JP2648986B2 - Photosensitive material processing equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light-sensitive material processing apparatus for processing a silver halide light-sensitive material (hereinafter simply referred to as a light-sensitive material or a light-sensitive material).

[0002]

2. Description of the Related Art A black-and-white photosensitive material is processed by processes such as black-and-white development, fixing and washing after exposure, and a color photosensitive material is processed by a process such as color development, desilvering, washing and stabilization after exposure. You. Black-and-white developer for black-and-white development, fixer for fixation, color (color) developer for color development, bleaching solution, bleach-fixer, fixer for desilvering, tap water or ion-exchanged water for washing, A stabilizing solution is used for the stabilizing treatment.
The temperature of each processing solution is usually adjusted to 30 to 40 ° C., and the photosensitive material is immersed in these processing solutions for processing. Such processing is usually performed by a processing device such as an automatic developing machine.

In such a case, in recent years, environmental conservation and resource saving have been demanded, and it has been desired to reduce the amount of processing solution used in each processing solution. On the other hand, with the development of a small-scale processing system called a mini-lab, photosensitive materials have been processed at stores such as photo shops, and thus miniaturization of the apparatus is desired.

In view of the above situation, the present applicant has firstly a plurality of processing chambers connected by narrow passages, and the photosensitive material is sequentially passed through the processing chambers, and the processing liquid in each processing chamber is sequentially processed. (Japanese Patent Application Nos. 1-25132, 1-27034, and 1-90).
No. 422, No. 1-248950, No. 2-54641
No. 2-155667, Japanese Patent Application No. 2-223766, etc.). These devices have the effect of reducing the size of the apparatus and improving the processing efficiency, thereby reducing the amount of processing liquid used.

As described above, the processing efficiency is improved because the processing chambers are connected by narrow passages, so that the mixing of the processing liquids between the processing chambers is small, and the processing liquid is supplied in accordance with the processing liquid supply direction. This is because a gradient is formed in the liquid composition or concentration of the processing liquid in each processing chamber, and this is maintained. In addition, the present inventors ensured that the gradient of the liquid composition and concentration between the processing chambers, and to further improve the processing efficiency, a blade for blocking the liquid flow between the processing chambers in the passage. The proposed one is proposed (Japanese Patent Application No. 2-155667). As a material of the blade, an elastic material such as a soft resin is used.

On the other hand, there is a processing apparatus in which the plurality of processing chambers are formed by housing a rack in a processing tank. In this type, a seal member or the like is interposed between the constituent members of the rack that divides each processing chamber and the inner wall of the processing tank, and the rack accommodates to prevent the flow of the processing liquid between the processing chambers as much as possible. It is configured to be able to. Such a configuration, in combination with the mounting of the blade, improves the liquid tightness of the processing chambers, makes the liquid composition and the concentration gradient between the processing chambers more reliable, and further improves the processing efficiency. preferable.

By the way, taking a washing tank as an example, a fresh replenisher (washing water) is supplied to the washing tank in order to maintain the washing performance with the washing water. Then, the replenisher is supplied to the photosensitive material discharge section so as to flow in the direction opposite to the moving direction of the photosensitive material (counter flow). Here, when a blade having high liquid tightness as described above is provided, when the photosensitive material passes between the blades, the replenisher flows through a gap generated between the blades. Therefore, the replenisher can be circulated only when the photosensitive material passes through all the blades and there is a gap in each blade.

For this reason, for example, when a photosensitive material having a short length in the transport direction is processed, all the blades cannot pass through at the same time, so that there is a problem that the replenisher does not flow. Even if the photosensitive material has a length that can pass through, the time required to pass through all the blades at the same time is short, so that the circulation time of the replenisher is shortened, and the replenishment of each processing chamber is not sufficiently performed. There was a problem. Further, the gap generated when the photosensitive material passes through the blade cannot be adjusted, so that the flow rate of the liquid cannot be adjusted. Therefore, even if the amount of the replenisher is increased or decreased, the flow amount does not change, and there is a disadvantage that it is difficult to adjust the amount of the replenisher according to the width of the photosensitive material and the transport speed.

[0009]

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and to provide a photosensitive material processing apparatus capable of circulating a necessary replenisher at any time.

[0010]

This and other objects are achieved by the present invention which is defined below as (1) or (2).

(1) A processing space for filling a processing solution is formed by a narrow passage and a plurality of processing chambers connected in sequence by the narrow passage, and a silver halide photosensitive material is sequentially filled in the processing chamber. In a photosensitive material processing apparatus provided with a conveying means for passing and a blade for blocking the flow of the processing liquid in the passage, the processing liquid is provided between the processing chambers in addition to the passage provided with the blade. Providing a processing liquid flow passage for circulation,
A photosensitive material processing apparatus, wherein a control means for controlling the flow of the processing liquid is provided in the processing liquid flow passage.

(2) The photosensitive material processing apparatus according to claim 1, wherein the control means operates in conjunction with the replenishment of the processing solution.

[0013]

In the photosensitive material processing apparatus of the present invention, a plurality of processing chambers are formed in a processing tank, and the processing chambers are sequentially connected by narrow passages, so that a processing solution is supplied between the processing chambers. In accordance with the direction, the liquid composition gradient (concentration gradient) of the processing liquid is maintained, and the processing efficiency of the photosensitive material is improved. At this time, since the blades, preferably at least a pair of blades facing each other, are provided in the passage, the gradient of the composition of the processing solution in each processing chamber is dramatically and long-term maintained. That is, when the photosensitive material passes, the blade comes into contact with both surfaces of the photosensitive material, and an effect of wiping off the liquid adhering to the photosensitive material (hereinafter referred to as a squeeze effect) is generated. The amount of liquid brought in is reduced. During the passage of the photosensitive material, the liquid flows through a minute gap (about the thickness of the photosensitive material) between the blades generated at the photosensitive material side end. When the photosensitive material does not pass through, the opposing blades are in close contact with each other, so that there is almost no liquid flow in the passage.

If the length of the photosensitive material to be processed in the transport direction is so short that all the blades cannot pass simultaneously when passing through the processing chamber in the processing tank, there are blades through which the photosensitive material does not pass. The blade blocks the liquid flow.

In this case, the flow of the liquid in the processing liquid flow passage is ensured between the processing chambers by the control means. The control means regulates, for example, the timing of the flow of the liquid and the shutoff of the liquid, and operates, for example, in conjunction with the replenishment of the processing liquid, thereby ensuring the flow of the replenisher.

[0016]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a photosensitive material processing apparatus according to the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings. FIG.
FIG. 2 is a cross-sectional side view showing a configuration example when the photosensitive material processing apparatus of the present invention is applied to a water washing processing apparatus.
FIG. 3 is a sectional view taken along line III-III in FIG. As shown in these figures, the photosensitive material processing apparatus 1 of the present invention has a vertically long processing tank 2 having a predetermined volume. A rack 3 is detachably loaded into the processing tank 2. The rack 3 has side plates 31 and 32, and several block-shaped members (hereinafter, referred to as block bodies) 4 are installed between the side plates.

These blocks 4 are made of plastics such as polyethylene, polypropylene, polyphenylene oxide (PPO), ABS resin, phenolic resin, polyester resin, polyurethane resin, ceramics such as alumina, or various kinds of materials such as stainless steel, titanium, hastelloy and the like. It is made of a hard material such as metal. Especially,
It is preferable to be made of plastics such as polypropylene, PPO, ABS resin, etc. from the viewpoint of excellent moldability, light weight and sufficient strength.

Although the block 4 is a solid member in the illustrated example, it may be formed as a hollow member (for example, manufactured by blow molding).

With such a block body 4, five processing chambers 6A, which are spaces for washing the photosensitive material S with water,
6B, 6C, 6D and 6E are formed.

In each of these processing chambers 6A to 6E, washing water W
Is satisfied.

In the illustrated configuration, the volume per processing chamber may be about 100 to 2000 ml.

The processing chambers 6A and 6B which are vertically adjacent to each other,
Between 6B and 6C, 6C and 6D and 6D and 6E,
Narrow passages 71, 72, 73 and 74 connecting both processing chambers are formed.

In addition, at the upper part of the processing chambers 6A and 6E,
Similar passages 75 and 76 for carrying in and out the photosensitive material S are formed, respectively. These passages 7
The width (effective slit width) of 1 to 76 is preferably about 0.5 to 5 mm, which is about 5 to 40 times the thickness of the photosensitive material S.

With such a width, the photosensitive material S is conveyed without any trouble.

In the illustrated configuration, the length of the passage between the processing chambers is preferably 10 to 200 mm, and more preferably, about 20 to 60 mm.

As shown, a pair of blades 15 are provided in each of the passages 71-74.

The pair of blades 15 are supported by a supporting member 9 such that the tips thereof are in close contact with each other when the photosensitive material S does not pass through.
, And as shown in FIG.
Is detachably attached to the block body 4.

The support member 9 has a rectangular parallelepiped shape.
Inside thereof, a slit portion 9 penetrating in the longitudinal direction is provided.
0 is formed. As shown in FIG. 5, the blades 15 are attached to the opposing surfaces 90a and 90b of the slit portion 90, respectively.

The supporting member 9 includes mounting members 91a and 91b.
And side members 94a and 94b. The mounting members 91a and 91b to which the blades 15 are attached are arranged with the blades 15 facing each other.
The supporting members 9 are assembled by fixing the side members 94a and 94b to the end of the supporting member 9b. Then, the mounting member 91a,
The slit portion 90 is formed between the slits 91b, and the photosensitive material S passes through the slit portion 90.

On the side surface of the support member 9, a seal member 96 for ensuring the liquid flow is cut off when the block member 4 is fitted.
Are provided. The attachment members 91a and 91b and the side members 94a and 94b may be integrally formed with the blade 15 and the seal member 96 by, for example, double injection injection molding or insert molding, or may be formed separately and then combined. The material of the support member 9 is the block body 4.
May be the same as that of the material. Further, the material of the blade 15 and the seal member 96 may be any material that does not adversely affect the washing water, such as natural rubber, chloroprene rubber, nitrile rubber, butyl rubber, fluoro rubber, isoprene rubber, butadiene rubber, styrene butadiene rubber, Elastic materials such as various rubbers such as ethylene propylene rubber and silicone rubber, soft polyvinyl chloride, polyethylene, polypropylene, ionomer resin, fluorine resin, and soft resin such as silicone resin, and also include Lavalon, Thermolan, Elastoran, and Hytrel. And an elastomer such as sunplane.

The method of assembling the support member 9 is the same as described above.
Various configurations are possible. As described above, when the blade is attached to the slit portion 90 in the support member 9 and integrated,
The blade replacement becomes extremely easy, and there are advantages such that the alignment of the blade pair is not required. The contact surface of the support member 9 on the processing tank 2 side is an inclined surface along the side wall of the processing tank 2, and when the rack 3 is inserted into the processing tank 2, an external force is applied from the inner wall of the processing tank 2 in the fitting direction. It has become.

Accordingly, even if the support member 9 is not sufficiently fitted into the block body 4, the fitting and holding of the support member 9 is ensured together with the mounting of the rack 3.

The blade 15 in the slit portion 90
Is configured such that when the photosensitive material S passes through, the leading end portion is pushed open by entry of the photosensitive material S.

FIG. 5 is an enlarged view of the slit portion 90 of the support member 9.

As shown in FIG. 5, the blade 15 has a base attached to the support member 9 and a tip whose thickness gradually decreases toward the tip, and is used in combination of two blades. Further, the blade 15 may have substantially the same thickness from the base to the tip.

The average inclination angle of the blade 15 with respect to the surface of the photosensitive material S is generally preferably about 10 to 70 °, more preferably about 20 to 45 °.

The length from the base to the tip of the blade 15 may be equal to or greater than the effective slit width (w) of the passage, but is generally preferably 2 to 20 times as large as 10 to 50 mm. And particularly preferably 15 to 2 times 3 to 10 times.
It is good to be 5mm.

The length of the overlapping portion between the tips of the blades 15 when the photosensitive material does not pass through the pair of blades 15 installed opposite to each other is about 1 to 10 mm, especially 2 to 2 mm.
It is good to be about 5 mm.

The thickness of the tip of the blade 15 may be 1/100 or more of the length of the blade 15 or 0.5 mm or more, and particularly preferably 1 to 1.5 mm.

The contact surface pressure between the blades 15 is 0.00
About 1 to 0.1 kg / cm ² , especially 0.005 to 0.02 kg / c
preferably with m ² approximately.

Under the above conditions, the adhesion between the tips of the blades 15 when the photosensitive material S does not pass is ensured, and the flow of the washing water W can be effectively blocked. Further, the flow of the washing water W when passing the photosensitive material S is very small.

Normally, the adhesive force between the blades 15 is given by the elastic force of the blades. However, a magnetic material is mixed into the tip of the blade 15 (for example, a rubber magnet), and It is also possible to give or increase adhesion by attracting each other by magnetic force.

Even if the photosensitive material S slides on the blade 15, there is almost no adverse effect such as scratches on the emulsion surface, but if this cannot be ignored or if the sliding resistance is to be reduced, The inner surface of the blade 15 may be smoothed or a surface treatment such as coating a lubricant such as silicone or Teflon on the inner surface may be employed.

In the illustrated example, one pair of blades 15 is installed in each support member 9, but two or more pairs of blades 15 may be installed for one support member 9. In this case, the shielding effect and the squeeze effect by the blade 15 are further increased.

The blades 15 are not limited to a pair, and may be provided as a single blade 15. In this case, it is preferable to transport the photosensitive material S such that the emulsion layer of the photosensitive material comes into contact with the blade 15.

The photosensitive material processing apparatus according to the present invention comprises a blade 1
A passage shielding means having another configuration instead of 5 may be provided.

Here, the mounting structure of the rack 3 on the support member 9 will be described. As shown in FIGS. 1 and 4, an accommodating portion 41 into which the support member 9 is fitted is formed in the block body 4 arranged between the processing chambers 6A to 6E. The accommodation part 41 is formed toward the outside of the rack 3 as shown in the figure, and a passage 71 faces the upper and lower surfaces. When the support member 9 is fitted here, the slit portion 90 of the support member 9 is fixed at a position corresponding to the passage 71. At this time, the seal member 96 provided on the side surface of the support member 9 comes into contact with the inner wall of the storage section 41 and the side wall of the processing tank 2, and the washing water W between the processing chamber 6 </ b> A and the processing chamber 6 </ b> B is formed. Block the flow.

The support member 9 is positioned and fixed between the side wall of the processing tank 2 and the rack 3 by inserting the rack 3 into the processing tank 2 after being fitted into the storage section 41.

Therefore, the mounting structure of the support member 9 is such that the support member 9 (the blade 15) can be easily replaced simply by taking out the rack 3 from the processing tank 2.

In the above example, the support member 9 is fitted and locked in the block body 4 so that the passage 71 provided in the block body 4 and the slit portion 90 of the support member 9 communicate with each other. Although it has a structure, in addition to this,
When the support member 9 is attached to the support member 9, one or both surfaces in the longitudinal direction of the support member 9 may function as inner walls of the processing chambers 6A to 6E.

Further, since the support member 9 having the above-described blade 15 can be replaced with a new one after the blade 15 has deteriorated, the operation of the operator or the like becomes extremely easy. As described above, the blade 15 may be replaced and reused.

As shown in FIGS. 1 and 2, the processing chamber 6
A pair of transport rollers 8 are installed near the center of each of A, 6B, 6D, and 6E, and three pairs of transport rollers 8 are installed in the processing chamber 6C. Further, a pair of conveying rollers 8 are provided near the photosensitive material entrance of the passage 75 and near the photosensitive material exit of the passage 76, respectively.

Each of these transport rollers 8 has a rotating shaft 8
At 1, both of the roller pairs are driven and rotated by the side plates 31 and 32, and the photosensitive material S is conveyed while sandwiching the photosensitive material S between the rollers.

As shown in FIG. 2, the drive mechanism of the transport roller 8 includes a bevel gear 83 fixed to a predetermined position of a main shaft 82 extending in the vertical direction in FIG.
1 and a bevel gear 84 fixed to one end of the roller pair 1 rotates a main shaft 82 in a predetermined direction by operation of a drive source (not shown) such as a motor, so that one of the transport rollers 8 of the roller pair is rotated. It is designed to rotate. A gear 85 is fixed to the other end of the rotating shaft 81 of each transport roller 8, and the rotation of one roller 8 of the roller pair is transmitted to the other roller 8 by meshing of the gear 85. Has become.

The material of each transport roller 8 is preferably one having durability and chemical resistance to washing water W. For example, various rubbers such as neoprene, EPT rubber, sunplane, thermolan, Hytrel, etc. Elastomer, rigid vinyl chloride, polypropylene, polyethylene,
ABS resin, PPO, nylon, polyacetal (PO
M), phenolic resin, polyphenylene sulfide (PP
S), polyethersulfone (PES), polyetheretherketone (PEEK), various resins such as Teflon, ceramics such as alumina, metals having corrosion resistance such as stainless steel, titanium and Hastelloy, or a combination thereof. be able to.

A guide 10a for guiding the photosensitive material S is provided between the transport rollers 8 in the processing chambers 6A, 6B, 6D and 6E and the passages 71 to 74.

The guide 10a is composed of a pair of plate-like members, and is installed facing each other with an interval through which the photosensitive material S can pass.

Further, between the transport rollers 8 in the processing chamber 6C,
A reversing guide 10b which is curved in an arc shape and changes the direction of the photosensitive material S along the curved portion is provided.

The guides 10a and 10b are made of, for example, a molded plastic or metal plate. Further, it is preferable that openings (not shown) penetrating the guides are formed substantially uniformly in the guides 10a and 10b. Thereby, the circulation of the washing water W becomes possible, and the circulation of the liquid in the processing chamber is promoted, so that the washing efficiency is improved.

The guides 10a and 10b, the transport roller 8 and a drive system thereof constitute transport means for the photosensitive material S.

The guides 10a and 10b may be partially provided along the transport path or may not be provided as long as the transportability of the photosensitive material S is not hindered.

Above the processing chamber 6E, a liquid supply passage 11 having one end open and the other end communicating with the passage 76 is formed penetrating the block body 4. In addition, above the processing chamber 6A,
A drain passage 12 having one end open and the other end communicating with the passage 75 is formed through the block body 4.

On the other hand, the processing tank 2 is provided with a liquid supply pipe 13 and a drain pipe 14 which penetrate the side wall and open to the inner surface of the processing tank. Then, with the rack 3 loaded in the processing tank 2, the liquid supply path 11 and the liquid supply pipe 13, the liquid discharge path 12 and the liquid discharge pipe 1
4 are respectively connected.

The supply pipe 13 is for supplying (replenishing) the washing water W, and the drain pipe 14 is for supplying the overflow water O of the fatigued washing water W after treatment due to overflow or the like.
It is for discharging F.

The rack 3 is provided with a plate-like partition member 17 orthogonal to the side plates 31 and 32. As shown in FIG. 6, the partition member 17 partitions a first area 18 shown by oblique lines on the left side of the figure and a second area 19 shown by oblique crosses on the right side of the figure, and distributes the washing water W in both areas. It is for shutting off.

The first area 18 is an area including the processing chamber 6A through which the photosensitive material S passes first, and also includes the processing chamber 6B through which the photosensitive material S passes second in the illustrated example.

The second area 19 is an area including the processing chamber 6E through which the photosensitive material S passes last, and in the example shown in the figure, also includes the processing 6D passing second from the last.

As shown in FIG. 2, both ends 171 and 172 of the partition member 17 are tapered (the width gradually decreases downward in the figure), while the corresponding side walls of the processing tank 2 are formed. 21 and 22 are also tapered at the same angle. Thereby, when the rack 3 is inserted into the processing tank 2, the ends 171 and 172 of the partition member 17 are connected to the side walls 21 and 2 of the processing tank 2.
2 to define a first area 18 and a second area 19. At this time, the engagement portion comes into close contact with the weight of the rack 3 and substantially prevents the flow of the washing water W. In addition, a seal member made of an elastic material is provided at the end portions 171 and 172 serving as the engagement portions, and the blocking property of the washing water W is enhanced. The taper angles of the ends 171 and 172 of the partition member 17 and the side walls 21 and 22 of the processing tank 2 are not particularly limited, but are preferably 1 to 10 ° with respect to the vertical direction.
Degree.

As the constituent material of the partition member 17, the same material as that of the block body 4 can be used, and the partition member 17 and the block members 4 and the side plates 31, 32 are formed by joining different members. Or it may be integrally formed.

Further, outside the side plates 31 and 32 and at predetermined positions in the height direction of the rack 3, the side plates 31, 3
A partition wall 20 orthogonal to each of the second and partition members 17 is provided. The main shaft 82 penetrates the partition wall 20 and is supported. The installation position of the partition 20 is determined by the passage 71
It is preferable that the height is set at or near a certain height where the height is 74.

The partition wall 20 prevents the vertical flush water W from flowing between the side plate 31 and the side wall 21 and between the side plate 32 and the side wall 22. A seal member is provided at the end where the partition wall 20 comes into contact with the side walls 21, 22 and the like of the processing tank 2, as in the case of the partition member 17, so that the blocking property of the washing water W is enhanced. The method of forming the partition member 17 and the partition wall 20 may be the same as that of the support member 9, and may be integrally formed with the seal member.
Alternatively, after separately formed, the seal member may be embedded in the end face. Furthermore, also in the main shaft 82 penetration part of the partition wall 20,
A seal member is interposed between the partition wall 20 and the flow of the washing water W in the penetrating portion is blocked. Also, the side plate 3
A seal member 60 is provided at the end of each of the first and second seals 32, and the flow of the rinsing water W is interposed between the first and second inner walls of the processing tank 2.

Thus, it is possible to prevent the washing water W in each of the processing chambers 6A to 6E from being mixed through the outside of the side plates 31 and 32.

As described above, by providing the partition wall 20 and the partition member 17, each processing chamber 6A, 6B, 6D, 6E
Outside the side plates 31, 32, there are partition spaces 61A to 61A.
E, 62A to 62E are formed. The one partition space 6
1A to 61E, the main shaft 82 is inserted, and the other partition spaces 62A to 62E are separated from the passages 71 to 76 provided with the blades 15 separately from the processing liquid flow passage 201.
And a control means 63 for regulating the flow of the liquid in the flow passage 201 is provided. Hereinafter, these configurations will be described with reference to FIGS.

Each partition 20 has a flow passage 201 for allowing a liquid to flow between vertically adjacent partition spaces 62.
Are provided in a hole shape. The control means 63 for regulating the flow of the liquid in the flow passage 201 includes a regulating member 64 which is removably fitted to each of the flow passages 201 to regulate the flow of the liquid, and an operation for inserting and removing the restricting member 64. The operating section 68 operates the regulating member 64 via the interlocking means 67 that simultaneously activates each regulating member 64.
In the device of the present embodiment, the operating section 68 is a solenoid,
The interlocking means 67 is a flexible cord, for example, a wire. The regulating member 64 is a cylindrical body having a tapered peripheral surface 642, and a wire as the interlocking means 67 is inserted at the center thereof.
7 and a regulating member 64, a ring-shaped sealing material 64 is provided.
1 is inserted. The regulating member 64 is a sealing member 641
Can slide with respect to the interlocking means 67. On the other hand, stoppers 651 and 652 are fixed to the interlocking means 67 at positions sandwiching the attached regulating member 64. An urging member 66 is interposed between the large-diameter end surface of the regulating member 64 and the stopper 651 to urge the regulating member 64 toward the stopper 652. In the device of the present embodiment, the biasing member 66 is a coil spring.

On the other hand, the interlocking means 67 is
While being guided by the guide rollers 672 in the partition space 62C, it is inserted through each of the partition spaces 62A to 62E, one end is connected to the plunger of the operating portion 68, and the other end is the photosensitive material S carrying side. Is connected to a spring 671 attached to the rack 3. Then, when the plunger is retracted by energization of the solenoid as the operating portion 68, the interlocking means 67 is pulled against the urging force of the spring 671.

When the flow path 201 is closed by the regulating member 64, the interlocking means 67 pulled by the spring 671 urges the regulating member 64 in the closing direction via the stopper 651 and the urging member 66. doing.
The inner peripheral surface of the flow passage 201 has an inner diameter gradually reduced in accordance with the taper angle of the peripheral surface 642 of the regulating member 64. With such a tapered shape, the sealing property between the regulating member 64 and the flow passage 201 is improved. Further, the regulating member 6
It is preferable that the material of No. 4 is an elastic body such as rubber, mirastomer or the like, since the sealing property is further improved. Further, the elastic body may cover only the peripheral surface 642 of the regulating member 64. Further, such a tapered shape allows the opening area of the flow passage 201 to be adjusted by changing the moving distance of the regulating member 64 (the retreat distance of the plunger of the operating portion 68).

The restricting member 64 described above is used to
And is simultaneously inserted and removed by the interlocking means 67 by the operation of the operation part 68. With such a configuration, a channel through which the processing liquid flows is formed in addition to the passages 71 to 76. The operating section 68 may be configured to operate when a rise in the level of the washing water W is detected based on a signal from the liquid level sensor or in conjunction with a liquid supply device of a processing liquid replenishment system.

On the other hand, each partition space 62A, 62B, 62
D, 62E, processing chambers 6A, 6B, 6D, 6E
The communication holes 621 and 622 are formed at upper and lower positions. The partition plate 23 is provided between the circulation holes 621 and 622. With such a configuration, the flow of the washing water W flowing through the flow passage 201 always passes through the processing chambers 6A to 6E, and the conversion efficiency to the replenisher is improved. According to the above configuration, it is possible to arbitrarily replenish the processing liquid regardless of whether or not the photosensitive material S is transported. Even when the photosensitive material S having a short transport length is processed, the control unit 63 is operated. By doing so, the liquid can be sufficiently replenished. Further, by adjusting the moving distance of the regulating member 64, the amount of liquid flowing can be regulated, so that the replenishing amount can be adjusted according to the width of the photosensitive material S, the transport time, and the like. The operating section 68 may be configured by a motor or the like, and may be configured to wind a wire serving as the interlocking means 67.

As described above, the rack 3 and the processing tank 2
A seal member is provided between the processing chambers to prevent the liquid from flowing between the processing chambers. Therefore, when the rack 3 is separated from the processing tank 2, a negative pressure is generated in the processing chamber, and the rack 3 However, if the restriction member 64 is operated at the time of separation to open the flow passage 201,
There is no pressure difference between the processing chambers, and the rack 3 can be easily separated.

FIGS. 10 and 11 show another embodiment of the operation section 68. FIG. In the example shown in FIG. 10, the structure is such that the interlocking means 67 is pulled by a float 682 floating on the surface of the washing water W. The arm 683 supporting the float 682 moves up and down around a fulcrum 684 fixed to the partition member 17 side. When the liquid level rises due to the replenishment of the washing water W, the float 682 rises together with the liquid level. Thus, the interlocking means 67 is pulled. Such a structure has an advantage that a special power or device such as a circuit for operating the operation unit is not required.

As shown in FIG. 11, the arm 683 may be extended to the opposite side of the partition member 17 to directly actuate the regulating members of the partition spaces 62A and 62B and the partition spaces 62D and 62E. . In this structure, the interlocking means 67 is a rod-shaped rigid body. Interlocking means 6
7 is connected to the arm 683 by a long hole 671 in the lateral direction.
Are provided, and a pin 68 provided on the arm 683 side is provided.
5 is inserted into the long hole 671, and the arm 683
At the time of swinging, the pin 685 moves in the long hole 671.

In addition to the control means described above, each flow passage 20
1 may be provided with a solenoid valve, and may be configured to control opening and closing separately. Alternatively, a bypass may be provided to directly connect the processing chamber, and a control means such as a solenoid valve may be provided in the bypass.

Next, the usage and operation of the photosensitive material processing apparatus 1 will be described.

When the processing of the photosensitive material S is started, washing water W is supplied from the liquid supply port 13, and the processing chambers 6A to 6E and the narrow passages 71 to 74 are filled with the washing water W.

At this time, as described above, when the photosensitive material S does not pass through, the blade 15 is configured to cut off the flow of the washing water W, so that the controller 63 is operated when supplying the washing water W. The flow passage 201 is opened.

When the photosensitive material S is carried in and the photosensitive material S passes through all the blades 15, a gap is formed between the blades 15, and a small amount of liquid flows when the washing water W is replenished. When replenishing the washing water W in accordance with the width and the transport speed of the photosensitive material S, the flow path 201 is opened by the control means 63 to adjust the flow rate of the washing water W. Further, if the photosensitive material S does not pass through all the blades 15 at the same time due to the short transport length of the photosensitive material S, the flow of the washing water W does not occur. To secure the distribution of the washing water W. When the flow of the flow passage 201 is separately controlled by the electromagnetic valve, the flow passage 20 corresponding to the blade 15 through which the photosensitive material S does not pass.
Only one may be opened. The flow rate in this case is defined by the gap between the blades 15 generated by the passage of the photosensitive material S. At the time of this replenishment, the overflow liquid OF having substantially the same amount as the replenishment amount is discharged from the drain pipe 14.

On the other hand, the photosensitive material S is transported in the order of the processing chambers 6A, 6B, 6C, 6D and 6E, as indicated by arrows in the figure. Therefore, the flow direction of the rinsing water W is opposite to the direction in which the photosensitive material S is conveyed (counter flow). This also improves the washing efficiency. When the processing is completed and the photosensitive material S is carried out of the passage 76 above the processing chamber 6E, the replenishment of the washing water W is stopped at the same time.

In such a case, each of the processing chambers 6A to 6A is caused by bringing in the chemicals attached to the photosensitive material S from the previous bath.
The degree of contamination of the rinsing water W in E is because the squeeze effect of the blade 15 reduces the carry-in from the preceding processing chamber to the subsequent processing chamber, and also the blade 15 has a very high liquid blocking property. Further, since the washing water W is supplied by the counter flow as described above, the washing water W is large in the processing chamber 6A and is large in the processing chambers 6B, 6C, 6D, 6D.
E, and each such processing chamber 6
The liquid composition gradient in A to 6E is very well maintained.

Therefore, the washing efficiency is remarkably improved, and the replenishing amount can be greatly reduced. The replenishment amount is defined by the gap formed when the photosensitive material S passes through the blade 15, the width and thickness of the photosensitive material S, the transport speed, and the like. Taking the processing of a color paper having a thickness of 0.24 mm as an example, the results are as shown in Table 1 below.

[0090]

[Table 1]

The control means adjusts the flow rate in accordance with such a change in the replenishment amount. The replenishment amount illustrated in Table 1 by the concentration gradient and the squeeze effect of the processing chamber due to the action of the blade 15 is approximately 30 to 80% of the replenishment amount as compared with the related art.
Even with such a small amount of replenishment, there is no generation of stain due to poor washing. Further, when the photosensitive material S does not pass through (when processing is not performed), the flow of the washing water W between the adjacent processing chambers is cut off by the blade 15, and the control means 63.
As a result, the flow of the liquid in the flow passage 201 can be reliably drained.
Mixing of the washing water W hardly occurs. As a result, even in a case where the processing is suspended for a long time and then restarted, an efficient water washing processing can be immediately performed.

The replenishment timing and replenishment amount control described above may be performed by using a known control method and means.

On the other hand, when the rack 3 is pulled up and separated from the processing tank 2, the processing liquid hardly flows because the blades 15 are provided in the passages 71 to 76 as described above. Therefore, when the rack 3 is detached, a negative pressure is first generated due to an increase in the volume in the lowermost processing chamber 6C. However, as described above, the negative pressure is prevented by opening the flow passage 201. Thus, the rack 3 can be easily separated.

In the above, an example has been described in which the photosensitive material processing apparatus of the present invention is applied to a washing processing apparatus. However, the present invention is not limited to this, and can be applied to various processing.

The processing having the function of washing out unnecessary substances in the photographic material (for example, stabilization, fixing, adjustment, reversal, etc.) may have the same configuration as that of the above-mentioned washing processing apparatus.

In the photosensitive material processing apparatus of the present invention, two or more processing solutions having different functions can be supplied from different processing chambers and processed. In addition to the above, the photosensitive material processing apparatus of the present invention can be applied to various processing such as development processing, bleaching, fixing, and bleach-fixing alone processing. By selecting, the flow of the processing solution can be changed and used.

Generally, in a processing solution containing a compound which reacts with silver halide or the like in a light-sensitive material such as a developer, a bleaching solution, a bleach-fixing solution, and a fixing solution, unlike the washing water, the processing solution flows. The same direction as the conveying direction of the photosensitive material S (parallel flow)
It is preferable to improve the processing efficiency. As described above, the processing liquid having the fixing function also has an effect of washing out unnecessary substances in the photosensitive material, and therefore, the flow of the processing liquid may be set to a direction opposite to the conveying direction of the photosensitive material S (counter flow). .

Washing water, stabilizing solution, black and white developer, color developing solution, bleaching solution, fixing solution, bleach-fixing solution,
Various processing solutions such as a stop solution, an adjusting solution, and a reversing solution may be any of known solutions. For details of these processing solutions, refer to “Basics of Photographic Engineering” edited by The Photographic Society of Japan, published by Corona Co., Ltd. (Showa 1954), p. 299, "Chapter 4 Development Processing", etc. can be referred to.

In the light-sensitive material processing apparatus of the present invention, the type of light-sensitive material to be processed is not particularly limited, and may be either color or black-and-white light-sensitive material. For example,
Examples thereof include a color negative film, a color reversal film, a color positive film, a color photographic paper, a color reversal photographic paper, a photographic light-sensitive material for plate making, an X-ray photographic light-sensitive material, a black-and-white negative film, a black-and-white photographic paper, and a photosensitive material for micro.

The photosensitive material processing apparatus of the present invention includes, for example, an automatic developing machine, a portable negative developing machine, a wet type copier, a printer processor, a video printer processor, a photo print making coin machine, a color paper processing machine for plate inspection, and the like. Can be applied to the various photosensitive material processing apparatuses.

Although the configuration examples of the present invention have been described above, the present invention is not limited to these examples.

[0102]

According to the light-sensitive material processing apparatus of the present invention, a liquid composition gradient of the processing liquid is formed between the processing chambers, and the liquid composition gradient is maintained, and a liquid requiring a replenishment liquid at all times is maintained. There is an advantage that distribution can be secured.

[Brief description of the drawings]

FIG. 1 is a cross-sectional side view showing one configuration example of a photosensitive material processing apparatus of the present invention.

FIG. 2 is a sectional view taken along line II-II in FIG.

FIG. 3 is a sectional view taken along line III-III in FIG.

FIG. 4 is a partial perspective view of a rack showing a mounting structure of a support member.

FIG. 5 is an enlarged cross-sectional side view showing a configuration example of a blade.

FIG. 6 is a schematic diagram showing a first region and a second region in the photosensitive material processing apparatus of the present invention.

FIG. 7 shows a flow path and its control means in FIG.
FIG. 7 is a sectional side view taken along line VII.

FIG. 8 is a cross-sectional view showing a configuration of the flow passage and the regulating member, showing a state in which the flow passage is closed.

FIG. 9 is a cross-sectional view illustrating a configuration of the flow passage and the regulating member, showing a state where the flow passage is opened.

FIG. 10 is a partially enlarged sectional view showing another embodiment of the operation unit in the control means.

FIG. 11 is a partially enlarged cross-sectional view showing another embodiment of the operation unit in the control means.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Photosensitive material processing apparatus 2 Processing tank 21, 22 Side wall 3 Rack 31, 32 Side plate 4 Block body 6A-6E Processing chamber 60 Seal member 61A-61E Partition space 62A-62E Partition space 621, 622 Distribution hole 63 Control means 64 Regulation member 641 Sealing material 642 Peripheral surface 651 Stopper 652 Stopper 66 Biasing member 67 Interlocking means 671 Long hole 68 Working part 682 Floating 683 Arm 684 Support point 685 Float 686 Pin 687 Pin 71-76 Passage 8 Transport roller 81 Rotating shaft 82 Main shaft 83 Bevel gear 85 Gear 9 Support member 90 Slit portion 91a, 91b Mounting member 94a, 94b Side member 95 Projection 96 Seal member 10a Guide 10b Reverse guide 11 Liquid supply path 12 Drain path 13 Liquid supply pipe 14 Liquid discharge pipe 15 Blade 17 Switching members 171 and 172 end 18 first region 19 second region 20 partition wall 201 passage 23 partition plate S photosensitive material W washing water OF overflow solution

Claims (2)

(57) [Claims] 1. A processing space filled with a processing liquid is formed by a narrow passage and a plurality of processing chambers sequentially connected by the narrow passage, and a silver halide photosensitive material is sequentially passed through the processing chamber. In a photosensitive material processing apparatus provided with a conveying means for causing the processing liquid to flow and a blade for interrupting the flow of the processing liquid in the passage, the processing liquid flows between the respective processing chambers in addition to the path provided with the blade. And a control means for controlling the flow of the processing liquid is provided in the processing liquid flow path. 2. A photosensitive material processing apparatus according to claim 1, wherein said control means operates in conjunction with the replenishment of the processing solution.