowered. In order to suppress this, a second polarizing plate 1106 is provided under the color filter 1107.

(9) Ninth Embodiment FIG. 46 is a schematic sectional view showing a liquid crystal display device 1110 according to a ninth embodiment.
46, the same code | symbol is attached | subjected to the same component as 6th Embodiment shown in FIG. 43, and description is abbreviate | omitted.

The liquid crystal display device 1110 of the ninth embodiment is roughly configured by a liquid crystal panel 1120 and a backlight 1060. The backlight 1060 is disposed on the surface 1120b side opposite to the display screen 1120a.

The liquid crystal panel 1120 includes a first polarizing plate 1121, a first substrate 1122, a first transparent electrode 1123, a liquid crystal layer 1124, a second transparent electrode 1125, a color filter 1126, a second substrate 1127, and a second polarization. The plate 1128 is provided, and these are laminated in order.
The color filter 1126 includes a red color filter 1126R, a green color filter 1126G, and a blue color filter 1126B.

As the 1st polarizing plate 1121 and the 2nd polarizing plate 1128, the thing similar to the polarizing plate 1010 which concerns on the above-mentioned 6th Embodiment of this invention or the polarizing plate 1030 which concerns on 7th Embodiment is used.
The absorption axis of the first polarizing plate 1121 faces the axial direction indicated by reference numeral 1121a in FIG. Further, the absorption axis of the second polarizing plate 1128 faces the axial direction indicated by reference numeral 1128a in FIG.

According to the liquid crystal display device 1110, the first polarizing plate 1121 and the second polarizing plate 1128 of the liquid crystal panel 1120 are the same as the polarizing plate 1010 or the polarizing plate 1030. Therefore, the light reflected by the first polarizing plate 1121 and the second polarizing plate 1128 can be reflected by the reflecting plate 1061 of the backlight 1060 and reused. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 1060 passes through the color filter 1087, depolarization occurs and the contrast is lowered. In order to suppress this, in the ninth embodiment, the contrast can be increased by providing the second polarizing plate 1128 on the outermost surface.

(10) Tenth Embodiment FIG. 47 is a schematic cross-sectional view showing a liquid crystal display device 1130 of a tenth embodiment.
47, the same code | symbol is attached | subjected to the same component as 6th Embodiment shown in FIG. 43, and description is abbreviate | omitted.

The liquid crystal display device 1130 according to the tenth embodiment is roughly configured by a liquid crystal panel 1140 and a backlight 1060. The backlight 1060 is disposed on the surface 1140b side opposite to the display screen 1140a.

The liquid crystal panel 1140 includes a first substrate 1141, a first transparent electrode 1142, a first polarizing plate 1143, a liquid crystal layer 1144, a second transparent electrode 1145, a second polarizing plate 1146, a color filter 1147, And two substrates 1148, which are stacked in order.
The color filter 1147 includes a red color filter 1147R, a green color filter 1147G, and a blue color filter 1147B.

As the 1st polarizing plate 1143 and the 2nd polarizing plate 1146, the thing similar to the polarizing plate 1010 which concerns on the above-mentioned 6th Embodiment of this invention or the polarizing plate 1030 which concerns on 7th Embodiment is used.
The absorption axis of the first polarizing plate 1143 faces the axial direction indicated by reference numeral 1143a in FIG. Further, the absorption axis of the second polarizing plate 1146 is oriented in the axial direction indicated by reference numeral 1146a in FIG.

According to the liquid crystal display device 1130, the first polarizing plate 1143 and the second polarizing plate 1146 of the liquid crystal panel 1140 are the same as the polarizing plate 1010 or the polarizing plate 1030. Therefore, the light reflected by the first polarizing plate 1143 and the second polarizing plate 1146 can be reflected by the reflecting plate 1061 of the backlight 1060 and reused. Therefore, it is possible to increase the luminance and to display a clear black with high contrast.
Further, when the light emitted from the backlight 1060 passes through the color filter 1147, depolarization occurs and the contrast is lowered. In order to suppress this, a second polarizing plate 1146 is provided under the color filter 1147.

"Electronics"
48A to 48D are diagrams each showing an example of an electronic device provided with a liquid crystal display device similar to any one of the liquid

crystal display devices

1040, 1070, 1090, 1110, and 1130 described above in its display portion.

FIG. 48A is a schematic perspective view showing a thin display device 1200 as an example of an electronic apparatus.
The thin display device (electronic device) 1200 is generally configured by a housing 1201, a support stand 1202, a display unit 1203, a speaker unit 1204, and a video input terminal 1205.
As the display unit 1203, a display unit having the same configuration as any of the liquid

crystal display devices

1040, 1070, 1090, 1110, and 1130 according to the sixth to tenth embodiments of the present invention described above is used.

FIG. 48B is a schematic perspective view showing a notebook computer 1300 as an example of an electronic apparatus.
The notebook personal computer (electronic device) 1300 is roughly configured by a main body 1301, a housing 1302, a display unit 1303, a keyboard 1304, an external connection port 1305, and a pointing pad 1306.
As the display unit 1303, a display unit having the same configuration as any of the liquid

crystal display devices

FIG. 48C is a schematic perspective view showing a mobile phone 400 as an example of the electronic apparatus.
The cellular phone (electronic device) 1400 includes a main body 1401, a housing 1402, a display unit 1403, a voice input unit 1404, a voice output unit 1405, operation keys 1406, an external connection port 1407, and an antenna 1408. It is roughly composed.
As the display unit 1403, a display unit having the same configuration as any of the liquid

crystal display devices

FIG. 48D is a schematic perspective view illustrating a video camera 1500 as an example of an electronic apparatus.
The video camera (electronic device) 1500 includes a main body 1501, a display unit 1502, a housing 1503, an external connection port 1504, a remote control receiving unit 1505, an image receiving unit 1506, a battery 1507, and an audio input unit 1508. The operation key 1509 and the eyepiece unit 1510 are roughly configured.
As the display unit 1502, a display unit having the same configuration as any of the liquid

crystal display devices

The

electronic devices

1200, 1300, 1400, and 1500 shown in FIGS. 48A to 48D display any one of the liquid

crystal display devices

1040, 1070, 1090, 1110, and 1130 according to the sixth to tenth embodiments of the present invention described above. In the department. Therefore, the electronic apparatus includes a display unit that can display an image with high brightness and high contrast.

The present invention can be used in the fields of polarizing plates, liquid crystal display devices, and electronic equipment.

10, 30 ... Polarizing plate,
11, 31 ... substrate,
12, 32 ... metal layer,
13 ... conductive layer,
14 ... laminate,
15, 15A, 33, 33A ... insulating layer,
16, 34 ... metal oxide layer,
21 ... Anode,
22 ... cathode,
23 ... sulfuric acid solution,
40, 70, 90, 130 ... liquid crystal display device,
50, 80, 100, 120, 140 ... liquid crystal panel,
51, 81, 101, 121, 143 ... first polarizing plate,
52, 82, 102, 122, 141 ... first substrate,
53, 83, 103, 123, 142 ... first transparent electrode,
54, 84, 104, 124, 144 ... liquid crystal layer,
55, 85, 105, 125, 145 ... second transparent electrode,
56, 86, 106, 128, 146 ... second polarizing plate,
57, 87, 107, 126, 147 ... color filters,
58, 88, 108, 127, 148 ... second substrate,
59 ... third polarizing plate,
60 ... Backlight,
61 ... reflector,
200 ... Thin display device (electronic device),
300 ・・・ Notebook computer (electronic equipment),
400: mobile phone (electronic device),
500 ... Video camera (electronic equipment),
1010, 1030 ... Polarizing plate,
1011, 1031... Substrate
1012, 1032 ... metal layer,
1013, 1033 ... Metal oxide layer,
1014 ... conductive layer,
1015, 1015A, 1034, 1034A ... insulating layer,
1021... Anode,
1022... Cathode,
1023 ... sulfuric acid solution,
1040, 1070, 1090, 1130 ... Liquid crystal display device,
1050, 1080, 1100, 1120, 1140 ... liquid crystal panel,
1051, 1081, 1101, 1121, 1143... First polarizing plate,
1052, 1082, 1102, 1122, 1141 ... the first substrate,
1053, 1083, 1103, 1123, 1142 ... first transparent electrode,
1054, 1084, 1104, 1124, 1144 ... liquid crystal layer,
1055, 1085, 1105, 1125, 1145, second transparent electrode,
1056, 1086, 1106, 1128, 1146 ... second polarizing plate,
1057, 1087, 1107, 1126, 1147 ... color filters,
1058, 1088, 1108, 1127, 1148 ... second substrate,
1059 ... third polarizing plate,
1060 ... Backlight,
1061... Reflector,
1200 ... thin display device (electronic device),
1300: Notebook computer (electronic device),
1400: mobile phone (electronic device),
1500 ... Video camera (electronic equipment)

Claims

Forming a metal layer on the substrate;
Forming an insulating layer on the metal layer;
Forming a one-dimensional lattice-like insulating layer on the metal layer by buffing the insulating layer using nerbuff;
The substrate on which the metal layer and the one-dimensional lattice-like insulating layer are formed is used as an anode, and the surface of the substrate on which the metal layer and the one-dimensional lattice-like insulating layer are formed is opposed to the cathode. Forming a porous metal oxide layer in and near the portion of the metal layer facing the gap of the one-dimensional lattice-like insulating layer by anodizing the surface layer of the metal layer in the state ,
And a step of removing the insulating layer by etching.
The manufacturing method of a polarizing plate according to claim 1, comprising a step of processing the metal layer into a one-dimensional lattice by removing the metal oxide layer by etching using the one-dimensional lattice-like insulating layer as a mask. Method.
The method for producing a polarizing plate according to claim 1, further comprising a step of forming a conductive layer on the substrate before the step of forming the metal layer on the substrate.
The method for producing a polarizing plate according to claim 3, wherein in the step of forming the metal oxide layer, the conductive layer is used as an anode.
The manufacturing method of the polarizing plate of Claim 3 which removes the part which opposes the said metal oxide layer among the said electroconductive layers with the said metal oxide layer in the process of processing the said metal layer in a one-dimensional lattice form. .
A polarizing plate comprising a substrate transparent to incident light and a one-dimensional lattice-like metal layer formed on the substrate, wherein the pitch of the one-dimensional lattice-like metal layer is smaller than the wavelength of incident light.
The one-dimensional grid-like metal layer is formed by buffing an insulating layer formed on the metal layer formed on the substrate using a nerbuff to form a one-dimensional grid-like insulating layer on the metal layer. The substrate on which the metal layer and the one-dimensional lattice-like insulating layer are formed is an anode, the surface of the substrate on which the metal layer and the one-dimensional lattice-like insulating layer are formed, and a cathode With the surface of the metal layer facing each other, the surface layer of the metal layer is anodized, so that a porous metal oxide layer is formed in and near the portion of the metal layer facing the gap of the one-dimensional lattice-like insulating layer. The polarizing plate according to claim 6, which is formed by removing the metal oxide layer by etching using the one-dimensional lattice-like insulating layer as a mask.
The polarizing plate according to claim 6, wherein a conductive layer is formed between the substrate and the metal layer.
The polarizing plate according to claim 6, further comprising a metal oxide layer interposed between the metal layers.
The one-dimensional grid-like metal layer is formed by buffing an insulating layer formed on the metal layer formed on the substrate using a nerbuff, thereby forming a one-dimensional grid-like insulation on the metal layer. Forming a layer, the substrate on which the metal layer and the one-dimensional lattice-like insulating layer are formed as an anode, a surface of the substrate on which the metal layer and the one-dimensional lattice-like insulating layer are formed, and a cathode And a portion of the metal layer facing the gap of the one-dimensional lattice-like insulating layer and a porous metal oxide layer in the vicinity thereof, by anodizing the surface layer of the metal layer The polarizing plate according to claim 9, formed by forming a film.
The polarizing plate according to claim 10, wherein a conductive layer is interposed between the substrate and the metal layer and the metal oxide layer.
A substrate transparent to incident light, and a one-dimensional grid-like metal layer formed on the substrate, wherein the pitch of the one-dimensional grid-like metal layer is smaller than the wavelength of the incident light. A liquid crystal panel.
A substrate transparent to incident light, and a one-dimensional grid-like metal layer formed on the substrate, wherein the pitch of the one-dimensional grid-like metal layer is smaller than the wavelength of the incident light. A liquid crystal display device comprising a liquid crystal panel.
A substrate transparent to incident light, and a one-dimensional grid-like metal layer formed on the substrate, wherein the pitch of the one-dimensional grid-like metal layer is smaller than the wavelength of the incident light. An electronic apparatus including a liquid crystal display device having a liquid crystal panel.