JPS60163435A - Semiconductor wafer cleaning device - Google Patents

Semiconductor wafer cleaning device

Info

Publication number
JPS60163435A
JPS60163435A JP1780184A JP1780184A JPS60163435A JP S60163435 A JPS60163435 A JP S60163435A JP 1780184 A JP1780184 A JP 1780184A JP 1780184 A JP1780184 A JP 1780184A JP S60163435 A JPS60163435 A JP S60163435A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
treatment
etching
tank
signal
time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1780184A
Inventor
Hideki Mitarai
Takeo Miura
Keiji Morita
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67023Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning

Abstract

PURPOSE:To make the etching quantity uniform by correcting the etching treatment time automatically according to variation of temperature of a treatment tank. CONSTITUTION:The temperature of dilute hydrofluoric acid solution 12 in a treatment tank 11 is detected by a temperature sensor 19 and is sent to a microcomputer (CPU)20 as a detected signal. In the microcomputer 20, a proper value of etching treatment time for a temperature of the treatment tank 11 is stored and the computer 20 outputs a correction signal for correcting the etching treatment time based on the detected signal. The correction signal is sent to an electromagnetic valve such as an drain plug 17 and etching treatment is performed in the treatment tank 11 by the corrected time. When etching is finished, the drain plug 17 opens automatically to the dilute hydrofluoric acid solution after the treatment, after which pure water flows into the tank 11 through rinsing water feeding holes 151-153 and water rinsing is performed by overflow for 15- 20min.
JP1780184A 1984-02-03 1984-02-03 Semiconductor wafer cleaning device Pending JPS60163435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1780184A JPS60163435A (en) 1984-02-03 1984-02-03 Semiconductor wafer cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1780184A JPS60163435A (en) 1984-02-03 1984-02-03 Semiconductor wafer cleaning device

Publications (1)

Publication Number Publication Date
JPS60163435A true true JPS60163435A (en) 1985-08-26

Family

ID=11953818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1780184A Pending JPS60163435A (en) 1984-02-03 1984-02-03 Semiconductor wafer cleaning device

Country Status (1)

Country Link
JP (1) JPS60163435A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995028736A1 (en) * 1994-04-15 1995-10-26 Steag Microtech Gmbh Donaueschingen Process and device for chemically treating substrates
US6197209B1 (en) 1995-10-27 2001-03-06 Lg. Philips Lcd Co., Ltd. Method of fabricating a substrate
US6228211B1 (en) 1998-09-08 2001-05-08 Lg. Philips Lcd Co., Ltd. Apparatus for etching a glass substrate
US6327011B2 (en) 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
US6558776B1 (en) 1998-10-22 2003-05-06 Lg.Philips Lcd Co., Ltd. Glass substrate for liquid crystal display device
US6675817B1 (en) * 1999-04-23 2004-01-13 Lg.Philips Lcd Co., Ltd. Apparatus for etching a glass substrate
US8043466B1 (en) 1997-03-21 2011-10-25 Lg Display Co., Ltd Etching apparatus

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995028736A1 (en) * 1994-04-15 1995-10-26 Steag Microtech Gmbh Donaueschingen Process and device for chemically treating substrates
US5569330A (en) * 1994-04-15 1996-10-29 Steag Microtech Gmbh Donaueschingen Method and device for chemically treating substrates
US6197209B1 (en) 1995-10-27 2001-03-06 Lg. Philips Lcd Co., Ltd. Method of fabricating a substrate
US6468438B1 (en) 1995-10-27 2002-10-22 Lg Philips Lcd Co., Ltd Method of fabricating a substrate
US8043466B1 (en) 1997-03-21 2011-10-25 Lg Display Co., Ltd Etching apparatus
US6955840B2 (en) 1997-10-20 2005-10-18 Lg. Philips Lcd Co., Ltd. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
US6327011B2 (en) 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
US7132034B2 (en) * 1998-03-16 2006-11-07 Lg.Philips Lcd Co., Ltd. Apparatus for etching a glass substrate
US6228211B1 (en) 1998-09-08 2001-05-08 Lg. Philips Lcd Co., Ltd. Apparatus for etching a glass substrate
US6558776B1 (en) 1998-10-22 2003-05-06 Lg.Philips Lcd Co., Ltd. Glass substrate for liquid crystal display device
US6675817B1 (en) * 1999-04-23 2004-01-13 Lg.Philips Lcd Co., Ltd. Apparatus for etching a glass substrate

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