JP2814867B2 - Manufacturing method of quartz glass - Google Patents

Manufacturing method of quartz glass

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Publication number
JP2814867B2
JP2814867B2 JP5022294A JP2229493A JP2814867B2 JP 2814867 B2 JP2814867 B2 JP 2814867B2 JP 5022294 A JP5022294 A JP 5022294A JP 2229493 A JP2229493 A JP 2229493A JP 2814867 B2 JP2814867 B2 JP 2814867B2
Authority
JP
Japan
Prior art keywords
quartz glass
gas
ingot
burner
temperature distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5022294A
Other languages
Japanese (ja)
Other versions
JPH06234531A (en
Inventor
潤 高野
和博 中川
典男 小峯
宏樹 神保
弘之 平岩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
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Filing date
Publication date
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Priority to JP5022294A priority Critical patent/JP2814867B2/en
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPH06234531A publication Critical patent/JPH06234531A/en
Priority to US08/479,130 priority patent/US5702495A/en
Priority to US08/484,863 priority patent/US5699183A/en
Priority to US08/509,223 priority patent/US5703712A/en
Priority to US08/648,867 priority patent/US5696624A/en
Priority to US08/711,471 priority patent/US5719698A/en
Publication of JP2814867B2 publication Critical patent/JP2814867B2/en
Application granted granted Critical
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/60—Relationship between burner and deposit, e.g. position
    • C03B2207/66—Relative motion
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/70—Control measures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【０００１】[0001]

【産業上の利用分野】本発明は、石英ガラスの製造方法
に関するものであり、特に高均質性が要求される合成石
英ガラス部材を必要とする分野、例えば光リソグラフィ
ー、高精度分光器、レーザー等の精密光学機器等に有用
とされる高均質な光学用合成石英ガラスに関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing quartz glass, and particularly to a field requiring a synthetic quartz glass member requiring high homogeneity, such as optical lithography, a high precision spectroscope, and a laser. The present invention relates to a highly homogeneous synthetic quartz glass for optics which is useful for precision optical instruments and the like.

【０００２】[0002]

【従来の技術】従来、シリコン等のウエハ上に集積回路
の微細パターンを露光・転写する光リソグラフィー技術
においては、ステッパーと呼ばれる露光装置が用いられ
ている。このステッパーの光源は、近年のＬＳＩの高集
積化にともなってｇ線（４３６ｎｍ）からｉ線（３６５
ｎｍ）、さらにはＫｒＦ（２４８ｎｍ）やＡｒＦ（１９
３ｎｍ）エキシマレーザーへと短波長化が進められてい
る。2. Description of the Related Art Conventionally, in an optical lithography technique for exposing and transferring a fine pattern of an integrated circuit onto a wafer such as silicon, an exposure apparatus called a stepper is used. The light source of this stepper has been changed from g-line (436 nm) to i-line (365 nm) with the recent high integration of LSI.
nm), KrF (248 nm) and ArF (19 nm).
3 nm) Excimer lasers are being shortened in wavelength.

【０００３】一般に、ステッパーの照明系あるいは投影
レンズとして用いられる光学ガラスは、ｉ線よりも短い
波長領域では光透過率が低下するため、従来の光学ガラ
スにかえて合成石英ガラスやＣａＦ2（蛍石）等のフッ
化物単結晶を用いることが提案されている。このよう
に、紫外線リソグラフィー用の光学素子として用いられ
る石英ガラスには、紫外域の高透過性と屈折率の高均質
性が要求されている。紫外域の高透過性を実現するため
には、石英ガラス中の不純物濃度を抑える必要がある。
そこで、石英ガラスの原料となるＳｉ化合物ガス（Ｓｉ
化合物ガスを送り出すために、Ｏ2、Ｈ2等のキャリアガ
スが用いられる）と加熱のための燃焼ガス（Ｏ2ガスと
Ｈ2ガス）とをバーナーから流出し、火炎内で石英ガラ
スを堆積させる火炎加水分解法が一般的に行なわれてい
る。In general, optical glass used as an illumination system or a projection lens of a stepper has a low light transmittance in a wavelength region shorter than the i-line, so that synthetic silica glass or CaF 2 (fluorescent) is used instead of the conventional optical glass. It has been proposed to use a single crystal of fluoride such as stone). As described above, quartz glass used as an optical element for ultraviolet lithography is required to have high transmittance in the ultraviolet region and high homogeneity in refractive index. In order to realize high transmittance in the ultraviolet region, it is necessary to suppress the impurity concentration in quartz glass.
Therefore, Si compound gas (Si
A carrier gas such as O 2 or H 2 is used to send out the compound gas) and a combustion gas (O 2 gas and H 2 gas) for heating flows out of the burner, and quartz glass is deposited in the flame. Flame hydrolysis methods are commonly used.

【０００４】この方法は、原料、燃焼ガスの不純物を抑
えることが容易なため、高純度の石英ガラスが得られる
ことが知られている。In this method, it is known that high-purity quartz glass can be obtained because it is easy to suppress impurities in raw materials and combustion gas.

【０００５】[0005]

【発明が解決しようとする課題】しかしながら、火炎加
水分解法により製造された石英ガラスは、不純物濃度は
抑えられているが、屈折率の均質性に関しては満足のい
くものが得られていなかった。本発明は、このような問
題点を解決し、不純物濃度が低く、かつ屈折率の均質性
の高い石英ガラスの製造方法を提供することを目的とす
る。However, quartz glass produced by the flame hydrolysis method has a low impurity concentration, but does not provide satisfactory refractive index homogeneity. An object of the present invention is to solve such problems and to provide a method for producing quartz glass having a low impurity concentration and a high refractive index homogeneity.

【０００６】[0006]

【課題を解決するための手段】屈折率の均質性は、ター
ゲット上にインゴットが形成されるときの径方向から見
た温度分布に依存すると考えられる。そこで、従来は、
バーナーの先端部の形状や、原料ガス、燃焼ガス（Ｏ2
ガスとＨ2ガス）の量や比をあらかじめ均質化に最適な
温度分布になるように予測して設定していた。It is considered that the homogeneity of the refractive index depends on the temperature distribution viewed from the radial direction when the ingot is formed on the target. So, conventionally,
Burner tip shape, raw material gas, combustion gas (O 2
The amounts and ratios of the gas and the H 2 gas were predicted and set in advance so as to obtain an optimum temperature distribution for homogenization.

【０００７】しかしながら、温度分布は必ずしも予測ど
おりにはならず、また、どの程度の均質性の石英ガラス
が得られるかは、実際に製造して均質性を測定するまで
わからなかった。本発明者らは、このような状況を踏ま
えた上で、屈折率の均質性を最適化するようにインゴッ
トのヘッド部の温度分布を調整すべく鋭意研究を重ねた
結果、ヘッド部の温度分布を計測し、その情報に応じて
合成中のインゴットのバーナーに対する位置関係を相対
的に平面移動させることにより上記問題を解決できるこ
とを見い出し、本発明を成すに至った。However, the temperature distribution is not always as expected, and the degree of homogeneity of the quartz glass obtained cannot be known until actual production and measurement of the homogeneity. The present inventors have conducted intensive research on adjusting the temperature distribution of the head portion of the ingot so as to optimize the homogeneity of the refractive index based on such a situation, and as a result, the temperature distribution of the head portion has been obtained. The present invention has been found to be able to solve the above-mentioned problem by measuring the relative position of the ingot being synthesized with respect to the burner in accordance with the information and by moving the positional relationship relative to the burner in a plane.

【０００８】よって、本発明は、Ｓｉ化合物ガスとＯ2
ガスとＨ2ガスとをバーナーから噴出して燃焼させ、タ
ーゲット上に石英ガラスを堆積しインゴットを形成する
石英ガラスの製造方法において、インゴットのヘッド部
の温度分布に応じてバーナーとインゴットとを相対的に
平面移動させることを特徴とする石英ガラスの製造方法
を提供するものである（請求項１）。Accordingly, the present invention provides a method for producing a gas comprising Si compound gas and O 2 gas.
In a method for producing quartz glass in which gas and H 2 gas are ejected from a burner and burned, and quartz glass is deposited on a target to form an ingot, the burner and the ingot are moved relative to each other in accordance with the temperature distribution of the head portion of the ingot. It is intended to provide a method for producing quartz glass, characterized in that the quartz glass is moved in a plane.

【０００９】また、本発明は、好ましくは、インゴット
をＸＹステージにより平面移動させるものであることを
特徴とする石英ガラスの製造方法を提供するものである
（請求項２）。Further, the present invention provides a method for producing quartz glass, wherein the ingot is preferably moved in a plane by an XY stage (claim 2).

【００１０】[0010]

【作用】従来の石英ガラスの製造方法においては、原料
の拡散を目的としたインゴットの回転運動及び平面移動
と、堆積速度に見合った上下移動のみを行なっていた。
本発明は、これらの運動に加えて、インゴットのヘッド
部の温度分布を計測して得られた情報に応じてバーナー
とインゴットを平面移動させることを特徴とする。より
端的に言えば、バーナーの形状やガス量等によって決定
される温度分布パターンと、平面移動によって与えられ
る温度分布パターンを組み合わせることにより屈折率の
均質性を最適化するような温度分布を形成し、結果とし
て均質性の向上した石英ガラスを得るものである。In the conventional method of manufacturing quartz glass, only the rotational movement and the plane movement of the ingot for the purpose of diffusing the raw material, and the vertical movement corresponding to the deposition rate are performed.
The present invention is characterized in that, in addition to these movements, the burner and the ingot are moved in a plane in accordance with information obtained by measuring the temperature distribution of the head portion of the ingot. To put it more simply, a temperature distribution pattern that optimizes the homogeneity of the refractive index is formed by combining a temperature distribution pattern determined by a burner shape, a gas amount, and the like, and a temperature distribution pattern given by plane movement. As a result, quartz glass with improved homogeneity is obtained.

【００１１】本発明によれば、インゴットとバーナーと
の相対的な位置関係を、ＸＹステージ等により微細に制
御できる。そして、インゴットのヘッド部の温度分布を
計測し、オンラインで位置関係にフィードバックするこ
とにより、絶えず屈折率の均質化に最適な温度分布を形
成することが可能である。また、火炎加水分解法の場
合、バーナーの火炎内にてインゴットが形成されるた
め、ヘッド部の温度分布は火炎のゆらぎ等の影響を受け
やすく、火炎そのものにより温度分布を細かく制御する
ことは非常に困難であったが、この点についても解決す
ることができる。According to the present invention, the relative positional relationship between the ingot and the burner can be finely controlled by an XY stage or the like. Then, by measuring the temperature distribution of the head portion of the ingot and feeding it back to the positional relationship online, it is possible to constantly form an optimal temperature distribution for homogenizing the refractive index. In the case of the flame hydrolysis method, since an ingot is formed in the flame of the burner, the temperature distribution of the head is easily affected by fluctuations of the flame, and it is very difficult to control the temperature distribution finely by the flame itself. However, this point can be solved.

【００１２】本発明の石英ガラスの製造方法により製造
された石英ガラスは、主としてレンズ、プリズム、反射
板等の光学部材の母材として用いられる。この母材の外
周部分は削り取られ、必要に応じて切断、再成形されて
任意の形状に加工される。そして、内部歪をなくすため
にアニール（熱処理）した後、研磨、コーティング工程
を経て光学部材となる。The quartz glass produced by the method for producing quartz glass of the present invention is mainly used as a base material for optical members such as lenses, prisms and reflectors. The outer peripheral portion of the base material is cut off, cut and reshaped as required, and processed into an arbitrary shape. Then, after annealing (heat treatment) to eliminate internal strain, the optical member is obtained through polishing and coating steps.

【００１３】[0013]

【実施例】以下、火炎加水分解法を用いた本発明の石英
ガラスの製造方法の一実施例について説明するが、本発
明はこれに限られるものではない。図１は本実施例の製
造装置の概念図である。バーナー１は、炉２の上部から
ターゲット３にその先端部を向けて設置されている。炉
壁には観察用の窓４と、ＩＲカメラ観察用の窓５と、排
気孔６とがそれぞれ設けられている。さらに、炉の下部
には、インゴット７形成用のターゲット３が設置されて
おり、支軸を介して炉外部のＸＹステージ８に接続され
ている。EXAMPLES Hereinafter, an example of a method for producing quartz glass of the present invention using a flame hydrolysis method will be described, but the present invention is not limited thereto. FIG. 1 is a conceptual diagram of the manufacturing apparatus of the present embodiment. The burner 1 is installed with its tip facing the target 3 from above the furnace 2. The furnace wall is provided with an observation window 4, an IR camera observation window 5, and an exhaust hole 6, respectively. Further, a target 3 for forming an ingot 7 is provided below the furnace, and is connected to an XY stage 8 outside the furnace via a support shaft.

【００１４】図２は、バーナー先端部の概略図である。
石英管１１からＳｉＣｌ4ガスおよびキャリアガスであ
るＯ2ガスが、加熱のための燃焼ガスとして石英管１２
及び１３からそれぞれＯ2ガスとＨ2ガスとが流出され
る。それぞれのガスの流量は、バーナー先端部の形状等
によっても異なるが、本実施例の場合はＳｉＣｌ4ガス
５〜５０ｇ／min.、Ｏ2ガス２０〜２５０ｌ／min.、Ｈ2
ガス４０〜５００ｌ／min.程度である。FIG. 2 is a schematic view of the burner tip.
From the quartz tube 11, SiCl 4 gas and O 2 gas as a carrier gas are used as a combustion gas for heating.
And O 2 gas and H 2 gas each flowing out of the 13. The flow rate of each gas varies depending on the shape of the tip of the burner, but in the case of this embodiment, SiCl 4 gas is 5 to 50 g / min., O 2 gas is 20 to 250 l / min., H 2 .
The gas is about 40 to 500 l / min.

【００１５】燃焼ガスによる火炎によりＳｉＣｌ4ガス
が酸化されて熔融石英となり、ターゲット上に堆積しイ
ンゴットを形成する。インゴットのヘッド部は燃焼ガス
による火炎に覆われている。インゴットのヘッド部の温
度計測にはＩＲカメラ９を使用し、画面をデータ処理す
るためのコンピュータ１０、及びリニアガイドで保持さ
れたサーボモータ駆動のＸＹステージ８で構成されてい
る。コンピュータは、処理された画面データから最適な
位置関係を計算し、サーボアンプに信号を送ることによ
り、オンラインでのＸＹステージの制御が可能になって
いる。[0015] The flame of the combustion gas oxidizes the SiCl 4 gas to form fused quartz, which deposits on the target to form an ingot. The head of the ingot is covered with a flame of the combustion gas. An IR camera 9 is used to measure the temperature of the head portion of the ingot, and is composed of a computer 10 for data processing of a screen and an XY stage 8 driven by a servomotor held by a linear guide. The computer calculates the optimal positional relationship from the processed screen data and sends a signal to the servo amplifier, whereby the XY stage can be controlled online.

【００１６】図３、図４には、実験的にＸＹステージに
よりバーナーとインゴットとを相対的に平面移動させた
際に得られるインゴットのヘッド部の温度分布と屈折率
の均質性の結果を示す。ここで、Ｘ軸、Ｙ軸はバーナー
の中心と原点が一致するＸＹステージの位置を基準とす
る。このように、ＸＹステージによる平面移動により得
られる温度分布は変化し、これに依存して均質性も変化
する。FIGS. 3 and 4 show the results of the temperature distribution of the head portion of the ingot and the homogeneity of the refractive index obtained when the burner and the ingot are relatively plane-moved by the XY stage experimentally. . Here, the X axis and the Y axis are based on the position of the XY stage where the origin coincides with the center of the burner. Thus, the temperature distribution obtained by the plane movement by the XY stage changes, and the homogeneity changes accordingly.

【００１７】本実施例においては、バーナーの形状やガ
ス量等によって決定される温度分布パターンと平面移動
によって得られる温度分布パターンとを組み合わせるこ
とにより、均質性の向上した石英ガラスが得られた。ま
た、温度分布を一定にするように平面移動を高精度に制
御することにより、長時間にわたって同じ均質性の石英
ガラスを得ることができた。In this embodiment, a quartz glass having improved homogeneity was obtained by combining a temperature distribution pattern determined by the shape of the burner, the amount of gas, and the like, and a temperature distribution pattern obtained by plane movement. In addition, by controlling the plane movement with high precision so as to keep the temperature distribution constant, it was possible to obtain quartz glass having the same homogeneity over a long period of time.

【００１８】[0018]

【発明の効果】以上のように、本発明の石英ガラスの製
造方法によれば、インゴットの径方向から見た温度分布
を計測し、バーナーとインゴットとを平面移動すること
により屈折率の均質性を最適化するような温度分布とす
ることができ、結果として不純物濃度が低く、かつ均質
性の高い石英ガラスが得られる。As described above, according to the quartz glass manufacturing method of the present invention, the temperature distribution as viewed from the radial direction of the ingot is measured, and the uniformity of the refractive index is obtained by moving the burner and the ingot in a plane. Can be optimized so that a quartz glass having a low impurity concentration and high homogeneity can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図１】 本発明の石英ガラスの製造方法に用いられる
製造装置の一例を示す図である。FIG. 1 is a diagram showing an example of a manufacturing apparatus used in a method for manufacturing quartz glass of the present invention.

【図２】 図１の製造装置のバーナー先端部の概略図で
ある。FIG. 2 is a schematic view of a burner tip of the manufacturing apparatus of FIG.

【図３】 バーナーとインゴットとを平面移動させて得
られるインゴットのヘッド部の温度分布と屈折率の均質
性の結果を示す説明図である。FIG. 3 is an explanatory diagram showing a result of temperature distribution and refractive index homogeneity of a head portion of an ingot obtained by moving a burner and an ingot in a plane.

【図４】 バーナーとインゴットとを平面移動させて得
られるインゴットのヘッド部の温度分布と屈折率の均質
性の結果を示す説明図である。FIG. 4 is an explanatory view showing the results of temperature distribution and refractive index homogeneity of a head portion of an ingot obtained by moving a burner and an ingot in a plane.

【符号の説明】[Explanation of symbols]

１ バーナー ２ 炉 ３ ターゲット ４ 観察用窓 ５ ＩＲカメラ観察用窓 ６ 排気孔 ７ インゴット ８ ＸＹステージ ９ ＩＲカメラ １０ コンピュータ １１ ＳｉＣｌ4＋キャリアガス（Ｏ2もしくはＨ2）用
石英管 １２ Ｏ2（もしくはＨ2）ガス用石英管 １３ Ｈ2（もしくはＯ2）ガス用石英管DESCRIPTION OF SYMBOLS 1 Burner 2 Furnace 3 Target 4 Observation window 5 IR camera observation window 6 Exhaust hole 7 Ingot 8 XY stage 9 IR camera 10 Computer 11 SiCl 4 + quartz tube for carrier gas (O 2 or H 2 ) 12 O 2 (or H 2 ) Gas quartz tube 13 H 2 (or O 2 ) gas quartz tube

───────────────────────────────────────────────────── フロントページの続き (72)発明者 平岩 弘之 東京都千代田区丸の内３丁目２番３号 株式会社ニコン内 審査官 大工原 大二 (56)参考文献 特開 昭61−91035（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) C03B 8/04 C03B 20/00──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Hiroyuki Hiraiwa 2-3-2 Marunouchi, Chiyoda-ku, Tokyo Examiner, Daikonbara, Nikon Corporation (56) References JP-A-61-91035 (JP, A) (58) Field surveyed (Int. Cl. 6 , DB name) C03B 8/04 C03B 20/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項１】Ｓｉ化合物ガスとＯ2ガスとＨ2ガスとをバ
ーナーから噴出して燃焼させ、ターゲット上に石英ガラ
スを堆積しインゴットを形成する石英ガラスの製造方法
において、前記インゴットのヘッド部の温度分布に応じ
て前記バーナーと前記インゴットとを相対的に平面移動
させることを特徴とする石英ガラスの製造方法。1. A method for producing quartz glass, wherein a Si compound gas, an O 2 gas, and a H 2 gas are ejected from a burner and burned, and quartz glass is deposited on a target to form an ingot. Wherein the burner and the ingot are relatively moved in a plane in accordance with the temperature distribution of the quartz glass. 【請求項２】請求項１に記載の石英ガラスの製造方法に
おいて、前記平面移動は、ＸＹステージによるものであ
ることを特徴とする石英ガラスの製造方法。2. The method for manufacturing quartz glass according to claim 1, wherein said plane movement is performed by an XY stage.
JP5022294A 1993-02-10 1993-02-10 Manufacturing method of quartz glass Expired - Lifetime JP2814867B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP5022294A JP2814867B2 (en) 1993-02-10 1993-02-10 Manufacturing method of quartz glass
US08/479,130 US5702495A (en) 1993-02-10 1995-06-07 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US08/484,863 US5699183A (en) 1993-02-10 1995-06-07 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US08/509,223 US5703712A (en) 1993-02-10 1995-07-31 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US08/648,867 US5696624A (en) 1993-02-10 1996-05-16 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US08/711,471 US5719698A (en) 1993-02-10 1996-09-06 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5022294A JP2814867B2 (en) 1993-02-10 1993-02-10 Manufacturing method of quartz glass

Publications (2)

Publication Number Publication Date
JPH06234531A JPH06234531A (en) 1994-08-23
JP2814867B2 true JP2814867B2 (en) 1998-10-27

Family

ID=12078733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5022294A Expired - Lifetime JP2814867B2 (en) 1993-02-10 1993-02-10 Manufacturing method of quartz glass

Country Status (1)

Country Link
JP (1) JP2814867B2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3064857B2 (en) * 1995-03-28 2000-07-12 株式会社ニコン Optical member for optical lithography and method for producing synthetic quartz glass
JP3841435B2 (en) * 1995-09-12 2006-11-01 コーニング インコーポレイテッド Boule vibration pattern for producing fused silica glass
EP0850199B1 (en) * 1995-09-12 2005-12-28 Corning Incorporated Method and Furnace for the Production of Silica Glass containing less striae
DE69629119T2 (en) * 1995-09-12 2004-04-15 Corning Inc. POT TO MAKE SILICAGLAS
JPH1067521A (en) * 1996-08-22 1998-03-10 Nikon Corp Fluorine containing quartz glass, production of the same, and projection recording system
JP3832008B2 (en) * 1997-02-28 2006-10-11 株式会社ニコン Quartz glass manufacturing equipment
US6044664A (en) * 1997-09-29 2000-04-04 Nikon Corporation Synthetic silica glass manufacturing apparatus
IT1308786B1 (en) * 1999-07-05 2002-01-10 Cselt Centro Studi Lab Telecom PROCESS AND EQUIPMENT FOR THE FORMATION OF GLASS DISILICE FLAT LAYERS THROUGH THE USE OF A COUPLING PLASMA TORCH
EP1129998B1 (en) * 1999-07-05 2012-03-21 Nikon Corporation Method for producing quartz glass member
JP2003511339A (en) 1999-10-14 2003-03-25 カール−ツァイス−シュティフトゥング Optically uniform and streak-free large-diameter quartz glass manufacturing equipment
WO2003027033A1 (en) * 2001-09-27 2003-04-03 Corning Incorporated Improved methods and furnaces for fused silica production

Also Published As

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