JP2891506B2 - Method for manufacturing solid electrolytic capacitor - Google Patents

Method for manufacturing solid electrolytic capacitor

Info

Publication number
JP2891506B2
JP2891506B2 JP7453790A JP7453790A JP2891506B2 JP 2891506 B2 JP2891506 B2 JP 2891506B2 JP 7453790 A JP7453790 A JP 7453790A JP 7453790 A JP7453790 A JP 7453790A JP 2891506 B2 JP2891506 B2 JP 2891506B2
Authority
JP
Japan
Prior art keywords
solid electrolytic
electrolytic capacitor
manganese
anode substrate
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP7453790A
Other languages
Japanese (ja)
Other versions
JPH03274715A (en
Inventor
一美 内藤
幸治 松村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP7453790A priority Critical patent/JP2891506B2/en
Publication of JPH03274715A publication Critical patent/JPH03274715A/en
Application granted granted Critical
Publication of JP2891506B2 publication Critical patent/JP2891506B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、弁作用を有する金属の表面に二酸化鉛と硫
酸鉛からなる半導体層を設けた固体電解コンデンサの製
造方法に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a solid electrolytic capacitor in which a semiconductor layer made of lead dioxide and lead sulfate is provided on the surface of a metal having a valve action.

〔従来の技術〕[Conventional technology]

一般に固体電解コンデンサの素子は、弁作用金属から
なる陽極基体の表面に誘電体酸化皮膜層を形成し、この
誘電体酸化皮膜層の外面に対向電極として二酸化マンガ
ン等の半導体層を形成し、さらに接触抵抗を減じるため
に銀ペースト層等を設けて導電体層を形成している。
In general, a solid electrolytic capacitor element has a dielectric oxide film layer formed on the surface of an anode substrate made of a valve metal, and a semiconductor layer such as manganese dioxide formed as a counter electrode on the outer surface of the dielectric oxide film layer. To reduce the contact resistance, a conductor layer is formed by providing a silver paste layer or the like.

上述した二酸化マンガン以外の半導体として、二酸化
鉛はその電導度が比較的高いため、高性能な固体電解コ
ンデンサを作製することが期待されたが実現されたもの
はなかった。このような中で、本発明者等は特開昭63−
51621号公報等で二酸化鉛と硫酸鉛からなる半導体層を
有し、性能が良好で工業的に実現可能な固体電解コンデ
ンサおよびその製造方法等を提案した。
As a semiconductor other than the above-mentioned manganese dioxide, lead dioxide has a relatively high conductivity, and therefore, it was expected to produce a high-performance solid electrolytic capacitor, but none was realized. Under these circumstances, the present inventors have disclosed in
No. 51621 and the like have proposed a solid electrolytic capacitor having a semiconductor layer composed of lead dioxide and lead sulfate, having good performance and industrially realizable, and a method for manufacturing the same.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

一方、電子機器の軽薄短小化に伴い固体電解コンデン
サに於いても出来る限り同一体積ならその容量値を大き
くすることが望まれている。一般に固体電解コンデンサ
の陽極基体は容量をかせぐために複雑な表面形状をして
いるが、半導体層は陽極基体の表面全域を覆わねば全容
量を引き出すことができない。しかしながら、二酸化鉛
と硫酸鉛からなる半導体層を形成させる反応母液中に陽
極基体を浸漬し、反応と同時に半導体層を析出させる従
来の製法に於いても、得られた固体電解コンデンサの単
位体積当りの容量値を更に大きくさせる必要性があっ
た。
On the other hand, as electronic devices become lighter and thinner, it is desired to increase the capacitance value of a solid electrolytic capacitor as long as it has the same volume as possible. Generally, the anode substrate of a solid electrolytic capacitor has a complicated surface shape in order to gain capacity, but the semiconductor layer cannot draw out the entire capacitance unless it covers the entire surface of the anode substrate. However, in the conventional manufacturing method in which the anode substrate is immersed in a reaction mother liquor for forming a semiconductor layer composed of lead dioxide and lead sulfate and the semiconductor layer is deposited simultaneously with the reaction, the solid electrolytic capacitor obtained per unit volume is also used. Need to be further increased.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、上述した問題点を解決するためになされた
もので、その要旨は、弁作用を有する金属からなる陽極
基体の表面に、誘電体酸化皮膜層、二酸化鉛と硫酸鉛か
らなる半導体層および導電体層を順次形成して固体電解
コンデンサを製造するに際して、誘電体酸化皮膜層を有
する陽極基体を硝酸イオンまたは/およびマンガンイオ
ンを含む溶液に浸漬して引き上げた後、二酸化鉛と硫酸
鉛とを析出する反応母液に浸漬して反応させ半導体層を
形成する固体電解コンデンサの製造方法にある。
The present invention has been made in order to solve the above-mentioned problems, and the gist of the present invention is to provide a dielectric oxide film layer and a semiconductor layer made of lead dioxide and lead sulfate on the surface of an anode substrate made of a metal having a valve action. And a conductor layer are sequentially formed to manufacture a solid electrolytic capacitor. After the anode substrate having the dielectric oxide film layer is immersed in a solution containing nitrate ions and / or manganese ions and pulled up, lead dioxide and lead sulfate are formed. In a solid electrolytic capacitor in which a semiconductor layer is formed by immersion in a reaction mother liquor for precipitating the semiconductor layer to cause a reaction.

本発明の方法によって製造する固体電解コンデンサ素
子の陽極として用いられる弁作用金属としては、例えば
アルミニウム、タンタル、ニオブ、チタンおよびこれを
基質とする合金等、弁作用を有する金属がいずれも使用
できる。
As the valve action metal used as the anode of the solid electrolytic capacitor element manufactured by the method of the present invention, any metal having a valve action such as aluminum, tantalum, niobium, titanium and an alloy using the same as a substrate can be used.

陽極基体の表面に形成される誘電体酸化皮膜層は、陽
極基体表層部分に設けられた陽極基体自体の酸化物層で
あっても良く、あるいは陽極基体の表面上に設けられた
他の誘電体酸化物の層であってもよいが、特に陽極弁金
属自体の酸化物からなる層であることが望ましい。いず
れの場合にも酸化物層を設ける方法としては、従来公知
の方法を用いることができる。
The dielectric oxide film layer formed on the surface of the anode substrate may be an oxide layer of the anode substrate itself provided on the surface layer of the anode substrate, or another dielectric layer provided on the surface of the anode substrate. It may be an oxide layer, but is preferably a layer made of an oxide of the anode valve metal itself. In any case, as a method of providing the oxide layer, a conventionally known method can be used.

次に本固体電解コンデンサ素子の誘電体酸化皮膜層上
に形成される半導体層は、二酸化鉛と硫酸鉛を主成分と
する層である。このような半導体層を形成する試薬類と
しては、鉛イオン種を与える酢酸鉛三水和物や過硫酸イ
オン種を与える過硫酸アンモニウム等があり、本発明者
等が特開昭62−279623号公報等で提案した試薬を採用す
ることが出来る。
Next, the semiconductor layer formed on the dielectric oxide film layer of the solid electrolytic capacitor element is a layer mainly composed of lead dioxide and lead sulfate. Examples of reagents for forming such a semiconductor layer include lead acetate trihydrate which gives a lead ion species, ammonium persulfate which gives a persulfate ion species, and the like. And the like.

本発明に於いては前記半導体層を形成する場合、硝酸
イオンまたは/およびマンガンイオンを含む溶液に浸漬
した後引き上げて、次に二酸化鉛と硫酸鉛とを析出する
反応母液に浸漬して反応させることが肝要である。陽極
基体を硝酸イオンまたは/およびマンガンイオンを含む
溶液に浸漬して引き上げるまでの時間は、陽極基体の形
状によって変化するので一概に決定することが出来ない
が一般に数秒以上である。また、陽極基体を溶液から引
き上げた後、表面を水洗して陽極基体の外表部に付着し
て残っている溶液を除去してもよい。
In the present invention, when the semiconductor layer is formed, the semiconductor layer is immersed in a solution containing nitrate ions and / or manganese ions, then pulled up, and then immersed in a reaction mother liquor for precipitating lead dioxide and lead sulfate to react. It is important. The time until the anode substrate is immersed in a solution containing nitrate ions and / or manganese ions and pulled up varies depending on the shape of the anode substrate, and cannot be determined unconditionally, but is generally several seconds or more. After the anode substrate is pulled out of the solution, the surface may be washed with water to remove the solution remaining on the outer surface of the anode substrate.

硝酸イオンまたは/およびマンガンイオンを与える化
合物として、例えば硝酸カリ、硝酸マンガン、硝酸ナト
リウム、硝酸鉛等の一価または二価の硝酸塩、硝酸、硝
酸アンモニウム、過マンガン酸カリ、過マンガン酸ナト
リウム、過塩素酸マンガン、塩素酸マンガン、テトラフ
ルオロ硼酸マンガン、ヘキサフルオロリン酸マンガン、
炭酸マンガン、りん酸マンガン、硼酸マンガン、しゅう
酸マンガン、サリチル酸マンガン、酒石酸マンガン、亜
りん酸マンガン、硫酸マンガン、MnX2〔ここでXはハロ
ゲン〕、水酸化マンガン、Mn(OCOR)〔ここでRは水
素、アルキル基、アリール基を表わす〕、およびアンモ
ニウム、オキシム、テトラエチレンジアミン、フタロシ
アニン、アセチルアセトン等とマンガンとのマンガン錯
体等、硝酸イオンまたは/およびマンガンイオンを与え
る従来公知の化合物が挙げられる。そしてこれらの化合
物は1種または2種以上混合して用いる。
Compounds that give nitrate ions and / or manganese ions include, for example, monovalent or divalent nitrates such as potassium nitrate, manganese nitrate, sodium nitrate, lead nitrate, nitric acid, ammonium nitrate, potassium permanganate, sodium permanganate, perchlorine Manganese phosphate, manganese chlorate, manganese tetrafluoroborate, manganese hexafluorophosphate,
Manganese carbonate, manganese phosphate, manganese borate, manganese oxalate, manganese salicylate, manganese tartrate, manganese phosphite, manganese sulfate, MnX 2 [where X is a halogen], manganese hydroxide, Mn (OCOR) 2 [where R represents hydrogen, an alkyl group, or an aryl group], and a conventionally known compound that provides a nitrate ion and / or a manganese ion, such as a manganese complex of manganese with ammonium, oxime, tetraethylenediamine, phthalocyanine, acetylacetone, or the like. These compounds are used alone or as a mixture of two or more.

本発明では陽極基体を硝酸イオンまたは/およびマン
ガンイオンを含む溶液に浸漬し引き上げた後、前述した
二酸化鉛と硝酸鉛を析出する反応母液に再度浸漬して反
応することによって半導体層が形成される。
In the present invention, a semiconductor layer is formed by immersing the anode substrate in a solution containing nitrate ions and / or manganese ions, pulling it up, and then immersing it again in a reaction mother liquor for depositing lead dioxide and lead nitrate to react. .

なお、前述した工程を複数回繰り返してもよく、ま
た、前述した工程の後、さらに半導体層の付着を完璧に
行うために反応母液に陽極基体を浸漬して反応させる従
来公知の方法を併用してもよい。
The above-described step may be repeated a plurality of times, and after the above-mentioned step, a conventionally known method of immersing the anode substrate in a reaction mother liquor and reacting the same in order to further completely adhere the semiconductor layer is also used. You may.

更に、前述した反応母液での反応後、または複数回繰
り返す工程間での反応母液での反応後に、半導体層表面
を酢酸アンモニウム、カルボン酸またはオキシ酸等の水
溶液で洗浄してもよい(特開昭62−98714号公報)。
Further, after the reaction with the above-described reaction mother liquor or after the reaction with the reaction mother liquor between a plurality of repeated steps, the surface of the semiconductor layer may be washed with an aqueous solution of ammonium acetate, carboxylic acid, oxyacid, or the like (Japanese Unexamined Patent Application, First Publication No. H11-163873). JP-A-62-98714).

上述した方法によって半導体層まで形成された固体電
解コンデンサ素子を充分洗浄し、乾燥後、半導体層上に
導電体層を形成する。導電体層として従来公知のものお
よび方法が採用できるが、とりわけカーボンペーストま
たは/および銀ペーストに固体電解コンデンサ素子を浸
漬して引き上げ乾燥する方法が簡便である。
The solid electrolytic capacitor element formed up to the semiconductor layer by the above-described method is sufficiently washed and dried, and then a conductor layer is formed on the semiconductor layer. Conventionally known conductor layers and methods can be employed as the conductor layer, but a method in which the solid electrolytic capacitor element is immersed in a carbon paste and / or silver paste, pulled up and dried is particularly simple.

以上述べた如く本発明の方法によって製造された固体
電解コンデンサは、例えば樹脂モールド、樹脂ケース、
金属製の外装ケース、樹脂のディッピング、ラミネート
フィルムによる外装などにより各種用途の汎用コンデン
サ製品とすることができる。
As described above, the solid electrolytic capacitor manufactured by the method of the present invention is, for example, a resin mold, a resin case,
A general-purpose capacitor product for various uses can be obtained by using a metal outer case, resin dipping, and a laminate film.

〔作用〕[Action]

陽極基体上に二酸化鉛と硫酸鉛からなる半導体層を形
成する際に、陽極基体を、硝酸イオンまたは/およびマ
ンガンイオンを含む溶液に浸漬した後引き上げて、再
度、二酸化鉛と硫酸鉛とを析出する反応母液に浸漬して
反応させると、陽極基体の複雑な形状の奥すみずみまで
反応母液が侵入し、結果として作製した固体電解コンデ
ンサの容量が大きくなる。
When forming a semiconductor layer composed of lead dioxide and lead sulfate on the anode substrate, the anode substrate is immersed in a solution containing nitrate ions and / or manganese ions and then pulled up to deposit lead dioxide and lead sulfate again. When the reaction is carried out by immersion in the reaction mother liquor, the reaction mother liquor penetrates all the way into the complicated shape of the anode substrate, resulting in an increase in the capacity of the solid electrolytic capacitor produced.

即ち、硝酸イオンまたは/およびマンガンイオンは、
微小細孔への侵入が極めて容易にできるイオン種である
ため、初期にこれらのイオン種を含浸しておくことによ
り、単味では陽極基体内部まで含浸しずらい反応母液
と、液交換を行い、反応母液を内部へ含浸させるものと
考えられる。
That is, nitrate ions and / or manganese ions are
Since it is an ionic species that can penetrate into the micropores very easily, by impregnating these ionic species at the initial stage, it is possible to exchange liquid with a reaction mother liquor that is difficult to impregnate into the inside of the anode substrate. It is considered that the reaction mother liquor is impregnated inside.

〔実施例〕〔Example〕

以下、実施例および比較例を示して本発明をさらに詳
しく説明する。
Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples.

実施例1〜12 フル容量が7.9μFで、約20mmの陽極リード線が一部
埋設されている長さ3mm、巾2mm、厚さ0.5mmのTa焼結体
をりん酸水溶液中で22V化成を行い誘電体酸化皮膜層を
形成した。このTa焼結体を、第1表に示した各水溶液に
浸漬し、1分後引き上げ、そのまま、別に用意した酢酸
鉛三水和物2.4モル/の水溶液と過硫酸アンモニウム
4モル/の水溶液の混合液即ち、反応母液に浸漬し60
℃で30分放置し反応させた。反応後反応母液から素子を
引き上げ水で充分洗浄して乾燥した。上述した反応をさ
らに3回繰り返し、誘電体酸化皮膜層の表面に二酸化鉛
と硫酸鉛からなる半導体層を形成した。
Examples 1 to 12 A Ta sintered body having a length of 3 mm, a width of 2 mm, and a thickness of 0.5 mm in which a full capacity of 7.9 μF and a part of an anode lead wire of about 20 mm was partially buried was subjected to 22 V conversion in a phosphoric acid aqueous solution. Then, a dielectric oxide film layer was formed. This Ta sintered body was immersed in each of the aqueous solutions shown in Table 1, pulled up after one minute, and mixed with a separately prepared aqueous solution of lead acetate trihydrate 2.4 mol / and ammonium persulfate 4 mol /. Immersed in the solution,
The reaction was allowed to stand at 30 ° C. for 30 minutes. After the reaction, the device was taken out of the reaction mother liquor, washed sufficiently with water, and dried. The above reaction was repeated three more times to form a semiconductor layer composed of lead dioxide and lead sulfate on the surface of the dielectric oxide film layer.

次いで半導体層の上にカーボンペーストおよび銀ペー
ストを順に付着させ誘電体層を形成した後、樹脂封口し
て固体電解コンデンサを作製した。
Next, a carbon paste and a silver paste were sequentially adhered on the semiconductor layer to form a dielectric layer, and then sealed with a resin to produce a solid electrolytic capacitor.

比較例 実施例で、第1表に示した各水溶液に浸漬しなかった
以外は実施例と同様にして固体電解コンデンサを作製し
た。
Comparative Example A solid electrolytic capacitor was produced in the same manner as in the example, except that the capacitor was not immersed in each of the aqueous solutions shown in Table 1.

実施例1〜12および比較例で各々50点の固体電解コン
デンサを作製し、各50点の平均値の性能を第2表にまと
めて示す。
In each of Examples 1 to 12 and Comparative Example, 50 points of solid electrolytic capacitors were produced, and the performance of the average value of each 50 points is shown in Table 2.

〔発明の効果〕 表面に誘電体酸化被膜層を有する陽極基体を、硝酸イ
オンまたは/およびマンガンイオンを含む溶液に浸漬し
た後引き上げて、次に二酸化鉛と硫酸鉛とを析出する反
応母液に浸漬させて半導体層を形成しているので、容量
を充分引き出せる固体電解コンデンサを作製することが
できる。
[Effects of the Invention] An anode substrate having a dielectric oxide film layer on its surface is immersed in a solution containing nitrate ions and / or manganese ions, then pulled up, and then immersed in a reaction mother liquor for depositing lead dioxide and lead sulfate. Since the semiconductor layer is formed in this manner, a solid electrolytic capacitor capable of sufficiently drawing out the capacitance can be manufactured.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭63−177409(JP,A) 特開 昭63−166207(JP,A) 特開 昭63−166205(JP,A) 特開 昭54−12447(JP,A) 特開 昭62−124728(JP,A) (58)調査した分野(Int.Cl.6,DB名) H01G 9/032 ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-63-177409 (JP, A) JP-A-63-166207 (JP, A) JP-A-63-166205 (JP, A) JP-A 54-167 12447 (JP, A) JP-A-62-124728 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) H01G 9/032

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】弁作用を有する金属からなる陽極基体の表
面に、誘電体酸化皮膜層、二酸化鉛と硫酸鉛からなる半
導体層および導電体層を順次形成してなる固体電解コン
デンサの製造方法において、前記誘電体酸化皮膜層を表
面に有する陽極基体を硝酸イオンまたは/およびマンガ
ンイオンを含む溶液に浸漬し引き上げた後、二酸化鉛と
硫酸鉛とを析出する反応母液に浸漬して反応させ半導体
層を形成することを特徴とする固体電解コンデンサの製
造方法。
1. A method for manufacturing a solid electrolytic capacitor comprising a dielectric oxide film layer, a semiconductor layer composed of lead dioxide and lead sulfate, and a conductor layer sequentially formed on the surface of an anode substrate composed of a metal having a valve action. After immersing the anode substrate having the dielectric oxide film layer on the surface thereof in a solution containing nitrate ions and / or manganese ions and lifting it up, the substrate is immersed and reacted in a reaction mother liquor for precipitating lead dioxide and lead sulfate. Forming a solid electrolytic capacitor.
JP7453790A 1990-03-23 1990-03-23 Method for manufacturing solid electrolytic capacitor Expired - Lifetime JP2891506B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7453790A JP2891506B2 (en) 1990-03-23 1990-03-23 Method for manufacturing solid electrolytic capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7453790A JP2891506B2 (en) 1990-03-23 1990-03-23 Method for manufacturing solid electrolytic capacitor

Publications (2)

Publication Number Publication Date
JPH03274715A JPH03274715A (en) 1991-12-05
JP2891506B2 true JP2891506B2 (en) 1999-05-17

Family

ID=13550128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7453790A Expired - Lifetime JP2891506B2 (en) 1990-03-23 1990-03-23 Method for manufacturing solid electrolytic capacitor

Country Status (1)

Country Link
JP (1) JP2891506B2 (en)

Also Published As

Publication number Publication date
JPH03274715A (en) 1991-12-05

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