JP2832493B2 - Cleaning of equipment used for liquid phase oxidation - Google Patents

Cleaning of equipment used for liquid phase oxidation

Info

Publication number
JP2832493B2
JP2832493B2 JP2415515A JP41551590A JP2832493B2 JP 2832493 B2 JP2832493 B2 JP 2832493B2 JP 2415515 A JP2415515 A JP 2415515A JP 41551590 A JP41551590 A JP 41551590A JP 2832493 B2 JP2832493 B2 JP 2832493B2
Authority
JP
Japan
Prior art keywords
phase oxidation
conduit
cleaning
liquid phase
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2415515A
Other languages
Japanese (ja)
Other versions
JPH04145199A (en
Inventor
デヴイツド・フレデリツク・ボウマン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shell Internationale Research Maatschappij BV
Original Assignee
Shell Internationale Research Maatschappij BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shell Internationale Research Maatschappij BV filed Critical Shell Internationale Research Maatschappij BV
Publication of JPH04145199A publication Critical patent/JPH04145199A/en
Application granted granted Critical
Publication of JP2832493B2 publication Critical patent/JP2832493B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/04Water-soluble compounds
    • C11D3/042Acids
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38Cationic compounds
    • C11D1/62Quaternary ammonium compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/26Organic compounds containing nitrogen
    • C11D3/33Amino carboxylic acids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Treating Waste Gases (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Gas Separation By Absorption (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】本発明は液体酸化法に使用される装置の洗
浄に関する。明細書および特許請求の範囲において用語
“液相酸化法”は、ガスを鉄(III)と有機酸の可溶
化されたは配位錯化合物を含む反応体水溶液と接触域中
で硫黄の融点より低い温度で硫化水素を転化する条件下
で接触させて硫化水素含量の低下した処理されたガスお
よび固体硫黄を含み鉄(II)と有機酸の可溶化された
配位錯化合物の濃度が増大した水性混合物を生じさせ
る、ガスからの硫化水素の除去法を指すのに使用され
る。別の域で硫黄は水性混合物から除去されそして鉄
(II)は鉄(III)に酸化されて接触域で使用する
水性混合物を再生する。
[0001] The present invention relates to the cleaning of equipment used in liquid oxidation processes. In the description and in the claims, the term "liquid-phase oxidation process" refers to the term "liquid-phase oxidation", which refers to the reaction of an aqueous solution of a reactant containing iron (III) and an organic acid with a coordination complex with the melting point of sulfur in the contact zone. Increased concentrations of solubilized coordination complex of iron (II) and organic acids containing treated gas with reduced hydrogen sulfide content and solid sulfur upon contact under conditions to convert hydrogen sulfide at lower temperatures Used to refer to a method of removing hydrogen sulfide from a gas that produces an aqueous mixture. In another zone, sulfur is removed from the aqueous mixture and iron (II) is oxidized to iron (III) to regenerate the aqueous mixture used in the contact zone.

【0002】上記方法で使用される装置は接触域で生成
した単体硫黄;反応体鉄と過剰量の硫化水素の反応によ
り生成した硫化鉄および水酸化鉄;およびガスの上流処
理からのミストとして持越される重質炭化水素の沈着に
より起される汚れにさらされる。機械的に緩んだ単体硫
黄を除去するのに反応体水溶液を使用することおよび油
膜形成の防除に界面活性剤を使用することは知られてい
る。本発明の目的は上記3つの形の汚れを効果的に防除
しうる液相酸化法に使用される装置の洗浄用の組成物を
提供することである。この目的に本発明による液相酸化
法に使用される装置の洗浄用の組成物は亜硫酸の塩3な
いし30質量%、キレート化剤0.5ないし30質量%
およびカチオン界面活性剤0.05ないし5質量%の水
溶液を含む。
[0002] The equipment used in the above process is elemental sulfur produced in the contact zone; iron sulfide and iron hydroxide produced by the reaction of the reactant iron with an excess of hydrogen sulfide; and carryover as mist from upstream processing of the gas. Exposed to fouling caused by the deposition of heavy hydrocarbons. It is known to use aqueous reactants to remove mechanically loose elemental sulfur and to use surfactants to control oil film formation. It is an object of the present invention to provide a composition for cleaning equipment used in a liquid phase oxidation process which can effectively control the above three types of soil. For this purpose, the composition for cleaning the equipment used in the liquid phase oxidation process according to the invention comprises 3 to 30% by weight of sulfite salt, 0.5 to 30% by weight of chelating agent.
And a 0.05 to 5% by weight aqueous solution of a cationic surfactant.

【0003】亜硫酸の塩は亜硫酸塩または重亜硫酸塩で
あることができる。亜硫酸塩(または重亜硫酸塩)は単
体硫黄と水に可溶のチオ硫酸塩を形成するであろう。不
活性の硫化鉄および水酸化鉄は鉄イオンが結合される分
子構造を形成するキレート化剤により溶解される。カチ
オン界面活性剤は油の除去を容易にするであろう。しか
しカチオン界面活性剤は更に、亜硫酸塩(または重亜硫
酸塩)と硫黄のチオ硫酸塩への反応におよび水酸化鉄の
溶解に有利な効果を有する。本発明の利点は汚染物を溶
解含有した洗浄組成物が反応体水溶液と相容れる無害物
を含むということである。適当には亜硫酸の塩はアンモ
ニウム塩またはナトリウム塩である。
[0003] The salt of sulfite can be sulfite or bisulfite. Sulfite (or bisulfite) will form thiosulfate, soluble in elemental sulfur and water. Inactive iron sulfide and iron hydroxide are dissolved by the chelating agent which forms the molecular structure to which the iron ions are bound. Cationic surfactants will facilitate oil removal. However, cationic surfactants also have a beneficial effect on the reaction of sulfites (or bisulfites) with sulfur to thiosulfates and on the dissolution of iron hydroxide. An advantage of the present invention is that the cleaning composition containing dissolved contaminants contains harmless substances that are compatible with the aqueous reactant solution. Suitably the sulfite salt is an ammonium or sodium salt.

【0004】キレート化剤は有機酸または有機酸のアン
モニウム塩またはナトリウム塩のような塩であることが
できる。有機酸は適当にはニトリロトリ酢酸(NTAと
云う)、エチレンジアミン四酢酸(EDTAと云う)ま
たはヒドロキシエチレンジアミン四酢酸(HOEDTA
と云う)のような窒素ポリ酸である。適当には亜硫酸の
塩中のカチオンはキレート化剤にかかわるカチオンと同
じである。更に、洗浄組成物のキレート化剤は適当には
液相酸化法で使用されるキレート化剤と同じである。
[0004] The chelating agent can be a salt such as an organic acid or the ammonium or sodium salt of an organic acid. The organic acid is suitably nitrilotriacetic acid (NTA), ethylenediaminetetraacetic acid (EDTA) or hydroxyethylenediaminetetraacetic acid (HOEDTA).
Nitrogen polyacid). Suitably, the cation in the sulfite salt is the same as the cation associated with the chelating agent. Further, the chelating agent of the cleaning composition is suitably the same as the chelating agent used in the liquid phase oxidation process.

【0005】カチオン界面活性剤は適当には4級アンモ
ニウム塩例えばジアルキルジメチルアンモニウム塩、ア
ルキルベンジルジメチルアンモニウムハライドのような
アルキルベンジルジメチルアンモニウムハライド、アル
キルトリメチルアンモニウム塩またはドデシルピリジニ
ウムブロマイドのようなアルキルピリジニウムハライド
である。
The cationic surfactant is suitably a quaternary ammonium salt, for example a dialkyldimethylammonium salt, an alkylbenzyldimethylammonium halide such as an alkylbenzyldimethylammonium halide, an alkyltrimethylammonium salt or an alkylpyridinium halide such as dodecylpyridinium bromide. is there.

【0006】本発明による組成物と汚れた装置との接触
は10ないし80℃の温度で実施される。本発明を例と
して添付図面を参照してより詳細に説明する。図中破線
は液相酸化法で使用される導管を示し、実線は液相酸化
法で使用する装置の洗浄時に使用される導管を示す。
The contact of the composition according to the invention with the soiled equipment is carried out at a temperature of from 10 to 80 ° C. The present invention will be described in more detail by way of example with reference to the accompanying drawings. In the figure, the broken line shows the conduit used in the liquid phase oxidation method, and the solid line shows the conduit used when cleaning the apparatus used in the liquid phase oxidation method.

【0007】硫化水素を除去すべきガスは導管4を通っ
て並流接触器6へ高められた圧力で供給され、反応体水
溶液は導管8を通って並流接触器6へ供給される。反応
体溶液は鉄(III)とNTAの可溶化された配位錯化
合物を含む。硫化水素を単体硫黄に転化する条件下でガ
スと反応体溶液を接触器6中で接触させて、低下した硫
化水素含量を有する処理されたガス、および固体硫黄と
増大した濃度の鉄(II)とNTAの可溶化された配位
錯化合物を含む水性混合物を生じさせる。ガス/液体混
合物は並流接触器6から導管9を通って気液分離器10
へ通され、そこから処理されたガスは導管12を通っ
て、そして固体硫黄と増大した濃度の鉄(II)とNT
Aの可溶化された配位錯化合物を含む水性混合物は導管
15を通って取出される。
The gas from which hydrogen sulfide is to be removed is supplied at elevated pressure to the co-current contactor 6 via conduit 4 and the aqueous reactant is supplied to the co-current contactor 6 via conduit 8. The reactant solution contains a solubilized coordination complex of iron (III) and NTA. The gas and reactant solution are contacted in a contactor 6 under conditions to convert hydrogen sulfide to elemental sulfur, a treated gas having a reduced hydrogen sulfide content, and solid sulfur and an increased concentration of iron (II) And an aqueous mixture comprising a solubilized coordination complex of NTA and NTA. The gas / liquid mixture is passed from the co-current contactor 6 through conduit 9 to a gas-liquid separator 10.
The gas processed therefrom passes through conduit 12 and passes through solid sulfur and increased concentrations of iron (II) and NT.
The aqueous mixture containing the solubilized coordination complex of A is withdrawn through conduit 15.

【0008】水性混合物は導管15を通って酸化器19
の上部へ供給され、その中で還元された鉄(II)は送
風機23により導管24を通って酸化器19の下部へ供
給される空気により鉄(III)に酸化される。還元さ
れた反応体を酸化する条件は本発明に無関係である。再
生された反応体は酸化器19から導管26を通って取出
されそして循環ポンプ27により導管8を通って並流接
触器6へ供給される。酸化器19の底から硫黄に富むス
ラリーが導管30を通って取出され、該溶液はポンプ3
1により硫黄を更に処理しそして硫黄を貯蔵する手段
(図示せず)へ供給される。枯渇した空気は導管35を
通って酸化器19の頂部を去る。
The aqueous mixture passes through conduit 15 through oxidizer 19
The iron (II) reduced therein is oxidized to iron (III) by air supplied to the lower part of the oxidizer 19 through a conduit 24 by a blower 23. The conditions for oxidizing the reduced reactants are irrelevant to the present invention. The regenerated reactant is withdrawn from oxidizer 19 through conduit 26 and fed to co-current contactor 6 through conduit 8 by circulation pump 27. A sulfur-rich slurry is withdrawn from the bottom of the oxidizer 19 through a conduit 30 and the solution is pumped 3
1 to further treat the sulfur and feed it to means for storing the sulfur (not shown). The depleted air leaves the top of the oxidizer 19 through conduit 35.

【0009】上記プロセスで使用される装置を洗浄する
には、このプロセスを中断し、接触器を解圧しそして洗
浄組成物をタンク36から循環ポンプ27により導管3
7および38を通って並流接触器6へ通し、そしてそこ
から導管42を通ってタンク36へ戻す。使用される洗
浄組成物は10質量%の亜硫酸アンモニウム、10質量
%のアンモニウムNTAおよび0.1質量%のドデシル
ピリジニウムブロマイドを含む。洗浄組成物は導管38
中の熱交換器43により60℃の温度に加熱される。洗
浄が完了したら組成物をタンクへ排出しそして清浄な並
流接触器6を使用に供する。
To clean the equipment used in the above process, the process is interrupted, the contactors are depressurized and the cleaning composition is removed from tank 36 by circulating pump 27 to conduit 3.
Through 7 and 38 to the co-current contactor 6 and from there back to the tank 36 via conduit 42. The cleaning composition used comprises 10% by weight of ammonium sulfite, 10% by weight of ammonium NTA and 0.1% by weight of dodecylpyridinium bromide. The cleaning composition is provided in conduit 38
It is heated to a temperature of 60 ° C. by the heat exchanger 43 inside. When the washing is completed, the composition is drained into a tank and a clean co-current contactor 6 is put into use.

【0010】明瞭化のため、洗浄組成物を通す導管系を
反応体水溶液を通す導管系と別個に示してある。しか
し、該組成物を通す導管系中に正常運転中反応体水溶液
を通す導管が含まれることは理解されるであろう。この
ようにして循環ポンプ27のほかに導管系の一部も洗浄
される。適当にはプラントは2つの並流接触器をそれら
に属する循環ポンプと共に含み、それにより洗浄されて
いる接触器からサービスを引継ぎうる並流接触器があ
る。
[0010] For clarity, the conduit system for passing the cleaning composition is shown separately from the conduit system for passing the aqueous reactant solution. However, it will be understood that the conduit system for passing the aqueous solution of reactants during normal operation is included in the conduit system for passing the composition. In this way, a part of the conduit system is cleaned in addition to the circulation pump 27. Suitably the plant includes two co-current contactors with their associated circulation pumps, whereby there are co-current contactors that can take over service from the contactor being cleaned.

【図面の簡単な説明】[Brief description of the drawings]

【図1】水性反応体の再生を伴なう液相酸化法のプラン
トの構成を示す線図。
FIG. 1 is a diagram showing the configuration of a plant for a liquid phase oxidation method involving regeneration of an aqueous reactant.

【符号の説明】[Explanation of symbols]

6 並流接触器 10 気液分離器 19 酸化器 36 洗浄組成物タンク 6 Co-current contactor 10 Gas-liquid separator 19 Oxidizer 36 Cleaning composition tank

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭54−71787(JP,A) (58)調査した分野(Int.Cl.6,DB名) C11D 10/02 C11D 1/62 C11D 7/10 C11D 3/30────────────────────────────────────────────────── (5) References JP-A-54-71787 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C11D 10/02 C11D 1/62 C11D 7 / 10 C11D 3/30

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 亜硫酸の塩3ないし30質量%、キレー
ト化剤0.5ないし30質量%およびカチオン界面活性
剤0.05ないし5質量%の水溶液を含む液相酸化法に
使用される装置の洗浄用組成物。
An apparatus for use in a liquid phase oxidation method comprising an aqueous solution of 3 to 30% by weight of a sulfite salt, 0.5 to 30% by weight of a chelating agent and 0.05 to 5% by weight of a cationic surfactant. Cleaning composition.
【請求項2】 亜硫酸の塩がアンモニウム塩またはナト
リウム塩である請求項1の組成物。
2. The composition of claim 1 wherein the sulfite salt is an ammonium salt or a sodium salt.
【請求項3】 キレート化剤が有機酸である請求項1ま
たは2の組成物。
3. The composition according to claim 1, wherein the chelating agent is an organic acid.
【請求項4】 キレート化剤が有機酸のアンモニウム塩
である請求項3の組成物。
4. The composition according to claim 3, wherein the chelating agent is an ammonium salt of an organic acid.
【請求項5】 有機酸がニトリロトリ酢酸またはエチレ
ンジアミン四酢酸である請求項3または4の組成物。
5. The composition according to claim 3, wherein the organic acid is nitrilotriacetic acid or ethylenediaminetetraacetic acid.
【請求項6】 カチオン界面活性剤が4級アンモニウム
塩である請求項1−5のいずれか1つの組成物。
6. The composition according to claim 1, wherein the cationic surfactant is a quaternary ammonium salt.
JP2415515A 1990-01-02 1990-12-28 Cleaning of equipment used for liquid phase oxidation Expired - Lifetime JP2832493B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB909000028A GB9000028D0 (en) 1990-01-02 1990-01-02 Cleaning of equipment used in a liquid phase oxidation process
GB9000028.2 1990-01-02

Publications (2)

Publication Number Publication Date
JPH04145199A JPH04145199A (en) 1992-05-19
JP2832493B2 true JP2832493B2 (en) 1998-12-09

Family

ID=10668753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2415515A Expired - Lifetime JP2832493B2 (en) 1990-01-02 1990-12-28 Cleaning of equipment used for liquid phase oxidation

Country Status (8)

Country Link
EP (1) EP0438833B1 (en)
JP (1) JP2832493B2 (en)
KR (1) KR0184862B1 (en)
AU (1) AU624756B2 (en)
CA (1) CA2031874C (en)
DE (1) DE69026063T2 (en)
ES (1) ES2084653T3 (en)
GB (1) GB9000028D0 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6872747B2 (en) * 2017-01-17 2021-05-19 株式会社片山化学工業研究所 Sulfur scale cleaning agent and sulfur scale cleaning method using it

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5471787A (en) * 1977-11-18 1979-06-08 Kiresuto Giken Kk Ironnremoving detergent for cation exchange resin
SE8204843L (en) * 1982-01-18 1983-07-19 Dearborn Chemicals Co purification process
GB8506685D0 (en) * 1985-03-14 1985-04-17 Unilever Plc Laundry bars
GB8619391D0 (en) * 1986-08-08 1986-09-17 Unilever Plc Acidic liquid cleaning composition

Also Published As

Publication number Publication date
DE69026063T2 (en) 1996-08-29
ES2084653T3 (en) 1996-05-16
GB9000028D0 (en) 1990-03-07
EP0438833A1 (en) 1991-07-31
AU624756B2 (en) 1992-06-18
AU6813390A (en) 1991-07-04
DE69026063D1 (en) 1996-04-25
CA2031874C (en) 2000-10-10
JPH04145199A (en) 1992-05-19
CA2031874A1 (en) 1991-07-03
KR0184862B1 (en) 1999-04-15
EP0438833B1 (en) 1996-03-20
KR910014497A (en) 1991-08-31

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