JP2798346B2 - Concentration measuring device - Google Patents
Concentration measuring deviceInfo
- Publication number
- JP2798346B2 JP2798346B2 JP18704093A JP18704093A JP2798346B2 JP 2798346 B2 JP2798346 B2 JP 2798346B2 JP 18704093 A JP18704093 A JP 18704093A JP 18704093 A JP18704093 A JP 18704093A JP 2798346 B2 JP2798346 B2 JP 2798346B2
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- transmitted light
- processing
- light intensity
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体洗浄装置等のよ
うに少なくとも２種類の処理液を使い分ける装置におけ
る個々の処理液の濃度測定装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for measuring the concentration of each processing solution in an apparatus for selectively using at least two types of processing liquids, such as a semiconductor cleaning apparatus.
【０００２】[0002]
【従来の技術】従来、半導体洗浄装置等のように少なく
とも２種類の処理液を使い分ける装置において個々の処
理液の濃度を測定するには、例えば、特開昭６１−２８
１５３２号公報や特開平３−２２０４５２に開示されて
いるように、まず処理液に紫外光や赤外光を照射して、
その透過光の強度を測定し、この透過光強度と測定した
対象の処理液に固有の濃度基準情報とを用いて濃度を算
出する。濃度基準情報は処理液ごとに異なるので、処理
液の濃度算出にあたっては、その処理液の種類を特定す
る必要がある。従来装置では、測定者が処理液の種類判
別情報を濃度測定装置にキーボード等から入力指示し
て、該当処理液の種類、すなわち濃度基準情報を指定し
ている。2. Description of the Related Art Conventionally, for measuring the concentration of each processing solution in an apparatus which uses at least two types of processing liquids, such as a semiconductor cleaning apparatus, for example, Japanese Patent Application Laid-Open No. 61-28-1986
As disclosed in JP-A-1532 and JP-A-3-220452, first, a treatment liquid is irradiated with ultraviolet light or infrared light,
The intensity of the transmitted light is measured, and the density is calculated using the transmitted light intensity and the density reference information unique to the measured processing solution. Since the concentration reference information differs for each processing solution, it is necessary to specify the type of the processing solution when calculating the concentration of the processing solution. In the conventional apparatus, a measurer instructs the concentration measuring device to input the type determination information of the processing liquid from a keyboard or the like, and specifies the type of the processing liquid, that is, the density reference information.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、このよ
うな構成を有する従来例の場合には、次のような問題が
ある。すなわち、従来装置は、濃度を求める際に、その
都度、測定者が濃度測定装置に対して処理液の種類判別
情報を入力指示する必要があるので煩雑であるという問
題点がある。However, the prior art having such a structure has the following problems. That is, the conventional apparatus has a problem that it is complicated since the measurer needs to input and instruct the concentration measuring apparatus to input the type identification information of the processing liquid every time the concentration is obtained.
【０００４】本発明は、このような事情に鑑みてなされ
たものであって、測定者が処理液の種類判別情報を入力
指示することなく、処理液の濃度を求めることができる
濃度測定装置を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and provides a concentration measuring apparatus capable of determining the concentration of a processing solution without requiring a measurer to input and input the type identification information of the processing solution. The purpose is to provide.
【０００５】[0005]
【課題を解決するための手段】本発明は、このような目
的を達成するために、次のような構成をとる。すなわ
ち、本発明に係る濃度測定装置は、処理槽と、これに連
通する処理液供給路と、この処理液供給路に薬液供給路
を介して連通接続される複数種類の薬液源と、前記薬液
供給路を切り換える流路切り換え機構とを備えた処理装
置に用いられる濃度測定装置であって、前記処理液供給
路を流通する処理液に光を照射し、その透過光の強度を
測定する透過光強度測定手段と、前記流路切り換え機構
の制御情報に基づいて、前記処理液供給路に流れる処理
液の種類を判別する処理液判別手段と、複数種類の処理
液ごとに濃度基準情報を予め記憶し、前記処理液判別手
段からの情報に基づいて、該当処理液の濃度基準情報を
決定し、この濃度基準情報と前記透過光強度測定手段か
ら与えられた透過光強度とに基づいて処理液の濃度を求
める濃度算出手段とを備えたことを特徴とする。The present invention has the following configuration in order to achieve the above object. That is, the concentration measuring device according to the present invention comprises a processing tank, a processing liquid supply path communicating therewith, a plurality of types of chemical liquid sources connected to the processing liquid supply path via a chemical liquid supply path, What is claimed is: 1. A concentration measuring device used in a processing apparatus having a flow path switching mechanism for switching a supply path, wherein the transmitted light irradiates the processing liquid flowing through the processing liquid supply path with light and measures the intensity of the transmitted light. Intensity measuring means, processing liquid determining means for determining the type of processing liquid flowing through the processing liquid supply path based on control information of the flow path switching mechanism, and concentration reference information stored in advance for each of the plurality of types of processing liquid Then, based on the information from the processing liquid discriminating means, the concentration reference information of the processing liquid is determined, and the concentration of the processing liquid is determined based on the concentration reference information and the transmitted light intensity given from the transmitted light intensity measuring means. Concentration calculation to obtain concentration Characterized by comprising a means.
【０００６】[0006]
【作用】本発明の作用は次のとおりである。すなわち、
本発明は、流路切り換え機構が適宜に切り換えられ、処
理液供給路に処理液が流通すると、透過光強度測定手段
は前記処理液の透過光強度を測定し、その測定データを
濃度算出手段に渡す。一方、処理液判別手段は、流路切
り換え機構の制御情報に基づいて、処理液供給路に流れ
る処理液の種類を判別して、その種類判別情報を濃度算
出手段に渡す。濃度算出手段は、処理液に応じて予め記
憶した複数種類の濃度基準情報の中から、前記種類判別
情報に基づいて該当処理液の濃度基準情報を決定し、こ
の濃度基準情報とその処理液の透過光強度とに基づいて
処理液の濃度を求める。The operation of the present invention is as follows. That is,
According to the present invention, when the flow path switching mechanism is appropriately switched and the processing liquid flows through the processing liquid supply path, the transmitted light intensity measuring means measures the transmitted light intensity of the processing liquid, and the measured data is sent to the concentration calculating means. hand over. On the other hand, the processing liquid determining means determines the type of the processing liquid flowing through the processing liquid supply path based on the control information of the flow path switching mechanism, and passes the type determination information to the concentration calculating means. The concentration calculating means determines the concentration reference information of the processing liquid based on the type identification information from among a plurality of types of concentration reference information stored in advance according to the processing liquid, and determines the concentration reference information and the concentration of the processing liquid. The concentration of the processing solution is determined based on the transmitted light intensity.
【０００７】[0007]
【実施例】以下、図面を参照して本発明の一実施例を説
明する。図１は、本発明の一実施例に係る濃度測定装置
を含む半導体洗浄装置の概略構成を示す図である。An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of a semiconductor cleaning device including a concentration measuring device according to one embodiment of the present invention.
【０００８】図中、符号１は、半導体ウェハを洗浄する
ために、フッ化水素酸（ＨＦ）等の薬液を使用する半導
体洗浄装置である。半導体洗浄装置１には、洗浄液供給
管２によってイオンを脱した水である純水が所定の圧力
で圧送される。洗浄液供給管２には、薬液と純水とを調
合して洗浄液（処理液）とする分岐管３が継合され、こ
の分岐管３には、薬液源としての薬液供給タンク４〜７
と、加圧ポンプＰと、流路切り換え機構としての操作弁
８〜１１及び流量調節弁Ｖとが薬液供給管２ａ〜２ｄを
介して接続されている。なお、操作弁８〜１１は、後述
の制御部１２から送られる操作弁制御情報に基づいて開
閉動作し、各薬液を洗浄液供給管２に送るか否かを制御
する。本実施例では、一例として薬液供給タンク４はフ
ッ化水素酸（ＨＦ）を貯蔵しており、薬液供給タンク５
はアンモニア（ＮＨ3 ）を、薬液供給タンク６は塩酸
（ＨＣｌ）を、薬液供給タンク７は過酸化水素水（Ｈ2
Ｏ2 ）を、それぞれ貯蔵している。In FIG. 1, reference numeral 1 denotes a semiconductor cleaning apparatus that uses a chemical such as hydrofluoric acid (HF) to clean a semiconductor wafer. Pure water, which is water from which ions have been removed by the cleaning liquid supply pipe 2, is sent to the semiconductor cleaning apparatus 1 at a predetermined pressure. The cleaning liquid supply pipe 2 is joined with a branch pipe 3 for preparing a cleaning liquid (treatment liquid) by mixing a chemical liquid and pure water, and the branch pipe 3 is connected to a chemical liquid supply tank 4 to 7 as a chemical liquid source.
, A pressure pump P, and operation valves 8 to 11 and a flow control valve V as a flow path switching mechanism are connected via chemical solution supply pipes 2a to 2d. The operation valves 8 to 11 open and close based on operation valve control information sent from a control unit 12 described later, and control whether or not each chemical solution is sent to the cleaning liquid supply pipe 2. In the present embodiment, as an example, the chemical solution supply tank 4 stores hydrofluoric acid (HF), and the chemical solution supply tank 5
Is ammonia (NH 3 ), chemical solution supply tank 6 is hydrochloric acid (HCl), and chemical solution supply tank 7 is hydrogen peroxide solution (H 2
O 2 ) are stored.
【０００９】操作弁８〜１１は制御線５０を介して制御
部１２に接続されている。制御部１２は、半導体洗浄装
置１を制御するプログラムを記憶したＲＯＭ１２ａ、プ
ログラムを解釈実行するＣＰＵ１２ｂ、計算処理等で作
業領域として使用されるＲＡＭ１２ｃ、制御状態等を表
示するＣＲＴ１２ｄ、および双方向にデータを転送可能
なインターフェイス１２ｅ等から構成されている。ここ
では、主として、予め決められたプログラムに従って操
作弁制御情報を操作弁８〜１１に送る。The operation valves 8 to 11 are connected to a control unit 12 via a control line 50. The control unit 12 includes a ROM 12a storing a program for controlling the semiconductor cleaning apparatus 1, a CPU 12b for interpreting and executing the program, a RAM 12c used as a work area in calculation processing and the like, a CRT 12d for displaying a control state and the like, and bidirectional data. And an interface 12e capable of transferring the same. Here, the operation valve control information is mainly sent to the operation valves 8 to 11 according to a predetermined program.
【００１０】洗浄液供給管２の終端は、後述する透過光
強度測定用光学系３２を介して、半導体ウェハを洗浄処
理するための処理槽１３の下部に連通接続されている。
処理槽１３に供給された洗浄液は、処理槽１３に設けら
れた整流多孔板により均一に上昇して、オーバーフロー
し、周囲に設けられた排液槽１４に溢れ、この下部に接
続された排液ドレイン１５を流下する。The end of the cleaning liquid supply pipe 2 is connected to a lower part of a processing tank 13 for cleaning a semiconductor wafer through a transmitted light intensity measuring optical system 32 described later.
The cleaning liquid supplied to the processing tank 13 rises uniformly by the rectifying perforated plate provided in the processing tank 13, overflows, overflows into a drain tank 14 provided around the tank, and is connected to a drain connected to a lower part thereof. It flows down the drain 15.
【００１１】濃度測定装置３０は、濃度算出プログラム
等を記憶したＲＯＭ３１ａ、プログラムを解釈実行する
ＣＰＵ３１ｂ、計算処理等で作業領域として使用される
ＲＡＭ３１ｃ、測定値等を表示するＣＲＴ３１ｄ、およ
び双方向にデータを転送可能なインターフェイス３１ｅ
等からなる演算部３１と、透過光強度測定用光学系３２
とで構成される。この演算部３１は本発明における処理
液判別手段および濃度算出手段としての機能を備えてい
る。また、透過光強度測定手段としての透過光強度測定
光学系３２は、洗浄液供給管２を流通する洗浄液の一部
を流通させる所定幅の透過性流路を備えたフローセル３
２ａと、このフローセル３２ａを流れる洗浄液に透過光
測定用の光（紫外光および／または赤外光）を照射する
ハロゲンランプ等の光源３２ｂと、透過光の強度を測定
するための光強度検出器３２ｃから構成されている。光
強度検出器３２ｃとしては、紫外光を使用する場合に
は、紫外光に対する感度が高いＧａＰ等の半導体や紫外
光電管が用いられ、また赤外光を使用する場合には、赤
外光に対する感度が高いＰｂＳ等の半導体素子が用いら
れる。なお、演算部３１は、通信信号線５１を介して半
導体洗浄装置１の制御部１２に接続されているととも
に、透過光強度測定用光学系３２の光強度検出器３２ｃ
に接続されている。The density measuring device 30 includes a ROM 31a storing a density calculation program and the like, a CPU 31b interpreting and executing the program, a RAM 31c used as a work area in calculation processing and the like, a CRT 31d displaying measured values and the like, and bidirectional data. Interface 31e that can transfer
And an optical unit 32 for measuring transmitted light intensity
It is composed of The calculation unit 31 has a function as a processing liquid determination unit and a concentration calculation unit in the present invention. Further, the transmitted light intensity measuring optical system 32 as a transmitted light intensity measuring means includes a flow cell 3 having a transparent passage having a predetermined width through which a part of the cleaning liquid flowing through the cleaning liquid supply pipe 2 flows.
2a, a light source 32b such as a halogen lamp for irradiating transmitted light measuring light (ultraviolet light and / or infrared light) to the cleaning liquid flowing through the flow cell 32a, and a light intensity detector for measuring the transmitted light intensity 32c. As the light intensity detector 32c, when ultraviolet light is used, a semiconductor such as GaP or an ultraviolet photoelectric tube having high sensitivity to ultraviolet light is used, and when infrared light is used, sensitivity to infrared light is used. A semiconductor element such as PbS having a high density is used. The arithmetic unit 31 is connected to the control unit 12 of the semiconductor cleaning device 1 via the communication signal line 51, and also has the light intensity detector 32c of the transmitted light intensity measuring optical system 32.
It is connected to the.
【００１２】次に、本実施例の動作を図２を参照して説
明する。図２は、濃度測定装置３０の濃度測定処理手順
を示したフローチャートである。この一連の処理は、半
導体洗浄装置１の制御部１２が、測定開始の信号を濃度
測定装置３０に送信した後に演算部３１によって実行さ
れる。Next, the operation of this embodiment will be described with reference to FIG. FIG. 2 is a flowchart showing the procedure of the density measurement process of the density measurement device 30. This series of processing is executed by the calculation unit 31 after the control unit 12 of the semiconductor cleaning device 1 transmits a signal of a measurement start to the concentration measurement device 30.
【００１３】実施例に係る半導体洗浄装置では、例え
ば、一般的にＲＣＡ洗浄法として知られている次のよう
な順序で洗浄を行っている。したがって、以下の説明で
は、洗浄工程（２），（４），（６）で使用される各洗
浄液の濃度測定について説明する。 （１）純水リンス １０分 （２）アンモニア（ＮＨ3 ）・過酸化水素（Ｈ2 Ｏ2 ）
１０分 （３）純水リンス ２０分 （４）フッ酸（ＨＦ） ５分 （５）純水リンス ２０分 （６）塩酸（ＨＣｌ）・過酸化水素（Ｈ2 Ｏ2 ） １０
分 （７）純水リンス ２０分In the semiconductor cleaning apparatus according to the embodiment, for example, cleaning is performed in the following order generally known as RCA cleaning method. Therefore, in the following description, the measurement of the concentration of each cleaning liquid used in the cleaning steps (2), (4), and (6) will be described. (1) Rinse with pure water for 10 minutes (2) Ammonia (NH 3 ) / hydrogen peroxide (H 2 O 2 )
10 minutes (3) Pure water rinse 20 minutes (4) Hydrofluoric acid (HF) 5 minutes (5) Pure water rinse 20 minutes (6) Hydrochloric acid (HCl) / hydrogen peroxide (H 2 O 2 ) 10
Minutes (7) Rinse with pure water 20 minutes
【００１４】ステップＳ１では、濃度測定装置３０の演
算部３１が通信信号線５１を介して、制御部１２に操作
弁８〜１１の制御情報を要求することにより、その情報
を取得する。本実施例において、操作弁制御情報は操作
弁８〜１１に応じた４ビットの信号〔ａｂｃｄ〕から構
成されており、ａは操作弁８の開閉状態、ｂは操作弁９
の開閉状態、ｃは操作弁１０の開閉状態、ｄは操作弁１
１の開閉状態をそれぞれ示している。ここでは、In step S1, the calculation unit 31 of the concentration measuring device 30 requests the control unit 12 for control information of the operation valves 8 to 11 via the communication signal line 51, and acquires the information. In this embodiment, the operation valve control information is composed of a 4-bit signal [abcd] corresponding to the operation valves 8 to 11, where a is the open / close state of the operation valve 8, and b is the operation valve 9
, C is the open / closed state of the operation valve 10, d is the open / closed state of the operation valve 1
1 shows an open / closed state. here,
〔０〕
は操作弁の閉状態を、〔１〕は操作弁の開状態とする。
したがって、上記の純水リンス工程（１），（３），
（５），（６）では、操作弁制御情報として〔０００
０〕を取得し、洗浄工程（２）では〔０１０１〕を取得
し、洗浄工程（４）では〔１０００〕を取得し、洗浄工
程（６）では〔００１１〕を取得する。[0]
Indicates a closed state of the operation valve, and [1] indicates an open state of the operation valve.
Therefore, the pure water rinsing steps (1), (3),
In (5) and (6), [000] is used as operation valve control information.
0], [0101] is obtained in the cleaning step (2), [1000] is obtained in the cleaning step (4), and [0011] is obtained in the cleaning step (6).
【００１５】ステップＳ２1 ，Ｓ２2 ，Ｓ２3 ，…で
は、ステップＳ１で取得した操作弁制御情報に基づい
て、洗浄液供給管２に流れている流体の種類を判別し、
その種類に応じた処理を決定する。In steps S2 1 , S2 2 , S2 3 ,..., The type of fluid flowing through the cleaning liquid supply pipe 2 is determined based on the operation valve control information obtained in step S1.
The processing according to the type is determined.
【００１６】すなわち、最初の純水リンス工程（１）で
は、ステップＳ２1 で操作弁制御情報[0016] That is, in the first of the pure water rinsing step (1), the operation valve control information in step S2 1
〔００００〕が確
認されることにより、洗浄液供給管２に純水が流れてい
るものと判断してステップＳ３に進む。When [0000] is confirmed, it is determined that pure water is flowing through the cleaning liquid supply pipe 2, and the process proceeds to step S3.
【００１７】ステップＳ３では、純水の透過光強度ＩC
を測定する。純水リンス工程（１）は１０分間行われる
ので、その間、透過光強度ＩC の測定は適宜の周期で繰
り返し行なわれ、各測定値の平均値が純水の透過光強度
ＩC として演算部３１のＲＡＭ３１ｃに保存される。In step S3, the transmitted light intensity I C of pure water
Is measured. Since deionized water rinsing step (1) is carried out for 10 minutes, during which the measurement of the transmitted light intensity I C is repeatedly performed at appropriate periods, the calculation unit the average value of each measured value as a transmitted light intensity I C of the pure water 31 is stored in the RAM 31c.
【００１８】そして、洗浄工程が次のＮＨ3 ＋Ｈ2 Ｏ2
洗浄工程（２）に移ると、演算部３１はステップＳ１で
得られた操作弁制御情報〔０１０１〕を基に、現在使用
されている洗浄液がＮＨ3 ＋Ｈ2 Ｏ2 洗浄液であると判
断し、その洗浄液の濃度測定のために予め決められてい
るステップＳ４以降の処理に移る。Then, the washing step is performed in the next NH 3 + H 2 O 2
In the cleaning step (2), the arithmetic unit 31 determines that the currently used cleaning liquid is the NH 3 + H 2 O 2 cleaning liquid based on the operation valve control information [0101] obtained in step S1, The processing shifts to the processing after step S4 which is predetermined for measuring the concentration of the cleaning liquid.
【００１９】ステップＳ４では、ＮＨ3 ＋Ｈ2 Ｏ2 洗浄
液の透過光強度Ｉm を測定する。ここでも、上述した純
水の透過光強度の測定と同様に、所定の洗浄時間（１０
分）の間、透過光強度Ｉm が繰り返し測定され、その平
均値がＮＨ3 ＋Ｈ2 Ｏ2 洗浄液の透過光強度Ｉm として
演算部３１のＲＡＭ３１ｃに保存される。[0019] In step S4, measuring the transmitted light intensity I m of NH 3 + H 2 O 2 cleaning solution. Here, similarly to the measurement of the transmitted light intensity of the pure water described above, a predetermined cleaning time (10
During minute) is measured repeatedly transmitted light intensity I m, the average value is stored in RAM31c of NH 3 + H 2 O 2 computing unit 31 as the transmitted light intensity I m of the cleaning liquid.
【００２０】ステップＳ５では、ステップＳ３で得られ
た純水の透過光強度ＩC と、ステップＳ４で得られたＮ
Ｈ3 ＋Ｈ2 Ｏ2 洗浄液の透過光強度Ｉm とを使い、予め
定められたＮＨ3 ＋Ｈ2 Ｏ2 洗浄液の濃度基準情報に従
って濃度を算出する。この濃度算出処理については後述
する。In step S5, the transmitted light intensity I C of the pure water obtained in step S3 and the N
H 3 + H 2 O 2 using a transmitted light intensity I m of the cleaning liquid, to calculate the concentration according to density reference information of NH 3 + H 2 O 2 cleaning solution which is determined in advance. This density calculation processing will be described later.
【００２１】ステップＳ６では、ステップＳ５で求めら
れたＮＨ3 ＋Ｈ2 Ｏ2 洗浄液の濃度をＣＲＴ３１ｄに表
示する。In step S6, the concentration of the NH 3 + H 2 O 2 cleaning solution obtained in step S5 is displayed on the CRT 31d.
【００２２】次の純水リンス工程（３）では、再び操作
弁制御情報In the next pure water rinsing step (3), the operation valve control information
〔００００〕を取得することにより、ステッ
プＳ３で新たに純水の透過光強度ＩC が測定される。そ
して、次のＨＦ洗浄工程（４）では、操作弁制御情報
〔１０００〕を取得することにより、ステップＳ１か
ら、Ｓ２1 、Ｓ２2 、Ｓ２3 と進む。ステップＳ２3 で
ＨＦ洗浄液が使われていると判断されると、ステップＳ
７でＨＦ洗浄液の透過光強度Ｉm が測定され、次のステ
ップＳ８で、直前に求められた純水の透過光強度Ｉ
C と、ＨＦ洗浄液の透過光強度Ｉm とを使い、ＨＦ洗浄
液の濃度基準情報に従って濃度を算出する。By obtaining [0000], the transmitted light intensity I C of pure water is newly measured in step S3. Then, in the next HF cleaning step (4), by obtaining the operating valve control information [1000] from the step S1, the process proceeds S2 1, S2 2, S2 3 . If it is determined that HF cleaning solution is used in Step S2 3, step S
7 transmitted light intensity I m of HF cleaning liquid is measured, in the next step S8, the transmitted light intensity of the pure water obtained just before I
Use and C, and the transmitted light intensity I m of HF cleaning solution, to calculate the concentration according to density reference information HF cleaning solution.
【００２３】以下、同様に、操作弁制御情報に基づいて
洗浄液供給管２に流れている流体の種類を判別し、各流
体に応じた処理が行われる。すなわち、本実施例では、
所定の洗浄処理の直前の純水リンス工程で、純水の透過
光強度を測定し、この透過光強度と当該洗浄液の透過光
強度とを使って、所定の濃度算出処理に従って洗浄液の
濃度が算出される。Hereinafter, similarly, the type of fluid flowing through the cleaning liquid supply pipe 2 is determined based on the operation valve control information, and a process corresponding to each fluid is performed. That is, in this embodiment,
In the pure water rinsing step immediately before the predetermined cleaning treatment, the transmitted light intensity of the pure water is measured, and the concentration of the cleaning liquid is calculated according to the predetermined concentration calculation processing using the transmitted light intensity and the transmitted light intensity of the cleaning liquid. Is done.
【００２４】以上のように、本実施例では、４ビットの
操作弁制御情報に基づいて洗浄液供給管２に流れている
流体の種類を自動的に判別して、予め定められた各洗浄
液の濃度算出処理を実行するようにしているので、測定
者が濃度測定装置に洗浄液の種類判別情報を入力指示す
る必要がなく、各洗浄液の濃度を速やかに測定すること
ができる。As described above, in this embodiment, the type of the fluid flowing through the cleaning liquid supply pipe 2 is automatically determined based on the 4-bit operation valve control information, and the concentration of each predetermined cleaning liquid is determined. Since the calculation process is executed, the measurer does not need to input and instruct the type measuring information of the cleaning liquid to the concentration measuring device, and the concentration of each cleaning liquid can be measured quickly.
【００２５】濃度算出処理は、一般的に、濃度算出式を
用いて算出する方法と、検量線データを用いて求める方
法とがあり、ここではＨＦ洗浄液を例に、簡単に説明す
る。濃度算出式を用いる方法では、ランベルト−ベール
の法則（Lambert-Beer's Law）に基づく下記濃度算出式
によって、洗浄液の濃度を算出する。 ｃ＝−１／αｄ・ｌｎ（Ｉm ／Ｉc ） 上記濃度算出式において、ｃは濃度（％）、αは洗浄液
が光を吸収する度合いを表す各洗浄液固有の吸光係数
（／ｍｍ・％）、ｄはフローセル３２ａに設けられたセ
ル部の長さ、すなわち透過光の光路長（ｍｍ）である。
なお、本実施例においては、吸光係数αは、互いに等し
い光路長のセル部において、光が純水を透過したときの
光強度に対して定義された各洗浄液固有のものであり、
また、濃度基準情報として、各洗浄液に対して対応づけ
られて、演算部３１内のＲＡＭ３１ｃに予め記憶されて
おり、操作弁制御情報によって逐次読み出される。The concentration calculation processing generally includes a method of calculating using a concentration calculation formula and a method of obtaining using a calibration curve data. Here, the HF cleaning solution will be briefly described as an example. In the method using the concentration calculation formula, the concentration of the cleaning liquid is calculated by the following concentration calculation formula based on Lambert-Beer's Law. c = −1 / αd · ln (I m / I c ) In the above-described concentration calculation formula, c is the concentration (%), and α is the extinction coefficient (/ mm ·%) specific to each cleaning solution, which represents the degree of absorption of light by the cleaning solution. ) And d are the length of the cell portion provided in the flow cell 32a, that is, the optical path length (mm) of the transmitted light.
In the present embodiment, the extinction coefficient α is unique to each cleaning liquid defined with respect to the light intensity when light passes through pure water in the cell portions having the same optical path length,
Further, the concentration reference information is stored in advance in the RAM 31c in the arithmetic unit 31 in association with each cleaning liquid, and is sequentially read out according to the operation valve control information.
【００２６】すなわち、純水リンス工程（３）時のステ
ップＳ３で求められた純水の透過光強度ＩC と、ステッ
プＳ７で求められたＨＦ洗浄液の透過光強度Ｉm を上記
の濃度算出式に代入して、濃度ｃを求める。このとき、
吸光係数αとしては、ＨＦ溶液固有の値が操作弁制御情
報〔１０００〕によって読み出され、濃度算出式に代入
される。[0026] That is, pure water rinsing step (3) and the transmitted light intensity I C of the pure water obtained in step S3 of the time, the transmitted light intensity I m the density calculating equation of HF cleaning solution obtained in step S7 To obtain the density c. At this time,
As the absorption coefficient α, a value specific to the HF solution is read out based on the operation valve control information [1000], and is substituted into the concentration calculation formula.
【００２７】検量線を用いて濃度を求める方法について
は、まず、検量線データを次のように作成する。始め
に、純水と濃度の異なる複数のＨＦ洗浄液を用意し、赤
外光に対する純水の透過光強度、各ＨＦ洗浄液の透過光
強度を測定する。そして、純水の透過光強度に対する各
ＨＦ洗浄液の透過光強度比Ｔを算出し、各透過光強度比
ＴにＨＦ洗浄液の濃度ｃを対応づけて、演算部３１のＲ
ＡＭ３１ｃに保存する。なお、検量線データは、各洗浄
液に対して作成し、濃度基準情報として、各洗浄液に対
応づけて、演算部３１内のＲＡＭ３１ｃに予め記憶して
おく。そして、操作弁制御情報によって逐次特定され
る。ＨＦ洗浄液の濃度を求めるとき（図２のステップＳ
８）は、まず、ステップＳ３で測定した純水の透過光強
度Ｉc と、ステップＳ７で測定したＨＦ洗浄液の透過光
強度Ｉm との比Ｔ１を算出する。一方、演算部３１では
ＲＡＭ３１ｃに記憶された検量線データの内、ＨＦ洗浄
液の検量線データを操作弁制御情報〔１０００〕に基づ
いて特定し、比Ｔ１と等しい透過光強度比Ｔを検索し、
それに対応する濃度ｃを得る。With respect to the method of obtaining the concentration using the calibration curve, first, the calibration curve data is prepared as follows. First, a plurality of HF cleaning solutions having different concentrations from pure water are prepared, and the transmitted light intensity of pure water with respect to infrared light and the transmitted light intensity of each HF cleaning solution are measured. Then, the transmitted light intensity ratio T of each HF cleaning liquid to the transmitted light intensity of pure water is calculated, and the transmitted light intensity ratio T is associated with the concentration c of the HF cleaning liquid, and R
Store it in AM 31c. Note that the calibration curve data is created for each cleaning liquid, and is stored in advance in the RAM 31c in the arithmetic unit 31 as concentration reference information in association with each cleaning liquid. And it is sequentially specified by operation valve control information. When calculating the concentration of the HF cleaning solution (Step S in FIG. 2)
8) first calculates the transmitted light intensity I c of pure water measured in step S3, the ratio T1 of the transmitted light intensity I m of HF cleaning liquid measured in step S7. On the other hand, the arithmetic unit 31 specifies the calibration curve data of the HF cleaning liquid from the calibration curve data stored in the RAM 31c based on the operation valve control information [1000], and searches for the transmitted light intensity ratio T equal to the ratio T1.
The corresponding concentration c is obtained.
【００２８】なお、上述した実施例では、基準となる透
過光強度を被測定洗浄液を使用する洗浄工程の直前の純
水リンス工程で測定したが、本発明はこれに限定され
ず、上記の基準透過光強度を該当洗浄工程の直後の純水
リンス工程で測定してもよい。In the above-described embodiment, the reference transmitted light intensity was measured in the pure water rinsing step immediately before the cleaning step using the cleaning liquid to be measured. However, the present invention is not limited to this, and the present invention is not limited thereto. The transmitted light intensity may be measured in a pure water rinsing step immediately after the corresponding washing step.
【００２９】また、濃度算出処理において基準となる透
過光強度を、当該洗浄工程の直前、または直後の純水リ
ンス工程で測定する理由は、基準透過光強度を測定して
から、被測定洗浄液の透過光強度を測定するまでの時間
は短くすることにより、光源の光量の変動等の影響を少
なくするためである。したがって、光源の光量の変動が
極めて小さい場合などでは、基準透過光強度を当該洗浄
工程の直前、または直後で測定する必要はなく、予め測
定しておいた純水の透過光強度を用いるようにしてもよ
い。The reason for measuring the reference transmitted light intensity in the pure water rinsing step immediately before or immediately after the cleaning step is that the reference transmitted light intensity is measured after the reference transmitted light intensity is measured and then the reference transmitted light intensity is measured. This is because the influence of the fluctuation of the light amount of the light source or the like is reduced by shortening the time until the transmitted light intensity is measured. Therefore, when the fluctuation of the light amount of the light source is extremely small, it is not necessary to measure the reference transmitted light intensity immediately before or immediately after the cleaning step, and the previously measured transmitted light intensity of pure water is used. You may.
【００３０】また、フローセル３２ａに入射する光の強
度ＩO を測定する光検出部を設け、ランベルト−ベール
の法則に基づく下記濃度算出式によって、洗浄液の濃度
を算出してもよい。 ｃ＝−１／α’ｄ・ｌｎ（Ｉm ／ＩO ） なお、α’は洗浄液が光を吸収する度合いを表す各洗浄
液固有の吸光係数（／ｍｍ・％）である。Further, a light detection unit for measuring the intensity I O of light incident on the flow cell 32a may be provided, and the concentration of the cleaning liquid may be calculated by the following concentration calculation formula based on Lambert-Beer's law. c = −1 / α ′ d · ln (I m / I O ) where α ′ is an extinction coefficient (/ mm ·%) specific to each cleaning liquid, which represents the degree to which the cleaning liquid absorbs light.
【００３１】さらに、上記の濃度計算処理は、半導体洗
浄装置１の制御部１２において実行するようにしてもよ
い。この場合、半導体洗浄装置１の制御部１２は、濃度
測定装置３０の演算部３１から通信信号線５１を介して
純水の透過光強度と洗浄液の透過光強度とを取得する。
そして、制御部１２が制御している操作弁８〜１１の制
御情報により、被測定洗浄液に応じた濃度算出手順を用
いて制御部１２のＣＰＵ１２ｂが濃度を算出する。Further, the above-described concentration calculation processing may be executed by the control unit 12 of the semiconductor cleaning apparatus 1. In this case, the control unit 12 of the semiconductor cleaning device 1 acquires the transmitted light intensity of pure water and the transmitted light intensity of the cleaning liquid from the calculation unit 31 of the concentration measuring device 30 via the communication signal line 51.
Then, based on the control information of the operation valves 8 to 11 controlled by the control unit 12, the CPU 12b of the control unit 12 calculates the concentration using a concentration calculation procedure corresponding to the cleaning liquid to be measured.
【００３２】[0032]
【発明の効果】以上の説明から明らかなように、本発明
によれば、薬液供給路を切り換えるための流路切り換え
機構の制御情報に基づいて、処理液供給路を流れる処理
液の種類を判別し、その処理液に応じた濃度基準情報に
よって処理液の濃度を求めているので、測定者は処理液
の種類などを入力指示する必要がなく、各種の処理液の
濃度を速やかに測定することができる。As is apparent from the above description, according to the present invention, the type of the processing liquid flowing through the processing liquid supply path is determined based on the control information of the flow path switching mechanism for switching the chemical liquid supply path. Since the concentration of the processing solution is determined based on the concentration reference information corresponding to the processing solution, the operator does not need to input and instruct the type of the processing solution, and the concentration of the various processing solutions can be measured promptly. Can be.
【図１】本発明の一実施例に係る濃度測定装置を含む半
導体洗浄装置の概略構成を示す図である。FIG. 1 is a diagram showing a schematic configuration of a semiconductor cleaning device including a concentration measuring device according to one embodiment of the present invention.
【図２】本発明の一実施例に係る濃度測定装置の濃度測
定処理の手順を示したフローチャートである。FIG. 2 is a flowchart showing a procedure of a density measuring process of the density measuring device according to one embodiment of the present invention.
【図３】濃度測定に用いる検量線の模式図である。FIG. 3 is a schematic diagram of a calibration curve used for concentration measurement.
１ … 半導体洗浄装置 ２ … 洗浄液供給管 ８，９，１０，１１ … 操作弁 １２ … 制御部 ３０ … 濃度測定装置 ３１ … 演算部 ３２ … 透過光強度測定用光学系 ５０ … 制御線 ５１ … 通信信号線 DESCRIPTION OF SYMBOLS 1 ... Semiconductor cleaning device 2 ... Cleaning liquid supply pipe 8, 9, 10, 11 ... Operating valve 12 ... Control part 30 ... Concentration measuring device 31 ... Operation part 32 ... Optical system for transmitted light intensity measurement 50 ... Control line 51 ... Communication signal line
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−247975（ＪＰ，Ａ) 特開 平４−157185（ＪＰ，Ａ) 特開 平４−278529（ＪＰ，Ａ) 特開 平４−157367（ＪＰ，Ａ) 実開 平５−53241（ＪＰ，Ｕ) 実開 昭60−90674（ＪＰ，Ｕ) 実開 昭61−42457（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.6，ＤＢ名) G01N 21/00 - 21/01 G01N 21/17 - 21/61 H01L 21/304 G01N 35/00 - 35/08──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-61-247975 (JP, A) JP-A-4-157185 (JP, A) JP-A-4-278529 (JP, A) JP-A-4-27895 157367 (JP, A) Japanese Utility Model Application Hei 5-53241 (JP, U) Japanese Utility Model Application Showa 60-90674 (JP, U) Japanese Utility Model Application Showa 61-42457 (JP, U) (58) Field surveyed (Int. 6, DB name) G01N 21/00 - 21/01 G01N 21/17 - 21/61 H01L 21/304 G01N 35/00 - 35/08
Claims (1)
と、この処理液供給路に薬液供給路を介して連通接続さ
れる複数種類の薬液源と、前記薬液供給路を切り換える
流路切り換え機構とを備えた処理装置に用いられる濃度
測定装置であって、 前記処理液供給路を流通する処理液に光を照射し、その
透過光の強度を測定する透過光強度測定手段と、 前記流路切り換え機構の制御情報に基づいて、前記処理
液供給路に流れる処理液の種類を判別する処理液判別手
段と、 複数種類の処理液ごとに濃度基準情報を予め記憶し、前
記処理液判別手段からの情報に基づいて、該当処理液の
濃度基準情報を決定し、この濃度基準情報と前記透過光
強度測定手段から与えられた透過光強度とに基づいて処
理液の濃度を求める濃度算出手段と、 を備えたことを特徴とする濃度測定装置。1. A processing tank, a processing liquid supply path communicating with the processing tank, a plurality of types of chemical liquid sources connected to the processing liquid supply path via a chemical liquid supply path, and a flow path for switching the chemical liquid supply path A concentration measuring device used for a processing device having a switching mechanism, wherein the transmitted light intensity measuring means for irradiating the processing liquid flowing through the processing liquid supply path with light and measuring the intensity of the transmitted light; Processing liquid determining means for determining the type of the processing liquid flowing through the processing liquid supply path based on control information of the flow path switching mechanism; and concentration reference information for each of the plurality of types of processing liquids is stored in advance, and the processing liquid determination is performed. Means for determining the concentration reference information of the processing liquid based on the information from the means, and calculating the concentration of the processing liquid based on the concentration reference information and the transmitted light intensity given from the transmitted light intensity measuring means. And having Concentration measuring apparatus according to claim.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18704093A JP2798346B2 (en) | 1993-06-29 | 1993-06-29 | Concentration measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18704093A JP2798346B2 (en) | 1993-06-29 | 1993-06-29 | Concentration measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0720052A JPH0720052A (en) | 1995-01-24 |
| JP2798346B2 true JP2798346B2 (en) | 1998-09-17 |
Family
ID=16199127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18704093A Expired - Lifetime JP2798346B2 (en) | 1993-06-29 | 1993-06-29 | Concentration measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2798346B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19840989A1 (en) * | 1997-09-09 | 1999-03-18 | Tokyo Electron Ltd | Object wet cleaning method for e.g. semiconductor wafer |
| JP3212958B2 (en) | 1998-12-11 | 2001-09-25 | 九州日本電気株式会社 | Chemical solution concentration control device |
| JP4658917B2 (en) * | 2006-12-28 | 2011-03-23 | 株式会社堀場製作所 | Analysis equipment for semiconductor manufacturing systems |
-
1993
- 1993-06-29 JP JP18704093A patent/JP2798346B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0720052A (en) | 1995-01-24 |
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