JP2864842B2 - Epoxy resin composition for optical semiconductor encapsulation - Google Patents

Epoxy resin composition for optical semiconductor encapsulation

Info

Publication number
JP2864842B2
JP2864842B2 JP4028044A JP2804492A JP2864842B2 JP 2864842 B2 JP2864842 B2 JP 2864842B2 JP 4028044 A JP4028044 A JP 4028044A JP 2804492 A JP2804492 A JP 2804492A JP 2864842 B2 JP2864842 B2 JP 2864842B2
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
optical semiconductor
curing agent
acid anhydride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4028044A
Other languages
Japanese (ja)
Other versions
JPH05226701A (en
Inventor
悟 土田
孝三 広川
正彦 小坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP4028044A priority Critical patent/JP2864842B2/en
Publication of JPH05226701A publication Critical patent/JPH05226701A/en
Application granted granted Critical
Publication of JP2864842B2 publication Critical patent/JP2864842B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は透明性が高く、耐熱性に
優れ、かつ短時間成形が可能な光半導体封止用エポキシ
樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for encapsulating an optical semiconductor which has high transparency, excellent heat resistance and can be molded in a short time.

【0002】[0002]

【従来の技術】一般に発光素子および受光素子封止用に
は、透明性の優れた酸無水物硬化系のエポキシ樹脂組成
物が使用されている。例えばトランスファ成形用のエポ
キシ樹脂組成物においては、特開平1−167359号
公報、特開平2−222165号公報に開示されている
ように、硬化剤としてテトラヒドロ無水フタル酸やヘキ
サヒドロ無水フタル酸等の二塩基酸無水物が使用されて
いる。
2. Description of the Related Art Generally, an acid anhydride-curable epoxy resin composition having excellent transparency is used for sealing a light emitting element and a light receiving element. For example, in an epoxy resin composition for transfer molding, as disclosed in JP-A-1-167359 and JP-A-2-222165, a curing agent such as tetrahydrophthalic anhydride or hexahydrophthalic anhydride is used as a curing agent. Basic anhydrides have been used.

【0003】しかしながら、一般のエポキシ樹脂組成物
は、透明性に関しては使用可能な水準にあるものの、ト
ランスファ成形時間に3分間〜5分間(150℃)を要
し、成形サイクルの点で問題があった。また、耐熱性の
点においても必ずしも満足できるレベルとは言い難かっ
た。
[0003] However, although the general epoxy resin composition is at a usable level in terms of transparency, it takes 3 to 5 minutes (150 ° C) for transfer molding time, and there is a problem in molding cycle. Was. In addition, the heat resistance was not always satisfactory.

【0004】[0004]

【課題を解決するための手段】本発明は上記課題を解決
するために、エポキシ樹脂、硬化剤、硬化促進剤を主体
とするエポキシ樹脂組成物において、四塩基酸無水物を
含有する硬化剤を用いるこを特長とする。更には、四塩
基酸無水物が脂環式四塩基酸無水物であり、これと脂環
式二塩基酸無水物との混合硬化剤を使用することを特長
とする。
SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides an epoxy resin composition mainly composed of an epoxy resin, a curing agent and a curing accelerator, comprising a curing agent containing a tetrabasic anhydride. It is characterized by its use. Further, the invention is characterized in that the tetrabasic acid anhydride is an alicyclic tetrabasic acid anhydride, and a mixed curing agent of the alicyclic dibasic acid anhydride is used.

【0005】本発明で用いるエポキシ樹脂としては、従
来公知のもので着色の少ない物であれば特に制限されな
い。例えばビスフェノールA型エポキシ樹脂、水添ビス
フェノール型エポキシ樹脂、ビスフェノールF型エポキ
シ樹脂、脂環式エポキシ樹脂、フェノールノボラック型
エポキシ樹脂、トリグリシジルイソシアヌレート等の含
複素環エポキシ樹脂等が挙げられ、単独でもしくは併せ
て用いられる。
[0005] The epoxy resin used in the present invention is not particularly limited as long as it is a conventionally known epoxy resin having little coloring. For example, bisphenol A type epoxy resin, hydrogenated bisphenol type epoxy resin, bisphenol F type epoxy resin, alicyclic epoxy resin, phenol novolak type epoxy resin, heterocyclic epoxy resin such as triglycidyl isocyanurate and the like, and the like. Alternatively, they are used together.

【0006】本発明に使用される硬化剤は、脂環式二塩
基酸無水物としてはヘキサヒドロフタル酸無水物又はメ
チルヘキサヒドロフタル酸無水物が挙げられ、脂環式四
塩基酸無水物としては、5−(2,5−ジオキソテトラ
ヒドロ−3−フラニル)−3−メチル−3−シクロヘキ
セン−1,2−ジカルボン酸無水物等が挙げられる。こ
れら二塩基酸無水物と四塩基酸無水物からなる混合硬化
剤の配合割合は、四塩基酸無水物の配合量が硬化剤全体
の50wt%以下であることが望ましい。四塩基酸無水
物の配合量が硬化剤全体の50wt%を越えた場合、速
硬化性、耐熱性は殆ど向上せず、むしろ透明性、ポット
ライフ、経済性が不利になるからである。
The curing agent used in the present invention includes, as an alicyclic dibasic anhydride, hexahydrophthalic anhydride or methylhexahydrophthalic anhydride, and as an alicyclic tetrabasic anhydride. Is, for example, 5- (2,5-dioxotetrahydro-3-furanyl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride. The mixing ratio of the mixed curing agent composed of dibasic acid anhydride and tetrabasic acid anhydride is preferably such that the amount of tetrabasic acid anhydride is 50 wt% or less of the entire curing agent. If the amount of the tetrabasic acid anhydride exceeds 50% by weight of the entire curing agent, the rapid curing property and heat resistance hardly improve, but rather the transparency, pot life and economy become disadvantageous.

【0007】エポキシ樹脂の酸無水物硬化剤に対する当
量比は0.8〜1.1が好ましく、当量比0.8未満で
は耐熱性、透明性の低下を招く。また、当量比が1.1
を越えた場合には、吸水率が増大し耐湿性が低下する。
更に、本発明で用いる硬化促進剤は、特に限定されず公
知のものでよく、イミダゾール類、DBU及びその塩、
三級アミン類、アンモニウム塩、ホスホニウム塩などが
例示されるが、この添加量はエポキシ樹脂と硬化剤との
合計量に対して0.1〜5wt%とすればよい。
[0007] The equivalent ratio of the epoxy resin to the acid anhydride curing agent is preferably 0.8 to 1.1. If the equivalent ratio is less than 0.8, heat resistance and transparency are reduced. In addition, the equivalent ratio is 1.1
When the ratio exceeds the above range, the water absorption rate increases and the moisture resistance decreases.
Further, the curing accelerator used in the present invention is not particularly limited and may be a known one, and may include imidazoles, DBU and salts thereof,
Tertiary amines, ammonium salts, phosphonium salts and the like are exemplified, and the amount of addition may be 0.1 to 5 wt% based on the total amount of the epoxy resin and the curing agent.

【0008】また、本発明のエポキシ樹脂組成物には、
上記各成分以外に必要に応じて離型剤、酸化防止剤、着
色剤、紫外線吸収剤、可視光吸収剤、充填材等の従来公
知の添加剤が用いられる。上記酸化防止剤としては、フ
ェノール系化合物、フォスファイト系化合物、有機硫黄
系化合物等従来公知のものが挙げられる。
Further, the epoxy resin composition of the present invention comprises:
In addition to the above components, conventionally known additives such as a release agent, an antioxidant, a coloring agent, an ultraviolet absorber, a visible light absorber, and a filler are used as necessary. Examples of the antioxidant include conventionally known compounds such as a phenol compound, a phosphite compound, and an organic sulfur compound.

【0009】[0009]

【実施例】本発明を実施例により、さらに詳細に説明す
るが、本発明はこれに限定されるものではない。 (1)光透過率 分光光度計(日立製U−2000型)を使用し、厚さ2
mmの試料について570nmにおける光透過率を測定
した。 (2)ガラス転移温度 直径4mm、長さ20mmの試料についてTMA(理学
製PTC−10A型)を用い、5℃/分で昇温したとき
の試料の伸び率が急変する温度とした。 (3)速硬化性 下記条件のトランスファ成形を行い、成形品およびカル
(厚さ5mm)の硬化性(型からの離型性)を下記のご
とく評価した。 《トランスファ条件》 成形温度−−−150℃ 成形時間−−−1分間,3分間 成形圧力−−−70kgf/cm2 《成形品及びカル硬化性》 A−−−成形品,カルとも離型性良 B−−−成形品離型性良,カル未硬化 C−−−成形品,カルとも離型不良
EXAMPLES The present invention will be described in more detail with reference to Examples, but the present invention is not limited thereto. (1) Light transmittance Using a spectrophotometer (Hitachi U-2000 type), thickness 2
The light transmittance at 570 nm was measured for a sample of mm. (2) Glass transition temperature TMA (PTC-10A, manufactured by Rigaku Corp.) was used for a sample having a diameter of 4 mm and a length of 20 mm. (3) Fast Curability The transfer molding was performed under the following conditions, and the curability (mold release property) of the molded product and the cull (thickness: 5 mm) was evaluated as follows. << Transfer conditions >> Molding temperature --- 150 ° C. Molding time ---- 1 minute, 3 minutes Molding pressure --- 70 kgf / cm 2 << Molded product and curable property >> A--Releasability from both molded product and cull Good B ---- Releasability of molded product, uncured

【0010】実施例1〜4,比較例1 下記の表1にしたがって、各原料を配合し、90℃の熱
ロールにて10分間混練後、冷却粉砕し、目的とする微
粉末状のエポキシ樹脂組成物を得た。次に、これらの樹
脂組成物を上記のトランスファ条件で成形し、離型可能
なものについては150℃、3時間アフタキュアを行
い、光透過率、ガラス転移温度を測定した。更に光透過
率についてはIRリフロー炉を使用し、240℃で12
秒間の処理を行った後に再び光透過率を求めた。これら
の測定結果を表1に併せて示す。
Examples 1 to 4, Comparative Example 1 According to the following Table 1, each raw material was blended, kneaded with a hot roll at 90 ° C. for 10 minutes, and then cooled and pulverized to obtain a desired fine powdery epoxy resin. A composition was obtained. Next, these resin compositions were molded under the above-described transfer conditions, and those that could be released were subjected to after-cure at 150 ° C. for 3 hours, and the light transmittance and glass transition temperature were measured. Further, regarding the light transmittance, an IR reflow furnace was used.
After performing the treatment for 2 seconds, the light transmittance was obtained again. Table 1 also shows these measurement results.

【0011】[0011]

【表1】 表 1 (重量比) ┌──────────────┬───────────────┬───┐ │ │ 実 施 例 │比較例│ │ ├───┬───┬───┬───┼───┤ │ │ 1 │ 2 │ 3 │ 4 │ 1 │ ├──────┬───────┼───┼───┼───┼───┼───┤ │ │ R366 ※1│ 80 │ 80 │ 80 │ 80 │ 80 │ │エポキシ樹脂├───────┼───┼───┼───┼───┼───┤ │ │ TEPIC-S ※2│ 20 │ 20 │ 20 │ 20 │ 20 │ ├──────┼───────┼───┼───┼───┼───┼───┤ │ *│ HH-A ※3│ 33 │ 29 │ 24 │ 19 │ 39 │ │硬 化 剤 ├───────┼───┼───┼───┼───┼───┤ │ │ B-4400 ※4│ 4.5 │ 7.8 │ 13 │ 17 │ − │ ├──────┴───────┼───┼───┼───┼───┼───┤ │B-4400混合量 (wt%) │ 12 │ 21 │ 35 │ 47 │ 0 │ ├──────────────┼───┼───┼───┼───┼───┤ │硬化促進剤 ※5│ 1 │ 1 │ 1 │ 1 │ 1 │ ┝━━━━━━┯━━━━━━━┿━━━┿━━━┿━━━┿━━━┿━━━┥ │ │ 150℃/1分 │ A │ A │ A │ A │ C │ │速硬化性 ├───────┼───┼───┼───┼───┼───┤ │ │ 150℃/3分 │ − │ − │ − │ − │ B │ ├──────┼───────┼───┼───┼───┼───┼───┤ │ │アフタキュア後│ 88 │ 87 │ 87 │ 86 │ 88 │ │光透過率(%) ├───────┼───┼───┼───┼───┼───┤ │ │IRリフロー後│ 86 │ 86 │ 87 │ 86 │ 68 │ ├──────┴───────┼───┼───┼───┼───┼───┤ │ガラス転移温度(℃) │ 138 │ 144 │ 145 │ 147 │ 118 │ └──────────────┴───┴───┴───┴───┴───┘ *硬化剤当量=0.9 ※1:三井石油化学工業社製 ※2:日産化学社製。 ※3:新日本理化社製脂環式二塩基酸無水物。 ※4:大日本インキ社製脂環式四塩基酸無水物。 ※5:2E4MZ 四国化成社製イミダゾール。[Table 1] Table 1 (weight ratio) ┌──────────────┬───────────────┬───┐ │ │ Example │ Comparative Example │ │ ├───┬───┬───┬───┼───┤ │ │ │ 1 │ 2 │ 3 │ 4 │ 1 │ ├──────┬─── 366 │ │ R366 ※ 1│ 80 │ 80 │ 80 │ 80 │ 80 │ │Epoxy resin├───── ──┼───┼───┼───┼───┼───┤ │ │ TEPIC-S ※ 2│ 20 │ 20 │ 20 │ 20 │ 20 │ ├──────┼─ │ │ * │ HH-A * 3 │ 33 │ 29 │ 24 │ 19 │ 39 │ │ Hardening agent -4 │ │ B-4400 ※ 4│ 4.5 │ 7.8 │ 13 │ 17 │ − │ ├── ────┴─ │ │B-4400 mixing amount (wt%) │ 12 │ 21 │ 35 │ 47 │ 0 │ ├── │ │Curing accelerator ※ 5│ 1 │ 1 │ 1 │ 1 │ 1 │ ┝━━━━━━┯━━━━━━━┿━━━┿━━━┿━━━┿━━━┿━━━┥ │ │ 150 ℃ / 1 minute │ A │ A │ A │ A │ C │ │ Fast curing ├───────┼───┼───┼───┼───┼───┤ │ │ 150 ℃ / 3min │ − │ − │ − │ − │ B │ ├──────┼───────┼───┼───┼───┼───┼───┤ │ │ After After Cure │ 88 │ 87 │ 87 │ 86 │ 88 │ │ Light transmittance (%) ├───────┼───┼───┼───┼───┼───┤ │ │ After IR reflow │ 86 │ 86 │ 87 │ 86 │ 68 │ │ Glass transition temperature (℃) │ 138 │ 144 │ 145 │ 147 │ 118 │ └──────────────┴───┴───┴───┴───┴───┘ * Curing agent equivalent = 0.9 * 1 : Made by Mitsui Petrochemical Industries * 2: Made by Nissan Chemical. * 3: Alicyclic dibasic acid anhydride manufactured by Nippon Rika Co., Ltd. * 4: Alicyclic tetrabasic acid anhydride manufactured by Dainippon Ink and Chemicals, Inc. * 5: 2E4MZ Imidazole manufactured by Shikoku Chemicals.

【0012】[0012]

【発明の効果】表1の結果から明らかなように、本発明
によれば、光透過性、耐熱性に優れ、かつ速硬化性を有
する光半導体封止用エポキシ樹脂組成物を提供すること
が可能である。
As is clear from the results shown in Table 1, according to the present invention, it is possible to provide an epoxy resin composition for encapsulating an optical semiconductor having excellent light transmittance and heat resistance and having fast curing properties. It is possible.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平3−247619(JP,A) 特開 平3−200858(JP,A) (58)調査した分野(Int.Cl.6,DB名) H01L 23/28 - 23/30 C08G 59/42 C08K 5/09 H01L 33/00────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-3-247619 (JP, A) JP-A-3-200858 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) H01L 23/28-23/30 C08G 59/42 C08K 5/09 H01L 33/00

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 エポキシ樹脂、硬化剤、硬化促進剤を主
体とするエポキシ樹脂組成物において、四塩基酸無水物
を含有する硬化剤を用いることを特徴とする光半導体封
止用エポキシ樹脂組成物。
1. An epoxy resin composition for encapsulating an optical semiconductor, characterized in that a curing agent containing a tetrabasic acid anhydride is used in an epoxy resin composition mainly comprising an epoxy resin, a curing agent and a curing accelerator. .
【請求項2】 四塩基酸無水物が脂環式四塩基酸無水物
である請求項1記載の光半導体封止用エポキシ樹脂組成
物。
2. The epoxy resin composition for optical semiconductor encapsulation according to claim 1, wherein the tetrabasic acid anhydride is an alicyclic tetrabasic anhydride.
【請求項3】 硬化剤が脂環式四塩基酸無水物と脂環式
二塩基酸無水物からなる混合硬化剤である請求項1記載
の光半導体封止用エポキシ樹脂組成物。
3. The epoxy resin composition for optical semiconductor encapsulation according to claim 1, wherein the curing agent is a mixed curing agent comprising an alicyclic tetrabasic acid anhydride and an alicyclic dibasic acid anhydride.
JP4028044A 1992-02-14 1992-02-14 Epoxy resin composition for optical semiconductor encapsulation Expired - Fee Related JP2864842B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4028044A JP2864842B2 (en) 1992-02-14 1992-02-14 Epoxy resin composition for optical semiconductor encapsulation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4028044A JP2864842B2 (en) 1992-02-14 1992-02-14 Epoxy resin composition for optical semiconductor encapsulation

Publications (2)

Publication Number Publication Date
JPH05226701A JPH05226701A (en) 1993-09-03
JP2864842B2 true JP2864842B2 (en) 1999-03-08

Family

ID=12237750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4028044A Expired - Fee Related JP2864842B2 (en) 1992-02-14 1992-02-14 Epoxy resin composition for optical semiconductor encapsulation

Country Status (1)

Country Link
JP (1) JP2864842B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001196642A (en) 2000-01-11 2001-07-19 Toyoda Gosei Co Ltd Light emitting device
WO2006009115A1 (en) * 2004-07-23 2006-01-26 Daicel Chemical Industries, Ltd. Thermosetting resin composition, sealing material for optical device and cured product

Also Published As

Publication number Publication date
JPH05226701A (en) 1993-09-03

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