JP2915513B2 - Anti-reflective coating - Google Patents
Anti-reflective coatingInfo
- Publication number
- JP2915513B2 JP2915513B2 JP2195995A JP19599590A JP2915513B2 JP 2915513 B2 JP2915513 B2 JP 2915513B2 JP 2195995 A JP2195995 A JP 2195995A JP 19599590 A JP19599590 A JP 19599590A JP 2915513 B2 JP2915513 B2 JP 2915513B2
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- JP
- Japan
- Prior art keywords
- layer
- refractive index
- optical
- optical thickness
- antireflection film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は反射防止膜に関する。The present invention relates to an antireflection film.
［従来の技術］ 反射防止膜はレンズやプリズム等の透明な光学部品の
表面による反射を防止するために用いられ、従来から種
々のものが提案されている。[Related Art] An anti-reflection film is used to prevent reflection on the surface of a transparent optical component such as a lens or a prism, and various types have been proposed.
可視光領域で比較的に低く且つ平坦な反射率を持つ反
射防止膜としては従来から、中心波長λ０に対しλ0/2
の光学厚さを持った層を、λ0/4の光学的厚さをもった
層で挟むようにした３層構造のものが知られている（特
開昭58−60701号公報）。The antireflection film having and flat reflectance relatively low in the visible light region conventionally, with respect to the central wavelength λ 0 λ 0/2
Of the layers having an optical thickness, λ 0/4 of the 3-layer structure in which a sandwich with a layer having an optical thickness have been known (JP-58-60701 JP).
一方、近来、プラスチックレンズを初めとしてプラス
チックの光学部品が広く実用化されつつあるが、プラス
チックの光学部品は帯電し易く、微塵等が静電的に吸着
されて汚れやすいという問題がある。On the other hand, recently, plastic optical components such as plastic lenses have been widely put into practical use. However, plastic optical components are easily charged, and there is a problem that fine dust and the like are easily attracted electrostatically and become dirty.
このような帯電の問題を解消するために上記３層構造
の反射防止膜の真中の層を、In2O3,ITO,SnO2,ZnO等の導
電性材料で形成することが提案されている（特開平１−
180501号公報）。In order to solve such a charging problem, it has been proposed that the middle layer of the antireflection film having the three-layer structure is formed of a conductive material such as In 2 O 3 , ITO, SnO 2 , and ZnO. (JP-A-1-
180501).
［発明が解決しようとする課題］ 上記３層構造の反射防止膜は、真中の層の光学的厚さ
が中心波長λ０の1/2倍と大きく、この層を形成するの
に長時間を要し、層形成中に形成装置内の温度が上昇す
ると層の屈折率が設計値から外れ易い。このため上記反
射防止膜は製造上の歩留まりが低く、結果的に反射防止
膜形成のコストが高くなる。Antireflection film of the three-layer structure [SUMMARY OF THE INVENTION] The optical thickness of the middle layer is as large as half the center wavelength lambda 0, a long time to form the layer In short, if the temperature inside the forming apparatus rises during the formation of the layer, the refractive index of the layer tends to deviate from the designed value. For this reason, the antireflection film has a low production yield, and as a result, the cost of forming the antireflection film increases.
また帯電防止のために上記真中の層に導電性の金属材
料を用いると、真中の層の光吸収率が大きくなるため光
学部品の光透過率は60〜70％程度と低くなり反射防止膜
の効果を十分に生かすことができない。Also, if a conductive metal material is used for the middle layer for antistatic purposes, the light absorption of the middle layer increases, so that the light transmittance of the optical component decreases to about 60 to 70%, and The effect cannot be fully utilized.
本発明は上述した事情に鑑みてなされたものであっ
て、比較的低コストで品質を安定して作製でき、しかも
光学部品の帯電の問題を有効に解決でき、尚且つ可視光
全領域で良好な反射防止機能を持つ新規な反射防止膜の
提供を目的とする。The present invention has been made in view of the above-described circumstances, and can be manufactured stably at a relatively low cost and quality, and can effectively solve the problem of charging of optical components, and is excellent in the entire visible light region. It is an object of the present invention to provide a novel antireflection film having an excellent antireflection function.
［課題を解決するための手段］ 以下、本発明を説明する。[Means for Solving the Problems] Hereinafter, the present invention will be described.
本発明の反射防止層は「1.4〜1.9の範囲内の屈折率を
有する透明な光学部品の入射面および／または射出面に
設けられる反射防止膜」であって、光学部品の表面側か
ら順次、第１乃至第５層を積層してなる。従って第１層
は光学部品表面に接し、第５層は空気に接する。The antireflection layer of the present invention is "an antireflection film provided on the entrance surface and / or the exit surface of a transparent optical component having a refractive index in the range of 1.4 to 1.9", and sequentially from the surface side of the optical component, It is formed by laminating first to fifth layers. Therefore, the first layer is in contact with the optical component surface, and the fifth layer is in contact with air.
上記光学部品は「1.4〜1.9の範囲内の屈折率の透明材
料で形成された光学部品、もしくはかかる光学部品の表
面部分を上記屈折率範囲内の材料により表面層を形成し
た光学部品」を意味する。The optical component means `` an optical component formed of a transparent material having a refractive index in the range of 1.4 to 1.9, or an optical component in which the surface portion of such an optical component has a surface layer formed of a material in the refractive index range ''. I do.
「第１層」は屈折率1.5〜2.5の高屈折率材料により光
学的厚さが、中心波長をλ０として（λ0/4）の0.3〜0.
7倍であるように形成される。The “first layer” is made of a high refractive index material having a refractive index of 1.5 to 2.5, and has an optical thickness of 0.3 to 0 (λ 0/4) with a center wavelength of λ 0 .
Formed to be 7 times.
「第２層」は屈折率1.3〜2.0の低屈折率材料により光
学的厚さが（λ0/4）の0.1〜0.5倍であるように形成さ
れる。"Second layer" is formed to be 0.1 to 0.5 times the optical thickness (λ 0/4) by the low-refractive index material having a refractive index 1.3 to 2.0.
「第３層」は屈折率1.5〜2.5の高屈折率材料により光
学的厚さが（λ0/4）の0.3〜0.7倍であるように形成さ
れる。"Third layer" is formed to be 0.3 to 0.7 times the optical thickness (λ 0/4) by the high refractive index material having a refractive index from 1.5 to 2.5.
「第４層」は金属または導電性の金属酸化物屈折率1.
5〜2.5の高屈折率材料により光学的厚さが（λ0/4）の
0.1〜0.5倍であるように形成される。`` Fourth layer '' is metal or conductive metal oxide refractive index 1.
The high refractive index material of 5 to 2.5 optical thickness of (λ 0/4)
It is formed to be 0.1 to 0.5 times.
「第５層」は屈折率1.3〜2.0の低屈折率材料により光
学的厚さが（λ0/4）の0.8〜1.5倍であるように形成さ
れる。"Fifth layer" is formed to be 0.8 to 1.5 times the optical thickness (λ 0/4) by the low-refractive index material having a refractive index 1.3 to 2.0.
本発明の反射防止膜は、一般には「光学部品」の入射
面と射出面とに設けられる。このようにすることにより
光学部品の光透過率を高めることができる。光学部品の
用途によっては入射面・射出面のうちの一方にのみ設け
る場合もあり得る。また光学部品がコーナーキューブの
ような場合には入射面が同時に射出面であるのでこの場
合は射出面を兼ねた入射面に設けることになる。The antireflection film of the present invention is generally provided on the entrance surface and the exit surface of an “optical component”. By doing so, the light transmittance of the optical component can be increased. Depending on the use of the optical component, it may be provided only on one of the entrance surface and the exit surface. In addition, when the optical component is a corner cube, the incident surface is also the exit surface, and in this case, it is provided on the incident surface that also serves as the exit surface.
［作用］ 本発明の反射防止膜は上述のように５層構造である
が、各層の光学的厚さは中心波長λ０の1/4倍を単位と
して平均して上記単位の0.1〜1.6倍程度であるから各層
の形成に然程の長時間を要しない。Although [Operation] antireflection film of the present invention is a five-layer structure as described above, the optical thickness of each layer by averaging the 1/4 of the central wavelength lambda 0 units 0.1-1.6 times the unit Therefore, it does not take a long time to form each layer.
また第４層は金属または導電性の金属酸化物で構成さ
れるから反射防止膜を低電気抵抗に形成できる。Further, since the fourth layer is composed of a metal or a conductive metal oxide, the antireflection film can be formed with low electric resistance.
本発明の反射防止膜の基本的構成を第1,第３図と第５
図を参照して具体的に説明する。The basic structure of the antireflection film of the present invention is shown in FIGS.
This will be specifically described with reference to the drawings.
第１図で符号１は透明な平行平板を示す。この平行平
板１は具体的には屈折率1.504のCR−39の透明基板の表
面に屈折率1.596の透明膜をディピング法で形成したも
のである。In FIG. 1, reference numeral 1 denotes a transparent parallel plate. Specifically, the parallel flat plate 1 is obtained by forming a transparent film having a refractive index of 1.596 on the surface of a CR-39 transparent substrate having a refractive index of 1.504 by a dipping method.
平行平板１の両面には本発明の反射防止膜12,13が形
成されている。これら反射防止膜12,13は５層構造であ
り、反射防止膜12は第１層2,第２層3,第３層4,第４層5,
第５層６により構成され、反射防止膜13は第１層7,第２
層8,3層9,第４層10,第５層11により構成されている。The antireflection films 12, 13 of the present invention are formed on both surfaces of the parallel plate 1. The antireflection films 12 and 13 have a five-layer structure, and the antireflection film 12 has a first layer 2, a second layer 3, a third layer 4, a fourth layer 5,
The antireflection film 13 is composed of the first layer 7 and the second layer 6.
It is composed of a layer 8, a third layer 9, a fourth layer 10, and a fifth layer 11.
第１層2,7は、屈折率1.7〜2.5を持つTiO2またはCeO2
を材料として形成され、光学的厚さは中心波長λ０＝50
0〜550nmに対して（λ0/4）の0.3〜0.7倍に設定され
る。The first layer 2 and 7, TiO 2 or CeO 2 having a refractive index 1.7 to 2.5
And the optical thickness is center wavelength λ 0 = 50.
It is set to 0.3 to 0.7 times (λ 0/4) with respect to 0 to 550 nm.
第２層3,8は、屈折率1.5〜1.9を持つSiOの薄膜であ
り、光学的厚さは中心波長λ０＝500〜550nmに対して
（λ0/4）の0.1〜0.5倍に設定される。なお第２層3,8に
はSiOの他にSiが混入しており、このSiの混入量の多寡
により屈折率が1.5〜1.9の範囲で変動する。The second layer 3 and 8, a thin film of SiO having a refractive index 1.5 to 1.9, set 0.1 to 0.5 times the optical thickness with respect to the central wavelength λ 0 = 500~550nm (λ 0/ 4) Is done. The second layers 3, 8 contain Si in addition to SiO, and the refractive index varies in the range of 1.5 to 1.9 depending on the amount of Si mixed.
第３層4,9は、屈折率1.7〜2.5を持つTiO2またはCeO2
を材料として形成され、光学的厚さは中心波長λ０＝50
0〜550nmに対して（λ0/4）の0.3〜0.7倍に設定され
る。The third layer 4 and 9, TiO 2 or CeO 2 having a refractive index 1.7 to 2.5
And the optical thickness is center wavelength λ 0 = 50.
It is set to 0.3 to 0.7 times (λ 0/4) with respect to 0 to 550 nm.
第４層５、10は、屈折率1.95〜2.05を持つIn2O3また
はITOを材料として形成され、光学的厚さは中心波長λ
０＝500〜550nmに対して（λ0/4）の0.1〜0.5倍に設定
される。The fourth layers 5 and 10 are made of In 2 O 3 or ITO having a refractive index of 1.95 to 2.05, and have an optical thickness of a center wavelength λ.
0 = is set to 0.1 to 0.5 times the (lambda 0/4) with respect to 500 to 550 nm.
第５層6,11は屈折率1.3〜1.5を持つSiO2を材料として
形成され、光学的厚さは中心波長λ０＝500〜550nmに対
して（λ0/4）の0.8〜1.5倍に設定される。Fifth layer 6, 11 is formed of SiO 2 having a refractive index 1.3 to 1.5 as a material, to 0.8 to 1.5 times the optical thickness with respect to the central wavelength λ 0 = 500~550nm (λ 0/ 4) Is set.
従って屈折率の大小関係は、第１層が高屈折率、第２
層が低屈折率、第３層が高屈折率、第４層が高屈折率、
第５層が低屈折率である。Therefore, the relationship between the refractive indices is that the first layer has a high refractive index and the second layer has a high refractive index.
The layer has a low refractive index, the third layer has a high refractive index, the fourth layer has a high refractive index,
The fifth layer has a low refractive index.
第１図のように反射防止膜12,13を形成されたCR−39
の平行平板に光を照射した場合の分光反射率は第３図に
示す如くであり、分光透過率は第５図に示す如くであ
る。CR-39 having anti-reflection films 12, 13 formed thereon as shown in FIG.
FIG. 3 shows the spectral reflectance when the parallel flat plate is irradiated with light, and FIG. 5 shows the spectral transmittance.
これらの図から明かなように、可視光の全域にわたっ
て反射率は１％以下で可視光域内に反射光特有のピーク
を有し、透過率は95％以上である。また表面電気抵抗率
は108Ω／□以下である。As is clear from these figures, the reflectance is 1% or less over the entire visible light range, has a peak specific to reflected light in the visible light range, and the transmittance is 95% or more. The surface electric resistivity is 10 8 Ω / □ or less.
［実施例］ 以下、具体的な実施例を説明する。[Example] Hereinafter, a specific example will be described.
第２図に於いて符号21はCR−39で形成されたレンズを
示している。In FIG. 2, reference numeral 21 denotes a lens formed of CR-39.
レンズ21の両面に反射防止膜32,33が形成されてい
る。Antireflection films 32 and 33 are formed on both surfaces of the lens 21.
反射防止膜32は、第１層22,第２層23,第３層24、第４
層25,第５層26により構成され、反射防止膜33は、第１
層27,第２層28,第３層29,第４層30,第５層31により構成
されている。The antireflection film 32 includes a first layer 22, a second layer 23, a third layer 24,
The antireflection film 33 includes a first layer 25 and a fifth layer 26.
It comprises a layer 27, a second layer 28, a third layer 29, a fourth layer 30, and a fifth layer 31.
第１層22,27は、屈折率1.80〜2.20を持つTiO2を材料
として形成され、光学的厚さは中心波長λ０＝500〜500
nmに対して（λ0/4）の0.3〜0.7倍に設定される。The first layers 22 and 27 are formed of TiO 2 having a refractive index of 1.80 to 2.20, and have an optical thickness of a center wavelength λ 0 = 500 to 500.
It is set to 0.3 to 0.7 times that of (λ 0/4) against nm.
第２層23,28は、屈折率1.50〜1.80を持つSiOの薄膜で
あり、光学的厚さは中心波長λ０＝500〜550nmに対し
（λ0/4）の0.1〜0.5倍に設定される。The second layer 23, 28 is a SiO thin film having a refractive index from 1.50 to 1.80, is set to 0.1 to 0.5 times the optical thickness with respect to the center wavelength λ 0 = 500~550nm (λ 0/ 4) You.
第３層24,29は、屈折率1.80〜2.20の屈折率を持つTiO
2を材料として形成され、光学的厚さは中心波長λ０＝5
00〜550nmに対して（λ0/4）の0.3〜0.7倍に設定され
る。The third layers 24 and 29 are made of TiO having a refractive index of 1.80 to 2.20.
2 as a material, and the optical thickness is a center wavelength λ 0 = 5.
It is set to 0.3 to 0.7 times that of (λ 0/4) against 00~550nm.
第４層25,30は、屈折率1.95〜2.05を持つIn2O3を材料
として形成され光学的厚さは中心波長λ０＝500〜550nm
に対して（λ0/4）の0.1〜0.5倍に設定される。The fourth layers 25 and 30 are formed of In 2 O 3 having a refractive index of 1.95 to 2.05, and have an optical thickness of a central wavelength λ 0 = 500 to 550 nm.
It is set to 0.1 to 0.5 times that of (λ 0/4) against.
第５層26,31は、屈折率1.35〜1.50を持つSiO2の薄膜
であり、光学的厚さは中心波長λ０＝500〜550nmに対し
（λ0/4）の0.8〜1.5倍に設定される。Fifth layer 26, 31 is a thin film of SiO 2 having a refractive index 1.35 to 1.50, set to 0.8 to 1.5 times the optical thickness with respect to the center wavelength λ 0 = 500~550nm (λ 0/ 4) Is done.
この実施例光学部品に於ける分光反射率を第４図に示
す。可視光の広範な領域に於いて反射率は１％以下であ
り、可視光域内に特有の反射光特性のピークを持ち、ピ
ークに於ける反射率は0.8％程度であり、波長430nm,630
nm付近の反射率は０％である。透過率は可視光の広範な
領域で98％以上で表面電気抵抗率は108Ω／□以下であ
った。FIG. 4 shows the spectral reflectance of the optical component of this embodiment. The reflectance is 1% or less in a wide range of visible light, has a characteristic reflection light peak in the visible light range, the reflectance at the peak is about 0.8%, and wavelengths of 430 nm and 630 nm.
The reflectance around nm is 0%. The transmittance was 98% or more in a wide range of visible light, and the surface electrical resistivity was 10 8 Ω / □ or less.
［発明の効果］ 以上、本発明によれば新規な反射防止膜を提供でき
る。この反射防止膜は、これを構成する５層の膜が何れ
も薄く比較的短時間で膜形成できるから反射防止膜形成
中の膜形成装置中の温度上昇に伴う膜の屈折率変化を小
さくでき、品質の安定したものを容易に量産することが
できる。[Effects of the Invention] As described above, according to the present invention, a novel antireflection film can be provided. Since the antireflection film can be formed in a relatively short time in all of the five layers constituting the antireflection film, the change in the refractive index of the film due to a rise in temperature in the film forming apparatus during the formation of the antireflection film can be reduced. In addition, products with stable quality can be easily mass-produced.
また５層構造としたことに伴い、第１〜第４層の屈折
率範囲と膜厚の範囲が広くなり、膜材料の選択の自由度
が大きい。Further, with the five-layer structure, the range of the refractive index and the range of the film thickness of the first to fourth layers are widened, and the degree of freedom in selecting the film material is large.
また光学部品の帯電を良好に防止でき、尚且つ可視光
の広範な領域で極めて高い透過率と良好な反射防止機能
とを実現できる。In addition, it is possible to prevent charging of the optical component satisfactorily, and to realize an extremely high transmittance and a good antireflection function in a wide range of visible light.
第１図は本発明の反射防止膜の基本構成を説明するため
の図、第２図は本発明の１実施例を説明するための図、
第３図及び第４図は第１図及び第２図に対応した分光反
射率特性を示す図、第５図は第１図に対応した分光透過
率特性を示す図である。 21……光学部品としてのCR−39のレンズ、32,33……反
射防止膜、22,27……第１層、23,28……第２層、24,29
……第３層、25,30……第４層、26,31……第５層FIG. 1 is a view for explaining a basic configuration of an antireflection film of the present invention, FIG. 2 is a view for explaining one embodiment of the present invention,
FIGS. 3 and 4 are diagrams showing spectral reflectance characteristics corresponding to FIGS. 1 and 2, and FIG. 5 is a diagram showing spectral transmittance characteristics corresponding to FIG. 21: CR-39 lens as an optical component, 32, 33: anti-reflection film, 22, 27: first layer, 23, 28 ... second layer, 24, 29
..... 3rd layer, 25,30 ... 4th layer, 26,31 .... 5th layer
フロントページの続き (56)参考文献 特開 昭64−80904（ＪＰ，Ａ) 実開 昭63−137301（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.6，ＤＢ名) G02B 1/10 - 1/12 Continued on the front page (56) References JP-A-64-80904 (JP, A) JP-A-63-137301 (JP, U) (58) Fields investigated (Int. Cl. 6 , DB name) G02B 1 / 10-1/12
Claims (1)
光学部品の入射面および／または射出面に設けられる反
射防止膜であって、 光学部品の表面側から順次、第１乃至第５層を積層して
なり、 第１層は屈折率1.5〜2.5の高屈折率材料により光学的厚
さが、中心波長をλ０として（λ0/4）の0.3〜0.7倍で
あるように形成され、 第２層は屈折率1.3〜2.0の低屈折率材料により光学的厚
さが（λ0/4）の0.1〜0.5倍であるように形成され、 第３層は屈折率1.5〜2.5の高屈折率材料により光学的厚
さが（λ0/4）の0.3〜0.7倍であるように形成され、 第４層は金属または導電性の金属酸化物で屈折率1.5〜
2.5の高屈折率材料により光学的厚さが（λ0/4）の0.1
〜0.5倍であるように形成され、 第５層は屈折率1.3〜2.0の低屈折率材料により光学的厚
さが（λ0/4）の0.8〜1.5倍であるように形成されたこ
とを特徴とする、反射防止膜。An anti-reflection film provided on an entrance surface and / or an exit surface of a transparent optical component having a refractive index in a range of 1.4 to 1.9, wherein the first to the first optical components are sequentially arranged from the surface side of the optical component. the five layers formed by laminating, as the first layer optical thicknesses the high refractive index material having a refractive index 1.5 to 2.5 is 0.3 to 0.7 times the center wavelength as λ 0 (λ 0/4) is formed, the second layer is formed so as to be 0.1 to 0.5 times the optical thickness (λ 0/4) by the low-refractive index material having a refractive index 1.3 to 2.0, the third layer refractive index 1.5 to 2.5 the optical thickness by the high refractive index material is formed so as to be 0.3 to 0.7 times the (λ 0/4), the fourth layer refractive index 1.5 in a metal or conductive metal oxide
0.1 The high refractive index material of 2.5 optical thickness of (λ 0/4)
It is formed so as to be 0.5 times, that the fifth layer was formed to 0.8 to 1.5 times the optical thickness (λ 0/4) by the low-refractive index material having a refractive index 1.3 to 2.0 Characterized by an anti-reflection film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2195995A JP2915513B2 (en) | 1990-07-24 | 1990-07-24 | Anti-reflective coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2195995A JP2915513B2 (en) | 1990-07-24 | 1990-07-24 | Anti-reflective coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0481701A JPH0481701A (en) | 1992-03-16 |
| JP2915513B2 true JP2915513B2 (en) | 1999-07-05 |
Family
ID=16350474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2195995A Expired - Fee Related JP2915513B2 (en) | 1990-07-24 | 1990-07-24 | Anti-reflective coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2915513B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170094416A (en) | 2015-02-27 | 2017-08-17 | 제이엑스금속주식회사 | Oxide sintered compact, oxide sputtering target, and oxide thin film |
-
1990
- 1990-07-24 JP JP2195995A patent/JP2915513B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170094416A (en) | 2015-02-27 | 2017-08-17 | 제이엑스금속주식회사 | Oxide sintered compact, oxide sputtering target, and oxide thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0481701A (en) | 1992-03-16 |
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