JP2807826B2 - Photosensitive material processing equipment - Google Patents

Photosensitive material processing equipment

Info

Publication number
JP2807826B2
JP2807826B2 JP1156139A JP15613989A JP2807826B2 JP 2807826 B2 JP2807826 B2 JP 2807826B2 JP 1156139 A JP1156139 A JP 1156139A JP 15613989 A JP15613989 A JP 15613989A JP 2807826 B2 JP2807826 B2 JP 2807826B2
Authority
JP
Japan
Prior art keywords
processing
photosensitive material
tank
processing tank
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1156139A
Other languages
Japanese (ja)
Other versions
JPH02124570A (en
Inventor
伸隆 五嶋
重治 小星
雅行 榑松
朋紀 河村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
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Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP1156139A priority Critical patent/JP2807826B2/en
Publication of JPH02124570A publication Critical patent/JPH02124570A/en
Application granted granted Critical
Publication of JP2807826B2 publication Critical patent/JP2807826B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 [発明の属する技術分野] この発明は感光材料処理装置に係り、詳しくは処理槽
内の処理液が実質的に外気と遮断密閉された構造となる
処理槽を設け、処理液の処理槽内での酸化劣化や蒸発を
防止し、かつ処理槽を極めて小型化することにより感光
材料処理装置自体も小型化する技術に関する。
Description: TECHNICAL FIELD [0001] The present invention relates to a photosensitive material processing apparatus, and more particularly, to a processing tank having a structure in which a processing liquid in a processing tank is substantially sealed off from outside air. The present invention relates to a technique for preventing oxidative deterioration and evaporation of a processing liquid in a processing tank, and for miniaturizing the processing tank itself by extremely miniaturizing the processing tank.

[従来の技術] 従来の感光材料処理装置の処理槽は、上部開放のバケ
ツ状をなしており、側部や底部に僅かな亀裂や間隙があ
れば処理液は処理槽外に漏洩するという常識が打ち破れ
ず、また感光材料が通過する処理槽上部開口部を密閉で
きなかったために、処理液の液面に浮きぶたを設けた
り、処理液に不活性な気体を処理槽上部に満たしたり、
処理液に耐性のある材料の浮遊物質を浮かべて処理液面
を減じる努力を行なっている。しかし、処理液の空気酸
化や蒸発を防止することができず、このために感光材料
の処理性能を一定に維持することが非常に困難である。
[Prior Art] The processing tank of a conventional photosensitive material processing apparatus has a bucket shape with an open top, and there is a common sense that a processing liquid leaks out of the processing tank if there are slight cracks or gaps on the side or bottom. Was not broken, and because the upper opening of the processing tank through which the photosensitive material passed could not be sealed, a floating lid was provided on the surface of the processing liquid, or the upper part of the processing tank was filled with an inert gas in the processing liquid.
Efforts are being made to reduce the level of the processing liquid by floating suspended substances of a material that is resistant to the processing liquid. However, air oxidation and evaporation of the processing liquid cannot be prevented, and therefore, it is very difficult to maintain the processing performance of the photosensitive material at a constant level.

特に、カラー写真現像処理量の少ない現像所(店舗)
での処理液の安定管理は解決不可能に思える課題であ
る。
In particular, developing laboratories (stores) with low color photographic processing
Is a problem that seems to be unsolvable.

[発明が解決しようとする課題] このように処理槽に貯溜した処理液の空気に接する開
口面積比を小さくするものは、処理液の酸化劣化や蒸発
の割合を減小させるだけであり、処理液の劣化や蒸発を
有効にかつ完全に防止するものとはいえない。特に、感
光材料処理装置の稼働率が極めて、低い場合には、処理
液の劣化や蒸発を防止することが、カラー写真現像処理
性能を一定に維持したり、処理装置の運転経費を減じる
上からも特に重要な問題となる。
[Problems to be Solved by the Invention] As described above, reducing the opening area ratio of the processing liquid stored in the processing tank in contact with the air only reduces the rate of oxidation deterioration and evaporation of the processing liquid. It cannot be said that the deterioration and evaporation of the liquid are effectively and completely prevented. In particular, when the operating rate of the photosensitive material processing apparatus is extremely low, preventing the deterioration and evaporation of the processing solution is important for maintaining a constant color photographic processing performance and reducing the operating cost of the processing apparatus. Is also a particularly important issue.

さらに、従来の上部開口型の処理槽では処理槽の壁部
と処理液の接触部において、処理液が壁部で持上った状
態にあるため、この部分の液面積が増して酸化が始まっ
て処理槽が汚れると共に、酸化された固り部分が処理液
内に落下して処理液中に入り、現像処理においてトラブ
ルが発生する一原因となっている。
Furthermore, in the conventional upper opening type processing tank, since the processing liquid is lifted by the wall at the contact portion between the processing tank wall and the processing liquid, the liquid area of this portion increases and oxidation starts. As a result, the processing tank becomes dirty, and the oxidized hardened portion falls into the processing liquid and enters the processing liquid, which is one of the causes of a trouble in the development processing.

そこで、種々検討したところ、処理槽を実質的に外気
の密閉状態にし、この処理槽の間に中間室を備え、その
処理槽内を処理液で満杯状態にして、空気を完全に処理
槽内より追い出し、感光材料を直接処理液中に搬入させ
れば、処理槽内で処理液の空気との接触がなくなり、酸
化による劣化や蒸発を有効に防止することができるが、
この場合如何に感光材料供給口のある処理槽から処理液
を液漏れがなく、直接感光材料を処理槽の処理液中に搬
入させるかが重要な技術的課題となる。
Therefore, as a result of various investigations, the processing tank was substantially sealed in the outside air, an intermediate chamber was provided between the processing tanks, the processing tank was filled with the processing liquid, and air was completely filled in the processing tank. If the photosensitive material is directly driven into the processing solution, the contact of the processing solution with the air in the processing tank is eliminated, and deterioration and evaporation due to oxidation can be effectively prevented.
In this case, it is an important technical issue how to directly carry the photosensitive material into the processing solution in the processing tank without any leakage of the processing solution from the processing tank having the photosensitive material supply port.

この発明はかかる点に鑑みなされたもので、処理液の
処理槽内での酸化劣化及び蒸発を防止すると共に、液漏
れなく感光材料を処理槽の処理液中に直接に浸漬させる
ことができる感光材料処理装置を提供することを目的と
している。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is possible to prevent oxidative deterioration and evaporation of a processing solution in a processing tank and to directly immerse a photosensitive material in a processing solution in a processing tank without liquid leakage. It is intended to provide a material processing device.

[課題を解決するための手段] 前記課題を解決するために、この発明の感光材料処理
装置は、槽内の処理液を実質的に外気と遮断密閉した少
なくとも1つの処理槽を有し、この遮断密閉状態の処理
槽内に感光材料を搬入して処理する。
[Means for Solving the Problems] In order to solve the above problems, the photosensitive material processing apparatus of the present invention has at least one processing tank in which the processing liquid in the tank is substantially sealed off from the outside air. The photosensitive material is carried into a processing tank in a closed and sealed state for processing.

この処理槽に、少なくとも1個の感光材料搬入機構
と、少なくとも1個の感光材料排出機構を有し、かつ処
理槽の処理液が実質的に外気の遮断密閉された構造を有
することができる。さらに、この処理槽に設けれられた
感光材料搬入と感光材料排出機構を通して、感光材料が
搬送挿入され、かつ排出される。この感光材料搬入機構
及び感光材料排出機構の少なくとも1個が弁構造体で、
また少なくとも1個がローラ構造体で構成することがで
きる。
The processing tank may have at least one photosensitive material loading mechanism and at least one photosensitive material discharging mechanism, and may have a structure in which the processing liquid in the processing tank is substantially sealed off from the outside air. Further, the photosensitive material is conveyed, inserted, and discharged through a photosensitive material carry-in and photosensitive material discharge mechanism provided in the processing tank. At least one of the photosensitive material loading mechanism and the photosensitive material discharging mechanism is a valve structure,
Also, at least one of them can be constituted by a roller structure.

処理槽は感光材料搬入機構及び感光材料排出機構、さ
らいは隙間などを有し、これらから実質的に処理液が、
外部に漏れないように外気と遮断密閉される。感光材料
は処理槽に弁構造体を通して通過搬送されるように構成
され、また処理槽の内部が弁構造体を介して外気と接す
るようにすることができる。また、少なくとも1個のロ
ーラ構造体を用いて搬入または排出してもよく、このロ
ーラの回転により感光材料を搬送できる。また、弁構造
体は可撓性の材料を用い感光材料の通過によってのみ間
隙が生じ、他は処理液が漏れないよう処理槽が密閉状態
となるよう構成してもよい。
The processing tank has a photosensitive material loading mechanism, a photosensitive material discharging mechanism, a gap, and the like.
It is sealed off from the outside air so that it does not leak outside. The photosensitive material is configured to be conveyed through the valve structure to the processing tank, and the inside of the processing tank can be brought into contact with outside air through the valve structure. Further, at least one roller structure may be used to carry in or out, and the rotation of the rollers allows the photosensitive material to be carried. Further, the valve structure may be made of a flexible material, and a gap may be formed only by the passage of the photosensitive material, and the processing tank may be otherwise closed so that the processing liquid does not leak.

後者の場合には処理槽内部及び/または処理槽間に必
要に応じて設けられた中間室に感光材料の搬送を行なう
ローラ等が設けられてもよい。
In the latter case, a roller or the like for transporting the photosensitive material may be provided in an intermediate chamber provided as necessary inside the processing tank and / or between the processing tanks.

上述のようにして密閉状態に保持される処理槽に、感
光材料の入出を可能とする機構を備えることができる。
また、この機構に処理液の液圧と同じ水圧を与える水槽
を備え、処理槽を実質的に密閉状態に保持することがで
きる。さらに、この処理槽内に感光材料を搬送する搬送
機構を備えることができる。また、処理槽の補充液供給
口を通して補充液を供給することで、実質的に密閉状態
の処理槽内の処理液を強制的に排出する手段を設けるこ
とができる。
A mechanism that allows the photosensitive material to enter and exit the processing tank that is maintained in a sealed state as described above can be provided.
In addition, this mechanism is provided with a water tank that applies the same water pressure as the processing liquid, and the processing tank can be kept substantially sealed. Further, a transport mechanism for transporting the photosensitive material into the processing tank can be provided. Further, by supplying the replenisher through the replenisher supply port of the processing tank, it is possible to provide a means for forcibly discharging the processing liquid in the substantially closed processing tank.

処理槽に設けられた感光材料搬入または排出機構の少
なくとも1個の外部を連続的に或いは間欠的に水で洗浄
することで、処理液の前記機構上での空気酸化、蒸発乾
固を防止することができる。
At least one exterior of the photosensitive material loading / unloading mechanism provided in the processing tank is continuously or intermittently washed with water to prevent the processing liquid from being oxidized by air and evaporated to dryness on the mechanism. be able to.

また、処理槽が連続して配列された時には、各処理槽
間の感光材料搬入排出機構で形成される中間室に、水、
流動パラフィン、イナートガスを充填し、処理液の前記
機構上の空気酸化、蒸発乾固を防止することができる。
Further, when the processing tanks are continuously arranged, water, water, and the like are formed in an intermediate chamber formed by a photosensitive material loading / discharging mechanism between the processing tanks.
Filling with liquid paraffin and inert gas can prevent air oxidation and evaporation to dryness of the treatment liquid on the mechanism.

この実質的に外気に対して密閉状態となっている処理
槽の密閉状態を解除する機構を備えることで、運転初期
の処理槽への処理液の供給またメンテナンス時の処理液
の排出をスムーズに実施することができる。
By providing a mechanism for releasing the sealed state of the processing tank which is substantially sealed from the outside air, the supply of the processing liquid to the processing tank in the initial stage of operation and the discharge of the processing liquid during maintenance can be smoothly performed. Can be implemented.

さらに、処理槽内で、感光材料をスムーズに搬送する
ためのガイドを設けたり、処理液を感光材料に吹き付け
ることによる処理槽内の撹拌効果、温調効果を高めるた
めに、また処理液中の不純物をろ過分離等の手段を用い
て除去するために、処理液を循環させる系を設置するこ
とができる。
Further, in the processing tank, a guide for smoothly transporting the photosensitive material is provided, and in order to enhance a stirring effect and a temperature control effect in the processing tank by spraying the processing liquid onto the photosensitive material, and in the processing liquid, In order to remove impurities by means such as filtration and separation, a system for circulating the treatment liquid can be provided.

[作用] この感光材料処理装置では、処理槽が実質的に外気に
対して遮断密閉され、処理液が空気と接する液面を有さ
ないため、処理槽内で空気とは接することがなく、処理
槽内での処理液の酸化劣化及び蒸発を防止することがで
き、処理槽内の処理液を安定性を極めて高めることとな
り、この処理装置のメンテナンスを容易にすると共に、
処理装置自体も小型化できる。また、感光材料の処理に
よって処理液が減少すると、処理液の補充することで処
理槽への空気が入ることを規制して、処理液が空気と接
することがない。
[Operation] In this photosensitive material processing apparatus, the processing tank is substantially shut off and sealed from the outside air, and the processing liquid does not have a liquid level in contact with air. Oxidation deterioration and evaporation of the processing liquid in the processing tank can be prevented, and the stability of the processing liquid in the processing tank can be extremely enhanced.
The processing device itself can be downsized. Further, when the processing solution is reduced by the processing of the photosensitive material, the replenishment of the processing solution restricts the air from entering the processing tank, and the processing solution does not come into contact with air.

処理槽に少なくとも1個の感光材料搬入機構と、少な
くとも1個の感光材料排出機構を有し、これらが処理槽
のシールをしており、しかも感光材料がこの密閉された
処理槽の処理液中に処理槽側壁から直接的に感光材料を
搬入搬出することができ、かつ処理槽が外気に対して密
閉されているので、感光材料搬入機構及び感光材料排出
機構のシール性が良く、感光材料の処理槽への搬入、処
理槽からの搬出時の液漏洩を軽減することができる。
The processing tank has at least one photosensitive material loading mechanism and at least one photosensitive material discharging mechanism, which seals the processing tank, and the photosensitive material is contained in the processing solution in the sealed processing tank. The photosensitive material can be loaded and unloaded directly from the side wall of the processing tank, and the processing tank is sealed from the outside air. Liquid leakage at the time of loading into and unloading from the processing tank can be reduced.

このように、処理槽の少なくとも1個の壁面に設けら
れた弁構造体が処理槽の壁を形成するだけでなく、ロー
ラ構造体で形成した場合には感光材料搬送機能も有して
いるので、従来の現像機のように感光材料を処理槽内に
搬送するための複雑なローラ機構やガイド機構を処理装
置内に設ける必要がない。
As described above, the valve structure provided on at least one wall surface of the processing tank not only forms the wall of the processing tank, but also has a photosensitive material transport function when formed by a roller structure. It is not necessary to provide a complicated roller mechanism and guide mechanism for transporting the photosensitive material into the processing tank unlike the conventional developing machine in the processing apparatus.

密閉状態に保持される処理槽に、感光材料の入出を可
能とする弁構造体を備えると、密閉状態に保持が簡単に
なる。さらに、この弁構造体に液の液圧と同じ水圧の水
槽を備えることができ、これにより弁構造体を感光材料
が通過する際の液漏れを防止する。また、処理槽内に設
けた搬送機構で、液漏れなく処理槽内の感光材料を搬送
することができる。
If the processing tank held in a sealed state is provided with a valve structure that allows the photosensitive material to enter and exit, the holding in the sealed state is simplified. Further, the valve structure can be provided with a water tank having the same water pressure as the liquid pressure of the liquid, thereby preventing liquid leakage when the photosensitive material passes through the valve structure. Further, the photosensitive material in the processing tank can be transported without liquid leakage by a transport mechanism provided in the processing tank.

また、実質上外気と遮断密閉状態にある処理槽に設け
た補充液供給口よりポンプ等を使用して強制的に補充液
を供給することにより、処理槽内の処理液は弁構造体周
囲の僅かな間隙より処理槽外に排出することができ、こ
の時にこの間隙を洗浄する作用も生じる。処理槽内に排
出された処理液は廃液として廃液槽に溜る。
In addition, the processing liquid in the processing tank is forcibly supplied to the surroundings of the valve structure by forcibly supplying the replenishing liquid using a pump or the like from a replenishing liquid supply port provided in the processing tank which is substantially insulated from the outside air. It can be discharged out of the processing tank through a small gap, and at this time, the action of cleaning this gap also occurs. The processing liquid discharged into the processing tank accumulates in the waste liquid tank as waste liquid.

さらに、この密閉された処理槽に対して循環系を設
け、処理槽内の処理液の撹拌及び温調を行ない、現像処
理を安定化することができる。
Furthermore, a circulation system is provided for the sealed processing tank, and the processing liquid in the processing tank is stirred and the temperature is adjusted, so that the development processing can be stabilized.

また、この循環系の経路にやはり外気に対して遮断密
閉されたろ過装置を設け、処理液中に蓄積した不溶解性
の不純物を除去することが、感光材料表面の損傷を防止
する上から好ましい。
Further, it is preferable to provide a filtration device which is also closed and sealed from the outside air in the path of the circulation system to remove insoluble impurities accumulated in the processing solution from the viewpoint of preventing damage to the photosensitive material surface. .

処理液の温調は循環液量が少量の時に多容量のヒータ
を用いて行なうと、処理設定温度に対してのハンチング
が大きくなり好ましいとは考えられないし、また循環液
量が大量なる時に小容量のヒータを用いて行なうと、ハ
ンチングが小さく好ましい制御となるが、多量な循環液
量のためにポンプ動力、処理槽内で圧変動が生じて安定
した現像処理から決して好ましい方法とは言えない。第
35図に熱負荷量(=ヒータ出力/循環液量)に対する制
御温度幅の関係を試験し図示した。
It is not considered preferable to use a large-capacity heater to control the temperature of the processing liquid when the amount of circulating liquid is small, because hunting to the processing set temperature becomes large, which is not considered preferable. When using a heater with a capacity, hunting is small and preferable control is performed. However, because of a large amount of circulating liquid, a fluctuation in pressure occurs in the pumping tank and the processing tank, which is not a preferable method because of stable development. . No.
FIG. 35 shows the relationship between the control temperature width and the heat load (= heater output / circulating fluid amount).

処理槽の内部に感光材料を搬送するガイド部材を設
け、スムーズに感光材料の搬送を行なうと同時に、この
ガイド部材に処理液が吹き出る開孔を設けることにより
処理液を感光材料に吹き付けることによって感光材料処
理にムラがなくなると共に、感光材料がガイド部材より
浮上しながら搬送されるので、感光材料面にすり傷が入
ったり、またガイド途中でジャミングを生じたりするこ
とがなくなる。
A guide member for transporting the photosensitive material is provided inside the processing tank, and the photosensitive material is smoothly transported. At the same time, the guide member is provided with an opening through which the processing solution is blown out, thereby spraying the processing solution onto the photosensitive material. Since there is no unevenness in the material processing, and the photosensitive material is conveyed while floating above the guide member, scratches do not occur on the photosensitive material surface and jamming does not occur during the guide.

ガイド部材の開孔率の現像ムラ、感光材料への吹き付
け線速と現像ムラの関係を各種の試験を行ない求め、こ
の結果を後記する表1、表2に示す。その結果による
と、ガイド部材の開孔率は15%以上、好ましくは20%以
上必要であり、感光材料への吹き付け線速は1.0cm/sec
以上、好ましくは1.5cm/sec以上必要である。
Various tests were conducted to determine the relationship between the development unevenness of the aperture ratio of the guide member, the linear velocity of the sprayed photosensitive material, and the development unevenness. The results are shown in Tables 1 and 2 below. According to the results, the porosity of the guide member is required to be 15% or more, preferably 20% or more, and the linear velocity of spraying on the photosensitive material is 1.0 cm / sec.
More preferably, it is required to be 1.5 cm / sec or more.

処理槽には、処理液の張り込みまた抜出しのために、
密閉状態を解除し、外気に開放する機構を備えている。
In the processing tank, in order to insert or withdraw the processing solution,
A mechanism is provided to release the closed state and open to the outside air.

処理槽内の処理液は弁構造体或いはローラ構造体を介
して外気と接しており、感光材料を搬送することにより
処理液の一部が漏洩する。この部分での処理液の空気酸
化を防止するために、構造体表面を間欠的或いは連続的
に水で洗浄する。
The processing liquid in the processing tank is in contact with the outside air via a valve structure or a roller structure, and a part of the processing liquid leaks by transporting the photosensitive material. The surface of the structure is washed intermittently or continuously with water in order to prevent air oxidation of the processing liquid in this portion.

また、各処理槽間の弁構造体或いはローラ構造体で形
成される中間室に、水や流動パラフィン、イナートガス
等処理に影響のない物質を充填して、実質的に空気酸化
蒸発等が生じない構造とすることも可能である。
In addition, an intermediate chamber formed by a valve structure or a roller structure between the processing tanks is filled with a substance that does not affect the processing such as water, liquid paraffin, and inert gas, so that substantially no air oxidation evaporation or the like occurs. A structure is also possible.

基本的はローラ構造体を使用する感光材料処理装置の
形状を第1図に示す。また処理槽へのローラ構造体の取
付及び感光材料の搬送を第2図に示す。さらに、処理槽
内での配置を第3図に示すが、特にこれらに限定される
訳ではない。
FIG. 1 shows the basic configuration of a photosensitive material processing apparatus using a roller structure. FIG. 2 shows the attachment of the roller structure to the processing tank and the transport of the photosensitive material. Further, the arrangement in the processing tank is shown in FIG. 3, but is not particularly limited thereto.

カラー写真処理においては、その処理温度の恒温性が
非常に重要である。その方法としては、通常処理槽の中
にヒータを入れ、処理槽内の処理液を撹拌したり処理液
を循環ポンプで循環して温調を行なっている。この発明
ではの処理槽では、処理液をポンプ循環することも可能
であるが、第28図に示す如く処理槽内のガイド内にヒー
タを内臓したり、第29図、第30図に示す如く処理槽内に
ヒータを内臓することもできる。また、処理槽内部の液
撹拌は第31図、第33図に示すように処理槽内で撹拌する
ことも可能であるし、また第32図に示す如く、感光材料
の搬送時に感光材料自体がガイド内側に設けられたフィ
ン状の撹拌板を振動させ処理液撹拌することもできる。
処理槽外に大容量のヒータを設置し、処理槽部に小容量
のヒータを持ち、昇温は主に外部ヒータで行ない、温調
は内部ヒータで行なうことで、温度変動範囲を小さくす
ることができる。
In color photographic processing, the constant temperature of the processing temperature is very important. As a method for controlling the temperature, a heater is usually placed in a processing tank, and the processing liquid in the processing tank is stirred or the processing liquid is circulated by a circulation pump. In the processing tank according to the present invention, the processing liquid can be circulated by pumping. However, a heater is built in a guide in the processing tank as shown in FIG. 28, or as shown in FIGS. 29 and 30. A heater can be built in the processing tank. In addition, the liquid agitation inside the processing tank can be agitated in the processing tank as shown in FIGS. 31 and 33, and as shown in FIG. 32, the photosensitive material itself is transferred when the photosensitive material is transported. The fin-shaped stirring plate provided inside the guide may be vibrated to stir the processing liquid.
A large-capacity heater is installed outside the processing tank, a small-capacity heater is provided in the processing tank, and the temperature rise is mainly performed by the external heater, and the temperature control is performed by the internal heater to reduce the temperature fluctuation range. Can be.

[発明の実施の形態] 以下、この発明の実施例を添付図面に基づいて詳細に
説明する。
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

第1図はこの発明を適用した感光材料処理装置を示す
概略図である。
FIG. 1 is a schematic view showing a photosensitive material processing apparatus to which the present invention is applied.

第1図において、符号1は外光を遮閉する装置本体
で、この装置本体1の片側には感光材料の搬入部2が、
他側に感光材料の搬出部3が設けられている。搬入部2
と搬出部3との間には、感光材料の搬入部2側から洗浄
部4、現像槽5、洗浄部6、定着槽7、洗浄部8、水洗
槽9、洗浄部10が連続して配置されている。
In FIG. 1, reference numeral 1 denotes an apparatus main body that blocks external light, and a loading section 2 for photosensitive material is provided on one side of the apparatus main body 1.
On the other side, a discharge section 3 for the photosensitive material is provided. Loading section 2
A washing unit 4, a developing tank 5, a washing unit 6, a fixing tank 7, a washing unit 8, a washing tank 9, and a washing unit 10 are arranged continuously from the photosensitive material carry-in unit 2 side to the carry-out unit 3. Have been.

現像槽5、定着槽7及び水洗槽9の各処理槽には、そ
れぞれ現像液、定着液、水洗液が密閉状態で貯溜され、
この各処理槽の上部にはそれぞれ補充容器11,12,13が配
管14,15,16を介して接続され、この補充容器11、12、13
内にそれぞれの処理槽の液面が形成されている。配管1
4,15,16にはそれぞれ外部の接続された空気配管17が接
続され、バルブ18の開放で空気を導入して密閉状態を解
除するようになっている。
In each processing tank of the developing tank 5, the fixing tank 7, and the washing tank 9, a developer, a fixing liquid, and a washing liquid are stored in a sealed state, respectively.
Replenishing containers 11, 12, and 13 are connected to the upper portions of the processing tanks via pipes 14, 15, and 16, respectively.
The liquid level of each processing tank is formed therein. Piping 1
An externally connected air pipe 17 is connected to each of 4, 15 and 16, and air is introduced when the valve 18 is opened to release the sealed state.

洗浄部4、現像槽5、洗浄部6、定着槽7、洗浄部
8、水洗槽9、洗浄部10を区画する側壁には上下一対の
ローラ19,20が実質的に液漏れがない間隙幅で形成さ
れ、このローラ19,20の間を感光材料が通過可能になっ
ている。ローラ間隙、或いはローラ19,20と本体壁との
間隙は処理槽が密閉状態をとっているために多少あいて
いても、液漏れは実質的にないとみなすことができる。
搬入部2から搬入された感光材料はローラ19,20の回転
により、洗浄部4、現像槽5、洗浄部6、定着槽7、洗
浄部8、水洗槽9、洗浄部10を順次搬送され、搬出部3
から処理された状態で取出される。
A pair of upper and lower rollers 19 and 20 is provided on a side wall for partitioning the washing unit 4, the developing tank 5, the washing unit 6, the fixing tank 7, the washing unit 8, the washing tank 9, and the washing unit 10. The photosensitive material can pass between the rollers 19 and 20. Even if the gap between the rollers or the gap between the rollers 19 and 20 and the main body wall is slightly open because the processing tank is in a sealed state, it can be considered that there is substantially no liquid leakage.
The photosensitive material carried in from the carry-in section 2 is sequentially conveyed through the washing section 4, the developing tank 5, the washing section 6, the fixing tank 7, the washing section 8, the washing tank 9 and the washing section 10 by the rotation of the rollers 19 and 20, Unloading section 3
It is taken out in the processed state.

現像槽5、定着槽7及び水洗槽9の各処理槽内は密閉
されているために処理液が漏らず、かつ処理液が処理槽
内で空気と接することがなくなり、処理槽内での処理液
の酸化劣化及び蒸発を防止することができる。従って、
処理液槽内で酸化によって生じるようなタール状の汚れ
は生じない。また、各処理槽の側壁にローラ19,20のロ
ーラ構造体を形成して、ローラ回転に支障のない範囲の
間隙でシールすることにより、感光材料はローラ19,20
の回転で、そのローラ間を通って処理液中に搬入され
る。各処理槽は密閉状態にすることで、感光材料の搬入
搬出時にも、ローラ19,20間からは液漏れが生じること
を実質的に防止している。
Since the processing tanks of the developing tank 5, the fixing tank 7, and the washing tank 9 are sealed, the processing liquid does not leak, and the processing liquid does not come into contact with air in the processing tank. Oxidation deterioration and evaporation of the liquid can be prevented. Therefore,
No tar-like stains, such as those caused by oxidation, occur in the treatment liquid tank. Further, by forming a roller structure of the rollers 19 and 20 on the side wall of each processing tank and sealing them with a gap within a range that does not hinder the rotation of the rollers, the photosensitive material can be transferred to the rollers 19 and 20.
Is carried into the processing liquid through the rollers. Each processing tank is sealed to substantially prevent liquid leakage from occurring between the rollers 19 and 20 even when the photosensitive material is carried in and out.

処理液の交換時には、バルブ18を開放して大気と導通
することで処理槽の密閉状態を解除すると、ローラ19,2
0間からは洗浄部4,6,8,10に排出され、この廃液はバル
ブ21を開放すると配管22から排出される。
When the treatment liquid is replaced, the valve 18 is opened to establish communication with the atmosphere to release the sealed state of the treatment tank.
From time 0, the liquid is discharged to the cleaning units 4, 6, 8, and 10. This waste liquid is discharged from the pipe 22 when the valve 21 is opened.

ローラ19,20が密閉されることによって処理液槽を壁
部として処理液を貯溜する機能を有し、さらにローラ1
9,20を回転することで感光材料を搬送するため、感光材
料を搬送するための特別な機構を設ける必要がない。
The rollers 19 and 20 are sealed to have a function of storing the processing liquid with the processing liquid tank serving as a wall portion.
Since the photosensitive material is transported by rotating 9, 20, there is no need to provide a special mechanism for transporting the photosensitive material.

現像槽5、定着槽7及び水洗槽9の各処理槽には、感
光材料の搬送を円滑にするガイド23が所定幅で対向して
配置され、このガイド23で処理液中に感光材料を搬送す
るスリット状の搬送路が形成され、感光材料は乳剤面を
下側にして搬送される。特に、上下の制限はないが、処
理液を感光材料の乳剤面に吹き付ける方向に、感光材料
の上下を決めることが好ましい。また、処理液循環によ
り十分に処理槽内の撹拌ができている場合には、処理液
循環供給口のない上部に乳剤面を向けても良い。ガイド
23には後記するような開口が形成されており、循環系24
の駆動で開口から処理液を感光材料に吹付けて搬送す
る。ガイド23には15%、より好ましくは20%以上の開孔
を形成することが好ましく、かつこの開孔から感光材料
に1.0cm/sec以上、より好ましくは1.5cm/sec以上の吹き
出し速度で吹き付けるようになっている。処理液の吹付
けで、感光材料と搬送路を形成するガイド23との接触抵
抗が軽減され、かつ処理液の撹拌性が向上し、処理ムラ
も防止される。
In each of the processing tanks of the developing tank 5, the fixing tank 7 and the washing tank 9, a guide 23 for facilitating the transfer of the photosensitive material is disposed opposite to each other with a predetermined width, and the guide 23 transfers the photosensitive material into the processing solution. The photosensitive material is transported with the emulsion surface downward. Although there is no particular limitation on the upper and lower sides, it is preferable to determine the upper and lower sides of the photosensitive material in the direction in which the processing solution is sprayed on the emulsion surface of the photosensitive material. Further, when the processing solution is sufficiently stirred in the processing tank by circulation of the processing solution, the emulsion surface may be directed to an upper portion without the processing solution circulation supply port. guide
An opening is formed in the circulating system 24 as described later.
The processing liquid is sprayed onto the photosensitive material from the opening by the drive of and is conveyed. The guide 23 preferably has an opening of 15%, more preferably 20% or more, and blows the photosensitive material from the opening at a blowing speed of 1.0 cm / sec or more, more preferably 1.5 cm / sec or more. It has become. By spraying the processing liquid, the contact resistance between the photosensitive material and the guide 23 forming the transport path is reduced, the agitation of the processing liquid is improved, and processing unevenness is prevented.

ガイド23で形成される搬送路の幅は、例えば感光材料
の厚さに5mm程度を加えた幅に設定され、これにより感
光材料のジャムリングを防止することができる。また、
処理液を搬送方向へ傾きをもって吹付ければ、処理液の
流れで感光材料をスムーズに搬送することができる。
The width of the conveyance path formed by the guide 23 is set to, for example, a width obtained by adding about 5 mm to the thickness of the photosensitive material, thereby preventing jamming of the photosensitive material. Also,
If the processing liquid is sprayed with an inclination in the transport direction, the photosensitive material can be smoothly transported by the flow of the processing liquid.

さらに、ガイド23の感光材料と対向する面に凹凸加工
あるいは縞状加工等を施して、感光材料との摩擦抵抗を
軽減することができる。
Further, the surface of the guide 23 facing the photosensitive material may be subjected to unevenness processing or striped processing to reduce the frictional resistance with the photosensitive material.

現像槽5、定着槽7及び水洗槽9に備えた循環系24
は、循環ポンプ25とヒータ26とろ過器31から構成され、
密閉された処理槽内の処理液の循環を行ない、現像槽5
及び定着槽7では処理液の組成を均一化にすると共に、
温度を一定に調節しながら各処理液中にある塵介等を除
去することができる。また、水洗槽9では水洗温度を調
節すると共に、水洗水を撹拌して効率よく洗浄すること
ができる。
The circulation system 24 provided in the developing tank 5, the fixing tank 7, and the washing tank 9
Is composed of a circulation pump 25, a heater 26, and a filter 31,
The processing solution in the sealed processing tank is circulated, and the developing tank 5 is circulated.
In the fixing tank 7, the composition of the processing liquid is made uniform,
Dust and the like in each processing solution can be removed while the temperature is constantly adjusted. In the washing tank 9, the washing temperature can be adjusted, and the washing water can be stirred for efficient washing.

感光材料の処理時間は現像処理、定着処理及び水洗処
理とも、例えばそれぞれ略30秒以内で行なわれる。
The processing time of the photosensitive material is, for example, within approximately 30 seconds for each of the developing process, the fixing process, and the washing process.

洗浄部4,6,8,10には噴射ノズル27が配置され、配管28
を介して水洗水タンク29に接続され、水洗水ポンプ30を
駆動して、各洗浄部4,6,8,10に水洗水を供給する。この
水洗水の供給は特に限定されないが、例えば処理の終了
時に、或いは処理前のスタンバイ状態時に噴射ノズル27
からローラ19,20の方向へ噴射して洗浄を行なうことが
できる。また、この洗浄部4,6,8,10に常時洗浄水を噴射
しておき、常に処理時にローラ19,20を洗浄することが
できる。
In the cleaning sections 4, 6, 8, and 10, injection nozzles 27 are arranged, and pipes 28 are provided.
Is connected to the washing water tank 29 via the, and drives the washing water pump 30 to supply the washing water to each of the washing units 4, 6, 8, and 10. The supply of the washing water is not particularly limited. For example, at the end of the processing, or at the standby state before the processing, the injection nozzle 27 is supplied.
The cleaning can be performed by jetting in the direction of the rollers 19 and 20 from above. Further, it is possible to always inject the washing water into the washing units 4, 6, 8, and 10, and to always wash the rollers 19 and 20 during the processing.

また、この洗浄部4,6,8,10の中間室部分に洗浄水を満
たしておき、ローラを連続的に洗浄することもできる。
In addition, it is also possible to fill the intermediate chamber portions of the cleaning sections 4, 6, 8, and 10 with cleaning water, and to continuously clean the rollers.

第2図乃至第23図はさらに具体的な感光材料処理装置
を示し、第2図は現像処理部の概略図、第3図は現像槽
の正面図、第4図は第3図のIV−IV断面図、第5図は第
4図の右側面図、第6図はシール部材の平面図、第7図
は第6図のVII−VII断面図、第8図乃至第11図はシール
部材の他の実施例の断面図、第12図及び第13図はローラ
の断面図、第14図はローラシール部の拡大断面図、第15
図は第14図の右側面図、第16図はローラシール部の他の
実施例の拡大断面図、第17図はガイドの平面図、第18図
はガイドの正面図、第19図は第17図のXIX−XIX断面図、
第20図及び第21図はガイドの平面図、第22図及び第23図
は現像槽の循環系の供給部と排出部を示すもので、第22
図はその側面図、第23図はその底面図である。
2 to 23 show a more specific photosensitive material processing apparatus, FIG. 2 is a schematic view of a developing processing section, FIG. 3 is a front view of a developing tank, and FIG. IV sectional view, FIG. 5 is a right side view of FIG. 4, FIG. 6 is a plan view of the seal member, FIG. 7 is a VII-VII sectional view of FIG. 6, FIG. 8 to FIG. 12 and 13 are cross-sectional views of a roller, FIG. 14 is an enlarged cross-sectional view of a roller seal portion, and FIG.
14 is a right side view of FIG. 14, FIG. 16 is an enlarged sectional view of another embodiment of the roller seal portion, FIG. 17 is a plan view of the guide, FIG. 18 is a front view of the guide, and FIG. XIX-XIX sectional view of FIG. 17,
FIGS. 20 and 21 are plan views of the guide, and FIGS. 22 and 23 show a supply part and a discharge part of a circulation system of the developing tank.
The figure is a side view, and FIG. 23 is a bottom view.

この実施例は、現像処理部について説明するが、定着
処理部及び水洗処理部も同様に構成される。
In this embodiment, a description will be given of a development processing unit. However, a fixing processing unit and a washing processing unit are similarly configured.

現像槽5の補充容器11と配管14との接続は第2図に示
すように、受台40に設けられた配管14に接続された先端
が尖った取付部41に補充容器11の蓋部11aを挿着して、
液漏れがない状態で連通される。また、補充容器11は特
にこのような形で処理槽に接続することなく、処理槽下
部に設置して、ポンプで強制的に供給することも可能で
ある。補充容器11の現像液は配管14を介して供給部14a
から現像部5に供給される。また、補充容器11は容易に
取付部41から着脱することができ、交換作業が簡単であ
る。
As shown in FIG. 2, the connection between the replenishing container 11 of the developing tank 5 and the pipe 14 is performed by attaching the lid 11a of the replenishing container 11 to a sharp-pointed mounting part 41 connected to the pipe 14 provided on the receiving table 40. Insert
It is communicated without any liquid leakage. In addition, the replenishing container 11 can be installed in the lower part of the processing tank without being connected to the processing tank in such a manner, and can be forcibly supplied by a pump. The developer in the replenishing container 11 is supplied through a pipe 14 to a supply unit 14a.
Is supplied to the developing unit 5 from the printer. Further, the replenishing container 11 can be easily attached to and detached from the attachment portion 41, and the replacement operation is simple.

配管14は供給部14aを介して現像部5に現像液を供給
し、この配管14の取付部41には補充容器11の処理液の残
量を検出する検出センサ42が設けられ、この検出センサ
42が作動で補充容器11の交換時期を知ることができる。
さらに、配管14の取付部41には大気と連通する空気配管
17が接続され、この配管17にはバルブ18が設けられてお
り、このバルブ18の閉塞で現像槽5は密閉状態に保持さ
れる。現像槽5内の現像液の交換時にはバルブ18を開放
すると、大気圧で現像液が現像槽5のローラ19,20を設
けた部分から漏れて排出する。バルブ18を閉じて現像槽
5を密閉に近い状態にして新たな現像液を供給し、補充
容器11をセットすると液交換が終了する。
The pipe 14 supplies a developing solution to the developing section 5 via a supply section 14a, and a mounting section 41 of the pipe 14 is provided with a detection sensor 42 for detecting the remaining amount of the processing liquid in the replenishing container 11.
By the operation of 42, the replacement time of the refill container 11 can be known.
Furthermore, an air pipe communicating with the atmosphere is provided at the mounting portion 41 of the pipe 14.
A pipe 18 is provided with a valve 18. The valve 18 is closed to keep the developing tank 5 in a closed state. When the developing solution in the developing tank 5 is exchanged, when the valve 18 is opened, the developing solution leaks from the portion of the developing tank 5 where the rollers 19 and 20 are provided and is discharged at atmospheric pressure. When the valve 18 is closed and the developing tank 5 is closed, a new developer is supplied, and the replenishing container 11 is set, the liquid exchange is completed.

現像槽5の上壁51、下壁52は近接して平行に配置さ
れ、この上壁51、下壁52の間には第4図及び第5図に示
すように後壁53と中壁54が設けられ、さらに中壁54に近
接して前壁55が配置されている。前側のローラの駆動機
構が設けられる側には、さらに空間を設けることにより
二重構造になって液漏れが防止される。
The upper wall 51 and the lower wall 52 of the developing tank 5 are arranged close to and parallel to each other, and between the upper wall 51 and the lower wall 52, as shown in FIGS. Are provided, and a front wall 55 is arranged close to the middle wall 54. By providing an additional space on the side where the drive mechanism of the front roller is provided, a double structure is formed to prevent liquid leakage.

現像槽5及びこの前段に配置される洗浄部4と、この
後段に配置される洗浄部6を区画する側壁はそれぞれロ
ーラ19,20で形成されている。即ち、上壁51と下壁52の
内側には第2図に示すようなシール部材56が対向して設
けられ、このシール部材56は球状の凹部56aを有してお
り、この凹部56aとローラ19,20とは液漏れがないように
シールされ、かつローラ19,20が回転可能な状態になっ
ている。
The developing tank 5 and the cleaning section 4 disposed at the preceding stage and the cleaning section 6 disposed at the subsequent stage are formed with rollers 19 and 20, respectively. That is, a seal member 56 as shown in FIG. 2 is provided inside the upper wall 51 and the lower wall 52, and the seal member 56 has a spherical concave portion 56a. 19 and 20 are sealed so that there is no liquid leakage, and the rollers 19 and 20 are in a rotatable state.

シール部材56は第3図乃至第7図に示すように、断面
球面状の凸条56bを有するように形成してもよい。この
場合、シール部材56が上壁51と下壁52の内側にビス孔56
cからビス57を装着して固定され、一対のローラ19,20は
上下のシール部材56の凸条56bの間に圧接するように配
置される。
As shown in FIGS. 3 to 7, the seal member 56 may be formed to have a ridge 56b having a spherical cross section. In this case, the sealing member 56 is provided with a screw hole 56 inside the upper wall 51 and the lower wall 52.
A screw 57 is mounted and fixed from c, and the pair of rollers 19 and 20 are arranged so as to be in pressure contact between the ridges 56b of the upper and lower seal members 56.

シール部材は第8図に示すように、弾力性で製作した
薄板80で形成し、この薄板80を上壁51と下壁52の内側に
形成した突起51a,52bを介してローラ19,20に押し当て
て、ローラと本体との間の液漏れを防止する。この薄板
80はローラ側に押し付けられ、ローラと本体との間の液
漏れをなくす。この薄板80としては十分に弾力性があ
り、かつ処理液に対して耐久性があれば、どのような材
料でもよい。なお、この実施例では、2つのローラを1
つの板でシールしているが、勿論1つのローラを1つの
板でシールすることもできる。さらに、前記以外にも例
えば第9図乃至第11図に示すように、支持部材81〜83で
ローラ19,20を支持する種々のシール方式がある。
As shown in FIG. 8, the seal member is formed of a thin plate 80 made of elasticity, and this thin plate 80 is formed on the rollers 19 and 20 via projections 51a and 52b formed on the inside of the upper wall 51 and the lower wall 52. Pressing to prevent liquid leakage between the roller and the main body. This thin plate
80 is pressed against the roller side to eliminate liquid leakage between the roller and the main body. Any material may be used as the thin plate 80 as long as it is sufficiently elastic and durable with respect to the processing liquid. In this embodiment, two rollers are connected to 1
Although one plate is used for sealing, one roller can be used for sealing with one plate. In addition to the above, there are various sealing methods in which the rollers 19 and 20 are supported by support members 81 to 83 as shown in FIGS. 9 to 11, for example.

ローラ19,20は第12図及び第13図に示すように、軸部1
9a,20aにローラ部19b,20bが設けられ、このローラ部19
b,20bの両端に、やや小径の端部ローラ部19c,20cが設け
られ、2段構造になっている。ローラ19,20の端部ロー
ラ部19c,20cはローラ部19b,20bより硬度が大きく設定さ
れ、例えばローラ部19b,20bが柔らかい材質で製作さ
れ、端部ローラ部19c,20cがローラ部19b,20bより硬い材
料で製作される。このため、ローラ19,20を組付状態
で、ローラ部19b,20bが弾性変形し、端部ローラ部19c,2
0cが圧接された状態になり、両ローラ19,20が平行にな
って芯出しが行なわれる。上下のシール部材56、一対の
ローラ19,20によってシールされた側壁が形成される。
この一対のローラ19,20の端部ローラ部19c,20cの両端側
部と、後壁53及び中壁54との間は液漏れがないようにシ
ールされ、かつローラ19,20の回転が可能になってい
る。
The rollers 19 and 20 are, as shown in FIGS.
Rollers 19b and 20b are provided on 9a and 20a, respectively.
At both ends of b and 20b, slightly smaller-diameter end roller portions 19c and 20c are provided to form a two-stage structure. The end rollers 19c, 20c of the rollers 19, 20 are set to have a higher hardness than the rollers 19b, 20b.For example, the rollers 19b, 20b are made of a soft material, and the end rollers 19c, 20c are formed by the rollers 19b, 20c. Made of material harder than 20b. Therefore, with the rollers 19, 20 assembled, the roller portions 19b, 20b are elastically deformed, and the end roller portions 19c, 2
0c is in a pressed state, and the rollers 19 and 20 are parallelized to perform centering. Side walls sealed by the upper and lower seal members 56 and the pair of rollers 19 and 20 are formed.
The space between both ends of the end roller portions 19c and 20c of the pair of rollers 19 and 20 and the rear wall 53 and the middle wall 54 are sealed so as not to leak liquid, and the rollers 19 and 20 can rotate. It has become.

ローラ部19b,20b及び19c,20cは、同質硬度で製作され
ても勿論シール機能には問題ない。
Even if the rollers 19b, 20b and 19c, 20c are manufactured with the same hardness, there is no problem in the sealing function.

また、ローラ19,20のローラ部19b,20bの材質はゴムに
限定されず、シール性がありかつ感光材料の挿通時にそ
の表面を傷付けない程度に柔軟性を有し、しかも現像液
に侵食しないものが用いられ、ゴムの他例えばポリエス
テル、塩化ビニル樹脂やナイロン等の有機高分子材料及
びフェルト材、織布等が用いられる。さらに、このロー
ラ部19b,20bは若干の撥水性のある材質が、感光材料の
表面を傷付けることがなく円滑に通過でき好ましい。ロ
ーラ19,20の端部ローラ19c,20cの材質もゴムに限定され
ず、ローラ部19b,20bと同様な材質のものを用いること
ができる。
Further, the material of the roller portions 19b and 20b of the rollers 19 and 20 is not limited to rubber, and has a sealing property and has such flexibility that the surface thereof is not damaged when the photosensitive material is inserted, and does not erode the developer. In addition to rubber, organic polymer materials such as polyester, vinyl chloride resin and nylon, felt materials, woven fabrics and the like are used. Further, the rollers 19b and 20b are preferably made of a material having a slight water repellency so that the material can pass smoothly without damaging the surface of the photosensitive material. The material of the end rollers 19c and 20c of the rollers 19 and 20 is not limited to rubber, and the same material as that of the roller portions 19b and 20b can be used.

洗浄部4,6及び現像槽5を区画するローラ19,20の下側
のローラ19は、第4図に示すように、その一端部19dを
後壁53に埋設されたベアリング58に軸支され、後壁53か
ら突出しない状態で回動可能になっている。このローラ
19の他端部19eは中壁54及び前壁55を貫通して、前壁55
にベアリング59を介して軸支されている。
As shown in FIG. 4, the roller 19 on the lower side of the rollers 19 and 20 for partitioning the washing sections 4 and 6 and the developing tank 5 has one end 19d supported by a bearing 58 embedded in the rear wall 53. , And is rotatable without protruding from the rear wall 53. This roller
The other end 19e of 19 passes through the middle wall 54 and the front wall 55, and
Are supported by a bearing 59 via a bearing 59.

ローラ19の軸部19aと中壁54との間には、第4図、第1
4図及び第15図に示すように、中壁54の凹部54aに嵌合し
た2個のOリング60を軸部20aに螺着したグランド押え6
1を回転し、このグランド押え61の移動でOリング60を
押圧してシールする。このグランド押え61の鍔部61aに
は4箇所に切欠61bが形成されており、この切欠61bに外
部から工具を当てがって回転させる。また、第16図に示
すように、グランド押え84をビス85により中壁54に締付
けてシールすることもできる。
4, between the shaft portion 19a of the roller 19 and the inner wall 54, FIG.
As shown in FIGS. 4 and 15, a ground press 6 in which two O-rings 60 fitted into the recesses 54a of the inner wall 54 are screwed to the shaft portion 20a.
1 is rotated, and the O-ring 60 is pressed and sealed by the movement of the gland presser 61. Notches 61b are formed at four places in the flange portion 61a of the gland retainer 61, and a tool is applied to the notch 61b from outside to rotate the notch 61b. In addition, as shown in FIG. 16, the ground presser 84 can be sealed to the middle wall 54 with screws 85.

ローラ19の先端部にはギヤ62が設けられ、このギア62
は駆動軸63に設けられたギア64と噛合しており、図示し
ないモータの駆動で駆動軸63を回転してローラ19を回転
するようになっている。この下側のローラ19の回転で上
側に対向して配置されたローラ20が回転し、このローラ
19,20間で感光材料を搬送する。
A gear 62 is provided at the tip of the roller 19.
Is meshed with a gear 64 provided on the drive shaft 63, and rotates the roller 19 by rotating the drive shaft 63 by driving a motor (not shown). By the rotation of the lower roller 19, the roller 20 disposed to face the upper side rotates, and this roller
The photosensitive material is transported between 19 and 20.

上側のローラ20の軸部20aは両端部20d,20eが後壁53
と、中壁54とに埋設されたベアリング65,66に回動可能
に支持され、液漏れがないようにシールされている。
The shaft portion 20a of the upper roller 20 has both ends 20d and 20e at the rear wall 53.
Are rotatably supported by bearings 65 and 66 embedded in the inner wall 54 and are sealed so as not to leak liquid.

現像槽5内には上下に配置されたガイド23で感光材料
の搬送路が形成され、このガイド23で密閉状態の現像槽
5内を感光材料が円滑に搬送できるようにしている。ガ
イド23は第17図乃至第19図に示すように、側部にネジ孔
23aが形成されており、現像槽5の後壁53と中壁54に図
示しないネジで締付固定される。ガイド23には搬送方向
にスリット23bが所定間隔で形成され、このスリット23b
で感光材料との接触面積を少なくし、感光材料との接触
抵抗を軽減して円滑に搬送できる。ガイド23は第20図に
示すように多孔板で形成することもでき、また第21図に
示すように網状板で形成することもできる。
In the developing tank 5, a guide path of the photosensitive material is formed by guides 23 arranged vertically, and the guide 23 enables the photosensitive material to be smoothly transported in the sealed developing tank 5. The guide 23 has a screw hole at the side as shown in FIGS.
23a are formed, and are fixed to the rear wall 53 and the middle wall 54 of the developing tank 5 by screws (not shown). In the guide 23, slits 23b are formed at predetermined intervals in the transport direction.
As a result, the contact area with the photosensitive material is reduced, the contact resistance with the photosensitive material is reduced, and the material can be smoothly transported. The guide 23 can be formed of a perforated plate as shown in FIG. 20, or can be formed of a mesh plate as shown in FIG.

感光材料は、その乳剤面を上下方向どちらの向きにて
も搬送できる。処理液循環の吹き出しノズルが処理槽下
側に設置されている場合には、ガイド23の下方から現像
液を感光材料の乳剤面に吹き付けて、ムラのない現像を
行なうと共に、感光材料の搬送抵抗を軽減し、搬送を円
滑に行なう。このガイド23によって形成される搬送路の
幅は感光材料の幅に、例えば略5mm程度を加えた幅と
し、感光材料の蛇行搬送及びジャムリングを防止する。
The light-sensitive material can be conveyed with the emulsion surface in either vertical direction. When the discharge nozzle for processing solution circulation is installed below the processing tank, a developing solution is sprayed from below the guide 23 onto the emulsion surface of the photosensitive material to perform development without unevenness and to reduce the transport resistance of the photosensitive material. And smooth transportation. The width of the conveyance path formed by the guide 23 is set to a width obtained by adding, for example, about 5 mm to the width of the photosensitive material, to prevent meandering conveyance and jamming of the photosensitive material.

また、ガイド23の搬送路を形成する面には摩擦抵抗を
軽減するために、凹凸加工や縞状加工を施すことができ
る。さらに、ガイド23の形成されるスリット23bは、現
像液を搬送方向へ向けて吹き付けるようにすることもで
き、より有効に現像液の流れで感光材料を搬送すること
ができる。
In addition, the surface of the guide 23 on which the conveyance path is formed can be subjected to uneven processing or striped processing in order to reduce frictional resistance. Further, the slits 23b in which the guides 23 are formed can spray the developer in the transport direction, so that the photosensitive material can be transported more effectively by the flow of the developer.

循環系24の循環ポンプ25の駆動で、現像槽5の中央部
の排出部67に接続された配管68を介して導かれる現像液
をヒータ26加熱し、配管69から排出部67の両側に配置さ
れた一対の供給部70より、現像槽5内に吹き出される。
By driving the circulation pump 25 of the circulation system 24, the developer guided through a pipe 68 connected to a discharge part 67 at the center of the developing tank 5 is heated by a heater 26, and arranged on both sides of the discharge part 67 from a pipe 69. From the pair of supply units 70 thus blown out, it is blown into the developing tank 5.

この循環系24の駆動で、現像液が供給部70から吹き出
し、感光材料に現像液を吹き付ける機能と、現像槽5内
の現像液を撹拌して温度を一定にする機能を有してい
る。また、現像槽5には温度センサ71が配置され、ヒー
タ26を駆動する温度情報を得ている。
The drive of the circulation system 24 has a function of blowing out the developer from the supply unit 70 and spraying the developer on the photosensitive material, and a function of stirring the developer in the developing tank 5 to keep the temperature constant. Further, a temperature sensor 71 is disposed in the developing tank 5 to obtain temperature information for driving the heater 26.

現像液の温度調節は循環系24に設けたヒータ26で行な
っており、特に小型の現像槽の温度調節要領としては現
像槽内に行なうよりは、現像槽5の外部の循環系24で行
なうことができる。
The temperature control of the developing solution is performed by the heater 26 provided in the circulation system 24. In particular, the procedure for adjusting the temperature of the small-sized developing tank is to perform it in the circulating system 24 outside the developing tank 5 rather than in the developing tank. Can be.

即ち、現像槽5が小さいので、現像槽5中にヒータを
入れて、大容量のヒータのON,OFF動作による温度調節を
行なうと、現像槽のように温度制御範囲の非常に狭いコ
ントロールは極めて困難となり、現像槽5内で温度分布
が生じ、ヒータの加熱表面上での液流動がないので、現
像の劣化が生じやすい。このため、ヒータ26を現像槽5
の槽外に設置して、処理槽内の処理液を多量循環して処
理槽内での温度変動を小さく保つことが可能になり、ま
た現像液の劣化を防止できる。
That is, since the developing tank 5 is small, if a heater is inserted into the developing tank 5 and temperature control is performed by turning on and off a large-capacity heater, a control with a very narrow temperature control range like the developing tank is extremely difficult. It becomes difficult, a temperature distribution occurs in the developing tank 5, and there is no liquid flow on the heating surface of the heater. For this reason, the heater 26 is connected to the developing tank 5.
It is possible to circulate a large amount of the processing liquid in the processing tank to keep the temperature fluctuation in the processing tank small and prevent the deterioration of the developer.

定着槽及び水洗槽も現像槽と同様に構成されている
が、水洗槽9では循環系24にヒータを設けることもでき
る。
Although the fixing tank and the washing tank are configured similarly to the developing tank, in the washing tank 9, a heater can be provided in the circulation system 24.

前記洗浄部4,6には噴射ノズル27が設けられ、洗浄水
ポンプ72の駆動によって水洗水タンク73から水洗水が配
管74を介して供給部75に供給され、ここから噴射ノズル
27で洗浄水がローラ19,20に向って噴射され、ローラ19,
20を洗浄する。水洗水タンク73には液面センサ76が設け
られ、水洗水の残量を検出する。
The washing units 4 and 6 are provided with injection nozzles 27, and washing water is supplied from a washing water tank 73 to a supply unit 75 via a pipe 74 by a driving of a washing water pump 72.
At 27, the washing water is sprayed toward the rollers 19, 20, and the rollers 19, 20
Wash 20. The washing water tank 73 is provided with a liquid level sensor 76 for detecting the remaining amount of washing water.

洗浄した廃液や感光材料をローラ19,20から挿入する
際に漏れる液は、配管22を介して廃液タンク77に排出さ
れる。さらに、この廃液タンク77には処理液を備えた受
台44から漏れるが、配管78を介して廃液タンク77に排出
される。
The washed waste liquid and the liquid leaking when the photosensitive material is inserted from the rollers 19 and 20 are discharged to the waste liquid tank 77 via the pipe 22. Further, the waste liquid tank 77 leaks from the receiving table 44 provided with the processing liquid, but is discharged to the waste liquid tank 77 via the pipe 78.

また、この洗浄部(中間室)4,6には水洗水を常時貯
溜しておき、常にローラ19,20を洗浄するような構成に
することができる。また、流動パラフィン、イナートガ
ス等処理に影響のない物質を充填することもできる。
In addition, the washing units (intermediate chambers) 4 and 6 can be configured so that washing water is always stored and the rollers 19 and 20 are always washed. In addition, a substance that does not affect the processing, such as liquid paraffin and inert gas, can be filled.

第24図は処理槽の他の実施例を示し、この実施例では
下壁90と、上壁91とが対向して配置されている。この下
壁90と上壁91と両端の凹部90a,91aには上下一対のロー
ラ92,93が実質的に液漏れがないようにシールし、かつ
回転可能に配置されている。このローラ92,93の回転
で、両者の間を感光材料が通過し、下壁90と一体に形成
されたガイド94と、上壁91と一体に形成されたガイド95
とで形成される搬送路に搬入される。ガイド94には搬送
方向へ向くスリット94aが形成されており、循環系の作
動で下方の供給部90bから供給される処理液を搬送方向
へ向けて導き、感光材料を搬送する。循環する処理液は
ガイド95に形成されたスリット95aから搬送路外にで
て、上壁91に形成された排出部91bから流出して循環す
る。
FIG. 24 shows another embodiment of the processing tank. In this embodiment, a lower wall 90 and an upper wall 91 are arranged to face each other. A pair of upper and lower rollers 92, 93 are sealed in the lower wall 90, the upper wall 91, and the concave portions 90a, 91a at both ends so as to substantially prevent liquid leakage and rotatably disposed. By the rotation of the rollers 92 and 93, the photosensitive material passes between the two, and a guide 94 formed integrally with the lower wall 90 and a guide 95 formed integrally with the upper wall 91.
And is carried into the conveyance path formed by. The guide 94 is formed with a slit 94a directed in the transport direction, and guides the processing liquid supplied from the lower supply unit 90b in the transport direction by the operation of the circulation system to transport the photosensitive material. The circulating treatment liquid exits the transport path through the slit 95a formed in the guide 95, flows out of the discharge portion 91b formed in the upper wall 91, and circulates.

第25図(a)乃至(e)は基本的なローラ構造体の形
状を示している。第25図(a)は前記実施例と同様に、
処理槽100と外気101とを同径の一対のローラ102で実質
的にシールしており、ローラ102の回転によって感光材
料103が搬送される。第25図(b)は一対のローラ102に
異なる径を用い、第25図(c),(e)は1個のローラ
102を用い、第25図(d)は3個のローラ102を用いてい
る。
FIGS. 25 (a) to (e) show the basic shape of the roller structure. FIG. 25 (a) shows the same as in the previous embodiment.
The processing tank 100 and the outside air 101 are substantially sealed by a pair of rollers 102 having the same diameter, and the photosensitive material 103 is transported by the rotation of the rollers 102. FIG. 25 (b) uses different diameters for the pair of rollers 102, and FIGS. 25 (c) and (e) show one roller.
FIG. 25 (d) uses three rollers 102.

第26図(a)乃至(f)は処理槽への搬入排出機構の
取付及び感光材料の搬送を示している。上記機構は1個
の弁、1個のローラ等の一重の機構でもよく、また複数
の同じ機構あるいは異なる機構が1ケ所の壁面のシール
性を高めるために複重に設置することもできる。第26図
(a)乃至(e)はローラ102を用いたもので、第26図
(a)は処理槽100が3個連続して横に配置され、感光
材料103が横方向から搬送され、第26図(b)は処理槽1
00が3個独立して横に配置しており、第26図(c)は処
理槽100を縦方向に配置し、感光材料103を上方から下方
に搬送し、第26図(d)は感光材料103が下方から上方
へ搬送され、第26図(e)は2個の処理槽100を上方
に、1個の処理槽100を下方に配置したものである。第2
6図(f)は弁シール107を用いたもので、ローラ102は
感光材料の搬送に用いている。第26図(g)及び(h)
はローラ102、弁シール107の2種類を併用したものであ
る。
FIGS. 26 (a) to 26 (f) show the attachment of the loading / unloading mechanism to the processing tank and the transfer of the photosensitive material. The above mechanism may be a single mechanism such as a single valve or a single roller, or a plurality of the same mechanisms or different mechanisms may be installed in multiple layers in order to enhance the sealing property of one wall surface. FIGS. 26 (a) to (e) show the use of rollers 102, and FIG. 26 (a) shows three processing tanks 100 arranged side by side, photosensitive material 103 being conveyed from the lateral direction, FIG. 26 (b) shows the processing tank 1.
FIG. 26 (c) arranges the processing tank 100 in the vertical direction, transports the photosensitive material 103 from above to below, and FIG. 26 (d) shows the photosensitive The material 103 is conveyed upward from below, and FIG. 26 (e) shows two processing tanks 100 arranged above and one processing tank 100 arranged below. No. 2
FIG. 6 (f) shows the use of the valve seal 107, and the roller 102 is used for conveying the photosensitive material. Fig. 26 (g) and (h)
Is a combination of two types of roller 102 and valve seal 107.

第27図(a)〜(p)はさらに処理槽100の配置及び
感光材料103の搬送方向が異なる実施例を示している。
FIGS. 27 (a) to 27 (p) show an embodiment in which the arrangement of the processing tank 100 and the conveying direction of the photosensitive material 103 are different.

第28図乃至第30図は処理液の温度調節の他の実施例を
示し、第28図に示す如く処理槽100内のガイド104内にヒ
ータ105を内蔵しており、このヒータ105はプレート型で
も棒型でもよい。第29図は処理槽100内にヒータ106を内
蔵しており、このヒータ106も同様にプレート型でも棒
型でもよい。第30図は処理槽100の外に大容量のヒータ1
07を設置し、処理槽部に小容量のヒータ108を持ち、昇
温は主に外部ヒータで行ない、温調は内部ヒータで行な
い、温度変動範囲を小さくすることができるものであ
る。
28 to 30 show another embodiment of the temperature control of the processing liquid. As shown in FIG. 28, a heater 105 is built in a guide 104 in the processing tank 100, and the heater 105 is a plate type. However, it may be rod-shaped. In FIG. 29, a heater 106 is built in the processing tank 100, and the heater 106 may be of a plate type or a rod type. Fig. 30 shows a large capacity heater 1 outside the processing tank 100.
07 is installed, and a small-capacity heater 108 is provided in the processing tank portion. The temperature is mainly raised by an external heater, and the temperature is controlled by an internal heater, so that the temperature fluctuation range can be reduced.

第31図乃至第33図は処理槽の撹拌の実施例を示してい
る。第31図は撹拌羽根200をガイド部材201に近接して設
け、外部からの動力で撹拌羽根200を駆動して処理液を
撹拌する。第32図はガイド部材202のガイド面から感光
材料の搬送路にのれん或いは糸状の部材203を出してお
き、感光材料が通過することで、この部材203が揺れて
処理液を撹拌する。第33図は供給口204から噴出する処
理液で、撹拌羽根200を回転させて撹拌する。
FIG. 31 to FIG. 33 show an embodiment of stirring of the processing tank. In FIG. 31, the stirring blade 200 is provided near the guide member 201, and the processing liquid is stirred by driving the stirring blade 200 with external power. In FIG. 32, a goodwill or a thread-like member 203 is put out of the guide surface of the guide member 202 into the conveying path of the photosensitive material, and when the photosensitive material passes, the member 203 shakes to agitate the processing liquid. FIG. 33 shows a processing liquid spouted from the supply port 204, which is stirred by rotating the stirring blade 200.

次に、この実施例のガイド部材のスリットの開孔率及
び処理液の吹き出し線速と処理のムラとの関係について
検討する。
Next, the relationship between the opening ratio of the slit of the guide member of this embodiment, the linear velocity of the processing solution, and the unevenness of the processing will be discussed.

まず、第34図に示すような開口部300を有するガイド
部材301で、開孔率と処理ムラとの関係を試験によって
求めた。この結果を、表1に示す。
First, with a guide member 301 having an opening 300 as shown in FIG. 34, the relationship between the opening ratio and the processing unevenness was determined by a test. Table 1 shows the results.

従って、ガイド部材の開孔率は20%以上に設定され
る。
Therefore, the aperture ratio of the guide member is set to 20% or more.

次に、前記ガイド部材301を用いて感光材料への吹出
し線速と現像ムラについて試験を行なった。開孔率50%
での結果を、表2に示す。
Next, using the guide member 301, a test was performed on the linear velocity of blowing to the photosensitive material and development unevenness. 50% porosity
Table 2 shows the results.

従って、ガイド部材301を用いた感光材料への処理液
の吹付け線速は、1.5cm/sec以上に設定される。
Therefore, the linear velocity at which the processing liquid is sprayed onto the photosensitive material using the guide member 301 is set to 1.5 cm / sec or more.

さらに、第35図に熱負荷量(=ヒータ出力/循環液
量)に対する制御温度幅の関係を試験し図示した。
Further, FIG. 35 shows the relationship between the control temperature width and the heat load (= heater output / circulating fluid amount) in a test.

第36図は他の感光材料処理装置を示す断面図である。
図中符号500は外光を遮閉する装置本体を示しており、
この実施例は感光材料の搬入機構及び搬出機構を弁構造
体で構成したものである。装置本体500の一側には感光
材料搬入部502が、他側に感光材料の搬出部503が設けら
れている。感光材料搬入部502と感光材料搬出部503との
間に、感光材料搬入部側502から現像槽504、水槽505、
空気槽(中間室)506、507、水槽508、定着槽509、水槽
510、水洗槽511が設けられている。これらの処理槽には
それぞれ現像液、定着液、水洗液が貯溜され、この各処
理槽の上部にはそれぞれ補充容器512が接続されてい
る。
FIG. 36 is a sectional view showing another photosensitive material processing apparatus.
Reference numeral 500 in the figure indicates an apparatus main body that blocks external light,
In this embodiment, the carrying-in mechanism and the carrying-out mechanism of the photosensitive material are constituted by a valve structure. A photosensitive material carry-in section 502 is provided on one side of the apparatus main body 500, and a photosensitive material carry-out section 503 is provided on the other side. Between the photosensitive material carry-in section 502 and the photosensitive material carry-out section 503, a developing tank 504, a water tank 505,
Air tank (intermediate room) 506, 507, water tank 508, fixing tank 509, water tank
510 and a washing tank 511 are provided. A developing solution, a fixing solution, and a washing solution are stored in these processing tanks, respectively, and a replenishing container 512 is connected to an upper portion of each processing tank.

現像槽504と補充容器512との接続は第37図に示すよう
に、現像槽504の上部の取付部504aには先端が尖った配
管513が設けられ、現像槽504と補充容器512とを連通し
ている。また、補充容器512には大気と連通する空気配
管514が備えられ、補充容器512の底部はシール部材515
を介して現像槽504の取付部に装着され、これにより処
理液の液面は現像槽504の外部で補充容器512内に設けら
れ、処理液が実質的に外気の遮断密閉されている。空気
配管514にはバルブ516が設けられ、このバルブ516で現
像槽504は密閉状態に保持されており、現像液を補充す
る際にバルブ516を操作して、空気を補充容器512内に導
入すると、現像液が現像槽504に供給され、補充容器512
の液面が低下する。
As shown in FIG. 37, the connection between the developing tank 504 and the replenishing container 512 is provided with a sharp-pointed pipe 513 at the mounting portion 504a on the upper part of the developing tank 504, and communicates the developing tank 504 with the replenishing container 512. doing. Further, the refill container 512 is provided with an air pipe 514 communicating with the atmosphere, and the bottom of the refill container 512 has a sealing member 515.
Thus, the processing liquid level is provided inside the replenishing container 512 outside the developing tank 504, and the processing liquid is substantially sealed off from the outside air. A valve 516 is provided in the air pipe 514, and the developing tank 504 is held in a sealed state by this valve 516. When the valve 516 is operated when replenishing the developer, air is introduced into the replenishing container 512. The developer is supplied to the developing tank 504, and the replenishing container 512 is supplied.
Of liquid drops.

定着槽509及び水洗槽511の上部にも同様の補充容器51
2が設けられており、これらは現像槽504の補充容器512
と同様に構成されている。現像槽504の現像液と空気と
を区画する壁部517と、現像液と水とを区画する壁部518
には弁シール519が備えられ、密閉状態に保持される現
像槽504に感光材料の入出を可能としている。現像槽504
は実質的に外気と遮断密閉され、さらに弁シール519の
隙間を小さくすることで、弁シール519から感光材料が
搬入されるとき液もれを軽減している。
A similar replenishing container 51 is also provided above the fixing tank 509 and the washing tank 511.
2 are provided, and these are replenishing containers 512 of the developing tank 504.
It is configured similarly to. A wall 517 for partitioning the developer and the air in the developing tank 504, and a wall 518 for partitioning the developer and the water
Is provided with a valve seal 519 to allow the photosensitive material to enter and exit the developing tank 504 which is kept in a sealed state. Developer tank 504
Is substantially sealed off from the outside air, and the gap between the valve seals 519 is reduced to reduce liquid leakage when the photosensitive material is carried in from the valve seals 519.

感光材料搬入部502側の弁シール519から感光材料が搬
入されて、反体側の弁シール519から搬出され、感光材
料を現像液中に直接搬入して搬出することができ、現像
槽504内での現像液の酸化による劣化が防止される。現
像槽504と感光材料搬入部502間には戻し配管520が備え
られ、ポンプ521を駆動して感光材料を弁シール519から
挿入する際に、僅かに漏れる液を現像槽504に戻すよう
になっている。弁シール519の材質は挿通時に感光材料
の表面を傷付けない程度に柔軟性があり、かつ現像液に
侵食されないものが用いられ、例えばポリエステルシー
ト、塩化ビニル樹脂シートやナイロンシート等の有機高
分子材料が好ましい。さらに、弁シール519のシートは
若干の撥水性のある材質が、感光材料の表面を傷付ける
ことがなく円滑に通過できる。
The photosensitive material is carried in from the valve seal 519 on the photosensitive material carry-in section 502 side, is carried out from the valve seal 519 on the opposite side, and the photosensitive material can be directly carried in and carried out in the developing solution. Of the developing solution due to oxidation is prevented. A return pipe 520 is provided between the developing tank 504 and the photosensitive material loading section 502. When the pump 521 is driven to insert the photosensitive material from the valve seal 519, a slightly leaking liquid is returned to the developing tank 504. ing. The material of the valve seal 519 is flexible enough not to damage the surface of the photosensitive material at the time of insertion, and is not eroded by a developer. For example, an organic polymer material such as a polyester sheet, a vinyl chloride resin sheet or a nylon sheet is used. Is preferred. Further, the sheet of the valve seal 519 allows a slightly water-repellent material to pass smoothly without damaging the surface of the photosensitive material.

弁シール519は第38図及び第39図に示すように形成さ
れ、第38図に示すものは感光材料Pの搬送方向に向かっ
て屈曲しており、現像槽504内の現像液で挿通部519aを
閉じる方向へ圧力がかかり、挿通部519aから液漏れが防
止される構造になっている。
The valve seal 519 is formed as shown in FIG. 38 and FIG. 39. The one shown in FIG. 38 is bent in the transport direction of the photosensitive material P, A pressure is applied in the direction to close the opening, and liquid leakage from the insertion portion 519a is prevented.

弁シール519は、第40図(a).(b)に示すよう
に、方形のシート部材にH型の切込み519bを入れ、この
連結する切込みに三角溝519cを形成する。この三角溝51
9cを第40図(c)に示すように三角溝と直交する方向へ
突出させて、第40図(d)に示すような挿通部519aを形
成する。現像槽504の搬出側に備えられた水槽505は、そ
の水位が処理液と同じ水位になっており、弁シール519
にかかる現像液の液圧と水圧とをバランスさせて、現像
液が漏れたり、水と混合することがないようにしてい
る。この弁シール519は水槽505と空気槽506とを区画す
る壁部522、空気槽506,507同士を区画する壁部523、空
気507と水槽508との区画する壁部524、水槽508と定着槽
509とを区画する壁部525、定着槽509と水槽510とを区画
する壁部526、水槽510と水洗槽511とと区画する壁部52
7、さらに水洗槽511と感光材料搬出部503とを区画する
壁部528に設けられ、このそれぞれの弁シート519を感光
材料が通過して搬送される。定着槽509の搬入側と、定
着槽509と水洗槽511との間には水槽508,510が設けら
れ、この水槽508,510の水位は定着液及び水洗液と略同
じ水位になっており、それぞれ弁シール519にかかる液
圧をバランスさせて、定着液及び水洗液と水が混合する
ことがないようにしている。水槽505と次段の空気槽506
との間、空気槽507と水槽508との間に、水洗槽511と感
光材料搬出部503とのの間にはそれぞれ戻し配管529〜53
1が備えられ、それぞれポンプ532〜534の作動で漏れた
液を元の処理槽に戻すようになっている。さらに、現像
槽504、定着槽509及び水洗槽511には、それぞれ処理液
を循環させる配管535〜537が設けられ、ポンプ521,538,
534で循環する。また、現像槽504、定着槽509及び水洗
槽511内には搬送ガイド539と搬送ローラ540が備えら
れ、このそれぞれの搬送ローラ540は各壁部を弁シール5
41を介して挿通された駆動軸542からベベルギヤ等の動
力伝達機構を介して駆動力を与えて回転するようになっ
ており、この駆動軸542はモータ543によって回転する。
駆動軸542が挿通する弁シール541は、駆動軸541を回転
可能に支持すると共に、駆動軸541と壁部との間をシー
ルして、液漏れ防止している。搬送ガイド部材539は第4
1図及び第42図に示すように、搬送方向の複数の板部材5
39aを所定の間隔をおいて、連結部材539bが形成されて
おり、この板部材539aによって、感光材料との接触面積
を少なくして円滑に搬送でき、しかも板部材539a間の隙
間から処理液が循環できるようにしている。さらに、現
像槽504、定着槽509及び水洗槽511にはそれぞれドレン
配管544が接続され、バルブ545の操作で排出される。な
お、この実施例にも前記実施例と同様に処理液の温度を
調節する手段及び処理槽を撹拌する手段を設けることが
できる。
The valve seal 519 is shown in FIG. As shown in (b), an H-shaped cut 519b is made in a square sheet member, and a triangular groove 519c is formed in the cut to be connected. This triangular groove 51
40c is projected in a direction orthogonal to the triangular groove as shown in FIG. 40 (c) to form an insertion portion 519a as shown in FIG. 40 (d). The water level of the water tank 505 provided on the carry-out side of the developing tank 504 is the same as that of the processing liquid.
The liquid pressure and the water pressure of the developer are balanced so that the developer does not leak or mix with water. The valve seal 519 includes a wall 522 that partitions the water tank 505 and the air tank 506, a wall 523 that partitions the air tanks 506 and 507, a wall 524 that separates the air 507 and the water tank 508, a water tank 508 and a fixing tank.
509, a wall 526 that partitions the fixing tank 509 and the water tank 510, and a wall 52 that partitions the water tank 510 and the washing tank 511.
7. Further, the photosensitive material is provided on a wall portion 528 for partitioning the washing tank 511 and the photosensitive material discharge portion 503, and the photosensitive material passes through the respective valve sheets 519 and is conveyed. Water tanks 508 and 510 are provided between the carry-in side of the fixing tank 509 and the fixing tank 509 and the washing tank 511, and the water levels of the water tanks 508 and 510 are substantially the same as the fixing liquid and the washing liquid. The fixing pressure, the rinsing liquid and the water are not mixed. Water tank 505 and next air tank 506
And return pipes 529 to 53 between the air tank 507 and the water tank 508 and between the washing tank 511 and the photosensitive material discharge section 503, respectively.
1 is provided, and the liquid leaked by the operation of the pumps 532 to 534 is returned to the original processing tank. Further, the developing tank 504, the fixing tank 509, and the washing tank 511 are provided with pipes 535 to 537 for circulating the processing solution, respectively, and pumps 521, 538,
Cycles at 534. A transport guide 539 and a transport roller 540 are provided in the developing tank 504, the fixing tank 509, and the rinsing tank 511.
The drive shaft 542 inserted through the drive shaft 542 is rotated by applying a driving force through a power transmission mechanism such as a bevel gear, and the drive shaft 542 is rotated by a motor 543.
The valve seal 541 through which the drive shaft 542 is inserted rotatably supports the drive shaft 541 and seals between the drive shaft 541 and the wall to prevent liquid leakage. The transport guide member 539 is the fourth
As shown in FIG. 1 and FIG. 42, a plurality of plate members 5
A connecting member 539b is formed at a predetermined interval from the plate member 539a, and by this plate member 539a, the contact area with the photosensitive material can be reduced and can be smoothly transported. It allows for circulation. Further, a drain pipe 544 is connected to each of the developing tank 504, the fixing tank 509, and the washing tank 511, and is discharged by operating a valve 545. In this embodiment, a means for adjusting the temperature of the processing solution and a means for stirring the processing tank can be provided in the same manner as in the above embodiment.

また、前記各実施例では処理槽を実質的に密閉してお
り、感光材料の処理で処理液が減少すると処理槽の上方
に配置した補充容器を大気と連通させることで処理液を
補充して処理槽内に空気が入ることを規制しているが、
補充容器は下方に配置してポンプ等で強制的に補充する
ことができる。
Further, in each of the above embodiments, the processing tank is substantially sealed, and when the processing liquid is reduced in the processing of the photosensitive material, the processing liquid is replenished by communicating a replenishing container disposed above the processing tank with the atmosphere. It regulates air from entering the processing tank,
The replenishing container can be disposed below and forcibly replenished with a pump or the like.

[発明の効果] 前記したように、請求項1記載の発明では、遮断密閉
状態の処理槽と処理槽の間に中間室を備え、この中間室
に不活性ガス又は水が導入されるから、処理槽が実質的
に外気と遮断密閉され、処理槽内で処理液が空気と接す
ることがなくなり、通常の処理装置で生じていたような
処理液の酸化劣化及び蒸発を防止することができ、処理
槽内の汚れも生じない。
[Effects of the Invention] As described above, according to the first aspect of the present invention, an intermediate chamber is provided between the processing tanks in a closed and sealed state, and an inert gas or water is introduced into the intermediate chamber. The processing tank is substantially closed and sealed from the outside air, so that the processing liquid does not come into contact with air in the processing tank, thereby preventing oxidative deterioration and evaporation of the processing liquid as occurred in a normal processing apparatus, No contamination in the processing tank occurs.

請求項2記載の発明では、遮断密閉状態の処理槽の間
に中間室を備え、この中間室に感光材料を搬送する搬送
機構を備えるから、搬送機構で、液漏れなく中間室内の
感光材料を搬送することができる。
According to the second aspect of the present invention, since the intermediate chamber is provided between the processing tanks in the closed and sealed state, and the transport mechanism for transporting the photosensitive material is provided in the intermediate chamber, the photosensitive material in the intermediate chamber can be transported by the transport mechanism without liquid leakage. Can be transported.

請求項3記載の発明では、遮断密閉状態の処理槽に設
けられた感光材料搬入と感光材料排出機構を通して、感
光材料が搬送挿入され、かつ排出され、さらに処理槽及
び/または中間室の側壁に設けられた弁機構の外部が、
連続的或いは間欠的に水で洗浄されるから、密閉された
処理槽の処理液中に処理槽側壁から直接的に感光材料を
搬入搬出することができ、かつ処理槽が外気に対して密
閉されているので、感光材料搬入機構及び感光材料排出
機構のシール性が良く、感光材料の処理槽への搬入、処
理槽からの搬出時の液漏洩を軽減することができ、さら
に洗浄されて処理液が空気酸化して固着することを防止
することができ、汚れが生じない。
According to the third aspect of the present invention, the photosensitive material is conveyed and inserted and discharged through the photosensitive material carrying-in and photosensitive material discharging mechanism provided in the processing tank in a closed and sealed state, and is further provided on the side wall of the processing tank and / or the intermediate chamber. The outside of the provided valve mechanism
Since the washing is performed continuously or intermittently with water, the photosensitive material can be directly carried into and out of the processing solution in the sealed processing tank from the side wall of the processing tank, and the processing tank is sealed from the outside air. As a result, the photosensitive material loading mechanism and photosensitive material discharging mechanism have good sealing properties, can reduce the leakage of liquid when the photosensitive material is carried into and out of the processing tank, and can be further washed and cleaned. Can be prevented from being oxidized and fixed by air, and no contamination occurs.

請求項4記載の発明では、遮断密閉状態の処理槽に少
なくとも1個の感光材料搬送機構と、少なくとも1個の
感光材料排出機構を有し、かつ処理槽内の処理液が実質
的に外気と遮断密閉された構造を有し、感光材料搬送機
構及び感光材料排出機構の少なくとも1個が弁構造体で
あって、さらに処理槽及び/または中間室の側壁に設け
られた弁機構の外部が、連続的或いは間欠的に水で洗浄
されるから、密閉された処理槽の処理液中に処理槽側壁
から直接的に感光材料を搬入搬出することができ、かつ
処理槽が外気に対して密閉されているので、感光材料搬
入機構及び感光材料排出機構のシール性が良く、感光材
料の処理槽への搬入、処理槽からの搬出時の液漏洩を軽
減することができ、さらに洗浄されて処理液が空気酸化
して固着することを防止することができ、汚れが生じな
い。
According to the fourth aspect of the present invention, at least one photosensitive material transport mechanism and at least one photosensitive material discharging mechanism are provided in the processing tank in a closed and sealed state, and the processing liquid in the processing tank is substantially free from outside air. It has a closed and sealed structure, at least one of the photosensitive material transport mechanism and the photosensitive material discharge mechanism is a valve structure, and further, the outside of the valve mechanism provided on the side wall of the processing tank and / or the intermediate chamber is: Since the washing is performed continuously or intermittently with water, the photosensitive material can be directly carried into and out of the processing solution in the sealed processing tank from the side wall of the processing tank, and the processing tank is sealed from the outside air. As a result, the photosensitive material loading mechanism and photosensitive material discharging mechanism have good sealing properties, can reduce the leakage of liquid when the photosensitive material is carried into and out of the processing tank, and can be further washed and cleaned. That air oxidizes and sticks It can be stopped, no dirt.

請求項5記載の発明では、遮断密閉状態の処理槽に少
なくとも1個の感光材料搬送機構と、少なくとも1個の
感光材料排出機構を有し、かつ処理槽内の処理液が実質
的に外気と遮断密閉された構造を有し、感光材料搬送機
構及び感光材料排出機構の少なくとも1個がローラ構造
体であって、さらに処理槽及び/または中間室の側壁に
設けられた弁機構の外部が、連続的或いは間欠的に水で
洗浄されるから、処理槽の密閉状態の保持が簡単にな
り、さらに弁構造体に液の液圧と同じ水圧の水槽を備え
ることができ、これにより弁構造体を感光材料が通過す
る際の液漏れを防止し、また処理槽内に設けた搬送機構
で、液漏れなく処理槽内の感光材料を搬送することがで
き、さらに洗浄されて処理液が空気酸化して固着するこ
とを防止することができ、汚れが生じない。
According to the fifth aspect of the present invention, the processing tank in the closed and sealed state has at least one photosensitive material transport mechanism and at least one photosensitive material discharging mechanism, and the processing liquid in the processing tank is substantially free from outside air. It has a closed and sealed structure, at least one of the photosensitive material transport mechanism and the photosensitive material discharge mechanism is a roller structure, and further, the outside of a valve mechanism provided on a side wall of the processing tank and / or the intermediate chamber is Since the treatment tank is continuously or intermittently washed with water, it is easy to keep the treatment tank closed, and the valve structure can be provided with a water tank having the same water pressure as the liquid pressure of the liquid. The photosensitive material in the processing tank can be transported without liquid leakage by the transport mechanism provided in the processing tank, preventing the liquid from leaking when the photosensitive material passes through. To prevent sticking , No dirt.

請求項6記載の発明では、遮断密閉状態の処理槽と処
理槽の間に中間室を備え、この中間室に、水、流動パラ
フィン、イナートガスを充填するから、処理槽が実質的
に外気と遮断密閉され、処理槽内で処理液が空気と接す
ることがなくなり、通常の処理装置で生じていたような
処理液の酸化劣化及び蒸発を防止することができ、処理
槽内の汚れも生じない。
According to the sixth aspect of the present invention, an intermediate chamber is provided between the processing tanks in a closed and sealed state, and the intermediate chamber is filled with water, liquid paraffin, and inert gas. It is hermetically sealed, so that the processing liquid does not come into contact with air in the processing tank, thereby preventing oxidation deterioration and evaporation of the processing liquid as occurred in a normal processing apparatus, and does not cause contamination in the processing tank.

請求項7記載の発明では、遮断密閉状態の処理槽に設
けられた感光材料搬入と感光材料排出機構を通して、感
光材料が搬送挿入され、かつ排出され、さらに処理槽内
部に感光材料を搬送するガス部材を設け、さらにガイド
部材には処理液が吹き出る開孔を設け、感光材料への吹
き付け線速度1.0cm/sec以上であるから、スムーズに感
光材料の搬送を行なうと同時に、処理液を感光材料に吹
き付けることによって感光材料処理をムラなく処理する
ことができる。
According to the seventh aspect of the present invention, the photosensitive material is conveyed and inserted and discharged through the photosensitive material carrying-in and photosensitive material discharging mechanism provided in the processing tank in a closed and sealed state, and further the gas for transporting the photosensitive material into the processing tank. The guide member is provided with an opening through which the processing liquid is blown out, and the linear velocity of spraying the photosensitive material is 1.0 cm / sec or more. The photosensitive material processing can be performed without unevenness by spraying.

請求項8記載の発明では、遮断密閉状態の処理槽に設
けられた感光材料搬入と感光材料排出機構を通して、感
光材料が搬送挿入され、かつ排出され、さらに処理槽内
部に感光材料を搬送するガス部材を設け、さらにガイド
部材には処理液が吹き出る開孔を設け、このガイド部材
の開孔率が15%以上であるから、スムーズに感光材料の
搬送を行なうと同時に、処理液を感光材料に吹き付ける
ことによって感光材料処理をムラなく処理することがで
きる。
According to the eighth aspect of the present invention, the photosensitive material is conveyed, inserted and discharged through the photosensitive material carrying-in and photosensitive material discharging mechanism provided in the processing tank in a closed and sealed state, and further the gas for transporting the photosensitive material into the processing tank. The guide member is provided with an opening through which the processing liquid is blown out. The opening ratio of the guide member is 15% or more, so that the photosensitive material can be smoothly transported and the processing liquid is applied to the photosensitive material at the same time. By spraying, the photosensitive material can be processed evenly.

【図面の簡単な説明】[Brief description of the drawings]

第1図はこの発明を適用した感光材料処理装置を示す概
略図、第2図は現像処理部の概略図、第3図は現像槽の
正面図、第4図は第3図のIV−IV断面図、第5図は第4
図の右側面図、第6図はシール部材の平面図、第7図は
第6図のVII−VII断面図、第8図乃至第11図はローラシ
ールの他の実施例の正面図、第12図及び第13図はローラ
の断面図、第14図はローラシール部の拡大断面図、第15
図は第14図の右側面図、第16図はローラシール部の他の
実施例の拡大断面図、第17図はガイドの平面図、第18図
はガイドの正面図、第19図は第17図のXIX−XIX断面図、
第20図及び第21図はガイドの他の実施例の平面図、第22
図及び第23図は現像槽の循環系の供給部と排出部を示す
もので、第22図はその側面図、第23図はその底面図、第
24図は処理槽の他の実施例の断面図、第25図(a)乃至
(e)は基本的なローラ構造体の構成を示す図、第26図
(a)乃至(h)は処理槽への弁機構の取付及び感光材
料の搬送を示す図、第27図(a)乃至(p)は処理槽の
配置と感光材料の搬送を示す図、第28図乃至第30図は処
理液の温度調節の他の実施例をす図、第31図乃至33図は
処理槽の撹拌を示す図、第34図は試験に用いたガイドの
平面図、第35図は熱負荷に対する制御温度幅の関係を示
す図、第36図は感光材料処理装置の他の実施例を示す断
面図、第37図は処理槽の補充容器の取付状態を示す図、
第38図及び第39図は弁機構を示す断面図、第40図(a)
乃至(d)は弁機構の製作を示す図、第41図はガイドの
平面図、第42図は第41図の右側面図である。 図中符号1,500は装置本体、4,6,8,10は洗浄部、5,504は
現像槽、6,509は定着槽、8,511は水洗槽、19,20はロー
ラ、23,539はガイド部材、24は循環系、519,541は弁シ
ール、540は搬送ローラである。
FIG. 1 is a schematic view showing a photosensitive material processing apparatus to which the present invention is applied, FIG. 2 is a schematic view of a development processing section, FIG. 3 is a front view of a developing tank, and FIG. 4 is IV-IV in FIG. Sectional view, FIG.
FIG. 6 is a plan view of the seal member, FIG. 7 is a sectional view taken along line VII-VII of FIG. 6, FIGS. 8 to 11 are front views of another embodiment of the roller seal, 12 and 13 are sectional views of the roller, FIG. 14 is an enlarged sectional view of the roller seal portion, and FIG.
14 is a right side view of FIG. 14, FIG. 16 is an enlarged sectional view of another embodiment of the roller seal portion, FIG. 17 is a plan view of the guide, FIG. 18 is a front view of the guide, and FIG. XIX-XIX sectional view of FIG. 17,
20 and 21 are plan views of another embodiment of the guide, FIG.
FIG. 23 and FIG. 23 show a supply part and a discharge part of the circulation system of the developing tank. FIG. 22 is a side view thereof, FIG.
FIG. 24 is a cross-sectional view of another embodiment of the processing tank, FIGS. 25 (a) to (e) are views showing the configuration of a basic roller structure, and FIGS. 26 (a) to (h) are processing tanks. FIGS. 27 (a) to 27 (p) show the arrangement of the processing tank and the transfer of the photosensitive material, and FIGS. 28 to 30 show the processing solution transfer. FIGS. 31 to 33 show the agitation of the processing tank, FIG. 34 shows a plan view of the guide used for the test, and FIG. 35 shows the control temperature range with respect to the heat load. FIG. 36 is a sectional view showing another embodiment of the photosensitive material processing apparatus, and FIG. 37 is a view showing an attached state of a replenishing container of a processing tank.
38 and 39 are sectional views showing the valve mechanism, and FIG. 40 (a)
41 to (d) show the production of the valve mechanism, FIG. 41 is a plan view of the guide, and FIG. 42 is a right side view of FIG. In the figure, reference numeral 1,500 denotes an apparatus main body, 4, 6, 8, 10 denotes a cleaning unit, 5,504 denotes a developing tank, 6,509 denotes a fixing tank, 8,511 denotes a washing tank, 19, 20 denotes a roller, 23, 539 denotes a guide member, and 24 denotes a circulation system. 519 and 541 are valve seals, and 540 is a transport roller.

フロントページの続き (72)発明者 河村 朋紀 東京都日野市さくら町1番地 コニカ株 式会社内 (56)参考文献 特開 平1−319038(JP,A) 特開 昭57−4045(JP,A) 特開 昭62−9351(JP,A) 特開 昭63−64047(JP,A) 特開 昭62−273535(JP,A) (58)調査した分野(Int.Cl.6,DB名) G03D 3/00 - 17/00Continuation of front page (72) Inventor Tomoki Kawamura 1 Konica Sakuracho, Hino-shi, Tokyo Inside Konica Corporation (56) References JP-A 1-319038 (JP, A) JP-A 57-4045 (JP, A) JP-A-62-9351 (JP, A) JP-A-63-64047 (JP, A) JP-A-62-273535 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) ) G03D 3/00-17/00

Claims (8)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料処理装
置において、前記処理槽と処理槽の間に中間室を備え、
この中間室に不活性ガス又は水が導入されることを特徴
とする感光材料処理装置。
1. A photosensitive material processing apparatus comprising: at least one processing tank in which a processing solution in the tank is substantially sealed off from outside air, and wherein the photosensitive material is carried into the processing tank in a closed and sealed state for processing. Including an intermediate chamber between the processing tank and the processing tank,
A photosensitive material processing apparatus wherein an inert gas or water is introduced into the intermediate chamber.
【請求項2】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料装置に
おいて、前記処理槽と処理槽の間に中間室を備え、この
中間室に前記感光材料を搬送する搬送機構を備えること
を特徴とする感光材料処理装置。
2. A photosensitive material apparatus which has at least one processing tank in which a processing solution in the tank is substantially sealed off from the outside air and carries the photosensitive material into the processing tank in a closed and sealed state. A photosensitive material processing apparatus comprising: an intermediate chamber between the processing tanks; and a transport mechanism for transporting the photosensitive material to the intermediate chamber.
【請求項3】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料装置に
おいて、前記処理槽に設けられた感光材料搬入と感光材
料排出機構を通して、感光材料が搬送挿入され、かつ排
出され、さらに処理槽及び/または中間室の側壁に設け
られた弁機構の外部が、連続的或いは間欠的に水で洗浄
されることを特徴とする感光材料処理装置。
3. A photosensitive material apparatus having at least one processing tank in which a processing solution in the tank is substantially sealed off from the outside air and carrying the photosensitive material into the processing tank in a closed and sealed state. The photosensitive material is conveyed, inserted and discharged through the photosensitive material loading and discharging mechanism provided in the processing tank, and the outside of a valve mechanism provided on the side wall of the processing tank and / or the intermediate chamber is continuously connected. Alternatively, the photosensitive material processing apparatus is washed intermittently with water.
【請求項4】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料装置に
おいて、前記処理槽に少なくとも1個の感光材料搬送機
構と、少なくとも1個の感光材料排出機構を有し、かつ
処理槽内の処理液が実質的に外気と遮断密閉された構造
を有し、前記感光材料搬送機構及び感光材料排出機構の
少なくとも1個が弁構造であって、さらに処理槽及び/
または中間室の側壁に設けられた弁機構の外部が、連続
的或いは間欠的に水で洗浄されることを特徴とする感光
材料処理装置。
4. A photosensitive material apparatus which has at least one processing tank in which a processing solution in the tank is substantially sealed off from the outside air and carries the photosensitive material into the processing tank in a closed and sealed state. The processing tank has at least one photosensitive material conveying mechanism and at least one photosensitive material discharging mechanism, and has a structure in which a processing solution in the processing tank is substantially sealed off from outside air; At least one of the material conveying mechanism and the photosensitive material discharging mechanism has a valve structure, and further includes a processing tank and / or a photosensitive tank.
Alternatively, the photosensitive material processing apparatus is characterized in that the outside of a valve mechanism provided on a side wall of the intermediate chamber is continuously or intermittently washed with water.
【請求項5】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料装置に
おいて、前記処理槽に少なくとも1個の感光材料搬送機
構と、少なくとも1個の感光材料排出機構を有し、かつ
処理槽内の処理液が実質的に外気と遮断密閉された構造
を有し、前記感光材料搬送機構及び感光材料排出機構の
少なくとも1個がローラ構造体であって、さらに処理槽
及び/または中間室の側壁に設けられた弁機構の外部
が、連続的或いは間欠的に水で洗浄されることを特徴と
する感光材料処理装置。
5. A photosensitive material apparatus which has at least one processing tank in which a processing solution in the tank is substantially sealed off from the outside air and carries the photosensitive material into the processing tank in a closed and sealed state for processing. The processing tank has at least one photosensitive material conveying mechanism and at least one photosensitive material discharging mechanism, and has a structure in which a processing solution in the processing tank is substantially sealed off from outside air; At least one of the material conveying mechanism and the photosensitive material discharging mechanism is a roller structure, and the outside of a valve mechanism provided on a side wall of the processing tank and / or the intermediate chamber is continuously or intermittently washed with water. A photosensitive material processing apparatus.
【請求項6】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料装置に
おいて、前記処理槽と処理槽の間に中間室を備え、この
中間室に、水、流動パラフィン、イナートガスを充填す
ることを特徴とする感光材料処理装置。
6. A photosensitive material apparatus which has at least one processing tank in which a processing liquid in the tank is substantially sealed off from the outside air and carries the photosensitive material into the processing tank in a closed and sealed state for processing. An apparatus for processing a photosensitive material, comprising an intermediate chamber between the processing tanks and filling the intermediate chamber with water, liquid paraffin, and inert gas.
【請求項7】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料装置に
おいて、前記処理槽に設けられた感光材料搬入と感光材
料排出機構を通して、感光材料が搬送挿入され、かつ排
出され、さらに処理槽内部に感光材料を搬送するガイド
部材を設け、さらに前記ガイド部材には処理液が吹き出
る開孔を設け、前記感光材料への吹き付け線速度が1.0c
m/sec以上であることを特徴とする感光材料処理装置。
7. A photosensitive material apparatus which has at least one processing tank in which a processing solution in the tank is substantially sealed off from the outside air, and carries the photosensitive material into the processing tank in a closed and sealed state for processing. A guide member for transporting, inserting and discharging the photosensitive material through a photosensitive material loading and discharging mechanism provided in the processing tank is provided, and a guide member for transporting the photosensitive material into the processing tank is further provided. An opening through which a liquid is blown out is provided, and the linear velocity of the sprayed light on the photosensitive material is 1.0 c.
m / sec or more.
【請求項8】槽内の処理液を実質的に外気と遮断密閉し
た少なくとも1つの処理槽を有し、この遮断密閉状態の
処理槽内に感光材料を搬入して処理する感光材料装置に
おいて、前記処理槽に設けられた感光材料搬入と感光材
料排出機構を通して、感光材料が搬送挿入され、かつ排
出され、さらに処理槽内部に感光材料を搬送するガイド
部材を設け、さらに前記ガイド部材には処理液が吹き出
る開孔を設け、このガイド部材の開孔率が15%以上であ
ることを特徴とする感光材料処理装置。
8. A photosensitive material apparatus which has at least one processing tank in which the processing solution in the tank is substantially sealed off from the outside air and carries the photosensitive material into the processing tank in a closed and sealed state. A guide member for transporting, inserting and discharging the photosensitive material through a photosensitive material loading and discharging mechanism provided in the processing tank is provided, and a guide member for transporting the photosensitive material into the processing tank is further provided. A photosensitive material processing apparatus, wherein an opening from which a liquid is blown out is provided, and an opening ratio of the guide member is 15% or more.
JP1156139A 1988-06-27 1989-06-19 Photosensitive material processing equipment Expired - Lifetime JP2807826B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1156139A JP2807826B2 (en) 1988-06-27 1989-06-19 Photosensitive material processing equipment

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP15875788 1988-06-27
JP63-158757 1988-06-27
JP1156139A JP2807826B2 (en) 1988-06-27 1989-06-19 Photosensitive material processing equipment

Publications (2)

Publication Number Publication Date
JPH02124570A JPH02124570A (en) 1990-05-11
JP2807826B2 true JP2807826B2 (en) 1998-10-08

Family

ID=26483965

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Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP2807826B2 (en)

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Publication number Priority date Publication date Assignee Title
US4994840A (en) * 1990-03-16 1991-02-19 Eastman Kodak Company Apparatus for processing photosensitive material
JP2648978B2 (en) * 1990-05-21 1997-09-03 富士写真フイルム株式会社 Photosensitive material processing equipment
JP2648986B2 (en) * 1991-01-16 1997-09-03 富士写真フイルム株式会社 Photosensitive material processing equipment
JP2722426B2 (en) * 1991-11-14 1998-03-04 富士写真フイルム株式会社 Photosensitive material processing equipment
JP2799440B2 (en) * 1991-12-13 1998-09-17 富士写真フイルム株式会社 Processing method of color photographic light-sensitive material
JP2563714B2 (en) * 1992-01-08 1996-12-18 株式会社阪神技術研究所 Development processor
US5400106A (en) * 1993-05-03 1995-03-21 Eastman Kodak Company Automatic tray processor
US5389994A (en) * 1993-05-03 1995-02-14 Eastman Kodak Company Closed solution recirculation/shutoff system for an automatic tray processor
US5418591A (en) * 1993-05-03 1995-05-23 Eastman Kodak Company Counter cross flow for an automatic tray processor
US5400107A (en) * 1993-05-03 1995-03-21 Eastman Kodak Company Automatic replenishment, calibration and metering system for an automatic tray processor
US5420659A (en) * 1993-05-03 1995-05-30 Eastman Kodak Company Modular processing channel for an automatic tray processor
US5381203A (en) * 1993-05-03 1995-01-10 Eastman Kodak Company Textured surface with canted channels for an automatic tray processor
US5398094A (en) * 1993-05-03 1995-03-14 Eastman Kodak Company Slot impingement for an automatic tray processor
US5386261A (en) * 1993-05-03 1995-01-31 Eastman Kodak Company Vertical and horizontal positioning and coupling of automatic tray processor cells

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JPH065372B2 (en) * 1985-07-08 1994-01-19 富士写真フイルム株式会社 Photo developing method and apparatus
JPS62273535A (en) * 1986-05-21 1987-11-27 Konika Corp Image forming device
JPS6364047A (en) * 1986-09-05 1988-03-22 Fuji Photo Film Co Ltd Photographic processing tank
DE3642893A1 (en) * 1986-12-16 1988-07-07 Hochtief Ag Hoch Tiefbauten JOINT SEALING RING

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